CN111965883B - Display screen and manufacturing method thereof - Google Patents
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- CN111965883B CN111965883B CN202010786077.1A CN202010786077A CN111965883B CN 111965883 B CN111965883 B CN 111965883B CN 202010786077 A CN202010786077 A CN 202010786077A CN 111965883 B CN111965883 B CN 111965883B
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- 230000031700 light absorption Effects 0.000 claims description 33
- 230000003287 optical effect Effects 0.000 claims description 18
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- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000002834 transmittance Methods 0.000 claims description 6
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Human Computer Interaction (AREA)
- Multimedia (AREA)
- Theoretical Computer Science (AREA)
- Image Input (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention discloses a display screen, comprising: the liquid crystal display comprises a TFT array substrate, a liquid crystal layer and a color filter layer, wherein the liquid crystal layer is positioned above the TFT array substrate; the color filter layer is positioned above the liquid crystal layer; the color filter layer comprises a sensing area and a non-sensing area, and the sensing area comprises a fingerprint identification sensor. The display screen can reduce development difficulty of the display and photosensitive fingerprint identification sensor to the greatest extent, maintains the manufacturing process of the conventional display driving TFT to the greatest extent, realizes the function of fingerprint induction and acquisition while ensuring the display function, and realizes fingerprint identification.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display screen and a manufacturing method thereof.
Background
The optical fingerprint identification technology replaces the capacitive fingerprint identification technology to become the standard of portable electronic products under the pushing of the requirements of 'full screen' surge, 'information security' and the like. The recent two years of optical fingerprint identification technology has seen rapid development and occupies a large part of market share. The fingerprint identification inductor works on the principle that when a finger touches the display device, the light source reflects when irradiating the valley line and the ridge line of the finger fingerprint, and the fingerprint identification inductor projects light onto the fingerprint identification inductor due to different reflection angles of the valley line and the ridge line and different reflected illumination intensities, and the fingerprint identification inductor transmits a received induction signal to the fingerprint identification signal receiving unit through the fingerprint signal line so that the fingerprint identification signal receiving unit can identify the valley line and the ridge line of the fingerprint according to the received signal.
In the prior art, the optical fingerprint technology is mostly used in an Organic Light Emitting Diode (OLED) display, and is formed in an externally hung manner under a pixel electrode, and integrated optical fingerprint module structures such as a sensor, a driving IC and the like are used for realizing fingerprint identification. Liquid Crystal Displays (LCDs) generally adopt a backlight structure, and control the brightness of a light emitting area through the combination of liquid crystals and polarizers, and implement color display in combination with color filters, at this time, due to structural limitations, optical fingerprint modules cannot be arranged, or the optical fingerprint modules are arranged, so that the existing process route needs to be adjusted greatly, the manufacturing cost is greatly increased, and the accuracy of fingerprint identification is low, so that the requirements cannot be met.
Accordingly, the prior art has drawbacks and improvements are urgently needed.
Disclosure of Invention
The invention aims to develop an optical fingerprint identification light path and a process route suitable for LCD and improve the fingerprint identification accuracy.
In order to achieve the above object, the present invention provides a display screen, including a TFT array substrate; the liquid crystal layer is positioned above the TFT array substrate; a color filter layer positioned above the liquid crystal layer; the color filter layer comprises a sensing area and a non-sensing area, and the sensing area comprises a fingerprint identification sensor.
In particular, the sensing area comprises a plurality of repeating units, each repeating unit comprises R, G, B three sub-pixels and one fingerprint identification sensor, and a black matrix is arranged between the sub-pixels and the fingerprint identification sensor and between the sub-pixels.
In particular, an optical path structure is arranged above each fingerprint sensor.
In particular, the light path structure includes a plurality of light absorbing layers and a planar layer disposed between the plurality of light absorbing layers; the light absorption layer is provided with a plurality of light holes, and the light holes with the same positions on the light absorption layer form a collimation hole.
In particular, the depth of the collimation hole is 2-6 μm, and the depth-to-width ratio is more than 5:1.
in particular, the thickness of the light absorbing layer is 50nm to 2 μm.
In particular, the light absorbing layer has a transmittance of less than 1% and the flat layer has a transmittance of greater than 95%.
In particular, the light passing holes are circular holes.
The invention also provides a display screen manufacturing method, which is characterized by comprising the following steps:
step S1, forming a black matrix pattern on a glass substrate of a color filter layer, wherein the black matrix pattern comprises a sensing area pattern and a non-sensing area pattern;
step S2, patterning of the R, G, B color resistance layer is completed in sequence;
step S3, arranging a fingerprint identification sensor on the sensing area pattern of the black matrix;
s4, forming a transparent layer on the color filter layer, and arranging a light path structure in the transparent layer corresponding to the position above the fingerprint identification sensor;
and S5, aligning and attaching the color filter layer and the TFT array substrate, and injecting liquid crystal between the color filter layer and the TFT array substrate to obtain the display screen.
Particularly, the light path structure is manufactured by alternately forming the light absorption layers and the flat layers, wherein each light absorption layer is formed by etching and curing independently or a plurality of light absorption layers are formed by etching and curing simultaneously.
The invention has the beneficial effects that: the display screen and the manufacturing method thereof can reduce the development difficulty of the display and photosensitive fingerprint identification sensor to the greatest extent, maintain the manufacturing process of the conventional display driving TFT to the greatest extent, realize the function of fingerprint sensing and acquisition while ensuring the display function, maintain the opening ratio of display pixels, reduce the display brightness loss, improve the signal to noise ratio of fingerprint signals and improve the identification precision.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a schematic cross-sectional structure of a display screen according to an embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a color filter layer of a display screen according to an embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a light path structure of a display screen according to an embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a light absorption layer of a display screen according to an embodiment of the present invention.
Fig. 5 is a flowchart of a method for manufacturing a display screen according to an embodiment of the present invention.
Fig. 6 is a flow chart of a method for manufacturing a light path structure of a display screen according to an embodiment of the invention.
Fig. 7 is a flow chart of another manufacturing method of the display screen optical path structure according to the embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to fall within the scope of the invention.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the present invention, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the description of the present invention, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically connected, electrically connected or can be communicated with each other; can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of two elements or the interaction relationship of the two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art according to the specific circumstances.
In the present invention, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, as well as the first and second features not being in direct contact but being in contact with each other through additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. In order to simplify the present disclosure, components and arrangements of specific examples are described below. They are, of course, merely examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not themselves indicate the relationship between the various embodiments and/or arrangements discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the application of other processes and/or the use of other materials.
The following describes specific embodiments in detail with reference to the drawings.
As shown in fig. 1, an embodiment of the present invention provides a display screen 100, which includes a TFT array substrate 101, a liquid crystal layer 102 disposed on the TFT array substrate 101, a color filter layer 103 disposed above the liquid crystal layer 102, and a transparent layer 104 disposed on the color filter layer 103. The color filter layer 103 is divided into an induction area and a non-induction area according to functions, and the induction area is provided with a fingerprint identification sensor 201, and can receive and sense optical signals reflected by valley lines and ridge lines on a finger fingerprint and perform fingerprint identification. The fingerprint identification sensor is arranged on the color filter layer and the TFT display driving film layer is arranged on the upper substrate and the lower substrate, so that the development difficulty of the display and photosensitive fingerprint identification sensor can be reduced to the greatest extent, the manufacturing process of the conventional display driving TFT can be maintained to the greatest extent, the fingerprint sensing and collecting functions are added while the display function is ensured, and the fingerprint identification is realized.
As shown in fig. 2, the sensing area of the color filter layer includes a plurality of repeating units 1030, each repeating unit includes R, G, B three sub-pixels 1031 and one fingerprint identification sensor 201, a Black Matrix (BM) 1032 is disposed between the sub-pixels 1031 and the fingerprint identification sensor 201 and between the sub-pixels 1031, and a fingerprint signal area received by each fingerprint identification sensor 201 is in a range of 80-200 μm. The positional relationship between the three sub-pixels 1031 of the fingerprint sensor 201 and R, G, B shown in fig. 2 is merely illustrative of one possible arrangement. The fingerprint identification sensor is arranged in the area between the display pixels of the repeating units, and the area is an opaque area, and because the area through which the common circuit driving grid wires pass is normally covered by a Black Matrix (BM), the fingerprint identification sensor is arranged at the position, so that the opening ratio of the display pixels can be maintained to the greatest extent, and the display brightness loss is reduced. Because the bottom of the fingerprint identification sensor is opaque, the display brightness loss can be reduced to the greatest extent by arranging the fingerprint identification sensor on the side of the color filter layer, and interference signals in the cell, such as liquid crystal scattering light signals, light signals reflected by a bottom metal circuit, influence of electric leakage of a TFT bottom driving circuit and the like, are reduced, and the signal to noise ratio of the fingerprint signals is improved. If the fingerprint identification sensor is arranged on one side of the TFT array substrate, the existing TFT is required to be made to be changed, the manufacturing cost is increased, the production efficiency is reduced, the fingerprint identification sensor also blocks light emitted from the bottom, and accordingly the display brightness is reduced.
As shown in fig. 1, an optical path structure 202 is further disposed above each of the fingerprint recognition sensors, and the optical path structure is disposed in the transparent layer 104 above the color filter layer 102. As shown in fig. 3, the optical path structure 202 includes a plurality of light absorbing layers 2021 and a flat layer 2022 disposed between the light absorbing layers, and the material of the light absorbing layers 2021 may be an inorganic metal material such as Cr, mo, mn, etc., a metal oxide material such as CrOx, moOx, mnO, etc., or a mixed film formed of metal and metal oxide. The light absorbing layer may also be made of an organic black resin material.
In this embodiment, the transmittance of the light absorbing layer is lower than 1% and the reflectance is lower than 5%, so that the accuracy of fingerprint identification is improved on the basis of ensuring the display effect.
The light absorbing layer 2021 is filled with a planarization layer 2022, and the planarization layer 2022 may be an organic transparent film layer, such as transparent photoresist, epoxy, transparent PI, PLN, PVA, PMMA, PS, and the like.
As shown in fig. 3 to 4, the light-absorbing layers 2021 are formed with a plurality of light-transmitting holes 2023 by etching, the positions and sizes of the light-transmitting holes 2023 on different light-absorbing layers 2021 are completely identical, the light-transmitting holes 2023 on the same positions on the plurality of light-absorbing layers 2021 form a plurality of collimation holes 2024 penetrating the whole light path structure from top to bottom and allowing light to pass through, and the collimation holes 2024 are formed so that the light signal of the finger fingerprint above can smoothly reach the fingerprint identification sensor below the collimation holes and be received.
In the optical path structure 202, the flat layer 2022 has the following functions: firstly, the distance between two adjacent light absorption layers is increased, so that the difficult problem that a black light absorption material with a larger thickness is difficult to process is solved; secondly, the substrate used as the upper light absorption layer requires higher flatness of the flat layer filled between the adjacent light absorption layers, and the preparation of the upper light absorption layer and the alignment between the upper light absorption layer and the lower light absorption layer are not affected; thirdly, when the light transmission hole needs to be filled, the transmittance of the flat layer is preferably more than 95% for passing the effective fingerprint signal.
For the collimation holes 2024 formed by the light-passing holes 2023, whether to fill the transparent material can be determined according to actual needs, if the medium surrounding the light path is air, the collimation holes do not need to be filled with the transparent material; and when other media are arranged around the light path and the surrounding media are not allowed to enter the light path, the transparent material is adopted to fill the light through hole.
The arrangement of the light transmission holes in the embodiment of the invention can effectively block other external interference signals and improve the signal to noise ratio of fingerprint signals, but the thickness of the light path structure also affects the thickness of the display screen, which is unfavorable for the development trend of the current display screen for lightening and thinning, as shown in fig. 3, the preferred thickness t of the light absorption layer is 50nm-2 μm, the depth d of the collimation holes is 2 μm-6 μm, the width is w, and the depth-width ratio d/w of the collimation holes is preferably greater than 5:1, so that the thickness problem of the display screen is considered while the higher fingerprint identification accuracy is obtained.
The shape of the light-passing hole 2023 may be square, rectangular or circular, and the light-passing hole 2023 is preferably circular in this embodiment.
The embodiment of the invention also provides a display screen manufacturing method, as shown in fig. 5, which specifically comprises the following steps:
step S1, a black matrix material is coated on a glass substrate of a color filter layer, and is subjected to photoetching and development to form a black matrix pattern, wherein the black matrix pattern comprises a corresponding sensing area pattern and a corresponding non-sensing area pattern according to a sensing area and a non-sensing area which are functionally divided on the color filter layer, and the sensing area pattern can be etched to form a preset arrangement position of a fingerprint identification sensor during patterning.
And step S2, sequentially completing the patterning of the R, G, B color resistance layer on the black matrix pattern.
And step S3, arranging a fingerprint identification sensor on the sensing area pattern of the black matrix pattern.
And S4, forming a transparent layer on the color filter layer, and arranging a light path structure in the transparent layer corresponding to the position above the fingerprint identification sensor to finish the manufacture of the color filter layer and the transparent layer.
And S5, aligning and attaching the color filter layer and the TFT array substrate, and injecting liquid crystal between the color filter layer and the TFT array substrate to obtain the display screen. The process route of other components is the same as that of the normal display screen process.
By the manufacturing method, development difficulty of the display and photosensitive fingerprint identification sensor can be reduced to the greatest extent, the manufacturing process of the conventional display driving TFT can be maintained to the greatest extent, the fingerprint sensing and collecting functions are added while the display function is ensured, and fingerprint identification is realized. The fingerprint identification sensor is arranged on the color filter layer, so that the display brightness of the display screen is maintained, the signal-to-noise ratio of fingerprint signals is improved, and the identification accuracy is improved.
In some embodiments, the optical path structure 202 includes a plurality of light absorbing layers 2021 and a flat layer 2022 disposed between the light absorbing layers, and the optical path structure 202 may employ a process step of individually etching, curing and molding each light absorbing layer as shown in fig. 6:
first, a light-absorbing layer material is coated on the glass substrate 1 to form a first one of the light-absorbing layers 2021.
Next, the light-absorbing layer 2021 is subjected to photolithography and development, and a plurality of light-transmitting holes 2023 are formed in the light-absorbing layer 2021 and then cured.
Again, a transparent planarization layer material is coated on the light absorbing layer 2021 to form a planarization layer 2022.
Finally, light-absorbing layers 2021 and flat layers 2022 are alternately formed on the upper surface of the flat layer 2022 in the same manner, so as to obtain the optical path structure 202. The positions and sizes of the light-transmitting holes 2023 in the plurality of light-absorbing layers 2021 are identical. The light-passing holes 2023 in the same positions on the plurality of light-absorbing layers 2021 form collimation holes 2024.
When the process method of independently etching each light absorption layer is adopted, a light resistance layer which is arranged on one side close to the mask plate can be adopted as a buffer layer during etching of the first light absorption layer, the light resistance layer is transparent photoresist and is sensitive to ultraviolet light, and can be decomposed under ultraviolet light with certain intensity, so that the light transmission area light resistance layer on the mask plate is unstable during photoetching, the light absorption layer at the light transmission area is preferentially etched, the light absorption layer of the light absorption area of the mask plate still keeps stable, thus the manufacture of a preset pattern is completed, then the first light absorption layer is formed by heating and solidifying, other light absorption layers are sequentially manufactured, and when the light absorption layer above is etched, the light absorption layer below can be adopted as a mask plate (mask) for manufacturing the light absorption layer above, thus the accuracy of light path alignment can be kept, and the dislocation and the loss of opening accuracy of light holes on a plurality of light absorption layers in the conventional process can be reduced as much as possible.
In other embodiments, the light path structure may further adopt a process step of etching, curing and molding a plurality of light absorbing layers at the same time as shown in fig. 7:
first, a light-absorbing layer material is coated on the glass substrate 1 to form a first light-absorbing layer 2021.
Next, a flat layer material is coated on the first light absorbing layer 2021 to form a transparent flat layer 2022.
Again, the light-absorbing layer material and the flat layer material are alternately coated on the upper surface of the flat layer 2022 in this order in the same manner, to obtain a laminated structure of a plurality of light-absorbing layers 2021 and a plurality of flat layers 2022.
Finally, the laminated structure is subjected to photolithography and development, and a plurality of light-transmitting holes 2023 are etched in the plurality of light-absorbing layers 2021, thereby obtaining the light path structure 202. The light-transmitting holes 2023 in the same position on the plurality of light-absorbing layers 2021 are formed to be identical in position and size, and the collimation holes 2024 are formed in the same position on the plurality of light-absorbing layers 2021.
The process method for simultaneously etching the light absorption layers can reduce the times of etching and developing, improves the manufacturing efficiency of the light path structure, and is more beneficial to improving the production efficiency of the process.
According to the requirements of the light path structure, transparent materials can be filled in the collimating holes or the light passing holes, and the transparent materials can be the same as the flat layer material or can be other transparent materials with smaller refractive indexes.
When the light absorption layer is etched, wet etching, such as chemical solvent etching, or dry etching, such as laser etching, focused ion beam etching or electron beam etching, can be used.
In the foregoing embodiments, the descriptions of the embodiments are emphasized, and for parts of one embodiment that are not described in detail, reference may be made to related descriptions of other embodiments.
The foregoing has described in detail embodiments of the present invention, and specific examples have been employed herein to illustrate the principles and embodiments of the present invention, the above description of the embodiments being only for the purpose of aiding in the understanding of the technical solution and core idea of the present invention; those of ordinary skill in the art will appreciate that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (8)
1. A display screen, comprising:
a TFT array substrate;
the liquid crystal layer is positioned above the TFT array substrate;
a color filter layer positioned above the liquid crystal layer; the color filter layer comprises an induction area and a non-induction area, and the induction area comprises a fingerprint identification sensor;
an optical path structure corresponding to the fingerprint identification sensor is arranged above each fingerprint identification sensor;
each light path structure comprises a plurality of light absorbing layers and a flat layer arranged among the plurality of light absorbing layers; the light absorption layer is provided with a plurality of light holes, and the light holes with the same positions on the light absorption layer form a collimation hole.
2. The display screen of claim 1, wherein the sensing area comprises a plurality of repeating units, each repeating unit comprising R, G, B three sub-pixels and one of the fingerprint recognition sensors, a black matrix being disposed between the sub-pixels and the fingerprint recognition sensors and between the sub-pixels.
3. The display screen of claim 1, wherein the collimating aperture has a depth of 2 μm to 6 μm and an aspect ratio of greater than 5:1.
4. a display screen as recited in claim 1, wherein the light absorbing layer has a thickness of 50nm-2 μm.
5. A display screen as recited in claim 1, wherein the light absorbing layer has a transmittance of less than 1% and the flat layer has a transmittance of greater than 95%.
6. The display screen of claim 1, wherein the light-passing holes are circular holes.
7. A method of manufacturing a display screen, comprising the steps of:
step S1, forming a black matrix pattern on a glass substrate of a color filter layer, wherein the black matrix pattern comprises a sensing area pattern and a non-sensing area pattern;
step S2, patterning of the R, G, B color resistance layer is completed in sequence;
step S3, arranging a fingerprint identification sensor on the sensing area pattern of the black matrix;
s4, forming a transparent layer on the color filter layer, and arranging a light path structure in the transparent layer at a position corresponding to the position above the fingerprint identification sensor, wherein the light path structure corresponds to the fingerprint identification sensor one by one, and the light path structure comprises a plurality of light absorption layers and a flat layer arranged among the light absorption layers; the light absorption layer is provided with a plurality of light transmission holes, and the light transmission holes with the same positions on the light absorption layer form a collimation hole;
and S5, aligning and attaching the color filter layer and the TFT array substrate, and injecting liquid crystal between the color filter layer and the TFT array substrate to obtain the display screen.
8. The method of manufacturing according to claim 7, wherein the light path structure is manufactured by alternately forming light-absorbing layers and flat layers, wherein each light-absorbing layer is formed by etching and curing alone or a plurality of light-absorbing layers are formed by etching and curing simultaneously.
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Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1880982A (en) * | 2005-06-17 | 2006-12-20 | 鸿富锦精密工业（深圳）有限公司 | Color filter and preparation method thereof |
| JP2007133059A (en) * | 2005-11-09 | 2007-05-31 | Epson Imaging Devices Corp | Electro-optical device, method for manufacturing the same, and electronic apparatus |
| CN101008733A (en) * | 2007-01-18 | 2007-08-01 | 友达光电股份有限公司 | Color filter and manufacture method therefor |
| CN103955679A (en) * | 2014-05-19 | 2014-07-30 | 上海天马微电子有限公司 | Color film substrate, array substrate and display device |
| CN104881196A (en) * | 2015-06-23 | 2015-09-02 | 京东方科技集团股份有限公司 | Substrate and display screen |
| CN105911781A (en) * | 2016-06-15 | 2016-08-31 | 深圳爱易瑞科技有限公司 | Display panel manufacturing method and liquid crystal cell manufacturing method |
| CN108415188A (en) * | 2018-05-02 | 2018-08-17 | 上海中航光电子有限公司 | A kind of liquid crystal display panel, display device and its unlocked by fingerprint method |
| TW201909023A (en) * | 2017-07-17 | 2019-03-01 | 金佶科技股份有限公司 | Image capturing apparatus |
| CN110472617A (en) * | 2019-08-29 | 2019-11-19 | 维沃移动通信有限公司 | Display module and electronic equipment |
| CN110727135A (en) * | 2019-10-28 | 2020-01-24 | 厦门天马微电子有限公司 | Color film substrate, display panel and display device |
| CN110928028A (en) * | 2019-11-29 | 2020-03-27 | 武汉华星光电技术有限公司 | Display panel |
-
2020
- 2020-08-06 CN CN202010786077.1A patent/CN111965883B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1880982A (en) * | 2005-06-17 | 2006-12-20 | 鸿富锦精密工业（深圳）有限公司 | Color filter and preparation method thereof |
| JP2007133059A (en) * | 2005-11-09 | 2007-05-31 | Epson Imaging Devices Corp | Electro-optical device, method for manufacturing the same, and electronic apparatus |
| CN101008733A (en) * | 2007-01-18 | 2007-08-01 | 友达光电股份有限公司 | Color filter and manufacture method therefor |
| CN103955679A (en) * | 2014-05-19 | 2014-07-30 | 上海天马微电子有限公司 | Color film substrate, array substrate and display device |
| CN104881196A (en) * | 2015-06-23 | 2015-09-02 | 京东方科技集团股份有限公司 | Substrate and display screen |
| CN105911781A (en) * | 2016-06-15 | 2016-08-31 | 深圳爱易瑞科技有限公司 | Display panel manufacturing method and liquid crystal cell manufacturing method |
| TW201909023A (en) * | 2017-07-17 | 2019-03-01 | 金佶科技股份有限公司 | Image capturing apparatus |
| CN108415188A (en) * | 2018-05-02 | 2018-08-17 | 上海中航光电子有限公司 | A kind of liquid crystal display panel, display device and its unlocked by fingerprint method |
| CN110472617A (en) * | 2019-08-29 | 2019-11-19 | 维沃移动通信有限公司 | Display module and electronic equipment |
| CN110727135A (en) * | 2019-10-28 | 2020-01-24 | 厦门天马微电子有限公司 | Color film substrate, display panel and display device |
| CN110928028A (en) * | 2019-11-29 | 2020-03-27 | 武汉华星光电技术有限公司 | Display panel |
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|---|---|
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