1257488 九、發明說明： 【發明所屬之技術領域】 本發明涉及一種用於液晶顯示器（LiqU1d Crystal Display, LCD)的彩 色濾光片及該彩色濾光片的製造方法。 【先前技術】 日液晶顯示器係一種被動式顯示裝置，為達到彩色顯示之效果，需要為 ，提供彩色濾光片，該彩色濾光片的作用係將通過的白光轉化為紅、綠、 I二原色光束，並配合薄膜電晶體（Thin Film Transist〇r，TFT)層及液1257488 IX. Description of the Invention: [Technical Field] The present invention relates to a color filter for a liquid crystal display (LCD) and a method of manufacturing the color filter. [Prior Art] A liquid crystal display is a passive display device. In order to achieve the effect of color display, it is necessary to provide a color filter, which converts the passing white light into red, green, and I primary colors. Light beam and matching thin film transistor (TFT) layer and liquid
晶等，他it件以達成顯示不同色彩影像之效果。彩色渡光片主要包括黑矩 陣及著色層，該著色層係由交替排列的紅、綠、藍三色顏色層⑼l〇rA 組成。 一種先前技術的彩色濾光片的製造方法係顏料分散法（pi柳咖 造方法係將彩色光阻以旋轉塗佈的方式 色相料^ t反上纟工由曝光、顯影製成顏色層。其中該彩色光阻是將彩 的光阻，其具有縣反應與熱硬化 色顏色層必需經過三次的塗佈、曝光、顯影製程，該ί 明^外而方扣機轉鍊的方式塗佈絲，容緒絲旋轉出透 高光阻的浪而且’該製造方法太過複雜，所製得的彩^ 技術S重彩色濾光片的製造方法如第-圖所示，其係以” 光片_造方明以下結合第—圖⑷至第—圖⑻對該彩色i 形成t陣=所_明基板1G，於該透縣板1G的上表面11上 如弟一圖 基錢上塗佈濕式旋轉塗佈法⑽ts_coa_)在該遷明 5 1257488 _ 如第0圖（d)所不，利用光罩19將位於透明基板10上的光阻層15經 由曝光、嘁衫形成複數阻隔壁16、18，每相鄰的阻隔壁丨6、丨8之間形 溝渠21。 如第一圖（e)所^彻噴《置13，例如熱泡式噴墨裝置(ThermalCrystal, etc., he piece to achieve the effect of displaying different color images. The color light-passing sheet mainly comprises a black matrix and a coloring layer, and the colored layer is composed of alternating layers of red, green and blue color layers (9) l〇rA. A prior art method for manufacturing a color filter is a pigment dispersion method. The method for forming a color photoresist in a spin coating manner is to form a color layer by exposure and development. The color resist is a photoresist of the color, which has a coating, exposure, and development process of three times for the county reaction and the thermo-hardening color layer, and the wire is coated by the method of turning the chain.容丝丝 rotates through the high-resistance wave and the manufacturing method is too complicated. The method of manufacturing the color S technology of the heavy-duty color filter is as shown in the first figure. Fang Ming will form a t-array=the same substrate 1G for the color i in combination with the first to the fourth to the fourth (8), and apply a wet rotation on the upper surface 11 of the through-plate 1G. The coating method (10) ts_coa_) is in the reexcitation 5 1257488 _ as shown in FIG. 0(d), and the photoresist layer 15 on the transparent substrate 10 is formed into a plurality of barrier walls 16 and 18 via exposure and squeezing. A ditch 21 is formed between each adjacent barrier wall 丨6, 丨8. As shown in the first figure (e), "13", for example, heat Bubble inkjet device (Thermal
Bubble Ink Jet Prmtmg Apparatus)或者壓電式喷墨裝置（Piez〇electric Ink Jet Printing Apparatus)，將需要的顏色的墨水以微液體2〇注入阻 隔壁16、18之間的溝渠21内，該複數微液體2〇於溝渠21内融合成墨水。 如第一圖（f)所示，利用固化裝置42，例如加熱裝置或者發光裝置，將 溝渠21 _墨水烘乾或交連或二者兼有之，以形成平坦的顏色層41，該顏 • 色層41可以為紅色，相應地，其他的藍顏色層及綠顏色層依次形成在該 顏色層41的一側。 如第一圖（g)所示，移除位於該透明基板10的黑矩陣12上的複數阻隔 壁16、18後在該透明基板1〇上形成覆蓋該黑矩陣12、丨4與紅、綠、藍顏 色層41、141、241的透明導電層46。該透明導電層46可以係採用真空濺 鍍裝置形成的氧化銦錫薄膜。 一彳 該種以喷墨技術製造彩色濾光片的方法使用噴墨裝置將紅、綠、藍三 種顏色層41、141、241同時噴印在透明基板1〇上，可以簡化製程，並提 高紅、綠、藍三種顏色層41、141、241設置位置的精確度。惟，因該黑矩 藝陣12、14係設置在該透明基板1〇的上表面11上，當該黑矩陣12、14的 材料存有孔洞時，注入溝渠21内的墨水很容易經該孔洞接觸到該黑矩陣 12 14外的/主有不相同顏色的溝槽内的墨水，從而造成不同顏色的顏色層 的展色。 【發明内容】 .以下，將以實施例說明一種可避免不同顏色顏色層混色的彩色濾光 片，以及，一種彩色濾光片的製造方法。 為實現上述實施例之内容提供一種彩色濾光片，該彩色濾光片包括透 明基板、黑矩陣及著色層，其中該黑矩陣設置在自該透明基板表面凹入的 溝槽内，該著色層設置在該透明基板的表面上並位於黑矩陣之間。 為實現上述實施例内容還提供一種彩色濾光片的製造方法，該彩色遽 1257488 下列步驟.：提供透明基板’且於該透明基板的表面上 明1 &、面凹人的複數溝槽；於該溝槽⑽成黑轉；於該透 陣』光片的製造方法以及彩色濾光片均因係將黑矩 有孔：夺，注:阻隔壁之=ϊ:=入的溝槽内’當該黑矩陣的材料存 色的顏色層的混色。·土'水不；接觸到該黑矩陣，從而避免不同顏 Φ 【實施方式】 _對細色核片的製造方法進行說明。 包括相與=2基板5°，例如玻璃基板’該透咖 的上數= 的方式於該透明基板50 51凹入β成她諸511，該溝槽㈣自該透明基板5G的上表面 如苐一圖（c)所示，利用嘖黑奘番μ _ 雜裝置，將有機$辦光阻置G ’例如熱泡讀墨裝μ者壓電式 數溝:二内(’ _微_ 矩陣53的"上表面塗佈在該透明基板即的形成有黑 該光阻層54背_下表面52 外光從該透明基板5〇的與 黑矩陣53的存在，該M j阻層54進行曝光。此時，由於該 光，而被其遮擔的光阻皮其遮播的光阻層54曝 於該透明基板5〇的卜μ 九的a射。或，將負型光阻材料塗佈 —-54^ 如第二圖（e、辦— 矩陣53上的阻隔壁15+、匕之兀阻層54經顯影製程形成複數位於黑 1257488 如第二圖（f)所示，利用喷墨裝置7〇，例如熱泡式噴墨裝置或者壓電式 歲墨k置，將需要的顏色的墨水以微液體71分別注入相鄰的阻隔壁55之 間’該複數微液體71於阻隔壁55之間融合成墨水56。 如第二圖（g)所示，利用固化裝置，例如加熱裝置、發光裝置或者加熱 裝置結合抽真空裝置，將阻隔壁55之關墨水56魏歧連或二者兼有 之，以形成平坦的需要的顏色的複數齡層57。並且移除位於該透明基板 50的黑矩陣53上的複數阻隔壁55。 一如第一圖（h)所示，在該透明基板5〇上形成覆蓋該黑矩陣53與紅、綠、Bubble Ink Jet Prmtmg Apparatus) or Piez〇electric Ink Jet Printing Apparatus, which injects ink of a desired color into the trench 21 between the barrier walls 16, 18 in a micro-liquid 2〇, the plurality of micro-liquids The liquid 2 is fused into the ink in the trench 21. As shown in the first diagram (f), the trench 21_ink is dried or crosslinked or both by a curing device 42, such as a heating device or a light emitting device, to form a flat color layer 41. The layer 41 may be red, and correspondingly, other blue color layers and green color layers are sequentially formed on one side of the color layer 41. As shown in the first figure (g), after removing the plurality of barrier walls 16, 18 on the black matrix 12 of the transparent substrate 10, the black matrix 12, the 丨4 and the red and green are formed on the transparent substrate 1? The transparent conductive layer 46 of the blue color layers 41, 141, 241. The transparent conductive layer 46 may be an indium tin oxide film formed by a vacuum sputtering apparatus. The method for manufacturing a color filter by inkjet technology uses an inkjet device to simultaneously print three color layers 41, 141, and 241 of red, green, and blue on a transparent substrate, thereby simplifying the process and increasing the red color. The green, blue three color layers 41, 141, 241 set the position accuracy. However, since the black matrix 12 and 14 are disposed on the upper surface 11 of the transparent substrate 1 , when the material of the black matrix 12 and 14 has holes, the ink injected into the trench 21 easily passes through the hole. The ink in the grooves outside the black matrix 12 14/mainly having different colors is contacted, thereby causing color development of color layers of different colors. SUMMARY OF THE INVENTION Hereinafter, a color filter which can avoid color mixing of different color layers will be described by way of example, and a method of manufacturing a color filter will be described. In order to achieve the content of the above embodiments, a color filter is provided, the color filter includes a transparent substrate, a black matrix and a coloring layer, wherein the black matrix is disposed in a groove recessed from a surface of the transparent substrate, the colored layer It is disposed on the surface of the transparent substrate and between the black matrices. In order to achieve the above embodiments, a method for manufacturing a color filter is provided. The color 遽 1257488 is provided in the following steps: providing a transparent substrate ′ and forming a plurality of grooves on the surface of the transparent substrate; The groove (10) is turned black; in the method of manufacturing the transparent film and the color filter, the black moment has a hole: a note, the barrier wall = ϊ: = in the groove When the material of the black matrix stores the color mixture of the color layers. · Soil 'water does not; contact with the black matrix to avoid different colors Φ [Embodiment] _ The method of manufacturing a fine color core sheet will be described. Including the phase and the =2 substrate 5°, for example, the glass substrate 'the number of the tops of the coffee beans' is recessed into the transparent substrate 50 51 to form the 511, and the groove (4) is from the upper surface of the transparent substrate 5G. As shown in Figure (c), using the 啧黑奘番μ _ miscellaneous device, the organic light is set to G', for example, the thermal bubble reading ink is installed in the piezoelectric type groove: two inner (' _ micro_ matrix 53 The upper surface is coated on the transparent substrate, that is, the black is formed on the back surface of the photoresist layer 54, and the light is emitted from the transparent substrate 5 from the black matrix 53. The M j resist layer 54 is exposed. At this time, due to the light, the photoresist layer 54 which is covered by the photoresist film which is covered by the light is exposed to the a film of the transparent substrate 5, or the negative photoresist material is coated. ——54^ As shown in the second figure (e, the barrier layer 15+ on the matrix 53 and the barrier layer 54 on the ruthenium are formed by the development process, the plurality is located in the black 1257488, as shown in the second diagram (f), using an inkjet device. 7〇, for example, a thermal bubble type inkjet device or a piezoelectric ink set, the ink of the required color is injected into the adjacent barrier wall 55 by the micro liquid 71 respectively. The partition 55 is fused between the partitions 55 to form the ink 56. As shown in the second diagram (g), the curing device, such as a heating device, a illuminating device or a heating device, is used in combination with the vacuuming device to separate the ink 55 of the barrier wall 55 or both. In order to form a plurality of layers 57 of a flat desired color, and removing the plurality of barrier walls 55 on the black matrix 53 of the transparent substrate 50. As shown in the first figure (h), on the transparent substrate Forming a cover on the black matrix 53 with red and green
藍的導電層58。該導電層58可以絲用真空濺鍍裝置形成的氧 化姻锡薄膜。 所示’利用上述的製造方法製得的本發明的彩色遽光片 甚I ^ 透明基板5〇、設置在自該透明基板5G上表面51凹入的 ί ^ 、設置在糊基板5G的上表面51上並位於黑矩 _層57錢53與顏色層Μ 經過曝光姆製程製得為宜。當 用研磨方錢__該_ ，可以採 本lx明办色濾光片的第二實施例的製造方法同 # 。 色滤光片製造方法基本相同，其不同之處在於 ^ _列的# 並採用研龄式或者侧方式將轉_高出締層的部HI的步驟’ 如第四圖所示，係本發明彩色濾 ： 示 濾光片同第-實施例的彩色濾光片基本相同弟心剖面圖。該彩色 的彩色遽光片的阻隔壁95保留在黑矩陣94上該方該第三實施例 顏色層96的厚度，且有一伴9 卩隔土郎的厚度大於該 與顏色層96上。該4二導電㈣依次覆蓋在該阻隔壁95 層用以保姉且隔壁95與顏色層96’同時滿足 1257488 平坦度要求。當然，亦可僅將導電層98覆蓋在該阻隔壁95與顏色層昍上。 本發明彩色滤光片的第三實施例的製造方法同前述的第―實二例的彩 色漉光片製造方法基本相同’其不同之處在於取消了移除阻隔壁的步驟， 並在阻隔賴祕層上依次覆蓋—保護層與_導電層，或者直接在阻隔璧 與顏色層上覆蓋一導電層。 上述的彩色滤光片的製造方法以及三種實施例的彩色濾光片均因係將 黑矩陣側壁的孔洞設置在自透明基板表面凹入的溝槽内，當該黑矩陣的材 料存有孔洞時，注人阻隔壁之間的墨水不會接觸到該黑矩陣，從而避免不 同顏色的顏色層的混色。同時，該黑矩陣設置在溝槽内後，可以直接利用 該黑矩陣為光罩從透明基板的背面對光阻層進行曝光形成該阻隔壁，而益 須採用光罩進而避免需將光罩與黑矩陣對位的複雜操作。 … 綜上所述，本發明確已符合發明專利之要件，爱依法提出專利 ，二上所述者僅為本發明之雛實施方式，本發明之範隨不以上述· 二二為t ’舉凡熟習本案技藝之人士援依本發明之精神所作之等效“ 或、又化，皆應涵蓋於以下申請專利範圍内。 /飾【圖式簡單說明】 第一圖係’先前技術彩色濾光片的製造方法的示意圖。 第二圖係本發明彩色濾光片的製造方法的示意圖，其^中第 —明彩色濾光片的第一實施例的剖面示意圖。 ^三圖係本發明彩色遽光片的第二實施例的剖面示意圖。 第四圖係本發明彩色縣片的第三實施例的剖面示意圖。【主要元件符號說明】 透明基板 .圖（h)顯示本發 下表面 黑矩陣 阻隔壁 顏色層 噴墨裝置 保護層 53 55 57 50 52 84、 94 85、 95 86、 96 60、70 97 上表面 溝槽 光阻層 墨水 導電層 微液體 51 511 54 56 58、98 61、71Blue conductive layer 58. The conductive layer 58 can be a oxidized tin oxide film formed by a vacuum sputtering apparatus. The color light-emitting sheet of the present invention, which is produced by the above-described manufacturing method, is disposed on the upper surface of the paste substrate 5G, and is disposed on the upper surface 51 of the transparent substrate 5G. 51 is located in the black moment _ layer 57 money 53 and color layer Μ is made by the exposure process. When the grinding method __this_ is used, the manufacturing method of the second embodiment of the present color filter can be the same as #. The color filter manufacturing method is basically the same, and the difference is that the step of the _ column and the step of turning the HI higher than the portion HI of the layer is performed as shown in the fourth figure. Color filter: The filter is substantially the same as the color filter of the first embodiment. The barrier ribs 95 of the colored color grading sheet are retained on the black matrix 94 by the thickness of the color layer 96 of the third embodiment, and a thickness of the ridge 9 is greater than that of the gradation layer 96. The 4 second conductive (four) sequentially covers the barrier layer 95 layer for protection and the partition wall 95 and the color layer 96' satisfy the 1257488 flatness requirement. Of course, only the conductive layer 98 may be covered on the barrier layer 95 and the color layer. The manufacturing method of the third embodiment of the color filter of the present invention is substantially the same as the manufacturing method of the color enamel sheet of the second embodiment described above. The difference is that the step of removing the barrier wall is eliminated, and the barrier is removed. The secret layer covers the protective layer and the _ conductive layer in turn, or directly covers a conductive layer on the barrier 璧 and the color layer. The method for manufacturing the color filter described above and the color filter of the three embodiments are both for arranging the holes of the sidewalls of the black matrix in the grooves recessed from the surface of the transparent substrate, when the material of the black matrix has holes. The ink between the barrier walls does not touch the black matrix, thereby avoiding color mixing of color layers of different colors. At the same time, after the black matrix is disposed in the trench, the black matrix can be directly used as a photomask to expose the photoresist layer from the back surface of the transparent substrate to form the barrier wall, and it is necessary to use a photomask to avoid the need for the photomask. The complex operation of the black matrix alignment. In summary, the present invention has indeed met the requirements of the invention patent, and loves to patent according to law. The above description is only the embodiment of the present invention, and the invention is not based on the above-mentioned two-two. Those skilled in the art will be able to cover the equivalent of the following claims in the spirit of the present invention. / Decoration [Simple Description] The first picture is a 'previous color filter' BRIEF DESCRIPTION OF THE DRAWINGS The second drawing is a schematic view of a method for fabricating a color filter of the present invention, and a cross-sectional view of a first embodiment of a first color filter. ^Three figures are colored twilight of the present invention A cross-sectional view of a second embodiment of a sheet. The fourth drawing is a schematic cross-sectional view of a third embodiment of the color county sheet of the present invention. [Main element symbol description] Transparent substrate. Figure (h) shows the black matrix barrier wall of the lower surface of the present invention. Color layer inkjet device protective layer 53 55 57 50 52 84, 94 85, 95 86, 96 60, 70 97 Upper surface groove photoresist layer Ink conductive layer Micro liquid 51 511 54 56 58, 98 61, 71