TW201837558A - Reflective polarizing layer, wavelength conversion layer, and liquid crystal display device - Google Patents

Abstract

A reflective polarizing layer according to an embodiment of the present invention has a width less than the shortest wavelength of the incident light that passes therethrough and a plurality of stripes. The stripes are separated from each other and arrayed in a direction parallel to the extending direction of the stripes. A first dielectric is filled between the stripes with the upper surface and the lower surface of the stripes in contact with a second dielectric and a third dielectric respectively.

Description

Reflective polarizing layer, wavelength conversion layer and liquid crystal display device

The present invention relates to a reflective polarizing layer, a wavelength converting layer, and a liquid crystal display device.

In recent years, liquid crystal display devices have been highly demanded for improving color reproducibility and high definition. In the high-definition liquid crystal display device, since the size of the pixel is small, it is a problem to improve the light use efficiency. As one of methods for improving color reproducibility and light utilization efficiency, a method of using a polarizing plate and a fluorescent material has been proposed. For example, Patent Document 1 discloses a method of converting blue light emitted from a white conversion layer into red or green by a wavelength conversion layer using quantum dots by a white light source, a color filter, and a wavelength conversion layer using quantum dots. The converted red light, green light, and unconverted blue light are transmitted through the color filters of the respective colors, thereby improving color reproducibility and light utilization efficiency. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 2016-70949

[Problems to be Solved by the Invention] The industry is demanding to further improve color reproducibility and light utilization efficiency. In view of such a problem, it is an object of an embodiment of the present invention to provide a reflective polarizing layer and a wavelength conversion layer which can improve color reproducibility and light use efficiency. Another object of the invention is to provide a liquid crystal display device including a reflective polarizing layer and a wavelength conversion layer capable of improving color reproducibility and light utilization efficiency. [Means for Solving the Problem] A reflective polarizing layer according to an embodiment of the present invention has a reflective polarizing layer having a linear portion and a width of a shortest wavelength or less of incident transmitted light; and the linear portion extends in a line portion The plurality of directions are arranged in parallel in parallel, and the first dielectric body is filled between the linear portions, and the upper surface of the linear portion is in contact with the second dielectric body, and the lower surface of the linear portion is in phase with the third dielectric body. Pick up. In the reflective polarizing layer according to an embodiment of the present invention, the reflectance of the p-polarized light of the blue wavelength is relatively higher than the reflectance of the red wavelength and the reflectance of the green wavelength, and the transmittance of the p-polarized light of the blue wavelength is relatively lower. Transmittance of red wavelength and transmittance of green wavelength. The reflective polarizing layer according to an embodiment of the present invention may be connected to the wavelength conversion layer, and the wavelength conversion layer includes a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and light that absorbs blue wavelength. And a wavelength conversion material that emits light of a green wavelength. In the reflective polarizing layer that is in contact with the wavelength conversion layer in one embodiment of the present invention, the wavelength conversion material that emits light of a red wavelength included in the wavelength conversion layer may be formed in the same wavelength as the wavelength conversion material that emits light of a green wavelength. on flat surface. In the reflective polarizing layer that is in contact with the wavelength conversion layer according to an embodiment of the present invention, the wavelength conversion layer may be in contact with the third dielectric or the second dielectric. The reflective polarizing layer that is in contact with the wavelength conversion layer in one embodiment of the present invention may be such that the wavelength conversion material that emits light of a red wavelength and the wavelength conversion material that emits light of a green wavelength included in the wavelength conversion layer is provided by a light shielding layer. Separated. The reflective polarizing layer connected to the wavelength conversion layer in one embodiment of the present invention may be a wavelength conversion material that emits red wavelength light and a red color filter, and emits a wavelength conversion material of green wavelength light. The green color filters are connected. A display device according to an embodiment of the present invention includes a first substrate, a TFT (Thin Film Transistor) array, a wavelength conversion layer, a reflective polarizing layer, a translucent conductive film, a first alignment film, a liquid crystal layer, and a second The alignment film, the second substrate, and the polarizing plate, and the TFT array, the wavelength conversion layer, the reflective polarizing layer, the translucent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are disposed between the first substrate and the second substrate . The reflective polarizing layer included in the display device according to the embodiment of the present invention may have a width equal to or shorter than the shortest wavelength of the incident transmitted light and include a conductive linear portion, a first dielectric body, and a second The dielectric body and the third dielectric body have a plurality of linear portions arranged in parallel with the direction in which the linear portions extend, and the first dielectric bodies are filled between the linear portions, and the linear portions are filled. The surface is in contact with the second dielectric body, and a lower surface of the linear portion is in contact with the third dielectric body. The wavelength conversion layer included in the display device according to the embodiment of the present invention may include a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and absorbs light of a blue wavelength and emits a green wavelength. The wavelength conversion material of light forms a wavelength conversion material that emits light of a red wavelength on the same plane as the wavelength conversion material that emits light of a green wavelength. The color conversion layer may include a red color filter and a green color filter between the reflective conversion layer and the wavelength conversion layer included in the display device according to the embodiment of the present invention. The light sheet, the red color filter is connected to the wavelength conversion material that emits light of a red wavelength, and the green color filter is connected to the wavelength conversion material that emits light of a green wavelength. In the display device according to the embodiment of the present invention, the wavelength conversion layer may have an opening, and the translucent conductive film may be in contact with the third dielectric member and disposed in the opening. Another display device according to an embodiment of the present invention includes a protective film, a wavelength conversion layer, a reflective polarizing layer, a first substrate, a TFT array, a light-transmitting conductive film, a first alignment film, a liquid crystal layer, a second alignment film, and a first The substrate and the polarizing plate, the TFT array, the transparent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are disposed between the first substrate and the second substrate, and the wavelength conversion layer and the reflective polarizing layer are disposed on the protective film. Between the first substrate and the first substrate. The reflective polarizing layer included in another display device according to an embodiment of the present invention may have a width equal to or shorter than a shortest wavelength of incident transmitted light, and may include a conductive linear portion and a first dielectric. The second dielectric body and the third dielectric body have a plurality of linear portions arranged in parallel with the direction in which the linear portions extend, and the first dielectric bodies are filled between the linear portions, and the linear portions are filled. The surface is in contact with the second dielectric body, and the lower surface of the linear portion is in contact with the third dielectric body. The wavelength conversion layer included in another display device according to an embodiment of the present invention may include a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and absorbs blue wavelength light and emits green light. The wavelength conversion material of the wavelength light, the wavelength conversion material that emits light of a red wavelength is formed on the same plane as the wavelength conversion material that emits light of a green wavelength. In another display device according to an embodiment of the present invention, a color filter layer may be included between the reflective conversion layer and the wavelength conversion layer, and the color filter layer includes a red color filter and a green color. The color filter, the red color filter is connected to the wavelength conversion material that emits light of a red wavelength, and the green color filter is connected to the wavelength conversion material that emits light of a green wavelength. The light-transmitting conductive film included in the display device according to the embodiment of the present invention may be in the form of a comb or a plate. The wavelength conversion layer included in the display device according to the embodiment of the present invention may be in contact with the protective film. The reflective polarizing layer included in the display device according to the embodiment of the present invention may be in contact with the first substrate.

Hereinafter, embodiments of the present invention will be described with reference to the drawings and the like. However, the invention can be embodied in many different forms without departing from the spirit and scope of the invention. That is, it is not limited to the disclosure of the embodiments exemplified below. Further, the drawings are intended to clarify the description, and the width, thickness, shape, and the like of each portion may be schematically indicated in comparison with the actual embodiment. However, the mode is only an example and does not limit the explanation of the present invention. In the present specification and the drawings, the same components as those already described in the prior art are denoted by the same reference numerals (or the numerals are denoted by a, b, etc.), and the description will be omitted as appropriate. In addition, the characters "1st" and "2nd" which are attached to each component are used to distinguish each component, and are not more meaningful unless otherwise specified. In the present specification, the term "upper" includes not only a case where it is directly connected to an object or a region, but also a case where another object or region is interposed. The term "below" is also the same. Also, the terms "upper" and "lower" mean that the relative relationship between objects or regions does not mean absolute superiority. Specifically, the main surface of the substrate (the surface on which the element or the like is formed) is defined as "upper" from the main surface side of the substrate, and the opposite side of the main surface of the substrate is defined as "lower". In the case where a plurality of patterns are formed by processing a certain film, there are cases where the plurality of patterns each have different functions and/or functions. However, the plurality of patterns are derived from the film formed as the same layer in the same step. That is, the plurality of patterns have the same layer configuration and contain the same material. Therefore, in the present specification, it is defined that the plurality of patterns exist in the same layer. The reflective polarizing layer and the wavelength conversion layer of the present invention will be described. The description will be as follows: The reflective polarizing layer includes a wire grid (hereinafter referred to as WG (Wire Grid)) and a resin, so that the blue p-polarized light is transmitted, reflected, or absorbed. The wavelength conversion layer includes a wavelength conversion material that absorbs light of blue (the shortest wavelength used) and emits red (the longest wavelength used), and absorbs blue (the shortest wavelength used) light and emits green The wavelength conversion material of light. The reflected blue light can be efficiently converted by using a reflective polarizing layer containing WG and resin, and a wavelength converting layer including a wavelength converting material that converts blue light into red light and a wavelength converting material that converts blue light into green light. It is red and green, and can improve utilization efficiency. (First Embodiment) In the present embodiment, a configuration and a manufacturing method of a reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention will be described. <Structure> Fig. 1 is a schematic cross-sectional view showing the configuration of the WG reflective polarizing layer 60 in the first embodiment. The optical system 200 shown in FIG. 1 represents a WG reflective polarizing layer 60, a light guide plate 10, a light diffusing plate 11, a light source 12, and a reflecting plate 13. The WG reflective polarizing layer 60 includes WG 61, a second dielectric body 62, and a third dielectric body 63. The light source 12 can use, for example, a light source that emits blue light. Specifically, a Light Emitting Diode (LED) can be used. The light guide plate 10 has a function of guiding light from the light source 12 upward. The diffusion plate 11 has a function of diffusing light from the light guide plate. The reflecting plate 13 has a function of reflecting light from a light source or reflected light 65 from the WG reflective polarizing layer 60. FIG. 1 shows an example of a backlight device called a so-called edge illumination method using a light guide plate and a light source, but is not limited to this example. For example, a backlight device called a so-called direct light method using a diffusion plate and a light source can also be used. Fig. 2 is a schematic cross-sectional view showing the configuration of the WG reflective polarizing layer 60 and the wavelength conversion layer in the first embodiment. The optical system 210 shown in FIG. 2 includes a light shielding layer 40, a red conversion layer 41, a green conversion layer 42, a blue color filter, or a fourth dielectric body 43 in addition to the configuration of FIG. In FIG. 2, the light source 12 may use, for example, a light source that emits white light, or a light source that emits blue light. Specifically, a Light Emitting Diode (LED) or a Light Emitting Diode (LED) can be used. Further, in FIG. 2, an example of a backlight device called a so-called edge illumination method using a light guide plate and a light source is used, but the present invention is not limited to this example. For example, a backlight device called a so-called direct light method using a diffusion plate and a light source can also be used. The light shielding layer 40 has a function of blocking visible light, and separates the adjacent red conversion layer 41, green conversion layer 42 and blue color filter or fourth dielectric body 43 to suppress transmission of each wavelength conversion layer and blue color Light such as a color filter is mixed with light reflected by each of the wavelength conversion layer and the blue color filter. The red conversion layer 41 has a function of converting blue incident light 64 into red. The green conversion layer 42 has the effect of converting the blue incident light 64 into green. The incident light 64 passes through each of the conversion layers and the WG reflective polarizing layer 60, and transmits red transmitted light (P wave) 67, green transmitted light (P wave) 68, and blue transmitted light (P wave) 69. The S wave (including blue, green, and red) reflected by the WG reflective polarizing layer is reflected by the reflecting plate 13, enters (returns) to 41, 42, and 43, and repeats the above operation to circulate (enhance the utilization efficiency of light). ). For example, the blue incident light 64 is wavelength converted to red by the red conversion layer 41, and incident on the WG 60 together with the blue which is not completely absorbed by 41. In the WG 60, the P wave is emitted as the transmitted light 67, and the S wave is reflected and returned to the light source side. Preferably, the transmittance and reflectance at WG 60 may be wavelength dependent, and blue may be lower in transmittance and higher in reflectance than green and red. The blue reflected from the WG 60 is converted to red by the red conversion layer 41. The light reflected by the WG 60 and passing through the red conversion layer 41 is returned to the wavelength conversion layer and the reflective polarizing layer 60 via the diffusion plate 11 , the light guide plate 10 , the reflection plate 13 , the light guide plate 10 , and the diffusion plate 11 , and the above operation is repeated. Cycle (increasing the efficiency of light utilization). For example, the blue incident light 64 is wavelength converted to green by the green conversion layer 42 and incident on the WG 60 together with the blue that is not completely absorbed by 42. In WG60, the P wave is emitted as transmitted light 68, and the S wave is reflected and returned to the light source side. Preferably, the transmittance and reflectance at WG 60 may be wavelength dependent, and blue may be lower in transmittance and higher in reflectance than green and red. The blue reflected from WG 60 is converted to green by the green conversion layer 42. The light reflected by the WG 60 and passing through the green conversion layer 42 is returned to the wavelength conversion layer and the reflective polarization layer 60 via the diffusion plate 11 , the light guide plate 10 , the reflection plate 13 , the light guide plate 10 , and the diffusion plate 11 , and the above operation is repeated. Cycle (increasing the efficiency of light utilization). For example, the blue incident light 64 is incident on the WG 60 via the blue color filter 43. In the WG 60, the P wave is emitted as the transmitted light 69, and the S wave is reflected and returned to the light source side. Preferably, the transmittance and reflectance at WG 60 may be wavelength dependent, and blue may be lower in transmittance and higher in reflectance than green and red. The blue reflected by the WG 60 is returned to the wavelength conversion layer and the reflective polarizing layer 60 via the blue color filter 43, the diffusion plate 11, the light guide plate 10, the reflection plate 13, the light guide plate 10, and the diffusion plate 11, by repeating the above Looping by action (increasing the efficiency of light utilization). By using the reflective polarizing layer and the wavelength conversion layer of the present invention, the light use efficiency can be improved. Here, although an example in which a color filter is used is shown here, it is not limited to this example, and a color filter may not be used. When the color filter is not used, since the portion where the color filter absorbs light is not present, the light utilization efficiency is further improved. Further, for example, when a wavelength conversion layer containing a phosphor such as a quantum dot is used, since the absorption efficiency of light on the wavelength conversion layer is improved, a color filter having a low light absorption rate can be used. WG61 is a thin line having a line width of the shortest wavelength or less of the transmitted light used. The WG 61 is arranged in plurality in parallel with the direction in which it extends, and is formed on the transparent substrate using a conductive material. Preferably, the arrangement interval of the WG 61 is periodic. Furthermore, the arrangement interval of the WG 61 may also be aperiodic. For example, when the light shielding layer is formed on the same plane as the plurality of WGs 61, the line width of the thin line and the light shielding layer may be different, so that it is non-periodic. As is well known, the performance of WG is represented by the relationship between the WG spacing, the wavelength of incident light, the angle of incident light (incident angle), and the refractive index of the substrate. When the arrangement interval of the WG 61 is equal to or less than the shortest wavelength of the transmitted light to be used, the WG reflective polarizing layer 60 can transmit the p-polarized light and reflect the s polarized light. Specifically, when the range of transmitted light used is 400 nm to 700 nm of visible light, since the shortest wavelength of the transmitted light used is 400 nm, for example, the interval is 360 nm or less and the line width is Below 180 nm. Further, it is preferable that the line width is 1/2 or less of the interval. When the line width is about 1/2 or less of the interval, the WG reflective polarizing layer 60 substantially reflects the component of the electric field vibrating in parallel with the WG 61 with respect to the incident light, and substantially transmits the component of the electric field of the vertical vibration. Therefore, it is possible to provide a WG reflective polarizing layer that selectively extracts light of a specific wavelength by adjusting the line width and interval of the WG 61 included in the WG reflective polarizing layer. Further, it is possible to provide a WG reflective polarizing layer that extracts either one of s-polarized light and p-polarized light. Further, the p-polarized light is a component of the light whose electric field vibrates vertically in the incident surface, and the s-polarized light is a component of the light whose electric field vibrates in parallel with the incident surface. Moreover, the performance of the WG is also related to the film thickness of the WG. For example, the film thickness of WG may be set so that the light transmittance is 1% or less. For example, it is preferred that the film thickness of WG is 30 nm or more. Specifically, when the range of transmitted light used in WG61 is 400 nm to 700 nm of visible light, since the shortest wavelength of the transmitted light used is 400 nm, for example, the interval between the WGs is 360 nm. The film thickness of WG is also 360 nm. If the film thickness of the WG is too thin, the transmitted light cannot be ignored, and the light of a specific wavelength cannot be selectively extracted. On the other hand, when the film thickness of WG is too thick, the light use efficiency may be lowered, and the transmitted light may not be neglected. Therefore, it is preferable that the film thickness is not less than 1/2 of the interval as in the line width. Moreover, the performance of the WG is also related to the refractive index between the gates of the WG. By a transparent dielectric such as a resin filled between the gates, it is possible to impart wavelength dependence of transmittance and reflectance (for example, a characteristic in which blue has a low transmittance with respect to green and red and a high reflectance). Preferably, the transparent dielectric material is a transparent resin, and the upper surface of the linear portions and the upper surface of the linear portion are filled with a transparent resin. The first dielectric body and the second dielectric body may be formed of the same transparent resin or may be formed of different transparent resins. The material forming the WG 61 is preferably a conductive metal. Further, it is preferable that the material forming the WG 61 has a high reflectance for transmitted light to be used, and has high adhesion to the second dielectric member 62 and the third dielectric member 63. For example, a conductive metal material such as aluminum, silver, platinum, or the like, or the like may be mentioned, but it is not limited thereto. In FIGS. 1 and 2, the cross-sectional shape of the WG 61 is a rectangle, but is not limited to a rectangle. The cross-sectional shape of the WG 61 may be a square shape, a trapezoidal shape, or a triangular shape, and various shapes may be employed without departing from the gist of the present invention. The material forming the third dielectric body 63 is preferably a material that can serve as a substrate. Preferably, the substrate is made of glass or resin having a higher transparency in a visible light region, a material having higher heat resistance, a higher adhesion to WG61, and a higher adhesion to the second dielectric 62, but not Limited to these. Examples thereof include amorphous thermoplastic resins such as polycarbonate, polystyrene (PS), cycloolefin polymer (COP), and polyvinyl chloride, and polyethylene terephthalate (PET), polyethylene, polypropylene, and the like. The crystalline thermoplastic resin is an ultraviolet curable resin such as an acrylic resin, an epoxy resin, a urethane type or a polyimine, or a thermosetting resin. Moreover, it is also possible to combine an ultraviolet curable resin, a thermosetting resin, an inorganic substrate such as glass, the above thermoplastic resin, or the like. Further, as the third dielectric member 63, a material for forming the second dielectric body which will be described later may be used. The material forming the second dielectric body 62 is preferably a resin or the like. Further, the material forming the second dielectric member 62 preferably has a high transparency in a visible light region, a material having high heat resistance, and a high adhesion to WG61, and a third dielectric member 63. The adhesion is high, but it is not limited to these. Examples thereof include amorphous thermoplastic resins such as polycarbonate, polystyrene (PS), cycloolefin polymer (COP), and polyvinyl chloride, and polyethylene terephthalate (PET), polyethylene, polypropylene, and the like. The crystalline thermoplastic resin is an ultraviolet curable resin such as an acrylic resin, an epoxy resin, a urethane type or a polyimine, or a thermosetting resin. Further, a configuration in which an ultraviolet curable resin or a thermosetting resin is combined with the above thermoplastic resin or the like may be employed. Further, the second dielectric body may have a two-layer structure. For example, it may be a two-layer structure in which a dielectric body between a plurality of WGs 61 and a dielectric body that is in contact with the upper surface of the plurality of WG61 and the upper surface of the dielectric body between the plurality of WGs 61 are filled. The material of each resin of the two-layer structure may be the same as the material of the second dielectric body 62 described above. Further, in the case of a double layer structure, the dielectric filled between the plurality of WGs 61 may be a layer using a solid dielectric material. For example, it may be formed of an inorganic compound such as cerium oxide, cerium nitride oxide, cerium oxide lanthanum or cerium nitride, or a laminated structure thereof, but is not limited thereto. The first dielectric material and the second dielectric material may be formed of the same transparent resin or may be formed of a different transparent resin. As the transparent resin material for forming the dielectric material, Japanese Patent Laid-Open Publication No. 2013-062489, Japan JP-A-2012-224845, JP-A-2013-089761, WO2014/196381, and the like. As the wavelength conversion layer, an inorganic phosphor, a fluorescent organic dye, a quantum dot or the like is used. For example, the red conversion layer 41 can use Y ₂ O ₃ :Eu ³⁺ , Y ₂ O ₂ S:Eu ³⁺ Etc., the green conversion layer 42 can use Ca ₂ SiO ₄ :Eu ²⁺ ZnSiO ₃ : Mn or the like, and the blue conversion layer may be ZnS: Ag, ZnS or the like. However, it is not limited to this. The light shielding layer may have a light transmittance of 5% or less. Further, a conductive metal is preferred. Further, it is preferable that the reflectance of the transmitted light used is high and the adhesion to the third dielectric body 63 and the wavelength conversion layer is high. A conductive metal material such as aluminum, chromium, titanium, or the like, or a carbon particle such as carbon black or the like can be used. However, it is not limited to this. <Production Step> The steps of producing the WG reflective polarizing layer 60 and the wavelength conversion layer will be briefly described. Furthermore, the production method is not limited to this method, and a method generally used in the technical field of the present invention can be employed. For example, a method of producing the WG reflective polarizing layer 60 and the wavelength conversion layer using an electron beam drawing device or a photolithography method will be described. Furthermore, the case where the second dielectric body is a double layer will be described. A polyimide-based or acrylic resin to be the second dielectric body 62 is applied onto the glass substrate. Alternatively, an inorganic compound such as cerium oxide or cerium nitride oxide, cerium oxynitride or cerium nitride is formed. The coating method may be a spin coating method, a dipping method, or the like. Further, the film formation can be chemically formed using a CVD (Chemical Vapor Deposition) device or the like, or can be physically formed by a vacuum deposition method, a sputtering method, an ion plating method, a screen printing method, or the like. Next, a film is formed to form a conductive metal of WG61. For example, a sputtering device is used to form aluminum. Further, a photoresist is applied, and a portion other than the pattern of the WG 61 is drawn by an ArF exposure apparatus, a KrF exposure apparatus, an electron beam drawing apparatus, or the like, and developed. Since the photoresist remains on the pattern of the WG 61, the WG 61 can be formed by etching the photoresist as a mask to remove the photoresist. Then, a polyimide-based or acrylic resin which is the second layer of the second dielectric body 62 is applied. Alternatively, an inorganic compound such as cerium oxide or cerium nitride oxide, cerium oxynitride or cerium nitride is formed. The coating method may be an inkjet method, a spin coating method, a dipping method, or the like. Further, the film formation can be chemically formed using a CVD apparatus or the like, or can be physically formed by a vacuum deposition method, a sputtering method, an ion plating method, or the like. In this way, a plurality of WG61 can be filled with a resin or an inorganic compound. Further, a resin or an inorganic compound is planarized using a chemical mechanical polishing machine (CMP). At this time, it is also possible to polish to the extent that WG61 is exposed on the surface. Then, a polyimide-based or acrylic resin which is the third dielectric body 63 is applied. Alternatively, an inorganic compound such as cerium oxide or cerium nitride oxide, cerium oxynitride or cerium nitride is formed. The coating method may be a spin coating method, a dipping method, or the like. Further, the film formation can be chemically formed using a CVD apparatus or the like, or can be physically formed by a vacuum deposition method, a sputtering method, an ion plating method, or the like. Further, the light shielding layer 40 is formed. For example, a conductive metal or chromium is formed using a sputtering device. Further, a photoresist is applied, and a pattern of the light shielding layer 40 is formed by photolithography using a photomask and developed. Since the photoresist remains on the pattern of the light shielding layer 40, the light shielding layer 40 can be formed by etching the photoresist as a mask to remove the photoresist. Next, a wavelength conversion layer is formed. The order in which the wavelength conversion layer is formed may be appropriately selected. For example, a red fluorescent organic dye is applied to form a red conversion layer 41, and a green fluorescent organic dye is applied to form a green conversion layer 42. The wavelength conversion layers are formed on the same plane. By being formed on the same plane, the manufacturing steps can be reduced as compared with being formed on different layers, respectively. The material used may be an inorganic phosphor or a quantum dot. The blue color filter layer 43 may be coated in blue, and the materials used in the second dielectric or the third dielectric may be applied. In this way, a wavelength conversion layer can be formed. Further, although not shown in FIG. 2, a protective film may be formed after the formation of the wavelength conversion layer. As the protective film, a material used for the second dielectric or the third dielectric can be used, and a film such as a plastic film can be used as the adhesive. In this way, the WG reflective polarizing layer 60 and the wavelength conversion layer can be manufactured. Further, the WG reflective polarizing layer 60 and the wavelength conversion layer formed on the glass substrate can be used as they are. Further, it can be mechanically peeled off from the glass substrate and used in a flexible state. The WG reflective polarizing layer 60 and the wavelength conversion layer which are formed as described above can improve the light use efficiency. Further, since the WG reflective polarizing layer 60 and the wavelength conversion layer can be fabricated by using a device or a method generally used in the technical field of the present invention without using a special manufacturing step or manufacturing apparatus, it is possible to provide a WG reflection which suppresses the manufacturing cost. The polarizing layer 60 and the wavelength conversion layer. (Second Embodiment) In the present embodiment, a liquid crystal display device using a reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention will be described. In addition, the same configuration as that of the first embodiment will be omitted, and the description will be omitted. Fig. 3 is a schematic plan view showing the configuration of a liquid crystal display device 160 according to an embodiment of the present invention. The liquid crystal display device 160 includes a first glass substrate 20, a pixel region 104, gate side drive circuits 108 and 109, a source side drive circuit 112, a connector 114, and an integrated circuit (IC) 116. A pixel region 104, gate side drive circuits 108 and 109, and a source side drive circuit 112 are formed on the first glass substrate 20. The connector 114 is connected to the glass substrate 114. An integrated circuit (IC) 116 is provided on the connector 114. Pixel region 104 includes a plurality of pixels 106. The plurality of pixels 106 are arranged along one direction and in a direction crossing one direction. The number of arrays of the plurality of pixels 106 is arbitrary. For example, pixels 106 in the X direction and n pixels in the Y direction are arranged. m and n are each independently a natural number greater than one. The pixel area 104 is a display area. Each of the pixels 106 has a display element, and the display element includes a liquid crystal element. For example, a display element corresponding to three primary colors of red (R), green (G), and blue (B) can be provided for each of three pixels. A full-color liquid crystal display device can be provided by supplying 256 levels of voltage or current to each pixel. Also, the arrangement of the plurality of pixels 106 is not limited. For example, a strip arrangement or a triangle arrangement or the like can be employed. Further, a liquid crystal display device 160 according to an embodiment of the present invention will be described with respect to a stripe array. The connector 114 has a function of supplying a video signal, a timing signal for operating the control circuit, a power supply, and the like to the gate side drive circuits 108 and 109 and the source side drive circuit 112. The connector 114 can use a flexible printed circuit (FPC). The video signal, the timing signal of the operation of the control circuit, the power supply, and the like are supplied from the external circuit to the gate side drive circuits 108 and 109 and the source side drive circuit 112 via the connector 114. The gate side drive circuits 108 and 109 and the source side drive circuit 112 have a function of driving each pixel 106 to display an image in the pixel region 104 using a supplied video signal, a timing signal of an operation of the control circuit, and a power supply. The gate side drive circuits 108 and 109 and the source side drive circuit 112 may not all be formed on the first glass substrate 20. For example, an integrated circuit (IC) including a part or all of the functions of the gate side drive circuit and the source side drive circuit may be disposed on the first glass substrate 20 or on the connector 114. Furthermore, the integrated circuit (IC) 116 of FIG. 3 has a function as a part of the gate side drive circuit and the source side drive circuit. 4 is a schematic cross-sectional view showing the configuration of an optical system 300 using a liquid crystal display device 310 or 320 including a wire grid reflective polarizing layer 60 and a wavelength conversion layer according to an embodiment of the present invention. In addition to the configuration of FIG. 2, the optical system 300 includes the first glass substrate 20, the TFT array 30, the first light-transmitting conductive layer 70, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, and the second through-layer. The optical conductive layer 110, the second glass substrate 120, and the polarizing plate 130. The TFT array 30 is formed by a plurality of thin film transistors, capacitor elements, resistor elements, various wirings, and the like, in which a pixel region 104, gate side drive circuits 108 and 109, and a source side drive circuit 112 are formed. The TFT array 30 has a function of driving the liquid crystal display device 310 or 320. Each of the first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110 is applied with a voltage, and has a function of controlling the liquid crystal element included in the liquid crystal layer 90. When the voltage is applied to each of the first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110, the first alignment film 80 and the second alignment film 100 are aligned with the liquid crystal element included in the liquid crystal layer 90. effect. The liquid crystal display device 310 or 320 can be realized by sandwiching the constituent elements such as the first glass substrate 20 and the second glass substrate 120. Further, the polarizing plate 130 has a function of aligning the random polarized light into a specific direction and transmitting it. Further, the common potential line 197 to be described later may be used without using the second light-transmitting conductive layer 110. Further, in FIG. 4, an example in which the red color filter layer 50, the green color filter layer 51, the blue color filter layer, or the fourth dielectric body 43 are used is shown, but the colorless filter is also used. can. Fig. 5 is a schematic plan view showing a pixel 106 included in a liquid crystal display device 160 according to an embodiment of the present invention. The pixel shown in FIG. 5 can be applied to a VA (Vertical Alignment) method or a TN (Twisted Nematic) method in which a voltage is applied in a direction perpendicular to the first glass substrate 20 to control the liquid crystal element. The pixel 106 shown in FIG. 5 includes a thin film transistor 190, a capacitor element 196, a source wiring 191, a gate wiring 192, a capacitance potential line 193, and a first light-transmitting conductive layer 70. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source/drain electrodes 36 and 38, and first openings 39a and 39b. The source/drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 via the first openings 39a and 39b. The first light-transmitting conductive layer 70 is electrically connected to the source/drain electrode 38 via the second opening 194 and the third opening 195 . The capacitor element 196 is formed by the source/drain electrode 38, a gate insulating film 33 to be described later, and a capacitance potential line 193. The source/drain electrode 36 is electrically connected to the source line 191. The gate electrode 34 is electrically connected to the gate wiring 192. By applying a voltage to each of the first light-transmitting conductive layer 70 and the second light-transmitting conductive layer 110 to be described later, an electric field is generated in a direction perpendicular to the first glass substrate 20, and liquid crystals included in the liquid crystal layer 90 are provided. The components are controlled and the liquid crystal display device is capable of displaying images. Fig. 6 is a schematic plan view showing another example of the pixel 106 included in the liquid crystal display device 160 according to the embodiment of the present invention. The pixel shown in FIG. 6 can be applied to an IPS (In Plane Switching) method of controlling a liquid crystal element by applying a voltage in a direction parallel to the first glass substrate 20. The pixel 106 shown in FIG. 6 includes a thin film transistor 190, a capacitor element 196, a source wiring 191, a gate wiring 192, a capacitance potential line 193, a first light-transmitting conductive layer 70, and a common potential line 197. The thin film transistor 190 includes a semiconductor layer 32, a gate electrode 34, source/drain electrodes 36 and 38, and first openings 39a and 39b. The source/drain electrodes 36 and 38 are electrically connected to the semiconductor layer 32 via the first openings 39a and 39b. The first light-transmitting conductive layer 70 is electrically connected to the source/drain electrode 38 via the second opening 194 and the third opening 195 . The capacitor element 196 is formed by the source/drain electrode 38, a gate insulating film 33 to be described later, and a capacitance potential line 193. The source/drain electrode 36 is electrically connected to the source line 191. The gate electrode 34 is electrically connected to the gate wiring 192. The common potential line 197 has a function of supplying a common potential to all of the pixels 106 included in the pixel region 104. The common potential line 197 may be shared by all of the pixels 106 included in the pixel region 104, may be supplied by each pixel in the X direction, or may be shared by each pixel in the Y direction. By applying a voltage to each of the first light-transmitting conductive layer 70 and the common potential line 197, an electric field is generated in a direction parallel to the first glass substrate 20, and the liquid crystal element included in the liquid crystal layer 90 is controlled, and the liquid crystal display device is controlled. Ability to display images. Fig. 7 is a schematic plan view showing a WG 61 of a WG reflective polarizing layer 60 of a pixel 106 included in a liquid crystal display device 160 according to an embodiment of the present invention. Fig. 7 is superimposed on the upper surface of the paper surface of Figs. 5 and 6. In order to facilitate viewing of the drawings, FIG. 5 and FIG. 6 are separated from FIG. The line width of WG61 and the interval of WG61 are set to be identifiable in the drawing for easy understanding, but are not limited to this size. With the above configuration, the WG reflective polarizing layer and the wavelength conversion layer can improve the light use efficiency. A liquid crystal display device using a WG reflective polarizing layer and a wavelength conversion layer can improve light use efficiency, has good color reproducibility, and can realize bright and clear display. (Third Embodiment) In the present embodiment, a method of manufacturing a liquid crystal display device according to an embodiment of the present invention will be described. In addition, the description of the same configuration as that of the first embodiment and the second embodiment will be omitted. A method of manufacturing the liquid crystal display device 310 will be described with reference to FIGS. 8 or 9 and FIGS. 10 to 13. In addition, the manufacturing method of the liquid crystal display device of the present invention will be described by way of an example of a photolithography technique which is generally used in the manufacture of a liquid crystal display device unless otherwise specified. The method of manufacturing the liquid crystal display device is not limited to the photolithography technique, and any method generally used in the technical field of the present invention can be employed. 8 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 310 including the wire grid reflective polarizing layer and the wavelength conversion layer in the case where the pixel configuration of FIG. 5 is applied. Further, it is a schematic cross-sectional view in which three pixels included in the liquid crystal display device are enlarged. Fig. 9 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 320 including the wire grid reflective polarizing layer and the wavelength conversion layer in the case where the pixel configuration of Fig. 6 is applied. Further, it is a schematic cross-sectional view in which three pixels included in the liquid crystal display device are enlarged. First, as shown in FIG. 10(A), the TFT array 30 is formed on the first glass substrate 20. The TFT array 30 includes a base film 31, a semiconductor layer 32, a gate insulating film 33, a gate electrode 34, an interlayer film 35, source/drain electrodes 36 and 38, first openings 39a and 39b, a capacitance potential line 193, and The first dielectric body 37. A thin film transistor 190 and a capacitor element 196 are formed on the TFT array 30. The first dielectric body 37 has a function of relaxing the unevenness of the film, the wiring, the transistor, and the like which are formed lower than the first dielectric body 37. Therefore, the film or pattern formed after the first dielectric can be formed on the flat surface. The material forming the first dielectric body 37 preferably has a high transparency in a visible light region, a material having high heat resistance, and a high adhesion to the wavelength conversion layer. The method of forming the TFT array 30, the structure of the thin film transistor 190 and the capacitor element 196, and the materials of the respective films, layers, and portions can be known. That is, a method, construction or material commonly used in the technical field of the present invention can be employed. Next, as shown in Fig. 10(B), a wavelength conversion layer is formed. First, the light shielding layer 40 included in the wavelength conversion layer is formed. For example, a dielectric material containing black particles such as carbon black is printed on the entire surface of the substrate, and further, a photoresist is applied, and a pattern of the light shielding layer 40 is formed by photolithography using a photomask. The photoresist layer 40 can be formed by leaving the photoresist on the pattern of the light shielding layer 40 and etching the photoresist as a mask to remove the photoresist. Since the light-shielding layer 40 is formed by the wavelength conversion layer, the wavelength conversion layer of each color can be clearly divided, and thus the color mixture of the transmitted light can be suppressed. Then, a wavelength conversion layer, that is, a red conversion layer 41 and a green conversion layer 42 are formed. Further, the order in which the red conversion layer 41 and the green conversion layer 42 are formed may be appropriately selected. For example, a blue color filter 43 can be formed, and a composition for forming a wavelength conversion film containing a red fluorescent inorganic pigment or a fluorescent organic pigment can be applied to form a red conversion layer 41, and then coated with green fluorescent property. The composition for wavelength conversion of an inorganic pigment or a fluorescent organic dye forms the green conversion layer 42. The composition for forming a wavelength conversion film containing the red fluorescent inorganic pigment or the fluorescent organic dye, and the fluorescent inorganic pigment in the wavelength conversion composition containing the green fluorescent inorganic pigment or the fluorescent organic dye Examples thereof include an oxynitride phosphor, a nitride phosphor, and a YAG (Yttrium Aluminium Garnet) phosphor. Examples of the fluorescent organic dye include an anthraquinone, an anthraquinone, an aryl methine group, an azo system, a azomethine system, a white man system, a coumarin system, and a 1,5-diazabicyclo ring. [3. 3. 0] octadiene, pyrrolidinone, naphtholimine, naphthyl imine, lanthanum, phenolphthalein, pyrrolidinium, pyran, lanthanum, porphyrin, oxime a specific example of a wavelength conversion composition containing the above-mentioned fluorescent inorganic pigment or fluorescent organic pigment, and a fluorinated dye, a fluorinated pigment, a fluorescein-based, a fluorescein-based, or a fluorene-based fluorescent dye. Japanese Patent Publication No. 2016-90998, WO2016/063930, WO2013/118334, and JP-A-2016-39228. Further, a composition for forming a wavelength conversion film containing a semiconductor quantum dot can be used as one of the fluorescent inorganic materials, and as a specific example of the semiconductor quantum dot, a semiconductor quantum dot composed of a compound containing In as a constituent element is preferable. More preferably, it is InP/ZnS, InP/ZnSe, CuInS2/ZnS and (ZnS/AgInS2) solid solution/ZnS as core-shell structured semiconductor quantum dots, and AgInS2 and Zn-doped as homogeneous structure type semiconductor quantum dots. AgInS2, further preferably InP/ZnS. As a composition for forming a wavelength conversion film containing a semiconductor quantum dot, a combination disclosed in JP-A-H99-32918, JP-A-H07-48355, JP-A-2015-46328, and the like can be used. Things. Here, although an example in which the blue color-coated blue color filter 43 is applied is shown, the fourth dielectric body may be applied. By forming the fourth dielectric body in the region where the blue color filter 43 is formed, absorption or reflection of light by the blue color filter 43 can be suppressed, so that blue light can be efficiently transmitted. As the material of the fourth dielectric body, for example, a polyimide resin or an acrylic resin can be used. Materials other than those materials may also be used. The fourth dielectric material preferably has high adhesion to the light shielding layer 40 and the first dielectric body 37, high transparency, and heat resistance. Next, as shown in Fig. 10(C), a color filter layer is formed. The order in which the color filter layers are formed may be appropriately selected. For example, a red color filter layer 50 may be formed to form a green color filter layer 51 to form a blue color filter layer 43. The color filter layer can be formed by coating on the entire surface, using a photomask, and using photolithography. Furthermore, the formation method is not limited to this method. Then, as shown in FIG. 11(A), the third dielectric body 63 is formed. The third dielectric body 63 has a function of relaxing the unevenness of the film formed under the third dielectric body or the wiring pattern. Moreover, it also functions to protect the wavelength conversion layer and the color filter layer. Further, it also functions as a substrate of the WG 61 formed thereafter. The third dielectric body has a function of relaxing the unevenness of the film formed under the third dielectric body or the wiring pattern. Moreover, it also functions to protect the wavelength conversion layer and the color filter layer. Further, it also functions as a substrate of the WG 61 formed on the third dielectric body. The material forming the third dielectric body 63 may be the same material as the fourth dielectric body. For example, a polyimide-based or acrylic resin, an epoxy-based or urethane-based resin can be used. Next, as shown in Fig. 11(B), WG61 is formed. WG61 can be formed by nanoimprinting. The nanoimprint method is a well-known technique, and a detailed description is omitted. For example, there is a method of forming a mold on which irregularities are formed on quartz glass or the like, and forming a pattern using the mold. For example, aluminum is formed on a transparent substrate such as a glass substrate by using a sputtering apparatus. Further, a resist is applied, and the mold is pressed against the resist to irradiate UV (Ultra Violet) light. The WG 61 can be formed by etching the resist as a mask to remove the resist. In Fig. 11(B), the line of WG61 is wider than the portion where the light is shielded, and the portion of the so-called WG changes. That is, the light shielding layer can also be formed using WG. By forming the light shielding layer with WG, visible light can be blocked. Further, the WG 61 may be formed by designing a mold at a line width and an interval of a fixed period without using a WG to form a light shielding layer. Next, as shown in FIG. 12(A), a second opening portion 194 for electrically connecting the first light-transmitting conductive layer 70 and the source/drain electrode 38 is formed. The second opening 194 is a first dielectric body 37, a red color conversion layer 41, a green color conversion layer 42, a blue color filter 43 or a fourth dielectric body, a red color filter layer 50, and a green color filter. The sheet layer 51 is open. Then, as shown in FIG. 12(B), the second dielectric body 62 is applied. The second dielectric body has a function of relaxing the unevenness of the WG 61. Further, the sidewall of the second opening 194 is covered to protect the red conversion layer 41, the green conversion layer 42, the blue color filter 43 or the fourth dielectric, the red color filter layer 50, and the green color filter. The role of layer 51. By flattening the unevenness of the layer forming the display device and flattening the surface of the film, it is possible to stabilize the light incident on the display device, the reflected light, and the light to be absorbed. Next, as shown in FIG. 13(A), a third opening portion 195 reaching the source/drain electrode is formed on the second dielectric body 62. The third opening 195 is formed by electrically connecting the first light-transmitting conductive layer 70 and the source/drain electrode 38. Then, as shown in FIG. 13(B), the first light-transmitting conductive layer 70 is formed. The first light-transmitting conductive layer 70 is connected to the source/drain electrode 38 of the pixel, and is applied with a voltage corresponding to the image signal to drive the liquid crystal element of the liquid crystal layer 90. The material for forming the first light-transmitting conductive layer 70 can be, for example, a material that transmits light such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). The first alignment film 80 is formed on the first light-transmitting conductive layer 70. The first alignment film 80 has an insulating property, that is, the first light-transmitting conductive layer 70 is not electrically connected to the second light-transmitting conductive layer 110 formed on the opposite side of the liquid crystal layer 90. A material such as a polyimide film is used as the material for forming the first alignment film 80. FIG. 13 shows an example in which the first alignment film 80 is formed on the first light-transmitting conductive layer 70, but may be formed between the first light-transmitting conductive layer 70 and the first alignment film 80. There may be a layer of a light-shielding film, and an inorganic compound layer may also be present. The light shielding film layer has a function of blocking visible light, and the inorganic compound layer has an effect of insulating the conductive layer on the opposite surface. Finally, the substrate on the opposite side will be described using FIG. The opposite side substrate includes the second glass substrate 120, the second light-transmitting conductive layer 110, and the second alignment film 100. After the second light-transmitting conductive layer 100 is formed on the second glass substrate 120, the second alignment film 100 is applied. The second light-transmitting conductive layer 100 has a voltage applied perpendicularly to the liquid crystal element included in the liquid crystal layer 90 disposed between the second light-transmitting conductive layer 100 and the first light-transmitting conductive layer 70 to control the liquid crystal element. effect. As the material for forming the second light-transmitting conductive layer 100, for example, a material that transmits light such as ITO or IZO can be used. The second alignment film 100 has an insulating effect, that is, the second light-transmitting conductive layer 110 is not electrically connected to the first light-transmitting conductive layer 70 formed on the opposite side of the liquid crystal layer 90. The material for forming the second alignment film 100 is, for example, a resin such as a polyimide. FIG. 8 shows an example in which the second alignment film 100 is formed under the second light-transmitting conductive layer 110, but may be formed between the second light-transmitting conductive layer 110 and the second alignment film 100. There may be a layer of a light-shielding film, and an inorganic compound layer may also be present. The light shielding film layer has a function of blocking visible light, and the inorganic compound layer has an effect of insulating the conductive layer on the opposite surface. For example, the opposite side substrate thus formed is bonded to the portion formed as shown in FIG. 13(B) so that the liquid crystal layer 90 is interposed therebetween by using a sealing material or the like. Further, the liquid crystal display device 310 or 320 can be manufactured by bonding the polarizing plate 130 to the second glass substrate 120. Further, in the liquid crystal display device 320 shown in FIG. 9, in the step of forming the first light-transmitting conductive layer 70, the common potential line 197 and the first light-transmitting conductive layer 70 are formed in the same layer. Further, the second light-transmitting conductive layer 110 may not be formed. The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured by the above-described manufacturing method can improve the light use efficiency, and has good color reproducibility, and can realize bright and clear display. Further, since a special manufacturing apparatus is not required, and the existing manufacturing equipment can be utilized, the manufacturing cost can be suppressed. (Fourth Embodiment) In the present embodiment, another configuration and a manufacturing method of a liquid crystal display device according to an embodiment of the present invention will be described. In addition, the description of the same configuration as that of the first embodiment to the third embodiment will be omitted. In the same manner as in the second embodiment and the third embodiment, the method of manufacturing the liquid crystal display device of the present invention will be described by taking the photolithography technique as an example, and of course, it is a technical field of the present invention. The method usually used can be adopted. Fig. 14 is a schematic cross-sectional view showing the configuration of an optical system 400 using a liquid crystal display device 410 or 420 including a wire grid reflective polarizing layer 60 and a wavelength conversion layer according to an embodiment of the present invention. The optical system 400 has the same configuration as that of FIG. 4. In the liquid crystal display device 410 or 420, the stacking order is different from that of FIG. 8 or FIG. In the stacking order, the TFT array 30, the first light-transmitting conductive layer 70, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, and the second light-transmitting conductive layer 110 are provided on the first glass substrate 20. a second glass substrate 120, a WG reflective polarizing layer 60, a wavelength conversion layer composed of a light shielding layer 50, a red conversion layer 41, a green conversion layer 42, a blue color filter, or a fourth dielectric 43, and a red color The color filter layer composed of the filter 50, the green color filter 51, the blue color filter or the fourth dielectric member 43, and the second glass substrate 120. Further, a polarizing plate 130 is provided under the first glass substrate 20. Fig. 15 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 410 including the WG reflective polarizing layer 60 and the wavelength conversion layer when the pixel configuration of Fig. 5 is applied. Further, it is a schematic cross-sectional view in which three pixels included in the liquid crystal display device are enlarged. Further, the third opening portion 195 shown in Fig. 5 may not be formed. Fig. 16 is a schematic cross-sectional view showing a method of manufacturing the liquid crystal display device 420 including the WG reflective polarizing layer 60 and the wavelength conversion layer when the pixel configuration of Fig. 6 is applied. Further, it is a schematic cross-sectional view in which three pixels included in the liquid crystal display device are enlarged. Further, the third opening portion 195 shown in Fig. 6 may not be formed. A method of manufacturing the liquid crystal display devices 410 and 420 will be described with reference to FIGS. 15 and 16 . The step of forming the TFT array 30 on the first glass substrate 20 is the same as that of FIG. 3, and therefore will not be described. After the first dielectric body 37 of the TFT array 30 is formed, the second opening portion 194 is formed to form the first light-transmitting conductive layer 70. In the manufacture of the liquid crystal display device 420 shown in FIG. 16, the common potential line 197 and the first light-transmitting conductive layer 70 are formed in the same layer. The first alignment film 80 is formed on the first light-transmitting conductive layer 70. Further, between the first light-transmitting conductive layer 70 and the first alignment film 80, a layer in which a light-shielding film is formed may be present, and an inorganic compound layer may be present. The light shielding film layer has a function of blocking visible light, and the inorganic compound layer has an effect of insulating the conductive layer on the opposite surface. Here, the substrate formed on the first glass substrate to the first alignment film 80 is referred to as a TFT side substrate. Next, the formation of the substrate on the side opposite to the TFT side substrate via the liquid crystal layer 90 will be described. Here, the substrate on the side opposite to the TFT side substrate is referred to as a counter substrate. A color filter layer composed of a red color filter 50, a green color filter 51, a blue color filter, or a fourth dielectric member 43 is formed on the second glass substrate 120. Further, a wavelength conversion layer composed of the light shielding layer 50, the red conversion layer 41, the green conversion layer 42, and the blue color filter or the fourth dielectric body 43 is formed. Then, a WG reflective polarizing layer 60 including the third dielectric body 63, the WG 61, and the second dielectric body is formed. Then, after the second light-transmitting conductive layer 110 is formed, the second alignment film 100 is applied. Further, between the second light-transmitting conductive layer 110 and the second alignment film 100, a layer in which a light-shielding film is formed may be present, and an inorganic compound layer may be present. The light shielding film layer has a function of blocking visible light, and the inorganic compound layer has an effect of insulating the conductive layer on the opposite surface. For example, the opposite side substrate and the TFT side substrate thus formed are bonded to each other with a sealing material or the like so as to be spaced apart from each other by the liquid crystal layer 90. Further, the liquid crystal display device 410 or 420 can be manufactured by bonding the polarizing plate 130 to the first glass substrate 20. The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured by the above-described manufacturing method can improve the light use efficiency, and has good color reproducibility, and can realize bright and clear display. Moreover, since it is not necessary to form the third opening portion 195, the manufacturing cost can be suppressed. (Fifth Embodiment) In the present embodiment, another configuration and a manufacturing method of a liquid crystal display device according to an embodiment of the present invention will be described. In addition, the description of the same configuration as that of the first embodiment to the fourth embodiment will be omitted. In the same manner as in the second embodiment to the fourth embodiment, the method of manufacturing the liquid crystal display device of the present invention will be described by taking an optical lithography technique as an example. However, it is of course also possible to manufacture using the method generally used in the technical field of the present invention. Fig. 17 is a schematic cross-sectional view showing the configuration of an optical system 500 using a liquid crystal display device 510 or 520 including a wire grid reflective polarizing layer 60 and a wavelength conversion layer according to an embodiment of the present invention. The optical system 500 has the same configuration as that of FIG. 4 or FIG. 14. In the liquid crystal display device 510 or 520, the stacking order is different from that of FIG. 15 or FIG. The stacking order is: a protective film 140, a wavelength conversion layer composed of the light shielding layer 50, the red conversion layer 41, the green conversion layer 42 and the blue color filter or the fourth dielectric body 43, and the red color filter 50, The color filter layer, the WG reflective polarizing layer 60, the first glass substrate 20, the TFT array 30, and the first transparent conductive layer formed by the green color filter 51 and the blue color filter or the fourth dielectric body 43 The layer 70, the first alignment film 80, the liquid crystal layer 90, the second alignment film 100, the second light-transmitting conductive layer 110, and the second glass substrate 120. Further, a polarizing plate 130 is provided on the second glass substrate 120. Here, the substrate formed on the first glass substrate 20 to the first alignment film 80 is referred to as a TFT side substrate. Since the manufacturing steps of the TFT side substrate are the same as those of the fourth embodiment, they are omitted. Here, the substrate on which the second alignment film 100 and the second light-transmitting conductive layer 110 are formed up to the second glass substrate 120 is referred to as a counter-side substrate. The manufacturing process of the opposite substrate is the same as that of the third embodiment, and therefore will not be described. Here, the wavelength conversion layer formed of the protective film 140, the light shielding layer 50, the red conversion layer 41, the green conversion layer 42, and the blue color filter or the fourth dielectric body 43 is formed by the red color filter 50. A method of the color filter layer composed of the green color filter 51 and the blue color filter or the fourth dielectric member 43 and the WG reflective polarizing layer 60 will be described. Further, the portion formed here is referred to as a WG substrate. First, although not shown, the protective film 140 is applied or formed on the third glass substrate 121. For example, when a material such as a polyimide or an acrylic resin is used as the material of the protective film 140, a material such as ruthenium oxide or tantalum oxide, tantalum oxynitride, tantalum nitride or the like is used as the material of the protective film 140. In the case of an inorganic compound, film formation is carried out. Alternatively, it may be a laminate film of a resin and an inorganic compound. The protective film 140 has a function of suppressing damage or deterioration of a layer formed on the protective film 140, a film, and a pattern by an impact or the like from the outside of the display device. In the case of the laminated film, it is possible to prevent the moisture or the like from penetrating into the liquid crystal display device and causing deterioration of the display device. Further, the coating method can be carried out by a spin coating method, a dipping method, or the like. Further, the film formation can be carried out chemically using a CVD apparatus or the like, or can be performed physically using a sputtering method or the like. Next, a wavelength conversion layer composed of the light shielding layer 50, the red conversion layer 41, the green conversion layer 42, and the blue color filter or the fourth dielectric body 43 is formed. Further, a color filter layer composed of the red color filter 50, the green color filter 51, the blue color filter, or the fourth dielectric member 43 is formed. Then, a WG reflective polarizing layer 60 including the third dielectric body 63, the WG 61, and the second dielectric body is formed. Since the wavelength conversion layer, the color filter layer, and the WG reflective polarizing layer 60 can be manufactured by the methods described in the second embodiment to the fourth embodiment, they are omitted here. In this way, a WG substrate can be produced. Finally, a procedure of bonding the TFT side substrate, the opposite side substrate, and the WG substrate will be described. For example, a TFT side substrate and a counter-side substrate are bonded together by using a sealing material or the like so as to be spaced apart from each other by the liquid crystal layer 90. Further, the surface of the WG conversion layer 60 of the WG substrate is bonded to the surface of the first glass substrate 20 on the TFT substrate side opposite to the surface to which the opposite substrate is bonded. Further, the liquid crystal display device 510 or 520 can be manufactured by bonding the polarizing plate 130 to the second glass substrate 130. The liquid crystal display device using the WG reflective polarizing layer and the wavelength conversion layer manufactured by the above-described manufacturing method can improve the light use efficiency, and has good color reproducibility, and can realize bright and clear display. In addition, since it is not necessary to form the third opening 195, and the normal liquid crystal display in which the TFT substrate and the counter substrate are bonded together can be directly used, the manufacturing cost can be further suppressed. The respective embodiments of the present invention described above can be appropriately combined within a range that does not contradict each other. In addition, the operator adds or deletes or changes the design of the constituent elements based on the respective embodiments, or adds or omits the steps, or changes the conditions, and the subject matter of the present invention is included in the scope of the present invention. in. Further, even if it is an effect that is different from the effects obtained by the above-described embodiments of the present invention, it can be interpreted as being by the person who can be easily predicted based on the description of the present specification. The winner of the invention.

10‧‧‧Light guide plate

11‧‧‧Light diffuser

12‧‧‧Light source

13‧‧‧reflector

20‧‧‧1st glass substrate

30‧‧‧TFT array

31‧‧‧ basement membrane

32‧‧‧Semiconductor layer

33‧‧‧gate insulating film

34‧‧‧gate electrode

35‧‧‧ interlayer film

36‧‧‧Source/drain electrodes

37‧‧‧1st dielectric

38‧‧‧Source/drain electrodes

39a‧‧‧1st opening

39b‧‧‧1st opening

40‧‧‧Shade film

41‧‧‧Red Conversion Layer

42‧‧‧Green conversion layer

43‧‧‧Blue color filter layer or 4th dielectric

50‧‧‧Red color filter layer

51‧‧‧Green color filter layer

60‧‧‧Reflective polarizer

61‧‧‧ wire grid

62‧‧‧1st dielectric, 2nd dielectric

63‧‧‧3rd dielectric

64‧‧‧Blue incident light

65‧‧‧Blue reflected light

66‧‧‧Blue p-polarized reflection

67‧‧‧Transmission of red phosphor

68‧‧‧Transmission of green phosphor

69‧‧‧Transmission of blue p-polarized light

70‧‧‧1st transparent conductive layer

80‧‧‧1st alignment film

90‧‧‧Liquid layer

100‧‧‧2nd alignment film

104‧‧‧Pixel area

106‧‧‧ pixels

108‧‧‧gate side drive circuit

109‧‧‧ gate side drive circuit

110‧‧‧2nd transparent conductive layer

112‧‧‧Source side drive circuit

114‧‧‧Connector

116‧‧‧IC

120‧‧‧2nd glass substrate

121‧‧‧3rd glass substrate

130‧‧‧Polar plate

140‧‧‧Protective film

150‧‧‧ opposite substrate

151‧‧‧ opposite substrate

160‧‧‧Liquid crystal display device

190‧‧‧film transistor

191‧‧‧ source signal line

192‧‧‧gate signal line

193‧‧‧Capacitor potential line

194‧‧‧2nd opening

195‧‧‧3rd opening

196‧‧‧Capacitive components

197‧‧‧Shared potential lines

200‧‧‧Wire grid reflective polarizer and optical system

210‧‧‧Wire grid reflective polarizer and wavelength conversion phosphor and optical system

300‧‧‧Liquid crystal display device and optical system

310‧‧‧Liquid crystal display device

320‧‧‧Liquid crystal display device

400‧‧‧Liquid crystal display device and optical system

410‧‧‧Liquid crystal display device

420‧‧‧Liquid crystal display device

500‧‧‧Liquid crystal display device and optical system

510‧‧‧Liquid crystal display device

520‧‧‧Liquid crystal display device

Fig. 1 is a schematic cross-sectional view showing the configuration of a wire grid reflective polarizing layer according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view showing the configuration of a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 3 is a schematic plan view showing the configuration of a liquid crystal display device according to an embodiment of the present invention. Fig. 4 is a schematic cross-sectional view showing the configuration of a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 5 is a schematic plan view showing a pixel included in a liquid crystal display device according to an embodiment of the present invention. Fig. 6 is a schematic plan view showing a pixel included in a liquid crystal display device according to an embodiment of the present invention. Fig. 7 is a schematic plan view showing a wire grid reflective polarizing layer of a pixel included in a liquid crystal display device according to an embodiment of the present invention. Fig. 8 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 9 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. 10(A), (B) and (C) are schematic cross-sectional views showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. 11(A) and 11(B) are schematic cross-sectional views showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. 12(A) and 12(B) are schematic cross-sectional views showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. 13(A) and 13(B) are schematic cross-sectional views showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 14 is a schematic cross-sectional view showing the configuration of a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 15 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 16 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 17 is a schematic cross-sectional view showing the configuration of a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 18 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention. Fig. 19 is a schematic cross-sectional view showing a method of manufacturing a liquid crystal display device including a wire grid reflective polarizing layer and a wavelength conversion layer according to an embodiment of the present invention.

Claims (21)

A reflective polarizing layer having a width equal to or shorter than a shortest wavelength of incident transmitted light and having a linear portion; wherein the linear portion is arranged in plurality in parallel with a direction in which the linear portion extends; A first dielectric body is filled between the linear portions; an upper surface of the linear portion is in contact with the second dielectric; and a lower surface of the linear portion is in contact with the third dielectric. The reflective polarizing layer of claim 1, wherein the reflectance of the p-polarized light of the blue wavelength is relatively higher than the reflectance of the red wavelength and the reflectance of the green wavelength; the transmittance of the p-polarized light of the blue wavelength is relatively lower than the transmittance of the red wavelength. Rate and transmittance of green wavelength. The reflective polarizing layer of claim 1, which is in contact with a wavelength conversion layer, the wavelength conversion layer comprising a wavelength conversion material that absorbs light of the blue wavelength and emits light of a red wavelength, and emits light of the blue wavelength and emits A wavelength conversion material for green wavelength light. The reflective polarizing layer of claim 3, wherein the wavelength converting material for emitting light of a red wavelength included in the wavelength converting layer and the wavelength converting material for emitting light of a green wavelength are formed on the same plane. The reflective polarizing layer of claim 3 or 4, wherein the wavelength conversion layer is in contact with the third dielectric or the second dielectric. The reflective polarizing layer of claim 3 or 4, wherein the wavelength converting material for emitting light of a red wavelength included in the wavelength converting layer and the wavelength converting material for emitting light of a green wavelength are separated by a light shielding layer. The reflective polarizing layer of claim 3 or 4, wherein the wavelength converting material emitting the red wavelength light is in contact with the red color filter; and the wavelength converting material emitting the green wavelength light and the green color filter are Pick up. A display device comprising: a first substrate, a TFT array, a wavelength conversion layer, a reflective polarizing layer, a translucent conductive film, a first alignment film, a liquid crystal layer, a second alignment film, a second substrate, and a polarizing plate; The TFT array, the wavelength conversion layer, the reflective polarizing layer, the translucent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are disposed between the first substrate and the second substrate. The display device of claim 8, wherein the reflective polarizing layer has a width equal to or shorter than a shortest wavelength of incident transmitted light, and includes a linear portion, a first dielectric body, a second dielectric body, and a third dielectric body; The linear portion is arranged in parallel with the direction in which the linear portion extends in parallel; the first dielectric member is filled between the linear portions; the upper surface of the linear portion and the second dielectric body The lower surface of the linear portion is in contact with the third dielectric body. The display device of claim 9, wherein the wavelength conversion layer comprises a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and a wavelength conversion material that absorbs light of a blue wavelength and emits light of a green wavelength; A wavelength converting material that emits light of a red wavelength and a wavelength converting material that emits light of a green wavelength are formed on the same plane. The display device of claim 9, wherein a color filter layer is included between the reflection conversion layer and the wavelength conversion layer; the color filter layer comprises a red color filter and a green color filter; The red color filter is in contact with the wavelength conversion material that emits light of a red wavelength; and the green color filter is in contact with the wavelength conversion material that emits light of a green wavelength. The display device according to any one of claims 8 to 11, wherein the wavelength conversion layer has an opening, and the translucent conductive film is in contact with the third dielectric member and is disposed in the opening. The display device according to any one of claims 8 to 11, wherein the light-transmitting conductive film is in the form of a comb or a plate. A display device comprising: a protective film, a wavelength conversion layer, a reflective polarizing layer, a first substrate, a TFT array, a translucent conductive film, a first alignment film, a liquid crystal layer, a second alignment film, and a second substrate; a polarizing plate; the TFT array, the translucent conductive film, the first alignment film, the liquid crystal layer, and the second alignment film are disposed between the first substrate and the second substrate; the wavelength conversion layer and the reflection The polarizing layer is disposed between the protective film and the first substrate. The display device of claim 14, wherein the reflective polarizing layer has a width equal to or shorter than a shortest wavelength of the incident transmitted light, and includes a linear portion, a first dielectric body, a second dielectric body, and a third dielectric body; The linear portion is arranged in parallel with the direction in which the linear portion extends in parallel; the first dielectric member is filled between the linear portions; the upper surface of the linear portion and the second dielectric body The lower surface of the linear portion is in contact with the third dielectric body. The display device of claim 14, wherein the wavelength conversion layer comprises a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and a wavelength conversion material that absorbs light of a blue wavelength and emits light of a green wavelength, The wavelength converting material that emits light of a red wavelength is formed on the same plane as the wavelength converting material that emits light of a green wavelength. The display device of any one of claims 14 to 16, wherein a color filter layer is included between the reflection conversion layer and the wavelength conversion layer; the color filter layer comprises a red color filter and a green color a color filter; the red color filter is in contact with the wavelength conversion material that emits light of a red wavelength; and the green color filter is in contact with the wavelength conversion material that emits light of a green wavelength. The display device according to any one of claims 14 to 16, wherein the light-transmitting conductive film is in the form of a comb or a plate. The display device according to any one of claims 14 to 16, wherein the wavelength conversion layer is in contact with the protective film. The display device according to any one of claims 14 to 16, wherein the reflective polarizing layer is in contact with the first substrate. A composition comprising a wavelength conversion layer comprising a wavelength conversion material that absorbs light of a blue wavelength and emits light of a red wavelength, and a wavelength conversion material that absorbs light of a blue wavelength and emits light of a green wavelength; Further, the wavelength conversion material that emits light of a red wavelength is disposed on the same plane as the wavelength conversion material that emits light of a green wavelength.