1277780 * 九、發明說明： 【發明所屬之技術領域】 ' 本發明涉及一種彩色濾光片之製造方法。 【先前技術】 被動式顯示裝置，如液晶顯示器，需藉由彩色濾光片將通過之白 光轉化為紅、綠、藍三原色光束達成顯示不同色彩影像之效果。彩色 濾光片主要包括黑矩陣及著色層，該著色層係由交替排列之紅、綠、 藍三色顏色層（Color Area)組成。 如第一圖所示，目前一般之彩色濾光片丨'0包括：一玻璃基板12 ; 一形成於該基板12表面之黑矩陣(Black Matrix，BM)14，該黑矩14 用於限定液晶顯示面板之像素區域，該像素區域用於容納並隔開紅綠 藍顏色層18 ;以及一透明導電層20，包覆該顏色層μ。 目前於基板上形成黑矩陣14之方法一般採用傳統之曝光顯影方 法元成。惟，由於黑矩陣14所用之光阻材料之影響，使得光阻材料 中紫外曝光交連之機制進行不完全，而使製程之良率不高且黑矩陣Μ 之黑度不夠。同時，又因使用到光罩及光罩式曝光機，使得製程成本 較高。 【發明内容】 _ 有鑒於此，有必要提供一種能提高良率及降低成本之彩色濾光片 之製造方法。 一種彩色濾光片之製造方法，其步驟如下： (1) 提供一基板； (2) 利用網版印刷技術於基板表面上形成黑矩陣，該黑矩陣限定 複數像素區； (3) 藉由一喷墨裝置將所需顏色之墨水注入複數像素區内； (4) 乾燥固化複數像素區内之墨水而形成複數顏色層。 相較於先前技術，所述之彩色濾光片之製造方法，由於使用網版 印刷技術來形成黑矩陣，其製造成本低，可避免出現由於曝光不完全 5 1277780 而造成之黑矩陣之’不高，黑度不夠，黑轉列 墨法形成複數顏色層，從而可提高整個彩色渡光片製===喷 【實施方式】 下面將結合附圖對本發明實施例作進一步之詳細說明。 光片第Γ圖’係本發明實施例提供—種彩色遽 光片之瓜xe方法之流程圖，其步驟如下：1277780 * IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a method of manufacturing a color filter. [Prior Art] Passive display devices, such as liquid crystal displays, need to convert white light through the color filters into red, green, and blue primary colors to achieve the effect of displaying different color images. The color filter mainly comprises a black matrix and a coloring layer, and the colored layer is composed of alternately arranged red, green and blue color regions. As shown in the first figure, the conventional color filter 丨'0 includes: a glass substrate 12; a black matrix (BM) 14 formed on the surface of the substrate 12, the black moment 14 is used to define the liquid crystal a pixel area of the display panel for accommodating and separating the red, green and blue color layer 18; and a transparent conductive layer 20 covering the color layer μ. The current method of forming the black matrix 14 on a substrate is generally carried out by a conventional exposure development method. However, due to the influence of the photoresist material used in the black matrix 14, the mechanism of ultraviolet exposure cross-linking in the photoresist material is incomplete, and the yield of the process is not high and the blackness of the black matrix is insufficient. At the same time, the cost of the process is high due to the use of a reticle and a reticle type exposure machine. SUMMARY OF THE INVENTION In view of the above, it is necessary to provide a method of manufacturing a color filter capable of improving yield and reducing cost. A method for manufacturing a color filter, the steps of which are as follows: (1) providing a substrate; (2) forming a black matrix on the surface of the substrate by using a screen printing technique, the black matrix defining a plurality of pixel regions; (3) by using a The ink jet device injects ink of a desired color into the plurality of pixel regions; (4) drying and curing the ink in the plurality of pixel regions to form a plurality of color layers. Compared with the prior art, the method for manufacturing the color filter has a low manufacturing cost by using a screen printing technique to form a black matrix, and can avoid the black matrix of the black matrix caused by the incomplete exposure 5 1277780. High, blackness is not enough, the black transfer ink method forms a plurality of color layers, so that the entire color light film system can be improved. </ RTI> EMBODIMENT The embodiments of the present invention will be further described in detail below with reference to the accompanying drawings. The light sheet is shown in the embodiment of the present invention as a flow chart of a color xenon film, and the steps are as follows:
步驟-：如第二圖所示，提供—基板100，該基板刚之表面淨 潔度及平整雜高。本實施财該餘㈣補。雜，美 料也可選用石英玻璃、矽晶圓、金屬或塑膠等。 土 步驟一 ·利用網版印刷技術於基板100表面上形成 之黑矩陣102。 一w μ、 該步驟二具體包括以下步驟·· 將基板100置於-印刷平台202上，將一網版200設置於基板· 正上方；利用一到板204將網版200及已調配好之油墨1〇2，壓向基 板100表面使網版2〇〇及油墨102,接觸到基板1〇〇表面並以此完^ 對整個基板100表面之壓印，如第二圖所示；移除網版2〇〇得到基板 100表面上之黑矩陣102。 ^由網版印刷形成之黑矩陣1〇2,其寬度範圍為15〜30微米（"m), 高度範圍為1〜10/zm。由於使用網版印刷技術來進行黑矩陣1〇2之列 印，可避免由於曝光不完全而造成之黑矩陣之良率不高及其較高之製 造成本。同時’由於網版2〇〇本身具有彈性，所以即使網版2〇〇與基 板100相互不平行，只要形成過程施以足夠之壓力，就能使油墨1〇2， 均勻附著於基板1〇〇表面上，能克服一般印刷技術如凹版印刷或凸版 印刷’會出現局部位置發生油墨不會被列印並附著於基板表面上之缺 陷。因為一般之印刷技術若列印過程中，發生網版與基板不完全平 行’局部位置因網版與基板距離較遠而發生油墨不會被列印並附著於 基板表面上。 步驟三：如第三圖所示，黑矩陣1〇2可限定複數像素區1〇6，或 如第六圖所示，選擇性可在黑矩陣1〇2上形成複數擋牆1〇4，而由該 6 1277780 =擔牆104及黑矩陣1()2限定複數像素區⑽。一般而言，該複數 擋‘ 104 —般由光阻材料，透過塗佈、曝光、顯影的方式構成，立呈 體步驟如下： 八/' 利用乾膜法（Dry Film Lamination)、濕式旋轉法（Wet Spin ⑴ating)或濕式裂縫式塗佈法(糾G加地)於該基板上表面 塗佈擋牆負型光阻材料1Q4，，並覆蓋該黑矩陣1〇2 ’如第四圖所示； 利用光罩式曝光機，將具有預設播牆圖案之光罩300設於該負型光阻 材料層104與曝光機（圖未示）光源間，並且與黑矩陣對準， 並曝光該難負型光崎料贈，如第五圖所示；糊顯影方式， 將未曝«之擔牆負型光阻材料1〇4，去除；形成設於黑矩陣1〇2上 表面之複數擋牆104,如第六圖所示。 ▲該方法係利用負型光阻材料104,於基板100表面形成之複數擋 牆104。可以理解，上述步驟亦可使用正型光阻材料，其相應之光罩 设計及製程巾曝光處材料係訂或去除具有差異外，並不影響本發明 之實施。 、—步驟四：藉由一噴墨裝置110將由顏色材料形成之墨水112填充 於複數像素區106内，如第七圖所示。 該步驟四包括同步噴墨法及分步喷墨法。同步噴墨法為同時於複 數像素區内噴射所需之紅（R)綠（G)藍（B)三色墨水。分步噴墨 法為依次噴射同色墨水於複數像素區内。 •該噴墨裝置U0可選用熱泡式喷墨裝置(Thermal Bubble Ink Jet Printing Apparatus)或壓電式喷墨裝置（Piez〇electric ink Jet Printing Apparatus)。 步驟五：乾燥固化複數像素區106中之墨水112而形成顏色層 108，如第八圖所示。此步驟主要藉由一抽真空裝置、一加熱裝置或 =發光裝置，將複數像素區1〇6之墨水112進行乾燥固化，或者同時 採用上述三者方式之任兩種或任三種進行乾燥固化，而發光裝置 紫外光發光照射裝置。 本實施例之彩色濾光片製造方法可進一步包括一步驟六，如第九 1277780 圖所不.於遠基板上同時依次形成覆蓋該黑矩陣1〇2及顏色層⑽之 一保護層114及一導電層116，或一保護層114，或一導電層116。 此外’除如前所述，直接形成-保護層114或一導電層116，成 同時依次形成—保護層114及—導電層116外，另外可在形成一保護 層114或-導電層116之前’加入前處理步驟，故該步驟六包括分步 驟如下： 利用研磨或磁I]方式’將顏色層⑽相對黑矩陣⑽突出之部分 磨平’以達成平坦度之要求；形成-保護層114或一導電層116於該 基板剛上並覆蓋該黑矩陣⑽及顏色層⑽Step-: As shown in the second figure, the substrate 100 is provided, and the surface of the substrate is just clean and flat. This implementation of the financial surplus (four) supplement. Miscellaneous, beauty materials can also be selected from quartz glass, silicon wafers, metal or plastic. Soil Step 1 - A black matrix 102 formed on the surface of the substrate 100 by screen printing. One step, the second step specifically includes the following steps: placing the substrate 100 on the printing platform 202, and placing a screen 200 on the substrate; directly using the screen 200 and the screen 200 Ink 1〇2, pressed against the surface of the substrate 100 to cause the screen 2 and the ink 102 to contact the surface of the substrate 1 and thereby emboss the surface of the entire substrate 100, as shown in the second figure; The screen 2 obtains a black matrix 102 on the surface of the substrate 100. ^ Black matrix 1〇2 formed by screen printing, the width of which ranges from 15 to 30 microns ("m), and the height ranges from 1 to 10/zm. Since the screen printing technique is used to perform the printing of the black matrix 1〇2, the yield of the black matrix due to incomplete exposure can be avoided and the higher the system cost. At the same time, since the screen 2 〇〇 itself has elasticity, even if the screen 2 〇〇 and the substrate 100 are not parallel to each other, the ink 1 〇 2 can be uniformly attached to the substrate 1 as long as sufficient pressure is applied during the formation process. On the surface, it is possible to overcome the drawbacks of conventional printing techniques such as gravure printing or letterpress printing, where localized inks are not printed and adhered to the surface of the substrate. Because the general printing technique, if the printing process occurs, the screen and the substrate are not completely parallel. The local position is caused by the screen and the substrate being far apart, and the ink is not printed and adhered to the surface of the substrate. Step 3: As shown in the third figure, the black matrix 1〇2 may define a plurality of pixel regions 1〇6, or as shown in the sixth figure, the selectivity may form a plurality of barrier walls 1〇4 on the black matrix 1〇2, The multi-pixel area (10) is defined by the 6 1277780 = the wall 104 and the black matrix 1 () 2 . Generally, the complex block '104 is generally formed of a photoresist material by coating, exposure, and development, and the steps of the substrate are as follows: 八/' Dry Film Lamination, wet rotation method (Wet Spin (1) ating) or wet crack coating method (correcting G) to coat the surface of the substrate with a negative-type photoresist material 1Q4, and covering the black matrix 1〇2' as shown in the fourth figure Using a mask exposure machine, a photomask 300 having a preset wall pattern is disposed between the negative photoresist material layer 104 and a light source of an exposure machine (not shown), and aligned with the black matrix, and exposed. The hard-to-wear type of light-stained material is as shown in the fifth figure; the paste development method removes the negative-resistance material 1〇4 of the unexposed wall; and forms a plurality of retaining walls on the upper surface of the black matrix 1〇2. 104, as shown in the sixth figure. ▲ This method utilizes a negative photoresist material 104 to form a plurality of walls 104 on the surface of the substrate 100. It will be understood that the above steps may also use a positive photoresist material, which has a difference in the stencil design and the material binding or removal at the exposure of the process towel, and does not affect the implementation of the present invention. - Step 4: The ink 112 formed of a color material is filled in the plurality of pixel regions 106 by an ink jet device 110, as shown in the seventh figure. This step four includes a synchronous inkjet method and a stepwise inkjet method. The synchronous ink jet method is a three-color ink of red (R) green (G) blue (B) which is required to be ejected simultaneously in a plurality of pixel regions. The step-and-step inkjet method sequentially ejects the same color ink in the plurality of pixel regions. • The inkjet device U0 can be selected from a Thermal Bubble Ink Jet Printing Apparatus or a Piez® electric ink Jet Printing Apparatus. Step 5: Drying and curing the ink 112 in the plurality of pixel regions 106 to form a color layer 108, as shown in the eighth figure. In this step, the ink 112 of the plurality of pixel regions 1 〇 6 is dried and solidified by a vacuuming device, a heating device or a illuminating device, or both of the above three methods are used for drying and curing. And the illuminating device ultraviolet illuminating device. The color filter manufacturing method of the present embodiment may further include a step 6. As shown in the ninth 1277780, the protective layer 114 and the protective layer 114 covering the black matrix 1〇2 and the color layer (10) are sequentially formed on the remote substrate. Conductive layer 116, or a protective layer 114, or a conductive layer 116. In addition, the protective layer 114 or a conductive layer 116 may be directly formed in addition to the protective layer 114 and the conductive layer 116, and may be formed before forming a protective layer 114 or the conductive layer 116. The pre-processing step is added, so the step 6 includes the following steps: using a grinding or magnetic I] method to smooth the portion of the color layer (10) protruding from the black matrix (10) to achieve flatness requirements; forming a protective layer 114 or a The conductive layer 116 is directly on the substrate and covers the black matrix (10) and the color layer (10)
彩色濾光片。 、 u π 或者該步驟六具體包括另一分步驟： 利用研磨或侧方式，將顏色層陶目對黑矩陣⑽突出之部分 磨平’以達成平坦度之要求；形成一保護層114於該基板謂上並覆 蓋該黑矩F車102及顏色層⑽；形成一導電層116於該保護層114上 方，如第Η• —圖所示。 若於…、矩陣102有形成複數擋踏1〇4，亦可將步驟六進行進一步 抹用去關το全去除該複數擋牆1Q4 ;形成一保護層114或一導 電層116於該基板⑽上並覆蓋該黑矩陣102及顏色層108。 或者將步驟六再進一步改進為： 採用去除全去除該複數麟1Q4 ;形成—保護層114於該基 板100上並覆蓋該黑矩陣102及顏色層108;形成一導電層116於該 保護層114上方，最終形成如第十一圖所示之彩色滤光片。 可以理解:上述步驟六之分步驟中，導電層ιι6之製程可採用真 王濺錢裝置進行濺鍍等工藝，而保護層114則可採用旋轉塗佈或裂縫 塗佈等製程。 本實關所提供之彩色渡光片之製造方法，由於使用網版印刷技 術來形成黑矩陣1G2，聽造成低，可避免出現由於曝光不完全而造 成之黑矩陣之良率不高及黑度補，黑矩_形成後再时墨法形成 8 1277780 複數顏色層，從而可提高整個彩色濾光片製程之産品良率。同時，由 於網版200本身具有彈性，所以即使網版2〇〇與基板丨〇〇相互不平行， 只要形成過程施以足夠之壓力，就能使油墨1〇2，均勻附著於基板1〇〇 表面上，能克服一般印刷技術會出現局部位置發生油墨不會被列印並 附著於基板表面上之缺陷。 絲上所述，本發明確已符合發明專利要件，爰依法提出專利申 請。惟，以上所述者僅為本發明之較佳實施例，舉凡熟悉本案技藝之 人士，於援依本案發明精神所作之等效修飾或變化，皆應包含於以下 之申請專利範圍内。 〜 、Color filter. , u π or the step 6 specifically includes another sub-step: using a grinding or side method, the color layer is polished to the portion of the black matrix (10) protruding to meet the flatness requirement; forming a protective layer 114 on the substrate The black moment F car 102 and the color layer (10) are covered and formed; a conductive layer 116 is formed above the protective layer 114, as shown in FIG. If the matrix 102 has a plurality of barriers 1〇4, the step 6 may be further applied to remove the plurality of barriers 1Q4; a protective layer 114 or a conductive layer 116 is formed on the substrate (10). The black matrix 102 and the color layer 108 are covered. Or the step 6 is further improved to: remove the complex lining 1Q4 by removing; form the protective layer 114 on the substrate 100 and cover the black matrix 102 and the color layer 108; form a conductive layer 116 above the protective layer 114. Finally, a color filter as shown in FIG. 11 is formed. It can be understood that in the step of the above step 6, the process of the conductive layer ι6 can be performed by a sputtering process such as sputtering, and the protective layer 114 can be processed by spin coating or crack coating. The manufacturing method of the color light film provided by the actual customs, because the screen printing technology is used to form the black matrix 1G2, the hearing is low, and the yield of the black matrix due to incomplete exposure can be avoided and the blackness is avoided. Complement, black moment _ after formation, the ink method forms 8 1277780 plural color layers, which can improve the product yield of the entire color filter process. At the same time, since the screen 200 itself has elasticity, even if the screen 2 〇〇 and the substrate 不 are not parallel to each other, the ink 1 〇 2 can be uniformly attached to the substrate 1 as long as sufficient pressure is applied during the formation process. On the surface, it is possible to overcome the defect that the printing process will not be printed and adhered to the surface of the substrate due to local printing. As stated on the silk, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art of the present invention should be included in the following claims. ~ ,
【圖式簡單說明】 第圖為先前技術之一種彩色滤光片之結構示意圖。 圖 第二圖至第三圖為本發明實施例提供之一種黑矩陣之製造示意 ，四圖至第六圖為本發明實施例提供之一種擋牆之製造示意圖。 ▲ 一 2圖至第十一圖為本發明實施例提供之—種彩色渡光片之製 w不忍圖。[Simple description of the drawing] The figure is a schematic structural view of a color filter of the prior art. 2 to 3 are schematic views showing the manufacture of a black matrix according to an embodiment of the present invention, and FIGS. 4 to 6 are schematic views showing the manufacture of a retaining wall according to an embodiment of the present invention. ▲ Figures 1 through 11 show an embodiment of the invention, which is a color-passing film.
【主要元件符號說明】 基板 100 網版 200 刮板 204 負型光阻材料 104, 噴墨裝置 110 像素區 106 保遵層 114 印刷平台 202 油墨 102, 黑矩陣 102 光罩 300 墨水 112 顏色層 108 導電層 116 9[Main component symbol description] substrate 100 screen 200 squeegee 204 negative photoresist material 104, ink jet device 110 pixel region 106 compliant layer 114 printing platform 202 ink 102, black matrix 102 reticle 300 ink 112 color layer 108 conductive Layer 116 9