JP5835651B2 - Manufacturing method of color filter - Google Patents

Description

  The present invention relates to a method for manufacturing a color filter used in a liquid crystal display device or the like.

  In recent years, liquid crystal display devices and organic EL display devices have been put to practical use as flat displays. In these display devices, in general, a color filter is provided in order to extract only light having a desired wavelength from the light from the light source or to improve the color purity of the light from the light source. In general, the color filter is provided in a predetermined pattern on the substrate, is provided in a black matrix layer that shields light from the light source, and an opening (colored layer forming region) between the black matrix layers. And a colored layer that transmits only light having a desired wavelength.

  Proposed as a method for producing a color filter is a method for producing a color filter comprising a step of forming a black matrix layer on a substrate and a step of forming a colored layer of a plurality of colors in openings between the black matrix layers. (For example, refer to Patent Document 1). Each colored layer is a layer formed by patterning a photosensitive colored layer material by a photolithography method including an exposure process and a development process. By using a photolithography method, each colored layer can be processed with high accuracy, and thus a high-definition color filter can be manufactured.

  FIGS. 11A to 11D are plan views showing a process for forming a colored layer of a conventional color filter. This figure shows a process of forming a red colored layer, for example. First, a colored layer coating solution containing a colored layer material on the entire surface of the substrate 11 on which the black matrix layer 50 having the plurality of colored layer forming regions 20a, 30a, and 40a shown in FIG. 210 is applied (see application process, FIG. 11B). Next, the colored layer material 220 obtained by heating the colored layer coating liquid 210 is exposed using an exposure mask 25 having an opening 26 and a light shielding part 27 (see FIG. 11C). . Next, the colored layer material 220 is developed to form the colored layer 200 (see FIG. 11D). Such a series of steps is repeated a plurality of times to form a colored layer of a plurality of colors.

  There has also been proposed a method for manufacturing a color filter, further comprising a step of forming a photo spacer by photolithography after forming a plurality of colored layers. By using the photolithography method, the photo spacer can be processed with high accuracy. Therefore, it is possible to manufacture a small color filter that requires a small photo spacer and is suitable for mobile use.

  12A to 12D are plan views showing a process for forming a photo spacer of a conventional color filter. First, a spacer coating liquid 1310 containing a spacer material is applied to the entire surface of the substrate 11 on which the black matrix layer 50 and the colored layers 200, 300, and 400 shown in FIG. FIG. 12 (b)). Next, the spacer material 1320 obtained by heating the spacer coating liquid 1310 is exposed using an exposure mask 135 having an opening 136 and a light shielding portion 137 (see FIG. 12C). Next, the spacer material 1320 is developed to form a photospacer 1300 (see FIG. 12D).

JP 2010-271576 A

  However, for example, in a color filter having three colored layers, the area of the red colored layer 200 is 1/3 or less of the area of the color filter. Therefore, most of the colored layer coating liquid 210 applied to the entire surface of the substrate 11 is wasted without forming the colored layer 200. The same applies to colored layers of other colors.

  Further, the area of the photo spacer 1300 is smaller than the area of the colored layer. Therefore, most of the spacer coating liquid 1310 applied to the entire surface of the substrate 11 is wasted without constituting the photo spacer 1300.

  Such useless use of the colored layer coating liquid 210 and the spacer coating liquid 1310 contributes to the inability to reduce the manufacturing cost of the color filter.

  The present invention has been made in consideration of such points, and an object of the present invention is to provide a color filter manufacturing method capable of manufacturing a color filter at low cost.

The first color filter manufacturing method according to the present invention includes:
Preparing a substrate;
In any one of the first colored layer forming region for the first colored layer, the second colored layer forming region for the second colored layer, and the third colored layer forming region for the third colored layer on the substrate, A coating process for applying the photosensitive colored layer coating liquid corresponding to the region, leaving a portion where the colored layer coating liquid is not applied in the other colored layer forming area; and
An exposure step of exposing the substrate after the coating step;
A development step of developing the substrate after the exposure step.

In the first method for producing a color filter according to the present invention,
In the coating step, the colored layer coating solution may be applied by an inkjet method.

In the first method for producing a color filter according to the present invention,
In the coating step, the colored layer coating solution may be applied in a stripe shape.

The second color filter manufacturing method according to the present invention includes:
Preparing a substrate;
On the substrate, a first colored layer forming region for the first colored layer, a second colored layer forming region for the second colored layer, a third colored layer forming region for the third colored layer, and a fourth colored layer forming region for the fourth colored layer. 4 colored layer forming regions are arranged in this order, in any one of the first colored layer forming region, the second colored layer forming region, the third colored layer forming region, and the fourth colored layer forming region, An application step of applying a photosensitive coloring layer coating liquid corresponding to a region, and applying a photosensitive coloring layer coating solution corresponding to the one area away from the area; ,
An exposure step of exposing the substrate after the coating step;
A development step of developing the substrate after the exposure step.

In the second method for producing a color filter according to the present invention,
In the coating step, the colored layer coating solution may be applied by an inkjet method.

In the second method for producing a color filter according to the present invention,
In the coating step, the colored layer coating solution may be applied in a stripe shape.

A third color filter manufacturing method according to the present invention includes:
Preparing a substrate having a plurality of colored layers and a black matrix layer;
A coating process for coating a photosensitive spacer coating solution on and around the spacer forming region on the substrate;
An exposure step of exposing the substrate after the coating step;
A development step of developing the substrate after the exposure step.

In the third method for producing a color filter according to the present invention,
In the application step, the spacer coating liquid may be applied by an inkjet method.

In the third method for producing a color filter according to the present invention,
In the coating step, the spacer coating liquid may be applied in a stripe shape.

  According to the present invention, the photosensitive colored layer coating liquid corresponding to the first colored layer forming region, the second colored layer forming region, and the third colored layer forming region on the substrate is applied to the region. In other colored layer forming regions, the coating is applied leaving a portion where the colored layer coating solution is not applied. That is, the amount of the color layer coating liquid applied to an unnecessary area where the color layer is not formed is reduced. Thereby, the usage-amount of the coating liquid for colored layers can be decreased. Furthermore, a small amount of developer is required, or the life of the developer is prolonged. Therefore, a color filter can be manufactured at low cost.

FIG. 1 is a longitudinal sectional view showing a display device according to a first embodiment of the present invention. FIG. 2 is a plan view showing a color filter in the first embodiment of the present invention. 3A to 3D are views showing a method for manufacturing a color filter according to the first embodiment of the present invention. 4A to 4D are plan views showing a colored layer forming step of forming a plurality of colored layers on the substrate in the first embodiment of the present invention. FIGS. 5A to 5F are plan views showing a colored layer forming step subsequent to FIG. 6A to 6C are views showing a method for manufacturing a color filter according to the second embodiment of the present invention. FIGS. 7A to 7D are plan views showing a colored layer forming step of forming a plurality of colored layers on a substrate in the second embodiment of the present invention. 8A to 8C are plan views showing a colored layer forming step following FIG. 9A to 9C are views showing a method for manufacturing a color filter according to the third embodiment of the present invention. FIGS. 10A to 10D are plan views showing a spacer forming step for forming a plurality of spacers on a substrate in the third embodiment of the present invention. 11A to 11D are plan views showing a process of forming a colored layer of a conventional color filter. 12A to 12D are plan views showing a process for forming a photo spacer of a conventional color filter.

  Embodiments of the present invention will be described below with reference to the drawings. In the drawings attached to the present specification, for the sake of illustration and ease of understanding, the scale, the vertical / horizontal dimension ratio, and the like are appropriately changed and exaggerated from those of the actual ones.

(First embodiment)
First, the entire display device 60 in the present embodiment will be described with reference to FIG.

Display Device As shown in FIG. 1, the display device 60 includes a color filter 10 and a display unit 18 that is disposed to face the color filter 10 and emits light toward the color filter 10.

  Among these, the color filter 10 includes a substrate 11, a black matrix layer (BM layer) 50 provided on the substrate 11, a plurality of first colored layers 20, second colored layers 30 provided between the BM layers 50, and And a third colored layer 40. The display unit 18 includes a TFT substrate 15 and a liquid crystal 17 that is interposed between the TFT substrate 15 and the color filter 10 and is controlled by a voltage from the TFT substrate 15. The display unit 18 further includes a backlight unit and a polarizing plate (not shown). By using such a display unit 18, light can be selectively emitted toward the color filter 10. Note that “selectively emit light” means that the light intensity is adjusted according to the unit pixel of the display device 60.

  As shown in FIG. 1, the colored layers 20, 30, 40 and the BM layer 50 of the color filter 10 may be covered with the overcoat film 12. This protects the colored layers 20, 30, 40 and the BM layer 50 from the external environment and prevents impurities contained in the colored layers 20, 30, 40 and the BM layer 50 from flowing out. it can. Further, as shown in FIG. 1, a columnar photo spacer 13 may be formed on the overcoat film 12. As a result, the thickness of the space filled with the liquid crystal 17, the so-called cell gap, can be kept constant.

Color Filter Next, the color filter 10 will be described in detail with reference to FIG. FIG. 2 is a plan view showing the color filter 10 as viewed from the direction of arrow II in FIG. For convenience of explanation, the overcoat film 12 of the color filter 10 is omitted in FIG. 2 and the subsequent drawings.

(substrate)
First, the substrate 11 of the color filter 10 will be described. As the substrate 11, various materials that can appropriately support the colored layers 20, 30, 40 and the BM layer 50 and have transparency are used. For example, glass or polymer is used.

(BM layer)
Next, the BM layer 50 of the color filter 10 will be described. The BM layer 50 is configured to shield light from the display unit 18. In the present embodiment, the BM layer 50 has a matrix pattern. The plurality of regions defined by the BM layer 50 are the first colored layer forming region 20a for the first colored layer 20, the second colored layer forming region 30a for the second colored layer 30, and the third colored layer 40, respectively. The third colored layer forming region 40a. The first colored layer forming region 20a, the second colored layer forming region 30a, and the third colored layer forming region 40a are repeatedly arranged in this order in the x direction. A plurality of sets of the first colored layer forming region 20a, the second colored layer forming region 30a, and the third colored layer forming region 40a that are repeatedly arranged in this way are arranged in the y direction.

  In addition, the specific pattern of each colored layer formation area | region 20a, 30a, 40a is not specifically limited.

  The material of the BM layer 50 is not particularly limited as long as it has a desired light shielding property. For example, a resin composition containing a black colorant such as carbon black or titanium black can be used. As the resin used in this resin composition, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.

(Colored layer)
Next, each colored layer 20, 30, 40 of the color filter 10 will be described. The plurality of colored layers 20, 30, and 40 are provided between the BM layers 50. Specifically, the first colored layer 20 is formed in the first colored layer forming region 20a. The second colored layer 30 is formed in the second colored layer forming region 30a. The third colored layer 40 is formed in the third colored layer forming region 40a.

  The first colored layer 20 is made of, for example, a red colored layer that transmits red light, the second colored layer 30 is made of a green colored layer that transmits green light, and the third colored layer 40 is blue light. It consists of a blue colored layer that transmits light. As will be described later, each colored layer 20, 30, 40 is a layer formed by patterning a photosensitive colored layer material by a photolithography method including an exposure step and a development step. As the coloring layer material to be patterned by the photolithography method, either a negative type or a positive type coloring layer material can be used, but a negative type coloring layer material is preferably used.

[Colored layer material]
Next, the first colored layer material (hereinafter referred to as the first material), the second colored layer material (hereinafter referred to as the second material), and the third colored layer material (hereinafter referred to as the following) constituting each colored layer 20, 30, 40. , 3rd material) is demonstrated. Each of the first to third materials includes a pigment dispersion including pigments and dyes of each color and a dispersant, a photoinitiator, a clearing agent including a polymer and a monomer, a surfactant, and the like. Of these, the photoinitiator generates a radical component when irradiated with light. Further, the clearing agent contains at least a component that causes a polymerization reaction by a radical generated by the photoinitiator and cures, and a component that can dissolve the unexposed portion by subsequent development.

  As described above, each colored layer 20, 30, 40 is configured to transmit light of a corresponding color, while the BM layer 50 is configured to shield light. That is, the light transmittance of the colored layer material constituting each colored layer 20, 30, 40 is larger than the light transmittance of the BM layer material constituting the BM layer 50.

Method for Manufacturing Color Filter Next, a method for manufacturing the color filter 10 will be described with reference to FIGS.

  First, the entire method for manufacturing the color filter 10 will be described with reference to FIGS. 3A to 3D correspond to the AA cross section of FIG. The manufacturing method of the color filter 10 includes a BM layer forming step (see FIG. 3A) for forming the BM layer 50 on the substrate 11, and coloring for forming the colored layers 20, 30, 40 between the BM layers 50. And a layer forming step (see FIGS. 3B to 3D). Among these, the colored layer forming step is performed on the substrate 11 after the first colored layer forming step (see FIG. 3B) for forming the plurality of first colored layers 20 on the substrate 11 and the first colored layer forming step. After the second colored layer forming step (see FIG. 3C) for forming the plurality of second colored layers 30 and the second colored layer forming step, the plurality of third colored layers 40 are formed on the substrate 11. And a third colored layer forming step (see FIG. 3D). In FIGS. 3B to 3D, specific processing performed in each step is shown on the right side, and formed on the substrate 11 after processing in each step is performed on the left side. A cross-sectional view of each of the layers is shown.

  Hereinafter, the BM layer forming step and each colored layer forming step will be described in detail.

(BM layer forming step)
First, as shown in FIGS. 3A and 4A, the first colored layer forming region 20 a for the first colored layer 20 and the second colored layer for the second colored layer 30 are formed on the substrate 11. The BM layer 50 is formed leaving the region 30a and the third colored layer forming region 40a for the third colored layer 40. The method for forming the BM layer 50 is not particularly limited, and for example, a photolithography method or the like can be used.

(First colored layer forming step)
Next, the first colored layer forming process will be described in detail with reference to FIGS.

[Coating process]
First, as shown in FIG. 4B, a first photosensitive colored layer coating liquid 21 (hereinafter referred to as a first coating liquid) 21 obtained by mixing the first material and the solvent described above, It is selectively applied to a predetermined area on the substrate 11.

  Specifically, as shown in FIG. 4B, the first coating liquid 21 corresponding to the region 20a is applied to the first colored layer forming region 20a on the substrate 11 on which the BM layer 50 is formed. The second and third colored layer forming regions 30a and 40a are applied leaving the portions 30x and 40x where the first coating liquid 21 is not applied. That is, in addition to the first colored layer forming region 20a, the first coating liquid 21 may be applied to part of the second and third colored layer forming regions 30a and 40a. Therefore, the coating accuracy can be reduced. However, the first coating liquid 21 may not be applied to at least one of the plurality of second and third colored layer forming regions 30a and 40a. Here, as shown in the figure, the first coating liquid 21 is applied in a stripe shape along the y direction.

  The method for applying the first coating liquid 21 onto the substrate 11 is not particularly limited, and an inkjet method, a screen printing method, a gravure printing method, or the like can be used as appropriate. However, an inkjet method that does not require a mask and can be applied with high accuracy is preferable. In the present embodiment, description will be made assuming that an inkjet method is used. When the inkjet method is used, the first coating liquid 21 suitable for the inkjet method is obtained by appropriately adjusting the ratio of each material of the first coating liquid 21.

[Pre-baking process]
Next, the 1st coating liquid 21 apply | coated on the board | substrate 11 is heated (prebaked), and, thereby, the solvent in the 1st coating liquid 21 is removed. As a result, the first material 22 is obtained on the substrate 11. The heating conditions in such a pre-baking process are not particularly limited, and the temperature and heating time in the pre-baking process are appropriately set according to the type and weight% of the solvent contained in the first coating liquid 21. Such a pre-baking process is generally performed by using a clean oven. In addition, before the prebaking process, the drying process for removing the solvent in the 1st coating liquid 21 partially, for example, a reduced pressure drying process may be implemented.

[Exposure process]
Next, as shown in FIG. 4C, the first material 22 is exposed through a first colored layer exposure mask (hereinafter, referred to as a first exposure mask) 25 having an opening 26 and a light shielding portion 27. Light exposure is performed. That is, the substrate 11 on which the first material 22 is formed is exposed. The openings 26 of the first exposure mask 25 are arranged side by side along the x direction and the y direction so as to correspond to the pattern of the first colored layer forming region 20a. As a result of the exposure, the portion of the first material 22 irradiated with the exposure light is cured. The light used as the exposure light is not particularly limited, and various lights can be used as appropriate according to the photosensitive characteristics of the first material 22.

[Development process]
Thereafter, the exposed first material 22 is developed with a developer, and thereby the portion of the first material 22 that has not been irradiated with the exposure light is dissolved in the developer. That is, the substrate 11 on which the first material 22 is formed is developed.

[Baking process]
Finally, the first material 22 remaining on the substrate 11, that is, the developed first material 22 is baked. As a result, as shown in FIG. 4D, the plurality of first colored layers 20 are formed in the plurality of first colored layer forming regions 20 a of the substrate 11.

(Second colored layer forming step)
Next, with reference to FIGS. 5A to 5C, the second colored layer forming step will be described focusing on differences from the first colored layer forming step. Description of the same points as in the first colored layer forming step is omitted.

[Coating process]
First, as shown in FIG. 5 (a), a second photosensitive colored layer coating liquid 31 (hereinafter referred to as a second coating liquid) 31 obtained by mixing the second material and the solvent described above, It is selectively applied to a predetermined area on the substrate 11.

  That is, the second coating liquid 31 corresponding to the region 30a is applied to the second colored layer forming region 30a on the substrate 11 on which the BM layer 50 is formed, and the other first and third colored layer forming regions 20a, 40a. The second coating liquid 31 is applied leaving the portions 20x and 40x where the second coating liquid 31 is not applied.

[Pre-baking process]
Next, the 2nd coating liquid 31 apply | coated on the board | substrate 11 is heated. As a result, the second material 32 is obtained on the substrate 11.

[Exposure process]
Next, as shown in FIG. 5B, the second material 32 is exposed through a second colored layer exposure mask (hereinafter referred to as a second exposure mask) 35 having an opening 36 and a light-shielding portion 37. Light exposure is performed. That is, the substrate 11 on which the second material 32 is formed is exposed. The openings 36 of the second exposure mask 35 are arranged corresponding to the pattern of the second colored layer forming region 30a. As a result of the exposure, the portion irradiated with the exposure light in the second material 32 is cured.

  Since the development step and the firing step are the same as the steps in the first colored layer forming step, description thereof is omitted.

  Thereby, as shown in FIG. 5C, the plurality of second colored layers 30 are formed in the plurality of second colored layer forming regions 30 a of the substrate 11.

(Third colored layer forming step)
Next, with reference to FIGS. 5D to 5F, the third colored layer forming step will be described focusing on differences from the first colored layer forming step. Description of the same points as in the first colored layer forming step is omitted.

[Coating process]
First, as shown in FIG. 5 (d), a third photosensitive colored layer coating liquid (hereinafter referred to as a third coating liquid) 41 obtained by mixing the above-mentioned third material and a solvent, It is selectively applied to a predetermined area on the substrate 11.

  That is, the third coating liquid 41 corresponding to the region 40a is applied to the third colored layer forming region 40a on the substrate 11 on which the BM layer 50 is formed, and the other first and second colored layer forming regions 20a and 30a. The third coating liquid 41 is applied leaving the portions 20x and 30x to which the third coating liquid 41 is not applied.

[Pre-baking process]
Next, the third coating liquid 41 applied on the substrate 11 is heated. As a result, the third material 42 is obtained on the substrate 11.

[Exposure process]
Next, as shown in FIG. 5E, the third material 42 is exposed through a third colored layer exposure mask (hereinafter referred to as a third exposure mask) 45 having an opening 46 and a light-shielding portion 47. Light exposure is performed. That is, the substrate 11 on which the third material 42 is formed is exposed. The opening 46 of the third exposure mask 45 is arranged corresponding to the pattern of the third colored layer forming region 40a. As a result of the exposure, the portion irradiated with the exposure light in the third material 42 is cured.

  Since the development step and the firing step are the same as the steps in the first colored layer forming step, description thereof is omitted.

  As a result, as shown in FIG. 5 (f), a plurality of third colored layers 40 are formed in the plurality of third colored layer forming regions 40 a of the substrate 11.

  By the above manufacturing method, the color filter 10 having the first to third colored layers 20, 30, and 40 is obtained.

  As described above, according to the present embodiment, the first coating liquid 21 corresponding to the region 20a is applied to the first colored layer forming region 20a with the other second and third colored layer forming regions 30a, It is made to apply | coat leaving the part 30x and 40x to which the said 1st coating liquid 21 is not applied to 40a. Similarly, the second and third coating liquids 31 and 41 are selectively applied. In this way, the coating liquid is selectively applied to a necessary region, and the amount to be applied to an unnecessary region where a colored layer is not formed is greatly reduced as compared with the conventional manufacturing method of FIG. Thereby, the usage-amount of each coating liquid 21,31,41 can be reduced to about 1/3 of the usage-amount in the conventional manufacturing method.

  In addition, by selectively applying the coating liquid in this way, the area of the unexposed portions of the first to third materials 22, 32, and 42 that are not irradiated with the exposure light is reduced compared to the conventional manufacturing method. . Therefore, after the unexposed portion is removed by the development process, the amount of residue generated in the removed region is also reduced. Furthermore, since the amount of the first to third materials 22, 32, and 42 dissolved in the developer is reduced, the development tact can be shortened and the life of the developer is lengthened. As a result, clogging of the developer filter of the developing device can be hardly caused. Alternatively, a small amount of developer may be used.

  Furthermore, when manufacturing a plurality of color filters on a single substrate, according to the present embodiment, the coating liquid is selectively applied to a necessary area and applied between the color filters. Therefore, the amount of coating solution used can be reduced more effectively.

  As described above, a color filter can be manufactured at low cost.

(Modification of the first embodiment)
In the above description, an example in which the first colored layer 20, the second colored layer 30, and the third colored layer 40 are formed in this order has been described. However, the order of forming the colored layers 20, 30, and 40 is any order. Good.
Further, the above manufacturing method may be applied to the manufacture of a color filter having four or more colors.

  Moreover, you may form the BM layer 50 by the method similar to the formation method of each colored layer demonstrated above. That is, a BM layer coating liquid obtained by mixing the material of the BM layer 50 and an appropriate solvent is selectively applied to a necessary region using an inkjet method or the like, and then exposed and developed. The BM layer 50 may be formed by performing the above. Thereby, the usage-amount of the coating liquid for BM layers can be decreased. Further, a small amount of developer may be used, or the life of the developer will be prolonged.

Furthermore, in the above description, an example in which the BM layer 50 is formed in advance has been described, but the present invention is not limited to this. That is, the BM layer 50 may be formed after any colored layer is formed, may be formed after two types of colored layers are formed, or after all the colored layers 20, 30, 40 are formed. It may be formed.
Further, the BM layer 50 may not be formed.

(Second Embodiment)
In the second embodiment, a four-color filter 100 having a first colored layer 20, a second colored layer 30, a third colored layer 40, and a fourth colored layer 70 as colored layers (FIG. 6C, FIG. 8 (c)) will be described.

  Also in this embodiment, as in the first embodiment, the first colored layer 20 is composed of a red colored layer, the second colored layer 30 is composed of a green colored layer, and the third colored layer 40 is colored blue. It consists of layers. Moreover, the 4th colored layer 70 consists of a yellow colored layer which permeate | transmits yellow light.

  The 4th colored layer material (henceforth 4th material) which comprises the 4th colored layer 70 is also comprised by the component similar to 1st Embodiment.

Manufacturing Method of Color Filter A manufacturing method of the color filter 100 will be described with reference to FIGS.

  First, the entire method for manufacturing the color filter 100 will be described with reference to FIGS. In the method of manufacturing the color filter 100, the BM layer forming step (see FIG. 6A) for forming the BM layer 50 on the substrate 11 and the colored layers 20, 30, 40, 70 are formed between the BM layers 50. And a colored layer forming step (see FIGS. 6B and 6C). Among these, the colored layer forming step includes a first colored layer forming step (see FIG. 6B) for forming a plurality of first colored layers 20 and a third colored layer 40 on the substrate 11, and a first colored layer forming step. Thereafter, a second colored layer forming step (see FIG. 6C) for forming a plurality of second colored layers 30 and a fourth colored layer 70 on the substrate 11 is included. In FIGS. 6B and 6C, specific processing performed in each process is shown on the right side, and formed on the substrate 11 after processing in each process is performed on the left side. A cross-sectional view of each of the layers is shown.

  Hereinafter, the BM layer forming step and each colored layer forming step will be described in detail.

(BM layer forming step)
First, as shown in FIGS. 6A and 7A, the first colored layer forming region 20a for the first colored layer 20 and the second colored layer for the second colored layer 30 are formed on the substrate 11. The BM layer 50 is formed leaving the region 30a, the third colored layer forming region 40a for the third colored layer 40, and the third colored layer forming region 70a for the fourth colored layer 70. The first colored layer forming region 20a, the second colored layer forming region 30a, the third colored layer forming region 40a, and the fourth colored layer forming region 70a are arranged in this order in the x direction. A plurality of sets of the first colored layer forming region 20a, the second colored layer forming region 30a, the third colored layer forming region 40a, and the fourth colored layer forming region 70a arranged in this way are arranged in the y direction.

(First colored layer forming step)
Next, with reference to FIGS. 7B to 7D, the first colored layer forming step will be described focusing on differences from the first embodiment. The description of the same points as in the first embodiment will be omitted.

[Coating process]
First, as shown in FIG. 7B, the first coating liquid 21 and the third coating liquid 41 similar to those in the first embodiment are selectively applied to predetermined regions on the substrate 11.

  Specifically, as shown in FIG. 7B, the first coating liquid 21 corresponding to the region 20a is applied to the first colored layer forming region 20a on the substrate 11 on which the BM layer 50 is formed. At the same time, the third coating liquid 41 corresponding to the region 40a separated by one is applied to a region separated from the region 20a, that is, the third colored layer forming region 40a. That is, in this coating process, the coating liquid is applied to the first and third colored layer forming regions 20a and 40a that are not adjacent to each other.

  Here, as shown in the figure, the first coating liquid 21 and the third coating liquid 41 are applied in stripes along the y direction. At this time, portions 30x and 70x where the first coating liquid 21 and the third coating liquid 41 are not applied are left in the other second and fourth colored layer forming regions 30a and 70a. In other words, in addition to the first and third colored layer forming regions 20a and 40a, the first coating liquid 21 and the third coating solution 41 are also applied to part of the second and fourth colored layer forming regions 30a and 70a. doing. However, the first coating liquid 21 and the third coating liquid 41 may not be applied to at least one of the plurality of second and fourth colored layer forming regions 30a and 70a.

  The method of applying the first coating liquid 21 and the third coating liquid 41 on the substrate 11 is the same as in the first embodiment. In the present embodiment, description will be made assuming that an inkjet method is used. When using the inkjet method, it is preferable to apply the first coating liquid 21 and the third coating liquid 41 almost simultaneously. By applying almost simultaneously, it is possible to prevent the third coating liquid 41 from flowing into the first colored layer forming region 20a and the first coating liquid 21 from flowing into the third colored layer forming region 40a. Because.

[Pre-baking process]
Next, the first coating liquid 21 and the third coating liquid 41 applied to the area 20a on the substrate 11 and the area 70a one distance away from the area are heated. As a result, the first material 22 and the third material 42 are obtained on the substrate 11.

[Exposure process]
Next, as shown in FIG. 7C, the first material 22 and the third material 42 are exposed through the first and third colored layer exposure masks 85 having the openings 86 and the light shielding portions 87. Light exposure is performed. That is, the substrate 11 on which the first material 22 and the third material 42 are formed is exposed. The openings 86 of the first and third colored layer exposure masks 85 are arranged side by side along the x and y directions so as to correspond to the patterns of the first colored layer forming region 20a and the third colored layer forming region 40a. Has been. As a result of the exposure, portions of the first material 22 and the third material 42 irradiated with the exposure light are cured.

[Development process]
Thereafter, the exposed first material 22 and the third material 42 are developed with a developer, and thereby the portions of the first material 22 and the third material 42 that are not irradiated with the exposure light are dissolved in the developer. . That is, the substrate 11 on which the first material 22 and the third material 42 are formed is developed.

[Baking process]
Finally, the first material 22 and the third material 42 remaining on the substrate 11, that is, the developed first material 22 and the third material 42 are baked. As a result, as shown in FIG. 7D, the plurality of first colored layers 20 are formed in the plurality of first colored layer forming regions 20a, and the plurality of third colored layers 40 are formed of the plurality of third colored layers. It is formed in the formation region 40a.

(Second colored layer forming step)
Next, with reference to FIGS. 8A to 8C, the second colored layer forming step will be described focusing on differences from the first colored layer forming step. Description of the same points as in the first colored layer forming step is omitted.

[Coating process]
As shown to Fig.8 (a), the 4th coating for the 4th photosensitive coloring layers obtained by mixing the 2nd coating liquid 31 similar to 1st Embodiment, the above-mentioned 4th material, and a solvent. A liquid (hereinafter, fourth coating liquid) 71 is selectively applied to a predetermined region on the substrate 11.

  Specifically, as shown in FIG. 8A, the second coating liquid 31 corresponding to the region 30a is applied to the second colored layer forming region 30a on the substrate 11 on which the BM layer 50 is formed. At the same time, the fourth coating liquid 71 corresponding to the region 70a separated by one is applied to the region separated from the region 30a, that is, the fourth colored layer forming region 70a. That is, in this coating step, the coating is applied to the second and fourth colored layer forming regions 30a and 70a that are not adjacent to each other.

  As shown in the drawing, portions 20x and 40x where the second coating liquid 31 and the fourth coating liquid 71 are not applied are left in the other first and third colored layer forming regions 20a and 40a.

[Pre-baking process]
Next, the second coating liquid 31 and the fourth coating liquid 71 applied on the substrate 11 are heated. As a result, the second material 32 and the fourth material 72 are obtained on the substrate 11.

[Exposure process]
Next, as shown in FIG. 8B, the second material 32 and the fourth material 72 are exposed through the second and fourth colored layer exposure masks 95 having the openings 96 and the light shielding portions 97. Light exposure is performed. That is, the substrate 11 on which the second material 32 and the fourth material 72 are formed is exposed. The openings 96 of the second and fourth colored layer exposure masks 95 are arranged side by side along the x and y directions so as to correspond to the patterns of the second colored layer forming region 30a and the fourth colored layer forming region 70a. Has been. As a result of the exposure, portions of the second material 32 and the fourth material 72 irradiated with the exposure light are cured.

  Since the development step and the firing step are the same as the steps in the first colored layer forming step, description thereof is omitted.

  As a result, as shown in FIG. 8C, the plurality of second colored layers 30 are formed in the plurality of second colored layer forming regions 30 a of the substrate 11, and the plurality of fourth colored layers 70 are formed on the substrate 11. The color filter 100 is obtained by forming the plurality of fourth colored layer forming regions 70a.

  As described above, according to the present embodiment, the first colored liquid forming region 20a is coated with the first coating liquid 21 corresponding to the region 20a, and one region away from the region 20a. That is, the third coating liquid 41 corresponding to the region 40a separated by one is applied to the third colored layer forming region 40a. Similarly, the second and fourth coating liquids 31 and 71 are selectively applied. In this way, the coating liquid is selectively applied to a necessary region, and the amount to be applied to an unnecessary region where a colored layer is not formed is greatly reduced as compared with the conventional manufacturing method of FIG. Thereby, the usage-amount of each coating liquid 21, 31, 41, 71 can be reduced to about 1/4 of the usage-amount in the conventional manufacturing method. Similarly, other effects of the first embodiment can be obtained.

  In addition to these effects, according to this embodiment, since the coating liquid is applied to the two colored layer forming regions in one application process, the application process, the pre-bake process, the exposure process, the development process, and The first to fourth colored layers 20, 30, 40, and 70 can be formed only by repeating a series of colored layer forming steps of the firing step twice. In the conventional manufacturing method, since the colored layer forming step needs to be repeated four times, according to this embodiment, the manufacturing step can be greatly reduced.

  Further, since the exposure process is performed only twice, only the first and third colored layer exposure masks 85 and the second and fourth colored layer exposure masks 95 may be used as the exposure mask. Since the conventional manufacturing method requires four types of exposure masks corresponding to four exposure processes, according to the present embodiment, the types of exposure masks can be halved.

  As described above, a color filter can be manufactured at low cost.

(Modification of the second embodiment)
In the above description, an example in which the first and third colored layers 20 and 40 are formed first and then the second and fourth colored layers 30 and 70 are formed has been described. However, the second and fourth colored layers 30 and 70 may be formed first, and then the first and third colored layers 20 and 40 may be formed.

  Further, in the above description, an example in which the fourth colored layer 70 is made of a yellow colored layer has been described. However, the fourth colored layer 70 is made of a white colored layer that transmits white light (transmittance adjusting layer). Also good. That is, the fourth colored layer 70 may be configured to transmit light in the visible light region substantially uniformly regardless of the wavelength region. By providing the fourth colored layer 70 having such characteristics between the BM layers 50, the color filter 100 has a color compared to the case where only the first to third colored layers 20, 30, 40 are provided. The transmittance of the filter 100 as a whole can be improved. Thereby, the luminance of the display device 60 can be increased without excessively increasing the light emission intensity of the display unit 18.

  Furthermore, the above manufacturing method may be applied to the manufacture of a color filter having five or more colors. Even in a color filter of five or more colors, the same effect can be obtained by applying the coating liquid to two colored layer forming regions that are not adjacent to each other in one application step.

  Similarly to the above-described modification of the first embodiment, the BM layer coating solution is selectively applied to a necessary region using an inkjet method or the like, and then exposure and development are performed. Thus, the BM layer 50 may be formed.

Furthermore, in the above description, an example in which the BM layer 50 is formed in advance has been described, but the present invention is not limited to this. That is, the BM layer 50 may be formed after forming two kinds of colored layers, or may be formed after forming all the colored layers.
Further, the BM layer 50 may not be formed.

(Third embodiment)
In the present embodiment, a photo spacer 13 of the color filter 10 is formed by selectively applying a coating liquid as in the first embodiment. Here, an example of forming the photo spacer 13 of the color filter 10 in FIG. 2 will be described.

Manufacturing Method of Color Filter A manufacturing method of the color filter 10 will be described with reference to FIGS.

  First, the entire method for manufacturing the color filter 10 will be described with reference to FIGS. 9A and 9B correspond to the AA cross section of FIG. 2, and FIG. 9C corresponds to the BB cross section of FIG. The manufacturing method of the color filter 10 includes a BM layer forming step (see FIG. 9A) for forming the BM layer 50 on the substrate 11, and coloring for forming the colored layers 20, 30, and 40 between the BM layers 50. A layer forming step (see FIG. 9B) and a photo spacer forming step for forming the photo spacer 13 (see FIG. 9C). In FIG. 9C, the right side shows a specific process performed in the photo spacer formation process, and the left side is formed on the substrate 11 after the process in the photo spacer formation process is performed. A cross-sectional view of each of the layers is shown.

  As shown in FIG. 9C, for example, the photo spacer 13 has a height h in the z direction of 2 to 4 μm and a width w in the x direction on the substrate 11 side of 10 to 15 μm.

The specific process performed in the BM layer forming step and the colored layer forming step is not particularly limited. Here, it is assumed that the same processing as in the first embodiment is performed, and the description thereof is omitted. However, it is assumed that after the colored layer forming step, the overcoat film 12 is formed so as to cover the colored layers 20, 30, 40 and the BM layer 50 of the color filter 10.
The BM layer forming step and the colored layer forming step are collectively referred to as a step of preparing the substrate 11 having the plurality of colored layers 20, 30, 40 and the BM layer 50.

  Hereinafter, the photo spacer formation step will be described in detail with reference to FIG.

(Photo spacer formation process)
[Coating process]
First, as shown in FIG. 10B, the photosensitive spacer coating liquid 131 obtained by mixing the spacer material and the solvent is used as the BM layer 50 and the colored layer 20 shown in FIG. This is selectively applied to a predetermined region on the substrate 11 on which 30 and 40 are formed. The spacer material constituting the photospacer 13 includes, for example, a photoinitiator, a clearing agent containing a polymer or a monomer, and a surfactant. That is, the spacer material has, for example, a component obtained by removing the pigment dispersion from the first material.

  Specifically, as shown in FIG. 10B, the spacer coating liquid 131 is applied to the spacer formation region 130a on the BM layer 50 and its periphery on the overcoat film 12. Here, as shown in the figure, the spacer coating liquid 131 is applied in stripes along the x direction. At this time, the spacer coating liquid 131 is also applied to a part of the first to third colored layer forming regions 20a, 30a, and 40a.

  However, the spacer coating liquid 131 may not be applied to at least one of the plurality of first to third colored layer forming regions 20a, 30a, and 40a. Alternatively, the spacer coating liquid 131 may be applied in a stripe shape along the y direction. Further, the region to which the spacer coating liquid 131 is applied is not limited to a striped region, but may be a circular region, a square region, or the like that covers each spacer forming region 130a.

  The method of applying the spacer coating liquid 131 on the substrate 11 is the same as in the first embodiment. In the present embodiment, description will be made assuming that an inkjet method is used. In the ink jet method, as shown in the figure, the spacer coating liquid 131 can be discharged while scanning the ink jet head 140 having a plurality of nozzles 141 extending in the y direction in the x direction. As shown, a spacer coating solution 131 can be applied. Alternatively, the spacer coating liquid 131 may be intermittently ejected while scanning an inkjet head (not shown) having a plurality of nozzles extending in the x direction in the y direction, as shown in FIG. Can be applied.

[Pre-baking process]
Next, the spacer coating liquid 131 applied on the substrate 11 is heated, whereby the solvent in the spacer coating liquid 131 is removed. As a result, a spacer material 132 is obtained on the substrate 11.

[Exposure process]
Next, as illustrated in FIG. 10C, the spacer material 132 is exposed to exposure light through a spacer exposure mask 135 having an opening 136 and a light shielding portion 137 to be exposed. That is, the substrate 11 on which the spacer material 132 is formed is exposed. The opening 136 of the spacer exposure mask 135 is arranged so as to correspond to the pattern of the spacer formation region 130a. As a result of the exposure, the portion irradiated with the exposure light in the spacer material 132 is cured.

[Development process]
Thereafter, the exposed spacer material 132 is developed with a developer, and thereby the portion of the spacer material 132 that has not been irradiated with the exposure light is dissolved in the developer. That is, the substrate 11 on which the spacer material 132 is formed is developed.

[Baking process]
Finally, the spacer material 132 remaining on the substrate 11, that is, the developed spacer material 132 is baked. As a result, a plurality of photo spacers 13 are formed on the BM layer 50 of the substrate 11 as shown in FIG.

  As described above, according to the present embodiment, the spacer coating liquid 131 is applied to the spacer forming region 130a on the BM layer 50 and its periphery. In this way, the spacer coating liquid 131 is selectively applied to a necessary region, and the amount to be applied to an unnecessary region where the photospacer 13 is not formed is greatly reduced compared to the conventional manufacturing method of FIG. Yes. Thereby, the usage-amount of the spacer coating liquid 131 can be reduced significantly from the usage-amount in the conventional manufacturing method.

  Similarly, other effects of the first embodiment can be obtained. Therefore, a color filter can be manufactured at low cost.

Note that the third embodiment may be combined with the second embodiment.
Further, the processing of the photospacer forming step can be performed on a color filter formed by any manufacturing method as long as it is a color filter including a substrate having a plurality of colored layers and a BM layer. That is, after the step of preparing a substrate having a plurality of colored layers and a BM layer, a photospacer forming step can be executed.

  As mentioned above, although some embodiment of this invention was described, these embodiment is shown as an example and is not intending limiting the range of invention. These embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and gist of the invention, and are also included in the invention described in the claims and the equivalents thereof.

10, 100 Color filter 11 Substrate 12 Overcoat film 13 Photo spacer 15 TFT substrate 17 Liquid crystal 18 Display unit 20 First colored layer 20a First colored layer forming region 21 First colored layer coating solution (first coating solution)
22 First colored layer material (first material)
25. First colored layer exposure mask (first exposure mask)
26 opening part 27 light-shielding part 30 2nd colored layer 30a 2nd colored layer formation area 31 2nd colored layer coating liquid (2nd coating liquid)
32 Second colored layer material (second material)
35. Second colored layer exposure mask (second exposure mask)
36 opening part 37 light-shielding part 40 3rd colored layer 40a 3rd colored layer formation area 41 The coating liquid for 3rd colored layers (3rd coating liquid)
42 Third colored layer material (third material)
45 Third Colored Layer Exposure Mask (Third Exposure Mask)
46 Opening 47 Light-shielding part 50 Black matrix layer (BM layer)
60 Display Device 70 Fourth Colored Layer 70a Fourth Colored Layer Formation Area 71 Fourth Colored Layer Coating Liquid (Fourth Coating Liquid)
72 Fourth colored layer material (fourth material)
85 Exposure mask 86 for first and third colored layers Opening 87 Light shielding portion 95 Exposure mask for second and fourth colored layers 96 Opening portion 97 Light shielding portion 130a Spacer formation region 131 Coating liquid for spacer 132 Spacer material 135 Spacer Exposure mask 136 opening 137 light-shielding portion 140 inkjet head 141 nozzle

Claims (3)

Preparing a substrate;
A black matrix layer coating solution is selectively applied to a necessary region on the substrate, and then the substrate is exposed, and then the substrate is developed to form a first colored layer forming region and a second colored layer. Forming a black matrix layer leaving a forming region and a third colored layer forming region; and a black matrix layer forming step;
The first colored layer forming area on the substrate, and a part of the second and third colored layer forming region, a first photosensitive color layer coating corresponding to the first colored layer forming region a first coating step of coating the fabric of the liquid,
A first exposure step of exposing the substrate after the first coating step;
A first development step for developing the substrate after the first exposure step;
After the first developing step, the second colored layer forming region on the substrate, and a part of the first and third colored layer forming regions, the second corresponding to the second colored layer forming region A second application step of applying a photosensitive colored layer coating solution;
A second exposure step of exposing the substrate after the second coating step;
A second development step of developing the substrate after the second exposure step;
After the second development step, a third colored layer forming region on the substrate and a part of the first and second colored layer forming regions corresponding to the third colored layer forming region A third application step of applying a photosensitive colored layer coating solution;
A third exposure step of exposing the substrate after the third coating step;
And a third development step of developing the substrate after the third exposure step . A method for producing a color filter, comprising: The color filter manufacturing method according to claim 1, wherein in the first, second, and third coating steps, a corresponding colored layer coating solution is applied by an inkjet method. 3. The method for producing a color filter according to claim 1, wherein in the first, second, and third application steps, the corresponding colored layer coating solution is applied in a stripe shape. 4.

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