GB2305765A - Method of forming the black matrix of a liquid crystal display - Google Patents

Method of forming the black matrix of a liquid crystal display Download PDF

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Publication number
GB2305765A
GB2305765A GB9606607A GB9606607A GB2305765A GB 2305765 A GB2305765 A GB 2305765A GB 9606607 A GB9606607 A GB 9606607A GB 9606607 A GB9606607 A GB 9606607A GB 2305765 A GB2305765 A GB 2305765A
Authority
GB
United Kingdom
Prior art keywords
black matrix
crystal display
photoresist
liquid crystal
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB9606607A
Other versions
GB9606607D0 (en
Inventor
Jang-Hyuk Kwon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung SDI Co Ltd
Original Assignee
Samsung Display Devices Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Devices Co Ltd filed Critical Samsung Display Devices Co Ltd
Publication of GB9606607D0 publication Critical patent/GB9606607D0/en
Publication of GB2305765A publication Critical patent/GB2305765A/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/04—Materials and properties dye

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)

Description

2305765 METHOD FOR FORMING BLACK MATRIX OF LIQUID CRYSTAL DISPLAY DEVICE
is The present invention relates to a method for forming a black matrix of a liquid crystal display device, and, more particularly, to a method of forming a black matrix provided in a colour filter of a liquid crystal display device.
A conventional liquid crystal display device is composed of a lower substrate on which a thin-film transistor is formed and an upper substrate having thereon a colour filter layer of the three primary colours (red, green and blue). In FIG. 1, the structure of the upper substrate on which the colour filter is formed is shown in cross-section. The process of formation of the upper substrate can be described as follows.
Firstly, a black matrix 12 for shading the light is coated in a predetermined pattern on a substrate 11, e.g., a glass material. Next, a coloured photosensitive acrylic resin, in which a pigment having a red spectral characteristic is dispersed, is coated over the entire surface of the glass substrate. A red filter layer 13 is then formed through the process of light exposure, developing and baking. A green filter layer 14 and a blue filter layer 15 are formed in the same manner as red filter layer 13. Next, a protection film 16 is formed using a transparent resin having high surface hardness and 1 excellent light permeability, in order to protect black matrix 12 and filter layers 13, 14 and 15 from external impact. Thereafter, an ITO electrode film 17 for driving a liquid crystal is formed, thereby to complete the colour filter of the liquid crystal display device.
FIGS. 2A-2E illustrate schematically a method for f orming a pattern of a black matrix on a substrate in order to form the above colour filter for a liquid crystal display device. In FIG. 2A, a film 22 of chromium or chromium oxide (commonly used as the material of a black matrix) is coated on a substrate 21. The chromium film is here usually formed by a sputtering method. In FIG. 2B, a photoresist layer 23 is coated on the entire surface of chromium film 22. A predetermined pattern of photoresist 231 is shaped, as shown in FIG. 2C, through the processes of light exposure and developing. The structure shown in FIG. 2D is obtained by an etching process in which the chromium film of the portion on which the photoresist was removed is eroded through a developing step. Thereafter, when the photoresist is removed through a process of stripping, a predetermined pattern of black matrix can be obtained, as is indicated with reference number 221 in FIG. 2E.
The biggest problem in forming the black matrix using the above method is that chromium is a heavy metal. In other words, a liquid crystal display device employing a black matrix of a heavy metal leads to various operational problems of environmental pollution, ranging from 2 production problems to employment and waste disposal problems. A material which could be substituted in use in a black matrix in order to avoid these environmental pollution problems is a colour photoresist-type resin obtained by dispersing a black pigment in a polymer resin. However, if such a material is used, the thickness of it needs to be at least 1. Ogm to 1. 5gm in order to meet optical conditions. This means that a black matrix made of resin material would be much thicker than one made of metal, which leads to a deterioration in flatness when the three filters of red, blue and green are formed subsequently.
The present invention is contrived to solve the above problems. It is an object of the present invention to provide a novel method for forming a black matrix of a liquid crystal display device.
It is another object of the present invention to provide a method for forming a black matrix with a material which generates neither heavy metallic pollution nor problems in subsequent processing.
To accomplish the above objects, according to the present invention, there is provided a method of forming a black matrix of a liquid crystal display device comprising the steps of: coating a photoresist layer over the entire surface of a substrate; forming a predetermined pattern of photoresist which has an exposed portion and a portion covered with the photoresist over the substrate, through the operations of light exposure and developing; coating a layer of black matrix material over the entire surface of 3 substrate on which the predetermined pattern of photoresist is formed; and stripping the predetermined pattern of photoresist and the portion of black matrix material coated thereon in order to leave a predetermined pattern of black matrix on the substrate.
According to a preferred embodiment of the present invention, the stripping step is performed by spraying water under high pressure after putting substrate on which the pattern of photoresist and the layer of black matrix material are formed into a NaOH solution of about 0.5% to 3%.
According to a further preferred embodiment of the present invention, the photoresist coating step is performed by coating photoresist on the substrate to a thickness of about 0.3gm to 1.Ogm.
Preferably, the black matrix material coating step is performed by coating the black matrix material to a thickness of about 3,OOOA to 7, OOOA on the substrate.
Advantageously, the black matrix material is produced by dispersing graphite particles of lgm and below in a solvent.
Alternatively, and also advantageously, the black matrix material is produced by dispersing a polymer resin (e.g., acryl, epoxy, polyamide or polyvinyl alcohol), a dispersion, and a carbon black pigment or a mixture of RGB (red, green and blue) pigments in an organic solvent.
Specific embodiments of the present invention are described in detail below. by way of example, with 4 reference to the attached drawings, in which:
FIG. 1 is a schematic cross-sectional view illustrating a colour filter of a liquid crystal display device; FIGS. 2A-2E are cross-sectional views illustrating a method for forming a black matrix of a liquid crystal display device in the prior art; and
FIGS. 3A-3E are cross-sectional views illustrating a method for forming a black matrix of a liquid crystal display device according to an embodiment of the present invention.
As a material for a black matrix to replace the metallic material used in the prior art, graphite may be used in embodiments of the present invention. For this, the graphite is pulverized, and filtered, and only particles of lgm and below are used. The filtered particles are dispersed in water or other solvents.
Alternatively, a mixture of a polymer resin (e.g., acryl, epoxy. polyamide and polyvinyl alcohol), a dispersion and a black pigment (e.g., carbon black or a mixture of RGB pigments) may be used as the material of the black matrix, which is obtained by dispersing these components in an organic solvent.
A method for forming a black matrix by using the above materials is shown in FIGS. 3A-3E. FIG. 3A shows a substrate 31. A photoresist layer 32 is coated over substrate 31 as shown in FIG. 3B. It is preferable that photoresist layer 32 is formed by a spin coating method, to a thickness of about 0.3gm to 1.Ogm.
FIG. 3C illustrates a predetermined pattern of photoresist 320 obtained by exposing to light and developing photoresist layer 32. The above two processes can be performed by a conventional method. After the development, the photoresist layer 32 is partially removed as shown in FIG. 3C, whereby an exposed portion and a portion covered with photoresist 32 are formed over substrate 31.
Referring to FIG. 3D, a layer of black matrix 33 is formed by spincoating a material of a black matrix over the predetermined pattern of photoresist 321. As described above, the black matrix material may be a material based on graphite or on polymer resin. It is preferable that the thickness of the layer of black matrix 33 is about 3,OOOA to 7,OOOA. After that, a process of prebaking is performed by heating the substrate 31 at about 800C to 1100C to evaporate solvent.
Next, a stripping process is performed to completely remove the pattern of photoresist 321 from substrate 31. The stripping is performed by spraying water under high pressure, after putting substrate 31 covered with the pattern of photoresist 320 and the layer of black matrix 33 into a NaOH solution of about 0.5% to 3%. Since the photoresist material is easily soluble in NaOH solution, and the black matrix material is strongly adhesive to the substrate, the pattern of photoresist 32f, and a portion of black matrix material covering the pattern of photoresist 6 320, are easily removed through the stripping operation. As a result, a predetermined pattern of black matrix 331 is completed on substrate 31, as shown in FIG. 3E. with a thickness of about 3,OOOA to 7,oooA and a width of about 1Ogm to 30gm.
The black matrix formed on the basis of use of graphite or a polymer resin according to embodiments of the present invention compares with that formed on the basis of use of chromium in the prior art. The optical densities of these materials are nearly similar to each other, given the same thickness of material (i.e., 3,oooA to 7,oooA). Also, so far as reflection is concerned, the black matrix of embodiments of the present invention exhibits an optical characteristic of low reflection, while the metallic black matrix of the prior art has that of high reflection. Taking into account the consideration of environmental pollution problems, the black matrix resulting according to embodiments of the present invention is very effective.
7

Claims (9)

CLAIMS:
1. A method f or f orming a black matrix of a liquid crystal display device, comprising the steps of:
coating a photoresist layer over the entire surf ace of a substrate; f orming over said substrate a predetermined pattern of photoresist which has an exposed portion and a portion covered with said photoresist, through the operations of light exposure and developing; coating a layer of black matrix material over the entire surface of substrate on which said predetermined pattern of photoresist is formed; and stripping said predetermined pattern of photoresist and the portion of black matrix material coated thereon, in order to leave a black matrix in a predetermined pattern on the substrate.
2. A method for forming a black matrix of a liquid crystal display device as claimed in claim 1, wherein said stripping step is performed by spraying water under high pressure after putting the substrate on which said pattern of photoresist and the layer of black matrix material are formed into a NaOH solution of about 0.5% to 3%.
3. A method for forming a black matrix of a liquid crystal display device as claimed in claim 1 or claim 2, wherein said photoresist coating step is performed by coating photoresist on said substrate to a thickness of about 0.3gm to 1.Ogm.
4. A method for forming a black matrix of a liquid 8 is crystal display device as claimed in any preceding claim, wherein said black matrix material coating step is performed by coating said black matrix material to a thickness of about 3,OOOA to 7,OooA on said substrate.
5. A method for forming a black matrix of a liquid crystal display device as claimed in any preceding claim, wherein said black matrix material is produced by dispersing graphite particles of Igm and below in a solvent.
6. A method for forming a black matrix of a liquid crystal display device as claimed in any of claims 1 to 4, wherein said black matrix material is produced by dispersing in an organic solvent a polymer resin selected from the group consisting of acryl, epoxy, polyamide or polyvinyl alcohol, a dispersion, and a carbon black pigment or a mixture of red, green and blue (RGB) pigments.
7. A method for forming a black matrix of a liquid crystal display device substantially as herein described with reference to Figures 3A to 3E.
8. A black matrix of a liquid crystal display device as formed by the method of any of claims 1 to 7.
9. A liquid crystal display device comprising a black matrix as claimed in claim 8.
9
GB9606607A 1995-09-30 1996-03-29 Method of forming the black matrix of a liquid crystal display Withdrawn GB2305765A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950033988A KR970016690A (en) 1995-09-30 1995-09-30 Method of forming black matrix of liquid crystal display

Publications (2)

Publication Number Publication Date
GB9606607D0 GB9606607D0 (en) 1996-06-05
GB2305765A true GB2305765A (en) 1997-04-16

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JP (1) JPH0996807A (en)
KR (1) KR970016690A (en)
DE (1) DE19612956A1 (en)
GB (1) GB2305765A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8669026B2 (en) 2009-01-19 2014-03-11 Basf Se Black matrix for colour filters
US9217070B2 (en) 2012-06-01 2015-12-22 Basf Se Black colorant mixture
CN113436548A (en) * 2021-06-23 2021-09-24 南方科技大学 Preparation method of black matrix

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5885669A (en) * 1997-08-08 1999-03-23 Acheson Industries, Inc. Liquid crystal device and method
KR100866202B1 (en) * 2002-06-18 2008-10-30 오리온오엘이디 주식회사 Organic Electroluminescence Device Using Diamond Like Carbon and Manufacturing Method thereof
JP5137418B2 (en) * 2006-03-10 2013-02-06 株式会社半導体エネルギー研究所 Semiconductor device
US8053816B2 (en) 2006-03-10 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR101291893B1 (en) * 2006-11-24 2013-07-31 엘지디스플레이 주식회사 Liquid Crystal Display Panel and Method For Fabricating Thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63144305A (en) * 1986-12-08 1988-06-16 Seiko Instr & Electronics Ltd Manufacture of multicolor display device
US5120623A (en) * 1989-12-08 1992-06-09 Nokia Unterhaltungselektronik Gmbh Method of producing a substrate plate for a liquid crystal cell with black matrix areas
EP0627663A1 (en) * 1993-05-28 1994-12-07 Nippon Oil Co. Ltd. Substrate having light-shielding layer, method for forming same and liquid crystal display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63144305A (en) * 1986-12-08 1988-06-16 Seiko Instr & Electronics Ltd Manufacture of multicolor display device
US5120623A (en) * 1989-12-08 1992-06-09 Nokia Unterhaltungselektronik Gmbh Method of producing a substrate plate for a liquid crystal cell with black matrix areas
EP0627663A1 (en) * 1993-05-28 1994-12-07 Nippon Oil Co. Ltd. Substrate having light-shielding layer, method for forming same and liquid crystal display device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Patent Abstracts of Japan Section P:P-777 Vol. 12 no. 4 & JP 63 144 305 A *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8669026B2 (en) 2009-01-19 2014-03-11 Basf Se Black matrix for colour filters
US9217070B2 (en) 2012-06-01 2015-12-22 Basf Se Black colorant mixture
CN113436548A (en) * 2021-06-23 2021-09-24 南方科技大学 Preparation method of black matrix
CN113436548B (en) * 2021-06-23 2024-01-30 南方科技大学 Preparation method of black matrix

Also Published As

Publication number Publication date
DE19612956A1 (en) 1997-04-03
JPH0996807A (en) 1997-04-08
KR970016690A (en) 1997-04-28
GB9606607D0 (en) 1996-06-05

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