TWI247164B - Method for forming a bank of color filter - Google Patents

Method for forming a bank of color filter Download PDF

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Publication number
TWI247164B
TWI247164B TW92130340A TW92130340A TWI247164B TW I247164 B TWI247164 B TW I247164B TW 92130340 A TW92130340 A TW 92130340A TW 92130340 A TW92130340 A TW 92130340A TW I247164 B TWI247164 B TW I247164B
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TW
Taiwan
Prior art keywords
color filter
black matrix
wall structure
patterned
retaining wall
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Application number
TW92130340A
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Chinese (zh)
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TW200515040A (en
Inventor
Hsien-Lin Lee
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Allied Material Technology Cor
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Publication date
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Priority to TW92130340A priority Critical patent/TWI247164B/en
Priority to JP2004238359A priority patent/JP2005134878A/en
Publication of TW200515040A publication Critical patent/TW200515040A/en
Application granted granted Critical
Publication of TWI247164B publication Critical patent/TWI247164B/en

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  • Liquid Crystal (AREA)

Abstract

A method for forming a bank of color filter is employed in ink jet printing method. A black matrix layer and a photo resist are sequentially deposited upon a substrate. The black matrix layer and the first photo resist are sequentially patterned by means of a mask. The photo resist is employed to be a bank of color filter. Finally, ink is deposed inside lattice structure by ink jet printing method.

Description

1247164 【實施方式】 在以噴墨法(Ink Jet Printing)製造彩色濾光片(c〇l〇r Filter)的製程中,為了降低光罩成本佔整個彩色濾光片總 成本的比重。本發明藉著使用圖案化後光阻層直接做為擋 牆結構,藉以減少使用一片光罩。 所明的播牆結構是形成於黑色矩陣上,且與黑色矩陣 具有相同圖案化的一層膜。擋牆結構和黑色矩陣圖案化後 所構成的凹框是喷墨法墨滴上色的位置。本發明係提供一 種低成本的擋牆結構製造方法,用以取代習知的擋牆結構 製造方法。以下將以實施例說明本發明的實施方式。 睛參照第1 A-1 C圖,其繪示依照本發明一較佳實施 例製造擋牆結構的步驟圖。在第丨A圖中,在彩色濾光片 的基材100上先形成黑色矩陣層1〇2,其功用在於阻擋光 線穿透。為了圖案化此黑色矩陣層丨〇2,形成光阻層工〇4 於黑色矩陣層102之上。在第1B圖中,藉由圖案化的光 罩(未繪示於圖示中)將光阻層1〇4曝光和顯影。圖案化後 的光阻層104不但作為蝕刻黑色矩陣層1〇2的阻擋罩幕, 而且作為噴墨法所需的擋牆結構。參照第1C圖,其繪示 圖案化後的黑色矩陣層1 〇2及擋牆結構i〇4。 1247164 因為LCD彩色濾光片製程產量的考量,皆採用一次 曝光(one shot)方式,因此光罩尺寸與彩色濾光片的基材 的尺寸相當’故光罩的成本昂貴。以第四代的彩色濾光片 為例,尺寸為止680x880 mm2之基板須使用800x920 mm2 大小之光罩’其售價約為2百萬台幣。因此,本發明所提 供之方法可節省LCD彩色濾光片製程的光罩費用。 第2A-2C圖係繪示依照本發明一較佳實施例的喷墨 法上色的步驟圖。在第2A圖中,藉由喷墨法將墨滴1〇6 上色到播牆結構1 04和黑色矩陣1 〇2圖案化後所構成的凹 框中。墨滴106可以是紅色、綠色或藍色,也可以依需求 柒成其他顏色。第2B圖係繪示墨滴附著在凹框中的情 形。為了使墨滴快速附著在凹框中,可藉由真空吸引、熱 烤或紫外光照色射等方式加速硬化的的速度。第2C圖 即纷示硬化後墨滴108的情形。 由上述本發明較佳實施例可知,應用本發明之擋牆結 構製作方法,可節省LCD彩色濾光片製程昂貴的光罩費 用而且,播牆結構製作的步驟亦減少了,相對的所兩制 程時間也較習知縮短。 而製 雖然本發明已以一較佳實施例揭露如上,然其 以限今丄μ „ "" 开用 反疋本發明,任何熟習此技藝者,在不脫離本發明之精 Ϊ247164 神和範圍内, 護範圍當視後 富可作各種之更動與潤飾,因此本發明之保 附之申請專利範圍所界定者為準。 【圖式簡單說明】 、特徵、和優點能更明 並配合所附圖式,作詳 為讓本發明之上述和其他目的 顯易懂,下文特舉一較佳實施例, 細說明如下: 第1A-1C圖係緣示依照本發明一較佳實施例製造擋 牆結構的步驟圖;以及 第2A-2C圖係綠示依照本發明一較佳實施例的喷墨 法上色的步驟圖。 【元件代表符號簡單說明】 100 : 彩色濾光片基材 102 : 黑色矩陣層 104 : 擋牆結構 106 : 墨滴 108 : 硬化後墨滴1247164 [Embodiment] In a process of manufacturing a color filter by ink jet printing (Ink Jet Printing), in order to reduce the proportion of the cost of the mask to the total cost of the entire color filter. The present invention reduces the use of a reticle by directly using the patterned photoresist layer as a barrier structure. The known wall structure is a film formed on a black matrix and having the same pattern as the black matrix. The concave frame formed by the retaining wall structure and the black matrix patterning is the position where the ink droplets are colored by the ink jet method. SUMMARY OF THE INVENTION The present invention provides a low cost method of manufacturing a retaining wall structure that replaces the conventional method of manufacturing a retaining wall structure. Embodiments of the present invention will be described below by way of examples. Referring to Figure 1A-1C, there is shown a step diagram of fabricating a retaining wall structure in accordance with a preferred embodiment of the present invention. In Fig. A, a black matrix layer 1 〇 2 is formed on the substrate 100 of the color filter, and its function is to block the light from penetrating. In order to pattern the black matrix layer 丨〇2, a photoresist layer 4 is formed over the black matrix layer 102. In Fig. 1B, the photoresist layer 1〇4 is exposed and developed by a patterned mask (not shown). The patterned photoresist layer 104 serves not only as a barrier mask for etching the black matrix layer 1 2 but also as a barrier structure required for the ink jet method. Referring to Fig. 1C, the patterned black matrix layer 1 〇 2 and the retaining wall structure i 〇 4 are shown. 1247164 Because of the consideration of the output of the LCD color filter process, one shot is used, so the size of the mask is equivalent to the size of the substrate of the color filter. Therefore, the cost of the mask is expensive. For example, in the fourth generation of color filters, the size of the 680x880 mm2 substrate must be 800x920 mm2. The price is about 2 million Taiwan dollars. Therefore, the method provided by the present invention can save the cost of the mask of the LCD color filter process. 2A-2C are diagrams showing the steps of coloring by an ink jet method in accordance with a preferred embodiment of the present invention. In Fig. 2A, the ink droplets 1〇6 are colored by the ink-jet method to the concave frame formed by the patterning of the wall structure 104 and the black matrix 1 〇2. The ink droplets 106 may be red, green or blue, or may be colored in other colors as desired. Fig. 2B is a diagram showing the case where ink droplets are attached to the concave frame. In order to quickly adhere the ink droplets to the concave frame, the speed of hardening can be accelerated by vacuum suction, hot baking or ultraviolet light coloring. Fig. 2C shows the case of the ink droplet 108 after hardening. According to the preferred embodiment of the present invention, the method for manufacturing the retaining wall structure of the present invention can save the cost of the mask of the LCD color filter process, and the steps for fabricating the wall structure are also reduced, and the relative two processes are reduced. Time is also shorter than conventional. Although the present invention has been disclosed above in a preferred embodiment, it is intended to be used in accordance with the present invention, and anyone skilled in the art, without departing from the essence of the invention, 247,164 Within the scope of the scope of protection, it is possible to make various changes and refinements. Therefore, the scope of the patent application of the invention is subject to the definition of the patent application. [Simplified description of the drawings], features, and advantages can be more clear and compatible BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects of the present invention will be apparent from the following detailed description of the preferred embodiments. A step view of the wall structure; and a second embodiment of the second embodiment of the present invention. Black matrix layer 104 : Retaining wall structure 106 : Ink drops 108 : Hardened ink drops

Claims (1)

1247164 拾、 晶顯 含: 阻層 層圖 法, 法, 器, 阻層 申請專利範圍 1 · 一檀播牆結構製# # ^ 一々m 乍H適用於以喷墨法製ϋ 不系色慮光片時,該擋牆結構製作方法幻 液 包 在彩色濾光片基材上 依序形成一黑 色矩陣層和一光 精由一光罩圖案化該光 圖案化該黑色矩陣層上 案化後構成喷墨法所需 2 ·如申睛專利範圍第 其中該光阻層係以習知 3 ·如申請專利範圍第 其中該黑色矩陣層係以 阻層成為擋牆結構;以及 ’其中該光阻層和該黑色矩 的凹框。1247164 Pickup, crystal display: Resistive layer method, method, device, resist layer patent application scope 1 · One sand tile wall structure system # # ^一々m 乍H is suitable for inkjet method ϋ 不色色光片When the retaining wall structure is formed, a black matrix layer is sequentially formed on the color filter substrate, and a light is patterned by a photomask. The light pattern is patterned on the black matrix layer to form a spray. The ink method is required to be as follows: 2. The scope of the patent application is as follows: wherein the photoresist layer is conventionally known as in the patent application scope, wherein the black matrix layer is a resist layer to form a retaining wall structure; and 'where the photoresist layer and The concave frame of the black moment. 陣 1項所述之擋牆結構製作方 的曝光和顯影的步驟圖案化。 1項所述之擋牆結構製 餘刻方式圖案化。 作方 4· 一種彩色濾光片之製作方法, 该彩色濾光片之製作方法至少包含 適用於液晶顯示 在彩色濾光片基材上依序形 藉由一光罩圖案化該光阻層 圖案化該黑色矩陣層;以及 成一黑色矩陣層和— 成為擋牆結構; 光 10 1247164 藉由噴墨法將彩色墨滴直接上色於該黑色矩陣層和 呑亥擋牆結構圖案化後所構成的凹框。 、5.如申請專利範圍第4項所述之彩色濾光片製作方 法更包含以熱烤方式硬化該彩色墨滴。 法, 6·如申請專利範圍第4項所述 其中該光阻層係以習知的曝光和 之彩色濾光片製作# 顯影的步驟圖案彳匕。 7 ·如申請專利範圍第 法,其中該黑色矩陣層係 4項所述之彩色濾光片 以蝕刻方式圖案化。 製作方The steps of exposure and development of the retaining wall structure described in the first aspect are patterned. The retaining wall structure described in item 1 is patterned in a residual manner. 4) A method for fabricating a color filter, the method for fabricating the color filter at least comprising: applying a liquid crystal display to a color filter substrate, sequentially patterning the photoresist layer pattern by a mask The black matrix layer; and a black matrix layer and - become a retaining wall structure; light 10 1247164 by coloring ink droplets directly by the inkjet method on the black matrix layer and the 呑 挡 retaining wall structure patterned Concave frame. 5. The color filter manufacturing method of claim 4, further comprising hardening the colored ink droplets by hot baking. The method is as described in claim 4, wherein the photoresist layer is formed by a conventional exposure and color filter. 7. The method of claim 2, wherein the color filter of the black matrix layer is patterned by etching. Producer
TW92130340A 2003-10-30 2003-10-30 Method for forming a bank of color filter TWI247164B (en)

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Application Number Priority Date Filing Date Title
TW92130340A TWI247164B (en) 2003-10-30 2003-10-30 Method for forming a bank of color filter
JP2004238359A JP2005134878A (en) 2003-10-30 2004-08-18 Method for manufacturing bank structure

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TW92130340A TWI247164B (en) 2003-10-30 2003-10-30 Method for forming a bank of color filter

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8034517B2 (en) 2007-01-03 2011-10-11 Au Optronics Corporation Color filter and manufacturing method thereof

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100394221C (en) * 2005-07-08 2008-06-11 虹创科技股份有限公司 Method for making colour-filter
KR100785169B1 (en) 2006-02-10 2007-12-11 비오이 하이디스 테크놀로지 주식회사 Method of manufacturing color filter layer
CN100426015C (en) * 2006-02-15 2008-10-15 虹创科技股份有限公司 Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof
CN108666328B (en) * 2017-04-01 2020-05-05 奇景光电股份有限公司 Image sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8034517B2 (en) 2007-01-03 2011-10-11 Au Optronics Corporation Color filter and manufacturing method thereof

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JP2005134878A (en) 2005-05-26

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