JP2003270430A - Method for manufacturing color filter substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To form respective color filters coexisting on a substrate in a composite color filter serving concurrently as transmissive and reflective types without increasing the number of steps. <P>SOLUTION: Reflection parts 3 on the substrate are defined as scattering reflection plates 6. The substrate surface where no scattering reflection plates 6 exist is defined as transmission parts 5. Inks 7-R, 7-G, 7-B for the color filters are made to protrude through the surfaces of the scattering reflection plates 6 centering the transmission parts 5. Surfaces of the inks are pressed with a shell with a water repellent surface and the color filters 7'-R, 7'-G, 7'-B for the reflection parts and the color filters 7"-R, 7"-G, 7"-B for the reflection parts are simultaneously formed. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color filter substrate used in a reflective / transmissive liquid crystal.

[0002]

2. Description of the Related Art Since a transmissive part color filter and a reflective part color filter have different transmissivities, conventionally, when these are formed on the same substrate, red (R), green (G), and blue (B) are used. The manufacturing process by photolithography was performed twice for each of the filters (2) and a total of 6 times. The conventional manufacturing process is shown in FIG.

First, a transparent uneven scattering film (11) is formed on a glass substrate (10) (FIG. 2). Subsequently, the portion which becomes the transmissive portion (12) in the pixel is selectively exposed by a mask to erase the unevenness, and the transparent uneven scattering film flat portion (11 ') is formed (FIG. 2). Here, after the metal thin film (13) is formed on the outer surface by a stapper process or the like, the other metal thin film (13) is removed by etching while leaving the reflective portion, so that the uneven reflection surface of the reflective portion is mirror-finished. Board (14)
Are formed (FIG. 2-). Then, the transparent part (1
2) The color filters (15-R) for the transmission part, (1
5-G) and (15-B) are formed (FIG. 2-).
Finally, color filters (16-R) and (16
-G) and (16-B) are formed respectively (Fig. 2-).

[0004]

However, in the photolithography process used in the conventional color filter manufacturing process described above, a large amount of coating agent is required at the time of coating, a coating machine, a camera, or a mask used at the time of exposure. Is an expensive equipment, and it costs a lot of money to deal with pollution such as developer waste, so it is a high manufacturing cost method. Therefore, in manufacturing a combined color filter in which a color filter for a transmissive part and a color filter for a reflective part are provided on a single substrate, a costly photolithography process is used six times, and thus the unit price is high. It does not meet the market requirements. Therefore, it is an object of the present invention to provide a method for manufacturing a color filter, which suppresses an increase in cost due to the use of a photolithography process and enables low-cost and efficient manufacturing.

[0005]

In order to solve the above-mentioned problems, the invention according to claim 1 has a color filter for a reflection part and a color filter for a transmission part for each color of red, green and blue on a single substrate. A method of manufacturing a color filter substrate coexisting with, wherein a region for forming a reflection portion on the substrate (for example,
A scattering reflection plate (6) having a predetermined film thickness is formed on the reflection portion 3), and a portion where the scattering reflection plate is not formed is used as a transmission portion formation region (for example, transmission portion 5) to form a planographic offset. Color filter inks (7-R, 7-G, 7-B) centered on the transparent part formation area of each color by printing method
The color filter ink (7'-) is pressed by pressing the color filter ink to flatten the surface from the transmission portion forming area to the surrounding scattering reflection plate.
R, 7'-G, 7'-B) and the transmission part color filter (7 "-R, 7" -G, 7 "-B) are formed at the same time.

According to a second aspect of the present invention, in the method of manufacturing a color filter substrate according to the first aspect, the average film thickness of the scattering reflection plate formed on the substrate is adjusted (for example, 0.5 μm to 3.0 μm) so that the film thickness ratio of the reflective part color filter and the transmissive part color filter is set to a desired value (for example, 1: 2 to 1:10). .

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION Next, an embodiment of a method for manufacturing a color filter substrate according to the present invention will be described in detail with reference to the accompanying drawings.

Prior to this, an outline of the technique adopted in the present invention will be described. In the present invention, an inexpensive lithographic offset printing method is used instead of using a high-cost photolithography process, and R, G, This is a method having a technical feature in that the number of steps can be reduced from the conventional 6 steps to 3 steps by simultaneously forming the transmissive part filter and the reflective part filter for each color of B. In order to make this possible, in the method of the present invention, a flatbed type lithographic offset printing machine equipped with a water-repellent press cylinder is used.

FIG. 1 shows an embodiment of a method of manufacturing a color filter substrate according to the present invention, and the outline of the manufacturing process is as follows.
Are described in this order. First, a black resist 2 (for example, a resist for a light-shielding film containing carbon) is applied on the glass substrate 1 for liquid crystal to a thickness of 1.2 μm, for example (see FIG. 1). After the black resist 2 is dried, it is selectively exposed with a predetermined mask and developed to remove the unfixed black resist. Thus, the black resist remains on the reflection portion 3 that is the reflection portion forming region in the color filter pixel portion, and the remaining black resist is subjected to heat treatment to form an uneven pattern on the surface to form the uneven scattering film 3 '(FIG. 1-see).

With the uneven scattering film 3'formed on the substrate 1 as described above, the metal thin film 4 is formed by the sputtering process.
Are formed, and unnecessary metal thin films are removed from the transmissive portions 5 (portions to be the transmissive portion forming regions in the color filter pixel portion) by etching so that the metal thin film 4 remains only in the reflective portions. Thus, the scattering reflection plate 6 having a mirror surface is formed on the uneven scattering film 3 '(see FIG. 1).

Subsequently, the color filter inks 7-R, 7-G, and 7-B are spread around the transparent portion 5 by a lithographic offset printing method (see FIG. 1). The printing plate for printing the color filter ink is prepared in advance according to the pixel shape including the transmissive portion 5 and the reflective portion 3.

After the color filter inks 7-R, 7-G, and 7-B are piled up as described above, the surface is pressed by a cylinder having a water-repellent surface to flatten the ink surface of each color. To do. That is, the ink is fluidized by press-bonding from the surface by a press, spreads from the transmissive portion 5 to the reflective portion 3, and the color filter 7'-R, 7'-G, 7'for the reflective portion.
-B and color filters for transmission part 7 "-R, 7" -G,
7 ″ -B are simultaneously formed (see FIG. 1).

Therefore, according to the method of manufacturing the color filter substrate according to the above-described embodiment, the inexpensive lithographic offset printing method is used instead of the high-cost photolithography process, so that the cost of using the photolithography process is increased. The increase can be suppressed. Moreover, the color filter inks 7-R, 7-G, and 7-B, which are centered around the transmission portion forming regions of each color, are pressed by the lithographic offset printing method to press the reflection portion color filters 7'-R, 7'-. Since G, 7'-B and the color filters 7 "-R, 7" -G, 7 "-B for the transmission part are formed at the same time, the six steps (R, G) which were conventionally required to form the color filter are performed. , 3 steps required for forming the filter for the transmissive part of each color of B, B and 3 steps required for forming the filter for the reflective part of each of R, G, B) can be reduced to half of 3 steps, which is inexpensive. In addition, the color filter substrate can be manufactured efficiently.

Further, as described above, the scattering reflection plate 6 having an appropriate thickness is formed in the reflection part formation region on the substrate 1, while the transmission part formation region is not formed with the scattering reflection plate 6 and is transmitted. By forming the part 5, the color filter ink 7-
The color filters 7'-R, 7'-G, 7'-B for the reflection part and the color filters 7 "-R, 7" -for the transmission part formed by R, 7-G, 7-B for each pixel. It is easy to obtain the film thickness ratio with G, 7 ″ -B as a desired value.

Strictly speaking, the color filters 7'-R, 7'-G, 7'-B for the reflection part and the color filters 7 "-R, 7" -G, 7 "-B for the transmission part are used. The film thickness ratio slightly changes depending on the amount of ink for the color filter used for printing and the area of the pixel portion where the ink spreads. In order to set the "thickness of" to a large value such as 1: 2 to 1:10, the thickness of the transmissive color filter is made thicker than the thickness of the reflective color filter is made thinner. It is easier to achieve higher accuracy. Therefore, if a manufacturing method is adopted in which the average film thickness of the scattering reflection plate 6 formed on the substrate is adjusted so that the film thickness ratio of the reflective part color filter and the transmissive part color filter is a desired value, the color It is possible to easily realize the “formation film thickness ratio of the color filter for the reflection part and the color filter for the transmission part” which is variously demanded according to the purpose of use of the filter substrate.

[0016]

As described above, according to the method of manufacturing a color filter substrate according to the first aspect, an inexpensive lithographic offset printing method is used instead of using a high-cost photolithography process, and further, a lithographic offset printing method is used. Conventionally, it is necessary to form a color filter because a color filter for a reflective portion and a color filter for a transmissive portion are simultaneously formed by pressing ink for a color filter that is centered around a transmissive portion forming region of each color by a printing method. It is possible to reduce 6 steps to 3 steps. Therefore, according to the present invention, it is possible to provide a method for manufacturing a color filter that suppresses an increase in cost due to the use of a photolithography process, and that can be manufactured inexpensively and efficiently.

Further, according to the method of manufacturing a color filter substrate according to the second aspect, the scattering reflection plate having a predetermined film thickness is formed in the reflection portion forming region on the substrate, and the scattering reflection plate is formed. Since the part not formed is the transmissive part forming region, the step between the part (substrate surface) where the transmissive part color filter is formed and the part (top surface of the scattering reflection plate) where the reflective part color filter is formed, The average film thickness of the scattering reflection plate formed on the substrate can be adjusted as desired, and when the color filter ink is leveled to form the color filter, the color filter for the reflection part and the transmission part It is easy to obtain a desired film thickness ratio with the color filter. As a result, it is possible to easily realize the “formed film thickness ratio of the color filter for the reflective portion and the color filter for the transmissive portion”, which is variously demanded according to the purpose of use of the color filter substrate, and has a wide range of applications. This is a method of manufacturing a color filter substrate.

[Brief description of drawings]

FIG. 1 is a process explanatory diagram of a color filter manufacturing method according to the present invention.

FIG. 2 is a process explanatory view of a conventional color filter manufacturing method.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Black resist 3 Reflection part 3'Uneven scattering film 4 Metal thin film 5 Transmission part 6 Scattering reflection plate 7-R, 7-G, 7-B Color filter ink 7'-R, 7'-G, 7 ′ -B Color filter for reflection part 7 ″ -R, 7 ″ -G, 7 ″ -B Color filter for transmission part

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hikaru Toyota             1378-7 Shimoishi, Otawara, Tochigi Prefecture Mitsumura Printing             Nasu factory inside F term (reference) 2H048 BA11 BA45 BA47 BA48 BA55                       BB02 BB08 BB42                 2H091 FA02Y FA14Y FC12 LA12

Claims (2)

[Claims] 1. A method of manufacturing a color filter substrate, wherein a color filter for a reflective portion and a color filter for a transmissive portion for each color of red, green and blue coexist on a single substrate, the method for forming a reflective portion on a substrate. A scattering reflection plate having a predetermined film thickness is formed in the region, and a portion where the scattering reflection plate is not formed is defined as a transmission part formation region, and a color is formed around the transmission part formation region of each color by a planographic offset printing method. Fill the filter ink and press this color filter ink to flatten the surface from the transmission part formation area to the surrounding scattering reflection plate, so that the reflection part color filter and the transmission part color filter can be simultaneously formed. A method of manufacturing a color filter substrate, characterized in that the color filter substrate is formed. 2. The film thickness ratio of the color filter for the reflective portion and the color filter for the transmissive portion is set to a desired value by adjusting the average film thickness of the scattering reflection plate formed on the substrate. The method of manufacturing a color filter substrate according to claim 1, wherein.