CN100394221C - Method for making colour-filter - Google Patents

Method for making colour-filter Download PDF

Info

Publication number
CN100394221C
CN100394221C CNB2005100359161A CN200510035916A CN100394221C CN 100394221 C CN100394221 C CN 100394221C CN B2005100359161 A CNB2005100359161 A CN B2005100359161A CN 200510035916 A CN200510035916 A CN 200510035916A CN 100394221 C CN100394221 C CN 100394221C
Authority
CN
China
Prior art keywords
ink
filtering substrate
manufacturing colored
colored filtering
black matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005100359161A
Other languages
Chinese (zh)
Other versions
CN1892265A (en
Inventor
周景瑜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongchuan Science & Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongchuan Science & Technology Co Ltd filed Critical Hongchuan Science & Technology Co Ltd
Priority to CNB2005100359161A priority Critical patent/CN100394221C/en
Priority to US11/432,969 priority patent/US7537867B2/en
Priority to JP2006188555A priority patent/JP4512950B2/en
Priority to KR1020060064435A priority patent/KR100868398B1/en
Publication of CN1892265A publication Critical patent/CN1892265A/en
Application granted granted Critical
Publication of CN100394221C publication Critical patent/CN100394221C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention relates to a color filter manufacturing method. It contains forming organic black matrices photoresistance layer on transparent carrier, through light hood to make exposure developing to said organic black matrices photoresistance layer and removing unnecessary organic black matrices photoresistance layer, on said organic black matrices photoresistance layer forming positive type photoresistance layer and making exposure from back, developing said positive type photoresistance layer to make plurality of barricade, through ink-jet method implanting ink to barricade, solidifying said ink.

Description

Method for manufacturing colored filtering substrate
[technical field]
The present invention relates to a kind of method for manufacturing colored filtering substrate.
[background technology]
The passive type display device, as LCD, the white light that need utilize colored filter to pass through is converted into the Red Green Blue light beam and reaches the effect that shows the different color image.Colored filter mainly comprises black matrix and dyed layer, and this dyed layer is made up of the red, green, blue three look color layers (Color Area) of alternately arranging.
A kind of method for manufacturing colored filtering substrate of prior art as shown in Figure 1, it is a method of making colored filter with ink-jet technology, mainly comprises the following steps: to form successively on transparency carrier the black matrix layer and first photoresist layer; By light shield this first photoresist layer is exposed and development; To this black matrix layer carry out etching and after remove this first photoresist layer fully; On this black matrix layer, form second photoresist layer and expose by the back side; This second photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
Below in conjunction with Fig. 2 to Fig. 9 this method for manufacturing colored filtering substrate is carried out summary description.
As shown in Figure 2, provide transparency carrier 100, on the upper surface of transparency carrier 100, form the black matrix layer 102 and first photoresist layer 104 successively.Should black matrix layer 102 generally be the chromium that forms of the mode with evaporation or sputter or the film of evanohm.
As shown in Figure 3, to this 104 exposures of first photoresist layer and development, form the photoresistance matrix 1041 of a plurality of patternings by light shield.By this step, with the design transfer that had on the light shield to this photoresistance matrix 1041.
As shown in Figure 4, this black matrix layer 102 is carried out etching, obtains the black matrix 1021 of patterning, and after remove remaining photoresistance matrix 1041 fully.
As shown in Figure 5, on the black matrix 1021 that black matrix layer makes by this, form second photoresist layer 106, and utilize ultraviolet photoetching source 112 exposing by this transparency carrier 100 with its upper surface opposing backside surface.
As shown in Figure 6, second photoresist layer 106 after this exposure of developing makes a plurality of barricades 1061, forms the space between every two adjacent barricades 1061.
As shown in Figure 7, utilize ink discharge device, for example Thermal Bubble Ink-jet Printer device (ThermalBubble Ink Jet Printing Apparatus) or piezoelectric ink jet device (Piezoelectric Ink Jet Printing Apparatus) are in the space that the ink of the color of needs is injected between the barricades 1061 with little liquid 108.As shown in Figure 8, these a plurality of little liquid 108 are fused into ink 110 in this space.
As shown in Figure 9, utilize solidification equipment, for example heating arrangement or light-emitting device, these ink 110 oven dry or commissure or the two are had concurrently, to form smooth color layers 114, this color layers 114 can be redness, and correspondingly, other blue color layers and green color layers are formed on a side of this beauty's chromatograph 114 successively.
In this method for manufacturing colored filtering substrate; for with the design transfer of light shield to this black matrix 1021; must be through the twice processing procedure; promptly at first utilize light shield first photoresist layer 104 that exposes; with the design transfer of this light shield to this photoresistance matrix 1041; and then do protection with the photoresistance matrix 1041 of this patterning, and unwanted black matrix layer 102 is carried out etching remove, obtain the black matrix 1021 of patterning.This kind processing procedure after the pattern of light shield is finally transferred to this black matrix 1041, influences the degree of accuracy of the pattern of required black matrix 1021 because the processing procedure that relates to is too much unavoidably, and this further can have influence on the degree of accuracy of follow-up barricade 1061 and color layers 114 etc.
[summary of the invention]
Below, will a kind of method for manufacturing colored filtering substrate that improves the degree of accuracy of the pattern of deceiving matrix be described with embodiment.
For realizing that the foregoing description content provides a kind of method for manufacturing colored filtering substrate, this method for manufacturing colored filtering substrate comprises the following steps: to form organic black matrix photoresist layer on transparency carrier; By light shield this organic black matrix photoresist layer exposure imaging is removed unnecessary organic black matrix photoresist layer; On this organic black matrix photoresist layer, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
And, another method for manufacturing colored filtering substrate is provided, this method for manufacturing colored filtering substrate comprises the following steps: to form on the surface of transparency carrier from these recessed a plurality of grooves in transparency carrier surface by light shield or accurate alignment device; In this groove, form organic black matrix; On this organic black matrix, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
Method for manufacturing colored filtering substrate that the foregoing description provides all because of being with direct make corresponding with light shield of black matrix, can improve the degree of accuracy of the pattern of black matrix.And, be organic material owing to make the material of black matrix, avoid using the poisonous metal chromium of prior art, make the colored filter tool environmental-protecting performance that the foregoing description makes.
In addition, when deceiving arranged in matrix in the recessed groove of self-induced transparency substrate surface the time,, when the material of this black matrix has hole, also can avoid the colour mixture of the color layers of different colours because of the ink that injects between the barricade can not touch this black matrix.
[description of drawings]
Fig. 1 is a kind of process flow diagram of prior art method for manufacturing colored filtering substrate.
Fig. 2 to Fig. 9 is the synoptic diagram of the prior art method for manufacturing colored filtering substrate.
Figure 10 is the process flow diagram of the method for manufacturing colored filtering substrate of first embodiment of the invention.
Figure 11 to Figure 15 is the synoptic diagram of the method for manufacturing colored filtering substrate of this first embodiment.
Figure 16 is the process flow diagram of the method for manufacturing colored filtering substrate of second embodiment of the invention.
Figure 17 to Figure 21 is the synoptic diagram of the method for manufacturing colored filtering substrate of this second embodiment.
[embodiment]
As shown in figure 10, be the process flow diagram of first embodiment of the invention method for manufacturing colored filtering substrate, it mainly comprises the following steps: to form organic black matrix photoresist layer on transparency carrier; By light shield this organic black matrix photoresist layer exposure imaging is removed unnecessary organic black matrix photoresist layer; On this organic black matrix photoresist layer, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
Below in conjunction with Figure 11 to Figure 15 this method for manufacturing colored filtering substrate is described.
As shown in figure 11, provide transparency carrier 300, for example glass substrate forms organic black matrix photoresist layer 304 on the upper surface of transparency carrier 300.The material of this organic black matrix photoresist layer 304 generally is a carbon black resin.
As shown in figure 12, by light shield this organic black matrix photoresist layer 304 is exposed, and remove unnecessary organic black matrix photoresist layer, form the black matrix 3041 of a plurality of patternings through developing.By this step, with the design transfer that had on the light shield to this black matrix 3041.
As shown in figure 13, on this black matrix 3041, form eurymeric photoresist layer 306, and utilize ultraviolet photoetching source 312 exposing by this transparency carrier 300 with its upper surface opposing backside surface.At this moment, owing to should deceive the existence of matrix 3041, this black matrix 3041 does not make by its eurymeric photoresist layer that blocks 306 exposures with the effect of light shield, and is avoided the irradiation of ultraviolet light by the eurymeric photoresist layer 306 that it blocks.
As shown in figure 14, the eurymeric photoresist layer 306 after this exposure of developing makes a plurality of barricades 3061 that are positioned on the black matrix 3041 after the development, form the space between every two adjacent barricades 3061.
As shown in figure 15, utilize ink discharge device, for example Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device inject the ink of the color of needs in the space between the barricade 3061, and utilize solidification equipment, for example heating arrangement or light-emitting device, this ink oven dry or commissure or the two are had concurrently, and to form smooth color layers 310, this color layers 310 can be redness, correspondingly, other blue color layers and green color layers are formed on a side of this beauty's chromatograph 310 successively.
This method for manufacturing colored filtering substrate can improve the degree of accuracy of the pattern of black matrix 3041 because of being with black matrix 3041 direct make corresponding with light shield.And, be organic material owing to make the material of black matrix 3041, avoid using the poisonous metal chromium of prior art, make the colored filter tool environmental-protecting performance that this method makes.
Again as shown in figure 16, be the process flow diagram of second embodiment of the invention method for manufacturing colored filtering substrate, it mainly comprises the following steps: to form on the surface of transparency carrier from these recessed a plurality of grooves in transparency carrier surface; In this groove, form organic black matrix; On this organic black matrix, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
Below in conjunction with Figure 17 to Figure 21 this method for manufacturing colored filtering substrate is described.
As shown in figure 17, transparency carrier 500 is provided, glass substrate for example, carry out laser, sandblast or etched mode by light shield, perhaps the mode of carrying out laser or sandblast by other accurate alignment device forms the groove 504 from the recessed a plurality of patternings of these transparency carrier 500 upper surfaces on the upper surface of this transparency carrier 500.By this step, with required design transfer to this groove 504.
As shown in figure 18, utilize ink discharge device, for example Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device, with organic black matrix photoresist, for example carbon black resin injects in these a plurality of grooves 504, and this organic black matrix photoresist forms organic black matrix 5041 at this groove 504.
As shown in figure 19, the eurymeric photoresist is coated on the surface that is formed with black matrix 5041 of this transparency carrier 500, forms eurymeric photoresist layer 506, and utilize ultraviolet photoetching source 512 exposing by this transparency carrier 500 with its upper surface opposing backside surface.At this moment, owing to should deceive the existence of matrix 5041, this black matrix 5041 does not make by its eurymeric photoresist layer that blocks 506 exposures with the effect of light shield, and is avoided the irradiation of ultraviolet light by the eurymeric photoresist layer 506 that it blocks.
As shown in figure 20, the eurymeric photoresist layer 506 after this exposure of developing makes a plurality of barricades 5061 that are positioned on the black matrix 5041, forms the space between every two adjacent barricades 5061.
As shown in figure 21, utilize ink discharge device, for example Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device inject the ink of the color of needs in the space between the barricade 5061, and utilize solidification equipment, for example heating arrangement or light-emitting device, this ink oven dry or commissure or the two are had concurrently, and to form smooth color layers 510, this color layers 510 can be redness, correspondingly, other blue color layers and green color layers are formed on a side of this beauty's chromatograph 510 successively.
The method for manufacturing colored filtering substrate of this second embodiment has the effect identical with the method for manufacturing colored filtering substrate of first embodiment, and, owing to be that black matrix 5041 is arranged in the recessed groove 504 in self-induced transparency substrate 500 surfaces, when the material of this black matrix 5041 has hole, the ink that injects between the barricade 5061 can not touch this black matrix 5041, thereby avoids the colour mixture of the color layers of different colours.

Claims (23)

1. a method for manufacturing colored filtering substrate comprises the following steps: to form organic black matrix photoresist layer on transparency carrier; By light shield this organic black matrix photoresist layer exposure imaging is removed unnecessary organic black matrix photoresist layer; On this organic black matrix photoresist layer, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
2. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: this transparency carrier is a glass substrate.
3. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: the material of this organic black matrix photoresist layer is an organic resin.
4. method for manufacturing colored filtering substrate as claimed in claim 3 is characterized in that: this organic resin is a carbon black resin.
5. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: the exposure that should be undertaken by the back side is as light source with ultraviolet light.
6. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: this ink-jet method is by ink discharge device ink to be injected between this barricade.
7. method for manufacturing colored filtering substrate as claimed in claim 6 is characterized in that: this ink discharge device is to select from thermal bubble type ink discharge device or piezoelectric ink jet device.
8. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: it is to solidify ink between each barricade by heating arrangement.
9. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: it is to solidify ink between each barricade by heating arrangement and vacuum extractor.
10. method for manufacturing colored filtering substrate as claimed in claim 1 is characterized in that: it is to solidify ink between each barricade by light-emitting device.
11. a method for manufacturing colored filtering substrate comprises the following steps: to form on the surface of transparency carrier from these recessed a plurality of grooves in transparency carrier surface by light shield or accurate alignment device; In this groove, form organic black matrix; On this organic black matrix, form the eurymeric photoresist layer and expose by the back side; This eurymeric photoresist layer that develops makes a plurality of barricades; By ink-jet method ink is injected between this barricade; Solidify this ink.
12. method for manufacturing colored filtering substrate as claimed in claim 11, it is characterized in that: the lip-deep groove of this transparency carrier is to carry out laser, sandblast or etched mode by light shield to form, and perhaps the mode of carrying out laser or sandblast by accurate alignment device forms.
13. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: the organic black matrix in this groove is to spray into ink discharge device.
14. method for manufacturing colored filtering substrate as claimed in claim 13 is characterized in that: this ink discharge device is to select from thermal bubble type ink discharge device or piezoelectric ink jet device.
15. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: it is by ink discharge device ink to be injected between this barricade.
16. method for manufacturing colored filtering substrate as claimed in claim 15 is characterized in that: this ink discharge device is to select from thermal bubble type ink discharge device or piezoelectric ink jet device.
17. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: it is to solidify ink between each barricade by heating arrangement.
18. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: it is to solidify ink between each barricade by heating arrangement and vacuum extractor.
19. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: it is to solidify ink between each barricade by light-emitting device.
20. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: this transparency carrier is a glass substrate.
21. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: the material of this organic black matrix is an organic resin.
22. method for manufacturing colored filtering substrate as claimed in claim 21 is characterized in that: this organic resin is a carbon black resin.
23. method for manufacturing colored filtering substrate as claimed in claim 11 is characterized in that: the exposure that should be undertaken by the back side is as light source with ultraviolet light.
CNB2005100359161A 2005-06-17 2005-07-08 Method for making colour-filter Expired - Fee Related CN100394221C (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CNB2005100359161A CN100394221C (en) 2005-07-08 2005-07-08 Method for making colour-filter
US11/432,969 US7537867B2 (en) 2005-06-17 2006-05-12 Method for manufacturing color filter
JP2006188555A JP4512950B2 (en) 2005-07-08 2006-07-07 Manufacturing method of color filter
KR1020060064435A KR100868398B1 (en) 2005-07-08 2006-07-10 Method for manufacturing color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2005100359161A CN100394221C (en) 2005-07-08 2005-07-08 Method for making colour-filter

Publications (2)

Publication Number Publication Date
CN1892265A CN1892265A (en) 2007-01-10
CN100394221C true CN100394221C (en) 2008-06-11

Family

ID=37597338

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005100359161A Expired - Fee Related CN100394221C (en) 2005-06-17 2005-07-08 Method for making colour-filter

Country Status (3)

Country Link
JP (1) JP4512950B2 (en)
KR (1) KR100868398B1 (en)
CN (1) CN100394221C (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI349117B (en) 2007-01-03 2011-09-21 Au Optronics Corp Color filter and manufacturing method thereof
CN100464224C (en) * 2007-01-18 2009-02-25 友达光电股份有限公司 Color filter and manufacture method therefor
CN102707353B (en) * 2011-08-04 2014-05-14 京东方科技集团股份有限公司 Color filter and method for producing same
KR101924997B1 (en) * 2012-07-03 2018-12-05 삼성디스플레이 주식회사 Display device and the method thereof
CN103646852B (en) * 2013-12-12 2018-11-23 京东方科技集团股份有限公司 A kind of production method of substrate
JP6269467B2 (en) * 2013-12-27 2018-01-31 富士フイルム株式会社 Color filter manufacturing method and solid-state image sensor manufacturing method
KR20150084566A (en) 2014-01-14 2015-07-22 삼성디스플레이 주식회사 Display apparatus and fabrication method thereof
CN104297978B (en) * 2014-10-30 2017-06-09 京东方科技集团股份有限公司 A kind of preparation method of display base plate, the preparation method of display device
CN105242445A (en) * 2015-10-30 2016-01-13 深圳市华星光电技术有限公司 A manufacture method of a liquid crystal display panel and a liquid crystal display panel
CN105259696A (en) * 2015-11-16 2016-01-20 深圳市华星光电技术有限公司 Manufacturing method for color filter substrate
CN114810661A (en) * 2015-12-11 2022-07-29 台达电子工业股份有限公司 Impeller and fan
US11965522B2 (en) 2015-12-11 2024-04-23 Delta Electronics, Inc. Impeller
KR102432785B1 (en) * 2017-02-15 2022-08-17 도쿄 오카 고교 가부시키가이샤 Method of forming pattern for partition
CN115166888A (en) * 2017-09-29 2022-10-11 富士胶片株式会社 Method for manufacturing optical filter
US10802325B2 (en) * 2018-11-05 2020-10-13 Himax Display, Inc. Display panel
CN111432571A (en) * 2020-02-20 2020-07-17 南昌欧菲光科技有限公司 Blackening method of conductive substrate, conductive substrate and electronic equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005134878A (en) * 2003-10-30 2005-05-26 Allied Material Technology Corp Method for manufacturing bank structure
CN1881024A (en) * 2005-06-17 2006-12-20 鸿富锦精密工业（深圳）有限公司 Color filter and manufacturing method thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04223402A (en) * 1990-12-26 1992-08-13 Fujitsu Ltd Production of color filter
JPH10133011A (en) * 1996-10-31 1998-05-22 Toppan Printing Co Ltd Color filter and its production
JP2000035511A (en) * 1998-07-16 2000-02-02 Asahi Glass Co Ltd Production of color filter and liquid crystal display using the color filter
CN1174265C (en) * 1998-12-21 2004-11-03 精工爱普生股份株式会社 Color filter and method of manufacture thereof
KR20010075430A (en) * 1999-07-28 2001-08-09 마츠시타 덴끼 산교 가부시키가이샤 Method for manufacturing color filter, color filter, and liquid crystal device
JP4431958B2 (en) * 2001-06-01 2010-03-17 セイコーエプソン株式会社 Color filter and electro-optical device
TWI224213B (en) * 2003-10-30 2004-11-21 Allied Material Technology Cor Method for forming a bank of color filter
KR101022552B1 (en) * 2003-12-30 2011-03-16 엘지디스플레이 주식회사 Device and the fabrication method for lcd
KR20060024939A (en) * 2004-09-15 2006-03-20 엘지.필립스 엘시디 주식회사 Color filter substrate for lcd and fabricating methode thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005134878A (en) * 2003-10-30 2005-05-26 Allied Material Technology Corp Method for manufacturing bank structure
CN1881024A (en) * 2005-06-17 2006-12-20 鸿富锦精密工业（深圳）有限公司 Color filter and manufacturing method thereof

Also Published As

Publication number Publication date
KR20070006624A (en) 2007-01-11
JP4512950B2 (en) 2010-07-28
KR100868398B1 (en) 2008-11-11
CN1892265A (en) 2007-01-10
JP2007017985A (en) 2007-01-25

Similar Documents

Publication Publication Date Title
CN100394221C (en) Method for making colour-filter
CN100529877C (en) Color filter and manufacturing method thereof
CN100354662C (en) Method of forming colored layers of color image display unit
KR0171230B1 (en) Method of manufacturing liquid crystal display device
JPS63235901A (en) Color filter forming method
US9867289B2 (en) Filled large-format imprinting method
KR100755916B1 (en) Manufacturing method of color filter
CN100468094C (en) Method for producing colour optical filter
CN102183806A (en) Color filter array and manufacturing method thereof
JPH08179113A (en) Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter
CN100426015C (en) Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof
JP2009175270A (en) Method of manufacturing color filter
US20070211196A1 (en) Color filter panel and manufacturing method thereof
JPH10206627A (en) Color filter and manufacture thereof
CN201615951U (en) Structural improvement of color filter
JP2006343518A (en) Manufacturing method of color filter and ink jet system for manufacturing color filter
JPH01307703A (en) Production of color filter
JP3997419B2 (en) Manufacturing method of color filter
JP5835651B2 (en) Manufacturing method of color filter
KR20050121303A (en) Color filter substrate and method for manufacturing the same
JP2009175269A (en) Method for manufacturing color filter
JPH10123310A (en) Production of color filter
JP2007241318A (en) Manufacturing method of color filter and display apparatus
KR20060021152A (en) Color filter substrate and method for manufacturing the same
KR20080060479A (en) Manufacturing method for color filter of flat panel display

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: HONGCHUANG TECHNOLOGY CO., LTD.

Free format text: FORMER OWNER: HONGFUJIN PRECISION INDUSTRY (SHENZHEN) CO., LTD.; APPLICANT

Effective date: 20070216

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20070216

Address after: 350 Hsinchu Science Industrial Park, Taiwan Province, No. 4, 24-1 East Fourth Street, Hsinchu

Applicant after: Hongchuan Science & Technology Co., Ltd.

Address before: 518109, No. two, No. tenth, East Ring Road, Pinus tabulaeformis Industrial Zone, Longhua Town, Baoan District, Guangdong, Shenzhen, 2

Applicant before: Hongfujin Precision Industry (Shenzhen) Co., Ltd.

Co-applicant before: Hongchuan Science & Technology Co., Ltd.

C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: HONGFUJIN PRECISION INDUSTRY (SHENZHEN) CO., LTD.

Free format text: FORMER OWNER: HONGCHUANG TECHNOLOGY CO., LTD.

Effective date: 20100416

Owner name: HONGHAI PRECISION INDUSTRY CO., LTD.

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 000350 FLOOR 4, NO.24-1, GONGYE EAST 4TH ROAD, HSINCHU CITY, HSINCHU SCIENCE PARK, TAIWAN PROVINCE TO: NO.2, EAST RING 2ND ROAD, YOUSONG 10TH INDUSTRY DISTRICT, LONGHUA TOWN, BAO AN DISTRICT, SHENZHEN CITY, GUANGDONG PROVINCE

TR01 Transfer of patent right

Effective date of registration: 20100416

Address after: Guangdong province Shenzhen city Baoan District town Longhua tenth Industrial Zone tabulaeformis East Ring Road No. 2 two

Co-patentee after: Hon Hai Precision Industry Co., Ltd.

Patentee after: Hongfujin Precise Industry (Shenzhen) Co., Ltd.

Address before: 000350 Hsinchu Science Industrial Park, Taiwan Province, No. 4, 24-1 East Fourth Street, Hsinchu

Patentee before: Hongchuan Science & Technology Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080611

Termination date: 20150708

EXPY Termination of patent right or utility model