CN100529877C - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
- Publication number
- CN100529877C CN100529877C CNB2005100354011A CN200510035401A CN100529877C CN 100529877 C CN100529877 C CN 100529877C CN B2005100354011 A CNB2005100354011 A CN B2005100354011A CN 200510035401 A CN200510035401 A CN 200510035401A CN 100529877 C CN100529877 C CN 100529877C
- Authority
- CN
- China
- Prior art keywords
- manufacturing
- barrier rib
- transparency carrier
- color filters
- black matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Optical Filters (AREA)
Abstract
The invention discloses a colorful filter and making method, which comprises the following parts: transparent base, black-matrix and dyed layer, wherein the black-matrix is set in the groove of transparent base surface; the dyed layer is set between the surface of transparent base and black-matrix.
Description
[technical field]
The present invention relates to a kind of LCD (Liquid Crystal Display, colored filter LCD) and this manufacturing method of color filters of being used for.
[background technology]
LCD is a kind of passive type display device, for reaching the colored effect that shows, need to use colored filter, the effect of this colored filter is that the white light that will pass through is converted into the Red Green Blue light beam, and (Thin FilmTransistor, TFT) other assemblies such as layer and liquid crystal are to reach the effect that shows the different color image to cooperate thin film transistor (TFT).Colored filter mainly comprises black matrix and dyed layer, and this dyed layer is made up of the red, green, blue three look color layers (Color Area) of alternately arranging.
A kind of manufacturing method of color filters of prior art is pigment dispersing method (Pigment Dispersion).This manufacture method is that chromatic photoresist is coated on the transparency carrier in the mode that rotation applies (Spin Coating), makes color layers via exposure, development.Wherein this chromatic photoresist is that color pigment is dispersed in wherein photoresistance, and it has the characteristic of irradiation reaction and thermmohardening.But, must be for making red, green, blue three look color layers through three times coating, exposure, developing manufacture process, this kind manufacturing method of color filters applies photoresistance in the mode that rotation applies, easily photoresistance is rotated the waste that transparency carrier causes photoresistance outward, and, this manufacture method too complex, the cost of prepared colored filter is higher.
The manufacturing method of color filters of another kind of prior art as shown in Figure 1, it is a method of making colored filter with ink-jet technology.This manufacturing method of color filters is carried out summary description below in conjunction with Fig. 1 (a) to Fig. 1 (g).
Shown in Fig. 1 (a), transparency carrier 10 is provided, on the upper surface 11 of this transparency carrier 10, form black matrix photoresist layer 5.
Shown in Fig. 1 (b), utilize light shield 7 will deceive matrix photoresist layer 5 and form a plurality of black matrixes of giving prominence on this upper surface 11 12,14 via exposure, development.
Shown in Fig. 1 (c), utilize wet type spin coating method (Wet Spin Coating) on this transparency carrier 10, to apply photoresist layer 15.
Shown in Fig. 1 (d), the photoresist layer 15 that utilizes light shield 19 will be positioned on the transparency carrier 10 forms a plurality of barrier ribs 16,18 via exposure, development, forms irrigation canals and ditches 21 between every adjacent barrier rib 16,18.
Shown in Fig. 1 (e), utilize ink discharge device 13, for example Thermal Bubble Ink-jet Printer device (Thermal Bubble Ink Jet Printing Apparatus) or piezoelectric ink jet device (Piezoelectric Ink Jet Printing Apparatus), in the irrigation canals and ditches 21 that the ink of the color of needs is injected between the barrier ribs 16,18 with little liquid 20, these a plurality of little liquid 20 are fused into ink in irrigation canals and ditches 21.
Shown in Fig. 1 (f), utilize solidification equipment 42, for example heating arrangement or light-emitting device, have the ink oven dry in the irrigation canals and ditches 21 or commissure or the two concurrently it, to form smooth color layers 41, this color layers 41 can be redness, and correspondingly, other blue color layers and green color layers are formed on a side of this beauty's chromatograph 41 successively.
Shown in Fig. 1 (g), a plurality of barrier ribs 16,18 backs that remove on the black matrix 12 that is positioned at this transparency carrier 10 form the transparency conducting layer 46 that covers this black matrix 12,14 and red, green, blue color layers 41,141,241 on this transparency carrier 10.This transparency conducting layer 46 can be the indium tin oxide films that adopts vacuum sputtering apparatus to form.
This method of making colored filter with ink-jet technology use ink discharge device with three kinds of color layers of red, green, blue 41,141,241 simultaneously spray printing on transparency carrier 10, can simplify processing procedure, and improve the degree of accuracy that three kinds of color layers of red, green, blue 41,141,241 are provided with the position.But, because of being arranged on the upper surface 11 of this transparency carrier 10 by black matrix 12,14, when the material of this black matrix 12,14 has hole, inject inks in the irrigation canals and ditches 21 and be easy to ink in the groove that is marked with color inequality outside this hole touches this black matrix 12,14, thereby cause the colour mixture of the color layers of different colours.
[summary of the invention]
Below, will a kind of colored filter of avoiding different colours color layers colour mixture be described with embodiment, and, a kind of manufacturing method of color filters.
For the content that realizes the foregoing description provides a kind of colored filter, this colored filter comprises transparency carrier, black matrix and dyed layer, wherein this colored filter further comprises a plurality of barrier ribs, should deceive arranged in matrix in the groove that this transparency carrier surface is recessed into certainly, this barrier rib is formed on this black matrix, this dyed layer be arranged on the surface of this transparency carrier and the position between this barrier rib.
For realizing that the foregoing description content also provides a kind of manufacturing method of color filters, this manufacturing method of color filters comprises the following steps: to provide transparency carrier, and forms on the surface of this transparency carrier from these recessed a plurality of grooves in transparency carrier surface; In this groove, form black matrix; On the black matrix of this transparency carrier, form a plurality of barrier ribs; Between each barrier rib, inject the ink of the color that needs respectively; Solidify the ink between each barrier rib.
Manufacturing method of color filters that present embodiment provides and colored filter all because of be will black matrix sidewall hole be arranged in the recessed groove of self-induced transparency substrate surface, when the material of this black matrix has hole, the ink that injects between the barrier rib can not touch this black matrix, thereby avoids the colour mixture of the color layers of different colours.
[description of drawings]
Fig. 1 is a kind of synoptic diagram of prior art manufacturing method of color filters.
Fig. 2 is the synoptic diagram of manufacturing method of color filters of the present invention.
Fig. 2 (h) is the diagrammatic cross-section of first embodiment of colored filter of the present invention.
Fig. 3 is the diagrammatic cross-section of second embodiment of colored filter of the present invention.
Fig. 4 is the diagrammatic cross-section of the 3rd embodiment of colored filter of the present invention.
[embodiment]
As shown in Figure 2, be the synoptic diagram of manufacturing method of color filters of the present invention.This manufacturing method of color filters is described to Fig. 2 (h) below in conjunction with Fig. 2 (a).
Shown in Fig. 2 (a), transparency carrier 50 is provided, glass substrate for example, this transparency carrier 50 comprise relative upper surface 51 and lower surface 52.
Shown in Fig. 2 (b), utilize laser, sandblast or etched mode on the upper surface 51 of this transparency carrier 50, to form a plurality of grooves 511, this groove 511 is recessed from the upper surface 51 of this transparency carrier 50.
Shown in Fig. 2 (c), utilize ink discharge device 60, for example Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device, with organic black matrix photoresist, for example carbon black resin injects in these a plurality of grooves 511 with little liquid 61, and these a plurality of little liquid 61 form black matrix 53 at this groove 511.
Shown in Fig. 2 (d), the eurymeric photoresist is coated on the upper surface 51 that is formed with black matrix 53 of this transparency carrier 50, form photoresist layer 54, and with ultraviolet light from this transparency carrier 50 with this photoresist layer 54 back to lower surface 52 1 sides this photoresist layer 54 is exposed.At this moment, owing to should deceive the existence of matrix 53, this black matrix 53 does not make by its photoresist layer that blocks 54 exposures with the effect of light shield, and is avoided the irradiation of ultraviolet light by its photoresist layer that blocks 54.Or, the minus photoresist is coated on the upper surface 51 of this transparency carrier 50, form photoresist layer 54, utilize the light shield exposure machine from a side, to these photoresist layer 54 exposures over against this photoresist layer 54.
Shown in Fig. 2 (e), the photoresist layer 54 of this exposure forms a plurality of barrier ribs 55 that are positioned on the black matrix 53 through developing manufacture process.
Shown in Fig. 2 (f), utilize ink discharge device 70, for example Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device inject the ink of the color of needs respectively between the adjacent barrier rib 55 with little liquid 71, and these a plurality of little liquid 71 are fused into ink 56 between barrier rib 55.
Shown in Fig. 2 (g), utilize solidification equipment, for example heating arrangement, light-emitting device or heating arrangement be in conjunction with vacuum extractor, has 56 oven dry of the ink between the barrier rib 55 or commissure or the two concurrently it, with a plurality of color layers 57 of the color that forms smooth needs.And remove a plurality of barrier ribs 55 on the black matrix 53 that is positioned at this transparency carrier 50.
Shown in Fig. 2 (h), on this transparency carrier 50, form the conductive layer 58 that covers this black matrix 53 and red, green, blue color layers 57.This conductive layer 58 can be the indium tin oxide films that adopts vacuum sputtering apparatus to form.
Detailed as Fig. 2 (h) shown in, utilize first embodiment of the colored filter of the present invention that above-mentioned manufacture method makes to comprise transparency carrier 50, be arranged on black matrix 53 in the recessed groove 511 of this transparency carrier 50 upper surfaces 51, be arranged on the upper surface 51 of this transparency carrier 50 and deceiving three look color layers 57 that the rule between the matrix 53 arranges and the conductive layer 58 that covers this black matrix 53 and color layers 57.
As shown in Figure 3, be the sectional view of second embodiment of colored filter of the present invention.This colored filter is basic identical with the colored filter of first embodiment, its difference is: the barrier rib 85 of the colored filter of this second embodiment is retained on the black matrix 84, and make this barrier rib 85 have identical or close thickness with color layers 86, this close thickness requires to be advisable to satisfy flatness.When barrier rib 85 existence that make through the exposure imaging processing procedure exceed the part of color layers 86, can adopt lapping mode or etching mode that the raised area of this barrier rib 85 is removed.The manufacturing method of color filters of second embodiment is basic identical with first embodiment's, its difference is to cancel the step that removes barrier rib 85, and adopt lapping mode or etching mode that the part that exceeds color layers of barrier rib is removed, on this barrier rib 85 and color layers 86, cover conductive layer.
As shown in Figure 4, be the sectional view of the 3rd embodiment of colored filter of the present invention.This colored filter is basic identical with the colored filter of first embodiment; its difference is: the barrier rib 95 of the colored filter of the 3rd embodiment is retained on the black matrix 94; the thickness of this barrier rib 95 is greater than the thickness of this color layers 96, and has a protective seam 97 and a conductive layer 98 to cover successively on this barrier rib 95 and the color layers 96.This protective seam 97 is used for protecting this barrier rib 95 and color layers 96, satisfies the flatness requirement simultaneously.Also a conductive layer 98 can be covered in the present embodiment on this barrier rib 95 and the color layers 96,, satisfy the flatness requirement simultaneously to protect this barrier rib 95 and color layers 96.The manufacturing method of color filters of the 3rd embodiment is basic identical with first embodiment's; its difference is to cancel the step that removes barrier rib 95; and adopt lapping mode or etching mode that the part that exceeds color layers of barrier rib is removed; on this barrier rib 95 and color layers 96, cover a conductive layer, or cover a protective seam and a conductive layer successively.
The colored filter of above-mentioned manufacturing method of color filters and three kinds of embodiment all because of be will black matrix sidewall hole be arranged in the recessed groove of self-induced transparency substrate surface, when the material of this black matrix has hole, the ink that injects between the barrier rib can not touch this black matrix, thereby avoids the colour mixture of the color layers of different colours.Simultaneously, this black arranged in matrix in groove after, can directly utilize this black matrix from the back side of transparency carrier photoresist layer to be exposed and form this barrier rib, and need not adopt light shield and then needing avoid complex operations light shield and black matrix contraposition for light shield.
In addition, those skilled in the art also can do other variation in spirit of the present invention.So the variation that these are done according to spirit of the present invention all should be included within the present invention's scope required for protection.
Claims (25)
1. colored filter, comprise transparency carrier, black matrix and dyed layer, it is characterized in that: this colored filter further comprises a plurality of barrier ribs, should deceive arranged in matrix in the groove that this transparency carrier surface is recessed into certainly, this barrier rib is formed on this black matrix, and this dyed layer is arranged on the surface of this transparency carrier and between this barrier rib.
2. colored filter as claimed in claim 1 is characterized in that this transparency carrier is a glass substrate.
3. colored filter as claimed in claim 1 is characterized in that this black matrix material is organic photoresist.
4. colored filter as claimed in claim 1 is characterized in that this black matrix material is a carbon black resin.
5. colored filter as claimed in claim 1 is characterized in that this dyed layer beauty's chromatograph of arranging that comprises rule, green color layers and blue color layers.
6. colored filter as claimed in claim 1 is characterized in that this barrier rib has identical or close thickness with this dyed layer, and this close thickness requires to be advisable to satisfy flatness.
7. colored filter as claimed in claim 1 is characterized in that covering on this barrier rib and this dyed layer conductive layer.
8. colored filter as claimed in claim 1 is characterized in that being coated with successively on this barrier rib and this dyed layer protective seam and a conductive layer.
9. a manufacturing method of color filters comprises the following steps: to provide transparency carrier, and forms on the surface of this transparency carrier from these recessed a plurality of grooves in transparency carrier surface; In this groove, form black matrix; On the black matrix of this transparency carrier, form a plurality of barrier ribs; Between each barrier rib, inject the ink of the color that needs respectively; Solidify the ink between each barrier rib, and between each barrier rib, form a plurality of color layers of the color that needs respectively.
10. manufacturing method of color filters as claimed in claim 9, the lip-deep groove that it is characterized in that this transparency carrier are to form with laser, sandblast or etched mode.
11. manufacturing method of color filters as claimed in claim 9 is characterized in that the black matrix in this groove is to spray into ink discharge device.
12. manufacturing method of color filters as claimed in claim 11 is characterized in that this ink discharge device is Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device.
13. manufacturing method of color filters as claimed in claim 9 is characterized in that the formation of barrier rib on this black matrix comprises the following steps: photoresist layer is coated on the surface that is formed with black matrix of this transparency carrier; Form this barrier rib with the exposure imaging processing procedure.
14. manufacturing method of color filters as claimed in claim 13, it is characterized in that exposure to this photoresist layer be from this transparency carrier with this photoresist layer back to surface one side carry out.
15. manufacturing method of color filters as claimed in claim 13 is characterized in that the exposure to this photoresist layer is to carry out from the side over against this photoresist layer by light shield.
16. manufacturing method of color filters as claimed in claim 9 is characterized in that injecting between this barrier rib by the ink of ink discharge device with the color of needs.
17. manufacturing method of color filters as claimed in claim 16 is characterized in that this ink discharge device is Thermal Bubble Ink-jet Printer device or piezoelectric ink jet device.
18. manufacturing method of color filters as claimed in claim 9 is characterized in that solidifying ink between each barrier rib by heating arrangement.
19. manufacturing method of color filters as claimed in claim 9 is characterized in that solidifying ink between each barrier rib by heating arrangement and vacuum extractor.
20. manufacturing method of color filters as claimed in claim 9 is characterized in that solidifying ink between each barrier rib by light-emitting device.
21. manufacturing method of color filters as claimed in claim 9 is characterized in that further comprising the following steps: to remove a plurality of barrier ribs on the black matrix that is positioned at this transparency carrier; On this transparency carrier, form the conductive layer that covers this black matrix and color layers.
22. manufacturing method of color filters as claimed in claim 21 is characterized in that this conductive layer is an indium tin oxide films.
23. manufacturing method of color filters as claimed in claim 9 is characterized in that further comprising the step that the part that exceeds this color layers of this barrier rib is removed.
24. manufacturing method of color filters as claimed in claim 23, the method that it is characterized in that removing the part that exceeds this color layers of this barrier rib is lapping mode or etching mode.
25. manufacturing method of color filters as claimed in claim 9 is characterized in that further being included in the step that forms the conductive layer that covers this barrier rib and color layers on this transparency carrier.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100354011A CN100529877C (en) | 2005-06-17 | 2005-06-17 | Color filter and manufacturing method thereof |
| US11/432,969 US7537867B2 (en) | 2005-06-17 | 2006-05-12 | Method for manufacturing color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100354011A CN100529877C (en) | 2005-06-17 | 2005-06-17 | Color filter and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1881024A CN1881024A (en) | 2006-12-20 |
| CN100529877C true CN100529877C (en) | 2009-08-19 |
Family
ID=37519278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100354011A Expired - Fee Related CN100529877C (en) | 2005-06-17 | 2005-06-17 | Color filter and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100529877C (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100394221C (en) * | 2005-07-08 | 2008-06-11 | 虹创科技股份有限公司 | Method for making colour-filter |
| TWI412796B (en) * | 2010-12-28 | 2013-10-21 | Innolux Corp | Method for manufacturing color filter filmd, isplay device and liquid crystal display device thereof |
| CN102645691B (en) * | 2011-07-12 | 2014-07-23 | 京东方科技集团股份有限公司 | Color filter and manufacturing method thereof |
| KR20140144752A (en) * | 2012-01-19 | 2014-12-22 | 삼성디스플레이 주식회사 | Organic light emitting display devices and methods of manufacturing organic light emitting display devices |
| CN105259696A (en) * | 2015-11-16 | 2016-01-20 | 深圳市华星光电技术有限公司 | Manufacturing method for color filter substrate |
| CN105572954A (en) * | 2016-02-19 | 2016-05-11 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
| EP3596539A4 (en) * | 2017-03-17 | 2020-09-16 | Boe Technology Group Co. Ltd. | Color filter substrate and method of fabricating a color filter substrate |
| CN107175193A (en) * | 2017-06-02 | 2017-09-19 | 信利光电股份有限公司 | The preparation method and making frock of a kind of graphical optical filter |
| CN108845447A (en) * | 2018-06-22 | 2018-11-20 | 惠科股份有限公司 | Color filter structure, manufacturing method of color filter structure and photoetching process |
| CN109031764A (en) * | 2018-08-30 | 2018-12-18 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal display device |
| CN109500500B (en) * | 2019-01-22 | 2020-11-20 | 沈阳仪表科学研究院有限公司 | Method for manufacturing gradually-changed neutral density optical filter |
-
2005
- 2005-06-17 CN CNB2005100354011A patent/CN100529877C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1881024A (en) | 2006-12-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100529877C (en) | Color filter and manufacturing method thereof | |
| CN100394221C (en) | Method for making colour-filter | |
| CN100405092C (en) | Color filter and preparation method thereof | |
| KR0171230B1 (en) | Method of manufacturing liquid crystal display device | |
| US7102710B2 (en) | Manufacturing method of color filter substrate having panel identification | |
| JP4107384B2 (en) | Method for manufacturing color filter substrate for liquid crystal display device | |
| US20110269075A1 (en) | Method of fabricating color filter with flexible substrate | |
| US20060045966A1 (en) | Method of forming colored layers of color image display unit | |
| CN100447591C (en) | Color filter substrate and manufacture method therefor | |
| KR20020078517A (en) | A method for fabricating a spacer for LCD | |
| CN100529805C (en) | Colourful optical filter and producing method thereof | |
| CN100443993C (en) | Color filter substrate, liquid crystal display device and methods for manufacturing same | |
| KR101022552B1 (en) | Device and the fabrication method for lcd | |
| CN100468094C (en) | Method for producing colour optical filter | |
| JPH08179113A (en) | Production of color filter, color filter obtained by this method and liquid crystal dispaly panel constituted by disposing this color filter | |
| KR20030088645A (en) | Liquid crystal display panel having a black sealant | |
| GB2305765A (en) | Method of forming the black matrix of a liquid crystal display | |
| US20060121370A1 (en) | Color filter substrate for liquid crystal display device and method of fabricating the same | |
| CN100426015C (en) | Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof | |
| CN1431527A (en) | Method for manufacturing color filter by use of micro flow liquid | |
| CN1971366A (en) | Color filter substrate, liquid crystal display, and electronic device, and method for manufacturing color filter substrate and method for manufacturing liquid crystal display | |
| KR100642859B1 (en) | method for manufacturing color filter | |
| CN101493599A (en) | Colourful filtering substrate and method for manufacturing same | |
| JP2003161824A (en) | Color filter, overcoat forming method therefor and liquid crystal display element | |
| KR20070079645A (en) | Color filter substate and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: HONGCHUANG TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: HONGFUJIN PRECISION INDUSTRY (SHENZHEN) CO., LTD.; APPLICANT Effective date: 20070202 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20070202 Address after: Floor 24-1, No. 4 East Fourth Street, Hsinchu Science Industrial Park, Taiwan, Hsinchu Applicant after: Hongchuan Science & Technology Co., Ltd. Address before: 518109, No. two, No. tenth, East Ring Road, Pinus tabulaeformis Industrial Zone, Longhua Town, Baoan District, Guangdong, Shenzhen, 2 Applicant before: Hongfujin Precision Industry (Shenzhen) Co., Ltd. Co-applicant before: Hongchuan Science & Technology Co., Ltd. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: HONGHAI PRECISION INDUSTRY CO., LTD. Owner name: HONGFUJIN PRECISION INDUSTRY (SHENZHEN) CO., LTD. Free format text: FORMER OWNER: HONGCHUANG TECHNOLOGY CO., LTD. Effective date: 20100416 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 000000 HSINCHU,TAIWAN PROVINCE INDUSTRY HSINCHU INDUSTRY FLOOR 4,NO.24-1,SI ROAD TO: NO.2, EAST RING 2ND ROAD, YOUSONG 10TH INDUSTRY DISTRICT, LONGHUA TOWN, BAO AN DISTRICT, SHENZHEN CITY, GUANGDONG PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20100416 Address after: Guangdong province Shenzhen city Baoan District town Longhua tenth Industrial Zone tabulaeformis East Ring Road No. 2 two Co-patentee after: Hon Hai Precision Industry Co., Ltd. Patentee after: Hongfujin Precise Industry (Shenzhen) Co., Ltd. Address before: 000000, Hsinchu Science Industrial Park, Hsinchu Province, Taiwan Industrial Road, No. 24-1, 4 floor Patentee before: Hongchuan Science & Technology Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090819 Termination date: 20150617 |
|
| EXPY | Termination of patent right or utility model |