CN100460951C

CN100460951C - Color filter substrate for liquid crystal display device and method of fabricating the same

Info

Publication number: CN100460951C
Application number: CNB2005101094666A
Authority: CN
Inventors: 金廷炫; 金三悦
Original assignee: LG Display Co Ltd
Current assignee: LG Display Co Ltd
Priority date: 2004-12-03
Filing date: 2005-10-20
Publication date: 2009-02-11
Anticipated expiration: 2025-10-20
Also published as: CN1782809A; KR20060062094A; KR100661290B1

Abstract

The invention provides a color filter base plate used in a liquid crystal display device, and the color filter base plate comprises a base plate comprising a first sub-pixel area, a second sub-pixel area and a third sub-pixel area as well as a first boundary region, a second boundary region and a third boundary region which are arranged among the adjacent sub-pixel areas; a first red color filter pattern, a first green color filter pattern and a first blue color filter pattern which are respectively arranged at the first sub-pixel area, the second sub-pixel area and the third sub-pixel area; as well as a second red color filter pattern, a second green color filter pattern and a second blue color filter pattern which are respectively arranged at the first boundary region, the second boundary region and the third boundary region.

Description

The filter substrate and the manufacture method thereof that are used for liquid crystal indicator

Technical field

The present invention relates to liquid crystal indicator, more specifically, relate to the filter substrate and the manufacture method thereof that are used for liquid crystal indicator.

Background technology

Because developing rapidly of infotech, display device are also constantly being developed with processing and are being shown growing bulk information.Recently, conceived and developed the flat panel display that is used for thin thickness, display device in light weight and low in energy consumption.In these technology, liquid crystal display (LCD) device has been widely used in notebook, both desktop monitors and other application owing to its good resolution, coloured image demonstration and picture quality.

Usually, the LCD device comprise upper substrate, infrabasal plate and be inserted in upper substrate and infrabasal plate between liquid crystal layer.The LCD device utilizes the optical anisotropy of liquid crystal material, changes with the corresponding transmittance of the arrangement of liquid crystal molecule by electric field to produce image.

The infrabasal plate that is commonly referred to array base palte comprises thin film transistor (TFT) and pixel electrode.By carrying out photoetching process repeatedly preformed film is carried out composition, make infrabasal plate.The upper substrate that is commonly referred to filter substrate comprises the color-filter layer that is used for color display.Color-filter layer generally includes the color filter pattern of redness (R), green (G) and blue (B).Color-filter layer forms by the whole bag of tricks (comprising: for example, decoration method, electrochemical plating, pigment (pigment) dispersion method and print process).Usually, because the pigment dispersing method can form the superior pattern with good reproducibility, so it is used more at large.

Yet, in the filter substrate manufacture method of using the pigment dispersing method, since filter substrate by be coated with repeatedly, expose, development and chromatic photoresist (color reist) solidify these and handle and make, therefore the manufacture method complexity needs a lot of times and equipment.

In order to overcome the above problems, proposed to use the filter substrate manufacture method of thermal imaging method.In thermal imaging method,, form color-filter layer by color filter transfer printing (transcription) film being adhered on the substrate, the color filter transfer film being exposed to such as being transferred on the substrate in the light source of laser beam and with the color-filter layer of color filter transfer film.

The color filter transfer film comprises: support membrane, photo-thermal conversion (LTHC) layer and color-filter layer.Support membrane supports LTHC layer and color-filter layer, and transmits laser beam to the LTHC layer.Support membrane can be by forming such as polyester or poly transparent polymeric material.The LTHC layer will convert heat energy to from the light of laser beam absorption, and LTHC can be formed by the material that expeditiously light is converted to heat thus.Color-filter layer can be formed by the material that comprises one of redness, green and blue pigment.

Figure 1A shows the method for making filter substrate according to the use thermal imaging of prior art to 1I.

Shown in Figure 1A, the metal material by deposit such as chromium or chromated oxide (CrOx) on transparency carrier 30 forms black matrix layer 31.Form photoresist layer 32 by coating photoresist resin on the almost whole surface of black matrix layer 31.The mask 90 that comprises light-blocking part and light transmission part is set above photoresist layer 32, and by mask 90 exposed photoresist layers 32.

Then, shown in Figure 1B, the photoresist layer that is exposed 32 of Figure 1A is developed, and forms photoresist pattern 33 thus.Herein, photoresist layer 32 is minus, and the part that wherein is exposed remains after developing.Yet photoresist layer 32 also can use eurymeric, wherein the part that removal is exposed after developing.

Next, shown in Fig. 1 C, remove the black matrix layer 31 of Figure 1B selectively, form thus and have the black matrix 35 of opening according to photoresist pattern 33.

Shown in Fig. 1 D, remove the photoresist pattern 33 of Fig. 1 C on the black matrix 35 by peeling off (stripping) or cineration technics.

Shown in Fig. 1 E, the first color-filter layer transfer film 10 comprise support membrane 10a, photo-thermal conversion (LTHC) layer 10b and color-filter layer 10c is set on the substrate 30 that comprises black matrix 35, make color-filter layer 10c in the face of being formed with the surface of black matrix 35 on its of substrate 30.Then, the color-filter layer 10c with the first color filter transfer film 10 adheres on the substrate 30.

Next, shown in Fig. 1 F, the substrate 30 that will comprise the first color filter transfer film 10 that is adhered to is packed in the laser aid, and the laser head 50 that will produce laser beam is arranged in the first color filter transfer film, 10 tops.Substrate 30 can be positioned on the operator's console (not shown).The part A that will form first color filter pattern subsequently to color filter transfer film 10 applies laser beam, makes laser head 50 or worktable along straight reciprocating motion simultaneously.In being exposed to the first color filter transfer film 10 of laser beam, LTHC layer 10b will become heat energy from the phototransformation of laser beam absorption, thereby send heat energy to color-filter layer 10c.Then, because the heat energy that is sent, color-filter layer 10c is transferred on the substrate 30.

Shown in Fig. 1 G, after the color filter transfer film 10 of having removed Fig. 1 F, in an opening corresponding of black matrix 35, formed first color filter pattern 40 with part A.First color filter pattern, 40 parts have covered the adjacent part of black matrix 35.

Shown in Fig. 1 H, use the second color filter transfer film and the 3rd color filter transfer film, by on substrate 30, forming second color filter pattern 42 and the 3rd color filter pattern 44 to technology identical shown in the 1G with Fig. 1 E.

Next, approximately Celsius 200 spending the substrate 30 that will have

color filter pattern

40,42 and 44 under 300 degree approximately Celsius and be placed in the hardening furnace such as baker, thereby

color filter pattern

40,42 and 44 is hardened.

Shown in Fig. 1 I, on the

color filter pattern

40,42 and 44 of overcure, forming coat 46.Coat 46 protection

color filter pattern

40,42 and 44, and make substrate 30 have an even surface, do not have step.By the transparent conductive material of deposit such as tin indium oxide and/or indium zinc oxide, on coat 46, form public electrode 48.

In the above-mentioned filter substrate that uses thermal imaging method to make, black matrix 35 is formed between adjacent

color filter pattern

40,42 and 44, and this black matrix 35 pairs of

color filter pattern

40,42 are separated with 44 color.In addition, black matrix 35 intercept from the select lines of array base palte and the data line by the light of the liquid crystal molecule of irregular driving.Black matrix 35 usually can be by forming greater than 4 metal material such as the optical density (OD) of chromium.Incidentally, in order to form black matrix, still need complicated photoetching process.That is, photoetching process comprises coating, exposure imaging photoresist, then in deposit the step of etching black matrix material after the black matrix material.In addition, also need to be used for the device of above step, compare, do not have the advantage of manufacturing cost aspect with the filter substrate that uses the pigment dispersion method manufacturing.

Summary of the invention

Only in the mode of example, as concrete enforcement and broadly described, a kind of filter substrate that is used for liquid crystal indicator comprises: substrate, this substrate comprise first borderline region, second borderline region and the 3rd borderline region between first subpixel area, second subpixel area and the 3rd subpixel area and the adjacent subpixels zone; Respectively at the first red color filter pattern, the first green color filter pattern and the first blue color filter pattern at first subpixel area, second subpixel area and the 3rd subpixel area place; And the second red color filter pattern, the second green color filter pattern and the second blue color filter pattern at each place in first borderline region, second borderline region and the 3rd borderline region.

In another aspect of this invention, provide a kind of manufacturing to be used for the method for the filter substrate of liquid crystal indicator, this method comprises: form the first red color filter pattern and the second red color filter pattern on substrate, this substrate comprises first subpixel area, first borderline region between second subpixel area and the 3rd subpixel area and the adjacent subpixels zone, second borderline region and the 3rd borderline region, the first red color filter pattern is at the first subpixel area place, and the second red color filter pattern is at first borderline region, each place in second borderline region and the 3rd borderline region; Form the first green color filter pattern at the second subpixel area place, and each place in first borderline region, second borderline region and the 3rd borderline region forms the second green color filter pattern; And form the first blue color filter pattern at the 3rd subpixel area place, and each place in first borderline region, second borderline region and the 3rd borderline region forms second blue color filter pattern.

Should be appreciated that above describe, in general terms and following detailed description all are exemplary and explanat, and aim to provide desired of the present invention the further specifying of claim.

Description of drawings

The accompanying drawing that is comprised is used for further understanding the present invention, and accompanying drawing is merged in and constitutes the part of this instructions, and accompanying drawing shows embodiments of the invention and is used from instructions one explains principle of the present invention.

In the accompanying drawings:

Figure 1A shows the cut-open view of making the method for filter substrate according to the use thermal imaging method of prior art to 1I;

Fig. 2 A shows the cut-open view of making the method for filter substrate according to the use thermal imaging method of first embodiment of the invention to 2I;

Fig. 3 A shows cut-open view according to the manufacture method of the filter substrate of second embodiment of the invention to 3C.

Embodiment

To describe embodiments of the invention in detail below, these embodiment are shown in the drawings.

Fig. 2 A shows the cut-open view of making the method for filter substrate according to the use thermal imaging of first embodiment of the invention to 2I.

Shown in Fig. 2 A, on transparency carrier 130, limit the first subpixel area R, the second subpixel area G and the 3rd subpixel area B, and the first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3, and red color filter transfer film 110 is set on substrate 130.The first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3 are successively set between adjacent subpixels zone R, G and the B.Red color filter transfer film 110 comprises support membrane 110a, photo-thermal conversion (LTHC) layer 110b and red color filter layer 110c.The transfer device that use has a transfer roll bubble-freely adheres to substrate 130 with the red color filter layer 110c of red color filter transfer film 110.

Shown in Fig. 2 B, the laser instrument 170 that is provided with separated by a distance above red color filter transfer film 110.When laser instrument 170 scanning substrates 130, the part corresponding with the first subpixel area R and the first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3 of red color filter transfer film 110 applied the laser beam of laser instrument 170.In being exposed to the red color filter transfer film 110 of laser beam, LTHC layer 110b will convert heat energy to from the light of laser beam absorption, thereby send heat energy to red color filter layer 110c.Then, because the heat energy that sent, red color filter layer 110c separates from LTHC layer 110b, thereby and is transferred on the substrate 130 and is fixed on the substrate 130.

Shown in Fig. 2 C, remove the red color filter transfer film 110 of Fig. 2 B from substrate 130.Thus, in the first subpixel area R, form the first red color filter pattern 140, in each of the first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3, formed the second red color filter pattern 141.In the second subpixel area G and the 3rd subpixel area B, owing to the LTHC layer 110b of Fig. 2 B do not applied laser beam, so red color filter layer 110c still attached on the LTHC layer 110b, and is not fixed on the substrate 130.Therefore, the red color filter layer 110c among the second and the 3rd subpixel area G and the B is removed with LTHC layer 110b.

Next, the substrate 130 that will have the first red color filter pattern 140 and second a red color filter pattern 141 is placed in sclerosis (or curing) stove such as baking oven, thereby the first red color filter pattern 140 and the second red color filter pattern 141 are by sclerosis (or curing).Preferably, the thickness of the first red color filter pattern 140 after the sclerosis and the second red color filter pattern 141 is in about 1 μ m arrives the scope of about 2 μ m.

Shown in Fig. 2 D, on the substrate 130 that comprises the first red color filter pattern 140 and the second red color filter pattern 141, green color filter transfer film 111 is set.Green color filter transfer film 111 comprises support membrane 111a, LTHC layer 111b and green color filter layer 111c.Then, use the transfer device comprise transfer roll that the green color filter layer 111c of green color filter transfer film 111 bubble-freely adhered on the substrate 130 with the first red color filter pattern 140 and second red color filter pattern 141.

Shown in Fig. 2 E, above green color filter transfer film 111 separated by a distance be provided with may be different with the laser instrument among Fig. 2 B laser instrument 170.When laser instrument 170 scanning substrates 130, the part corresponding with the second subpixel area G and the first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3 of green color filter transfer film 111 applied the laser beam of laser instrument 170.

Shown in Fig. 2 F, after laser scanning, remove green color filter transfer film 111 from substrate 130.In being exposed to the green color filter transfer film 111 of laser beam, because green color filter layer 111c is transferred on substrate 130, so in the second subpixel area G, form the first green color filter pattern 142, and on the second red color filter pattern 141 in each of the first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3, formed the second green color filter pattern 143.

Next, the substrate 130 that will have the first green color filter pattern 142 and second a green color filter pattern 143 is placed in the hardening furnace such as baking oven, thereby the first green color filter pattern 142 and the second green color filter pattern 143 are hardened.Preferably, through the thickness of the first green color filter pattern 142 of overcure and the second green color filter pattern 143 at about 1 μ m in the scope of about 2 μ m.

Shown in Fig. 2 G, use blue color filter transfer film (not shown), on the substrate 130 that comprises the first green color filter pattern 142 and the second green color filter pattern 143, carry out the processing identical with red and green color filter pattern 140,141,142 and 143, in the 3rd subpixel area B, form the first blue color filter pattern 144, and form the second blue color filter pattern 145 on the second green color filter pattern 143 in each first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3.

Then, the substrate 130 that will have the first and second blue

color filter patterns

144 and 145 is placed in the hardening furnace such as baking oven, thereby the first and second blue

color filter patterns

144 and 145 are hardened.Preferably, first and second blue color filter patterns 144 after the sclerosis and 145 thickness at about 1 μ m in the scope of about 2 μ m.

Shown in Fig. 2 H, transparent organic material by coating such as light propylene (photo acryl), on substrate 130, form coat 146, wherein this substrate 130 comprises the first red color filter pattern 140, the first green color filter pattern 142 and the first blue color filter pattern 144 among each subpixel area R, G and the B, and is formed on the second red color filter pattern 141, the second green color filter pattern 143 and the second blue color filter pattern 145 among each first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3 successively.Coat 146 protection color filter pattern 140,141,142,143,144 and 145, and the surface of the substrate 130 that comprises color filter pattern 140,141,142,143,144 and 145 is flattened.The thickness of coat 146 makes the second red color filter pattern 141, the second green

color filter pattern

143 and 146 covering of the second blue color filter pattern, 145 complete coated layers among each first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3.The thickness of coat 146 is in about 3 μ m arrive the scope of about 6 μ m.

Shown in Fig. 2 I, the transparent conductive material by deposit such as tin indium oxide forms public electrode 148 on the substrate 130 that comprises coat 146.

In first embodiment, harden after forming each color filter pattern (or curing) handles.Yet, can after having formed redness, green and blue color filter pattern, carry out cure process, thus sclerosis redness, green and blue color filter pattern.

Simultaneously,, also can form other color filter pattern, and the formation order can change though formed redness, green and blue color filter pattern successively.

In above filter substrate, because the second red color filter pattern, the second green color filter pattern that form in each borderline region are identical with the ratio of the second blue color filter pattern, so the second red color filter pattern, the second green color filter pattern and the second blue color filter pattern displaying are black.Therefore, the second red color filter pattern in each borderline region, the second green color filter pattern and the second blue color filter pattern are as the black matrix that intercepts light.

In order to boost productivity, more specifically, for purifying redness, green and blue, ideally, the thickness of the first red color filter pattern, the first green color filter pattern and the first blue color filter pattern at about 1 μ m in the scope of 2 μ m.Along with the thickness thickening of color filter pattern, colour purity improves.Therefore, improve the concentration of color, and produced good color.This shows as bigger zone on NTSC ((U.S.) National Television System Committee) chromaticity coordinate (chromaticity coordinates), improved the color reproducibility thus.

Incidentally, the thickness of the color-filter layer of color filter transfer film is thick more, and color-filter layer transfer printing required heat energy on substrate is many more.For this reason, need following laser instrument, it has more highdensity laser beam on unit area, increased thus to manufacture a finished product.In addition, if color-filter layer has thicker thickness, then precision reduces, and precision is that the good pattern of formation is necessary.This has reduced productive capacity.

Therefore, in first embodiment, consider above problem, the thickness of color filter pattern is essentially about 1 μ m best to about 2 μ m.

Simultaneously, the second embodiment of the present invention prevents the decline of colour purity and color production performance simultaneously and a kind of filter substrate and manufacture method thereof that comprises superior multicolour pattern is provided by using the color-filter layer color filter transfer film thinner than the color-filter layer of first embodiment.

Fig. 3 A is the cut-open view that illustrates according to the method for the manufacturing filter substrate of second embodiment of the invention to 3C.

As shown in Figure 3A, form the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 among the first subpixel area R on substrate 230, the second subpixel area G and the 3rd subpixel area B respectively, and in each first borderline region BA1, the second borderline region BA2 and the 3rd borderline region BA3, form the second red color filter pattern 241, the second green color filter pattern 243 and the second blue color filter pattern 245 successively.Can form the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 by the processing identical with the processing of in first embodiment, describing, and the second red color filter pattern 241, the second green color filter pattern 243 and the second blue color filter pattern 245.The first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 can have with first embodiment in identical thickness, that is, and the thickness of about 1 μ m in the scope of 2 μ m.Yet, preferably, the thickness of the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 can be less than 1 μ m, thereby the thickness of the second red color filter pattern 241, the second green color filter pattern 243 and the second blue color filter pattern 245 can be less than 3 μ m.

Next, on the almost whole surface of the substrate 230 that comprises the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 and the second red color filter pattern 241, the second green color filter pattern 243 and the second blue color filter pattern 245, form colourless, transparent dyestuff absorption layer 259.The thickness of dyestuff absorption layer 259 is greater than 2 μ m, thereby in borderline region BA1, BA2 and BA3, the end face of dyestuff absorption layer 259 is equal to or higher than the end face of the second blue color filter pattern 245.Colourless, transparent material that can absorbing dye (dye) by coating form dyestuff absorption layer 259.Dyestuff absorption layer 259 can be by forming with the material identical materials with the first red color filter pattern 240, the first green color filter pattern 242 and the first blue color filter pattern 244 of pigment (pigment) not, such as acrylic acid or epoxide resin material.

Shown in Fig. 3 B, by ink discharge device 290, on the substrate 230 of colourless, the transparent dyestuff absorption layer 259 that comprises Fig. 3 A sputter (spray) or ink-jet (ink-jetted) than pigment more tiny and more uniform redness, green and blue dyes, at each subpixel area R, G and B place, the redness of being sprayed, green and blue dyes are absorbed in the dyestuff absorption layer 259 of Fig. 3 A.Therefore, in the first subpixel area R, the second subpixel area G and the 3rd subpixel area B, form the 3rd red color filter pattern 260a, the 3rd green color filter pattern 260b and the 3rd blue color filter pattern 260c respectively.Here, formation has the color filter pattern of same hue in each subpixel area.That is, in the first subpixel area R, form the first red color filter pattern 240 and the 3rd red color filter pattern 260a; In the second subpixel area G, form the first green color filter pattern 242 and the 3rd green color filter pattern 260b; In the 3rd subpixel area B, form the first blue color filter pattern 244 and the 3rd blue color filter pattern 260c.Dyestuff absorption layer 259 at Fig. 3 A at borderline region BA1, BA2 and BA3 place can absorb these dyestuffs.Yet, also can not absorb these dyestuffs at the dyestuff absorption layer 259 of Fig. 3 A at borderline region BA1, BA2 and BA3 place.

The 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue

color filter pattern

260a, 260b and 260c have increased the thickness of the color-filter layer with the first red color filter pattern 240, the first green color filter pattern 242 and first blue color filter pattern 244.Therefore, increase colour purity, and improved the color reproducibility.In addition, the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue

color filter pattern

260a, 260b and 260c are as complanation layer.

Usually, because dyestuff is more more tiny and even than pigment, so when color-filter layer has same thickness, comprise that the color-filter layer of dyestuff has better colour purity than the color-filter layer that comprises pigment.Yet, to compare with pigment, dyestuff is relatively poor aspect heat impedance.Therefore, pigment is widely used in the filter substrate of the liquid crystal indicator of making through pyroprocessing.

In the second embodiment of the present invention, color-filter layer has double-decker: the last color filter pattern and the following color filter pattern that comprises pigment that comprise dyestuff.Thus, comprise the following color filter pattern compensation heat impedance of pigment, and have the last color filter pattern compensating color reproducibility of dyestuff, the filter substrate with the color quality that has improved is provided thus.

Next, shown in Fig. 3 C,, on the almost whole surface of the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue

color filter pattern

260a, 260b and 260c, form public electrode 248 by the deposit transparent conductive material.This transparent conductive material can be indium tin oxide or indium tin oxide.

In the present invention, redness, green and blue color filter pattern are formed in the borderline region successively, and as black matrix.Therefore, simplified manufacturing process.In addition, owing to need not to provide lithographic equipment, so reduced production cost.

In addition, because by using the dyestuff absorption layer further to form color filter pattern on the color filter pattern of pigment comprising, so improved the color reproducibility.The color filter pattern that comprises dyestuff is as complanation layer.At this moment, can form the color filter pattern that comprises pigment less than the color filter transfer film of about 1 μ m, can form superior pattern, thereby boost productivity by used thickness.

For those skilled in the art, can under the situation that does not break away from the spirit or scope of the present invention, carry out various modifications and variations obviously to manufacturing of the present invention and application.Therefore, the present invention is intended to cover modification of the present invention and the modification in the scope that falls into claims and equivalent thereof.

The application requires the right of priority of 2004-0100817 korean patent application of submitting on Dec 3rd, 2004 and the 2004-0103428 korean patent application of submitting on Dec 9th, 2004, incorporate into by reference at this, as complete elaboration the in this article.

Claims

1. filter substrate that is used for liquid crystal indicator comprises:

Substrate, this substrate comprise first borderline region, second borderline region and the 3rd borderline region between first subpixel area, second subpixel area and the 3rd subpixel area and the adjacent subpixels zone;

Respectively at the first red color filter pattern, the first green color filter pattern and the first blue color filter pattern at described first subpixel area, second subpixel area and the 3rd subpixel area place;

The second red color filter pattern at each place in described first borderline region, second borderline region and the 3rd borderline region, the second green color filter pattern and the second blue color filter pattern; And

The 3rd red color filter pattern on the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern respectively, local its adjacent described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern that cover of each described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern, described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern comprise dyestuff.

2. filter substrate according to claim 1, wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern are as complanation layer.

3. filter substrate according to claim 1, each in the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern have the thickness in the scope of 2 μ m at 1 μ m.

4. filter substrate according to claim 3, wherein the combination thickness of the described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern in borderline region at 3 μ m in the scope of 6 μ m.

5. filter substrate according to claim 1 also is included in the public electrode on described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern.

6. filter substrate according to claim 1, each in the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern has the thickness less than 1 μ m.

7. filter substrate according to claim 6, the wherein said second red color filter pattern, the second green color filter pattern and the second blue color filter pattern have the thickness less than 3 μ m.

8. filter substrate according to claim 6, each in wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern has the thickness less than 3 μ m.

9. filter substrate according to claim 1, the wherein said first red color filter pattern, the first green color filter pattern and the first blue color filter pattern comprise pigment.

10. a manufacturing is used for the method for the filter substrate of liquid crystal indicator, and described method comprises:

On substrate, form the first red color filter pattern and the second red color filter pattern, this substrate comprises first borderline region, second borderline region and the 3rd borderline region between first subpixel area, second subpixel area and the 3rd subpixel area and the adjacent subpixels zone, the described first red color filter pattern is at the described first subpixel area place, and the described second red color filter pattern is at each described first borderline region, second borderline region and the 3rd borderline region place;

Form the first green color filter pattern at the described second subpixel area place, and form the second green color filter pattern at each described first borderline region, second borderline region and the 3rd borderline region place;

Form the first blue color filter pattern at described the 3rd subpixel area place, and form the second blue color filter pattern at each described first borderline region, second borderline region and the 3rd borderline region place; And

On the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern, form the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern respectively, local its adjacent described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern that cover of each described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern, described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern comprise dyestuff.

11. method according to claim 10, wherein form the described first and second red color filter patterns, form the described first and second green color filter patterns and form in the described first and second blue color filter patterns each all use thermal imaging method.

12. method according to claim 11, wherein said thermal imaging method comprises:

The color filter transfer film is adhered on the described substrate, make color-filter layer face described substrate;

By with laser beam irradiation on described color filter transfer film, selectively with described color-filter layer transfer printing on described substrate; And

Shining the described laser beam described color filter transfer film of removal later on.

13. method according to claim 10, wherein said the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern are as complanation layer.

14. method according to claim 10, also be included in to have formed and the described first and second red color filter patterns hardened after the described first and second red color filter patterns, after having formed the described first and second green color filter patterns, the described first and second green color filter patterns are hardened, and after having formed the described first and second blue color filter patterns, the described first and second blue color filter patterns are hardened.

15. method according to claim 10 also comprises the described first and second red color filter patterns, the described first and second green color filter patterns and the described first and second blue color filter patterns is hardened.

16. method according to claim 10 wherein forms described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern and comprises:

On the described first red color filter pattern, the first green color filter pattern and the first blue color filter pattern and the described second red color filter pattern, the second green color filter pattern and the second blue color filter pattern, form the dyestuff absorption layer; And

With red, green and blue dyes respectively sputter or ink-jet in the described dyestuff absorption layer at described first subpixel area, second subpixel area and the 3rd subpixel area place, perhaps respectively sputter or ink-jet to described first subpixel area, second subpixel area and the 3rd subpixel area with and the described dyestuff absorption layer at adjacent borderline region place in.

17. method according to claim 10 also is included on described the 3rd red color filter pattern, the 3rd green color filter pattern and the 3rd blue color filter pattern and forms public electrode.