CN100464224C - Color filter and manufacture method therefor - Google Patents

Color filter and manufacture method therefor Download PDF

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Publication number
CN100464224C
CN100464224C CNB2007100036041A CN200710003604A CN100464224C CN 100464224 C CN100464224 C CN 100464224C CN B2007100036041 A CNB2007100036041 A CN B2007100036041A CN 200710003604 A CN200710003604 A CN 200710003604A CN 100464224 C CN100464224 C CN 100464224C
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China
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black matrix
layer
color filter
separation
photosensitive
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CNB2007100036041A
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Chinese (zh)
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CN101008733A (en
Inventor
曹俊杰
李淑琴
林祥麟
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友达光电股份有限公司
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Publication of CN101008733A publication Critical patent/CN101008733A/en
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Publication of CN100464224C publication Critical patent/CN100464224C/en

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Abstract

This invention discloses one color filter light slice process method, which comprises the following steps: firstly providing transparent base board to form black matrix to define multiple pixel areas; then coating light sensitive materials for pattern to form isolation layer on black matrix; then filling color dye by spray type in multiple pixel area and drying color dye to form multiple color filter unit; then forming column gap structure by pattern isolation layer.

Description

Colored filter and preparation method thereof

Technical field

The present invention relates to a kind of colored filter with and manufacture method, and particularly relate to a kind of colored filter that forms by ink jet printing mode with and manufacture method.

Background technology

LCD (liquid crystal display, be called for short LCD) because have conventional cathode ray tube (cathode ray tube such as low voltage operating, radiationless line scattering, in light weight and volume be little, be called for short CRT) display of the manufacturing advantage that is beyond one's reach, therefore become the major subjects of display research in recent years, and constantly developed towards colorize.

Utilize colored filter can make LCD carry out full-colorization demonstration.Recently, developed a kind of method of utilizing ink jet printing (inkjet printing) to form colored filter.This manufacture method at first forms black matrix on substrate, to define a plurality of pixel regions.Then, carry out the ink jet printing operation so that pigment (red, green, blueness) is injected in the black defined pixel region of matrix.Subsequently, carry out hot roasting procedure (thermal baking process) so that pigment is solidified.

The technology of ink jet printing (Ink-jet printing) can directly be coated color pigment on the substrate, to make colored filter.Its benefit is, need not utilize mask (mask) or half tone (stencil) promptly can make colored filter.At this moment, making flow process becomes simple and easy and can not use other acid-base solution relevant issues of deriving because of need.Fig. 1 is the known diagrammatic cross-section of utilizing the colored filter of ink jet printing mode made.Please refer to Fig. 1, known colored filter 100 comprises glass substrate 110 and is disposed at black matrix" 120 on the glass substrate 110.Wherein, black matrix" 120 surrounds most pixel region P, and is filled with color pigment 130 among the pixel region P.It should be noted that color pigment 130 is to utilize the mode of ink jet printing (Ink-jetprinting) to insert pixel region P's.

Because the solid solution of color pigment 130 also contains 70 to 80 percent solvent approximately than about 70%~80% in the ie in solution.In color pigment 130 solidification processs, a large amount of solvent evaporations often make color pigment 130 volume-diminished and fill out discontented pixel region P.In addition; if make coat of colo(u)r thickness after the curing be same as the thickness of black matrix" 120; volume before color pigment 130 solidifies adds the high flow rate when inserting pigment then relatively greater than pixel region P volume, and regular meeting's generation color pigment 130 slops over and the problem of mutual union dyeing.

Slop over and mutual union dyeing and limit the volume of color pigment 130 for fear of color pigment 130, may cause pixel region P not to be filled again, and make the color saturation deficiency of demonstration.Or, on black matrix" 120, carry out hydrophobic treatments (hydrophobic treatment), to improve the surface tension of color pigment 130 on black matrix" 120.As shown in Figure 1, under capillary effect, color pigment 130 can present the height uneven surfaces of central protrusion, peripheral recesses.So smooth colored filter 100 covering of each rete in subsequent handling of air spots is relatively poor and when being applied in LCD, and the phenomenon of display image brightness irregularities (mura) takes place easily.

By learning in the experiment, in colored filter 100, between the thickness Db of black matrix" 120 and the thickness Dc of color pigment 130, there is specific relation.For example, be under 2 microns the situation, to carry out ink jet printing at the thickness Db of black matrix" 120 to insert color pigment 130.If after the moulding, the maximum film thickness Dc of color pigment 130 equals or be slightly larger than the thickness Db of black matrix" 120, then color pigment 130 thickness Dc difference has 0.5 to 0.8 micron approximately.Yet, when the maximum film thickness Dc of color pigment 130 approximates 1/3rd to two/for the moment of black matrix" 120 thickness Db, only about 0.1 micron of the thickness Dc of color pigment 130 difference.In other words, as black matrix" 120 thickness Db during greater than two or three times of color pigment 130 thickness Dc, color pigment 130 has even and smooth surface.Yet outstanding black matrix" 120 but can cause subsequent film to be difficult for the problem that covers.

Therefore, prevent that the color pigment union dyeing from making paints uniform film thickness again and the colored filter that has an even surface still is industry required difficult problem that faces in the making of colored filter.

Summary of the invention

The purpose of this invention is to provide a kind of manufacture method, in order to make high yield and high-quality colored filter.

Another object of the present invention provides a kind of high yield and high-quality colored filter.

For reaching above-mentioned or other purpose, the present invention proposes a kind of color filter making method, and its step is as follows.At first, provide transparent substrates.Then, on transparent substrates, form black matrix", a plurality of pixel regions of definition on transparent substrates.Then, on black matrix", form separation layer.Then, in these pixel regions, insert color pigment respectively.Come, dry color pigment is to form a plurality of colored light-filtering units again.And the pattern isolated layer is to form a plurality of separation materials on black matrix".

In one embodiment of this invention, the method for above-mentioned formation separation layer is included in and forms photosensitive material layer on the substrate, and photosensitive material layer is carried out photo-mask process, with the patterning photosensitive material layer.

Employed mask when in one embodiment of this invention, the employed mask of photo-mask process is for example for the making black matrix".

In one embodiment of this invention, photo-mask process for example be with black matrix" as mask, and with respect to a side of photosensitive material layer photosensitive material layer is exposed by substrate.

In one embodiment of this invention, also be included in after the patterning photosensitive material layer, photosensitive material layer is carried out first heat treatment step, its technological temperature is for example between 90 ℃~120 ℃.This first heat treatment step for example is baking.

In one embodiment of this invention, the technological temperature of above-mentioned dry color pigment comprises 90 ℃~120 ℃.

In one embodiment of this invention, after the pattern isolated layer, comprise also and carry out second heat treatment step comprehensively that its technological temperature is for example between 200 ℃~240 ℃.This second heat treatment step for example is baking.

In one embodiment of this invention, the summation of formed separation layer of above-mentioned method for making and black matrix" thickness is for example more than or equal to the twice of colored light-filtering units thickness.In addition, the thickness of colored light-filtering units for example is the thickness that equals black matrix" haply.

In one embodiment of this invention, above-mentioned color filter making method comprises that the mode of utilizing ink jet printing inserts color pigment in pixel region.

The present invention proposes a kind of color filter making method in addition, and its step is described below.At first, provide transparent substrates.Then, on transparent substrates, form black matrix", with a plurality of pixel regions of definition on transparent substrates.Then, on black matrix", form separation layer, in pixel region, insert color pigment more respectively.Then, dry color pigment forming a plurality of colored light-filtering units, and removes separation layer.

In one embodiment of this invention, the method for above-mentioned formation separation layer is included in and forms photosensitive material layer on the substrate, and photosensitive material layer is carried out photo-mask process, with the patterning photosensitive material layer.

Employed mask when in one embodiment of this invention, the employed mask of above-mentioned photo-mask process is for example for the making black matrix".

In another embodiment of the present invention, above-mentioned photo-mask process for example be with black matrix" as mask, and with respect to a side of photosensitive material layer photosensitive material layer is exposed by substrate.

In one embodiment of this invention, after the patterning photosensitive material layer, comprise also photosensitive material layer carried out first heat treatment step that its technological temperature is for example between 90 ℃~120 ℃.This first heat treatment step for example toasts.

In one embodiment of this invention, the technological temperature of above-mentioned dry color pigment comprises 90 ℃~120 ℃.

In one embodiment of this invention, after removing separation layer, comprise also and carry out second heat treatment step comprehensively that its technological temperature is for example between 200 ℃~240 ℃.This second heat treatment step for example is baking.

In one embodiment of this invention, the summation of formed separation layer of above-mentioned method for making and black matrix" thickness for example is the twice more than or equal to the colored light-filtering units thickness.

In addition, the thickness of the formed colored light-filtering units of above-mentioned method for making for example is the thickness that equals black matrix" haply.

In one embodiment of this invention, the mode of inserting color pigment in pixel region comprises the mode of utilizing ink jet printing.

The present invention reintroduces a kind of colored filter, comprises transparent substrates, black matrix", a plurality of colored light-filtering units and a plurality of separation material.Wherein, black matrix" is disposed on the transparent substrates, and defines a plurality of pixel regions on substrate, and a plurality of colored light-filtering units is disposed in the pixel region respectively.In addition, a plurality of separation materials are disposed on the black matrix".

In one embodiment of this invention, the material of above-mentioned separation material comprises photosensitive material.

In one embodiment of this invention, the height of above-mentioned separation material with the summation of black matrix" thickness for example be twice more than or equal to the colored light-filtering units thickness.

In one embodiment of this invention, the thickness of above-mentioned colored light-filtering units for example is the thickness that equals black matrix" haply.

In one embodiment of this invention, the material of above-mentioned transparent substrates comprises glass.In addition, the material of colored light-filtering units comprises resin (resin).

Color pigment splash and union dyeing when the present invention forms separation layer and can prevent ink jet printing on black matrix".Fill the q.s color pigment because the height of separation layer can be allowed, can obtain the even and the second best in quality colored filter of thickness.Say that further the display of using colored filter of the present invention has than superior display quality.

For above and other objects of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and in conjunction with the accompanying drawings, carry out following detailed description.

Description of drawings

Fig. 1 is the known diagrammatic cross-section of utilizing the colored filter of ink jet printing mode made;

Fig. 2 A is the section schematic flow sheet of the color filter making method of first embodiment of the invention to Fig. 2 G;

Fig. 3 is the schematic top plan view according to the made colored filter of first embodiment of the invention;

Fig. 4 A is depicted as the color filter making method of second embodiment of the invention to Fig. 4 F.

Wherein, Reference numeral:

100,270,460: colored filter

110,200,410: substrate

120,210,420: black matrix"

130,240,440: color pigment

220,430: photosensitive material layer

222,432: separation layer

250,450: colored light-filtering units

260: separation material

Db, Dc, Di: thickness

Ds: the height of separation material

P: pixel region

Embodiment

First embodiment

Fig. 2 A is the section schematic flow sheet of the color filter making method of first embodiment of the invention to Fig. 2 G.At first, shown in Fig. 2 A, provide transparent substrates 200.The material of this transparent substrates 200 for example is a glass.In other embodiments, the material of transparent substrates 200 also can be employed other light transmissive material in the correlative technology field.

Then, on transparent substrates 200, form black matrix" 210 (shown in Fig. 2 B).Wherein, black matrix" 210 defines a plurality of pixel region P on transparent substrates 200.In the present embodiment, for example be to utilize the photoetching etching work procedure that materials such as lighttight resin or metal are made the black matrix" 210 with a plurality of pixel region P.

Then please refer to Fig. 2 C, behind the formation black matrix" 210, for example on substrate 200, form photosensitive material layer 220, and make photosensitive material layer 220 cover black matrix"s 210.Afterwards, carry out photo-mask process with patterning photosensitive material layer 220.In the present embodiment, above-mentioned photo-mask process can utilize black matrix" 210 as mask, and by substrate 200 with respect to a side of photosensitive material layer 220 to photosensitive material layer 220 expose dorsad (shown in Fig. 2 C).It should be noted that selection exposes to photosensitive material layer 220 as mask dorsad with black matrix" 210, then photosensitive material layer 220 should be selected the positive photoetching rubber material for use.If adopt this mode patterning photosensitive material layer 220, contingent error helps the step of simplifying working process in the time of can avoiding the mask contraposition, and can improve fine ratio of product.

Then, after patterning photosensitive material layer 220, also can carry out first heat treatment step to photosensitive material layer 220, for example be baking, and its technological temperature comprises 90 ℃~120 ℃.So, can tentatively photosensitive material layer 220 be solidified, and the separation layer 222 of formation shown in Fig. 2 D.

Then, please refer to Fig. 2 E, after separation layer 222 forms, can insert color pigment 240 respectively in the P of different pixels zone, it for example is resin (resin) material.In the present embodiment, for example be the color pigment 240 of in pixel region P, inserting different colours such as red, green, blue by ink-jet printing technology in regular turn.When injecting color pigment 240, regular meeting takes place that color pigment 240 slops over and the situation of union dyeing compared to known ink jet printing method, and the structure of separation layer 222 can effectively be isolated the color pigment 240 among the P of different pixels zone among the present invention.Therefore, the present invention does not need to carry out complicated hydrophobic treatments or ink ejection amount is adjusted on black matrix" 210.In addition, in follow-up baking step, have the phenomenon of volumetric contraction based on color pigment 240, separation layer 222 of the present invention helps to increase the height of the color pigment 240 that is received in pixel region P, therefore can make color pigment 240 keep an ideal height after by oven dry.

Then, please refer to Fig. 2 E and Fig. 2 F, dry color pigment 240 is to form a plurality of colored light-filtering units 250.The technological temperature of dry color pigment 240 for example is between 90 ℃~120 ℃, its purpose contained a large amount of solvent evaporates in making color pigment 240, and make color pigment 240 primary solidification.After the solvent evaporates in the color pigment 240, can make the volumetric contraction of color pigment 240.Therefore, the thickness Db that can equal black matrix" 210 for the thickness Dc that makes colored light-filtering units 250 haply is to present better quality, and preferable situation is to insert the color pigment 240 of more amount.In the present invention, the design of separation layer 222 can be allowed the color pigment 240 of inserting more amount, therefore can avoid the problem of deriving because of color pigment 240 volumetric contractions.

In addition, experiment through reality is learnt, shielding thickness around the colored light-filtering units 250, just the summation of the thickness Di of separation layer 222 and black matrix" 210 thickness Db is greater than the twice of colored light-filtering units 250 thickness Dc or when above, then can obtain thickness Dc colored light-filtering units 250 uniformly, that is colored light-filtering units 250 central authorities and less near the film thickness difference at edge, black matrix" 210 place.Therefore, the design of separation layer 222 more helps avoid LCD and produces the defective that shows inhomogeneous (mura), and then improves the display quality of LCD.

Then, please also refer to Fig. 2 F and Fig. 2 G, because when carrying out aforesaid first heat treatment step and dry color pigment 240, technological temperature is subjected to good control, makes the prepared separation layer 222 of eurymeric photoresist material still have photosensitivity.So, present embodiment can continue separation layer 222 is carried out second time exposure, with separation layer 222 patternings, and forms a plurality of separation materials 260 on black matrix" 210.Generally speaking, the design of separation material 260 is the cell gaps (cell gap) in order to keep display panels.Present embodiment forms the design of separation material 260 by separation layer 222, can save the step that known need are made separation material 260 in addition, therefore can reach the purpose of simplifying working process and reducing cost.In addition, present embodiment is formed at separation material 260 on the black matrix" 210, therefore can avoid being stopped by separation material 260 by the light of pixel region P, and help to improve whole display brightness.

In the present embodiment, only need increase by one mask process can be with separation layer 222 patternings, to form separation material 260, so can make the purpose of making process simplification and reaching the raising production capacity.What deserves to be mentioned is, in this step, only need to remove unwanted part in the separation layer 222, therefore colored light-filtering units 250 and black matrix" 210 are corroded or destroy with dry-etching or with specific developer (developer) or stripper (stripper).

In fact, the step of above-mentioned making colored filter can also adopt alternate manner.For example, employed mask carried out the forward exposure when photo-mask process of patterning photosensitive material layer 220 can utilize making black matrix" 210, bought the mask cost to save.At this moment, the material of photosensitive material can be looked and make black matrix" 210 employed mask-type, and selects positive photoetching rubber material or negative photoresist material for use.Particularly, if be to adopt minus mask (mask pattern is opposite with formed black matrix pattern) when making black matrix", then photosensitive material layer 220 need be selected for use and bear the photoresist material.In a single day it should be noted that working as separation layer 222 forms with negative photoresist material, then finish after the patterning step that separation layer 222 promptly loses photosensitivity and can't carry out re-expose.Therefore, when forming the step of a plurality of separation materials 260, the mode of may the using plasma etching etc. requiring great effort is carried out at pattern isolated layer 222.Yet based on lateral thinking, the present invention does not get rid of the negative photoresist material of employing to make separation layer 222.

In addition, present embodiment also can carry out second heat treatment step comprehensively after forming separation material 260, for example baking.The technological temperature of second heat treatment step for example is between 200 ℃~240 ℃, and its purpose is to make colored light-filtering units 250 and separation material 260 full solidification, so that carry out subsequent handling.Simultaneously, after the above-mentioned multiple tracks photo-mask process of process, the edge of colored light-filtering units 250 may produce irregular acute angle (shown in Fig. 2 F), and influences the coverage effect of subsequent film.This second heat treatment step more can be eliminated the acute angle at colored light-filtering units 250 edges, in order to the formation of subsequent film.

Fig. 3 is the schematic top plan view according to the prepared colored filter of first embodiment of the invention.As shown in Figure 3, colored filter 270 comprises transparent substrates 200, black matrix" 210, a plurality of colored light-filtering units 250 and a plurality of separation material 260.Wherein, black matrix" 210 is disposed on the transparent substrates 200, and defines a plurality of pixel region P on substrate 200, and a plurality of colored light-filtering units 250 is disposed at respectively in the pixel region P.It should be noted that on the black matrix" 210 of each pixel region P periphery configuration at least one or a plurality of separation material 260, and separation material 260 for example is cylindric (as shown in Figure 3), flat column or other column.The made colored light-filtering units 250 of method for making that the present invention proposes has uniform thickness, and when being applied in LCD, can not produce the mura defective.

Second embodiment

Fig. 4 A is depicted as the color filter making method of second embodiment of the invention to Fig. 4 F.Please refer to Fig. 4 A, at first, provide transparent substrates 410, and form black matrix" 420 on transparent substrates 410, wherein black matrix" 420 defines a plurality of pixel region P on transparent substrates 410.In the present embodiment, the material of transparent substrates 410 for example is a glass, and the material of black matrix" 420 for example is metal or lighttight resin.

Then, please refer to Fig. 4 B, on substrate 410, form photosensitive material layer 430 and make it cover black matrix" 420.Subsequently, carry out photo-mask process with patterning photosensitive material layer 430.In the present embodiment, the mode of patterning photosensitive material layer 430 is identical with the mode of patterning photosensitive material layer 220 among first embodiment, and its material can be selected positive photoetching rubber material or negative photoresist material for use.Wherein, if adopt black matrix" 420 as mask (shown in arrow among Fig. 4 B) when exposing dorsad, photosensitive material layer 430 should be selected the positive photoetching rubber material for use.Issuable error when the benefit of exposing dorsad is to save the mask contraposition helps to improve fine ratio of product.On the other hand, also can adopt used mask when forming black matrix" 420 and carry out the forward exposure.At this moment, then according to the kind of mask-type with decision photosensitive material layer 430.Particularly, in the step of patterning photosensitive material layer 430, need not make new mask, burden can reduce cost.Yet if consider actual demand, the present invention does not get rid of for patterning photosensitive material layer 430 and makes new mask to carry out photo-mask process.

Next, please also refer to Fig. 4 B and Fig. 4 C.In the present embodiment, after forming, patterning photosensitive material layer 430 comprises also photosensitive material layer 430 carried out first heat treatment step that its method for example is to toast under 90 ℃~120 ℃.This step be for the photosensitive material layer 430 of precuring patterning to form separation layer 432.Shown in Fig. 4 C, separation layer 432 is disposed on the black matrix" 420, can increase the barrier of pixel region P, helps the carrying out of subsequent step.

Then, please refer to Fig. 4 D, in the P of different pixels zone, insert color pigment 440 respectively.In the present embodiment, the mode of inserting color pigment 440 is by ink jet printing color pigment 440 to be inserted among the pixel region P.Wherein, color pigment 440 comprises the combination of red pigment, viridine green and blue pigment or other color pigment 440.Because the barrier of separation layer 432 can be inserted the color pigment 440 of proper volume in pixel region P according to actual demand.The barrier that separation layer 432 has been arranged, color pigment 440 is difficult for taking place the situation of mutual union dyeing, can avoid showing the defective of inhomogeneous (mura) further.In making flow process, do not need on black matrix" 420, to carry out complicated hydrophobic treatments yet, can save cost and simplify the making flow process.

After inserting color pigment 440, with color pigment 440 dryings to form a plurality of colored light-filtering units 450 (shown in Fig. 4 E).Wherein, the technological temperature of drying steps for example is between 90 ℃~120 ℃, so that the solvent evaporation in the color pigment 440 and primary solidification becomes colored light-filtering units 450.In general, for the good colored filter of fabricating quality, must make colored light-filtering units 450 keep certain thickness.Yet the evaporation of solvent can make its volumetric contraction and make the quality of colored light-filtering units 450 bad in the color pigment 440.Therefore, the present invention adopts color pigment 440 that the design tolerable of separation layer 432 inserts enough volumes to address the above problem, and further makes colored light-filtering units 450 that uniform thickness Dc is arranged, and helps to improve the quality of colored filter.

Next, separation layer 432 is removed to form the colored filter 460 shown in Fig. 4 F.In the present embodiment, for example remove separation layer 432 with dry-etching or with specific developer (developer) or stripper (stripper).Utilize the advantage of these methods to be, remove and in separation layer 432 processes colored light-filtering units 450 and black matrix" 420 to be corroded or destroy.In fact, among the present invention the formation of separation layer 432 with remove the destruction that can not cause colored filter.

Removing after the separation layer 432, also comprise and carry out second heat treatment step comprehensively, for example is to toast under 200 ℃~240 ℃.Therefore, but colored light-filtering units 450 full solidification also can be eliminated between colored light-filtering units 450 and the separation layer 432 in above-mentioned multiple tracks step formed acute angle (shown in Fig. 4 E) simultaneously to improve the quality of colored filter 460.It should be noted that the barrier of separation layer 432, made the thickness Dc of colored light-filtering units 450 can equal the thickness Db of black matrix" 420 haply.Therefore, colored filter 460 not only has superior display quality, and its smooth surface more helps the covering of subsequent film.

In sum, color filter making method of the present invention has the following stated advantage at least: at first, color filter making method of the present invention can prevent the situation of mutual union dyeing when color pigment is inserted pixel region because the design of separation layer has been arranged.Therefore, do not need in the colored filter manufacturing process of the present invention on black matrix", to carry out hydrophobic treatments, can save cost.In addition, when making colored filter, can form the separation material of liquid crystal layer, help to simplify working process.Moreover, adopt method of the present invention to make colored filter, can in pixel region, insert an amount of color pigment and make colored filter have thickness uniformly, can present saturated color, and not have the defective that shows inhomogeneous (mura).

Though the present invention as above describes with preferred embodiment; right its is not in order to qualification the present invention, any those of ordinary skill in the art, without departing from the spirit and scope of the present invention; when can making amendment and improve, so protection scope of the present invention is limited by the accompanying Claim book.

Claims (22)

1. a color filter making method is characterized in that, comprising:
One transparent substrates is provided;
On this transparent substrates, form a black matrix", with a plurality of pixel regions of definition on this transparent substrates;
On this black matrix", form a separation layer;
In these a plurality of pixel regions, insert a color pigment respectively;
Dry this color pigment is to form a plurality of colored light-filtering units; And
This separation layer of patterning is to form at least one separation material on this black matrix".
2. color filter making method according to claim 1 is characterized in that, the method that forms this separation layer comprises:
On this substrate, form a photosensitive material layer; And
This photosensitive material layer is carried out a photo-mask process, with this photosensitive material layer of patterning.
3. color filter making method according to claim 2 is characterized in that, the employed mask of this photo-mask process is an employed mask when making this black matrix".
4. color filter making method according to claim 2 is characterized in that, this photo-mask process be with this black matrix" as mask, and with respect to a side of this photosensitive material layer this photosensitive material layer is exposed by this substrate.
5. color filter making method according to claim 2 is characterized in that, also is included in after this photosensitive material layer of patterning, and this photosensitive material layer is carried out one first heat treatment step.
6. color filter making method according to claim 5 is characterized in that, the technological temperature of this first heat treatment step comprises 90 ℃~120 ℃.
7. color filter making method according to claim 5 is characterized in that, this first heat treatment step comprises baking.
8. color filter making method according to claim 1 is characterized in that, the technological temperature of dry this color pigment comprises 90 ℃~120 ℃.
9. color filter making method according to claim 1 is characterized in that, also is included in after this separation layer of patterning, carries out one second heat treatment step comprehensively.
10. color filter making method according to claim 9 is characterized in that, the technological temperature of this second heat treatment step comprises 200 ℃~240 ℃.
11. color filter making method according to claim 9 is characterized in that, this second heat treatment step comprises baking.
12. color filter making method according to claim 1 is characterized in that, the summation of formed this separation layer and this black matrix" thickness is more than or equal to the twice of this colored light-filtering units thickness.
13. color filter making method according to claim 1 is characterized in that, the thickness of formed this colored light-filtering units equals the thickness of this black matrix" haply.
14. color filter making method according to claim 1 is characterized in that, comprises by the mode of ink jet printing inserting this color pigment in these a plurality of pixel regions.
15. color filter making method according to claim 1 is characterized in that, the shape of this separation material comprises column.
16. a colored filter is characterized in that, comprising:
One transparent substrates;
One black matrix" is disposed on this transparent substrates, and defines a plurality of pixel regions on this substrate;
A plurality of colored light-filtering units are disposed at respectively in these a plurality of pixel regions; And
At least one separation material is disposed on this black matrix", and this separation material is to form a separation layer when forming colored light-filtering units on this black matrix", and this separation layer patterning is formed.
17. colored filter according to claim 16 is characterized in that, the material of this separation material comprises photosensitive material.
18. colored filter according to claim 16 is characterized in that, the summation of the height of this separation material and this black matrix" thickness is more than or equal to the twice of this colored light-filtering units thickness.
19. colored filter according to claim 16 is characterized in that, the thickness of this colored light-filtering units equals the thickness of this black matrix" haply.
20. colored filter according to claim 16 is characterized in that, the material of this transparent substrates comprises glass.
21. colored filter according to claim 16 is characterized in that, the material of this colored light-filtering units comprises resin.
22. colored filter according to claim 16 is characterized in that, the shape of this separation material comprises column.
CNB2007100036041A 2007-01-18 2007-01-18 Color filter and manufacture method therefor CN100464224C (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9884782B2 (en) 2014-04-04 2018-02-06 Corning Incorporated Treatment of glass surfaces for improved adhesion

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101226946B (en) * 2008-02-18 2010-11-24 友达光电股份有限公司 Initiative array substrate, liquid crystal display panel and manufacturing method thereof
CN101726783B (en) * 2008-10-13 2011-09-21 华映视讯(吴江)有限公司 Method for manufacturing colored filtering substrate
CN102213785A (en) * 2011-06-03 2011-10-12 深圳市华星光电技术有限公司 Method, optical mask and photoreaction layer for making substrate of color filter
CN102636904B (en) * 2012-04-16 2015-07-22 深圳市华星光电技术有限公司 Color filter and production method thereof as well as liquid crystal panel
US8792077B2 (en) 2012-04-16 2014-07-29 Shenzhen China Star Optoelectronics Technology Co., Ltd. Color filter, manufacturing method thereof, and liquid crystal panel with the same
US9276029B1 (en) * 2015-01-20 2016-03-01 Omnivision Technologies, Inc. Optical isolation grid over color filter array
US10503064B2 (en) 2017-09-15 2019-12-10 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Method for manufacturing color filter substrate
CN107479246A (en) * 2017-09-15 2017-12-15 深圳市华星光电半导体显示技术有限公司 The preparation method of color membrane substrates
CN107505766B (en) * 2017-10-12 2020-05-05 深圳市华星光电半导体显示技术有限公司 Color film substrate, manufacturing method thereof and structure for increasing thickness of film layer
CN108051944A (en) * 2017-12-29 2018-05-18 深圳市华星光电技术有限公司 A kind of method and colored filter of the colored filter for preparing low segment difference
CN107991726A (en) * 2017-12-29 2018-05-04 深圳市华星光电技术有限公司 A kind of method and colored filter of inkjet printing manufacture colored filter

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08166507A (en) * 1994-12-15 1996-06-25 Canon Inc Production of color filter for liquid crystal, color filter for liquid crystal and liquid crystal panel equipped with that color filter
US6208401B1 (en) * 1999-07-19 2001-03-27 Industrial Technology Research Institute Liquid crystal panel and method for producing the same
CN1291289A (en) * 1998-12-21 2001-04-11 精工爱普生股份株式会社 Color filter and method of manufacture thereof
CN1431527A (en) * 2002-01-11 2003-07-23 财团法人工业技术研究院 Method for manufacturing color filter by use of micro flow liquid
US20040100596A1 (en) * 2002-11-26 2004-05-27 Hannstar Display Corporation Method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate
CN1892265A (en) * 2005-07-08 2007-01-10 鸿富锦精密工业(深圳)有限公司 Method for making colour-filter

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08166507A (en) * 1994-12-15 1996-06-25 Canon Inc Production of color filter for liquid crystal, color filter for liquid crystal and liquid crystal panel equipped with that color filter
CN1291289A (en) * 1998-12-21 2001-04-11 精工爱普生股份株式会社 Color filter and method of manufacture thereof
US6208401B1 (en) * 1999-07-19 2001-03-27 Industrial Technology Research Institute Liquid crystal panel and method for producing the same
CN1431527A (en) * 2002-01-11 2003-07-23 财团法人工业技术研究院 Method for manufacturing color filter by use of micro flow liquid
US20040100596A1 (en) * 2002-11-26 2004-05-27 Hannstar Display Corporation Method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate
CN1892265A (en) * 2005-07-08 2007-01-10 鸿富锦精密工业(深圳)有限公司 Method for making colour-filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9884782B2 (en) 2014-04-04 2018-02-06 Corning Incorporated Treatment of glass surfaces for improved adhesion

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