JP2001188117A - Method of manufacturing for part of optoelectronic device - Google Patents

Method of manufacturing for part of optoelectronic device

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Publication number
JP2001188117A
JP2001188117A JP37160499A JP37160499A JP2001188117A JP 2001188117 A JP2001188117 A JP 2001188117A JP 37160499 A JP37160499 A JP 37160499A JP 37160499 A JP37160499 A JP 37160499A JP 2001188117 A JP2001188117 A JP 2001188117A
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method
electro
manufacturing
optical device
forming region
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JP3988067B2 (en )
Inventor
Satoru Kataue
Hiroshi Kiguchi
Masaharu Shimizu
Yoshiaki Yamada
善昭 山田
浩史 木口
政春 清水
悟 片上
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Seiko Epson Corp
セイコーエプソン株式会社
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Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a part of an optoelectronic device in which influence of difference in a condition for drying a liquid sub stance is suppressed with a simple construction and no color and color tone irregularity and no uneven brightness exist.
SOLUTION: The method for manufacturing the part of the optoelectronic device is provided with a step to discharge the specified liquid substance 17 on respective pixels 13 on a substrate, equipped with a pixels forming region in which the plural pixels 13 are continuously formed with a prescribed interval and a pixels nonforming region 19 in which no pixel is formed ranging wider than the prescribed interval, and to discharge the liquid substance 17 on a part of the pixels nonforming region 19 surrounding the pixels forming region, and a step to dry the discharged liquid substance.
COPYRIGHT: (C)2001,JPO

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、カラーフィルタ、 BACKGROUND OF THE INVENTION The present invention, a color filter,
エレクトロルミネセンス素子マトリクス等の、電気光学装置部品の製造方法に関する。 Such as electroluminescent elements matrix, a method of manufacturing an electro-optical device components. 特に、基板上の各画素が形成される位置にそれぞれ微小インク滴等の液状物を吐出して製造される電気光学装置部品について、乾燥速度を制御することによって、乾燥後の表面を平坦化する技術に関する。 In particular, the electro-optical device components manufactured by discharging a liquid material such as minute ink droplets at respective positions each pixel on the substrate is formed, by controlling the drying speed, to flatten the surface after drying about the technology.

【0002】 [0002]

【従来の技術】カラーフィルタ等の電気光学装置部品の製造方法として、インクジェット法を応用した方法が提案されている。 The production method of the prior art electro-optical device components such as a color filter, a method of applying an ink jet method has been proposed. この方法では、透明基板上に仕切りをマトリクス状に形成した後、インクジェット法を用いて液状物を仕切り内に塗布する。 In this method, after forming a partition in a matrix on a transparent substrate, applying a liquid substance into the partition by an inkjet method.

【0003】かかる従来の電気光学装置部品の製造方法においては、液状物吐出時には基板上の仕切りより上方に盛り上がる程度に液状物を付与する。 [0003] In such a conventional method of manufacturing an electro-optical device components, at the time of liquid material discharged supplying the liquid substance to the extent that rises above the partition on the substrate. これを所定温度でベークし乾燥及び硬化させると体積が減り、平坦化する。 When this is baked and dried and cured at a predetermined temperature reduces the volume, to flatten.

【0004】 [0004]

【発明が解決しようとする課題】しかしながら、例えばカラーフィルタに於いて、吐出するインクのレベリング性の制御が不十分であると、乾燥時のインクの体積が大きすぎて基板上の仕切りより上方に盛り上がってしまったり、乾燥時の体積が小さすぎてへこんだ形状になってしまったりすることがある。 [SUMMARY OF THE INVENTION However, for example, at the color filter, the control of the leveling of the ink to be ejected is insufficient, the volume of the ink during drying is too large above the partition board or've raised, there is to be or has become a recessed shape of the volume is too small when dry.

【0005】図1は、インク吐出直後及び乾燥後における画素のインク面の状態を示す断面図である。 [0005] Figure 1 is a sectional view showing a state of the ink surface of the pixel in the immediately after ink ejection and drying. 図1 Figure 1
(a)〜(c)の各図において、符号21はインク吐出直後のインク面であり、符号22はインクを乾燥及び固化させた場合のインク面である。 In each figure (a) ~ (c), reference numeral 21 denotes an ink surface immediately after the ink ejection, reference numeral 22 denotes an ink surface when dried and solidified ink. 各図に示されるように、インク吐出直後のインク面21の盛り上がりは、図1(a)〜(c)で違いがない。 As shown in the figures, swelling of the ink surface 21 immediately after ink ejection, there is no difference in FIG. 1 (a) ~ (c). しかし、インクを乾燥及び固化させた場合のインク面22は、図1(a)では画素の仕切りより上側に盛り上がっており、図1(b) However, the ink surface 22 when ink is dried and solidified is raised above the partition of the pixel in FIG. 1 (a), FIG. 1 (b)
では画素の仕切りの上端より下方に凹んでおり、図1 In is recessed below the partition of the upper end of the pixel, Fig. 1
(c)では仕切りの上端とほぼ同じ高さで、インク面も平坦である。 (C) the at substantially the same height as the partition of the upper end, the ink surface is also flat.

【0006】このように乾燥後のインク面に差が生じるのは、インクの量及び濃度が同一でも、乾燥条件が異なるからである。 [0006] The difference in the ink surface after drying thus occurs, even in the same amount and concentration of the ink, the drying conditions are different. 例えばインクを吐出後、高温条件下で乾燥させると、乾燥が速く進み、図1(b)のようにインクの体積が小さくなる傾向にある。 After discharging for example ink, and dried under high-temperature conditions, drying proceeds rapidly, there is a tendency that the volume of the ink is reduced as shown in FIG. 1 (b). 逆に低温条件下で乾燥させると、乾燥が遅くなり、図1(a)のように乾燥後のインクの体積がさほど小さくならない傾向にある。 Drying at low temperature under conditions contrary, drying becomes slow, there is a tendency that the volume of the ink after drying is not less reduced as shown in FIG. 1 (a).

【0007】そこで、乾燥後のインク面を図1(c)に示すような所望の状態にするには、インクの乾燥条件の制御が必要となる。 [0007] Therefore, in the ink surface after drying to the desired state as shown in FIG. 1 (c), it is necessary to control the drying conditions of the ink. しかしながら、同じカラーフィルタ基板上の画素間にもインク面のばらつきが生じることがある。 However, there is a variation of the ink surface in between pixels of the same color filter substrate is produced. 特に、画素形成領域の周縁部の画素と中央部の画素との間、および、カラーフィルタ基板周縁部の画素と中央部の画素との間にばらつきが生じている。 In particular, between the pixels of the pixel and the central portion of the periphery of each pixel forming region, and the variation occurs between the pixel of the pixel and the central portion of the color filter substrate periphery. これは、 this is,
画素形成領域の周縁部の乾燥速度が中央部より速く、基板周縁部の乾燥速度が基板中央部より速いことに起因すると考えられる。 Drying speed of the periphery of the pixel forming region faster than the central portion, the drying rate of the substrate peripheral portion is considered to be due to faster than the center of the substrate. このような同一基板上のレベリング性の差は、色むら、色調差の原因となって好ましくない。 Difference in leveling property on such same substrate, uneven color, unfavorably causing the difference in color tone.

【0008】この乾燥速度の違いを解決するためには、 [0008] In order to solve the differences of the drying rate,
中央部の画素の乾燥を速めるためのメカニカルな工夫も考えられるが、その設計は必ずしも容易ではない。 Mechanical contrivance to speed up drying of the pixel of the central portion are also contemplated, but the design is not always easy.

【0009】そこで、本発明は、簡単な構成で液状物の乾燥条件の差を抑え、色むら、色調むら、光度むらのない電気光学装置部品の製造方法を提供することを目的とする。 [0009] Therefore, the present invention is to suppress the difference in the drying conditions of the liquid product with a simple structure, and an object color unevenness, color unevenness, to provide a method of manufacturing an electro-optical device components without luminosity unevenness.

【0010】 [0010]

【課題を解決するための手段】そこで本発明の電気光学装置部品の製造方法は、複数の画素が所定間隔をもって連続形成される画素形成領域と前記所定間隔以上にわたって画素が形成されない非形成領域とを備える基板上の当該各画素に所定の液状物を吐出し、かつ、前記非形成領域の一部に、前記画素形成領域を取り囲んで前記液状物を吐出する工程と、前記吐出した液状物を乾燥させる工程とを備える。 Therefore a method of manufacturing an electro-optical device components of the present invention, in order to solve the problem] has a non-formation region in which a plurality of pixels is not the pixel is formed over the predetermined distance between the pixel forming region which is continuously formed at predetermined intervals ejecting a predetermined liquid material to the respective pixels on a substrate comprising, and, the part of the non-forming region, a step of discharging the liquid material surrounding the pixel forming region, the discharged liquid product and a step of drying.

【0011】これにより、画素領域内の液状物の乾燥条件を均一にし、乾燥後の表面を均一にすることができ、 [0011] Thus, a uniform drying conditions of the liquid of the pixel region can be made uniform surface after drying,
色むら、色調むら、光度むらのない電気光学装置部品を製造することができる。 It is possible to produce color unevenness, color unevenness, no intensity unevenness electro-optical device components.

【0012】また、本発明の電気光学装置部品の製造方法において、前記基板は、前記非形成領域によって複数の画素形成領域に区分され、前記画素形成領域の各々が複数の画素を備えて1枚の電気光学装置部品を構成してもよい。 [0012] In the method of manufacturing the electro-optical device components of the present invention, the substrate, the by non-forming region is divided into a plurality of pixel formation regions, one each of the pixel forming region includes a plurality of pixels electro-optical device components may be configured.

【0013】また、本発明の電気光学装置部品の製造方法において、前記基板はカラーフィルタ基板であって、 [0013] In the method of manufacturing the electro-optical device components of the present invention, the substrate is a color filter substrate,
前記液状物としてインクを吐出するものでもよい。 Ink may be one which discharges as the liquid. これにより、乾燥後のインク面を平坦にすることが容易となり、色むら、色調むらのないカラーフィルタを製造することができる。 Thus, the ink surface after drying becomes easy to flat, color unevenness can be produced without color irregularity color filter.

【0014】また、本発明の電気光学装置部品の製造方法において、前記複数の画素形成領域の各々を取り囲んで前記液状物を吐出することとしてもよい。 [0014] In the method of manufacturing the electro-optical device components of the present invention, it is also possible to eject the liquid material surrounds each of the plurality of pixel formation region.

【0015】また、前記非形成領域内の吐出域には、前記非形成領域と前記複数の画素形成領域との境界線を形成する画素に吐出する液状物の量と少なくとも同量の液状物を吐出することが望ましい。 Further, the on the discharge region of the non-forming region, wherein the amount of at least the same amount of liquid substance of the liquid product to be discharged to the pixels forming the boundary line between the non-forming region and the plurality of pixel forming region discharge it is desirable to.

【0016】また、本発明の電気光学装置部品の製造方法において、前記複数の画素形成領域の全体を取り囲んで前記液状物を吐出することとしてもよい。 Further, in the method for manufacturing an electro-optical device components of the present invention, it is also possible to eject the liquid material surrounding the entire of the plurality of pixel formation region.

【0017】また、前記非形成領域内の吐出域には、基板中の最も外側の画素に吐出する液状物の量と少なくとも同量の液状物を吐出することが望ましい。 [0017] wherein the discharge area of ​​the non-forming region, it is desirable to discharge at least the same amount of liquid material to the amount of liquid material to be discharged to the outermost pixel in the substrate.

【0018】また、本発明の電気光学装置部品の製造方法において、前記複数の画素形成領域の各々を取り囲んで前記液状物を吐出する第1の吐出域と、前記複数の画素形成領域の全体を取り囲んで前記液状物を吐出する第2の吐出域とを備えることとしてもよい。 [0018] In the method for manufacturing an electro-optical device components of the present invention, the first discharge zone for discharging the liquid material surrounds each of the plurality of pixel forming region, the whole of the plurality of pixel forming region it may be provided with a second discharge area for discharging the liquid material surrounding.

【0019】また、前記第2の吐出域は、前記第1の吐出域より外側に形成されることとしてもよい。 Further, the second discharge zone, may be formed on the outer side than the first discharge zone.

【0020】また、本発明の電気光学装置部品の製造方法において、前記非形成領域内の吐出域は、前記画素形成領域との境界付近に形成されることが望ましい。 Further, in the method for manufacturing an electro-optical device components of the present invention, the discharge region of the non-forming region is preferably formed in the vicinity of the boundary between the pixel forming region.

【0021】 [0021]

【発明の実施の形態】まず、本発明の第1の実施の形態によるカラーフィルタの製造方法について、図面を参照して説明する。 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, a method of manufacturing the color filter of the first embodiment of the present invention will be described with reference to the drawings.

【0022】(カラーフィルタの構成)図2に、この実施形態でカラーフィルタを製造する際に用いられるカラーフィルタ基板の平面形状を示す。 [0022] (Configuration of a color filter) in FIG. 2 shows a planar shape of the color filter substrate used for manufacturing a color filter in this embodiment. 図3は、図2の符号Aで示す円内の拡大図である。 Figure 3 is an enlarged view in a circle indicated by symbol A in FIG.

【0023】図2に示されるように、カラーフィルタ基板12は、1枚のカラーフィルタとなるパネルチップ1 [0023] As shown in FIG. 2, the color filter substrate 12, the panel chip 1 serving as one color filter
1が、平面上に複数並べられた状態となっている。 1, has a plurality ordered state on a plane. この実施形態では、1枚のカラーフィルタ基板12は、8× In this embodiment, one color filter substrate 12, 8 ×
12=96枚のパネルチップ11から構成されている。 And a 12 = 96 panels chip 11.
カラーフィルタの製造時には、これら複数のパネルチップ11に対してまとめてインクの吐出及び乾燥の処理を行い、その後、パネルチップ単位に切り離してカラーフィルタとする。 When manufacturing a color filter, together with respect to the plurality of panels chip 11 performs the processing of ejection and drying of the ink, then the color filter detach the panel chip unit.

【0024】図3に示されるように、パネルチップ11 [0024] As shown in FIG. 3, panel chip 11
は、マトリクス状に並んだ画素13を備え、画素と画素の境目は、仕切り14によって区切られている。 Is provided with a pixel 13 arranged in a matrix, pixels and boundary pixels are separated by a partition 14. そして、複数の画素13が仕切り14を介して連続形成される画素形成領域の外側には、画素が形成されない非形成領域19がある。 And, on the outside of the pixel forming region in which a plurality of pixels 13 are continuously formed through the partition 14, there is a non-forming region 19 where the pixel is not formed.

【0025】カラーフィルタの製造の際には、上記画素13の1つ1つに、赤、緑、青のいずれかのインクを数滴ずつ吐出する。 [0025] in the manufacture of color filters, in each one of the pixel 13, to discharge the red, green, by several drops of one of blue ink. 図3の例では赤、緑、青の配置をいわゆるモザイク型としたが、3色が均等に配置されていれば、ストライプ型など、その他の配置でも構わない。 Red in the example of FIG. 3, green, has been a so-called mosaic arrangement of blue, if it is three colors uniformly arranged, stripe like, or may be other arrangements.

【0026】図4は、図3のB−B'線断面図である。 [0026] FIG. 4 is a line B-B 'sectional view of FIG.
カラーフィルタ基板を構成するパネルチップ11は、透光層15と、遮光層である仕切り14とを備えている。 Panel chip 11 constituting the color filter substrate includes a transparent layer 15, and a partition 14 is light-shielding layer.
仕切り14が形成されていない(除去された)部分は、 Partition 14 is not formed (removed) portion,
上記画素13を形成する。 To form the pixel 13. この画素13に各色の液状インクを吐出し、乾燥および固化させることにより、カラーフィルタとなる。 Ejecting respective colors of liquid ink in the pixel 13, by drying and solidification, the color filter.

【0027】(吐出インクの配置)本発明では、パネルチップのうち画素が形成されない非形成領域に、複数の画素が連続形成される画素形成領域を取り囲むようにインク滴を吐出し、画素形成領域の周縁部の乾燥条件を、 [0027] In (discharge arrangement of ink) In the present invention, the non-forming region where pixels are not formed among the panel chip, ejecting ink droplets so as to surround the pixel forming region in which a plurality of pixels are successively formed, the pixel forming region the drying conditions of the peripheral portion of,
画素形成領域の中央部の乾燥条件に近づけることによって、画素形成領域の周縁部の乾燥速度を適切に制御する。 By approaching the drying conditions of the central portion of the pixel forming region, to properly control the drying speed of the periphery of each pixel forming region.

【0028】図5及び図6を用いて、本発明の実施例を具体的に説明する。 [0028] Figure 5 and with reference to FIG. 6, a description will be given of an embodiment of the present invention in detail. 図5は、本実施形態によるカラーフィルタの製造方法におけるインクの吐出パターンと、パネルチップにおける画素の配置との平面的位置関係を示したものである。 Figure 5 is a graph showing the ejection pattern of ink in a method for manufacturing a color filter according to the present embodiment, the planar positional relationship between the arrangement of pixels in the panel chip. 図5の符号13は、各画素の位置を示す。 Reference numeral 13 in FIG. 5 shows the position of each pixel. 符号17は、インクの吐出位置を示す。 Reference numeral 17 denotes a discharge position of the ink. この図に示されるように、パネルチップ上の各画素にインクを吐出するとともに、画素が形成されない領域にも、画素形成領域との境界に沿ってインクを吐出する。 As shown in this figure, as well as ejecting ink to each pixel on the panel chip, even in a region where pixels are not formed, to eject ink along the boundary between the pixel forming region. 特に、画素形成領域と非形成領域との境界線を形成する画素に対して、非形成領域側にもう1列の画素がある場合と同等に、いわばダミーのインク滴を吐出する第1のダミー領域を設ける。 In particular, equivalent to the case with respect to pixels forming the boundary line between the pixel forming region and a non-forming region, there is a pixel in another row in the non-formation region side, a first dummy to speak ejecting ink droplets of the dummy providing the area.

【0029】この場合、第1のダミー領域には、隣接する画素1つにつき、画素形成領域における1画素あたりのインク滴の量と同じかそれ以上のインク滴を、吐出することが望ましい。 [0029] In this case, the first dummy area, per one pixel 1 adjacent, equal to or more ink droplets and the amount of ink droplets per pixel in the pixel forming region, it is desirable to discharge. 例えば、画素形成領域における1画素あたりのインク滴が約70ピコリットルであるとすれば、画素形成領域と非形成領域との境界線を形成する画素の隣にも、70ピコリットルまたはそれ以上のインク滴を吐出する。 For example, if the ink droplets per one pixel in the pixel forming region is about 70 picoliters, and next to the pixels forming the boundary line between the pixel forming region and a non-forming region, 70 picoliters or more ejecting ink droplets.

【0030】これにより、パネルチップの周縁部に位置する画素のインク乾燥条件と、パネルチップの中央部に位置する画素のインク乾燥条件を近づけることができる。 [0030] Thus, it is possible to close the ink drying conditions of the pixels located at the periphery of the panel chip, the ink drying conditions of a pixel positioned at the center of the panel chip. 画素以外の部分に吐出するインクの色は、特に限定されない。 Inks to be ejected to a portion other than pixels is not particularly limited. また、インクの吐出順序は特に限定されず、 The discharge order of the ink is not limited in particular,
インクジェットヘッドの移動距離など、カラーフィルタの製造効率を考慮してプログラムすればよい。 And moving distance of the ink-jet head may be programmed by considering the production efficiency of the color filter.

【0031】実際にインクを吐出して実験を行ったところ、従来の方法では、画素間の色ばらつきΔEが7であったが、本実施形態では、ΔEが3以下に収まり、ばらつきの小さいカラーフィルタを製造することができた。 [0031] was carried out actually experimentally by ejecting ink, in the conventional method, the color is a color variation Delta] E between the pixel is a 7, in the present embodiment, Delta] E is fit to 3 below, small variations It was able to manufacture the filter.

【0032】図6は、ダミー領域の配置を示す平面図である。 [0032] FIG. 6 is a plan view showing the arrangement of the dummy region. 図6に示すように、上記第1のダミー領域31の外側でかつカラーフィルタ基板12の周縁部に沿って、 As shown in FIG. 6, along the periphery of the outer and and the color filter substrate 12 of the first dummy area 31,
複数の画素形成領域の全体を取り囲むように第2のダミー領域32を設ける。 A second dummy region 32 is provided so as to surround the whole of the plurality of pixel forming region. この第2のダミー領域32に吐出する単位面積当たりのインク量は、カラーフィルタに吐出されるインク滴の単位面積当たりのインク量と同等にすることが望ましい。 The ink amount per unit area discharged to the second dummy region 32 is desirably equal to the amount of ink per unit area of ​​the ink droplets ejected on the color filter. また、第2のダミー領域には、基板中の最も外側の画素に対するインク滴の量と少なくとも同量のインク滴を吐出する。 The second dummy region, ejects ink droplets of the amount of at least the same amount of ink droplets most relative to the outer pixels in the substrate. これにより、カラーフィルタ基板の周縁部に位置する画素のインク乾燥条件と、 Thus, the ink drying conditions pixels located on the periphery of the color filter substrate,
カラーフィルタ基板の中央部に位置する画素のインク乾燥条件を近づけることができる。 It can be brought close to the ink drying conditions of a pixel positioned at the center of the color filter substrate.

【0033】実際にインクを吐出して実験を行ったところ、従来の方法では、全チップ間の色ばらつきΔEが7 [0033] was carried out actually experimentally by ejecting ink, in the conventional method, the color variation ΔE between all chips 7
であったが、本実施形態では、ΔEが3以下に収まり、 Although there was a, in the present embodiment, Delta] E is fit to 3 below,
ばらつきの小さいカラーフィルタを製造することができた。 It could be produced small variations color filter.

【0034】(カラーフィルタの製造工程)以下、本実施形態の製造方法によるカラーフィルタの製造工程につき、更に詳細に説明する。 [0034] (a color filter manufacturing process) Hereinafter, the manufacturing process of a color filter according to the manufacturing method of the present embodiment will be described in more detail.

【0035】膜厚0.7mm、たて38cm、横30c [0035] thickness of 0.7mm, vertical 38cm, horizontal 30c
mの無アルカリガラスからなる透明基板の表面を、熱濃硫酸に過酸化水素水を1重量%添加した洗浄液で洗浄し、純水でリンスした後、エア乾燥を行って清浄表面を得る。 The surface of the transparent substrate made of alkali-free glass of m, the hydrogen peroxide solution was washed with 1 wt% addition of washing solution in hot concentrated sulfuric acid, rinsed with pure water to obtain a clean surface by performing an air drying. この表面に、スパッタ法によりクロム膜を平均0.2μmの膜厚で形成し、金属層を得た。 On the surface, a chromium film was formed in an average film thickness of 0.2μm by sputtering to obtain a metal layer. この金属層の表面に、フォトレジストOFPR−800(東京応化製)をスピンコートした。 On the surface of the metal layer, the photoresist OFPR-800 (product of Tokyo Ohka Kogyo Co., Ltd.) was spin-coated. 基板はホットプレート上で、 The substrate on a hot plate,
80℃で5分間乾燥し、フォトレジスト層を形成した。 At 80 ° C. and dried for 5 minutes to form a photoresist layer.

【0036】この基板表面に、所要のマトリクスパターン形状を描画したマスクフィルムを密着させ、紫外線で露光をおこなった。 [0036] The substrate surface is brought into close contact with the mask film drawn the required matrix pattern shape was subjected to exposure with ultraviolet light. 次に、これを、水酸化カリウムを8 Next, this, potassium hydroxide 8
重量%の割合で含むアルカリ現像液に浸漬して、未露光の部分のフォトレジストを除去し、レジスト層をパターニングした。 Was immersed in an alkaline developing solution containing a ratio of weight percent, the photoresist is removed in portions of the unexposed and patterned resist layer. 続いて、露出した金属層を、塩酸を主成分とするエッチング液でエッチング除去した。 Subsequently, the exposed metal layer was removed by etching with an etching solution mainly composed of hydrochloric acid. このようにして所定のマトリクスパターンを有する遮光層(ブラックマトリクス)を得た。 There was thus obtained a light-shielding layer (black matrix) having a prescribed matrix pattern. 遮光層の膜厚は、およそ0.2 Thickness of the light-shielding layer is approximately 0.2
μmであった。 It was μm. また、遮光層の幅は、およそ22μmであった。 The width of the light blocking layer was about 22 .mu.m.

【0037】この基板上に、さらにネガ型の透明アクリル系の感光性樹脂組成物をやはりスピンコート法で塗布した。 [0037] On this substrate was further again the photosensitive resin composition of the transparent acrylic negative spin coated. 100℃で20分間プレベークした後、所定のマトリクスパターン形状を描画したマスクフィルムを用いて紫外線露光を行った。 After prebaking for 20 minutes at 100 ° C., it was UV exposure using a mask film drawn with a predetermined matrix pattern. 未露光部分の樹脂を、やはりアルカリ性の現像液で現像し、純水でリンスした後スピン乾燥した。 The resin of the unexposed portion, also developed with alkaline developer, and spin-dried after rinsing with pure water. 最終乾燥としてのアフターベークを200℃ After-baking as the final drying 200 ° C.
で30分間行い、樹脂部を十分硬化させ、バンク層を形成した。 Performed in 30 minutes, the resin portion was sufficiently cured, thereby forming a bank layer. このバンク層の膜厚は、平均で2.7μmであった。 The thickness of the bank layer was 2.7μm on average. また、バンク層の幅は、およそ14μmであった。 In addition, the width of the bank layer was about 14μm. そして、遮光層は、その上面でおよそ4μmの幅のリング状露出面が形成されていた。 Then, the light-shielding layer is ring-shaped exposed surface of the width of approximately 4μm in its upper surface was formed.

【0038】得られた遮光層およびバンク層で区画された着色層形成領域のインク濡れ性を改善するため、ドライエッチング、すなわち大気圧プラズマ処理を行った。 [0038] To improve the ink wettability of the resulting colored layer forming region defined by the light shielding layer and the bank layer, dry etching, that is, the atmospheric pressure plasma treatment was performed.
ヘリウムに酸素を20%加えた混合ガスに高電圧を印加し、プラズマ雰囲気を大気圧内でエッチングスポットに形成し、基板を、このエッチングスポット下を通過させてエッチングし、バンク層とともに着色層形成領域(ガラス基板の露出面)の活性化処理を行った。 A high voltage is applied to oxygen helium 20% mixed gas was added, the plasma atmosphere was formed into an etching spot within atmospheric pressure, the substrate is etched by passing under the etching spot, the colored layer formed with the bank layer the activation treatment areas (the exposed surface of the glass substrate) were carried out. この処理の直後、対比テストプレートでの水に対する接触角は、バンク層上で平均50°であったのに対し、ガラス基板上では平均35°であった。 Immediately after this treatment, the contact angle with water at comparison test plate, whereas an average 50 ° on the bank layer, an average 35 ° is on the glass substrate.

【0039】この着色層形成領域に、インクジェットプリンティングヘッドから色材であるインクを高精度で制御しつつ吐出し、インクを塗布した。 [0039] The colored layer forming region, the ink is a coloring material from an ink jet printing head ejecting while controlling with high accuracy, the ink was applied. インクジェットプリンティングヘッドには、ピエゾ圧電効果を応用した精密ヘッドを使用し、20ピコリットルの微小インク滴を着色形成領域毎に3〜8滴、選択的に飛ばした。 The inkjet printing head, using a precision head that applies piezoelectric effect, 3-8 drops of fine ink droplets of 20 picoliter per coloring formation region, flew selectively. ヘッドよりターゲットである着色層形成領域への飛翔速度、飛行曲がり、サテライトと称される分裂迷走滴の発生防止のためには、インクの物性はもとよりヘッドのピエゾ素子を駆動する電圧と、その波形が重要である。 Flying speed of the colored layer forming region is the target of the head, ink deflection, for prevention of the satellite called division stray droplets and voltage properties of the ink for driving the piezoelectric elements of well head, the waveform is important. 従って、 Therefore,
あらかじめ条件設定された波形をプログラムして、インク滴を赤、緑、青の3色を同時に塗布して所定の配色パターンの着色層を形成した。 Program the pre condition setting waveform, ink droplets red, green, and simultaneously applying the three colors of blue to form a colored layer of a predetermined color scheme.

【0040】インクとしては、ポリウレタン樹脂オリゴマーに無機顔料を分散させた後、低沸点溶剤としてシクロヘキサノンおよび酢酸ブチルを、高沸点溶剤としてブチルカルビトールアセテートを加え、さらに非イオン系界面活性剤0.01重量%を分散剤として添加し、粘度6〜8センチポアズとしたものを用いた。 [0040] As the ink, after dispersing the inorganic pigment in a polyurethane resin oligomer, cyclohexanone and butyl acetate as a low-boiling solvent, butyl carbitol acetate was added as a high-boiling solvent, further nonionic surfactant 0.01 added% by weight dispersing agent used was a viscosity 6-8 centipoise.

【0041】塗布後の乾燥は、自然雰囲気中で3時間放置してインク層のセッティングを行った後、80℃のホットプレート上で40分間加熱し、最後にオーブン中で200℃で30分間加熱してインク層の硬化処理を行って、着色層を得た。 The drying after coating, after the setting of the ink layer to stand for 3 hours in a natural atmosphere, then heated at 80 ° C. on a hot plate for 40 minutes and finally heated for 30 minutes at 200 ° C. in an oven performing a curing process of the ink layer, to obtain a colored layer. この条件によって着色層、特にその透過部における膜厚のばらつきを10%以下に抑制することが出来、結果として着色層の色調の色差を3以下、 Colored layer by this condition, in particular the variation of the thickness at the transmission unit can be suppressed to 10% or less, the color difference of the color tone of the resulting colored layer 3 or less,
さらには2以下に抑制できた。 Furthermore it was suppressed to 2 or less.

【0042】上記基板に、透明アクリル樹脂塗料をスピンコートして平滑面を有するオーバーコート層を得た。 [0042] The substrate to obtain an overcoat layer having a smooth surface by spin coating a transparent acrylic resin coating material.
さらに、この上面にITOからなる電極層を所要パターンで形成して、カラーフィルタとした。 Further, an electrode layer made of ITO on the upper surface and formed in a required pattern, and a color filter. 得られたカラーフィルタは、熱サイクル耐久試験、紫外線照射試験、加湿試験等の耐久試験に合格し、液晶表示装置などの要素基板として十分用い得ることを確認した。 The resulting color filter, heat cycle durability test, ultraviolet irradiation test, passed the endurance tests such as humidification test, it was confirmed that can sufficiently used as an element substrate such as a liquid crystal display device.

【0043】(他の電気光学装置部品の例)上記の実施形態は、電気光学装置部品としてカラーフィルタを例にとって説明したが、これに限らず、EL(エレクトロルミネセンス)表示装置に用いられるEL素子マトリクス、MLA(マイクロレンズアレイ)など、液状物を塗布して乾燥させる工程を備えた種々の電気光学装置部品に、本発明を適用することができる。 The above embodiment (Examples of other electro-optical device components) is, EL is a color filter as an electro-optical device components has been described as an example, which is not limited thereto, used in EL (electroluminescence) display device elements matrix, such as MLA (microlens array), a variety of electro-optical device components having a step of drying by applying a liquid material, it is possible to apply the present invention.

【0044】 [0044]

【発明の効果】本発明によれば、液状物の乾燥条件を、 According to the present invention, the drying condition of the liquid material,
画素形成領域の周縁部と中央部、又は基板の周縁部と中央部で均一化することにより、色むら、色調むら、光度むらのない電気光学装置部品の製造方法を提供することができる。 Peripheral portion and the central portion of the pixel forming region, or by equalizing the peripheral portion and the central portion of the substrate, it is possible to provide color unevenness, color unevenness, a production method without the electro-optical device components luminosity unevenness.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】インク吐出直後及び乾燥後における画素のインク面の状態を示す断面図である。 1 is a cross-sectional view showing a state of the ink surface of the pixel in the immediately after ink ejection and drying.

【図2】本発明の実施形態でカラーフィルタを製造する際に用いられるカラーフィルタ基板の平面図である。 [2] In an embodiment of the present invention is a plan view of a color filter substrate used for manufacturing a color filter.

【図3】図2の符号Aで示す円内の拡大図である。 3 is an enlarged view in a circle indicated by symbol A in FIG.

【図4】図3のB−B'線断面図である。 4 is a line B-B 'sectional view of FIG.

【図5】本実施形態によるカラーフィルタの製造方法におけるインクの吐出パターンと、パネルチップにおける画素の配置との平面的位置関係を示した図である。 5 is a diagram showing a planar positional relationship of the ejection pattern of ink in a method for manufacturing a color filter according to the present embodiment, the arrangement of pixels in the panel chip.

【図6】ダミー領域の配置を示す平面図である。 6 is a plan view showing the arrangement of the dummy region.

【符号の説明】 DESCRIPTION OF SYMBOLS

13…画素、17…液状物、19…非形成領域、21… 13 ... pixel 17 ... liquid material, 19 ... non-forming region, 21 ...
インク吐出直後のインク面、22…インク乾燥後のインク面、12…基板、11…パネルチップ、14…仕切り、15…透光層、31…第1のダミー領域、32…第2のダミー領域 The ink surface immediately after the ink ejection, the ink surface after 22 ... ink drying, 12 ... substrate, 11 ... panel chip, 14 ... partition, 15 ... light transmitting layer, 31 ... first dummy region, 32 ... second dummy area

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl. 7識別記号 FI テーマコート゛(参考) G09F 9/30 365 B41J 3/04 101Y (72)発明者 山田 善昭 長野県諏訪市大和3丁目3番5号 セイコ ーエプソン株式会社内 (72)発明者 清水 政春 長野県諏訪市大和3丁目3番5号 セイコ ーエプソン株式会社内 Fターム(参考) 2C056 EA04 EC07 EC28 EC72 FB01 FC06 HA46 2H048 BA11 BA45 BA47 BA64 BB14 BB24 BB28 2H091 FA02Y FA35Y FB02 FB13 FC01 FC12 FC22 FC27 FD04 FD05 GA16 LA18 5C094 AA03 AA07 AA08 AA42 AA43 AA48 AA55 BA27 CA19 CA24 DA13 EB02 ED01 ED03 ED15 FA01 FA02 FB01 FB02 GB10 5G435 AA00 AA04 AA17 BB05 CC09 CC12 FF13 GG02 GG12 HH20 KK05 KK07 ────────────────────────────────────────────────── ─── of the front page continued (51) Int.Cl. 7 identification mark FI theme Court Bu (reference) G09F 9/30 365 B41J 3/04 101Y ( 72) inventor Yoshiaki Yamada Nagano Prefecture Suwa Yamato 3-chome No. 3 5 No. Seiko over Epson within Co., Ltd. (72) inventor Masaharu Shimizu Suwa City, Nagano Prefecture Yamato 3-chome No. 3 No. 5 Seiko over Epson Corporation in the F-term (reference) 2C056 EA04 EC07 EC28 EC72 FB01 FC06 HA46 2H048 BA11 BA45 BA47 BA64 BB14 BB24 BB28 2H091 FA02Y FA35Y FB02 FB13 FC01 FC12 FC22 FC27 FD04 FD05 GA16 LA18 5C094 AA03 AA07 AA08 AA42 AA43 AA48 AA55 BA27 CA19 CA24 DA13 EB02 ED01 ED03 ED15 FA01 FA02 FB01 FB02 GB10 5G435 AA00 AA04 AA17 BB05 CC09 CC12 FF13 GG02 GG12 HH20 KK05 KK07

Claims (10)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 複数の画素が所定間隔をもって連続形成される画素形成領域と前記所定間隔以上にわたって画素が形成されない非形成領域とを備える基板上の当該各画素に所定の液状物を吐出し、かつ、前記非形成領域の一部に、前記画素形成領域を取り囲んで前記液状物を吐出する工程と、前記吐出した液状物を乾燥させる工程とを備える、電気光学装置部品の製造方法。 1. A discharging a plurality of pixels given liquid product in the respective pixels on the substrate and a non-forming region where pixels are not formed over the pixel forming region which is continuously formed at predetermined intervals the above predetermined intervals, and, wherein a portion of the non-forming region, a step of discharging the pixel forming region the surrounding said liquid material, and a step of drying the discharged liquid material, method of manufacturing the electro-optical device components.
  2. 【請求項2】 請求項1に記載の電気光学装置部品の製造方法であって、 前記基板は、前記非形成領域によって複数の画素形成領域に区分され、前記画素形成領域の各々が複数の画素を備えて1枚の電気光学装置部品を構成する、電気光学装置部品の製造方法。 2. A method of manufacturing an electro-optical device component according to claim 1, wherein the substrate, the by non-forming region is divided into a plurality of pixel formation regions, each plurality of pixels of the pixel forming region constituting one of the electro-optical device components includes a method of manufacturing the electro-optical device components.
  3. 【請求項3】 請求項2に記載の電気光学装置部品の製造方法であって、 前記基板はカラーフィルタ基板であって、前記液状物としてインクを吐出する、電気光学装置部品の製造方法。 3. A method of manufacturing an electro-optical device component according to claim 2, wherein the substrate is a color filter substrate, the ink is ejected as the liquid product, the method of manufacturing an electro-optical device components.
  4. 【請求項4】 請求項2又は請求項3に記載の電気光学装置部品の製造方法であって、 前記複数の画素形成領域の各々を取り囲んで前記液状物を吐出する、電気光学装置部品の製造方法。 4. A method of manufacturing an electro-optical device component according to claim 2 or claim 3, ejecting the liquid material surrounds each of the plurality of pixel forming region, the production of electro-optical device components Method.
  5. 【請求項5】 請求項4に記載の電気光学装置部品の製造方法であって、 前記非形成領域内の吐出域には、前記非形成領域と前記複数の画素形成領域との境界線を形成する画素に吐出する液状物の量と少なくとも同量の液状物を吐出する、電気光学装置部品の製造方法。 5. A method of manufacturing an electro-optical device component according to claim 4, wherein the discharge area of ​​the non-forming region, forming a boundary line between the non-forming region and the plurality of pixel forming region the amount and discharging at least the same amount of liquid product, the method of manufacturing an electro-optical device components of the liquid product to be discharged to the pixels.
  6. 【請求項6】 請求項2又は請求項3に記載の電気光学装置部品の製造方法であって、 前記複数の画素形成領域の全体を取り囲んで前記液状物を吐出する、電気光学装置部品の製造方法。 6. A method of manufacturing an electro-optical device component according to claim 2 or claim 3, ejecting the liquid material surrounding the entire of the plurality of pixel forming region, the production of electro-optical device components Method.
  7. 【請求項7】 請求項6に記載の電気光学装置部品の製造方法であって、 前記非形成領域内の吐出域には、基板中の最も外側の画素に吐出する液状物の量と少なくとも同量の液状物を吐出する、電気光学装置部品の製造方法。 7. A method of manufacturing an electro-optical device component according to claim 6, wherein the discharge area of ​​the non-forming region is at least as to the amount of liquid material to be discharged to the outermost pixels in the substrate discharging the amount of liquid product, the method of manufacturing an electro-optical device components.
  8. 【請求項8】 請求項2又は請求項3に記載の電気光学装置部品の製造方法であって、 前記複数の画素形成領域の各々を取り囲んで前記液状物を吐出する第1の吐出域と、前記複数の画素形成領域の全体を取り囲んで前記液状物を吐出する第2の吐出域とを備える、電気光学装置部品の製造方法。 8. A method of manufacturing an electro-optical device component according to claim 2 or claim 3, the first discharge zone for discharging the liquid material surrounds each of the plurality of pixel forming region, second and a discharge zone, a method of manufacturing an electro-optical device components for ejecting the liquid material surrounding the entire of the plurality of pixel formation region.
  9. 【請求項9】 請求項8に記載の電気光学装置部品の製造方法であって、 前記第2の吐出域は、前記第1の吐出域より外側に形成される、電気光学装置部品の製造方法。 9. A method of manufacturing an electro-optical device component according to claim 8, wherein the second discharge region, said first discharge region than is formed on the outside, a method of manufacturing an electro-optical device components .
  10. 【請求項10】 請求項1乃至請求項9のいずれか一項に記載の電気光学装置部品の製造方法であって、 前記非形成領域内の吐出域は、前記画素形成領域との境界付近に形成される電気光学装置部品の製造方法。 10. A method of manufacturing an electro-optical device component according to any one of claims 1 to 9, the discharge region of the non-forming region is in the vicinity of a boundary between the pixel forming region method of manufacturing an electro-optical device components formed.
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US7055932B2 (en) 2002-03-19 2006-06-06 Seiko Epson Corporation Method of filling liquid into function liquid droplet ejection head, and ejection apparatus; method of manufacturing LCD device, organic EL device, electron emission device, PDP device, electrophoretic display device, color filter, and organic EL; and method of forming spacer, metallic wiring, lens, resist, and light diffusion member
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