WO2018147279A1 - Reflective polarizing layer, wavelength conversion layer, and liquid crystal display device - Google Patents

Abstract

A reflective polarizing layer according to an embodiment of the present invention has a width less than the shortest wavelength of the incident light that passes therethrough and a plurality of stripes. The stripes are separated from each other and arrayed in a direction parallel to the extending direction of the stripes. A first dielectric is filled between the stripes with the upper surface and the lower surface of the stripes in contact with a second dielectric and a third dielectric respectively. The reflectance of p-polarized light with a blue wavelength is relatively higher than the reflectance of the red wavelength and the reflectance of the green wavelength. The transmittance of p-polarized light with a blue wavelength is relatively lower than the transmittance of the red wavelength and the transmittance of the green wavelength.

Description

Reflective polarizing layer, wavelength conversion layer, and liquid crystal display device

The present invention relates to a reflective polarizing layer, a wavelength conversion layer, and a liquid crystal display device.

In recent years, there is a high demand for improvement in color reproducibility and high definition of liquid crystal display devices. A high-definition liquid crystal display device has a problem of improving the light use efficiency because the pixel size is small. As a method for improving color reproducibility and light utilization efficiency, a method using a polarizing plate and a fluorescent material has been proposed.

For example, Patent Document 1 converts a blue light emitted from a white conversion layer into red or green by a wavelength conversion layer using a quantum dot by a white light source, a color filter, and a wavelength conversion layer using a quantum dot, and converts the light. A method for improving color reproducibility and light utilization efficiency by passing the red light, green light, and unconverted blue light through the color filters of the respective colors is disclosed.

JP 2016-70949 A

It is required to further improve color reproducibility and light utilization efficiency.

In view of such a problem, an embodiment of the present invention has an object to provide a reflective polarizing layer and a wavelength conversion layer that can improve color reproducibility and light utilization efficiency. An object is to provide a liquid crystal display device including a reflective polarizing layer and a wavelength conversion layer that can improve color reproducibility and light utilization efficiency.

A reflective polarizing layer according to an embodiment of the present invention is a reflective polarizing layer having a width equal to or shorter than the shortest wavelength of incident transmitted light and having a linear portion, and the linear portion extends from the linear portion. The first dielectric is provided between the linear portions, and the upper surface of the linear portion is in contact with the second dielectric, and the lower surface of the linear portion is in contact with the third dielectric.

In the reflective polarizing layer according to the embodiment of the present invention, the reflectance of the p-polarized light having the blue wavelength is relatively higher than the reflectance of the red wavelength and the reflectance of the green wavelength. The transmittance may be relatively lower than the transmittance of the red wavelength and the transmittance of the green wavelength.

The reflective polarizing layer according to an embodiment of the present invention absorbs light having a blue wavelength and emits light having a red wavelength, absorbs light having a blue wavelength, and emits light having a green wavelength. You may make it contact the wavelength conversion layer containing a wavelength conversion material.

In the reflective polarizing layer in contact with the wavelength conversion layer according to an embodiment of the present invention, the wavelength conversion material that emits red wavelength light and the wavelength conversion material that emits green wavelength light included in the wavelength conversion layer are on the same plane. May be provided.

The wavelength conversion layer in the reflective polarizing layer according to an embodiment of the present invention may be in contact with the third dielectric or the second dielectric.

The reflective polarizing layer in contact with the wavelength conversion layer according to an embodiment of the present invention includes a wavelength conversion material that emits red wavelength light and a wavelength conversion material that emits green wavelength light included in the wavelength conversion layer. You may make it partition with the layer.

In the reflective polarizing layer in contact with the wavelength conversion layer according to an embodiment of the present invention, the wavelength conversion material that emits red wavelength light is in contact with the red color filter, and the wavelength conversion material that emits green wavelength light is a green color. You may make it contact | connect with a filter.

A display device according to an embodiment of the present invention includes a first substrate, a TFT array, a wavelength conversion layer, a reflective polarizing layer, a translucent conductive film, a first alignment film, a liquid crystal layer, and a second layer. An alignment film, a second substrate, a polarizing plate, a TFT array, a wavelength conversion layer, a reflective polarizing layer, a translucent conductive film, a first alignment film, a liquid crystal layer, and a second alignment film Is arranged between the first substrate and the second substrate.

A reflective polarizing layer included in a display device according to an embodiment of the present invention has a width equal to or shorter than the shortest wavelength of incident transmitted light, has a conductive linear portion, a first dielectric, and a second A plurality of linear portions arranged in parallel with a direction in which the linear portions extend; the first dielectric is provided between the linear portions; and the linear portions The upper surface of the contact with the second dielectric,
The lower surface of the linear portion may be in contact with the third dielectric.

The wavelength conversion layer included in the display device according to an embodiment of the present invention includes a wavelength conversion material that absorbs blue wavelength light and emits red wavelength light, absorbs blue wavelength light, and emits green wavelength light. The wavelength conversion material that emits light having a red wavelength and the wavelength conversion material that emits light having a green wavelength may be provided on the same plane.

A color filter layer is included between the reflection conversion layer and the wavelength conversion layer included in the display device according to the embodiment of the present invention, and the color filter layer includes a red color filter and a green color filter. The red color filter may be in contact with a wavelength conversion material that emits light with a red wavelength, and the green color filter may be in contact with a wavelength conversion material that emits light with a green wavelength.

The wavelength conversion layer included in the display device according to an embodiment of the present invention may have an opening, and the translucent conductive film may be in contact with the third dielectric and disposed in the opening.

Another display device according to an embodiment of the present invention includes a protective film, a wavelength conversion layer, a reflective polarizing layer, a first substrate, a TFT array, a translucent conductive film, a first alignment film, Including a liquid crystal layer, a second alignment film, a second substrate, and a polarizing plate; a TFT array, a translucent conductive film, a first alignment film, a liquid crystal layer, and a second alignment film; The first substrate and the second substrate are disposed, and the wavelength conversion layer and the reflective polarizing layer are disposed between the protective film and the first substrate.

A reflective polarizing layer included in another display device according to an embodiment of the present invention has a width equal to or shorter than the shortest wavelength of incident transmitted light, a linear portion having conductivity, a first dielectric, A plurality of linear portions including a second dielectric material and a third dielectric material are arranged in parallel with a direction in which the linear portions extend, and a first dielectric material is provided between the linear portions. The upper surface of the linear portion may be in contact with the second dielectric, and the lower surface of the linear portion may be in contact with the third dielectric.

The wavelength conversion layer included in another display device according to an embodiment of the present invention includes a wavelength conversion material that absorbs blue wavelength light and emits red wavelength light, and absorbs blue wavelength light and green light. A wavelength conversion material that emits light of a wavelength and a wavelength conversion material that emits light of a red wavelength and a wavelength conversion material that emits light of a green wavelength may be provided on the same plane.

A color filter layer is included between a reflection conversion layer and a wavelength conversion layer included in another display device according to an embodiment of the present invention, and the color filter layer includes a red color filter, a green color filter, The red color filter may be in contact with a wavelength conversion material that emits light of a red wavelength, and the green color filter may be in contact with a wavelength conversion material that emits light of a green wavelength.

The translucent conductive film included in the display device according to the embodiment of the present invention may be comb-shaped or plate-shaped.

The wavelength conversion layer included in the display device according to the embodiment of the present invention may be in contact with the protective film.

The reflective polarizing layer included in the display device according to the embodiment of the present invention may be in contact with the first substrate.

The composition according to an embodiment of the present invention constitutes a wavelength conversion layer included in a display device.

It is typical sectional drawing which shows the structure of the reflective polarizing layer which concerns on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. 1 is a schematic plan view showing a configuration of a liquid crystal display device according to an embodiment of the present invention. It is typical sectional drawing which shows the structure of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is a typical top view showing a pixel which a liquid crystal display concerning one embodiment of the present invention contains. It is a typical top view showing a pixel which a liquid crystal display concerning one embodiment of the present invention contains. It is a typical top view which shows the reflective polarizing layer of the pixel which the liquid crystal display device which concerns on one Embodiment of this invention contains. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the structure of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention. It is typical sectional drawing which shows the manufacturing method of the liquid crystal display device containing the reflective polarizing layer and wavelength conversion layer which concern on one Embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention can be implemented in many different modes without departing from the scope of the invention. That is, the present invention is not construed as being limited to the description of the embodiments exemplified below. In addition, in order to clarify the description, the drawings may be schematically represented with respect to the width, thickness, shape, and the like of each part as compared to the actual mode. However, the schematic drawings are merely examples, and do not limit the interpretation of the present invention.

In the present specification and each drawing, the same elements as those described in the previous drawings are denoted by the same reference numerals (or numerals followed by a, b, etc.), and the description will be omitted as appropriate. There is. The letters “first” and “second” attached to each element are convenient signs used to distinguish each element, and have more meanings unless otherwise specified. Absent.

In this specification, “upper” includes not only the case of being placed directly on a certain object or region, but also the case of being placed with another object or region in between. The same applies to the term “below”. In addition, terms such as “upper” and “lower” indicate a relative vertical relationship between objects or regions, and do not mean an absolute vertical relationship. Specifically, with respect to the main surface of the substrate (the surface on which elements are formed), the upper side is defined as “up” and the opposite side of the main surface of the substrate is defined as “lower”. To do.

When a single film is processed to form a plurality of patterns, each of the plurality of patterns may have a different function and / or role. However, these plural patterns are derived from films formed as the same layer in the same process. That is, these plural patterns have the same layer structure and include the same material. Therefore, in this specification, it is defined that these plural patterns exist in the same layer.

The reflective polarizing layer and wavelength conversion layer of the present invention will be described. The reflective polarizing layer includes a wire grid (which may be described as WG (Wire Grid) in the following description) and a resin, and blue p-polarized light is transmitted, reflected, or absorbed. Here, the wire grid is sometimes called a wire grid polarizer, a wire grid polarizer, a wire grid polarizer, a wire grid film, or the like. A wire grid is an optical element having a linear region (wire grid) in which a plurality of fine linear members (also referred to as linear portions or wires) are arranged in a lattice shape or a net shape. Moreover, the wire grid polarizer may have a plurality of the optical elements. The wire grid polarizer extracts light oscillating in a specific direction from the light of the light source, and reflects light that is not in the specific direction to the light source side. The wavelength conversion layer absorbs light of blue (shortest wavelength to use), absorbs light of red (longest wavelength to use), and absorbs light of blue (shortest wavelength to use), A wavelength conversion material that emits green light is included. Reflected blue light by using a wavelength conversion layer that includes a reflective polarizing layer containing WG and resin, a wavelength conversion material that converts blue light into red light, and a wavelength conversion material that converts blue light into green light. It will be described that light can be efficiently converted into red light and green light, and the utilization efficiency of light can be improved.

(First embodiment)
In the present embodiment, a configuration and a manufacturing method of a reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention will be described.

<Configuration>
FIG. 1 is a schematic cross-sectional view showing the configuration of the WG reflective polarizing layer 60 in the first embodiment.

The WG reflective polarizing layer and optical system 200 shown in FIG. 1 show a WG reflective polarizing layer 60, a light guide plate 10, a diffuser plate 11, a light source 12, and a reflective plate 13. The WG reflective polarizing layer 60 includes a linear portion 61, a second dielectric 62, and a third dielectric 63.

The light source 12 may be a light source that emits blue light, for example. Specifically, a blue light emitting diode (LED) can be used. The light guide plate 10 has a role of guiding light from the light source 12 upward. The diffusion plate 11 has a role of diffusing light from the light guide plate. The reflection plate 13 has a role of reflecting light from the light source and reflected light 65 from the WG reflective polarizing layer 60. Although FIG. 1 shows an example using a so-called edge light type backlight using a light guide plate and a light source, the present invention is not limited to this example. For example, a so-called direct light type backlight using a diffusion plate and a light source may be used.

FIG. 2 is a schematic cross-sectional view showing the configuration of the WG reflective polarizing layer 60 and the wavelength conversion layer in the first embodiment.

The WG reflective polarizing layer, the wavelength conversion layer, and the optical system 210 shown in FIG. 2 include the light shielding layer 40, the red conversion layer 41, the green conversion layer 42, the blue color filter layer 43, or the fourth dielectric in addition to the configuration shown in FIG. including. In FIG. 2, for example, the light source 12 may be a light source that emits white light or a light source that emits blue light. Specifically, a white light emitting diode (Light Emitting Diode (LED)) or a blue light emitting diode (Light Emitting Diode (LED)) may be used. FIG. 2 shows an example using a so-called edge light type backlight using a light guide plate and a light source, but the present invention is not limited to this example. For example, a so-called direct light type backlight using a diffusion plate and a light source may be used.

The light blocking layer 40 has a function of blocking visible light, partitions the adjacent red conversion layer 41, green conversion layer 42, blue color filter layer 43 or fourth dielectric, and converts each wavelength conversion layer and blue color. Mixing of light transmitted or reflected through the color filter layer 43 or the like can be suppressed. The red conversion layer 41 has a role of converting the blue incident light 64 into red. The green conversion layer 42 has a role of converting the blue incident light 64 into green. Blue incident light 64 passes through each conversion layer and WG reflective polarizing layer 60, and red transmitted light (P wave) 67, green transmitted light (P wave) 68, and blue transmitted light (P wave) 69 are transmitted. S-waves (including blue, green, and red) reflected by the WG reflective polarizing layer are reflected by the reflector 13 and proceed (return) to 41, 42, and 43, and are recycled by repeating the above-described behavior (light Use efficiency).

For example, the blue incident light 64 is wavelength-converted to red by the red conversion layer 41 and enters the WG reflective polarizing layer 60 together with the blue color that cannot be absorbed by the red conversion layer 41. In the WG reflective polarizing layer 60, the P wave is emitted as red transmitted light (P wave) 67, but the S wave is reflected and returns to the light source side. The transmittance and reflectance of the WG reflective polarizing layer 60 may be wavelength-dependent, and blue preferably has a low transmittance and a high reflectance with respect to green and red. Blue reflected by the WG reflective polarizing layer 60 is converted to red by the red conversion layer 41. The light reflected by the WG reflective polarizing layer 60 and passing through the red color conversion layer 41 returns to the wavelength conversion layer and the WG reflective polarizing layer 60 through the diffusion plate 11, the light guide plate 10, the reflection plate 13, the light guide plate 10, and the diffusion plate 11. Recycling (improves light use efficiency) by repeating behavior.

For example, the blue incident light 64 is wavelength-converted to green by the green conversion layer 42 and enters the WG reflection polarizing layer 60 together with the blue color that cannot be absorbed by the green conversion layer 42. In the WG reflective polarizing layer 60, the P wave is emitted as green transmitted light (P wave) 68, while the S wave is reflected and returns to the light source side. The transmittance and reflectance of the WG reflective polarizing layer 60 may be wavelength-dependent, and blue preferably has a low transmittance and a high reflectance with respect to green and red. Blue reflected by the WG reflective polarizing layer 60 is converted to green by the green conversion layer 42. The light reflected by the WG reflective polarizing layer 60 and passing through the green conversion layer 42 returns to the wavelength conversion layer and the WG reflective polarizing layer 60 through the diffusion plate 11, the light guide plate 10, the reflection plate 13, the light guide plate 10, and the diffusion plate 11. Recycling (improves light use efficiency) by repeating behavior.

For example, the blue incident light 64 enters the WG reflective polarizing layer 60 through the blue color filter layer 43. In the WG reflective polarizing layer 60, the P wave is emitted as blue transmitted light (P wave) 69, while the S wave is reflected and returns to the light source side. The transmittance and reflectance of the WG reflective polarizing layer 60 may be wavelength-dependent, and blue preferably has a low transmittance and a high reflectance with respect to green and red. Blue reflected by the WG reflective polarizing layer 60 returns to the wavelength conversion layer and the WG reflective polarizing layer 60 through the blue color filter layer 43, the diffuser plate 11, the light guide plate 10, the reflective plate 13, the light guide plate 10, and the diffuser plate 11. Recycling (improves light use efficiency) by repeating behavior.

The use efficiency of light can be improved by using the reflective polarizing layer and the wavelength conversion layer of the present invention. Although an example using a color filter is shown here, the present invention is not limited to this example, and a color filter may not be used. When the color filter is not used, the amount of light absorbed by the color filter can be eliminated, so that the light use efficiency is further improved. For example, when a wavelength conversion layer including a phosphor such as a quantum dot is used, a light filter with a low light absorption rate may be used because the light absorption efficiency in the wavelength conversion layer is improved.

The linear part 61 is a thin line having a line width equal to or shorter than the shortest wavelength of transmitted light to be used. A plurality of linear portions 61 are arranged in parallel with the extending direction, and are formed on the transparent substrate using a conductive material. It is preferable that the intervals at which the linear portions 61 are arranged are periodic. The intervals at which the linear portions 61 are arranged may be aperiodic. For example, when the light shielding layer is formed on the same plane as the plurality of linear portions 61, the line widths of the thin line and the light shielding layer may be different, and thus become aperiodic.

It is well known that the performance of WG is expressed by the relationship between the WG interval, the wavelength of incident light, the angle of incident light (incident angle), and the refractive index of the substrate. If the interval at which the linear portions 61 are arranged is equal to or shorter than the shortest wavelength of transmitted light to be used, the WG reflective polarizing layer 60 can transmit p-polarized light and reflect s-polarized light. Specifically, when the range of transmitted light used is a visible light wavelength of 400 nm to 700 nm, the shortest wavelength of transmitted light used is 400 nm. For example, the interval is 360 nm or less and the line width is 180 nm or less. And it is sufficient. The line width is preferably 1/2 or less of the interval. When the line width is about ½ or less of the interval, the WG reflective polarizing layer 60 reflects almost all the electric field components that oscillate parallel to the linear portion 61 with respect to the incident light, and oscillates vertically. Is almost transparent. Therefore, by adjusting the line width and interval of the linear portion 61 included in the WG reflective polarizing layer, it is possible to provide a WG reflective polarizing layer that selectively extracts light of a specific wavelength. In addition, it is possible to provide a WG reflective polarizing layer that extracts either s-polarized light or p-polarized light. It is assumed that p-polarized light is a component of light whose electric field oscillates vertically in the incident plane, and s-polarized light is a component of light whose electric field oscillates in parallel with the incident plane.

WG performance is also related to WG film thickness. For example, the film thickness of WG may be such that the light transmittance is 1% or less. For example, the film thickness of WG is preferably 30 nm or more. Specifically, when the range of transmitted light in which the linear portion 61 is used is a visible light wavelength of 400 nm to 700 nm, the shortest wavelength of transmitted light to be used is 400 nm, and for example, the WG interval is 360 nm. The film thickness of WG may be 360 nm. If the thickness of the WG is too thin, the transmitted light cannot be ignored, and light with a specific wavelength cannot be selectively extracted. On the other hand, if the film thickness of the WG is too thick, the light use efficiency may be reduced, so that the transmitted light cannot be ignored. Therefore, as with the line width, the film thickness is preferably ½ or less of the interval. The performance of the WG is also related to the refractive index between the WG grids. By filling a transparent dielectric such as resin between the grids, the wavelength dependence of transmittance and reflectance (for example, blue has a low transmittance and a high reflectance with respect to green and red) can be imparted. I can do it. The transparent dielectric is preferably a transparent resin, and the space between the linear portions and the upper surface of the linear portion are filled with the transparent resin. The first dielectric and the second dielectric may be formed of the same transparent resin or may be formed of different transparent resins.

The material forming the linear part 61 is preferably a conductive metal. In addition, it is preferable that the material forming the linear portion 61 has a high reflectance with respect to the transmitted light to be used and a high adhesion to the second dielectric 62 and the third dielectric 63. Examples thereof include, but are not limited to, conductive metal materials such as aluminum, silver, platinum, etc., or alloys thereof.

1 and 2, the cross-sectional shape of the linear portion 61 is a rectangle, but is not limited to a rectangle. The cross-sectional shape of the linear portion 61 may be a square, a trapezoid, a triangle, or various shapes within the scope of the present invention. Can do.

The material forming the third dielectric 63 is preferably a material that can be a base material. The base material is a material having high transparency in the visible light region such as glass and resin, a material having high heat resistance, high adhesion to the linear portion 61, and the second dielectric 62. Although it is preferable that adhesiveness is high, it is not limited to these. For example, polycarbonate, polystyrene (PS), cycloolefin polymer (COP), amorphous thermoplastic resin such as polyvinyl chloride, crystalline thermoplastic resin such as polyethylene terephthalate (PET), polyethylene, polypropylene, acrylic, epoxy , Urethane-based, polyimide-based and other ultraviolet curable resins and thermosetting resins. Moreover, it is good also as a structure which combined ultraviolet curable resin or thermosetting resin, inorganic board | substrates, such as glass, the said thermoplastic resin, etc. The third dielectric 63 may be made of a material for forming a second dielectric described later.

The material forming the second dielectric 62 is preferably a resin or the like. Further, the characteristics of the material forming the second dielectric 62 are a material having high transparency in the visible light region, a material having high heat resistance, high adhesion to the linear portion 61, It is preferable that the adhesiveness with the three dielectrics 63 is high, but is not limited thereto. For example, polycarbonate, polystyrene (PS), cycloolefin polymer (COP), amorphous thermoplastic resin such as polyvinyl chloride, crystalline thermoplastic resin such as polyethylene terephthalate (PET), polyethylene, polypropylene, acrylic, epoxy , Urethane-based, polyimide-based and other ultraviolet curable resins and thermosetting resins. Moreover, it is good also as a structure which combined the ultraviolet curable resin and the thermosetting resin, and the said thermoplastic resin. The second dielectric may have a two-layer structure. For example, a dielectric filling between the plurality of linear portions 61, a dielectric contacting the top surface of the plurality of linear portions 61 and the top surface of the dielectric filling between the plurality of linear portions 61, and a two-layer structure It is good. The material of each resin of the two-layer structure may be the same material as the second dielectric 62 described above. In the case of a two-layer structure, the dielectric filling between the plurality of linear portions 61 may be a layer using a solid dielectric material. For example, it can be formed of an inorganic compound such as silicon oxide, silicon nitride oxide, silicon oxynitride, or silicon nitride, or a laminated structure thereof, but is not limited thereto.
The first dielectric and the second dielectric may be formed of the same transparent resin, or may be formed of different transparent resins. As a transparent resin material for forming the dielectric, JP-A-2013-062489 JP, 2012-224845, JP 2013-097661, WO 2014/196281, etc. can be used.

For the wavelength conversion layer, an inorganic phosphor, a fluorescent organic dye, a quantum dot, or the like is used. For example, the red color conversion layer 41 is Y ₂ O ₃ : Eu ³⁺ , Y ₂ O ₂ S: Eu ^3+, etc., and the green color conversion layer 42 is blue, such as Ca ₂ SiO ₄ : Eu ²⁺ , ZnSiO ₃ : Mn. For the conversion layer, ZnS: Ag, ZnS, or the like may be used. However, it is not limited to these.

The light shielding layer may have a light transmittance of 5% or less. Moreover, it is preferable that it is an electroconductive metal. Furthermore, it is preferable that the reflectance with respect to the transmitted light to be used is high and the adhesion between the third dielectric 63 and the wavelength conversion layer is high. For example, a conductive metal material such as aluminum, chromium, titanium, or an alloy thereof, or carbon particles such as carbon black may be used. However, it is not limited to these.

<Production process>
A process for manufacturing the WG reflective polarizing layer 60 and the wavelength conversion layer will be briefly described. Note that the manufacturing method is not limited to this method, and a method usually used in the technical field of the present invention can be adopted.

For example, a method of producing the WG reflective polarizing layer 60 and the wavelength conversion layer using an electron beam drawing apparatus or photolithography will be described. A case where the second dielectric has two layers will be described.

A polyimide or acrylic resin to be the second dielectric 62 is applied to the glass substrate. Alternatively, an inorganic compound such as silicon oxide, silicon nitride oxide, silicon oxynitride, or silicon nitride is formed. The coating method may be a spin coating method or a dipping method. Further, the film formation may be chemically formed using a CVD apparatus or the like, or may be physically formed using a vacuum deposition method, a sputtering method, an ion plating method, a screen printing method, or the like.

Next, a conductive metal for forming the linear portion 61 is formed. For example, aluminum is formed using a sputtering apparatus. Further, a photoresist is applied, and portions other than the pattern of the linear portion 61 are drawn and developed by an ArF exposure device, a KrF exposure device, an electron beam drawing device or the like. Since the photoresist remains on the pattern of the linear portion 61, the linear portion 61 can be formed by performing etching using the photoresist as a mask and removing the photoresist.

Subsequently, a polyimide or acrylic resin that is the second layer of the second dielectric 62 is applied. Alternatively, an inorganic compound such as silicon oxide, silicon nitride oxide, silicon oxynitride, or silicon nitride is formed. As an application method, an inkjet method, a spin coating method, a dipping method, or the like may be used. The film may be formed chemically using a CVD apparatus or the like, or physically formed using a vacuum deposition method, a sputtering method, an ion plating method, or the like. In this way, the space between the plurality of linear portions 61 can be filled with the resin or the inorganic compound.

Further, the resin or the inorganic compound is planarized using a chemical mechanical polishing apparatus (Chemical Mechanical Polisher, CMP). At this time, polishing may be performed to such an extent that the linear portion 61 is exposed on the surface.

Subsequently, a polyimide or acrylic resin to be the third dielectric 63 is applied. Alternatively, an inorganic compound such as silicon oxide, silicon nitride oxide, silicon oxynitride, or silicon nitride is formed. The coating method may be a spin coating method or a dipping method. The film may be formed chemically using a CVD apparatus or the like, or physically formed using a vacuum deposition method, a sputtering method, an ion plating method, or the like.

Further, a light shielding layer 40 is formed. For example, a conductive metal or chromium film is formed using a sputtering apparatus. Further, a photoresist is applied, and the pattern of the light shielding layer 40 is formed and developed by a photolithography technique using a photomask. Since the photoresist remains on the pattern of the light shielding layer 40, the light shielding layer 40 can be formed by performing etching using the photoresist as a mask and removing the photoresist.

Next, a wavelength conversion layer is formed. What is necessary is just to select the order which forms a wavelength conversion layer suitably. For example, a red fluorescent organic dye may be applied to form the red conversion layer 41, and a green fluorescent organic dye may be applied to form the green conversion layer 42. These wavelength conversion layers are formed on the same plane. By forming them on the same plane, it is possible to reduce the number of manufacturing steps as compared to forming each of them with different layers. The material used may be an inorganic phosphor or quantum dots. For blue, a blue color filter layer 43 may be applied, or a material used for the second dielectric and the third dielectric may be applied. In this way, a wavelength conversion layer can be formed. Although not shown in FIG. 2, a protective film may be formed after the wavelength conversion layer is formed. For the protective film, the material used for the second dielectric and the third dielectric may be used, or a film layer such as a plastic film may be bonded using an adhesive.

In this way, the WG reflective polarizing layer 60 and the wavelength conversion layer can be produced. In addition, you may use the WG reflective polarizing layer 60 and the wavelength conversion layer produced on the glass substrate as it is. Alternatively, it may be peeled mechanically from the glass substrate and used in a flexible state.

The WG reflective polarizing layer 60 and the wavelength conversion layer constructed and manufactured as described above can improve the light utilization efficiency. In addition, the WG reflective polarizing layer 60 and the wavelength conversion layer can be manufactured using an apparatus and a method that are usually used in the technical field of the present invention without using a special manufacturing process or manufacturing apparatus. It is possible to provide the WG reflection polarizing layer 60 and the wavelength conversion layer that suppresses the above.

(Second Embodiment)
In the present embodiment, a liquid crystal display device using a reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment.

FIG. 3 is a schematic plan view showing the configuration of the liquid crystal display device 160 according to an embodiment of the present invention.

The liquid crystal display device 160 includes a first glass substrate 20, a pixel region 104, gate side driving circuits 108 and 109, a source side driving circuit 112, a connector 114, and an integrated circuit (IC) 116.

On the first glass substrate 20, the pixel region 104, the gate side drive circuits 108 and 109, and the source side drive circuit 112 are formed. The connector 114 is connected to the first glass substrate 20. An integrated circuit (IC) 116 is provided on the connector 114.

The pixel area 104 includes a plurality of pixels 106. The plurality of pixels 106 are arranged along one direction and a direction intersecting with one direction. The number of arrangement of the plurality of pixels 106 is arbitrary. For example, m pixels 106 in the X direction and n pixels 106 in the Y direction are arranged. m and n are each independently a natural number greater than 1. The pixel area 104 becomes a display area. Each of the pixels 106 includes a display element, and the display element includes a liquid crystal element.

For example, display elements corresponding to the three primary colors of red (R), green (G), and blue (B) can be provided in each of the three pixels. A full-color liquid crystal display device can be provided by supplying 256 steps of voltage or current to each pixel. Further, there is no limitation on the arrangement of the plurality of pixels 106. For example, a stripe arrangement or a delta arrangement may be adopted. In the liquid crystal display device 160 according to an embodiment of the present invention, an example of a stripe arrangement will be described.

The connector 114 has a role of supplying a video signal, a timing signal for controlling the operation of the circuit, a power source, and the like to the gate side driving circuits 108 and 109 and the source side driving circuit 112. The connector 114 may use a flexible printed circuit (FPC). A video signal, a timing signal for controlling the operation of the circuit, a power source, and the like are supplied from an external circuit to the gate side driving circuits 108 and 109 and the source side driving circuit 112 via the connector 114.

The gate side driver circuits 108 and 109 and the source side driver circuit 112 drive each pixel 106 using the supplied video signal, a timing signal for controlling the operation of the circuit, a power source, and the like, and display an image in the pixel region 104. Have a role to play.

All of the gate side drive circuits 108 and 109 and the source side drive circuit 112 may not be formed on the first glass substrate 20. For example, an integrated circuit (IC) including part or all of the functions of the gate side driver circuit and the source side driver circuit may be disposed on the first glass substrate 20 or the connector 114. Note that the integrated circuit (IC) 116 in FIG. 3 has some functions of a gate-side driver circuit and a source-side driver circuit.

FIG. 4 is a schematic cross-sectional view showing the configuration of the liquid crystal display device 310 or the liquid crystal display device 320 including the WG reflective polarizing layer 60 and the wavelength conversion layer according to an embodiment of the present invention, and the optical system 300. In addition to the configuration of FIG. 2, the optical system 300 includes a first glass substrate 20, a TFT array 30, a first light-transmissive conductive layer 70, a first alignment film 80, a liquid crystal layer 90, a second alignment film 100, and a second light-transmitting film. A photoconductive layer 110, a second glass substrate 120, and a polarizing plate 130 are included.

The TFT array 30 is a layer in which a pixel region 104, gate side driving circuits 108 and 109, and a source side driving circuit 112 are formed by a plurality of thin film transistors, capacitor elements, resistance elements, various wirings, and the like. The TFT array 30 has a role of driving the liquid crystal display device 310 or 320. The first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110 have a role of controlling a liquid crystal element included in the liquid crystal layer 90 by applying a voltage to each. The first alignment film 80 and the second alignment film 100 are liquid crystal elements included in the liquid crystal layer 90 when a voltage is applied to each of the first light transmitting conductive layer 70 and the second light transmitting conductive layer 110. Has the role of orientation. The liquid crystal display device 310 or 320 can be realized by sandwiching these components between the first glass substrate 20 and the second glass substrate 120. Note that the polarizing plate 130 has a role of aligning and transmitting random polarized light to polarized light in a specific direction. Note that a common potential line 197 described later may be used without using the second light-transmitting conductive layer 110. 4 shows an example in which the red color filter layer 50, the green color filter layer 51, the blue color filter layer 43, or the fourth dielectric is used, the color filter may not be provided.

FIG. 5 is a schematic plan view showing the pixel 106 included in the liquid crystal display device 160 according to the embodiment of the present invention. The pixel shown in FIG. 5 can be applied to a VA (Vertical Alignment) method or a TN (Twisted Nematic) method in which a voltage is applied in a direction perpendicular to the first glass substrate 20 to control a liquid crystal element.

5 includes a thin film transistor 190, a capacitor 196, a source wiring 191, a gate wiring 192, a capacitor potential line 193, and a first light-transmitting conductive layer 70. The pixel 106 illustrated in FIG. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source / drain electrodes 36 and 38, and first openings 39a and 39b. The source / drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 through the first openings 39a and 39b. The first translucent conductive layer 70 is electrically connected to the source / drain electrode 38 via the second opening 194 and the third opening 195. A capacitor element 196 is formed by the source / drain electrode 38, the gate insulating film 33 described later, and the capacitor potential line 193. The source / drain electrodes 36 and the source wiring 191 are electrically connected. The gate electrode 34 and the gate wiring 192 are electrically connected. By applying a voltage to each of the first light transmissive conductive layer 70 and the second light transmissive conductive layer 110 described later, an electric field is generated in a direction perpendicular to the first glass substrate 20 and is included in the liquid crystal layer 90. The liquid crystal element to be controlled is controlled, and the liquid crystal display device can display an image.

FIG. 6 is a schematic plan view showing another example of the pixel 106 included in the liquid crystal display device 160 according to the embodiment of the present invention. The pixel shown in FIG. 6 can be applied to an IPS (In Plane Switching) system in which a voltage is applied to the first glass substrate 20 in a horizontal direction to control a liquid crystal element.

6 includes a thin film transistor 190, a capacitor element 196, a source wiring 191, a gate wiring 192, a capacitive potential line 193, a first light-transmitting conductive layer 70, and a common potential line 197. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source / drain electrodes 36 and 38, and first openings 39a and 39b. The source / drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 through the first openings 39a and 39b. The first translucent conductive layer 70 is electrically connected to the source / drain electrode 38 via the second opening 194 and the third opening 195. A capacitor element 196 is formed by the source / drain electrode 38, the gate insulating film 33 described later, and the capacitor potential line 193. The source / drain electrodes 36 and the source wiring 191 are electrically connected. The gate electrode 34 and the gate wiring 192 are electrically connected. The common potential line 197 has a role of supplying a common potential to all the pixels 106 included in the pixel region 104. The common potential line 197 may be shared by all the pixels 106 included in the pixel region 104, may be supplied for each pixel in the X direction, or may be shared for each pixel in the Y direction. By applying a voltage to each of the first translucent conductive layer 70 and the common potential line 197, an electric field is generated in a direction parallel to the first glass substrate 20, and the liquid crystal elements included in the liquid crystal layer 90 are controlled. The liquid crystal display device can display an image.

FIG. 7 is a schematic plan view showing the linear portion 61 of the WG reflective polarizing layer 60 of the pixel 106 included in the liquid crystal display device 160 according to the embodiment of the present invention. FIG. 7 is superimposed on the upper surface of FIG. 5 and FIG. In order to make the drawing easy to see, FIG. 5 and FIG. 6 are separated from FIG. Although the line width of the linear part 61 and the space | interval of the linear part 61 are made into the magnitude | size which can be recognized with drawing in order to make it intelligible, it is not restricted to this magnitude | size.

With the above configuration, the WG reflection polarizing layer and the wavelength conversion layer can improve the light use efficiency. A liquid crystal display device using a WG reflective polarizing layer and a wavelength conversion layer can improve the light utilization efficiency, and can realize a bright and clear display with good color reproducibility.
(Third embodiment)
In this embodiment, a method for manufacturing a liquid crystal display device according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment and 2nd Embodiment.

A method for manufacturing the liquid crystal display device 310 will be described with reference to FIG. 8 or FIG. 9 and FIG. 10 to FIG. The method for manufacturing a liquid crystal display device according to the present invention will be described by taking an example of using a photolithography technique generally used in manufacturing a liquid crystal display device unless otherwise specified. As long as it is a manufacturing method of a liquid crystal display device, not only a photolithography technique but the method normally used in the technical field of this invention can be employ | adopted.

FIG. 8 is a schematic cross-sectional view showing a manufacturing method of the liquid crystal display device 310 including the wire grid reflective polarizing layer and the wavelength conversion layer when the pixel configuration of FIG. 5 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device.

FIG. 9 is a schematic cross-sectional view showing a manufacturing method of the liquid crystal display device 320 including a wire grid reflective polarizing layer and a wavelength conversion layer when the pixel configuration of FIG. 6 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device.

First, as shown in FIG. 10A, the TFT array 30 is formed on the first glass substrate 20. The TFT array 30 includes a base film 31, a semiconductor layer 32, a gate insulating film 33, a gate electrode 34, an interlayer film 35, source / drain electrodes 36 and 38, first openings 39a and 39b, a capacitance potential line 193, and a first dielectric. Including a body 37; A thin film transistor 190 and a capacitor element 196 are formed in the TFT array 30.

The first dielectric 37 has a role of relaxing unevenness when a film, a wiring, a transistor, or the like in a layer below the first dielectric 37 is formed. Therefore, the film and pattern formed after the first dielectric can be formed on a flat surface. The characteristics of the material forming the first dielectric 37 are preferably a material having high transparency in the visible light region, a material having high heat resistance, and high adhesion to the wavelength conversion layer.

The formation method of the TFT array 30, the structures of the thin film transistor 190 and the capacitor 196, the respective films, layers, and materials of each part may be known materials. That is, a method and a method usually used in the technical field of the present invention can be adopted.

Next, as shown in FIG. 10B, a wavelength conversion layer is formed. First, the light shielding layer 40 included in the wavelength conversion layer is formed. For example, a dielectric material containing black particles such as carbon black is printed on the entire surface of the substrate, a photoresist is applied, a pattern of the light shielding layer 40 is formed and developed by a photolithography technique using a photomask. By leaving the photoresist on the pattern of the light shielding layer 40, the light shielding layer 40 can be formed by performing etching using the photoresist as a mask and removing the photoresist. By forming the light-shielding layer 40 in the wavelength conversion layer, the wavelength conversion layers of the respective colors can be clearly separated, so that the color mixture of transmitted light can be suppressed.

Subsequently, a wavelength conversion layer, that is, a red conversion layer 41 and a green conversion layer 42 are formed. Note that the order of forming the red color conversion layer 41 and the green color conversion layer 42 may be appropriately selected. For example, a blue color filter layer 43 is formed, a wavelength conversion film forming composition containing a red fluorescent inorganic pigment or a fluorescent organic dye is applied, a red conversion layer 41 is formed, and a green fluorescent inorganic pigment or The green conversion layer 42 may be formed by applying a wavelength conversion composition containing a fluorescent organic dye.

As the fluorescent inorganic pigment in the wavelength conversion film forming composition containing the red fluorescent inorganic pigment and the fluorescent organic dye, and the wavelength converting composition containing the green fluorescent inorganic pigment and the fluorescent organic dye, Product phosphor, nitride phosphor, YAG phosphor and the like. Fluorescent organic dyes include anthracene, anthraquinone, arylmethine, azo, azomethine, biman, coumarin, 1,5-diazabicyclo [3.3.0] octadiene, diketopyrrole, naphthalenol imine, Naphthalimide, perylene, phenolphthalein, pyrrolemethine, pyran, pyrene, porphycene, porphyrin, quinacridone, rhodamine, rubulin, and stilbene fluorescent dyes, and these fluorescent inorganics Specific examples of the wavelength conversion composition containing a pigment and a fluorescent organic dye include JP2016-90998A, WO2016 / 063930, WO2013 / 118334, JP2016-39228, and the like. .

Moreover, the composition for wavelength conversion film formation containing a semiconductor quantum dot as a kind of fluorescent inorganic material can also be used, and the semiconductor quantum dot which consists of a compound which contains In as a constituent element as a specific example of a semiconductor quantum dot is Preferably, core-shell structure type semiconductor quantum dots InP / ZnS, InP / ZnSe, CuInS2 / ZnS and (ZnS / AgInS2) solid solution / ZnS, and homogeneous structure type semiconductor quantum dots AgInS2 and Zn-doped AgInS2 are more preferable. / ZnS is more preferable. As the composition for forming a wavelength conversion film containing semiconductor quantum dots, the compositions described in JP 2017-32918 A, JP 2017-48355 A, JP 2015-46328 A, and the like can be used.

Here, blue shows an example in which the blue color filter layer 43 is applied, but a fourth dielectric may be applied. By forming the fourth dielectric in the region where the blue color filter layer 43 is to be formed, light absorption and reflection by the blue color filter layer 43 can be suppressed, so that blue light can be transmitted efficiently. .

The material of the fourth dielectric can be, for example, a polyimide or acrylic resin. Materials other than these materials can also be adopted. The fourth dielectric preferably has high adhesion to the light shielding layer 40 and the first dielectric 37, high transparency, and resistance to heat.

Next, as shown in FIG. 10C, a color filter layer is formed. What is necessary is just to select the order of formation of a color filter layer suitably. For example, the red color filter layer 50 may be formed, the green color filter layer 51 may be formed, and the blue color filter layer 43 may be formed. The color filter layer may be formed on the entire surface by coating and then formed by photolithography using a photomask. Note that the forming method is not limited to this method.

Subsequently, as shown in FIG. 11A, a third dielectric 63 is formed. The third dielectric 63 has a role of relaxing unevenness when a film below the third dielectric or a wiring pattern is formed. It also has a role of protecting the wavelength conversion layer and the color filter layer. Further, it also serves as a base material for the linear portion 61 formed thereafter.

The third dielectric has a role of relaxing unevenness when a film below the third dielectric or a wiring pattern is formed. It also has a role of protecting the wavelength conversion layer and the color filter layer. Furthermore, it also serves as a base material for the linear portion 61 formed on the third dielectric.

The material forming the third dielectric 63 can be the same material as the fourth dielectric. For example, a polyimide resin, an acrylic resin, an epoxy resin, a urethane resin, or the like can be used.

Next, as shown in FIG. 11B, a linear portion 61 is formed. The linear portion 61 can be formed by a nanoimprint method. The nanoimprint method is a known technique and will not be described in detail. For example, there is a method of creating a pattern in which irregularities are formed on quartz glass or the like, and forming a pattern using the mold. For example, aluminum is formed into a film using a sputtering apparatus on a transparent base material such as a glass substrate. Further, a resist is applied, the above-described mold is pressed against the resist, and UV light is irradiated. The linear portion 61 can be formed by performing etching using the resist as a mask and removing the resist.

In FIG. 11 (B), the line width of the linear portion 61 is changed between a light shielding portion and a so-called WG portion. That is, the light shielding layer may be formed by WG. Visible light can be blocked by forming a light blocking layer with WG. In addition, the linear part 61 may be formed by designing a mold with a line width and an interval of a fixed period without forming a light shielding layer with WG.

Next, as shown in FIG. 12A, a second opening 194 for electrically connecting the first light-transmitting conductive layer 70 and the source / drain electrode 38 is formed. The second opening 194 opens the first dielectric 37, the red conversion layer 41, the green conversion layer 42, the blue color filter layer 43 or the fourth dielectric, the red color filter layer 50, and the green color filter layer 51.

Subsequently, as shown in FIG. 12B, a second dielectric 62 is applied. The second dielectric has a role of relaxing the unevenness of the linear portion 61. Further, it covers the side wall of the second opening 194 and protects the red color conversion layer 41, the green color conversion layer 42, the blue color filter layer 43 or the fourth dielectric, the red color filter layer 50, and the green color filter layer 51. Have. By relaxing unevenness of a layer forming the display device and flattening a film surface, light incident on the display device, reflected light, and absorbed light can be stabilized.

Next, as shown in FIG. 13A, a third opening 195 reaching the source / drain electrode is formed in the second dielectric 62. The third opening 195 is formed to electrically connect the first light-transmissive conductive layer 70 and the source / drain electrode 38.

Subsequently, as shown in FIG. 13B, a first light-transmissive conductive layer 70 is formed. The first light-transmissive conductive layer 70 is connected to the source / drain electrodes 38 of the pixel, and has a role of driving a liquid crystal element included in the liquid crystal layer 90 to which a voltage corresponding to a video signal is applied. As a material for forming the first light-transmissive conductive layer 70, for example, a material that transmits light, such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), or the like can be used. A first alignment film 80 is formed on the first translucent conductive layer 70. The first alignment film 80 has a role of insulating the first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110 formed on the side facing the liquid crystal layer 90 so as not to conduct. As a material for forming the first alignment film 80, for example, a polyimide resin or the like is used. Although FIG. 13 shows an example in which the first alignment film 80 is formed on the first light-transmissive conductive layer 70, light shielding is performed between the first light-transmissive conductive layer 70 and the first alignment film 80. There may be a layer in which a film is formed or an inorganic compound layer. The light-shielding film layer has a role of blocking visible light, and the inorganic compound layer has a role of insulating from the conductive layer on the opposite surface.

Finally, the substrate on the opposite side will be described with reference to FIG. The counter substrate includes a second glass substrate 120, a second light transmissive conductive layer 110, and a second alignment film 100. After the second light-transmissive conductive layer 110 is formed on the second glass substrate 120, the second alignment film 100 is applied. The second light transmissive conductive layer 110 applies a voltage vertically to the liquid crystal element included in the liquid crystal layer 90 disposed between the second light transmissive conductive layer 110 and the first light transmissive conductive layer 70. It has a role to control the liquid crystal element. As a material for forming the second light-transmissive conductive layer 110, a material that transmits light, such as ITO or IZO, can be used. The second alignment film 100 has a role of insulating the second light-transmissive conductive layer 110 and the first light-transmissive conductive layer 70 formed on the side facing the liquid crystal layer 90 so as not to conduct. As a material for forming the second alignment film 100, for example, a polyimide resin or the like is used. FIG. 8 shows an example in which the second alignment film 100 is formed under the second light-transmissive conductive layer 110, but light shielding is performed between the second light-transmissive conductive layer 110 and the second alignment film 100. There may be a layer in which a film is formed or an inorganic compound layer. The light-shielding film layer has a role of blocking visible light, and the inorganic compound layer has a role of insulating from the conductive layer on the opposite surface. For example, the counter substrate thus formed and the portion formed up to FIG. 13B are attached to each other with a liquid crystal layer 90 interposed therebetween using a sealant or the like. Furthermore, the liquid crystal display device 310 or 320 can be manufactured by attaching the polarizing plate 130 to the second glass substrate 120.

In the liquid crystal display device 320 shown in FIG. 9, the common potential line 197 is formed in the same layer as the first translucent conductive layer 70 in the step of forming the first translucent conductive layer 70. Further, the second light transmissive conductive layer 110 may not be formed.

The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured using the manufacturing method as described above can improve the light use efficiency, has good color reproducibility, and is bright and clear. Can be realized. Furthermore, since no special manufacturing apparatus is required and existing manufacturing equipment can be used, manufacturing costs can be reduced.

(Fourth embodiment)
In this embodiment, another structure and a manufacturing method of a liquid crystal display device according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment thru | or 3rd Embodiment. Further, the manufacturing method of the liquid crystal display device of the present invention will be described by using photolithography technology as an example unless otherwise specified, as in the second and third embodiments. Needless to say, any method usually used in the technical field can be adopted.

FIG. 14 is a schematic cross-sectional view showing a configuration of the liquid crystal display device 410 or the liquid crystal display device 420 including the WG reflective polarizing layer 60 and the wavelength conversion layer according to an embodiment of the present invention, and the optical system 400. The optical system 400 includes the same configuration as that in FIG. 4, and the order in which the liquid crystal display device 410 or 420 is stacked differs from that in FIG. 8 or 9.

The order of stacking is on the first glass substrate 20, the TFT array 30, the first translucent conductive layer 70, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, and the second translucent conductive. A wavelength conversion layer comprising a layer 110, a second glass substrate 120, a WG reflection polarizing layer 60, a light shielding layer 40, a red conversion layer 41, a green conversion layer 42, a blue color filter layer 43 or a fourth dielectric, and a red color filter layer 50, a green color filter layer 51, a blue color filter layer 43, or a color filter layer made of a fourth dielectric, and the second glass substrate 120. A polarizing plate 130 is provided under the first glass substrate 20.

FIG. 15 is a schematic cross-sectional view showing a manufacturing method of the liquid crystal display device 410 including the WG reflective polarizing layer 60 and the wavelength conversion layer when the pixel configuration of FIG. 5 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device. Note that the third opening 195 illustrated in FIG. 5 may not be formed.

FIG. 16 is a schematic cross-sectional view showing a manufacturing method of the liquid crystal display device 420 including the WG reflective polarizing layer 60 and the wavelength conversion layer when the pixel configuration of FIG. 6 is applied. It is typical sectional drawing which expanded 3 pixels contained in a liquid crystal display device. Note that the third opening 195 illustrated in FIG. 6 may not be formed.

A method for manufacturing the liquid crystal display devices 410 and 420 will be described with reference to FIGS. 15 and 16. The process of forming the TFT array 30 on the first glass substrate 20 is the same as that in FIG.

After the first dielectric 37 of the TFT array 30 is formed, the second opening 194 is formed, and the first light-transmissive conductive layer 70 is formed. In the manufacture of the liquid crystal display device 420 shown in FIG. 16, the common potential line 197 is formed in the same layer as the first translucent conductive layer 70. A first alignment film 80 is formed on the first translucent conductive layer 70. There may be a layer in which a light shielding film is formed or an inorganic compound layer between the first translucent conductive layer 70 and the first alignment film 80. The light-shielding film layer has a role of blocking visible light, and the inorganic compound layer has a role of insulating from the conductive layer on the opposite surface. Here, the substrate formed up to the first alignment film 80 on the first glass substrate is referred to as a TFT side substrate.

Subsequently, formation of the substrate on the side facing the TFT side substrate with the liquid crystal layer 90 interposed therebetween will be described. Here, the substrate on the side facing the TFT side substrate is referred to as a counter side substrate.

On the second glass substrate 120, a color filter layer composed of the red color filter layer 50, the green color filter layer 51, the blue color filter layer 43, or the fourth dielectric is formed. Further, a wavelength conversion layer including the light shielding layer 40, the red conversion layer 41, the green conversion layer 42, the blue color filter layer 43, or the fourth dielectric is formed. Subsequently, the WG reflection polarizing layer 60 including the third dielectric 63, the linear portion 61, and the second dielectric is formed. Subsequently, after forming the second light-transmissive conductive layer 110, the second alignment film 100 is applied. There may be a layer in which a light shielding film is formed or an inorganic compound layer between the second translucent conductive layer 110 and the second alignment film 100. The light-shielding film layer has a role of blocking visible light, and the inorganic compound layer has a role of insulating from the conductive layer on the opposite surface. For example, the counter substrate thus formed and the TFT substrate are bonded together with a liquid crystal layer 90 interposed therebetween using a sealant or the like. Furthermore, the liquid crystal display device 410 or 420 can be manufactured by bonding the polarizing plate 130 to the first glass substrate 20.

The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured using the manufacturing method as described above can improve the light use efficiency, has good color reproducibility, and is bright and clear. Can be realized. Further, since it is not necessary to form the third opening 195, the manufacturing cost can be further reduced.

(Fifth embodiment)
In this embodiment, another structure and a manufacturing method of a liquid crystal display device according to an embodiment of the present invention will be described. In addition, description may be abbreviate | omitted regarding the structure similar to 1st Embodiment thru | or 4th Embodiment. Further, the manufacturing method of the liquid crystal display device of the present invention will be described by taking photolithography technique as an example unless otherwise specified, as in the second and fourth embodiments. However, it goes without saying that it can be produced by using a method usually used in the technical field of the present invention.

FIG. 17 is a schematic cross-sectional view showing the configuration of the liquid crystal display device 510 or the liquid crystal display device 520 and the optical system 500 including the WG reflective polarizing layer 60 and the wavelength conversion layer according to an embodiment of the present invention. The optical system 500 includes the same configuration as that in FIG. 4 or FIG. 14, and the stacking order of the liquid crystal display device 510 or 520 is different from that in FIG. 15 or FIG.

The order of lamination is as follows: protective film 140, light shielding layer 40, red conversion layer 41, green conversion layer 42, blue color filter layer 43, or wavelength conversion layer comprising a fourth dielectric, red color filter layer 50, and green color filter. Color filter layer composed of the layer 51 and the blue color filter layer 43 or the fourth dielectric, the WG reflective polarizing layer 60, the first glass substrate 20, the TFT array 30, the first light-transmissive conductive layer 70, the first alignment film 80 , Liquid crystal layer 90, second alignment film 100, second light-transmissive conductive layer 110, and second glass substrate 120. A polarizing plate 130 is provided on the second glass substrate 120.

A substrate in which up to the first alignment film 80 is formed on the first glass substrate 20 is referred to as a TFT side substrate here. The manufacturing process of the TFT side substrate is the same as that of the fourth embodiment, and will be omitted. The substrate on which the second alignment film 100, the second translucent conductive layer 110, and the second glass substrate 120 are formed is referred to as a counter-side substrate here. The manufacturing process of the counter substrate is the same as that in the third embodiment, and is omitted.

Here, the protective film 140, the light shielding layer 40, the red color conversion layer 41, the green color conversion layer 42, the blue color filter layer 43, or the wavelength conversion layer made of the fourth dielectric, the red color filter layer 50, the green color filter layer 51, A method of forming the color filter layer made of the blue color filter layer 43 or the fourth dielectric and the WG reflective polarizing layer 60 will be described. The portion formed here is called a WG substrate.

First, although not shown, a protective film 140 is applied or formed on the third glass substrate 121. For example, when the material of the protective film 140 uses a resin such as polyimide or acrylic, it is applied, and when the material of the protective film 140 uses an inorganic compound such as silicon oxide, silicon nitride oxide, silicon oxynitride, or silicon nitride. Form a film. Or it is good also as a laminated film of resin and an inorganic compound. The protective film 140 has a role in which layers, films, and patterns formed above the protective film 140 suppress damage and deterioration due to an impact from the outside of the display device. In the case of the laminated film, moisture or the like can further enter the liquid crystal display device and prevent the display device from being deteriorated. As a method for applying, a spin coating method, a dipping method, or the like can be used. The film formation may be performed chemically using a CVD apparatus or the like, or physically performed using a sputtering method or the like.

Next, a wavelength conversion layer comprising the light shielding layer 40, the red conversion layer 41, the green conversion layer 42, the blue color filter layer 43, or the fourth dielectric is formed. Further, a color filter layer including the red color filter layer 50, the green color filter layer 51, the blue color filter layer 43, or the fourth dielectric is formed. Subsequently, the WG reflection polarizing layer 60 including the third dielectric 63, the linear portion 61, and the second dielectric is formed. A method for manufacturing the wavelength conversion layer, the color filter layer, and the WG reflective polarizing layer 60 is omitted here because the methods described in the second to fourth embodiments can be used. In this way, a WG substrate can be manufactured.

Finally, the process of bonding the TFT side substrate, the opposite side substrate, and the WG substrate will be described. For example, the TFT side substrate and the opposite side substrate are attached to each other with a liquid crystal layer 90 interposed therebetween using a sealant or the like. Further, the surface of the WG reflective polarizing layer 60 of the WG substrate is bonded to the surface opposite to the surface on which the counter substrate of the first glass substrate 20 on the TFT substrate side is bonded. Furthermore, the liquid crystal display device 510 or 520 can be manufactured by attaching the polarizing plate 130 to the second glass substrate 120.

The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured using the manufacturing method as described above can improve the light use efficiency, has good color reproducibility, and is bright and clear. Can be realized. Further, since it is not necessary to form the third opening 195 and a general liquid crystal display in which the TFT substrate and the counter substrate are bonded can be used as they are, the manufacturing cost can be further reduced.

The embodiments of the present invention described above can be combined as appropriate within a range that does not contradict each other. In addition, those in which a person skilled in the art has added, deleted, or changed a design based on each embodiment, or those in which a process has been added, omitted, or changed in conditions also include the gist of the present invention. As long as it falls within the scope of the present invention.

In addition, even if the operational effects are different from the operational effects provided by the aspects of the embodiments of the present invention described above, those that are apparent from the description of the present specification or that can be easily predicted by those skilled in the art. , To be construed as provided by the present invention.

DESCRIPTION OF SYMBOLS 10 ... Light guide plate, 11 ... Diffusing plate, 12 ... Light source, 13 ... Reflecting plate, 20 ... 1st glass substrate, 30 ... TFT array, 31 ... Base film, 32 ... Semiconductor layer, 33 ... Gate insulating film, 34 ... Gate Electrode 35 ... Interlayer film 36, 38 ... Source / drain electrode 37 ... First dielectric 39a, 39b ... First opening 40 ... Light shielding layer 41 ... Red conversion layer 42 ... Green conversion layer 43 ... Blue color filter layer, 50 ... red color filter layer, 51 ... green color filter layer, 60 ... WG reflective polarizing layer, 61 ... linear portion, 62 ... second dielectric, 63 ... third dielectric, 64 ... blue incident Light, 65 ... reflected light, 66 ... reflection of blue p-polarized light, 67 ... red transmitted light (P wave), 68 ... green transmitted light (P wave), 69 ... blue transmitted light (P wave), 70 ... first transmitted light Photoconductive layer, 80 ... first alignment film, 90 ... liquid crystal layer, 100 ... second Directional film, 104 ... Pixel region, 106 ... Pixel, 108, 109 ... Gate side driving circuit, 110 ... Second light transmitting conductive layer, 112 ... Source side driving circuit, 114 ... Connector, 116 ... Integrated circuit (IC), DESCRIPTION OF SYMBOLS 120 ... 2nd glass substrate, 121 ... 3rd glass substrate, 130 ... Polarizing plate, 140 ... Protective film, 150, 151 ... Opposite substrate, 160, 310, 320, 410, 420, 510, 520 ... Liquid crystal display device, 190 Thin film transistor, 191 ... Source wiring, 192 ... Gate wiring, 193 ... Capacitance potential line, 194 ... Second opening, 195 ... Third opening, 196 ... Capacitance element, 197 ... Common potential line, 200 ... Wire grid reflection polarization Layer and optical system, 210 ... wire grid reflective polarizing layer and wavelength conversion layer and optical system, 300, 400, 500 ... liquid crystal display device and optical system

Claims (21)

1. A reflective polarizing layer having a width equal to or shorter than the shortest wavelength of incident transmitted light and having a linear portion,
   A plurality of the linear portions are arranged in parallel with a direction in which the linear portions extend,
   A first dielectric is provided between the linear portions,
   The upper surface of the linear portion is in contact with the second dielectric,
   The reflective polarizing layer, wherein a lower surface of the linear portion is in contact with a third dielectric.
2. The reflectance of the p-polarized light of the blue wavelength is relatively higher than the reflectance of the red wavelength and the reflectance of the green wavelength,
   The transmittance of the p-polarized light of the blue wavelength is relatively lower than the transmittance of the red wavelength and the transmittance of the green wavelength.
   The reflective polarizing layer according to claim 1.
3. A wavelength converting material that absorbs light of the blue wavelength and emits light of the red wavelength;
   A wavelength conversion layer that absorbs light of the blue wavelength and emits light of the green wavelength, and a wavelength conversion layer comprising:
   The reflective polarizing layer according to claim 1, wherein the reflective polarizing layer is in contact with the reflective polarizing layer.
4. Included in the wavelength conversion layer,
   A wavelength converting material that emits light of the red wavelength;
   A wavelength converting material that emits light of the green wavelength;
   The reflective polarizing layer according to claim 3, wherein the two are provided on the same plane.
5. The wavelength conversion layer includes the third dielectric or the second dielectric,
   The reflective polarizing layer according to claim 3, wherein the reflective polarizing layer is in contact with the reflective polarizing layer.
6. Included in the wavelength conversion layer,
   A wavelength converting material that emits light of the red wavelength;
   The reflective polarizing layer according to any one of claims 3 to 5, wherein the wavelength conversion material that emits light having a green wavelength is partitioned by a light shielding layer.
7. The wavelength conversion material that emits light of the red wavelength is in contact with the red color filter,
   The wavelength conversion material that emits light of the green wavelength is a green color filter,
   The reflective polarizing layer according to claim 3, wherein the reflective polarizing layer is in contact with the reflective polarizing layer.
8. A first substrate, a TFT array, a wavelength conversion layer, a reflective polarizing layer, a translucent conductive film, a first alignment film, a liquid crystal layer, a second alignment film, a second substrate, and a polarizing plate; ,
   Including
   The TFT array, the wavelength conversion layer, the reflective polarizing layer, the translucent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are:
   A display device, wherein the display device is disposed between the first substrate and the second substrate.
9. The reflective polarizing layer is
   And having a width equal to or shorter than the shortest wavelength of incident transmitted light, and includes a linear portion, a first dielectric, a second dielectric, and a third dielectric,
   A plurality of the linear portions are arranged in parallel with a direction in which the linear portions extend,
   The first dielectric is provided between the linear portions,
   The upper surface of the linear portion is in contact with the second dielectric,
   The display device according to claim 8, wherein a lower surface of the linear portion is in contact with the third dielectric.
10. The wavelength conversion layer is
    A wavelength converting material that absorbs blue wavelength light and emits red wavelength light;
    A wavelength converting material that absorbs light of a blue wavelength and emits light of a green wavelength, and
    The display device according to claim 9, wherein the wavelength conversion material that emits light of the red wavelength and the wavelength conversion material that emits light of the green wavelength are provided on the same plane.
11. A color filter layer is included between the reflective polarizing layer and the wavelength conversion layer,
    The color filter layer includes a red color filter and a green color filter,
    The red color filter is in contact with a wavelength conversion material that emits light of the red wavelength,
    The display device according to claim 9 or 10, wherein the green color filter is in contact with a wavelength conversion material that emits light of the green wavelength.
12. The wavelength conversion layer has an opening,
    The display device according to claim 9, wherein the translucent conductive film is in contact with the third dielectric and disposed in the opening.
13. The display device according to claim 8, wherein the light-transmitting conductive film has a comb shape or a plate shape.
14. A protective film, a wavelength conversion layer, a reflective polarizing layer, a first substrate, a TFT array, a translucent conductive film, a first alignment film, a liquid crystal layer, a second alignment film, and a second substrate; , Polarizing plate,
    Including
    The TFT array, the translucent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are:
    Disposed between the first substrate and the second substrate;
    The display device, wherein the wavelength conversion layer and the reflective polarizing layer are disposed between the protective film and the first substrate.
15. The reflective polarizing layer is
    And having a width equal to or shorter than the shortest wavelength of incident transmitted light, and includes a linear portion, a first dielectric, a second dielectric, and a third dielectric,
    A plurality of the linear portions are arranged in parallel with a direction in which the linear portions extend,
    The first dielectric is provided between the linear portions,
    The upper surface of the linear portion is in contact with the second dielectric,
    The display device according to claim 14, wherein a lower surface of the linear portion is in contact with the third dielectric.
16. The wavelength conversion layer is
    A wavelength converting material that absorbs blue wavelength light and emits red wavelength light;
    A wavelength converting material that absorbs light of a blue wavelength and emits light of a green wavelength, and
    The display device according to claim 14, wherein the wavelength conversion material that emits light of the red wavelength and the wavelength conversion material that emits light of the green wavelength are provided on the same plane. .
17. A color filter layer is included between the reflective polarizing layer and the wavelength conversion layer,
    The color filter layer includes a red color filter and a green color filter,
    The red color filter is in contact with a wavelength conversion material that emits light of the red wavelength,
    The display device according to claim 14, wherein the green color filter is in contact with a wavelength conversion material that emits light of the green wavelength.
18. The display device according to claim 14, wherein the light-transmitting conductive film has a comb shape or a plate shape.
19. The display device according to claim 14, wherein the wavelength conversion layer is in contact with the protective film.
20. The display device according to claim 14, wherein the reflective polarizing layer is in contact with the first substrate.
21. A wavelength converting material that absorbs blue wavelength light and emits red wavelength light;
    A wavelength converting material that absorbs light of a blue wavelength and emits light of a green wavelength, and
    The wavelength conversion material that emits light of the red wavelength and the wavelength conversion material that emits light of the green wavelength constitute a wavelength conversion layer provided on the same plane.

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