CN1959449A - Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display - Google Patents
Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display Download PDFInfo
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- CN1959449A CN1959449A CN 200610127593 CN200610127593A CN1959449A CN 1959449 A CN1959449 A CN 1959449A CN 200610127593 CN200610127593 CN 200610127593 CN 200610127593 A CN200610127593 A CN 200610127593A CN 1959449 A CN1959449 A CN 1959449A
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- element matrix
- pixel wells
- laser ablation
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Abstract
Apparatus and methods are provided for forming a pixel matrix. The methods include coating a substrate with a pixel matrix material, coating the pixel matrix material with an ink-phobic material, and forming pixel wells in the pixel matrix material and the ink-phobic material. A system for forming a pixel matrix is provided that includes a patterning tool including a laser ablation system operable to form pixel wells in pixel matrix material coated with ink-phobic material. The laser ablation system is operable to form pixel wells in pixel matrix material coated with ink-phobic material in an oxygenated environment so that the sidewalls of the pixel matrix are made to be ink-philic. The invention also includes a pixel well structure in which the top surfaces of the pixel well is ink-phobic and the surfaces of the sidewalls are ink-philic. Numerous other aspects are provided.
Description
Technical field
The present invention relates in general to and is used for the ink jet printing that flat-panel monitor is made, and relates more specifically to be used for forming on substrate the equipment and the method for picture element matrix.
Background technology
Flat panel display industry has attempted to adopt ink jet printing to make display device, especially makes the colored filter that is used for flat-panel monitor.Because the pixel wells that deposit of ink arrives wherein when printing is used for the pattern of colored filter can be especially little, so it is very big to produce the possibility of defective.Thereby, need comprise the improved method and apparatus of improved pixel matrix structure, with help accurately with stable and consistent ground with deposit of ink in pixel wells.
Summary of the invention
Aspect some, provide a kind of picture element matrix that comprises a plurality of pixel wells of the present invention, each pixel wells comprises end face and side wall surface, and wherein end face is the ink-resistant water-based, and side wall surface is ink-receptive water-based.
In others of the present invention, a kind of system that is used to form picture element matrix is provided, it comprises the patterned tool that comprises laser ablation system, it operationally forms pixel wells in being coated with the picture element matrix material of ink-resistant water-based material.Laser ablation system operationally forms pixel wells in the picture element matrix material that is being coated with the ink-resistant water-based material under the oxygen containing environment, make the sidewall of picture element matrix make ink-receptive water-based.
In another aspect of this invention, a kind of method that forms picture element matrix is provided, it comprises that the part of each pearl picture element matrix material of laser ablation is to form the vertical side wall by deposit a plurality of pearl picture element matrix materials and the printed pixels matrix with matrix pattern on substrate.
In another aspect of this invention, provide a kind of method that forms picture element matrix, it comprises with picture element matrix coated materials substrate, applies the picture element matrix material with the ink-resistant water-based material, forms pixel wells in picture element matrix material and ink-resistant water-based material.
From the following detailed description, claim and accompanying drawing, it is obvious that further feature of the present invention and aspect will become.
Description of drawings
Fig. 1 is that the wettable drop that has various degree on substrate is described;
Fig. 2 is the description of sealing cut-open view with pixel wells of the ink on the end face that is deposited on the picture element matrix material:
Fig. 3 and Fig. 4 A to Fig. 4 C describe according to the sealing cut-open view of the pixel wells of the embodiment of the invention;
Fig. 5 A and Fig. 5 B describe according to the vertical view of the substrate of the first step processing of illustrative methods of the present invention and sectional side view signal;
Fig. 6 A and 6B describe according to the vertical view of the substrate of second step process of illustrative methods of the present invention and sectional side view signal;
Fig. 7 A and Fig. 7 B describe according to the vertical view of the substrate of the third step processing of illustrative methods of the present invention and sectional side view signal;
Fig. 8 is the process flow diagram of describing according to the illustrative methods of some embodiments of the present invention;
Fig. 9 and Figure 10 are the schematic sectional views of two exemplary embodiments of patterned tool according to the present invention.
Embodiment
The invention provides permission forms picture element matrix on substrate system, method and apparatus, wherein (for example, black matrix material) end face is the ink-resistant water-based to the picture element matrix material, and the side wall surface of picture element matrix material is ink-receptive water-based.This new structure causes improvedly (for example being used for flat-panel monitor, LCD, OLED etc.) colored filter, this is will be tending towards flowing in the pixel wells because of any ink on the picture element matrix material end face that is deposited on the ink-resistant water-based inadvertently, and the ink in pixel wells can not be tending towards from the pixel wells side wall surface of ink-receptive water-based forming the liquid pearl, is such under whole situations with the picture element matrix of ink-resistant water-based material manufacturing yet.New structure is realized by the ink-receptive aqueous layer that forms the ink-resistant aqueous coating at the top of solid, forms the picture element matrix material on substrate.Laser ablation system is used in the aerobic environment directly the picture element matrix outside the solid layer of the coating of picture element matrix material is carried out patterning.Laser ablation in aerobic environment causes the picture element matrix material on established pixel wells sidewall to be burnt, and this makes sidewall have more ink-receptive water-based, and the end face of matrix is because the ink-resistant aqueous coating still keeps the ink-resistant water-based.
Can have the characteristic of inhaling mutually or repelling this liquid with the material of liquid contact.The chemical decision of the component of material, its corresponding surface chemistry and liquid and the interaction of liquid.This phenomenon is called as the water wettability ink-receptive water-based of liquid ink (for example, for) and hydrophobicity the ink-resistant water-based of liquid ink (for example, for).
Water wettability also is called as affinity, is the material behavior that shows the affinity of liquid.The literally meaning of affinity " liked liquid ", and such material is easy to absorb liquid.Form liquid film or coating after these materials of surface chemistry permission are wetted in its surface.Hydrophilic material also has higher surface tension value, and has the ability that forms the chemical combination key with liquid.
Hydrophobicity also is called " hydrophobic nature ", and the material with this specific character is compared with hydrophilic material, has the response opposite with the interaction of liquid.Hydrophobic material (" probably fluent material ") has less absorption liquid trend or does not absorb the trend of liquid, and liquid is tending towards on its surface formation liquid pearl (for example, forming discrete droplet).Hydrophobic material has low surface tension value, and lacks the reactive group that is used to form with the chemical combination key of liquid in its surface chemistry.
Wettable is meant the surface property characteristic of material.Can utilize the surface tension value of material to determine that material is by the wettable of particular fluid.By measuring the contact angle θ between solid surface and this lip-deep droplet, can calculate the surface tension of solid material.
Surface tension is meant to contact with each other the molecule force unbalance that takes place when forming interface or border and the power that causes owing to work as two different materials (for example, the droplet on the solid surface) a kind of.This power be owing to all materials in order to reduce the trend of its surface area in response to the molecule force unbalance that takes place at its contact point place.The result of this power will change the contact angle between this regulation wettable and drop and the surface at the liquid of different system and solid.
With reference to Fig. 1, the continuity of wettable 100 is described.For droplet A given on solid surface B, contact angle θ be the surface of solid B and from and the tangent tangent line of the radius of the contact point of solid B and droplet A between the measuring of the angle that forms.Contact angle θ is the surface tension of calculating about by Youngs equation (Young ' s equation), by this tension force, can calculate the synergistic behavior of specific liquid-solid.It is wet that the contact angle θ 102 of zero degree causes becoming, and the angle θ 104 between zero degree and 90 degree causes the extension (because molecular attraction) of drop.The contact angle θ 106 of 90 degree can cause stable status, and wherein surface tension stops the extension of liquid.Angle θ 108 express liquids greater than 90 degree are tending towards forming liquid pearl or contraction from solid surface.
The flat-panel monitor manufacturing can be used the colored filter that is included in the different color ink that prints on glass (or other material) substrate.In the specific pixel well that ink can use the ink-jet printer that is suitable for accurate ink-jet and/or other suitable material to deposit to be limited by matrix.Before deposited ink, can use photoetching, printing or other any suitable processing, on substrate, form the pixel wells matrix.Because substrate and/or be used to form the variation of ink-receptive water-based/ink-resistant water-based of the material of matrix, it is not optional for forming colored filter that the section that deposits to the ink droplet in the pixel wells is filled profile (for example, distributing).In some cases, ink uneven distribution in pixel wells can cause the defective in the colored filter.For example, if ink " globule occurs ", then just cannot the complete filling pixel wells.The inventor has been noted that the ink-receptive water-based/ink-resistant water-based of matrix alters a great deal in the mill.Thereby in order to attempt the adjustment form surface tension, even feasible, the filling profile of the ink by chemical change can not meet the requirements yet.
With reference to Fig. 2, the inventor has further noticed and (for example has been commonly used to form picture element matrix 204, the top of material 202 black matrix) (for example, (in the colored filter printing process) level) surface 200 can be sufficiently ink-receptive water-based, if make that ink 206 drops on the picture element matrix 204, and desirably do not remain on the end face 200, the ink 206 that then will drop in the pixel wells 204 is tending towards making end face 200 to become wet.Further, illustrate as the cut-open view of the pixel wells in Fig. 2 204, because ink 206 still remains on the top 200 of ink-receptive water-based picture element matrix material 202, the profile of the pixel wells 204 of ink 206 on substrate 208 can undesirably be recessed into.In certain embodiments, be different from Fig. 2, the end face of the pixel wells of filling ink is flat, and concordant with the end face of picture element matrix wall be necessary.
As shown in Figure 3, a method that remedies this problem be in ink 206 is deposited on pixel wells 204 before, all surface (comprising end face 200 and side 300) of picture element matrix material 202 is handled or is applied, so that the surface has the ink-resistant water-based.This idea is that by scribbling coating 302, the ink 206 that picture element matrix material 202 can be made extending on end face has bigger resistance.After picture element matrix 204 has been patterned, and as noted before well is filled ink 206, finishes and handle or apply 302.The processing of even now or apply 302 and can make end face 200 more be not easy to water to extend, but the sidewall 300 of pixel wells 204 can become too ink-resistant water, and because ink pulls away from the ink-resistant water-based pixel borehole wall 204 as shown in FIG. 3, the profile that is deposited on the ink 206 in the well 204 can projection arrive unwanted degree.
With reference to figure 4A to Fig. 4 C, the invention provides the system, the method and apparatus that allow to form picture element matrix 204, wherein, the end face 200 of picture element matrix material 202 is ink-resistant water-baseds, and the side wall surface 300 of picture element matrix material 202 is property of ink-receptive water.When the end face 200 of picture element matrix material 202 is ink-resistant water-based and sidewall 300 when being ink-receptive water-based, if as in the correct amount of distributing ink 206 as shown in Fig. 4 A, then ink 206 with filler pixels matrix 204 to desirable level.If the amount of the ink 206 that is distributed is slightly more than desirable amount, then ink-resistant water-based top 200 and ink-receptive water-based sidewall 300 also can (under given condition) (for example can provide optimal shape at ink 206 surfaces, protruding from the top of sidewall to sidewall), described at Fig. 4 B.If the amount of the ink 206 that is distributed is slightly less than desirable amount, then the top 200 of ink-resistant water-based and ink-receptive water sidewall 300 will (under given condition) provide optimal shape (for example, recessed to sidewall from the top of sidewall) as described at Fig. 4 C at the surface of ink 206.
The method of making picture element matrix according to some embodiments of the present invention is described referring now to Fig. 5 to Fig. 8.Method 800 in Fig. 8 as flow chart description.
In step 804, substrate 208 at first is coated with picture element matrix material 202 (for example, condensate) layer, as respectively shown in the vertical view and side view of substrate among Fig. 5 A and Fig. 5 B.The thickness of picture element matrix material layer 202 can be between about 1 micron and 2.5 microns.Other thickness range also is feasible.Picture element matrix material layer 202 is chosen to be the more ink-receptive water-based of ink, and this ink will be at the follow-up filler pixels well that is used for.
Then in step 806, shown in the vertical view and side view of the substrate in Fig. 6 A and 6B 208, picture element matrix material layer 202 surperficial processed or be coated with the very thin layer of forming by the very high ink-resistant water-based material 302 between about 10 and the 1000 thickness.Other thickness range also is feasible.
In step 808 subsequently, described at Fig. 7 A and Fig. 7 B, be used for removing selectively the part of handled or the picture element matrix material layer 202 that applies such as the direct patterned tool 700 of laser ablation system, be removed to substrate 208 downwards fully, to form pixel " ink wells " or " well ".Swashing the ablation system will describe with reference to Fig. 9 and Figure 10 below in more detail.The substrate 208 of patterning is then prepared to be used for ink and is filled.The sidewall of well thus the same with the matrix material that is used for forming picture element matrix material 202 be ink-receptive water-based, and the top is still the ink-resistant water-based owing to handling or apply 302.Notice that accompanying drawing is not drawn in proportion.
In some embodiments of the invention, can select being used for the ink of filler pixels in the back is the picture element matrix material of comparison ink-resistant water-based.Then can in oxygen containing environment, carry out laser ablation (patterning) step 808.The effect of oxygen will make sidewall " burning " or " burning " of pixel wells, and this sidewall that makes becomes more ink-receptive water-based, and the end face of picture element matrix keeps the ink-resistant water-based.In such optional method, can omit the step 804 that applies the picture element matrix material with the ink-resistant water-based material.
Above method uses laser ablation system to produce novel pixel matrix structure of the present invention.Yet, in other embodiments, can utilize the method for not using laser ablation to form new structure of the present invention.For example, can form one deck photoresistance picture element matrix polymer material, then handle, use photoetching to carry out patterning then with the ink-resistant water-based material at substrate.
In case on substrate, formed above-mentioned new structure, as the U.S. patent application case U.S. Provisional Patent Application case sequence number No.60/625 that is for example being comprised before, 550 described ink-jet printing systems can be used for color inks filler pixels matrix, are suitable for the colored filter of flat-panel monitor with formation.In certain embodiments, even layer after filling ink, may apply clear coat (for example, transparency electrode, indium-tin-oxide (ITO)) being filled with on the picture element matrix of ink on surface level.Yet,, can be difficult to the clear coat that distributes equably if the end face of picture element matrix keeps the ink-resistant water-based.In such embodiments, can at first make hydrocarbon, the hydrocarbon of fluoridizing and/or fluorinated silicone oil flow through the picture element matrix of filling ink, so that end face is consistent with the water wettability of ink or other liquid.
In another embodiment of the present invention, picture element matrix can use the material of solidify out into ink-resistant water-based to be printed on the substrate.Can carry out ink-jet picture element matrix material, make this material be deposited as the semilune droplet-like.In certain embodiments, the both sides of the printed pixels matrix material of semilune droplet-like can use laser ablation to repair in oxygen containing environment, form vertical sidewall.Sidewall thereby will burn makes sidewall owing to the result of laser ablation becomes ink-receptive water-based.
The present invention further comprises as respectively in the patterned tool shown in the exemplary embodiment of Fig. 9 and Figure 10 900,1000.With reference to Fig. 9, the section of describing patterned tool 900 schematically illustrates.Patterned tool 900 comprises laser ablation system 902, and laser ablation system 902 comprises the one or more lasing light emitters 904 that are arranged in the shell 906.Lasing light emitter 904 can comprise or be coupled to one or more optical heads 908.Lasing light emitter 904 and/or optical head 908 can be supported by laser bridge 910.Although do not illustrate, laser bridge 910 can also comprise motor, actuator, driver, gear, chain and be suitable for influencing the parts of laser bridge 910 work as described below.Laser bridge 910 can be supported by tool base 912.Tool base 912 can be made by for example big granite, and the involving vibrations isolation characteristic.
With reference to Figure 10, another patterned tool 1000 exemplary embodiments are described, except many extractions 930, be similar to above-mentioned instrument 900, another patterned tool 1000 comprises the air suction device 931 of the All Ranges of the just ablated substrate of leap 920.
With reference to Fig. 9 and Figure 10, at work, form pixel wells in the picture element matrix material 922 of patterned tool 900,1000 on substrate 920.Lasing light emitter 904 (for example, diode-pumped solid (DPSS) laser instrument) is operationally carried out picture element matrix material 922 (for example, the black matrix resin) patterning of accurately ablating.For example, the DPSS laser instrument that many high powers CW Q switches (for example, in the 350W of 1.06 mum wavelengths, 10kHz power, 30kHz Max rep speed, 10kHz works under about 80ns pulse length down) can be used for via optical fiber to optical head 908 conveying capacities.
Under the situation that substrate 920 is fixed by chuck system 924, the substrate 920 of virtually any size can craft or the platform 914 that is loaded into of machine on.Platform 914 operationally moves on an axis above the laser bridge 910, and laser bridge 910 is suitable for along second, quadrature-axis flying optical head 908 and/or lasing light emitter 904.In certain embodiments, may be provided in picture system's (for example, CCD camera) (not shown) to detect substrate 920 and/or the auxiliary aligning that passes through the substrate 920 of the reference mark on the use substrate 920.
In case substrate 920 is loaded on the platform 914, optical read head 908 can the guided laser energy by the aperture on the mask 916 (if use), upwards by substrate 920 (not absorbing a lot of laser energies) to picture element matrix material 922 layer in.Via gas supply unit 934, flow to the oxygen of instrument 900,1000 simultaneously, make picture element matrix material 922 volatilizations that are exposed to laser energy by mask 916 in conjunction with laser energy.Residual material be extracted 930 or air suction device 931 remove.
Aforementioned description only discloses certain embodiments of the present invention; The modification that falls in the scope of the invention of above disclosed method and apparatus is tangible for the those skilled in the art in present technique field.Further, the present invention can also be applied to wall formation, polarizer coating and the formation of nanoparticle circuit.
Thereby, although disclose the present invention in conjunction with specific embodiments, should recognize that other embodiment can drop in the spirit and scope of the present invention, scope of the present invention is defined by the claims.
The present invention advocates to be called in the name that on September 19th, 2005 submitted to the U.S. Provisional Patent Application case sequence number No.60/718 of " METHOD ANDAPPARATUS FOR MANUFACTURING A PIXEL MATRIX OF A COLORFILTER FOR A FLAT PANEL DISPLAY " (acting on behalf of case number No.10502/L), the right of priority of 565D, this patent by reference mode herein all is contained in this, to be used for all purposes.
The present invention advocates to be called in the name that on July 28th, 2006 submitted to the U.S. Provisional Patent Application case sequence number No.60/834 of " METHOD ANDAPPARATUS FOR MANUFACTURING A PIXEL MATRIX OF A COLORFILTER FOR A FLAT PANEL DISPLAY " (acting on behalf of case number No.10502/L2), 076 right of priority, this patent by reference mode herein all is contained in this, to be used for all purposes.
The U.S. patent application case of transfer the possession of jointly below the present invention relates to, application is co-pending, wherein each by reference mode herein all are contained in this to be used for all purposes.
The name of submitting on November 4th, 2004 is called the U.S. Provisional Patent Application case sequence number No.60/625 of " APPARATUS AND METHODSFOR FORMING COLOR FILTERS IN A FLAT PANEL DISPLAY BYUSING INKJETTING ", 550.
The name of submitting on November 22nd, 2004 is called the U.S. patent application case sequence number No.11/019 of " APPARATUS AND METHODSOF AN INJET HEAD SUPPORT HAVING AN INKJET HEAD CAPABLEOF INDEPENDENT LATERAL MOVEMENT " (acting on behalf of case number No.9521-1), 967.
The name of submitting on November 22nd, 2004 is called the U.S. patent application case sequence number No.11/019 of " METHODS AND APPARATUSFOR INKJET PRINTING " (acting on behalf of case number No.9521-2), 929.
The name of submitting on November 22nd, 2004 is called the U.S. patent application case sequence number No.11/019 of " METHODS AND APPARATUSFOR ALIGNING PRINT HEADS " (acting on behalf of case number No.9521-3), 930.
The name of submitting on July 28th, 2005 is called " METHODS AND APPARATUSFOR SIMULTANEOUS INKJET PRINTING AND DEFECT INSPECTIOIN " (act on behalf of case number No.9521-L02 (before 9521-7/L)) U.S. Provisional Patent Application case sequence number No.60/703,146.
The name of submitting on July 25th, 2005 is called " METHODS AND APPARATUSFOR CONCURRENT INKJET PRINTING AND DEFECT INSPECTIOIN " (acting on behalf of case number No.9521-10) U.S. patent application case sequence number No.11/493,861.
Claims (25)
1. method that forms picture element matrix comprises:
With picture element matrix coated materials substrate;
Apply described picture element matrix material with the ink-resistant water-based material;
In described picture element matrix material and described ink-resistant water-based material, form pixel wells.
2. method according to claim 1, wherein, described substrate is the glass that is suitable for making the colored filter that is used for flat-panel monitor.
3. method according to claim 1, wherein, described substrates coated has the picture element matrix material of ink-receptive water-based.
4. method according to claim 1, wherein, described substrates coated has the picture element matrix material with the thickness that is suitable for forming pixel wells.
5. method according to claim 1, wherein, described picture element matrix coated materials has ink-resistant water-based material layer, and described ink-resistant water-based material layer is with respect to the thinner thickness of described picture element matrix material.
6. method according to claim 1, wherein, form pixel wells comprise form described pixel wells make the end face of described pixel wells be the ink-resistant water-based and the side of described pixel wells is ink-receptive water-based.
7. method according to claim 1 wherein, forms pixel wells and comprises that the use laser ablation carries out patterning to picture element matrix.
8. method according to claim 7 wherein, is used laser ablation that picture element matrix is carried out patterning and is included in the oxygen containing environment and uses laser ablation.
9. method according to claim 8, wherein, the feasible pixel wells sidewall that forms ink-receptive water-based of the laser ablation step in aerobic environment.
10. method according to claim 9, wherein, the end face of described pixel wells is because the coating of described ink-resistant water-based but ink-resistant water-based.
11. method according to claim 1 wherein, forms pixel wells and comprises and use photoetching that picture element matrix is carried out patterning.
12. a method that forms picture element matrix comprises:
Picture element matrix coated materials substrate with the ink-resistant water-based;
In aerobic environment, use to be laser-ablated in the described picture element matrix material to form pixel wells, directly described pixel wells being carried out patterning,
Wherein, described pixel wells form make the end face of described pixel wells be the ink-resistant water-based and the side wall surface of described pixel wells is ink-receptive water-based.
13. a system that is used to form picture element matrix comprises:
Patterned tool with laser ablation system operationally forms pixel wells in the picture element matrix material on substrate,
Wherein, described laser ablation system can be operated the described pixel wells that has the side wall surface of the end face of ink-resistant water-based and ink-receptive water-based with formation.
14. system according to claim 13, wherein, described laser ablation system can be operated to form pixel wells in the picture element matrix material of the material that is coated with the ink-resistant water-based.
15. system according to claim 13, wherein, described laser ablation system can be operated to form pixel wells in the picture element matrix material under aerobic environment.
16. system according to claim 13, wherein, described patterned tool comprises the vacuum system that is suitable for removing the material that is volatilized by described laser ablation system.
17. system according to claim 13, wherein, described patterned tool comprises mask, and by described mask, described laser ablation system makes described picture element matrix material volatilization, to form the pixel wells matrix.
18. system according to claim 13, wherein, described laser ablation system can be operated at least one laser instrument that is arranged under the described substrate with utilization and form pixel wells in being coated with the picture element matrix material of ink-resistant water-based material,
Wherein, described laser ablation system comprises shell and oxygen supply unit, and can operate forming pixel wells in the picture element matrix material under aerobic environment,
Described patterned tool comprises pumped vacuum systems, and this system is arranged on described substrate top, and be suitable for removing as by by as described in the material of the material that volatilizees of laser ablation system,
Described patterned tool comprises mask, and this mask is arranged between described laser instrument and the described substrate, and by described mask, described laser ablation system makes described picture element matrix material volatilization, to form the pixel wells matrix.
19. a method that forms picture element matrix comprises:
By on substrate, depositing a plurality of pearl picture element matrix materials and the printed pixels matrix with matrix pattern; And
The part of each pearl picture element matrix material of laser ablation is to form the vertical side wall.
20. method according to claim 19, wherein, described substrate is the glass that is suitable for making the colored filter that is used for flat-panel monitor.
21. method according to claim 19, wherein, described picture element matrix material is the ink-resistant water-based.
22. method according to claim 19, wherein, the pearl picture element matrix material of described deposition has the height that is suitable for forming pixel wells.
23. method according to claim 19, wherein, the part of each pearl picture element matrix material of laser ablation is included in the part of each pearl picture element matrix material of laser ablation in the oxygen containing environment to form ink-receptive water side wall surface.
24. a picture element matrix comprises:
A plurality of pixel wells, described each pixel wells all comprises end face or side wall surface,
Wherein, described end face is the ink-resistant water-based, and described side wall surface is ink-receptive water-based.
25. picture element matrix according to claim 24, wherein, described pixel wells forms on substrate, and described picture element matrix is suitable for holding ink to form colored filter.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US71856505P | 2005-09-19 | 2005-09-19 | |
| US60/718,565 | 2005-09-19 | ||
| US60/834,076 | 2006-07-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1959449A true CN1959449A (en) | 2007-05-09 |
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| CN 200610127593 Pending CN1959449A (en) | 2005-09-19 | 2006-09-19 | Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100447591C (en) * | 2007-01-24 | 2008-12-31 | 友达光电股份有限公司 | Color filter substrate and manufacture method therefor |
| CN103403609A (en) * | 2010-07-26 | 2013-11-20 | 伊英克公司 | Method, apparatus, and system for forming filter elements on display substrates |
| CN103403609B (en) * | 2010-07-26 | 2016-11-30 | 伊英克公司 | For forming the method, apparatus and system of filter element on display base plate |
-
2006
- 2006-09-19 CN CN 200610127593 patent/CN1959449A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100447591C (en) * | 2007-01-24 | 2008-12-31 | 友达光电股份有限公司 | Color filter substrate and manufacture method therefor |
| CN103403609A (en) * | 2010-07-26 | 2013-11-20 | 伊英克公司 | Method, apparatus, and system for forming filter elements on display substrates |
| CN103403609B (en) * | 2010-07-26 | 2016-11-30 | 伊英克公司 | For forming the method, apparatus and system of filter element on display base plate |
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