KR970016690A - Method of forming black matrix of liquid crystal display - Google Patents

Method of forming black matrix of liquid crystal display Download PDF

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Publication number
KR970016690A
KR970016690A KR1019950033988A KR19950033988A KR970016690A KR 970016690 A KR970016690 A KR 970016690A KR 1019950033988 A KR1019950033988 A KR 1019950033988A KR 19950033988 A KR19950033988 A KR 19950033988A KR 970016690 A KR970016690 A KR 970016690A
Authority
KR
South Korea
Prior art keywords
black matrix
photoresist
substrate
matrix material
liquid crystal
Prior art date
Application number
KR1019950033988A
Other languages
Korean (ko)
Inventor
권장혁
Original Assignee
윤종용
삼성전관 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윤종용, 삼성전관 주식회사 filed Critical 윤종용
Priority to KR1019950033988A priority Critical patent/KR970016690A/en
Priority to GB9606607A priority patent/GB2305765A/en
Priority to DE19612956A priority patent/DE19612956A1/en
Priority to JP11636396A priority patent/JPH0996807A/en
Publication of KR970016690A publication Critical patent/KR970016690A/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/04—Materials and properties dye

Abstract

본 발명에 따르면, 기판(31)의 전면에 걸쳐 포토레지스터(32)를 적층하는 포토레지스터 도포 단계, 노광 및 현상 과정을 통해 상기 기판(31)이 포토레지스터(32)로 적층된 부분과 노출된 부분으로 구분 형성되도록 하는 포토레지스터의 패턴 형성 단계, 상기 소정 패턴의 포토레지스터가 형성된 기판(31)의 전면에 걸쳐 블랙 매트릭스 재료(33)를 적층하는 블랙 매트릭스 도포 단계 및 사익 포토레지스터의 패턴 형성 단계에서 상기 기판(31)의 노출된 부분에 적층된 블랙 매트릭스 재료(33)만이 상기 기판(31) 위에 잔류하도록, 상기 소정 패턴의 포토레지스터(31)와 그 상부에 적층된 블랙 매트릭스 재료(33)를 제거하는 스트리핑 단계를 구비하는 액정 표시 장치의 블랙 매트릭스 형성 방법이 제공된다. 본 발명에 따라 형성된 블랙 매트릭스는 종래의 크롬 블랙 매트릭스와 거의 동일한 성능을 발휘하면서도 환경을 오염시키지 않는 장점이 있다.According to the present invention, through the photoresist coating step, the exposure and the development process of stacking the photoresist 32 over the entire surface of the substrate 31, the substrate 31 is exposed to the portion laminated with the photoresist 32 The pattern forming step of the photoresist to be divided into parts, the black matrix coating step of laminating the black matrix material 33 over the entire surface of the substrate 31 on which the photoresist of the predetermined pattern is formed and the pattern forming step of the saik photoresistor The photoresist 31 of the predetermined pattern and the black matrix material 33 stacked thereon such that only the black matrix material 33 stacked on the exposed portion of the substrate 31 remains on the substrate 31 in FIG. Provided is a method of forming a black matrix of a liquid crystal display device having a stripping step of removing. The black matrix formed in accordance with the present invention has the advantage of exhibiting almost the same performance as the conventional chromium black matrix and not polluting the environment.

Description

액정표시장치의 블랙 매트릭스 형성 방법Method of forming black matrix of liquid crystal display

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 3(가)도 내지 제 3(마)도는 본 발명에 따른 액정표시장치의 블랙 매트릭스 형성 방법으 도시하는 단면도.3 (a) to 3 (e) are cross-sectional views showing a black matrix forming method of a liquid crystal display device according to the present invention.

Claims (6)

기판(3)의 전면에 걸쳐 포토레지스터(32)를 적층하는 포토레지스터 도포 단계, 노광 및 현상 과정을 통해 상기 기판(31)이 포토레지스터(32)로 적층된 부분과 노출된 부분으로 구분 형성되도록 하는 포토레지스터의 패턴 형성 단계, 상기 소정 패턴의 포토레지스터가 형성된 기판(31)의 전면에 걸쳐 블랙 매트릭스 재료(33)를 적층하는 블랙 매트릭스 도포 단계 및 상기 포토레지스터의 패턴 형성 단계에서 상기 기판(31)의 노출된 부분에 적층된 블랙 매트릭스 재료(33)만이 상기 기판(31) 위에 잔류하도록, 상기 소정 패턴의 포토레지스터(31)와 그 상부에 적층된 블랙 매트릭스 재료(33)를 제거하는 스트리핑 단계를 구비하는 액정표시장치의 블랙 매트릭스 형성 방법.Through the photoresist application step, the exposure and the development process of stacking the photoresist 32 over the entire surface of the substrate 3, the substrate 31 is formed into a portion laminated with the photoresist 32 and an exposed portion. The substrate 31 in the pattern forming step of the photoresist, the black matrix applying step of laminating the black matrix material 33 over the entire surface of the substrate 31 on which the photoresist of the predetermined pattern is formed, and the pattern forming step of the photoresist. Stripping step of removing the photoresist 31 of the predetermined pattern and the black matrix material 33 stacked thereon such that only the black matrix material 33 stacked on the exposed portion of the substrate remains on the substrate 31. The black matrix forming method of the liquid crystal display device provided with. 제 1항에 있어서, 상기 스트리핑 단계는 포토레지스터(32)와 블랙 매트릭스 재료(33)가 도포된 기판(31)을 약 0.5 내지 3%의 수산화나트륨(NaOH) 용액에 담근 후에 고압으로 물을 분사함으로써 이루어지는 것을 특징으로 하는 액정표시장치의 블랙 매트릭스 형성 방법.The method of claim 1, wherein the stripping is performed by immersing the substrate 31 coated with the photoresist 32 and the black matrix material 33 in about 0.5 to 3% of sodium hydroxide (NaOH) solution and then spraying water at a high pressure. The black matrix forming method of the liquid crystal display device characterized by the above-mentioned. 제 1항에 있어서, 상기 포토레지스터 도포 단계는 기판(31) 위에 포토레지스터(32)를 약 0.3 내지 1.0 마이크로미터의 두께로 도포하는 것을 특징으로 하는 액정표시장치의 블랙 매트릭스 형성 방법.The method of claim 1, wherein the photoresist coating step comprises applying a photoresist (32) on the substrate (31) to a thickness of about 0.3 to 1.0 micrometers. 제 1항에 있어서, 상기 블랙 매트릭스 도포 단계는 블랙 매트릭스 재료를 약 3000 내지 7000 옴스트롬의 두께로 도포하는 것을 특징으로 하는 액정표시장치의 블랙 매트릭스 형성 방법.The method of claim 1, wherein the applying the black matrix comprises applying a black matrix material to a thickness of about 3000 to 7000 angstroms. 제 1항 내지 4항의 어느 한 항에 있어서, 상기 블랙 매트릭스 재료(33)는 1마이크로미터 이하의 흑연 입자를 용매에 분산시킨 것을 특징으로 하는 액정표시장치의 블랙 매트릭스 형성 방법.5. The method of forming a black matrix of a liquid crystal display device according to any one of claims 1 to 4, wherein the black matrix material (33) is made by dispersing graphite particles of 1 micrometer or less in a solvent. 제 1항 내지 제 4항의 어느 한 항에 있어서, 상기 블랙 매트릭스 재료(33)는 아크릴, 에폭시, 폴리아미드 또는 폴리비닐알코올과 같은 고분자 수지와, 분산제와, 카본블랙 안료 또는 혼합 안료와 같은 안료를 유기 용매에 분산시킨 것을 특징으로 하는 액정표시장치의 블랙 매트릭스 형성 방법.The black matrix material (33) according to any one of claims 1 to 4, wherein the black matrix material (33) comprises a polymer resin such as acrylic, epoxy, polyamide or polyvinyl alcohol, a dispersant, and a pigment such as a carbon black pigment or a mixed pigment. A black matrix forming method of a liquid crystal display device, which is dispersed in an organic solvent. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950033988A 1995-09-30 1995-09-30 Method of forming black matrix of liquid crystal display KR970016690A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019950033988A KR970016690A (en) 1995-09-30 1995-09-30 Method of forming black matrix of liquid crystal display
GB9606607A GB2305765A (en) 1995-09-30 1996-03-29 Method of forming the black matrix of a liquid crystal display
DE19612956A DE19612956A1 (en) 1995-09-30 1996-04-01 Method for forming a black matrix of a liquid crystal display device
JP11636396A JPH0996807A (en) 1995-09-30 1996-05-10 Formation of black matrix of liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950033988A KR970016690A (en) 1995-09-30 1995-09-30 Method of forming black matrix of liquid crystal display

Publications (1)

Publication Number Publication Date
KR970016690A true KR970016690A (en) 1997-04-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950033988A KR970016690A (en) 1995-09-30 1995-09-30 Method of forming black matrix of liquid crystal display

Country Status (4)

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JP (1) JPH0996807A (en)
KR (1) KR970016690A (en)
DE (1) DE19612956A1 (en)
GB (1) GB2305765A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100866202B1 (en) * 2002-06-18 2008-10-30 오리온오엘이디 주식회사 Organic Electroluminescence Device Using Diamond Like Carbon and Manufacturing Method thereof

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5885669A (en) * 1997-08-08 1999-03-23 Acheson Industries, Inc. Liquid crystal device and method
US8053816B2 (en) 2006-03-10 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5137418B2 (en) * 2006-03-10 2013-02-06 株式会社半導体エネルギー研究所 Semiconductor device
KR101291893B1 (en) * 2006-11-24 2013-07-31 엘지디스플레이 주식회사 Liquid Crystal Display Panel and Method For Fabricating Thereof
WO2010081624A1 (en) 2009-01-19 2010-07-22 Basf Se Black matrix for colour filters
JP6157602B2 (en) 2012-06-01 2017-07-05 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Black colorant mixture
CN113436548B (en) * 2021-06-23 2024-01-30 南方科技大学 Preparation method of black matrix

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JPS63144305A (en) * 1986-12-08 1988-06-16 Seiko Instr & Electronics Ltd Manufacture of multicolor display device
DE3940640A1 (en) * 1989-12-08 1991-06-20 Nokia Unterhaltungselektronik METHOD FOR PRODUCING A SUBSTRATE PLATE FOR A LIQUID CRYSTAL CELL WITH BLACK MATRIX AREAS
JPH0743522A (en) * 1993-05-28 1995-02-14 Nippon Oil Co Ltd Method for forming, substrate having light-shading layer, substrate having light-shading layer, counter electrode substrate for black-and-white display thin film transistor(tft) array substrate, and black-and-white liquid crystal display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100866202B1 (en) * 2002-06-18 2008-10-30 오리온오엘이디 주식회사 Organic Electroluminescence Device Using Diamond Like Carbon and Manufacturing Method thereof

Also Published As

Publication number Publication date
DE19612956A1 (en) 1997-04-03
GB2305765A (en) 1997-04-16
GB9606607D0 (en) 1996-06-05
JPH0996807A (en) 1997-04-08

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