WO2013127208A1

WO2013127208A1 - Color filter and fabricating method thereof

Info

Publication number: WO2013127208A1
Application number: PCT/CN2012/085204
Authority: WO
Inventors: 赵吉生
Original assignee: 京东方科技集团股份有限公司
Priority date: 2012-02-29
Filing date: 2012-11-23
Publication date: 2013-09-06
Also published as: CN102707357A; CN102707357B

Abstract

Provided are a color filter and a fabricating method thereof. The color filter comprises a black matrix layer (20) formed on a substrate and defining multiple sub-pixel regions, and multiple color filter layers (30) formed in the multiple sub-pixel regions defined by the black matrix layer respectively, wherein the black matrix layer between two adjacent sub-pixel regions has such a shape that the upper side is wide and the lower side is narrow in the cross-section, the cross-section of the color filter layer has the corresponding shape that the lower side is wide and the upper side is narrow. An overlapped area (40) is provided between the black matrix layer and the color filter layer, and the overall thickness of the black matrix layer and the color filter layer in the overlapped area equals to the thickness of the black matrix layer or the color filter layer in the non-overlapped area (41).

Description

Color filter and manufacturing method thereof

Background technique

Liquid crystal display (LCD) is a non-active light-emitting component. The light source must be provided by an internal backlight. It can be combined with the driver IC and liquid crystal control to form a gray-scale display of black and white colors, and then pass the color filter ( Color Filter, CF ) The three color filters of red (R), green (G), and blue (B) form a color display. Therefore, color filters are key components for colorization of liquid crystal displays. The quality of the system not only determines the pros and cons of the LCD, but also determines the yield of the subsequent process.

In the current process of manufacturing color filters, the color filter layer needs to have a partial overlap with the black matrix. The purpose of this method is to avoid light leakage, because the color filter layer shrinks during baking, if the color filter is designed. The layer does not overlap with the black matrix, which is highly susceptible to light leakage defects after baking. Although this method avoids light leakage, the area where the color filter layer overlaps with the black matrix is higher than the sub-pixel area, which is called "segment difference". The step difference has a detrimental effect on the subsequent process of the box, which disturbs the orientation of the liquid crystal. Therefore, a flat layer (OC) is formed in the production of the color filter, eliminating the step difference and adding a one-step manufacturing process.

Thus, it can be seen that there is a problem in the prior art that a process of manufacturing a flat color layer is required in the process of manufacturing a color filter. Summary of the invention

An embodiment of the present invention provides a color filter, including: a black matrix layer defined on a substrate defining a plurality of sub-pixel regions, and a plurality of color filters formed in a plurality of sub-pixel regions defined by the black matrix layer a light layer, wherein a portion of the black matrix layer between two adjacent sub-pixel regions has a cross section of a large upper and lower small shape, and a color filter layer is formed to have a cross section having a corresponding shape of a lower large and small upper, the black matrix layer a portion having an overlap with the color filter layer, and a sum of thicknesses of the black matrix layer and the color filter layer in the overlap region is equal to a thickness of the black matrix layer or the color filter layer of the non-overlapping region Degree.

Another embodiment of the present invention provides a method of fabricating a color filter for manufacturing the color filter described above, comprising: applying a first type of photoresist layer in which a black pigment is dispersed on a surface of a substrate; dispersing therein A second type of photoresist layer having a black pigment is applied to the first type of photoresist layer, wherein the first type of photoresist layer is one of a positive photoresist and a negative photoresist, the second category The photoresist layer is another one of a positive photoresist and a negative photoresist; the second type photoresist layer is exposed and developed by a mask; directly lithography is performed on the first category The adhesive layer is exposed and developed to form a black matrix layer portion having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is smaller in size and smaller in size; and a color filter layer is formed in the sub-pixel region.

A further embodiment of the present invention provides a method of manufacturing a color filter, for manufacturing the color filter, comprising: applying a first photosensitive material layer of a black matrix layer to a surface of the substrate; and second sensing the black matrix layer The material layer is coated on the first photosensitive material layer of the black matrix layer, the first photosensitive material layer and the second photosensitive material layer are positive photoresist, or the first photosensitive material layer and the second photosensitive material layer are negative photoresist, Wherein the first photosensitive material layer and the second photosensitive material layer both comprise an alkali-soluble resin, and the content of the alkali-soluble resin of the first photosensitive material layer is greater than the content of the alkali-soluble resin of the second photosensitive material layer; a photosensitive material layer and a second photosensitive material layer are exposed and developed to form a black matrix layer having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is larger in size and smaller in size; formed in the sub-pixel region Color filter layer. DRAWINGS

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the embodiments or the prior art description will be briefly described below. Obviously, the drawings in the following description relate only to some of the present invention. The examples are not intended to limit the invention.

1 is a structural view of a color filter provided by the present invention;

2 is a flow chart of a method for manufacturing a double exposure of a color filter provided by the present invention;

3 is a structural diagram of a color filter having a sub-pixel region provided by the present invention;

4 is a flow chart of a method for manufacturing a single exposure of a color filter provided by the present invention. detailed description

The technical solutions in the embodiments of the present invention will be clearly and completely described in the following with reference to the accompanying drawings. It is apparent that the described embodiments are only a part of the embodiments of the invention, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present invention without departing from the inventive scope are the scope of the present invention.

One of the objects of the embodiments of the present invention overcomes the problem of the complicated process caused by the need to fabricate a flat layer in the process of manufacturing a color filter in the prior art.

An embodiment of the present invention provides a color filter, as shown in FIG. 1, including a black matrix layer 20 formed on a substrate 10, the black matrix layer 20 defining a plurality of sub-pixel regions; a plurality of color filter layers 30 in the sub-pixel regions, wherein the portion of the black matrix layer 20 between the two adjacent sub-pixel regions has a cross section of a large upper and lower small shape, and the color filter layer 30 has a larger size and a smaller size. The cross section of the shape. The black matrix layer 20 and the color filter layer 30 overlap each other at the interface 40. Here, in a region where both a black matrix layer and a color filter layer are formed, the region may be referred to as an overlap region; and in a region where only a black matrix layer or a color filter layer is formed, the region may be called Is a non-overlapping area. In the present embodiment, the sum of the thicknesses of the black matrix layer and the color filter layer of the overlap region 40 is equal to the thickness of the black matrix layer or the color filter layer of the non-overlapping region 41. In the overlap region, both the black matrix layer and the color filter layer may be formed to be complementary in shape.

It can be seen from Fig. 1 that since the overlapping layers 40 and the non-overlapping regions 41 have the same film thickness, it is not necessary to form a flat layer, which simplifies the manufacturing process.

In one embodiment of the present invention, the black matrix layer 20 has an inverted stepped cross-sectional shape at a portion between two adjacent sub-pixel regions, including a first sub-layer 21 having a lower width and a wider width at the upper portion. Two sub-layers 22. The cross-sectional shape of the color filter layer 30 is a positive step shape.

In another embodiment of the present invention, the portion of the black matrix layer 20 between the two sub-pixel units has an inverted trapezoidal cross-sectional shape in which the upper base is longer and the lower base is shorter.

In one embodiment of the invention, the portion of the black matrix layer 20 between the two sub-pixel units has an inverted triangular cross-sectional shape.

According to its chemical reaction mechanism and development principle, photoresist can be divided into two types: negative adhesive and positive adhesive. By

In one embodiment, the first sub-layer 21 and the second sub-layer 22 employ different types of photoresist. For example, the first photosensitive material of the first sub-layer 21 is a positive photoresist, and the second photosensitive material of the second sub-layer 22 is a negative photoresist, and the first photosensitive material of the first sub-layer 21 is a negative photoresist. , the second sensitization of the second sub-layer The material is a positive photoresist.

In one embodiment of the present invention, the first sub-layer 21 and the second sub-layer 22 are made of a photoresist of the same nature, that is, the first photosensitive material and the second photosensitive material are both positive photoresists, or first Both the photosensitive material and the second photosensitive material are negative photoresists. In this case, the first photosensitive material and the second photosensitive material are different in that the alkali-soluble resin contents of the two are different. For example, the content of the alkali-soluble resin of the first photosensitive material is greater than the content of the alkali-soluble resin of the second photosensitive material. For example, the first photosensitive material may have an alkali-soluble resin weight percentage of 5% to 79%, and the second photosensitive material may have an alkali-soluble resin weight percentage of 0.05% to 30%. Thus, during development, the first sub-layer 21 having a narrow cross section and the second sub-layer 22 having a wide cross-section can be easily obtained by using the same alkali solvent, thereby obtaining a black matrix layer 20 having a cross-sectional shape that is upper and lower. . In one embodiment, the first photosensitive material comprises: 5% to 45% by weight of black pigment, 0.5% to 67% by weight of dispersant, 0.05% by weight, based on the following components and ratios; -30% dispersion resin, 5% to 79% by weight of alkali-soluble resin, 2% to 25% by weight of ethylenically unsaturated monomer, 0.05% to 10% by weight of epoxy resin, weight The percentage is from 20% to 80% of the solvent, from 0.05% to 10% by weight of the photoinitiator, and from 0.01% to 2% by weight of the surface tension-modifying additive. The second photosensitive material comprises: 5%-45% by weight of black pigment, 0.5%-67% by weight of dispersant, 0.05%-30% by weight of dispersion resin, 0.05%-30% by weight Alkali-soluble resin, 2%-25% by weight of ethylenically unsaturated monomer, 0.05%-10% by weight of epoxy resin, 20%-80% by weight of solvent, 0.05% by weight - 10% of the photoinitiator, 0.01% to 2% by weight of the agent to change the surface tension.

In one embodiment, the additive that changes the surface tension may employ a leveling agent, a surface flow control, and a silane coupling agent. The ethylenically unsaturated monomer is a polyfunctional acrylate monomer.

Another embodiment of the present invention provides a method of fabricating a color filter for fabricating a color filter as described above, as shown in FIG.

Step 101: Apply a positive photoresist layer in which a black pigment is dispersed to the surface of the substrate.

Step 102: Apply a negative photoresist layer in which a black pigment is dispersed on the positive photoresist layer.

Step 103: Exposing the negative photoresist layer with a mask and performing development.

Step 104: Directly exposing the positive photoresist layer and performing development to form a black matrix layer having a shape of a large upper and lower cross section and a sub-pixel region having a corresponding shape with a lower cross section and a smaller cross section. Step 105: Form a color filter layer in each sub-pixel region.

In one embodiment of the present invention, since the substrate is coated with a positive photoresist layer and a negative photoresist layer is coated on the positive photoresist layer, in step 103, the mask is placed on the negative photoresist. On the layer, the negative photoresist layer in the area that is desired to be preserved is exposed, and then the corresponding solvent is used for development. Since the negative photoresist is exposed to the corresponding solvent, an insoluble matter is formed, and the exposed region is not exposed. As a soluble material, the negative photoresist in the exposed region is thus developed to form a wider second sub-layer of the upper portion. In step 104, instead of using a separate mask, the second sub-layer is used as a mask to directly expose the positive photoresist layer and perform development, thereby, except for the area covered by the second sub-layer. The positive photoresist layers in (eg, sub-pixel regions) are all exposed. The positive light gel is exposed to form a soluble substance, while the unexposed areas are still insoluble. At the same time, due to the underside of the edge portion of the second sub-layer, a certain amount of illumination is inevitably received, so that the positive photoresist layer under the edge portion of the second sub-layer becomes soluble, thereby developing the positive light. The area retained by the engraved layer is slightly smaller than the area retained by the negative photoresist layer. As a result, as shown in Fig. 3, the portion of the black matrix layer 20 having the upper and lower cross-sections and the corresponding sub-pixel region 31 having the upper and lower large shapes are formed on the substrate 10. Finally, as shown in Fig. 1, a color filter layer 30 is formed in the sub-pixel region. In order to ensure that the positive photoresist layer and the negative photoresist layer do not penetrate each other, after the positive photoresist layer is applied to the surface of the substrate, pre-baking is performed, and then the negative photoresist layer is coated on the positive photoresist. Make another pre-baking.

In another embodiment of the present invention, in step 101, a negative photoresist layer in which a black pigment is dispersed may be applied to the surface of the substrate, and in step 102, a positive light in which the black pigment is dispersed may be disposed. The adhesive layer is applied to the negative photoresist layer. In step 103, the upper photoresist layer is exposed by a mask and developed. In step 104, the negative photoresist is directly exposed and developed to form a black matrix layer portion having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is larger and smaller.

Step 201: Apply a first photosensitive material layer of the black matrix layer to the surface of the substrate.

Step 202: Apply a second photosensitive material layer of the black matrix layer to the first photosensitive material layer.

Step 203: exposing the first photosensitive material layer and the second photosensitive material layer with a mask, and performing development to form a black matrix layer portion having a cross-sectional shape that is upper and lower, and a cross-sectional shape corresponding to a large upper and a lower Sub-pixel area. Step 204, forming a color filter layer in the sub-pixel region.

In one embodiment of the invention, the first photosensitive material layer is used to form a first sub-layer of the black matrix layer portion, and the second photosensitive material layer is used to form a second sub-layer of the black matrix layer portion. The first photosensitive material layer and the second photosensitive material layer are both positive photoresists, or both the first photosensitive material layer and the second photosensitive material layer are negative photoresists. The first photosensitive material layer and the second photosensitive material layer each include, for example, an alkali-soluble resin, and the content of the alkali-soluble resin in the first photosensitive material layer is larger than the content of the alkali-soluble resin in the second photosensitive material layer. Taking the first photosensitive material layer and the second photosensitive material layer as negative photoresists as an example, the first photosensitive material layer and the second photosensitive material layer are exposed by a mask, and the mask is placed on the second photosensitive material film layer. Above, a region where it is desired to retain the first photosensitive material layer and the second photosensitive material layer (for example, a region between sub-pixel regions) is exposed, and then developed with a corresponding solvent. Since the negative photoresist becomes insoluble after exposure to the corresponding solvent, the negative photoresist in the unexposed region is still soluble, so that the negative photoresist in the exposed region is left after development to form a black matrix layer. . In this embodiment, the exposed areas of the first photosensitive material layer and the second photosensitive material layer are the same, because the content of the alkali-soluble resin of the first photosensitive material layer below is larger than the alkali-soluble resin of the upper second photosensitive material layer. The content, therefore, at the time of development, the lower portion of the first photosensitive material layer is removed more, and the portion of the upper second photosensitive material layer removed is less. As a result, as shown in Fig. 3, a black matrix layer 20 having a shape of a large upper and lower cross section and a corresponding sub-pixel region 31 of a large upper and lower large shape are formed on the substrate 10. Finally, as shown in Fig. 1, the color filter layer 30 is filled in the sub-pixel region. In order to ensure that the positive photoresist layer and the negative photoresist layer do not penetrate each other, the positive photoresist layer is applied to the surface of the substrate, pre-baking, and then the negative photoresist layer is applied on the positive photoresist layer. And do another pre-baking.

(1) a color filter comprising: a black matrix layer defined on the substrate defining a plurality of sub-pixel regions; and a plurality of color filter layers formed in the plurality of sub-pixel regions defined by the black matrix layer, wherein the black a portion of the matrix layer between two adjacent sub-pixel regions having a cross section of a large upper and lower small shape, and a color filter layer formed into a cross section having a corresponding shape of a lower large and small upper, the black matrix layer portion and the color There are overlapping regions between the filter layers, and the sum of the thicknesses of the black matrix layer and the color filter layer in the overlap region is equal to the thickness of the black matrix layer or the color filter layer of the non-overlapping region.

(2) The color filter according to (1), wherein a cross-sectional shape of the black matrix layer portion is complementary to a shape of a cross section of the color filter layer. (3) The color filter according to (1) or (2), wherein the black matrix layer portion has an inverted step shape, and includes a first sub-layer having a narrow lower width and a wider upper portion. The second sub-layer, the cross-sectional shape of the color filter layer is a positive step shape.

(4) The color filter according to (3), wherein the first photosensitive material of the first sub-layer is a positive photoresist, and the second photosensitive material of the second sub-layer is a negative photoresist; or

The first photosensitive material of the first sub-layer is a negative photoresist, and the second photosensitive material of the second sub-layer is a positive photoresist.

(5) The color filter according to (3), wherein the first photosensitive material of the first sub-layer and the second photosensitive material of the second sub-layer each comprise an alkali-soluble resin, and the alkali-soluble resin of the first photosensitive material The content of the alkali-soluble resin is greater than that of the second photosensitive material, the first photosensitive material and the second photosensitive material are both positive photoresists, or the first photosensitive material and the second photosensitive material are both negative photoresists.

(6) The color filter according to (5), wherein the alkali photosensitive resin of the first photosensitive material is from 5% to 79% by weight, and the alkali-soluble resin of the second photosensitive material is from 0.05% to 30% by weight.

(7) The color filter according to (6), wherein the first photosensitive material further comprises: a black pigment having a weight percentage of 5% to 45%, a dispersant having a weight percentage of 0.5% to 67%, and a weight percentage of

0.05%-30% dispersion resin, 2%-25% by weight of ethylenically unsaturated monomer, 0.05%-10% by weight of epoxy resin, 20%-80% by weight of solvent, weight The percentage of 0.05%-10% of the photoinitiator, 0.01%-2% by weight of the surface tension-modifying additive, the second photosensitive material further comprises: 5%-45% by weight of black pigment, the weight percentage is 0.5%-67% dispersant, 0.05%-30% by weight of dispersion resin, 2%-25% by weight of ethylglycolically unsaturated monomer, 0.05%-10% by weight of epoxy resin The solvent is 20%-80% by weight, the photo-initiator is 0.05%-10% by weight, and the surface tension-changing additive is 0.01%-2% by weight.

(8) The color filter according to (7), wherein the additive that changes the surface tension is a leveling agent, a surface flow controlling agent, and a silane coupling agent.

(9) The color filter according to (7), wherein the ethylenically unsaturated monomer is a polyfunctional acrylate monomer.

(10) A method of producing a color filter, comprising the color filter of any one of (1) to (8), comprising:

Applying a first type of photoresist layer in which a black pigment is dispersed to the surface of the substrate; Applying a second type of photoresist layer in which a black pigment is dispersed, to the first type of photoresist layer, wherein the first type of photoresist layer is one of a positive photoresist and a negative photoresist, The second type of photoresist layer is another one of a positive photoresist and a negative photoresist;

Exposing the second type of photoresist layer with a mask and performing development;

Exposing the first type of photoresist layer directly, and performing development to form a black matrix layer portion having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is larger in size and smaller in size; A color filter layer is formed in the area.

(11) The method of manufacturing a color filter according to (10), further comprising: applying a first type of photoresist layer to the surface of the substrate, performing a pre-baking, and photolithography of the second category After the adhesive layer is applied to the first type of photoresist layer, a pre-baking is performed.

(12) A method of producing a color filter, comprising the color filter of any one of (1) to (8), comprising:

Coating a first photosensitive material layer of the black matrix layer on the surface of the substrate;

Applying a second photosensitive material layer of the black matrix layer to the first photosensitive material layer of the black matrix layer, the first photosensitive material layer and the second photosensitive material layer being positive photoresist, or the first photosensitive material layer and the second photosensitive material The material layer is a negative photoresist, wherein the first photosensitive material layer and the second photosensitive material layer both comprise an alkali-soluble resin, and the content of the alkali-soluble resin of the first photosensitive material layer is greater than that of the alkali-soluble resin of the second photosensitive material layer; Content

Exposing the first photosensitive material layer and the second photosensitive material layer with a mask, and performing development to form a black matrix layer having a cross-sectional shape that is upper and lower, and a sub-pixel region having a correspondingly large and small cross-sectional shape;

A color filter layer is formed in the sub-pixel region.

(13) The method of manufacturing a color filter according to (12), further comprising: applying a first photosensitive material layer of the black matrix layer to the surface of the substrate, performing a pre-baking, and a second photosensitive material of the black matrix layer; A layer of pre-baking is performed after the layer is applied to the first photosensitive material layer of the black matrix layer.

In the embodiment of the present application, since the black matrix layer and the color filter layer have overlapping regions, and the film thickness of the overlap region and the film thickness of the non-overlapping region are the same, it is not necessary to form a flat layer, and the manufacturing process is simple.

Although the present invention has been described in detail above with reference to the preferred embodiments and specific embodiments, the invention may be modified or modified by those skilled in the art. It is obvious. Therefore, such modifications or improvements made without departing from the spirit of the invention are intended to be within the scope of the invention.

Claims

Claim

A color filter comprising: a black matrix layer defined on a substrate defining a plurality of sub-pixel regions, and a plurality of color filter layers formed in a plurality of sub-pixel regions defined by the black matrix layer, wherein the black matrix a portion of the layer between two adjacent sub-pixel regions having a cross section of a large upper and lower small shape, and a color filter layer formed to have a cross section having a corresponding shape of a lower large and small upper, the black matrix layer portion and the color filter There are overlapping regions between the light layers, and the sum of the thicknesses of the black matrix layer and the color filter layer in the overlapping region is equal to the thickness of the black matrix layer or the color filter layer of the non-overlapping region.

The color filter according to claim 1, wherein a cross-sectional shape of the black matrix layer portion is complementary to a shape of a cross section of the color filter layer.

The color filter according to claim 1 or 2, wherein a cross-sectional shape of the black matrix layer portion is an inverted step shape, including a first sub-layer having a lower width and a second width having a wider upper portion The sub-layer, the cross-sectional shape of the color filter layer is a positive step shape.

4. The color filter according to claim 3, wherein the first photosensitive material of the first sub-layer is a positive photoresist, and the second photosensitive material of the second sub-layer is a negative photoresist; or

The color filter according to claim 3, wherein an alkali-soluble resin, an alkali-soluble resin of the first photosensitive material, is included in the first photosensitive material of the first sub-layer and the second photosensitive material of the second sub-layer The content of the alkali-soluble resin is greater than that of the second photosensitive material, the first photosensitive material and the second photosensitive material are both positive photoresists, or the first photosensitive material and the second photosensitive material are both negative photoresists.

The color filter according to claim 5, wherein the first photosensitive material has an alkali-soluble resin weight percentage of 5% to 79%, and the second photosensitive material has an alkali-soluble resin weight percentage of 0.05% to 30%.

The color filter according to claim 6, wherein the first photosensitive material further comprises: 5% to 45% by weight of a black pigment, 0.5% to 67% by weight of a dispersant, and a weight percentage of 0.05%-30% dispersion resin, 2%-25% by weight of ethylenically unsaturated monomer, 0.05%-10% by weight of epoxy resin, 20%-80% by weight of solvent, weight The percentage is from 0.05% to 10% of the photoinitiator, and the weight percentage is from 0.01% to 2% of the additive for changing the surface tension. The second photosensitive material further comprises: 5% to 45% by weight of black pigment, and 100% by weight. a dispersant in a ratio of 0.5% to 67%, a dispersion resin in a weight percentage of 0.05% to 30%, an ethyl ester-based unsaturated monomer in an amount of 2% to 25% by weight, and a weight percentage of 0.05% to 10%. Epoxy resin, 20%-80% by weight of solvent, 0.05%-10% by weight of photoinitiator, 0.01%-2% by weight of surface tension-modifying additive.

The color filter according to claim 7, wherein the additive that changes the surface tension is a leveling agent, a surface flow controlling agent, and a silane coupling agent.

The color filter according to claim 7, wherein the ethylenically unsaturated monomer is a polyfunctional acrylate monomer.

A method of manufacturing a color filter for manufacturing the color filter according to any one of claims 1 to 8, comprising:

Applying a first type of photoresist layer in which a black pigment is dispersed to the surface of the substrate;

Applying a second type of photoresist layer in which a black pigment is dispersed, to the first type of photoresist layer, wherein the first type of photoresist layer is one of a positive photoresist and a negative photoresist, The second type of photoresist layer is another one of a positive photoresist and a negative photoresist;

Exposing the first type of photoresist layer directly, and performing development to form a black matrix layer portion having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is larger in size and smaller in size;

A color filter layer is formed in the sub-pixel region.

11. The method of manufacturing a color filter according to claim 10, further comprising: applying a first type of photoresist layer to the surface of the substrate, performing a pre-baking, and applying the second type of light After the adhesive layer is applied to the first type of photoresist layer, a pre-baking is performed.

A method of manufacturing a color filter, for manufacturing the color filter according to any one of claims 1 to 8, comprising:

Exposing the first photosensitive material layer and the second photosensitive material layer with a mask and developing the film Forming a black matrix layer portion having a cross-sectional shape that is upper and lower, and a sub-pixel region having a cross-sectional shape that is larger in size and smaller in size;

A color filter layer is formed in the sub-pixel region.

13. The method of manufacturing a color filter according to claim 12, further comprising: applying a first photosensitive material layer of the black matrix layer to the surface of the substrate, performing a pre-baking, and second sensitizing the black matrix layer. The material layer is applied to the first photosensitive material layer of the black matrix layer and then pre-baked.