CN108415113A - The production method and display device of polarizing film, polarizing film - Google Patents
The production method and display device of polarizing film, polarizing film Download PDFInfo
- Publication number
- CN108415113A CN108415113A CN201810126776.6A CN201810126776A CN108415113A CN 108415113 A CN108415113 A CN 108415113A CN 201810126776 A CN201810126776 A CN 201810126776A CN 108415113 A CN108415113 A CN 108415113A
- Authority
- CN
- China
- Prior art keywords
- line
- resin layer
- protective film
- area
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
Abstract
The present invention, which provides, a kind of preventing the polarizing film of light leakage, the production method of polarizing film and display device.The polarizing film, including：The linear portion that extends in one direction and multiple line-like areas that multiple threadiness portions are arranged on the direction substantially parallel with the extending direction in the threadiness portion; and threadiness portion has the minimal wave length width below from external incident visible light; contain protective film between multiple line-like areas, protective film covers visible light.
Description
Technical field
The present invention relates to the production methods and display device of a kind of polarizing film, polarizing film.
Background technology
In recent years, the High precision of liquid crystal display device, color reprodubility are promoted, the expansion of dynamic range is developing.
High precision can cause aperture opening ratio to reduce, therefore in order to maintain display brightness, need the brightness for improving light source.Color reprodubility carries
Rising can be realized by wavelength convert or wavelength selection, but there are energy losses in wavelength convert or wavelength selection, therefore be
Maintenance display brightness needs the brightness for improving light source.Dynamic range can be expanded by improving display brightness, but in order to improve
Display brightness needs the brightness for improving light source.The brightness of light source is improved under the either case, therefore causes to consume electric power
Increase.The polarizing film or polarizer configured in the light source side of liquid crystal display device takes out from the light of light source along specific direction vibration
Light, and the light is incident in liquid crystal cells, but the light of the non-specific direction is almost absorbed, and liquid crystal is not used to
Display.As the method using the unserviceable light, it is proposed that reflecting polarizer or reflective polarizer.As polarization by reflection
The example of device has wiregrating (wire grid) polarizer (sometimes referred to as wire grid polarizer, wiregrating film etc.).Wire-grid polarizer is
Clathrate or netted linear area is made with multiple fine wire-like members (also referred to as threadiness portion, line (wire)) are arranged
The optical element in domain (wiregrating).In addition, wire-grid polarizer can also have multiple optical elements.Wire-grid polarizer is from light source
Light take out the light that is vibrated along specific direction, and by the light reflection of the non-specific direction to light source side.The light of the reflection
By repeating by reflections such as the reflecting plates of light source side and again to be recycled by being incident to wire-grid polarizer, therefore light can be promoted
Utilization ratio.
For example, patent document 1 is related to a kind of polarizer, shows and promote the production of wire-grid polarizer, make precision
Method, and the production method for disclosing piece (sheet) shape version of large area.In addition, patent document 2 is related to a kind of LCD display
Plate, and disclose the method that wire-grid polarizer is formed by Step-and-repeat (step-and repeat) mode.
Existing technical literature
Patent document
1 Japanese Patent Laid-Open 2016-103001 bulletins of patent document
Patent document No. 2012/0140148 specification of 2 U.S. Patent Application Publication No.
Invention content
Problem to be solved by the invention
In order to make the polarizing film or polarizer that utilize wire-grid polarizer, need to utilize electron beam lithography (electron
Beam lithography) or the technique same as semiconductor such as impregnation technology (immersion process) form wiregrating, and
There are projects in terms of enlargement.In the case of application nano-imprint method, the substrate as substrate is also difficult to enlargement.In order to
It realizes enlargement, such as has the pattern for forming polarizer using the small mold of 20mm × 20mm or so, and by multiple patterns
The method for arranging or connecting etc. and made, but here, gap when self-align or light leakage in the gap of connection
As problem.In addition, light leakage can be improved by overlap by multiple arrangements or when connecting, but the case where overlapping
Under, overlap ampleness the ensuring of (margin), the scale of intersection becomes problem.
In view of this project, the first purpose of an embodiment of the present invention be to provide a kind of polarizing film for preventing light leakage,
The production method and display device of polarizing film.
Technical means to solve problem
The polarizing film (wire grid polarizer) of an embodiment of the present invention includes：The linear portion that extends in one direction and
Multiple line-like areas in multiple threadiness portions are arranged on the direction substantially parallel with the extending direction in linear portion, and threadiness portion has
There is the minimal wave length width below from external incident visible light, contains protective film (third resin between multiple line-like areas
Layer, the 4th resin layer), protective film covers visible light.
The polarizing film of an embodiment of the present invention is alternatively, and the lower surface in linear portion contacts the first resin layer, linear portion
Side contacts the second resin layer, the side contact protection film of the side of the first resin layer and the second resin layer with upper surface.
The polarizing film of an embodiment of the present invention is alternatively, and is provided with the second resin layer between linear portion, under linear portion
Surface contacts the first resin layer, the side contact protection film of the side of the first resin layer and the second resin layer.
The polarizing film of an embodiment of the present invention is alternatively, and the lower surface in linear portion contacts the first resin layer, linear portion
The side contact protection film of side and first resin layer.
Protective film contained by the polarizing film of an embodiment of the present invention can also cover line-like area.
Linear portion contained by the polarizing film of an embodiment of the present invention can also include conductive metal material.
Protective film contained by the polarizing film of an embodiment of the present invention can also be resin or the resin comprising liquid crystal.
Protective film contained by the polarizing film of an embodiment of the present invention can also include with refractive anisotrop
Material.
The production method of the polarizing film of an embodiment of the present invention includes：The process for forming resin layer on the first substrate；
The linear portion extended in one direction is formed on the resin layer and in the side substantially parallel with the extending direction in the threadiness portion
The process for arranging the line-like area in multiple threadiness portions upwards；The process that first substrate is detached with line-like area；By multiple lines
Process of the shape area arrangement on second substrate；And masking is formed between multiple line-like areas on being arranged in second substrate
The process of the protective film of visible light.
The process that line-like area is formed included in the production method of the polarizing film of an embodiment of the present invention can also
Including following process：Metallic conduction film, and the painting photoresist on metallic conduction film are formed on the first resin layer,
Using photomask and using the light of the wavelength more shorter than the width in linear portion, photoresist is exposed.
The process that line-like area is formed included in the production method of the polarizing film of an embodiment of the present invention can also
Including following process：Metallic conduction film, and the painting photoresist on metallic conduction film are formed on the first resin layer,
The figuratum face of the formation for forming figuratum mold is pressed on into photoresist, to mold irradiation than linear portion width more
The light of short wavelength, to be exposed to photoresist.
Included in the production method of the polarizing film of an embodiment of the present invention formed protective film process can also be
It is carried out by ink-jet.
The process of protective film is formed included in the production method of the polarizing film of an embodiment of the present invention in addition to arranging
It is listed between multiple line-like areas on second substrate and is formed other than protective film, can also be formed and be protected in the upper surface of line-like area
Cuticula.
The display device of an embodiment of the present invention includes：Polarizing film includes the most shortwave with incident visible light
Long width below and the linear portion that extends in one direction and on the direction substantially parallel with the extending direction in linear portion
Multiple line-like areas in multiple threadiness portions are arranged, and include the protection for being set between multiple line-like areas and covering visible light
Film；Multiple pixels arrange on the direction extended in one direction and the direction intersected with the direction extended in one direction；
And photomask, first substrate and second substrate.
Protective film contained in the display device of an embodiment of the present invention can also be in the surface vertical with photomask
Direction on it is Chong Die with photomask, and the width of protective film is narrower than the width of photomask.
Pixel contained in the display device of an embodiment of the present invention can also include：With extend in one direction
Source signal line that direction is formed substantially in parallel and substantially parallel with the direction that intersects with the direction extended in one direction
Ground formed gate line, and source signal line with, source electrode Chong Die with protective film on the direction of the surface vertical of protective film
The width of signal wire is narrower than the width of protective film.
Gate line contained in the display device of an embodiment of the present invention can also be on the surface edge of protective film
Vertical direction is Chong Die with protective film, and the width of gate line is narrower than the width of protective film.
The display device of an embodiment of the present invention can also have multiple photomasks, and multiple photomasks include：With
Photomask and the line-like area screening Chong Die with both protective films that line-like area is overlapped on the direction of the surface vertical of photomask
Light film.
The display device of an embodiment of the present invention can also have in turn：Red color filter piece, green colorized optical filtering
Piece and blue color filter, and multiple photomasks include：The screening contacted with red color filter piece and green colored filter
Light film, the photomask contacted with green colored filter and blue color filter and with blue color filter and red
The photomask of colored filter contact.
Polarizing film contained in the display device of an embodiment of the present invention can also configure the following table in first substrate
On at least one of face and the upper surface of second substrate.
Pass through embodiment as described above, it is possible to provide a kind of display device with the WG polarizing films for preventing light leakage.
Description of the drawings
Fig. 1 is the schematic perspective view of the structure for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 2 (A)~Fig. 2 (C) is the schematic cross sectional view of the structure for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 3 (A)~Fig. 3 (C) is the schematic cross sectional view of the structure for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 4 (A)~Fig. 4 (C) is the schematic cross sectional view of the structure for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 5 is the flow chart of the production method for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 6 (A)~Fig. 6 (F) is the flow chart of the production method for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 7 (A)~Fig. 7 (F) is the flow chart of the production method for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 8 (A)~Fig. 8 (D) is the flow chart of the production method for the wire grid polarizer for indicating an embodiment of the present invention.
Fig. 9 is the schematic plan of the structure for the display device with wire grid polarizer for indicating an embodiment of the present invention
Figure.
Figure 10 is to indicate pixel included in the display device with wire grid polarizer of an embodiment of the present invention
Schematic plan view.
Figure 11 is to indicate pixel included in the display device with wire grid polarizer of an embodiment of the present invention
Schematic plan view.
Figure 12 is indicated in pixel included in the display device with wire grid polarizer of an embodiment of the present invention
Wire grid polarizer schematic plan view.
Figure 13 is to indicate three pictures included in the display device with wire grid polarizer of an embodiment of the present invention
The schematic cross sectional view of element.
Figure 14 is to indicate three pictures included in the display device with wire grid polarizer of an embodiment of the present invention
The schematic cross sectional view of element.
Figure 15 (A), Figure 15 (B) are the making for the display device with wire grid polarizer for indicating an embodiment of the present invention
The flow chart of method.
Figure 16 is the flow of the production method for the display device with wire grid polarizer for indicating an embodiment of the present invention
Figure.
Figure 17 is the flow of the production method for the display device with wire grid polarizer for indicating an embodiment of the present invention
Figure.
The explanation of symbol
20、120、121、122、123：Glass substrate；
30：Tft array；
31：Basilar memebrane；
32：Semiconductor layer；
33：Gate insulating film；
34：Gate electrode；
35、37：Interlayer film；
36、38：Source-drain electrode；
39a、39b：First opening portion；
40：Photomask；
50：Red color filter lamella；
51：Green color filter layers；
52：Blue color filter layer；
60：Polarizer layers；
61：First resin layer；
62：Linear portion；
63：Second resin layer；
64：Third resin layer (protective film)；
65：Include the layer (the 4th resin layer, protective film) of the material with refractive anisotrop；
66：Metallic conduction film；
67：Photoresist；
68：Mask；
69：Mold；
70：First transparent conductive layer；
110：Second transparent conductive layer；
80：First orientation film；
90：Liquid crystal layer；
100：Second orientation film；
104：Display area；
106：Pixel；
108、109：Gate side driver circuit；
112：Source side drive circuit；
114：Connector；
116：Integrated circuit；
126：Line-like area；
130：Polarizing film；
190：Thin film transistor (TFT)；
191：Source signal line；
192：Gate line；
193：Capacitance equipotential line；
194：Second opening portion；
196：Capacity cell；
197：Public equipotential line；
200：Wire grid polarizer (WG polarizing films)；
300：Liquid crystal display device；
S20~S26：Step；
A1、A2、B1、B2、C1、C2：Hatching；
UV：Ultraviolet light.
Specific implementation mode
Hereinafter, whiles with reference to attached drawing etc., embodiments of the present invention will be described.But the present invention is not departing from
It can be implemented with a variety of different embodiments in the range of inventive concept.That is, be not limited to it is following illustrated by embodiment party
The contents of formula are explained.In addition, attached drawing is to make explanation definitely, compared with actual embodiment, sometimes to each
Partial width, thickness, shape etc. are schematically shown.However, schematical attached drawing eventually as an example of, not to this hair
Bright explanation is defined.
In this specification and each figure, sometimes pair with the same element label of content illustrated in the figure shown in oneself together
One symbol (or a, b are marked with behind number etc. symbol) simultaneously suitably omits the description.Furthermore to the word of each element note
" first ", " second " are to distinguish each element and the convenient mark that uses, are not had then as long as no special instructions more
Meaning.
In the present specification, so-called "upper" includes not only being configured in a manner of being in direct contact on object or region
Situation also includes the case where centre is configured across other objects or region.This term of "lower" is also same.In addition,
The term of "upper", "lower" etc indicates object or interregional opposite upper and lower relation, is not necessarily referring to absolute upper and lower relation.Specifically
For, on the basis of the interarea (face for being formed with element etc.) of substrate, the main surface side of substrate is defined as "upper", by the master of substrate
The opposite side in face is defined as "lower".
In the case of forming multiple patterns being processed to some film, the multiple pattern respectively has not sometimes
Same function and/or effect.However, the multiple pattern is formed by film in the same process as same layer.That is, described
Multiple patterns are constructed with same layer, and include same material.Therefore, in the present specification, it is by the multiple pattern definition
The pattern being present in same layer.
The polarizing film of the present invention is illustrated.Furthermore polarizing film of the invention is that wiregrating (in following explanation, is remembered sometimes
It is WG (Wire Grid) to carry) polarizing film.In WG polarizing films, polarizer layers have puts down with the direction extended in one direction
The line-like area in multiple threadiness portions is provided on capable direction.In WG polarizing films, multiple line-like areas are arranged in tile fragment
(tile) shape.It is being arranged in the resin for being provided with masking visible light between tile-shaped line-like area and line-like area or is having
The material etc. of refractive anisotrop.By resin or tool that masking visible light is arranged between line-like area and line-like area
There is the material etc. of refractive anisotrop, it is possible to provide a kind of WG polarizing films that can inhibit light leakage.In addition, since be not necessarily to will be linear
Region and line-like area overlapping, thus can provide it is a kind of do not consider to overlap ampleness and formed line-like area can and without Jie
Meaning overlaps the WG polarizing films of scale.Here, the resin for covering visible light is the material to form third resin layer in the present specification.
In addition, the material with refractive anisotrop is formed comprising the material with refractive anisotrop in the present specification
The material of layer or the material for forming the 4th resin layer.In addition, third resin layer and the 4th resin layer are protective film.
(first embodiment)
In present embodiment, the structure of the polarizing film of an embodiment of the present invention is illustrated.Furthermore about what is repeated
Structure omits the description sometimes.
Fig. 1 is the schematic perspective view of the structure for the WG polarizing films 200 for indicating first embodiment.
WG polarizing films 200 shown in FIG. 1 include：Glass substrate 20, polarizer layers 60 and line-like area 126.
Line-like area 126 includes the first resin layer 61 and threadiness portion 62.Between line-like area 126 and line-like area 126
Layer 65 containing third resin layer 64 or comprising the material with refractive anisotrop.Furthermore including each with refractive index
The layer 65 of the material of anisotropy is the 4th resin layer 65.In addition, third resin layer 64 and the 4th resin layer 65 are protective film.
Fig. 2 (A)~Fig. 2 (C) is the schematic cross sectional view between the A1 and A2 of WG polarizing films 200 shown in FIG. 1.
Fig. 2 (A) includes glass substrate 20 and polarizer layers 60.Polarizer layers 60 include line-like area 126 and third resin
Layer 64.Line-like area 126 includes the first resin layer 61, threadiness portion 62 and the second resin layer 63.The side in linear portion 62 and upper table
Face contacts the second resin layer 63.The lower surface in linear portion 62 is contacted with a part for the upper surface of the first resin layer 61.First tree
A part for the upper surface of lipid layer 61 is contacted with the second resin layer 63.That is, the second resin layer 63 covers linear portion 62 and the first tree
Lipid layer 61.The side contact third resin layer 64 of first resin layer 61.The side contact third resin layer 64 of second resin layer 63.
The upper surface of the lower surface contact glass substrate 20 of first resin layer 61.The lower surface of third resin layer 64 contacts glass substrate 20
Upper surface.Furthermore show that the side end of line-like area 126 is the example of the second resin layer 63 in Fig. 2 (A), but linear area
The side end in domain 126 can also be linear portion 62.In the case of described, linear portion 62 is contacted with the side of third resin layer 64.Again
Person, in this specification, the first resin layer 61 is the solidfied material for the material to form the first resin layer 61, and the second resin layer 63 is to be formed
The solidfied material of the material of second resin layer 63, third resin layer 64 are the solidfied materials for the material to form third resin layer 64.
First resin layer 61 is preferably high in the visible light region transparency, and heat resistance is high, and with glass substrate 20, threadiness portion
62, the adhesion of the second resin layer 63 and third resin layer 64 is high, but is not limited to these.Form the material of the first resin layer 61
Material can be enumerated：Uv curing resins or the Thermocurables such as acrylic acid series, epoxy, carbamate system, polyimides system
Resin.In addition, the first resin layer 61 can also be set as two layers of construction.For example, the side contacted with glass substrate 20 can also make
With the higher bonding agent of adhesion, and the resin layer contacted with linear portion 62 is set as the uv curing resin or thermosetting
The property changed resin.
Linear portion 62 is linear, and is arranged on the direction extended in one direction multiple.In addition, threadiness portion 62 has
The minimal wave length width below of incident visible light.In turn, linear portion 62 is formed in using conductive metal material
On first resin layer 61.Show that the arrangement pitch in linear portion 62 is this periodic example in Fig. 2 (A)~Fig. 2 (C), but
Can also be acyclic.For example, in the case where two kinds of threadiness portions 62 of different size are formed on same plane, it can
There is the function by the function of light polarization and shading simultaneously.
It is well known that the transmittance in threadiness portion 62 is by the wave at the interval in linear portion 62 and adjacent threadiness portion 62, incident light
Long, incident light angle (incidence angle) is indicated as the relationship of the refractive index of the material of base material.For example, by by linear portion
62 width is set as 180nm, the arrangement pitch in threadiness portion 62 is set as 360nm, the light in region of the transmissive wavelength more than 360nm.
That is, 200 transmissive visible light of WG polarizing films.Furthermore in this specification, the interval in linear portion 62 and adjacent threadiness portion 62 refers to certainly
Distance until the center of the width in linear portion 62 to the center of the width in adjacent threadiness portion 62.In addition, the width in threadiness portion 62
It is preferably set to the 1/2 or less of interval.
In addition, the transmittance in threadiness portion 62 also has relationship with film thickness (also referred to as height).For example, the film thickness in threadiness portion 62 is only
It is set as that the transmissivity through the light in threadiness portion 62 is made to become 1% film thickness below.For example, the film thickness in threadiness portion 62 is preferred
30nm or more.Specifically, in the case of being divided into 360nm between linear portion 62 and adjacent threadiness portion 62, by linear portion 62
Film thickness is also set as 360nm.By in this way, transmissive wavelength is more than the light in the region of 360nm.That is, WG polarizing films 200 can be saturating
Penetrate visible light.If the film thickness in threadiness portion 62 is excessively thin, transmitted light can not be ignored, and the light of particular range of wavelengths can not be taken out.
On the other hand, if the film thickness in threadiness portion 62 is excessively thick, there is the possibility that the utilization ratio of light reduces, it is therefore, same as line width
Ground, film thickness is it is also preferred that 1/2 or less be spaced.
The conductive metal material for forming threadiness portion 62 is preferably high to the reflectivity of transmitted light, and with the first resin layer 61 and
The adhesion of second resin layer 63 is high.For example, the conductive metal material for forming threadiness portion 62 be preferably aluminium, silver, platinum, chromium etc. or
Their alloy etc. of person, but it is not limited to these.
Second resin layer 63 preferably has characteristic same as the first resin layer 61.That is, the characteristic of the second resin layer 63 is excellent
Be selected in that the visible light region transparency is high, and heat resistance is high, and with glass substrate 20, threadiness portion 62, the first resin layer 61 and third tree
The adhesion of lipid layer 64 is high.Forming the material of the second resin layer 63 can enumerate：Acrylic acid series, carbamate system, gathers epoxy
The uv curing resins such as imide series or heat-curing resin.Second resin layer 63 is contacted with the upper surface in threadiness portion 62,
As a result, when WG polarizing films 200 fall etc., impact can be mitigated.That is, linear portion 62 can be protected, and increase the strong of WG polarizing films 200
Degree.
So-called " visible light " refers to the light of the wavelength with 380nm~780nm, the present invention in protective film it is visible
The transmissivity of light is preferably set to 5% or less.
Third resin layer 64 preferably has the function of blocking visible light, it may have by line-like area 126 and line-like area 126
The effect separated, and the transmissivity that light is faced upward or downward relative to the surface of third resin layer 64 is 1% or less.In addition, the
The preferred heat resistance of the characteristics of three resin layers 64 is high, and with glass substrate 20, threadiness portion 62, the first resin layer 61 and the second resin layer
63 adhesion is high.The material of formation third resin layer 64 is such as usable by colorings such as the particles, pigment, dyestuff of carbon carbon black
The composition that agent and resin, polymerizable monomer, Photoepolymerizationinitiater initiater etc. mix.It is coated with this coloured composition, utilizes light
Or coated film hardening can be formed the resin layer of black by heat.As the material for forming third resin layer 64, preferably with described
The resin layer that mode is formed, but it is not limited to these.
As the composition for forming third resin layer 64, for example, can be used Japanese Patent Laid-Open 2006-053569 bulletins,
Composition described in WO2009/010521 bulletins, Japanese Patent Laid-Open 2014-146029 bulletins etc..
By being set as structure as described above, line-like area 126 and third resin layer 64 and line-like area 126 may make
Adhesion is high, and the gap of line-like area 126 and line-like area 126 will not transmit visible light.I.e., it is possible to provide one kind inhibiting leakage
The WG polarizing films of light.In addition, the coincidence ampleness without considering line-like area 126 and line-like area 126, rank is overlapped without minding
Difference.I.e., it is possible to provide a kind of WG polarizing films that the configuration freedom of line-like area 126 compared with the past increases.
Fig. 2 (B) shows the upper surface for not utilizing the second resin layer 63 to cover linear portion 62 compared with the construction of Fig. 2 (A)
Structure.Construction in addition to this is identical as Fig. 2 (A), and and the description is omitted.Furthermore in the same manner as Fig. 2 (A), show in Fig. 2 (B)
The side end for having gone out line-like area 126 is the example of the second resin layer 63, but the side end of line-like area 126 can also be threadiness
Portion 62.In the case of described, linear portion 62 is contacted with the side of third resin layer 64.The WG polarizing films 200 of the construction of Fig. 2 (B) exist
Upper surface can be not easily susceptible to the refractive effect of the light of upper surface, and transmitted light is largely emitted as a result, without the second resin layer 63.
That is, the utilization ratio of light can be promoted.In addition, it is possible to provide a kind of to inhibit the configuration of light leakage and line-like area compared with the past 126 certainly
The WG polarizing films increased by degree.
Fig. 2 (C) shows compared with the construction of Fig. 2 (B) and is not filled in linear portion 62 and adjoining using the second resin layer 63
Linear portion 62 between and the structure that is contacted with third resin layer 64 of threadiness portion 62.Construction in addition to this is identical as Fig. 2 (B),
And the description is omitted.The WG polarizing films 200 of the construction of Fig. 2 (C) in the upper surface in linear portion 62 and side without the second resin layer 63,
As a result, compared with having the case where the second resin layer 63, it can be not easily susceptible to the refractive effect of the light of the second resin layer 63, and will transmission
Wide measure is penetrated.That is, the utilization ratio of light can be promoted further.In addition, it is possible to provide a kind of inhibition light leakage and line compared with the past
The WG polarizing films that the configuration freedom in shape region 126 increases.
Fig. 3 (A), Fig. 3 (B) and Fig. 3 (C) are the schematic cross sections between the A1 and A2 of WG polarizing films 200 shown in FIG. 1
Figure.Fig. 3 (A), Fig. 3 (B) and Fig. 3 (C) are respectively illustrated the structure between line-like area 126 and line-like area 126 from Fig. 2
(A), the third resin layer 64 that Fig. 2 (B) and Fig. 2 (C) are respectively shown in is changed into comprising the material with refractive anisotrop
The example of layer (the 4th resin layer) 65.In addition to this, identical as structure shown in Fig. 2 (A), Fig. 2 (B) and Fig. 2 (C), omission is said
It is bright.
Including layer (the 4th resin layer) 65 of the material with refractive anisotrop is preferably with the work(for blocking visible light
It can, it may have the effect for separating line-like area 126 and line-like area 126, and the transmissivity of light is 1% or less.Additionally, it is preferred that
Heat resistance is high, and high with the adhesion of glass substrate 20, threadiness portion 62, the first resin layer 61 and the second resin layer 63.For example, can
Use lysotropic liquid crystal or thermotropic liquid crystal etc..Lysotropic liquid crystal is the compound of water and solvent or solution and solvent, such as can pass through
Surfactant and water or solution are mixed to mesomorphic state, and by adjusting the concentration of solvent or smear mixed liquor
Direction and make liquid crystal aligning.Thermotropic liquid crystal is for example shown as the action of interphase and stabilization in certain temperature range, and passes through
The variation of temperature and become mesomorphic state.Such as lysotropic liquid crystal is smeared between line-like area 126 and line-like area 126, and edge
Smearing direction makes it be orientated and cure, and thus can cover visible light.Also will include that there is folding sometimes furthermore in this specification
The layer 65 for penetrating the anisotropic material of rate is recorded as the 4th resin layer 65.
WG polarizing films 200 shown in Fig. 3 (A) may make line-like area 126 and the 4th resin layer 65 and line-like area 126
Adhesion is high, and the gap of line-like area 126 and line-like area 126 will not transmit visible light.I.e., it is possible to provide one kind inhibiting leakage
The WG polarizing films of light.In addition, the coincidence ampleness without considering line-like area 126 and line-like area 126, rank is overlapped without minding
Difference.I.e., it is possible to provide a kind of WG polarizing films that the configuration freedom of line-like area 126 compared with the past increases.
WG polarizing films 200 shown in Fig. 3 (B), without the second resin layer 63, can be not easily susceptible to upper surface as a result, in upper surface
The refractive effect of light.That is, the utilization ratio of light can be promoted.In addition, it is possible to provide a kind of WG polarizing films inhibiting light leakage.
WG polarizing films 200 shown in Fig. 3 (C) in the upper surface in linear portion 62 and side without the second resin layer 63, as a result, with
The case where having the second resin layer 63, is compared, and the refractive effect of the light of the second resin layer 63 can be not easily susceptible to.That is, can further be promoted
The utilization ratio of light.In addition, it is possible to provide a kind of WG polarizing films inhibiting light leakage.
Fig. 4 (A), Fig. 4 (B) and Fig. 4 (C) are the schematic cross sections between the A1 and A2 of WG polarizing films 200 shown in FIG. 1
Figure.Fig. 4 (A), Fig. 4 (B) and Fig. 4 (C) are respectively illustrated from the structure that Fig. 3 (A), Fig. 3 (B) and Fig. 3 (C) are respectively shown in
Four resin layers 65 are not only formed between line-like area 126 and line-like area 126, are also formed in the upper surface of line-like area 126
Example.In addition to this, identical as structure shown in Fig. 3 (A)~Fig. 3 (C), it omits the description.Furthermore in Fig. 4 (A), Fig. 4 (B)
And in Fig. 4 (C), in order to be easy the 4th resin layer 65 of observation, the 4th resin layer 65 of the upper surface of line-like area 126 will be formed in
Layer thickness illustrate thicker than practical.4th resin layer 65 is the material for having light-proofness, with light through the upper of line-like area 126
4th resin layer 65 is formed thin by the mode on surface.
WG polarizing films 200 shown in Fig. 4 (A), Fig. 4 (B) and Fig. 4 (C) are sharp from structure shown in Fig. 3 (A)~Fig. 3 (C)
The upper surface of line-like area 126 is also covered with the 4th resin layer 65, as a result, in addition in Fig. 3 (A), Fig. 3 (B) and Fig. 3 (C)
Other than feature described in explanation, it can also increase the intensity of polarizing film.
The section shape in threadiness portion 62 possessed by the polarizing film of an embodiment of the present invention instantiates as rectangular example
Son, but shape is not limited to rectangle.The section shape in linear portion 62 can be square, or can be trapezoidal, also may be used
To be triangle, can be used without departing from the spirit and scope of the invention variously-shaped.
As described above, it is possible to provide a kind of material that visible light can be covered by being arranged between line-like area and line-like area
Material etc. inhibits light leakage, WG polarizing films.In addition, it is possible to provide more than a kind of coincidence without considering line-like area and line-like area
WG polarizing films abundant and that scale need not be overlapped.
(second embodiment)
In present embodiment, the production process of the polarizing film of an embodiment of the present invention is illustrated.Furthermore making side
Method is not limited to the method, and the commonly used method in the technical field of the present invention can be used.Furthermore about with first
The identical structure of embodiment, omits the description sometimes.
Fig. 5 is the flow chart of the production method for the WG polarizing films for indicating an embodiment of the present invention.
The production method of WG polarizing films includes：The step 20 (S20) started from；Resin layer is formed on the first substrate
Step 21 (S21)；The step 22 (S22) of line-like area is formed on the resin layer；The step that first substrate is detached with line-like area
Rapid 23 (S23)；The step 24 (S24) multiple line-like areas being arranged on second substrate；It is more on being arranged in second substrate
The step 25 (S25) of the protective film of masking visible light is formed between a line-like area；And terminate the step 26 (S26) made.
Fig. 6 (A)~Fig. 6 (F) shows to illustrate out in the production method of the WG polarizing films of an embodiment of the present invention
The step 20 (S20) of beginning making, forms linear area at the step 21 (S21) for forming resin layer on the first substrate on the resin layer
The step 22 (S22) in domain and the step 23 (S23) that detaches first substrate with line-like area, specific sectional view.
Fig. 6 (A) includes：The step 20 (S20) that starts from and the step for forming the first resin layer 61 on the first substrate
Rapid 21 (S21).Specifically, after the S20 started from, the first resin layer 61 is formed on glass substrate 121.First tree
Lipid layer 61 has the bumps for mitigating glass substrate 121 and makes and the work that is formed by the face that linear portion 62 contacts later and becomes flat
With.The method of the first resin layer 61 is formed such as usable silk screen print method, spin-coating method or infusion process.
Fig. 6 (B)~Fig. 6 (E) includes the step 22 (S22) for forming line-like area on the resin layer.It shows to use photoetching skill
The method that art forms linear portion 62.Specifically, metallic conduction film 66 is formed a film on the first resin layer 61, and be coated with photic
Resist 67.In turn, it is exposed using mask 68 and using photoetching technique to photoresist 67.Metallic conduction film 66
Film forming for example can be used using chemical vapor deposition (chemical vapor deposition, CVD) device etc. chemically
The method of formation or the method physically formed using vacuum vapour deposition, sputtering method, ion plating method etc..In addition, coating
The method of photoresist 67 is such as usable spin-coating method or infusion process.Develop to exposed photoresist 67,
Photoresist 67 is etched as mask, and photoresist 67 is removed, thus can form linear portion 62.Then
Form the second resin layer 63.In this way, line-like area 126 can be formed.Furthermore the step 22 of line-like area is formed on the resin layer
In, the formation in linear portion 62 shows the method using photoetching technique, but as long as be the present invention technical field in usually made
Method then can be used.For example, it is also possible to form linear portion 62 using electron beam lithography system.Furthermore in photoresist
In the case that agent uses negative resist, the part for having irradiated light can be left behind by developing.On the other hand, photic anti-
Agent is lost using in the case of positive-workingresist, can be left behind the part of non-irradiation light by developing.Furthermore Fig. 6 (B) is shown
Use the example of negative resist.
Fig. 6 (F) includes the step 23 (S23) for detaching glass substrate 121 with line-like area 126.Glass substrate 121 and line
The method being mechanically ripped can be used in the separation in shape region 126, or can also be further in the upper surface of the second resin layer 63
Film is attached, and 121 entire surface irradiation laser of glass substrate is removed, usual institute in the technical field of the present invention can be used
The method used.
Fig. 7 (A)~Fig. 7 (F) shows to illustrate out in the production method of the WG polarizing films of an embodiment of the present invention
The step 20 (S20) of beginning making, forms linear area at the step 21 (S21) for forming resin layer on the first substrate on the resin layer
The step 22 (S22) in domain and the step 23 (S23) that detaches first substrate with line-like area, with Fig. 6 (A)~Fig. 6 (F)
Different specific sectional views.It omits and Fig. 6 (A)~identical explanations of Fig. 6 (F).
Fig. 7 (B)~Fig. 7 (E) includes the step 22 (S22) for forming line-like area on the resin layer.It shows to press using nanometer
The method that print method forms linear portion 62.Nano-imprint method is known technology, omits detailed description.For example, nano-imprint method has
The method for being produced on quartz glass etc. and forming irregular mold, and pattern is formed using the mold.For example, using sputtering
Device is by aluminium film in being used as metallic conduction film 66 on the first resin layer 61.In turn, it is coated on metallic conduction film 66
The mold 69 is pressed on photoresist by photoresist 67, and irradiates ultraviolet light (ultraviolet, UV) light.It connects
It, regard photoresist 67 as mask, be etched, and photoresist 67 is removed, thus can form linear portion 62.Separately
Outside, as another example of nano-imprint method, it can also use and be coated with resist on metallic conduction film 66, and by the mold
69 press on resist, make the method for resist heat cure.The specific example of nano-imprint method is disclosed in Japanese Patent Laid-Open
In No. 2012/0140148 specification of 2016-103001 bulletins or U.S. Patent Application Publication No..Furthermore Fig. 7 (F) can be adopted
With in the same production method of content illustrated in Fig. 6 (F).
Fig. 8 (A)~Fig. 8 (D) in the production method of the WG polarizing films of an embodiment of the present invention, show to illustrate by
Multiple line-like areas be arranged in the step 24 on second substrate (S24), multiple line-like areas on being arranged in second substrate it
Between formed masking visible light protective film step 25 (S25) and terminate the step 26 (S26) made, specific sectional view.
Fig. 8 (A), Fig. 8 (B) and Fig. 8 (C) or Fig. 8 (A), Fig. 8 (B) and Fig. 8 (D) include：Multiple line-like areas are arranged
The step 24 (S24) being listed on second substrate；It is visible that masking is formed between multiple line-like areas on being arranged in second substrate
The step 25 (S25) of the protective film of light；And terminate the step 26 (S26) made.
Fig. 8 (A) and Fig. 8 (B) shows the step 24 (S24) being arranged in multiple line-like areas 126 on glass substrate 20.Example
Such as, the method that pickup line-like area 126 can also be used and be arranged on glass substrate 20.Aligning method is not limited to the side
Method.In addition, when arrangement bonding agent can also be smeared on the first resin layer 61 of line-like area 126.
Then, formation masking can between Fig. 8 (C) and Fig. 8 (D) shows multiple line-like areas on being arranged in second substrate
The step 25 (S25) of light-exposed protective film and the step 26 (S26) for terminating making.Fig. 8 (C) shows to form the 4th resin layer
65 method.For example, using liquid crystal Dropping feeder, ink-jet printer, screen process press, slit coater, nozzle dispensers
4th resin layer 65 is coated between line-like area 126 and line-like area 126 and line by (nozzle dispenser) etc.
The upper surface in shape region 126.The material for forming the 4th resin layer 65 is, for example, lysotropic liquid crystal or thermotropic liquid crystal.As making molten cause liquid
The method that brilliant or thermotropic liquid crystal is orientated, has the method using alignment agent and is directly coated with specific lysotropic liquid crystal and makes liquid crystal aligning
Method.
As the method for using alignment agent, can be taken described in progress by the way that alignment agent to be coated on substrate to and made its solidification
Liquid crystal drop is added in alignment films later to make liquid crystal aligning by the friction to film.Tool as this method using alignment agent
Body example can be enumerated：Japanese Patent Laid-Open 2015-26050 bulletins, Japanese Patent Laid-Open 2017-16089 bulletins etc..
As the direct method for being coated with lysotropic liquid crystal and making liquid crystal aligning, the water-soluble chemical combination for capableing of self-organization can be used
Object, as specific compound, can enumerate and side chain upright and outspoken comprising main polymer chains such as conjugation based polymers has display water-soluble
The composition of the polymer of the hydrophily base of property.In addition, also may include dichroism pigment compound.This compound will be included
Composition is coated on base material and is heated, the moisture removal that will be remained in film, thus can be formed with optics respectively to different
The anisotropic membrane of property.
As the concrete example of this direct method for being coated with lysotropic liquid crystal and making liquid crystal aligning, can enumerate：WO2007/
No. 080419 bulletin, WO2009/130675 bulletins, WO2012/007923 bulletins etc..
Furthermore such as in the same manner as Fig. 4 (A), Fig. 4 (B) and Fig. 4 (C), in Fig. 8 (C), in order to be easy the 4th resin layer of observation
65, the layer thickness for the 4th resin layer 65 that also will be formed in the upper surface of line-like area 126 illustrates thicker than practical.4th resin
Layer 65 is the material with light-proofness, forms the 4th resin layer 65 in such a way that light is through the upper surface of line-like area 126
It is thin.In addition, with Fig. 3 (A), Fig. 3 (B) and Fig. 3 (C) it is equally possible that not forming the 4th tree in the upper surface of line-like area 126
Lipid layer 65.As long as example, using the galley for being provided with slit between line-like area 126 and line-like area 126, in linear area
The 4th resin layer 65 is formed between domain 126 and line-like area 126 forms the 4th resin layer without the upper surface in line-like area 126
65.Fig. 8 (D) shows to form the side of third resin layer 64 by ink-jet between line-like area 126 and line-like area 126
Method.Furthermore the method that protective film is formed between line-like area is not limited to these methods.For example, it is also possible to make galley
And protective film is formed by silk-screen printing.
Utilize production method as described above, it is possible to provide a kind of light leakage inhibited between line-like area and line-like area
WG polarizing films.In addition, it is possible to provide a kind of there is no the WG polarizing films of the coincidence scale of line-like area and line-like area.
(third embodiment)
In present embodiment, the liquid crystal display device with wire grid polarizer of an embodiment of the present invention is said
It is bright.Furthermore it about structure identical with first embodiment and second embodiment, omits the description sometimes.
Fig. 9 is the schematic plan view of the structure for the liquid crystal display device 300 for indicating an embodiment of the present invention.
Liquid crystal display device 300 includes：Glass substrate 123, display area 104, gate side driver circuit 108 and gate electrode side
Driving circuit 109, source side drive circuit 112, connector 114 and integrated circuit 116.
Display area 104, gate side driver circuit 108 and gate side driver circuit are formed on glass substrate 123
109, source side drive circuit 112.Connector 114 is connected to glass substrate 123.Integrated circuit 116 is arranged in connector 114
On.The size of display area 104 can also be coordinated to change the quantity of connector 114.
Display area 104 includes multiple pixels 106.What multiple pixels 106 were intersected along a direction and with a direction
Direction arranges.The number of the arrangement of multiple pixels 106 is arbitrary.For example, can by along the direction in a direction be set as X-direction, along
The direction in the direction intersected with a direction is set as Y-direction, arranges m pixel 106 in the X direction, arranges n in the Y direction
Pixel 106.M and n is separately the natural number more than 1.It includes liquid that pixel 106, which respectively has display element, display element,
Crystal cell.
For example, display element corresponding with red (R), green (G) and blue (B) this three primary colors can be distributed respectively three
In a pixel.By the voltage for supplying 256 grades to each pixel, it is possible to provide panchromatic display device.In addition, multiple pixels 106
Bar shaped (stripe) arrangement for example can be used in arrangement.Furthermore the arrangement of multiple pixels 106 is not limited to the arrangement, can also
Using the arrangement etc. of triangle (Delta) arrangement or corrugated tile (Pentile) etc.Furthermore to an embodiment of the present invention
In liquid crystal display device 300, the example for being arranged as bar shaped arrangement of multiple pixels 106 illustrates.
Connector 114 has is supplied in gate electrode side by video signal, the timing signal of control circuit action and power supply etc.
The effect of driving circuit 108 and gate side driver circuit 109, source side drive circuit 112 and integrated circuit 116.Connector
114 can also use flexible print circuit (flexible printed circuit, FPC).Video signal, control circuit are moved
Timing signal and power supply of work etc. from outside liquid crystal display device 300 circuit or device supplied via connector 114
Award gate side driver circuit 108 and gate side driver circuit 109, source side drive circuit 112 and integrated circuit 116.
Gate side driver circuit 108 and gate side driver circuit 109, source side drive circuit 112 and integrated circuit 116
With using supplied video signal, the timing signal of control circuit action and each pixel 106 of the driving such as power supply and by shadow
As the effect being shown in display area 104.
Gate side driver circuit 108 and gate side driver circuit 109 can not also whole shapes with source side drive circuit 112
At on glass substrate 123.For example, it is also possible to by the part of functions comprising gate side driver circuit Yu source side drive circuit
Integrated circuit (integrated circuit, IC) configure on glass substrate 123 or on connector 114.Furthermore Fig. 9
Shown in integrated circuit 116 included in liquid crystal display device 300 there is gate side driver circuit and source side drive circuit
Part of functions.
Figure 10 is indicated included in the liquid crystal display device 300 with wire grid polarizer of an embodiment of the present invention
The schematic plan view of pixel.Pixel shown in Figure 10 can be applied to along perpendicular to the direction of attached drawing, i.e. along perpendicular to glass
The direction of substrate 123 applies voltage to control vertical orientation (Vertical Alignment, VA) mode or the torsion of liquid crystal cell
Qu Xianglie (Twisted Nematic, TN) mode.Furthermore Figure 10 color filter layers not shown, first orientation film 80, liquid crystal
Layer 90, second orientation film 100, the second transparent conductive layer 110, glass substrate 123 and polarizing film 130.In aftermentioned liquid crystal
The layer and film etc. are illustrated in the production method of showing device 300.
Pixel 106 shown in Fig. 10 includes：Thin film transistor (TFT) 190, capacity cell 196, source signal line 191, grid letter
Number line 192, capacitance equipotential line 193 and the first transparent conductive floor 70.Thin film transistor (TFT) 190 includes：Semiconductor layer 32, grid electricity
Pole 34, source-drain electrode 36 and source-drain electrode 38 and the first opening portion 39a and the first opening portion 39b.Source-drain electrode 36 and source and drain electricity
Pole 38 is electrically connected at semiconductor layer 32 via the first opening portion 39a and the first opening portion 39b.First transparent conductive layer 70
It is electrically connected at source-drain electrode 38 via the second opening portion 194.By source-drain electrode 38 and aftermentioned gate insulating film 33, capacitance electricity
Bit line 193 forms capacity cell 196.Source-drain electrode 36 is electrically connected with source signal line 191.Gate electrode 34 and grid signal
Line 192 is electrically connected.By applying voltage respectively with aftermentioned second transparent conductive layer 110 to the first transparent conductive layer 70,
And electric field is generated on the direction vertical with glass substrate 123, liquid crystal cell is controlled included in liquid crystal layer 90, to
Liquid crystal display device 300 is capable of displaying image.
Figure 11 is indicated included in the liquid crystal display device 300 with wire grid polarizer of an embodiment of the present invention
Another schematic plan view of pixel 106.Pixel shown in Figure 11 can be applied to along the side for being parallel to glass substrate 123
In-plane switching (In Plane Switching, IPS) mode of liquid crystal cell is controlled to voltage is applied.Furthermore Figure 11 does not scheme
Show color filter layers, first orientation film 80, liquid crystal layer 90, second orientation film 100, the second transparent conductive layer 110, glass base
Plate 123 and polarizing film 130.The layer and film etc. are illustrated in the production method of aftermentioned liquid crystal display device 300.
Pixel 106 shown in Figure 11 includes：Thin film transistor (TFT) 190, capacity cell 196, source signal line 191, grid letter
Number line 192, capacitance equipotential line 193, the first transparent conductive floor 70, public equipotential line 197.Thin film transistor (TFT) 190 includes：Partly lead
Body layer 32, gate electrode 34, source-drain electrode 36 and source-drain electrode 38, the first opening portion 39a and the first opening portion 39b.Source-drain electrode
36 and source-drain electrode 38 be electrically connected at semiconductor layer 32 via the first opening portion 39a and the first opening portion 39b.First light transmission
Property conductive layer 70 is electrically connected at source-drain electrode 38 via the second opening portion 194.By source-drain electrode 38 and aftermentioned gate insulator
Film 33, capacitance equipotential line 193 form capacity cell 196.Source-drain electrode 36 is electrically connected with source signal line 191.Gate electrode
34 are electrically connected with gate line 192.There are public equipotential line 197 all pixels 106 to including in display area 104 to supply
To the effect of public current potential.Public equipotential line 197 can be shared by all pixels 106 for including in display area 104, or can be with
It supplies, can also be shared according to the pixel of Y-direction according to the pixel of X-direction.By to the first transparent conductive layer 70 with
Public equipotential line 197 applies voltage respectively, and electric field is generated on the direction parallel with glass substrate 123, institute in liquid crystal layer 90
Including liquid crystal cell controlled, to liquid crystal display device 300 it is capable of displaying image.
Figure 12 is indicated included in the liquid crystal display device 300 with wire grid polarizer of an embodiment of the present invention
The schematic plan view of wire grid polarizer in pixel 106.Paper towards Figure 10 and Figure 11 and in upper surface overlay chart 12.For
Easy observation attached drawing, Figure 10 and Figure 11 and Figure 12 is separately depicted.About the width in linear portion 62 and threadiness portion 62 and threadiness
The interval in portion 62, for easy understanding and by the size for being sized to identify in the accompanying drawings, but size be not limited to it is described
Size.As long as the width in linear portion 62 is thinner than the wavelength of incident light.
In addition, Figure 12 also shows that third resin layer 64 or the 4th resin layer between line-like area 126 and line-like area 126
65.Third resin layer 64 or the 4th resin layer 65 be with on the direction of 65 vertical of third resin layer 64 or the 4th resin layer with
The mode that source signal line 191 and gate line 192 are overlapped configures.Third resin layer 64 or the 4th resin layer 65 are believed than source electrode
The width of number line 191 and gate line 192 is thick.Source signal line and gate line are covered by protective film, can inhibit
Light leakage.
By being set as structure as described above, the display device with WG polarizing films can prevent light leakage.Therefore, it is possible to provide one
The display device of the light and shade difference of kind black and white or black clear with the aberration of each color etc. and display distinctness image.
(the 4th embodiment)
In present embodiment, the production method of the liquid crystal display device of an embodiment of the present invention is illustrated.Furthermore
It, to the identical structure of third embodiment, is omitted the description sometimes about with first embodiment.
Using Figure 13 or Figure 14 and Figure 15 (A), Figure 15 (B) to Figure 17, have WG inclined an embodiment of the present invention
The manufacturing method of liquid crystal display device 300 of piece 200 of shaking illustrates.
The manufacturing method of liquid crystal display device about an embodiment of the present invention, in the manufacture of liquid crystal display device
Using being illustrated for commonly used photoetching technique.Furthermore the system of the liquid crystal display device of an embodiment of the present invention
It makes and is not limited to photoetching technique, commonly used method in the technical field of the present invention can also be used.
Figure 13 is the system of liquid crystal display device 300 when indicating the dot structure of application drawing 10, with WG polarizing films 200
Make the schematic cross sectional view of method.It is by schematic cross section made of three pixel amplifications included in liquid crystal display device
Figure.Furthermore B1 and the B2 section of pixel shown in Figure 10 are equivalent to the right of attached drawing.
Figure 14 is the system of liquid crystal display device 300 when indicating the dot structure of application drawing 11, with WG polarizing films 200
Make the schematic cross sectional view of method.It is by schematic cross section made of three pixel amplifications included in liquid crystal display device
Figure.Furthermore C1 and the C2 section of pixel shown in Figure 11 are equivalent to the right of attached drawing.
Show third resin layer 64 Chong Die with photomask on the direction of the surface vertical of photomask in Figure 13 and Figure 14
Example.Though in addition, show the width of photomask 40 example wider than the width of third resin layer 64 in Figure 13 and Figure 14,
The width of photomask 40 can also be narrower than the width of third resin layer 64.In liquid crystal display device 300 other than photomask 40
Also there is third resin layer 64, can compensate in the step 24 (S24) of arrangement line-like area 126 line-like area 126 as a result, towards substrate
Anawgy accuracy.Therefore, it is possible to provide a kind of display device with the WG polarizing films for preventing light leakage.Here, photomask 40 be
Commonly used black matrix in liquid crystal display device.
Figure 15 (A), Figure 15 (B) are the manufactures for indicating the liquid crystal display device 300 with WG polarizing films 200 shown in Figure 14
The flow chart of method.
First, as shown in Figure 15 (A), thin film transistor (TFT) (thin film transistor, TFT) array 30 is formed in
On glass substrate 123.Tft array 30 includes：Basilar memebrane 31, semiconductor layer 32, gate insulating film 33, gate electrode 34, interlayer film
35, source-drain electrode 36 and source-drain electrode 38, the first opening portion 39a and the first opening portion 39b, capacitance equipotential line 193 and interlayer
Film 37.Thin film transistor (TFT) 190 and capacity cell 196 are formed on tft array 30.
Interlayer film 37 have to whens forming film, wiring and the transistor etc. compared to interlayer film 37 and by lower layer it is concave-convex into
The effect that row mitigates.Therefore, it is formed by film after interlayer film 37 or pattern may be formed on flat face.Form interlayer film
The characteristic of 37 material is preferably in the high material of the visible light region transparency, is the high material of heat resistance, and and source-drain electrode
36 and source-drain electrode 38, the first transparent conductive layer 70, the adhesion of public equipotential line 197 it is high.The material of interlayer film 37 can be adopted
With the material with the material identical shown in the first resin layer 61 or the second resin layer 63.For example, can be used comprising acrylic acid
It is the photosensitive polymer combination of resin, polyimides system resins etc..
The forming method of tft array 30, the constructing of thin film transistor (TFT) 190 and capacity cell 196, each film, layer and each portion
Known person can be used in the material divided.That is, commonly used method, construction and material in technical field of the invention can be used.
Then, it as shown in Figure 15 (B), is formed the first transparent conductive layer 70 being electrically connected with source-drain electrode 38
Second opening portion 194.Second opening portion 194 makes interlayer film 37 be open.In a manner of the upper surface for contacting interlayer film 37 and side wall
Configure the first transparent conductive layer 70.In the process for forming the first transparent conductive layer 70, public equipotential line 197 and first is thoroughly
Photosensitiveness conductive layer 70 is formed in same layer.First transparent conductive layer 70 has following effect：Connect with the source-drain electrode 38 of pixel
It connects, and application and the comparable voltage of video signal, is driven possessed by liquid crystal layer 90 using the electric field with public equipotential line 197
Liquid crystal cell.Formed the material of the first transparent conductive layer 70 for example can be used tin indium oxide (Indium Tin Oxide,
ITO), indium zinc oxide (Indium Zinc Oxide, IZO) etc. makes the material that light penetrates.The shape on the first transparent conductive layer 70
At first orientation film 80.Form material resin such as using polyimides system of first orientation film 80.Furthermore in the first light transmission
Property conductive layer 70 and public equipotential line 197 and first orientation film 80 between there may be being formed with the layer of photomask, or also may be used
There is the layer for being formed with inorganic compound.Photomask have the function of stop visible light, inorganic compound can prevent moisture or
The intrusion of impurity.Here, the substrate being formed with until first orientation film 80 on glass substrate 123 is denoted as TFT side substrate.
Then, to being illustrated across the production method of liquid crystal layer 90 and the substrate of the side opposite with TFT side substrate.This
In, the substrate of the side opposite with TFT side substrate is denoted as opposite sides substrate.
As shown in figure 16, opposite sides substrate is taken by glass substrate 120, photomask 40, color filter layers and second
It is constituted to film 100, wherein color filter layers include red color filter lamella 50, green color filter layers 51 and blue
Color filter layers 52.Such as metallic conduction film can be formed a film and form photomask 40 using photoetching technique.In turn, it is formed
Color filter layers.As long as suitably selecting the formation sequence of each color filter layers.For example, red color filter can be formed
Lamella 50 forms green color filter layers 51, and forms blue color filter layer 52.Each color filter layers are arranged to
It is contacted with photomask 40.Using photomask and light can also be utilized after the material coating that will form each color filter layers
Lithography forms each color filter layers.Furthermore forming method is not limited to the method.In turn, by second orientation film 100
It is formed in entire surface.Form material resin such as using polyimides system of second orientation film 100.Second orientation film 100 has
Play the role of protecting color filter layers.For example, using sealing material etc. and sandwich liquid crystal layer 90 will be as formed
Opposite sides substrate be bonded with TFT side substrate.In turn, by will have the WG polarizing films 200 of glass substrate 122 to be fitted in glass
On substrate 120, liquid crystal display device 300 can be made.
Furthermore as shown in figure 17, can also prepare two panels has the WG polarizing films 200 of glass substrate 122, and is bonded respectively
On glass substrate 120 and glass substrate 123.
In addition, in the dot structure of application drawing 11, liquid crystal display device with WG polarizing films 200 shown in Figure 14
In 300 manufacturing method, in the process for forming the first transparent conductive layer 70, public equipotential line 197 is not formed.In addition,
The second transparent conductive layer 110 is formed between color filter layers and glass substrate 120.Second transparent conductive layer 110 has
Following effect：Included to the liquid crystal layer 90 being configured between the second transparent conductive layer 110 and the first transparent conductive layer 70
Liquid crystal cell vertically apply voltage to control liquid crystal cell.Forming the material of the second transparent conductive layer 110 can for example make
Make the material that light penetrates with ITO, IZO etc..Second orientation film 100 has and makes the second transparent conductive layer 110 and be formed in and liquid
The effect that first transparent conductive layer 70 of the opposite side of crystal layer 90 is not turned on, insulate.
By using production method as described above, it is possible to provide a kind of display dress with the WG polarizing films for preventing light leakage
It sets.
(the 5th embodiment)
In present embodiment, the 4th resin layer 65 used in the liquid crystal display device to an embodiment of the present invention
An example illustrates.As described above, the 4th resin layer 65 is protective film, and to include the material with refractive anisotrop
Layer.Furthermore it, to the identical structure of the 4th embodiment, is omitted the description sometimes about with first embodiment.
As the concrete example of lysotropic liquid crystal, the water soluble compound of self-organization is can be used with liquid crystal liquid crystal property and be capable of, is made
For specific compound, can enumerate and side chain upright and outspoken comprising main polymer chains such as conjugation based polymers has the water-soluble parent of display
The composition of the polymer of aqueous base.In addition, also may include guest-host type dichroism pigment compound.Guest-host type dichroism pigment
It is polycyclic compound to close object, the absorption change with big absorbance and orthogonal short-axis direction on molecular long axis direction
It is small, therefore two or more different refractive index can be shown in a molecule.By that comprising this compound, can make optically
With anisotropic film.
This lysotropic liquid crystal can also enumerate WO2007/080419 bulletins, WO2009/130675 public affairs as concrete example
Report, WO2012/007923 bulletins, WO2014/174381 bulletins, WO2015/162495 bulletins etc..As guest-host type two
The concrete example of color pigment compound can enumerate WO2011/024892 bulletins etc..
By using material as described above, it is possible to provide a kind of display device with the WG polarizing films for preventing light leakage.
The embodiments of the present invention can be suitably combined in mutual reconcilable range.In addition, with each implementation
Based on mode, those skilled in the art carry out structural element addition, deletion or design alteration and winner or carry out process
Addition, omission or condition change and winner, as long as have the present invention purport, then be also contained in the scope of the present invention.
Even in addition, the function and effect different from the function and effect brought by each embodiment of the present invention, for
According to the record of this specification clear person or those skilled in the art can easily dopester, be also construed to by the present invention
The function and effect brought.
Claims (21)
1. a kind of polarizing film, which is characterized in that including：
It the linear portion that extends in one direction and is arranged on the direction parallel with the extending direction in threadiness portion multiple
Multiple line-like areas in the threadiness portion, and
The threadiness portion has the minimal wave length width below from external incident visible light,
Contain protective film between the multiple line-like area,
The protective film covers visible light.
2. polarizing film according to claim 1, which is characterized in that
The lower surface in the threadiness portion contacts the first resin layer,
The side in the threadiness portion contacts the second resin layer with upper surface,
The side of first resin layer contacts the protective film with the side of second resin layer.
3. polarizing film according to claim 1, which is characterized in that
The second resin layer is provided between the threadiness portion, the lower surface in the threadiness portion contacts the first resin layer,
The side of first resin layer contacts the protective film with the side of second resin layer.
4. polarizing film according to claim 1, which is characterized in that
The lower surface in the threadiness portion contacts the first resin layer,
The side in the threadiness portion contacts the protective film with the side of first resin layer.
5. polarizing film according to claim 1, which is characterized in that
The protective film covers the line-like area.
6. polarizing film according to claim 1, which is characterized in that
The threadiness portion includes conductive metal material.
7. polarizing film according to claim 1, which is characterized in that
The protective film is resin.
8. polarizing film according to claim 7, which is characterized in that
The protective film is the resin for including liquid crystal.
9. polarizing film according to claim 1, which is characterized in that
The protective film includes the material with refractive anisotrop.
10. a kind of production method of polarizing film, which is characterized in that including：
The process for forming resin layer on the first substrate；
The linear portion extended in one direction is formed on the resin layer and parallel with the extending direction in threadiness portion
Direction on arrange multiple threadiness portions line-like area process；
The process that the first substrate is detached with the line-like area；
Multiple line-like areas are arranged in the process on second substrate；And
The process that the protective film of masking visible light is formed between multiple line-like areas on being arranged in the second substrate.
11. the production method of polarizing film according to claim 10, which is characterized in that
The process for forming the line-like area includes following process：
Metallic conduction film is formed on the resin layer, and
The painting photoresist on the metallic conduction film,
Using photomask and using the light of the wavelength more shorter than the width in the threadiness portion, photoresist is exposed.
12. the production method of polarizing film according to claim 10, which is characterized in that
The process for forming the line-like area includes following process：
Metallic conduction film is formed on the resin layer, and
The painting photoresist on the metallic conduction film,
The figuratum face of the formation for forming figuratum mold is pressed on into the photoresist,
The light that the wavelength more shorter than the width in the threadiness portion is irradiated to the mold, to be exposed to photoresist.
13. the production method of polarizing film according to claim 10, which is characterized in that
The process for forming the protective film is carried out by ink-jet.
14. the production method of polarizing film according to claim 10, which is characterized in that
The process of the protective film is formed in addition to being formed between multiple line-like areas on being arranged in the second substrate
Other than protective film, also protective film is formed in the upper surface of the line-like area.
15. a kind of display device, which is characterized in that include：
Polarizing film, including：
Minimal wave length width below with incident visible light and the linear portion that extends in one direction and
Multiple line-like areas in multiple threadiness portions are arranged on the direction parallel with the extending direction in threadiness portion, and
Including being set between the multiple line-like area and covering the protective film of visible light；
Multiple pixels, in the direction extended in one direction and the side intersected with the direction extended in one direction
Arrangement upwards；And
Photomask, first substrate and second substrate.
16. display device according to claim 15, which is characterized in that
The protective film Chong Die with the photomask on the direction of the surface vertical of the photomask, and
The width of the protective film is narrower than the width of the photomask.
17. display device according to claim 15, which is characterized in that the pixel includes：
The source signal line that is formed parallel to the direction extended in one direction and
The gate line being formed parallel to the direction intersected with the direction extended in one direction, and
The source signal line Chong Die with the protective film on the direction of the surface vertical of the protective film,
The width of the source signal line is narrower than the width of the protective film.
18. display device according to claim 17, which is characterized in that
The gate line Chong Die with the protective film on the direction of the surface vertical of the protective film, and
The width of the gate line is narrower than the width of the protective film.
19. display device according to claim 15, which is characterized in that
With multiple photomasks, and
The multiple photomask includes：
With the Chong Die photomask in the line-like area and the line-like area on the direction of the surface vertical of the photomask
The photomask Chong Die with both protective films.
20. the display device according to any one of claim 16 to 19, which is characterized in that and then have：
Red color filter piece, green colored filter and blue color filter, and
The multiple photomask includes：
The photomask and the green colored filter contacted with the red color filter piece and the green colored filter
With the blue color filter contact photomask and with the blue color filter and the red color filter piece
The photomask of contact.
21. display device according to claim 15, which is characterized in that
The polarizing film configuration is at least one of the lower surface of the first substrate and the upper surface of the second substrate.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017021977 | 2017-02-09 | ||
| JP2017-021977 | 2017-02-09 | ||
| JP2018003388A JP2018128669A (en) | 2017-02-09 | 2018-01-12 | Polarizing plate, method for manufacturing polarizing plate, and display |
| JP2018-003388 | 2018-02-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108415113A true CN108415113A (en) | 2018-08-17 |
Family
ID=63126936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810126776.6A Pending CN108415113A (en) | 2017-02-09 | 2018-02-07 | The production method and display device of polarizing film, polarizing film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108415113A (en) |
-
2018
- 2018-02-07 CN CN201810126776.6A patent/CN108415113A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11231605B2 (en) | Display device comprising switchable anti-peeping device with light orientation layer | |
| US9575356B2 (en) | Polarizer, display substrate, display panel having the same and method of manufacturing the same | |
| TWI291578B (en) | Liquid crystal display | |
| KR101282323B1 (en) | Liquid crystal display | |
| TW589471B (en) | Electrooptical device and electronic apparatus | |
| KR102363676B1 (en) | Display device and manufacturing method thereof | |
| KR101288835B1 (en) | Liquid crystal display device and fabrication method thereof | |
| US20050195353A1 (en) | Liquid crystal display apparatus and method of manufacturing the same | |
| EP2781956A1 (en) | Display device | |
| US20060232728A1 (en) | Liquid crystal display and fabricating method thereof | |
| KR102416573B1 (en) | Display device and manufacturing method thereof | |
| KR100772940B1 (en) | A color filter for LCD and method for fabricating the same | |
| KR20060125008A (en) | Liquid crystal display panel and method of making the same | |
| JP2007025690A (en) | Method for manufacturing liquid crystal display | |
| KR20110072248A (en) | Thin film transistor substrate and method of fabricating the same | |
| KR102132929B1 (en) | Display device | |
| TW201837558A (en) | Reflective polarizing layer, wavelength conversion layer, and liquid crystal display device | |
| KR101541029B1 (en) | Color filter substrate, method of manufacturing the same, liquid crystal display panel having the color filter substrate, and method of manufacturing the liquid crystal display panel | |
| KR20100016823A (en) | Liquid crystal display | |
| KR101152142B1 (en) | Manufacturing method of liqiud crystal dsplay | |
| KR101230315B1 (en) | Mold for display device and manufacturing method of dsplay device using the same | |
| WO2016098268A1 (en) | Electrode-equipped color filter substrate, display device including that substrate and method for manufacturing that substrate | |
| US10852592B2 (en) | Liquid crystal display device including liquid crystal capsule and method of fabricating the same | |
| KR101297234B1 (en) | Display substrate and method of manufacturing thereof | |
| CN109976024A (en) | Colored filter substrate and its manufacturing method and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180817 |