CN100447591C

CN100447591C - Color filter substrate and manufacture method therefor

Info

Publication number: CN100447591C
Application number: CNB200710004376XA
Authority: CN
Inventors: 林惠芬; 李淑琴
Original assignee: AU Optronics Corp
Current assignee: AU Optronics Corp
Priority date: 2007-01-24
Filing date: 2007-01-24
Publication date: 2008-12-31
Anticipated expiration: 2027-01-24
Also published as: CN101008686A

Abstract

This invention provides one color filter base board and its form method, wherein, the color filter base board comprises base board, multiple filter slices and multiple block walls, wherein, the block wall isolates filter slice and the block wall side and base board angle is between 60 to 90 degrees; the above block wall can avoid color mixture problem to improve LCD panel resolution rate.

Description

The formation method of colored filter substrate

Technical field

The present invention is relevant for a kind of colored filter substrate,, be a kind of colored filter substrate and forming method thereof (ColorFilter Substrate and Method for Manufacturing the Same) concretely particularly relevant for the barricade of avoiding material to pollute mutually on this substrate.

Background technology

(Liquid Crystal Display, structure LCD) generally is located between plurality of groups of substrates of thin-film transistor and the colored filter substrate by liquid crystal layer LCD.The making of colored filter is on glass substrate, with the organic material of Red Green Blue, is produced within each pixel.Colored filter is cost soprano in the LCD key part and component.14.1 inches panels using with mobile computer are example, and colored filter accounts for about 28% of all material cost, are higher than the cost of backlight module (18%) and drive IC (17%).

The formation method of colored filter coloured part has dye method, pigment dispersing method, print process, strike, ink-jet method.Based on the pigment dispersing method, the first step is that evengranular micro pigment (R, G, B three looks) is dispersed in the transparent feel photopolymer resin at present.Use methods such as coating, exposure, development then, form R, G, B trichromatic diagram case successively.In order to prevent light leak, generally all to add black matrix" (BM) at RGB three look intersections.Manyly in the past form single-layer metal chromium film, now also have and use the compound BM film of crome metal and chromium oxide or the resin type BM of mixed with resin carbon instead with sputtering method.In addition, also need on BM, make layer protecting film and formation IT0 electrode.Because colored filter substrate constitutes liquid crystal cell with the TFT substrate, two substrates must be aimed at each other, makes the pixel region of colored filter corresponding with the pixel region of TFT substrate.It should be noted that this kind manufacturing process needs expensive colored photoresist, and lithographic fabrication processes utmost point consumption worker is consuming time, will significantly improve the cost of manufacture of colored filter substrate, improves the cost of manufacture of LCD simultaneously.

United States Patent (USP) the 5th, 340 discloses a kind of formation method of colored filter substrate No. 619.At first form a black-matrix layer after on the substrate, divest black-matrix layer partly, and spin coating material of the same colour fills up and divests the district with laser.Then harden behind the look material, remove the look material that divests outside the district with electricity slurry manufacturing process or laser manufacturing process.Repeat that laser divests, spin coating look material, sclerosis and remove unnecessary steps such as look material and can form colored filter substrate.It is evident that this kind practice will expend a large amount of look materials.And the look material of spin coating must be with extra evenization manufacturing process to avoid the mutual pollution problems of look material.

Figure 1A-Fig. 1 F solves the problem of the look material cost of dispersed color method with ink-jet method.At first shown in Figure 1A, on substrate 10, form the barricade layer 12 of a sensitization as black-matrix layer.Then shown in Figure 1B-Fig. 1 C, utilize light shield 11 to carry out lithographic fabrication processes exposure and development barricade layer 12, define a plurality of barricades 14.Angle theta that it should be noted that barricade 14 its sidewalls that the technology of present major part is produced and substrate 10 is less than 60 degree.Then shown in Fig. 1 D, make barricade 14 its sidewalls be close look wood property with the surface treatment manufacturing process, its upper surface is dredges the look wood property.Then shown in Fig. 1 E-Fig. 1 F, insert ink 16 with look material shower nozzle 17 in the different intervals that divests, hard roasting back forms colored filter 19, promptly finishes colored filter substrate 18.Shown in Fig. 1 G, when the mutual colour mixture of look material 16, just the quality of colored filter substrate 18 can reduce.

Summary of the invention

The present invention makes the problem that colored filter substrate causes the colorant colour mixture for solving ink-jet method, and a kind of formation method of colored filter substrate is provided especially, comprises substrate is provided; Form the barricade layer on substrate; The barricade layer is divested manufacturing process, and to form a plurality of district and a plurality of barricades of divesting, wherein barricade is separated and to be divested the district, and the described manufacturing process that divests comprises a solid-state laser or an excimer laser are provided; Carry out the surface treatment manufacturing process, make the upper surface of barricade be thin look wood property; Fill manufacturing process, material of the same colour is at least inserted respectively divested the district; And roasting firmly look material.

The present invention also provides a kind of colored filter substrate, comprises substrate; A plurality of optical filters; And a plurality of barricades; Wherein these barricades are separated described optical filter, and the angle of the sidewall of barricade and substrate is between 60 degree are spent to 90.

Barricade can effectively be avoided the problem of look material colour mixture, and improves the LCD panel resolution rate.

Description of drawings

Figure 1A to Fig. 1 G represents the manufacturing process sectional view of the colored filter substrate of prior art; And

Fig. 2 A to Fig. 2 E represents the manufacturing process sectional view of the colored filter substrate of preferred embodiment of the present invention.

The primary clustering symbol description:

10,20～substrate; 11,21～light shield;

12,22～barricade layer; 14,24～barricade;

15,25～divest the district; 16,26～look material;

17,27～look material shower nozzle; 18,28～colored filter substrate;

19,29～colored filter; The sidewall of θ, θ '～barricade and the angle between substrate.

Embodiment

Shown in Fig. 2 A, the invention provides a barricade layer 22 on a substrate 20.Substrate 20 for example can be pliability transparent material such as plastics, or inflexible transparent material such as glass or quartz.Barricade layer 22 also can be black-matrix layer, divests manufacturing process because the present invention uses, and therefore can adopt photosensitive material or non-photosensitive material according to circumstances.Photosensitive material for example is solvent-laden liquid photoresist, liquid resin, dry film photoresist or transfer membrane photoresist, as has acryl resin (Acrylic), epoxy resin (Epoxy resin) or the polyimide resin (PI) of sensitization base.In order to reduce the penetrability of photosensitive material, but hybrid pigment, dyestuff or carbon black (carbon black).Non-photosensitive material can be acryl resin (Acrylic), epoxy resin (Epoxy resin) or polyimide resin (PI), but the same hybrid pigment, dyestuff or carbon black (carbon black).Because the resin that non-photosensitive material adopts need not possess the sensitization base, can reduce cost.In addition, non-photosensitive material also comprises metal material such as chromium or metal oxide materials such as chromium oxide.If the photosensitive material that adopts wet type is as barricade layer 22, the preferable hard baking fabrication technique that carries out earlier before divesting manufacturing process is to remove the contained solvent of photosensitive material.Preferable hard roasting temperature is between about 150 ℃ to 250 ℃, goodly is about 220 ℃.

Shown in Fig. 2 B, then utilize light shield 21 divest manufacturing process with the definition barricade 24, and by barricade 24 separate divest the district 25.If adopt lithographic fabrication processes definition barricade 24, the then previous barricade layer 22 that forms is necessary for photosensitive material.If adopt laser manufacturing process such as solid-state laser or excimer laser definition barricade 24, then can adopt the cheaper non-photosensitive material of price.The laser manufacturing process can directly write or adopt light shield with definition barricade 24 according to circumstances.This divests the angle theta of barricade 24 its sidewalls that manufacturing process forms and substrate 20 ' approximately between 60 degree are spent to 90.Its sidewall of barricade that the general using lithographic fabrication processes forms and substrate angle can't be greater than 60 degree, because x-ray diffraction makes the exposure of the exposure on barricade layer 22 surface greater than barricade layer bottom.Barricade layer 24 thickness that above-mentioned manufacturing process forms are between about 0.5 micron to 5.0 microns.

Shown in Fig. 2 C, then carry out a surface treatment manufacturing process such as electricity slurry surface treatment manufacturing process and make the upper surface of barricade 24 be thin look wood property, its sidewall is close look wood property.When the look material was water wettability (water-based), then need select suitable surface treatment manufacturing process to make the sidewall of barricade 24 was water wettability, and upper surface is a hydrophobicity.If when the look material was hydrophobicity (oiliness), then need adopt another kind of surface treatment manufacturing process to make the sidewall of barricade 24 was hydrophobicity, upper surface is a water wettability.

Shown in Fig. 2 D, then insert look material 26 in divesting district 25.It should be noted that this step can single look material shower nozzle 27 be inserted look material 26 in regular turn divests district 25, also can a plurality of look material shower nozzles (not icon) look material 26 be inserted the different districts 25 that divest simultaneously.The look material can be red ink, blue ink, green ink or cyan, and its character can be water wettability or hydrophobicity.Because the angle of the sidewall of barricade 24 and substrate 20 is between 60 degree and 90 are spent, upper surface still has certain width and unlikelyly dwindles even disappear behind reduced size, can avoid the problem of look material colour mixture.

Shown in Fig. 2 E, carry out a hard baking fabrication technique sclerosis look material 26 at last to form colored filter 29, to finish colored filter substrate 28.Preferable hard roasting temperature is between about 150 ℃ to 250 ℃, goodly is about 220 ℃.The color of colored filter 29 is decided on look material 26, can be red, blue, green or cyan.

Because barricade layer 24 of the present invention still has the upper surface of broad and avoids the problem of look material colour mixture after size is dwindled, be suitable for the High Resolution LCD panel.

Though the present invention discloses as above with several preferred embodiments; right its is not in order to limit the present invention; have in the technical field under any and know the knowledgeable usually; without departing from the spirit and scope of the present invention; when can change arbitrarily with the retouching, so protection scope of the present invention when with claim the person of being defined be as the criterion.

Claims

1. the formation method of a colored filter substrate said method comprising the steps of:

One substrate is provided;

Form a barricade layer on described substrate;

Described barricade layer is carried out one divest manufacturing process, to form a plurality of district and a plurality of barricades of divesting, wherein said barricade is separated the described district that divests, and the described manufacturing process that divests comprises a solid-state laser or an excimer laser are provided;

Carry out a surface treatment manufacturing process, make the upper surface of described barricade be thin look wood property;

Carry out one and fill manufacturing process, material of the same colour is at least inserted the described district that divests respectively; And

Hard roasting described look material,

Wherein, the angle of described barricade and described substrate is between 60 degree and 90 degree.

2. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, carries out the described manufacturing process that divests and also comprises use one light shield.

3. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, described surface treatment manufacturing process comprises an electricity slurry surface treatment manufacturing process.

4. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, described filling manufacturing process comprises ink-jet filling manufacturing process.

5. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, described look material is water wettability or hydrophobicity.

6. the formation method of colored filter substrate as claimed in claim 1, it is characterized in that described barricade layer comprises solvent-laden liquid photoresist, liquid resin, dry film photoresist, transfer membrane photoresist, the acryl resin with sensitization base, epoxy resin, polyimide resin, pigment, dyestuff, carbon black, metal oxide or metal.

7. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, described method also is included in described divesting and described barricade layer is carried out a hard baking fabrication technique before the manufacturing process.

8. the formation method of colored filter substrate as claimed in claim 7 is characterized in that, the temperature of described barricade layer being carried out hard baking fabrication technique is between 150 ℃ to 250 ℃.

9. the formation method of colored filter substrate as claimed in claim 7 is characterized in that, the temperature of described barricade layer being carried out hard baking fabrication technique is 220 ℃.

10. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, the sidewall of described barricade is close look wood property.

11. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, the thickness of described barricade is 0.5 micron to 5.0 microns.

12. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, the temperature of roasting firmly described look material is between 150 ℃ to 250 ℃.

13. the formation method of colored filter substrate as claimed in claim 1 is characterized in that, the temperature of roasting firmly described look material is 220 ℃.