JP2018128669A - Polarizing plate, method for manufacturing polarizing plate, and display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polarizing plate that prevents leakage of light, a method for manufacturing the polarizing plate, and a display.SOLUTION: A polarizing plate includes a plurality of linear areas in each of which a plurality of linear parts extending in one direction and a plurality of linear parts extending in a direction substantially parallel to the direction in which the linear parts extend are arranged; the linear part has a width equal to or less than the shortest wavelength of visible light made incident from the outside; the plurality of linear areas have a protective film therebetween, and the protective film blocks the visible light.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a polarizing plate, a method for manufacturing a polarizing plate, and a display device.

  In recent years, liquid crystal display devices have been improved in definition, color reproducibility, and dynamic range. In order to maintain the display luminance, it is necessary to increase the luminance of the light source because the aperture ratio is lowered when the definition is increased. Although the color reproducibility can be improved by wavelength conversion or wavelength selection, there is an energy loss during wavelength conversion or wavelength selection, and therefore it is necessary to increase the luminance of the light source in order to maintain display luminance. The dynamic range can be expanded by increasing the display luminance, but in order to increase the display luminance, it is necessary to increase the luminance of the light source. In either case, the brightness of the light source is increased, leading to an increase in power consumption. A polarizing plate or a polarizer disposed on the light source side of the liquid crystal display device extracts light oscillating in a specific direction from the light of the light source, and enters the light into the liquid crystal cell, but the light is not in the specific direction. Is absorbed and cannot be used for liquid crystal display. As a method of using this unusable light, a reflective polarizing plate or a polarizer has been proposed. Examples of the reflective polarizer include a wire grid polarizer (sometimes referred to as a wire grid polarizer, a wire grid polarizer, a wire grid film, or the like). A wire grid polarizer is an optical element having a linear region (wire grid) in which a plurality of fine linear members (also referred to as linear portions or wires) are arranged in a lattice shape or a net shape. Moreover, the wire grid polarizer may have a plurality of the optical elements. The wire grid polarizer extracts light oscillating in a specific direction from the light of the light source, and reflects light that is not in the specific direction to the light source side. The reflected light is recycled by being reflected by a light source-side reflecting plate or the like and repeatedly incident on the wire grid polarizer, so that the light utilization efficiency can be improved.

  For example, Patent Document 1 discloses a method for improving the mass productivity and production accuracy of a wire grid polarizer with respect to a polarizer, and discloses a method for producing a sheet-like plate having a large area. Patent Document 2 discloses a method of forming a wire grid polarizer by a step-and-repeat method for a liquid crystal display panel.

JP, 2006-103001, A US Patent Application Publication No. 2012/014148

  In order to produce a polarizing plate or a polarizer using a wire grid polarizer, it is necessary to form a wire grid by a process similar to that of a semiconductor such as electron beam lithography or an immersion process, and there is a problem in increasing the size. is there. Even when the nanoimprint method is applied, it is difficult to increase the size of the base substrate. In order to increase the size, for example, there is a method in which a polarizer pattern is formed using a small mold of about 20 mm × 20 mm, and a plurality of the patterns are arranged or joined together. Light leakage from the gaps at the time of alignment or gaps at the joint becomes a problem. Further, light leakage is improved by overlapping a plurality of elements when they are arranged or joined together. However, when they are overlapped, securing an overlapping margin and a step difference in the overlapping part become problems.

  In view of such a problem, an object of one embodiment of the present invention is to provide a polarizing plate, a method for manufacturing a polarizing plate, and a display device that prevent light leakage.

  A polarizing plate (wire grid polarizing plate) according to an embodiment of the present invention includes a linear portion extending in one direction and a line in which a plurality of linear portions are arranged in a direction substantially parallel to the direction in which the linear portion extends. A plurality of linear regions, the linear portion has a width equal to or shorter than the shortest wavelength of visible light incident from the outside, and a protective film (third resin layer, fourth resin layer) is included between the plurality of linear regions The protective film blocks visible light.

  In the polarizing plate according to an embodiment of the present invention, the lower surface of the linear portion is in contact with the first resin layer, the side surface and the upper surface of the linear portion are in contact with the second resin layer, the side surface of the first resin layer and the second resin layer. The side surface of the resin layer may be in contact with the protective film.

  In the polarizing plate according to the embodiment of the present invention, the second resin layer is provided between the linear portions, the lower surface of the linear portion is in contact with the first resin layer, the side surface of the first resin layer, and the second resin layer The side surface may be in contact with the protective film.

  In the polarizing plate according to an embodiment of the present invention, the lower surface of the linear portion may be in contact with the first resin layer, and the side surface of the linear portion and the side surface of the first resin layer may be in contact with the protective film. .

  The protective film included in the polarizing plate according to the embodiment of the present invention may cover the linear region.

  The linear part included in the polarizing plate according to the embodiment of the present invention may include a conductive metal material.

  The protective film included in the polarizing plate according to the embodiment of the present invention may be a resin or a resin containing a liquid crystal.

  The protective film included in the polarizing plate according to an embodiment of the present invention may include a material having refractive index anisotropy.

  A method for producing a polarizing plate according to an embodiment of the present invention includes a step of forming a resin layer on a first substrate, a linear portion extending in one direction on the resin layer, and a direction in which the linear portion extends. A step of forming a linear region in which a plurality of linear portions are arranged in a direction substantially parallel to the step, a step of separating the first substrate and the linear region, and a step of arranging a plurality of linear regions on the second substrate, And a step of forming a protective film that shields visible light between a plurality of linear regions arranged on the second substrate.

  The step of forming a linear region included in the method for manufacturing a polarizing plate according to an embodiment of the present invention includes forming a metallic conductive film on the first resin layer and applying a photoresist on the metallic conductive film. A step of exposing the photoresist with light having a wavelength shorter than the width of the linear portion using a photomask may be included.

  The step of forming a linear region included in the method for manufacturing a polarizing plate according to an embodiment of the present invention includes forming a metallic conductive film on the first resin layer and applying a photoresist on the metallic conductive film. The method may include a step of exposing the photoresist by pressing the surface on which the pattern of the mold on which the pattern is formed is pressed against the photoresist, irradiating the mold with light having a wavelength shorter than the width of the linear portion. Good.

  The step of forming the protective film included in the method for manufacturing a polarizing plate according to an embodiment of the present invention may be performed by inkjet.

  The step of forming a protective film included in the method for manufacturing a polarizing plate according to an embodiment of the present invention protects the upper surface of the linear region in addition to a plurality of linear regions arranged on the second substrate. A film may be formed.

  A display device according to an embodiment of the present invention has a width equal to or shorter than the shortest wavelength of incident visible light, a linear portion extending in one direction, and a direction substantially parallel to the direction in which the linear portion extends. A polarizing plate including a plurality of linear regions in which a plurality of linear portions are arranged, including a protective film provided between the plurality of linear regions and shielding visible light, and extending in one direction and extending in one direction A plurality of pixels arranged in a direction crossing the direction, a light shielding film, a first substrate, and a second substrate are included.

  The protective film included in the display device according to the embodiment of the present invention may overlap the light shielding film in a direction perpendicular to the surface of the light shielding film, and the width of the protective film may be narrower than the width of the light shielding film.

  Pixels included in a display device according to an embodiment of the present invention are formed substantially parallel to a source signal line formed substantially parallel to a direction extending in one direction and a direction crossing the direction extending to one direction. The source signal line may overlap the protective film in a direction perpendicular to the surface of the protective film, and the width of the source signal line may be narrower than the width of the light shielding film.

  The gate signal line included in the display device according to the embodiment of the present invention may overlap the protective film in a direction perpendicular to the surface of the protective film, and the width of the gate signal line may be narrower than the width of the light shielding film.

  A display device according to an embodiment of the present invention includes a plurality of light shielding films, and the plurality of light shielding films includes a light shielding film in which linear regions overlap in a direction perpendicular to the surface of the light shielding film, a linear region, and a protective film. And a light-shielding film that overlaps both.

  The display device according to an embodiment of the present invention further includes a red color filter, a green color filter, and a blue color filter, and the plurality of light shielding films include a light shielding film in contact with the red color filter and the green color filter, and a green color. A light shielding film in contact with the filter and the blue color filter, and a light shielding film in contact with the blue color filter and the red color filter may be included.

  The polarizing plate included in the display device according to the embodiment of the present invention may be disposed on at least one of the lower surface of the first substrate and the upper surface of the second substrate.

It is a typical perspective view which shows the structure of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the wire grid polarizing plate which concerns on one Embodiment of this invention. It is a typical top view which shows the structure of the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is a typical top view showing a pixel contained in a display which has a wire grid polarizing plate concerning one embodiment of the present invention. It is a typical top view showing a pixel contained in a display which has a wire grid polarizing plate concerning one embodiment of the present invention. It is a typical top view which shows the wire grid polarizing plate on the pixel contained in the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is typical sectional drawing which shows 3 pixels contained in the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is typical sectional drawing which shows 3 pixels contained in the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention. It is a flowchart which shows the preparation methods of the display apparatus which has a wire grid polarizing plate which concerns on one Embodiment of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention can be implemented in many different modes without departing from the scope of the invention. That is, the present invention is not construed as being limited to the description of the embodiments exemplified below. In addition, in order to clarify the description, the drawings may be schematically represented with respect to the width, thickness, shape, and the like of each part as compared to the actual mode. However, the schematic drawings are merely examples, and do not limit the interpretation of the present invention.

  In the present specification and each drawing, the same elements as those described in the previous drawings are denoted by the same reference numerals (or numerals followed by a, b, etc.), and the description will be omitted as appropriate. There is. The letters “first” and “second” attached to each element are convenient signs used to distinguish each element, and have more meanings unless otherwise specified. Absent.

  In this specification, the term “above” includes not only the case of being placed directly on a certain object or region, but also the case of being placed with another object or region in between. The same applies to the term “below”. In addition, terms such as “upper” and “lower” indicate a relative vertical relationship between objects or regions, and do not mean an absolute vertical relationship. Specifically, the main surface side of the substrate is defined as “upper” and the opposite side of the main surface of the substrate is defined as “lower” with reference to the main surface of the substrate (surface on which elements are formed). .

  When a plurality of patterns are formed by processing a certain film, the plurality of patterns may have different functions and / or roles. However, these plural patterns are derived from films formed as the same layer in the same process. That is, these plural patterns have the same layer structure and include the same material. Therefore, in this specification, it is defined that these plural patterns exist in the same layer.

  The polarizing plate of the present invention will be described. In addition, the polarizing plate of this invention is a wire grid (it may describe as WG (Wire Grid) in the following description) polarizing plate. In the WG polarizing plate, the polarizing layer has a plurality of linear regions provided in a direction parallel to the direction in which the linear portion extends in one direction. In the WG polarizing plate, a plurality of linear regions are arranged in a tile shape. Between the linear regions arranged in a tile shape and the linear regions, a resin that blocks visible light, a material having refractive index anisotropy, or the like is provided. A WG polarizing plate capable of suppressing light leakage can be provided by providing a resin that shields visible light, a material having refractive index anisotropy, or the like between the linear regions. Further, since it is not necessary to overlap the linear region with the linear region, it is only necessary to form the linear region without considering the overlapping margin, and to provide a WG polarizing plate that does not need to worry about the overlapping step. Can do. Here, the resin that blocks visible light is a material for forming the third resin layer in the present specification. In addition, the material having refractive index anisotropy is a material forming a layer having a material having refractive index anisotropy or a material forming the fourth resin layer in this specification. Further, both the third resin layer and the fourth resin layer are protective films.

(First embodiment)
In the present embodiment, the configuration of a polarizing plate according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the overlapping structure.

  FIG. 1 is a schematic cross-sectional view showing a configuration of a WG polarizing plate 200 in the first embodiment.

  A WG polarizing plate 200 shown in FIG. 1 includes a glass substrate 20, a polarizer layer 60, and a linear region 126.

  The linear region 126 includes a first resin layer 61 and a linear portion 62. Between the linear region 126 and the linear region 126, a third resin layer 64 or a layer 65 containing a material having refractive index anisotropy is included. The layer 65 containing a material having refractive index anisotropy is the fourth resin layer 65. The third resin layer 64 and the fourth resin layer 65 are both protective films.

  FIG. 2 is a schematic cross-sectional view between A1 and A2 of the WG polarizing plate 200 shown in FIG.

  FIG. 2A includes a glass substrate 20 and a polarizer layer 60. The polarizer layer 60 includes a linear region 126 and a third resin layer 64. The linear region 126 includes a first resin layer 61, a linear portion 62, and a second resin layer 63. The side surface and the upper surface of the linear portion 62 are in contact with the second resin layer 63. The lower surface of the linear portion 62 is in contact with a part of the upper surface of the first resin layer 61. A part of the upper surface of the first resin layer 61 is in contact with the second resin layer 63. That is, the second resin layer 63 covers the linear portion 62 and the first resin layer 61. The side surface of the first resin layer 61 is in contact with the third resin layer 64. The side surface of the second resin layer 63 is in contact with the third resin layer 64. The lower surface of the first resin layer is in contact with the upper surface of the glass substrate 20. The lower surface of the third resin layer 64 is in contact with the upper surface of the glass substrate 20. 2A shows an example in which the end portion of the linear region 126 is the second resin layer, the end portion of the linear region 126 may be the linear portion 62. In that case, the linear portion 62 is in contact with the side surface of the third resin layer 64. In the present specification, the first resin layer 61 is a cured product of the material forming the first resin layer 61, and the second resin layer 63 is a cured product of the material forming the second resin layer 63. The third resin layer 64 is a cured product of the material forming the third resin layer 64.

  The first resin layer 61 has high transparency in the visible light region, high heat resistance, and adhesion between the glass substrate 20, the linear portion 62, the second resin layer 63, and the third resin layer 64. However, the present invention is not limited to these. Examples of the material for forming the first resin layer 61 include acrylic, epoxy, urethane, and polyimide ultraviolet curable resins and thermosetting resins. The first resin layer 61 may have a two-layer structure. For example, an adhesive having higher adhesion may be used on the side in contact with the glass substrate 20, and the resin layer in contact with the linear portion 62 may be the above-described ultraviolet curable resin or thermosetting resin.

  A plurality of linear portions 62 are linearly arranged in a direction extending in one direction. Further, the linear portion 62 has a width equal to or shorter than the shortest wavelength of incident visible light. Further, the linear portion 62 is formed on the first resin layer 61 using a conductive metal material. In FIG. 2, an example in which the interval at which the linear portions 62 are arranged is periodic, but may be aperiodic. For example, when two types of linear portions 62 having different widths are formed on the same plane, it is possible to simultaneously have a function of polarizing light and a function of shielding light.

  The transparency of the linear part 62 is expressed by the relationship between the distance between the linear part 62 and the adjacent linear part 62, the wavelength of incident light, the angle of incident light (incident angle), and the refractive index of the material used as the base material. It is well known that For example, by setting the width of the linear portions 62 to 180 nm and the interval at which the linear portions 62 are arranged to be 360 nm, light in a region where the wavelength is larger than 360 nm can be transmitted. That is, the WG polarizing plate 200 can transmit visible light. In this specification, the interval between the linear portion 62 and the adjacent linear portion 62 is the distance from the center of the width of the linear portion 62 to the center of the width of the adjacent linear portion 62. is there. Moreover, it is preferable that the width | variety of the linear part 62 shall be 1/2 or less of space | interval.

  Further, the transparency of the linear portion 62 is also related to the film thickness (also called height). For example, the film thickness of the linear portion 62 may be set such that the transmittance of light transmitted through the linear portion 62 is 5% or less, more preferably 1% or less. For example, the film thickness of the linear portion 62 is preferably 30 nm or more. Specifically, when the distance between the linear part 62 and the adjacent linear part 62 is 360 nm, the film thickness of the linear part 62 may be 360 nm. By doing so, light in a region where the wavelength is larger than 360 nm can be transmitted. That is, the WG polarizing plate 200 can transmit visible light. If the film thickness of the linear portion 62 is too thin, the transmitted light cannot be ignored and light in a specific wavelength range cannot be extracted. On the other hand, if the film thickness of the linear portion 62 is too thick, the light use efficiency may be lowered. Therefore, the film thickness is preferably ½ or less of the interval as with the line width.

  It is preferable that the conductive metal material forming the linear portion 62 has a high reflectance with respect to transmitted light and high adhesion with the first resin layer 61 and the second resin layer 63. For example, the conductive metal material forming the linear portion 62 is preferably aluminum, silver, platinum, chromium, or an alloy thereof, but is not limited thereto.

  The second resin layer 63 preferably has the same characteristics as the first resin layer 61. That is, the characteristics of the second resin layer 63 are high transparency in the visible light region, high heat resistance, the glass substrate 20, the linear portion 62, the first resin layer 61, and the third resin layer. It is preferable that the adhesiveness with 64 is high. Examples of the material for forming the second resin layer 63 include acrylic, epoxy, urethane, and polyimide ultraviolet curable resins and thermosetting resins. When the second resin layer 63 is in contact with the upper surface of the linear portion 62, the impact can be reduced when the WG polarizing plate 200 is dropped. That is, the linear part 62 can be protected and the strength of the WG polarizing plate 200 can be increased.

  “Visible light” means light having a wavelength of 380 to 780 nm, and the visible light transmittance of the protective film in the present invention is preferably 5% or less.

  The third resin layer 64 has a function of blocking visible light, and also has a role of partitioning the linear region 126 and the linear region 126, and allows light that is directed upward or downward with respect to the surface of the third resin layer 64. It is preferable that the transmittance is 5% or less, more preferably 1% or less. The characteristics of the third resin layer 64 are preferably high heat resistance, and high adhesion between the glass substrate 20, the linear portion 62, the first resin layer 61, and the second resin layer 63. . As a material for forming the third resin layer 64, for example, a composition in which carbon particles such as carbon black, a colorant such as a pigment and a dye, and a resin, a polymerizable monomer, a photopolymerization initiator, and the like are mixed is used. be able to. By applying such a colored composition and curing the coating film with light or heat, a resin layer colored black can be formed. The material for forming the third resin layer 64 is preferably the resin layer formed as described above, but is not limited thereto.

  As a composition which forms the 3rd resin layer 64, the composition as described in Unexamined-Japanese-Patent No. 2006-053569, WO2009 / 010521, Unexamined-Japanese-Patent No. 2014-146029 etc. can be used, for example.

  With the above configuration, the adhesion between the linear region 126, the third resin layer, and the linear region 126 is high, and visible light does not pass through the gap between the linear region 126 and the linear region 126. Can be. That is, it is possible to provide a WG polarizing plate that suppresses light leakage. Further, it is not necessary to consider the overlapping margin between the linear region 126 and the linear region 126, and it is not necessary to worry about the overlapping step. That is, it is possible to provide a WG polarizing plate in which the degree of freedom of arrangement of the linear region 126 is increased as compared with the conventional case.

  FIG. 2B shows a configuration in which the upper surface of the linear portion 62 is not covered with the second resin layer 63 as compared with the structure of FIG. The other structure is the same as that in FIG. As in FIG. 2A, FIG. 2B shows an example in which the end portion of the linear region 126 is the second resin layer, but the end portion of the linear region 126 is a line. The shape part 62 may be sufficient. In that case, the linear portion 62 is in contact with the side surface of the third resin layer 64. Since the WG polarizing plate 200 having the structure of FIG. 2B does not have the second resin layer 63 on the upper surface, the WG polarizing plate 200 can be hardly affected by light refraction on the upper surface, and a large amount of transmitted light is emitted. That is, the light use efficiency can be improved. In addition, it is possible to provide a WG polarizing plate that suppresses light leakage and has an increased degree of freedom in arrangement of the linear regions 126 as compared with the related art.

  In FIG. 2C, compared with the structure of FIG. 2B, the space between the linear portion 62 and the adjacent linear portion 62 is not filled with the second resin, and the linear portion 62 and the third resin are not filled. A configuration in which the layer 64 is in contact is shown. Since the other structure is similar to that of FIG. 2B, description thereof is omitted. The WG polarizing plate 200 having the structure of FIG. 2C has no second resin layer 63 on the upper surface and side surfaces of the linear portion 62, so that the second resin layer is compared with the case where the second resin layer 63 is present. The light beam 63 can be made less susceptible to the refraction of light 63, and a large amount of transmitted light is emitted. That is, the light use efficiency can be further improved. In addition, it is possible to provide a WG polarizing plate that suppresses light leakage and has an increased degree of freedom in arrangement of the linear regions 126 as compared with the related art.

  3A, 3B, and 3C are schematic cross-sectional views between A1 and A2 of the WG polarizing plate 200 shown in FIG. 3A, FIG. 3B, and FIG. 3C each show a configuration between the linear region 126 and the linear region 126 as shown in FIG. 2A, FIG. And the example which changed from the 3rd resin layer 64 shown to each of FIG.2 (C) to the layer (4th resin layer) 65 which has the material which has refractive index anisotropy is shown. The rest is the same as the structure shown in FIGS. 2A, 2B, and 2C, and a description thereof is omitted.

  The layer (fourth resin layer) 65 having a material having refractive index anisotropy has a function of blocking visible light, has a role of partitioning the linear region 126 and the linear region 126, and transmits light. Is 5% or less, more preferably 1% or less. Moreover, it is preferable that heat resistance is high and the adhesiveness of the glass substrate 20, the linear part 62, the 1st resin layer 61, and the 2nd resin layer 63 is high. For example, a lyotropic liquid crystal or a thermotropic liquid crystal can be used. A lyotropic liquid crystal is a compound of water and a solvent or a solution and a solvent. For example, a liquid crystal state is obtained by mixing a surfactant and water or a solution, and the concentration of the solvent and the direction in which the mixture is applied are adjusted. The liquid crystal can be aligned. The thermotropic liquid crystal, for example, exhibits a stable behavior as an intermediate phase in a certain temperature range, and enters a liquid crystal state due to a change in temperature. For example, visible light can be blocked by applying lyotropic liquid crystal between the linear region 126 and the linear region 126 and aligning and solidifying in the applied direction. In this specification, the layer 65 having a material having refractive index anisotropy may be referred to as a fourth resin layer 65.

  The WG polarizing plate 200 shown in FIG. 3A has high adhesion between the linear region 126, the fourth resin layer 65, and the linear region 126, and the gap between the linear region 126 and the linear region 126 is visible. It is possible to prevent light from being transmitted. That is, it is possible to provide a WG polarizing plate that suppresses light leakage. Further, it is not necessary to consider the overlapping margin between the linear region 126 and the linear region 126, and it is not necessary to worry about the overlapping step. That is, it is possible to provide a WG polarizing plate in which the degree of freedom of arrangement of the linear region 126 is increased as compared with the conventional case.

  In the WG polarizing plate 200 shown in FIG. 3B, the second resin layer 63 is not provided on the upper surface, so that it is difficult to be affected by light refraction on the upper surface. That is, the light use efficiency can be improved. Moreover, the WG polarizing plate which suppressed light leakage can be provided.

  In the WG polarizing plate 200 shown in FIG. 3C, the second resin layer 63 is not provided on the upper surface and the side surface of the linear portion 62, so that the second resin layer 63 is compared with the case where the second resin layer 63 is present. The layer 63 can be made less susceptible to light refraction. That is, the light use efficiency can be further improved. Moreover, the WG polarizing plate which suppressed light leakage can be provided.

  4A, 4B, and 4C are schematic cross-sectional views between A1 and A2 of the WG polarizing plate 200 shown in FIG. Each of FIG. 4A, FIG. 4B, and FIG. 4C is obtained from the configuration shown in FIG. 3A, FIG. 3B, and FIG. In the example, the resin layer 65 is formed not only between the linear region 126 and the linear region 126 but also on the upper surface of the linear region 126. Others are the same as the structure shown in FIG. 3, and description is abbreviate | omitted. 4A, FIG. 4B, and FIG. 4C, the layer of the fourth resin layer 65 formed on the upper surface of the linear region 126 in order to make the fourth resin layer 65 easy to see. Is shown thicker than the actual thickness. The fourth resin layer 65 is a light-shielding material, and the fourth resin layer 65 is formed thin so that light passes through the upper surface of the linear region 126.

  In the WG polarizing plate 200 shown in FIGS. 4A, 4B, and 4C, the upper surface of the linear region 126 is also covered with the fourth resin layer 65 from the configuration shown in FIG. In addition to the features described in the description of (A), FIG. 3 (B), and FIG. 3 (C), the strength of the polarizing plate can be increased.

  Although the cross-sectional shape of the linear part 62 which the polarizing plate which concerns on one Embodiment of this invention has showed the example which is a rectangle, a shape is not limited to a rectangle. The cross-sectional shape of the linear portion 62 may be a square, a trapezoid, a triangle, or various shapes within the scope of the present invention. Can do.

  As described above, a WG polarizing plate capable of suppressing light leakage can be provided by providing a material that blocks visible light between the linear regions. In addition, it is not necessary to consider the overlapping margin between the linear regions and the linear regions, and it is possible to provide a WG polarizing plate that eliminates the need for an overlapping step.

(Second Embodiment)
In this embodiment, a manufacturing process of a polarizing plate according to an embodiment of the present invention will be described. Note that the manufacturing method is not limited to this method, and a method usually used in the technical field of the present invention can be adopted. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment.

  FIG. 5 is a flowchart showing a method for producing a WG polarizing plate according to an embodiment of the present invention.

  The manufacturing method of the WG polarizing plate includes step 20 (S20) for starting production, step 21 (S21) for forming a resin layer on the first substrate, and step 22 (for forming a linear region on the resin layer). S22), a step of separating the first substrate and the linear region (S23), a step of arranging a plurality of linear regions on the second substrate (S24), and a plurality of linear regions arranged on the second substrate. A step (S25) of forming a protective film that blocks visible light between the steps, and a step (S26) of finishing the production.

  FIG. 6 shows a method for producing a WG polarizing plate according to an embodiment of the present invention, Step 20 (S20) for starting production, Step 21 (S21) for forming a resin layer on the first substrate, and a resin layer A specific cross-sectional view for explaining step 22 (S22) for forming a linear region on the substrate and step (S23) for separating the first substrate from the linear region is shown.

  FIG. 6A includes step 20 (S20) for starting the production and step 21 (S21) for forming the first resin layer 61 on the first substrate. Specifically, the first resin layer 61 is formed on the glass substrate 121 after S20 that starts manufacturing. The 1st resin layer 61 has a role which eases the unevenness | corrugation of the glass substrate 121, and makes the surface which contacts the linear part 62 formed after this flat. As a method for forming the first resin layer 61, for example, a screen printing method, a spin coating method, a dipping method, or the like can be used.

  6B to 6E include step 22 (S22) for forming a linear region on the resin layer. A method for forming the linear portion 62 by using a photolithography technique will be described. Specifically, a metallic conductive film 66 is formed on the first resin layer 61 and a photoresist 67 is applied. Further, the photoresist 67 is exposed by photolithography using the mask 68. The metal conductive film 66 is formed by, for example, a chemical formation method using a CVD apparatus or the like, or a physical formation method using a vacuum evaporation method, a sputtering method, an ion plating method, or the like. be able to. As a method for applying the photoresist 67, for example, a spin coating method, a dipping method, or the like can be used. The exposed photoresist 67 is developed, the photoresist 67 is used as a mask, etching is performed, and the photoresist 67 is removed, whereby the linear portion 62 can be formed. Subsequently, the second resin layer 63 is formed. Thus, the linear region 126 can be formed. In the step 22 of forming the linear region on the resin layer, the formation of the linear portion 62 has been shown by a method using a photolithography technique, but any method that is usually used in the technical field of the present invention can be used. Can be adopted. For example, the linear portion 62 may be formed using an electron beam drawing apparatus. In the case where a negative photoresist is used as a photoresist, a portion irradiated with light can be left by development. On the other hand, when the photoresist is a positive photoresist, a portion that is not irradiated with light can be left by development. FIG. 6B shows an example using a negative photoresist.

  FIG. 6F includes a step (S23) of separating the glass substrate 121 and the linear region 126 from each other. Separation between the glass substrate 121 and the linear region 126 may be performed by a mechanical peeling method, or a film is further pasted on the upper surface of the second resin layer 63, and the entire surface of the first substrate is irradiated with a laser to be peeled off. Alternatively, a method usually used in the technical field of the present invention can be adopted.

  FIG. 7 shows a method for producing a WG polarizing plate according to an embodiment of the present invention, Step 20 (S20) for starting production, Step 21 (S21) for forming a resin layer on the first substrate, and a resin layer 6 is a specific cross-sectional view different from FIG. 6 for explaining step 22 (S22) for forming a linear region on the substrate and step (S23) for separating the first substrate from the linear region. ing. Descriptions similar to those in FIG. 6 are omitted.

  7B to 7E include step 22 (S22) for forming a linear region on the resin layer. A method of forming the linear portion 62 using the nanoimprint method will be described. The nanoimprint method is a known technique and will not be described in detail. For example, in the nanoimprint method, there is a method in which a mold having irregularities formed on quartz glass or the like is created, and a pattern is formed using the mold. For example, as the metallic conductive film 66, aluminum is formed on the first resin layer 61 using a sputtering apparatus. Further, a photoresist 67 is applied on the metallic conductive film 66, the above-described mold is pressed against the photoresist, and UV light is irradiated. Subsequently, etching is performed using the photoresist 67 as a mask, and the photoresist 67 is removed, whereby the linear portion 62 can be formed. As another example of the nanoimprint method, a method of applying a photoresist on the metallic conductive film 66, pressing the above-described mold against the photoresist, and thermally curing the photoresist may be used. Specific examples of the nanoimprint method are disclosed in JP-A-2006-103001 and US Patent Application Publication No. 2012/014148. Note that FIG. 7F can employ a creation method similar to the content described with reference to FIG.

  FIG. 8 shows a step of arranging a plurality of linear regions on the second substrate (S24) in the method for producing a WG polarizing plate according to an embodiment of the present invention, and a step of arranging a plurality of linear regions arranged on the second substrate. Specific cross-sectional views for explaining a step (S25) of forming a protective film that shields visible light between them and a step (S26) of finishing the production are shown.

  8G, 8H, and 8I, or FIG. 8G, FIG. 8H, and FIG. 8J, a plurality of linear regions are arranged on the second substrate. The method includes a step (S24), a step (S25) of forming a protective film that blocks visible light between a plurality of linear regions arranged on the second substrate, and a step (S26) of completing the production.

  FIGS. 8G and 8H show a step (S24) of arranging a plurality of linear regions 126 on the glass substrate 20. FIG. For example, a method of picking up the linear regions 126 and arranging them on the glass substrate 20 may be employed. The method of arranging is not limited to this method. Further, an adhesive may be applied to the first resin layer 61 in the linear region 126 when arranging.

  Subsequently, FIG. 8I and FIG. 8J show a step of forming a protective film that shields visible light between a plurality of linear regions arranged on the second substrate (S25), and production. (S26) which complete | finishes. FIG. 8I shows a method for forming the fourth resin layer 65. For example, the fourth resin layer is formed between the linear region 126 and the linear region 126 and on the upper surface of the linear region 126 using a liquid crystal dropping device, an ink jet printer, a screen printer, a slit coater, a nozzle dispenser, or the like. 65 is applied. The material forming the fourth resin layer 65 is, for example, lyotropic liquid crystal or thermotropic liquid crystal. As a method of aligning the lyotropic liquid crystal or thermotropic liquid crystal, there are a method using an aligning agent and a method of directly applying a specific lyotropic liquid crystal to align the liquid crystal.

  As a method using an alignment agent, the alignment agent is applied on a substrate and solidified, the alignment film is rubbed, and then the liquid crystal is dropped onto the alignment film to align the liquid crystal. Specific examples of the method using such an aligning agent include JP-A-2015-26050 and JP-A-2017-16089.

  As a method for aligning the liquid crystal by directly applying the lyotropic liquid crystal, a water-soluble compound that can be self-assembled can be used. As a specific compound, a polymer main chain such as a conjugated polymer is rigid and has a side chain. The composition containing the polymer which has a hydrophilic group which shows water solubility is mentioned. A dichroic dye compound may also be included. An anisotropic film having optical anisotropy can be formed by applying a composition containing such a compound to a substrate and heating to remove moisture remaining in the film.

  Specific examples of the method of directly applying such lyotropic liquid crystal to align the liquid crystal include WO2007 / 080419, WO2009 / 130675, and WO2012 / 007923.

  Note that, as in FIGS. 4A, 4B, and 4C, the top surface of the linear region 126 is also shown in FIG. 8I in order to make the fourth resin layer 65 easier to see. The thickness of the fourth resin layer 65 formed in FIG. The fourth resin layer 65 is a light-shielding material, and the fourth resin layer 65 is formed thin so that light passes through the upper surface of the linear region 126. Further, as in FIGS. 3A, 3B, and 3C, the fourth resin layer 65 does not have to be formed on the upper surface of the linear region 126. For example, the linear region 126 and the linear region are formed without forming the fourth resin layer 65 on the upper surface of the linear region 126 by a printing plate in which a slit is provided between the linear region 126 and the linear region 126. The fourth resin layer 65 may be formed between the first resin layer 126 and the second resin layer 126. FIG. 8J shows a method of forming the third resin layer 64 between the linear region 126 and the linear region 126 by ink jetting. Note that methods for forming a protective film between the linear regions are not limited to these methods. For example, a protective plate may be formed by producing a printing plate and screen printing.

  The WG polarizing plate which suppressed the light leak between a linear area | region and a linear area | region by the above preparation methods can be provided. In addition, it is possible to provide a WG polarizing plate having no overlapping step between the linear region and the linear region.

(Third embodiment)
In the present embodiment, a liquid crystal display device having a wire grid polarizer according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment and 2nd Embodiment.

  FIG. 9 is a schematic plan view showing the configuration of the liquid crystal display device 300 according to an embodiment of the present invention.

  The liquid crystal display device 300 includes a glass substrate 123, a display region 104, gate side driving circuits 108 and 109, a source side driving circuit 112, a connector 114, and an integrated circuit 116.

  On the glass substrate 123, the display region 104, the gate side driver circuits 108 and 109, and the source side driver circuit 112 are formed. The connector 114 is connected to the glass substrate 123. The integrated circuit 116 is provided on the connector 114. The number of connectors 114 may be changed in accordance with the size of the display area 104.

  The display area 104 includes a plurality of pixels 106. The plurality of pixels 106 are arranged along one direction and a direction intersecting with one direction. The number of arrangement of the plurality of pixels 106 is arbitrary. For example, the direction along one direction is the X direction, the direction along the direction intersecting one direction is the Y direction, and m pixels 106 in the X direction and n pixels 106 in the Y direction can be arranged. m and n are each independently a natural number greater than 1. Each of the pixels 106 includes a display element, and the display element includes a liquid crystal element.

  For example, display elements corresponding to the three primary colors of red (R), green (G), and blue (B) can be assigned to each of the three pixels. A full-color display device can be provided by supplying 256-step voltages to each pixel. For example, a stripe arrangement can be adopted as the arrangement of the plurality of pixels 106. Note that the arrangement of the plurality of pixels 106 is not limited to this arrangement, and a delta arrangement, an arrangement like a pen tile, or the like may be adopted. In the liquid crystal display device 300 according to an embodiment of the present invention, an example in which the arrangement of the plurality of pixels 106 is a stripe arrangement will be described.

  The connector 114 has a role of supplying a video signal, a timing signal for controlling the operation of the circuit, a power source, and the like to the gate side driver circuits 108 and 109, the source side driver circuit 112, and the integrated circuit 116. The connector 114 may use a flexible printed circuit (FPC). A video signal, a timing signal for controlling the operation of the circuit, a power source, and the like are connected to the gate side driving circuits 108 and 109 via the connector 114 from a circuit or device outside the liquid crystal display device 300, and a source side driving circuit. 112 and the integrated circuit 116.

  The gate-side driver circuits 108 and 109, the source-side driver circuit 112, and the integrated circuit 116 use the supplied video signal, a timing signal that controls the operation of the circuit, a power source, and the like to control each pixel 106. It is driven and has a role of displaying an image on the display area 104.

  All of the gate side driver circuits 108 and 109 and the source side driver circuit 112 may not be formed on the glass substrate 123. For example, an integrated circuit (IC) including some functions of the gate side driver circuit and the source side driver circuit may be arranged on the glass substrate 123 or the connector 114. Note that the integrated circuit 116 included in the liquid crystal display device 300 illustrated in FIG. 9 has partial functions of a gate side driver circuit and a source side driver circuit.

  FIG. 10 is a schematic plan view showing pixels included in a liquid crystal display device 300 having a wire grid polarizer according to an embodiment of the present invention. The pixel shown in FIG. 10 is applied to a VA (Vertical Alignment) method or a TN (Twisted Nematic) method in which a voltage is applied in a direction perpendicular to the drawing, that is, a direction perpendicular to the glass substrate 123 to control a liquid crystal element. be able to. 10 illustrates a color filter layer, a second light-transmissive conductive layer 110, a first alignment film 80, a liquid crystal layer 90, a second alignment film 100, a second light-transmissive conductive layer 110, The glass substrate 123 and the polarizing plate 130 are not shown. These layers, films, and the like will be described in a manufacturing method of the liquid crystal display device 300 described later.

  A pixel 106 illustrated in FIG. 10 includes a thin film transistor 190, a capacitor 196, a source signal line 191, a gate signal line 192, a capacitor potential line 193, and a first light-transmitting conductive layer 70. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source / drain electrodes 36 and 38, and first openings 39a and 39b. The source / drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 through the first openings 39a and 39b. The first light transmissive conductive layer 70 is electrically connected to the source / drain electrode 38 through the second opening 194. A capacitor element 196 is formed by the source / drain electrode 38, the gate insulating film 33 described later, and the capacitor potential line 193. The source / drain electrode 36 and the source signal line 191 are electrically connected. The gate electrode 34 and the gate signal line 192 are electrically connected. By applying a voltage to each of the first light-transmissive conductive layer 70 and the second light-transmissive conductive layer 110 described later, an electric field is generated in a direction perpendicular to the glass substrate 123, and the liquid crystal contained in the liquid crystal layer 90 The elements are controlled, and the liquid crystal display device 300 can display an image.

  FIG. 11 is a schematic plan view showing another example of the pixel 106 included in the liquid crystal display device 300 having the wire grid polarizer according to the embodiment of the present invention. The pixel shown in FIG. 11 can be applied to an IPS (In Plane Switching) method in which a voltage is applied to the glass substrate 123 in a horizontal direction to control a liquid crystal element. 11 shows the color filter layer, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, the second light-transmissive conductive layer 110, the glass substrate 123, and the polarizing plate 130. Not shown. These layers, films, and the like will be described in a manufacturing method of the liquid crystal display device 300 described later.

  A pixel 106 illustrated in FIG. 11 includes a thin film transistor 190, a capacitor 196, a source signal line 191, a gate signal line 192, a capacitor potential line 193, a first light-transmitting conductive layer 70, and a common potential line 197. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source / drain electrodes 36 and 38, and first openings 39a and 39b. The source / drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 through the first openings 39a and 39b. The first light transmissive conductive layer 70 is electrically connected to the source / drain electrode 38 through the second opening 194. A capacitor element 196 is formed by the source / drain electrode 38, the gate insulating film 33 described later, and the capacitor potential line 193. The source / drain electrode 36 and the source signal line 191 are electrically connected. The gate electrode 34 and the gate signal line 192 are electrically connected. The common potential line 197 has a role of supplying a common potential to all the pixels 106 included in the display region 104. The common potential line 197 may be shared by all the pixels 106 included in the display region 104, may be supplied for each pixel in the X direction, or may be shared for each pixel in the Y direction. By applying a voltage to each of the first light-transmitting conductive layer 70 and the common potential line 197, an electric field is generated in a direction parallel to the glass substrate 20, and the liquid crystal element included in the liquid crystal layer 90 is controlled. The display device 300 can display an image.

  FIG. 12 is a schematic plan view showing the wire grid polarizer on the pixel 106 included in the liquid crystal display device 300 having the wire grid polarizer according to an embodiment of the present invention. FIG. 12 is superimposed on the upper surface toward the paper surface of FIGS. 10 and 11. In order to make the drawings easier to see, FIGS. 10, 11 and 12 are shown separately. The width of the linear portion 62 and the interval between the linear portion 62 and the linear portion 62 are set to a size that can be recognized in the drawing for easy understanding, but the size is limited to this size. Absent. The width | variety of the linear part 62 should just be thinner than the wavelength of incident light.

  FIG. 12 also shows the third resin layer 64 or the fourth resin layer 65 between the linear region 126 and the linear region 126. The third resin layer 64 or the fourth resin layer 65 is disposed so as to overlap the source signal line 191 and the gate signal line 192 in a direction perpendicular to the third resin layer 64 or the fourth resin layer 65. . The third resin layer 64 or the fourth resin layer 65 is thicker than the width of the source signal line 191 and the gate signal line 192. Since the protective film hides the source signal line and the gate signal line, light leakage can be suppressed.

  With the above configuration, the display device having the WG polarizing layer can prevent light leakage. Therefore, it is possible to provide a display device that displays a clear image in which a difference in brightness between black and white, a difference in color between black and each color, and the like are clear.

(Fourth embodiment)
In this embodiment, a method for manufacturing a liquid crystal display device according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment thru | or 3rd Embodiment.

  A manufacturing method of the liquid crystal display device 300 having the WG polarizing plate 200 according to an embodiment of the present invention will be described with reference to FIG. 13 or FIG. 14 and FIGS. 15 to 17.

  A method for manufacturing a liquid crystal display device according to an embodiment of the present invention will be described by taking an example of using a photolithography technique generally used in manufacturing a liquid crystal display device. The manufacturing of the liquid crystal display device according to the embodiment of the present invention is not limited to the photolithography technique, and a method usually used in the technical field of the present invention may be used.

  FIG. 13 is a schematic cross-sectional view showing a method for manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 when the pixel configuration of FIG. 10 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device. Note that the cross sections B1 and B2 of the pixel shown in FIG. 10 correspond to the right side of the drawing.

  FIG. 14 is a schematic cross-sectional view showing a method for manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 when the pixel configuration of FIG. 11 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device. Note that the cross sections of the pixels C1 and C2 shown in FIG. 11 correspond to the right side of the drawing.

  13 and 14 show an example in which the third resin layer 64 overlaps the light shielding film in a direction perpendicular to the surface of the light shielding film. 13 and 14 show examples in which the width of the light shielding film 40 is wider than the width of the third resin layer 64, the width of the light shielding film 40 is narrower than the width of the third resin layer 64. Also good. In the liquid crystal display device 300, by having the third resin layer 64 in addition to the light shielding film 40, the bonding accuracy of the linear region 126 to the substrate in step 24 (S24) of arranging the linear regions 126 is compensated. Can do. Therefore, it is possible to provide a display device having a WG polarizing plate that prevents light leakage. Here, the light shielding film 40 is a black matrix generally used in a liquid crystal display device.

  FIG. 15 is a flowchart showing a manufacturing method of the liquid crystal display device 300 having the WG polarizing plate 200 shown in FIG.

  First, as shown in FIG. 15A, the TFT array 30 is formed on the glass substrate 123. The TFT array 30 includes a base film 31, a semiconductor layer 32, a gate insulating film 33, a gate electrode 34, an interlayer film 35, source / drain electrodes 36 and 38, first openings 39a and 39b, a capacitance potential. A line 193 and an interlayer film 37 are included. A thin film transistor 190 and a capacitor 196 are formed in the TFT array 30.

  The interlayer film 37 has a role of relieving unevenness when a film in a layer lower than the interlayer film 37, a wiring, a transistor, and the like are formed. Therefore, films and patterns formed after the interlayer film 37 can be formed on a flat surface. The material for forming the interlayer film 37 is a material having high transparency in the visible light region, a material having high heat resistance, the source / drain electrodes 36 and 38, the first light-transmitting conductive layer 70, and the like. It is preferable that the adhesiveness with the common potential line 197 is high. As the material of the interlayer film 37, the same material as that shown for the first resin layer 61 and the second resin layer 63 can be used. For example, a photosensitive resin composition containing an acrylic resin, a polyimide resin, or the like can be employed.

  As a method for forming the TFT array 30, the structures of the thin film transistor 190 and the capacitor 196, the respective films, layers, and materials of the respective parts, known materials can be employed. That is, a method and a method usually used in the technical field of the present invention can be adopted.

  Next, as shown in FIG. 15B, a second opening 194 for electrically connecting the first light-transmissive conductive layer 70 and the source / drain electrode 38 is formed. The second opening 194 opens the interlayer film 37. The first translucent conductive layer 70 is disposed so as to contact the upper surface and the side wall of the interlayer film 37. In the step of forming the first light transmissive conductive layer 70, the common potential line 197 is formed in the same layer as the first light transmissive conductive layer 70. The first light-transmissive conductive layer 70 is connected to the source / drain electrodes 38 of the pixel, is applied with a voltage corresponding to a video signal, and drives a liquid crystal element included in the liquid crystal layer 90 by an electric field with the common potential line 197. Have As a material for forming the first light-transmissive conductive layer 70, for example, a material that transmits light, such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide), can be used. A first alignment film 80 is formed on the first translucent conductive layer 70. As a material for forming the first alignment film 80, for example, a polyimide resin or the like is used. There may be a layer in which a light-shielding film is formed or a layer in which an inorganic compound is formed between the first light-transmissive conductive layer 70 and the common potential line 197 and the first alignment film 80. May be. The light-shielding film has a role of blocking visible light, and the inorganic compound can prevent moisture and impurities from entering. Here, a substrate in which up to the first alignment film 80 is formed on the glass substrate 20 is referred to as a TFT side substrate.

  Next, a method for manufacturing a substrate on the side facing the TFT side substrate with the liquid crystal layer 90 interposed therebetween will be described. Here, the substrate on the side facing the TFT side substrate is referred to as a counter side substrate.

  As shown in FIG. 16, the opposite substrate is a color filter layer composed of a glass substrate 123, a light shielding film 40, a red color filter layer 50, a green color filter layer 51, and a blue color filter layer 52; And the second alignment film 100. The light shielding film 40 is formed by, for example, forming a metallic conductive film and using a photolithography technique. Further, a color filter layer is formed. What is necessary is just to select the order of formation of each color filter layer suitably. For example, the red color filter layer 50 may be formed, the green color filter layer 51 may be formed, and the blue color filter layer 52 may be formed. Each color filter layer is provided in contact with the light shielding film 40. Each color filter layer may be formed by a photolithographic technique using a photomask after applying a material for forming each color filter layer. Note that the forming method is not limited to this method. Further, the second alignment film 100 is formed on the entire surface. As a material for forming the second alignment film 100, for example, a polyimide resin or the like is used. The second alignment film 100 has a role of protecting the color filter layer. For example, the counter substrate thus formed and the TFT substrate are bonded together with a liquid crystal layer 90 interposed therebetween using a sealant or the like. Furthermore, the liquid crystal display device 300 can be manufactured by attaching the WG polarizing plate 200 to the glass substrate 120.

  As shown in FIG. 17, two WG polarizing plates 200 may be prepared and bonded to a glass substrate 120 and a glass substrate 123, respectively.

  In the method of manufacturing the liquid crystal display device 300 having the WG polarizing plate 200 shown in FIG. 14 when the configuration of the pixel of FIG. 11 is applied, in the step of forming the first light-transmissive conductive layer 70, the common potential is formed. Line 197 is not formed. In addition, the second translucent conductive layer 110 is formed between the color filter layer and the glass substrate 120. The second light transmissive conductive layer 110 applies a voltage vertically to the liquid crystal element included in the liquid crystal layer 90 disposed between the second light transmissive conductive layer 110 and the first light transmissive conductive layer 70. It has a role to control the liquid crystal element. As a material for forming the second light-transmissive conductive layer 110, a material that transmits light, such as ITO or IZO, can be used. The second alignment film 100 has a role of insulating the second light-transmissive conductive layer 110 and the first light-transmissive conductive layer 70 formed on the side facing the liquid crystal layer 90 so as not to conduct.

  By using the production method as described above, a display device having a WG polarizing plate that prevents light leakage can be provided.

(Fifth embodiment)
In the present embodiment, an example of the fourth resin layer 65 used in the liquid crystal display device according to one embodiment of the present invention will be described. As described above, the fourth resin layer 65 is a protective film and is a layer having a material having refractive index anisotropy. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment thru | or 4th Embodiment.

  As a specific example of the lyotropic liquid crystal, a water-soluble compound having liquid crystallinity and capable of self-organization can be used. As a specific compound, a polymer main chain such as a conjugated polymer is rigid and water-soluble in a side chain. And a composition containing a polymer having a hydrophilic group. A guest-host type dichroic dye compound may also be included. A guest-host type dichroic dye compound is a polycyclic compound that has a large absorbance in the molecular long axis direction and a small absorption in the short axis direction perpendicular thereto, so that two or more different refractions per molecule. Rate can be expressed. By containing such a compound, a film having optical anisotropy can be produced.

Specific examples of such lyotropic liquid crystals include WO2007 / 080419, WO2009 / 130675, WO2012 / 007923, WO2014 / 174811, and WO2015 / 162495. Specific examples of guest-host type dichroic dye compounds include WO2011 / 024892.

  By using the above materials, a display device having a WG polarizing plate that prevents light leakage can be provided.

  The above-described embodiments of the present invention can be appropriately combined within a range that does not contradict each other. In addition, those in which a person skilled in the art has added, deleted, or changed a design based on each embodiment, or those in which a process has been added, omitted, or changed in conditions also include the gist of the present invention. As long as it falls within the scope of the present invention.

  In addition, even if the operational effects are different from the operational effects brought about by the aspects of the embodiments of the present invention described above, those that are obvious from the description of the present specification or that can be easily predicted by those skilled in the art. , To be construed as provided by the present invention.

  20, 120, 121, 122, 123 ... glass substrate, 30 ... TFT array, 31 ... base film, 32 ... semiconductor layer, 33 ... gate insulating film, 34 ... gate electrode, 35 ... interlayer film, 36, 38 ... source drain Electrode 37 ... interlayer film 39a, 39b ... first opening 40 ... light shielding film 50 ... red color filter layer 51 ... green color filter layer 52 ... blue color filter layer 60 ... polarizer layer 61 ... 1st resin layer, 62 ... linear part, 63 ... 2nd resin layer, 64 ... 3rd resin layer, 65 ... layer (4th resin layer) which has material which has refractive index anisotropy, 66 ... metallic conductivity Film, 67 ... photoresist, 68 ... mask, 69 ... type, 70 ... first translucent conductive layer, 110 ... second translucent conductive layer, 80 ... first alignment film, 90 ... liquid crystal layer, 100 ... first 2 orientation films, 104 ... display area, 106 ... pixels, 1 DESCRIPTION OF SYMBOLS 8,109 ... Gate side drive circuit, 112 ... Source side drive circuit, 114 ... Connector, 116 ... Integrated circuit, 126 ... Linear region, 130 ... Polarizing plate, 190 ... Thin film transistor, 191 ... Source signal line, 192 ... Gate signal 193 ... capacitance potential line, 194 ... second opening, 196 ... capacitor element, 197 ... common potential line, 200 ... wire grid polarizing plate (WG polarizing plate), 300 ... liquid crystal display device

Claims (20)

Including a plurality of linear regions in which a plurality of the linear portions are arranged in a direction substantially parallel to a direction in which the linear portions extend in one direction and the direction in which the linear portions extend,
The linear portion has a width equal to or shorter than the shortest wavelength of visible light incident from the outside,
A protective film is included between the plurality of linear regions,
The said protective film shields visible light. The polarizing plate characterized by the above-mentioned. The lower surface of the linear portion is in contact with the first resin layer,
The side surface and the upper surface of the linear portion are in contact with the second resin layer,
The polarizing plate according to claim 1, wherein a side surface of the first resin layer and a side surface of the second resin layer are in contact with the protective film. A second resin layer is provided between the linear portions, and a lower surface of the linear portion is in contact with the first resin layer,
The polarizing plate according to claim 1, wherein a side surface of the first resin layer and a side surface of the second resin layer are in contact with the protective film. The lower surface of the linear portion is in contact with the first resin layer,
The polarizing plate according to claim 1, wherein a side surface of the linear portion and a side surface of the first resin layer are in contact with the protective film.   The polarizing plate according to claim 1, wherein the protective film covers the linear region.   The polarizing plate according to claim 1, wherein the linear portion includes a conductive metal material.   The polarizing plate according to claim 1, wherein the protective film is a resin or a resin containing liquid crystal.   The polarizing plate according to claim 1, wherein the protective film includes a material having refractive index anisotropy. Forming a resin layer on the first substrate;
On the resin layer, forming a linear region in which a plurality of linear portions are arranged in a direction substantially parallel to a linear portion extending in one direction and a direction in which the linear portion extends;
Separating the first substrate and the linear region;
Arranging a plurality of the linear regions on the second substrate;
Forming a protective film that shields visible light between the plurality of linear regions arranged on the second substrate;
The manufacturing method of the polarizing plate characterized by including. The step of forming the linear region includes
A metallic conductive film is formed on the resin layer,
A photoresist is applied on the metallic conductive film,
The method for producing a polarizing plate according to claim 9, comprising a step of exposing the photoresist with light having a wavelength shorter than the width of the linear portion using a photomask. The step of forming the linear region includes
A metallic conductive film is formed on the resin layer,
A photoresist is applied on the metallic conductive film,
The surface on which the pattern of the pattern on which the pattern is formed is pressed against the photoresist,
The method for producing a polarizing plate according to claim 9, comprising a step of irradiating the mold with light having a wavelength shorter than the width of the linear portion to expose the photoresist. The method for forming a polarizing plate according to claim 9, wherein the step of forming the protective film is performed by inkjet. The step of forming the protective film includes forming a protective film on the upper surface of the linear region in addition to a plurality of the linear regions arranged on the second substrate. The manufacturing method of the polarizing plate as described in any one of. A linear portion having a width equal to or shorter than the shortest wavelength of incident visible light and extending in one direction;
Including a plurality of linear regions in which a plurality of the linear portions are arranged in a direction substantially parallel to a direction in which the linear portions extend,
A protective film that is provided between the plurality of linear regions and shields visible light;
A polarizing plate;
A plurality of pixels arranged in a direction extending in the one direction and in a direction intersecting with the direction extending in the one direction;
A light shielding film, a first substrate, a second substrate,
A display device comprising: The protective film overlaps the light shielding film in a direction perpendicular to the surface of the light shielding film,
The width of the protective film is narrower than the width of the light shielding film,
The display device according to claim 14. The pixel is
A source signal line formed substantially parallel to the direction extending in the one direction;
A gate signal line formed substantially parallel to a direction intersecting with the direction extending in the one direction;
Including
The source signal line overlaps the protective film in a direction perpendicular to the surface of the protective film,
The width of the source signal line is narrower than the width of the protective film,
The display device according to claim 14. The gate signal line overlaps the protective film in a direction perpendicular to the surface of the protective film,
The width of the gate signal line is narrower than the width of the protective film,
The display device according to claim 16. A plurality of the light shielding films;
The plurality of light shielding films include a light shielding film in which the linear regions overlap in a direction perpendicular to the surface of the light shielding film, a light shielding film in which both the linear regions and the protective film overlap,
The display device according to claim 14, comprising: A red color filter, a green color filter, a blue color filter,
And further
The plurality of light shielding films include a light shielding film in contact with the red color filter and the green color filter, a light shielding film in contact with the green color filter and the blue color filter, and a light shielding film in contact with the blue color filter and the red color filter. When,
The display device according to claim 15, further comprising:   The display device according to claim 14, wherein the polarizing plate is disposed on at least one of a lower surface of the first substrate and an upper surface of the second substrate.

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