JP5610664B2 - レジストがコーティングされたウエハの熱処理をインラインで監視及び制御する方法 - Google Patents
レジストがコーティングされたウエハの熱処理をインラインで監視及び制御する方法 Download PDFInfo
- Publication number
- JP5610664B2 JP5610664B2 JP2007255605A JP2007255605A JP5610664B2 JP 5610664 B2 JP5610664 B2 JP 5610664B2 JP 2007255605 A JP2007255605 A JP 2007255605A JP 2007255605 A JP2007255605 A JP 2007255605A JP 5610664 B2 JP5610664 B2 JP 5610664B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- resist
- hot plate
- hot plates
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 235000012431 wafers Nutrition 0.000 title claims description 168
- 238000000034 method Methods 0.000 title claims description 72
- 238000010438 heat treatment Methods 0.000 title claims description 68
- 238000012544 monitoring process Methods 0.000 title description 10
- 238000012545 processing Methods 0.000 claims description 90
- 238000004519 manufacturing process Methods 0.000 claims description 47
- 230000008569 process Effects 0.000 claims description 43
- 238000005259 measurement Methods 0.000 claims description 32
- 238000011161 development Methods 0.000 claims description 22
- 238000007689 inspection Methods 0.000 claims description 15
- 238000005457 optimization Methods 0.000 claims description 12
- 238000000149 argon plasma sintering Methods 0.000 claims description 8
- 230000010411 postconditioning Effects 0.000 claims 1
- 238000012360 testing method Methods 0.000 description 30
- 238000000576 coating method Methods 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 24
- 230000007246 mechanism Effects 0.000 description 22
- 238000001816 cooling Methods 0.000 description 14
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000012546 transfer Methods 0.000 description 9
- 238000000059 patterning Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 238000011068 loading method Methods 0.000 description 7
- 230000000737 periodic effect Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000009423 ventilation Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- 238000010511 deprotection reaction Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000112 cooling gas Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003223 protective agent Substances 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000013401 experimental design Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000013178 mathematical model Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000001314 profilometry Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/477—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
2 前方部分
3 後方部分
9 搬入/搬出用開口部
10 搬入/搬出部
11 処理部
12 インターフェース部
13 カセット
14 ウエハ
15 カセット
16 カセット
20 カセットテーブル
20a 突起
21 副アーム機構
22 主アーム機構
23 付属露光システム
23A リソグラフィ装置
23B 光散乱システム
24 第2副アーム機構
25 案内用レール
31 多段階処理ユニット群
32 多段階処理ユニット群
33 多段階処理ユニット群
34 多段階処理ユニット群
35 多段階処理ユニット群
36 レジストコーティングユニット
37 現像ユニット
38 カップ
39 冷却ユニット
40 接合ユニット
41 位置合わせユニット
42 拡張ユニット
43 プリベーキングユニット
44 ポストベーキングユニット
45 拡張冷却ユニット
46 ウエハ搬送システム
47 搬送用下部テーブル
48 ホルダ部
49 円筒支持体
50 処理チャンバ
50A 開口部
50B 開口部
51 熱処理システム
52 側壁
53 側壁
55 水平遮蔽板
56 開口部
58 ホットプレート
62 リフトピン
64 空気穴
66 シャッター
68 カバー
68a 排気ポート
70 排気パイプ
72 底部板
74 分室
76 支持板
78 シャッターアーム
80 アーム
82 シリンダ
84 持ち上げ可能な垂直シリンダ
84a 棒
86 突起
600 熱処理システム
610 制御装置
615 通気システム
620 ホットプレート
620a ホットプレート
620b ホットプレート
625 ヒーター
630 センサ
635 支持用ピン
680 制御装置
690 ウエハ
710 部分
715 加熱素子
720 部分
725 加熱素子
730 部分
735 加熱素子
740 部分
745 加熱素子
750 部分
755 加熱素子
760 部分
765 加熱素子
769 中心部分
770 扇形
771 加熱素子
775 扇形
780 扇形
785 扇形
810 部分
820 加熱素子
1300 CD最適化装置
Claims (10)
- 処理システム内でレジストがコーティングされた製造用ウエハを熱処理する方法であって:
前記処理システム内の複数のホットプレートの各々について温度プロファイルを設定する設定工程であって、前記複数のホットプレートの各々が複数の温度制御領域に分割され、かつ、前記設定工程が、前記複数のホットプレートの各々の上の前記複数の温度制御領域について既知の温度を設定する工程を有する、工程;
前記複数のホットプレート上で前記レジストが複数のコーティングされた製造用ウエハを並行して熱処理する熱処理工程;
前記の熱処理されたレジストがコーティングされた製造用ウエハ上の検査領域からCD計測データを取得する取得工程;
前記CD計測データから前記複数のホットプレートの各々のCDのばらつきを決定する決定工程;
前記決定工程後に、前記複数のホットプレートのうちの1以上について温度プロファイルを調節する調節工程;及び
前記調節工程後に、前記複数のホットプレート上で別のレジストがコーティングされた製造用ウエハを熱処理する調節後熱処理工程;
を有し、
前記決定工程が、前記の複数のホットプレートの各々についてのCD計測データとCD計測の失敗値とを比較する工程を有し、かつ
前記調節工程が、前記CD計測の失敗値を超えた複数のホットプレートのうちの1以上についての温度プロファイルを調節する工程を有する、
する方法。 - 前記設定工程が、前記1以上のホットプレート上の各温度制御領域について調節された既知の温度を設定することで、前記1以上のホットプレートについて調節された温度プロファイルを設定する工程を有する、請求項1に記載の方法。
- 前記熱処理工程が、塗布後ベーキング(PAB)、露光後ベーキング(PEB)又は現像後ベーキング(PDB)を有する、請求項1に記載の方法。
- 前記決定工程が、前記CD計測データをCD最適化システムへ送ることで、前記複数のホットプレートの各々についてのCDのばらつきを決定する工程を有し、かつ
前記調節工程が、前記CD最適化システムの出力を用いることによって、前記1以上のホットプレートの温度プロファイルを調節する工程を有する、
請求項1に記載の方法。 - 前記取得工程が、光散乱法を用いて前記CD計測データを取得する工程を有する、請求項1に記載の方法。
- 前記CDのばらつきが、平均CDデータ及び/又はウエハ内部でのCDの均一性データを有する、請求項1に記載の方法。
- 処理システム内でレジストがコーティングされた製造用ウエハを熱処理する方法であって:
前記処理システム内の複数のホットプレートの各々について温度プロファイルを設定する工程であって、各ホットプレートは複数の温度制御領域に分割される、設定工程;
前記熱処理工程が露光後ベーキング(PEB)処理において実行され、
前記取得工程が光散乱法を用いる工程を有し、
前記調節工程が、前記CD計測失敗値を超えた各ホットプレートの温度プロファイルの調節である、
を有する請求項1に記載の方法。 - 前記決定工程が、前記CDデータをCD最適化システムへ送ることで、前記複数のホットプレートの各々についてのCDのばらつきを決定する工程を有し、かつ
前記調節工程が、前記CD最適化システムの出力を用いることによって、前記温度プロファイルを調節する工程を有する、
請求項7に記載の方法。 - 前記調節工程が、各ホットプレート上の各温度制御領域について調節された異なる既知の温度を設定することで、各ホットプレートについて調節された異なる温度プロファイルを設定する工程を有する、請求項7に記載の方法。
- 前記CD計測データが、平均CDデータ及び/又はウエハ内部でのCDの均一性データを有する、請求項7に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/536,978 US7445446B2 (en) | 2006-09-29 | 2006-09-29 | Method for in-line monitoring and controlling in heat-treating of resist coated wafers |
US11/536,978 | 2006-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008091918A JP2008091918A (ja) | 2008-04-17 |
JP5610664B2 true JP5610664B2 (ja) | 2014-10-22 |
Family
ID=39365552
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007255605A Active JP5610664B2 (ja) | 2006-09-29 | 2007-09-28 | レジストがコーティングされたウエハの熱処理をインラインで監視及び制御する方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7445446B2 (ja) |
JP (1) | JP5610664B2 (ja) |
KR (1) | KR101404349B1 (ja) |
TW (1) | TW200823608A (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100607364B1 (ko) * | 2004-12-28 | 2006-08-01 | 동부일렉트로닉스 주식회사 | 포토리소그라피 공정에 사용되는 노광 후 베이크 장비 및이에 의한 감광막 패턴들의 임계 치수 제어 방법 |
US7625680B2 (en) * | 2006-09-29 | 2009-12-01 | Tokyo Electron Limited | Method of real time dynamic CD control |
JP2010287856A (ja) * | 2009-06-15 | 2010-12-24 | Tokyo Electron Ltd | 半導体装置の製造方法及び半導体装置の製造装置 |
US8808788B2 (en) | 2010-09-20 | 2014-08-19 | Tokyo Electron Limited | Processing a wafer with a post application bake (PAB) procedure |
US8546732B2 (en) * | 2010-11-10 | 2013-10-01 | Lam Research Corporation | Heating plate with planar heater zones for semiconductor processing |
CN103999545B (zh) * | 2011-08-30 | 2018-02-06 | 沃特洛电气制造公司 | 制造高清晰度加热器系统的方法 |
US9349660B2 (en) * | 2011-12-01 | 2016-05-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit manufacturing tool condition monitoring system and method |
JP5973731B2 (ja) | 2012-01-13 | 2016-08-23 | 東京エレクトロン株式会社 | プラズマ処理装置及びヒータの温度制御方法 |
US9984866B2 (en) * | 2012-06-12 | 2018-05-29 | Component Re-Engineering Company, Inc. | Multiple zone heater |
JP6219227B2 (ja) | 2014-05-12 | 2017-10-25 | 東京エレクトロン株式会社 | ヒータ給電機構及びステージの温度制御方法 |
KR20160017699A (ko) * | 2014-07-31 | 2016-02-17 | 세메스 주식회사 | 베이크 유닛, 이를 포함하는 기판 처리 장치 및 방법 |
KR102222455B1 (ko) * | 2018-01-15 | 2021-03-04 | 세메스 주식회사 | 기판 처리 장치 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW389949B (en) | 1997-01-30 | 2000-05-11 | Tokyo Electron Ltd | Method and apparatus for coating and development of the photo-resist solution |
US6402509B1 (en) * | 1999-09-03 | 2002-06-11 | Tokyo Electron, Limited | Substrate processing apparatus and substrate processing method |
EP1383167A1 (en) * | 1999-12-09 | 2004-01-21 | Ibiden Co., Ltd. | Ceramic plate for semiconductor producing/inspecting apparatus |
US6689519B2 (en) * | 2000-05-04 | 2004-02-10 | Kla-Tencor Technologies Corp. | Methods and systems for lithography process control |
US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
JP2002134395A (ja) * | 2000-10-25 | 2002-05-10 | Sony Corp | 半導体装置の製造方法および半導体装置の製造システム |
JP3494435B2 (ja) * | 2001-02-27 | 2004-02-09 | 東京エレクトロン株式会社 | 基板処理装置 |
US20020177245A1 (en) * | 2001-03-29 | 2002-11-28 | Sonderman Thomas J. | Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile |
JP4348412B2 (ja) * | 2001-04-26 | 2009-10-21 | 東京エレクトロン株式会社 | 計測システムクラスター |
JP3825277B2 (ja) * | 2001-05-25 | 2006-09-27 | 東京エレクトロン株式会社 | 加熱処理装置 |
EP1273973A1 (en) * | 2001-07-03 | 2003-01-08 | Infineon Technologies SC300 GmbH & Co. KG | Method for adjusting a temperature in a resist process |
DE10134756A1 (de) * | 2001-07-17 | 2003-04-03 | Advanced Micro Devices Inc | Ein System und Verfahren zur gesteuerten Strukturierung auf Waferbasis von Strukturelementen mit kritischen Dimensionen |
JP2003209050A (ja) * | 2002-01-17 | 2003-07-25 | Tokyo Electron Ltd | 基板処理方法及び基板処理装置 |
JP3923023B2 (ja) | 2003-03-06 | 2007-05-30 | 株式会社東芝 | パターン形成方法および該パターン形成方法を用いた半導体装置の製造方法 |
US7135259B2 (en) * | 2003-05-28 | 2006-11-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control |
US7187796B1 (en) * | 2003-10-01 | 2007-03-06 | Advanced Micro Devices, Inc. | Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabrication |
US7227628B1 (en) * | 2003-10-10 | 2007-06-05 | Kla-Tencor Technologies Corp. | Wafer inspection systems and methods for analyzing inspection data |
US7101816B2 (en) | 2003-12-29 | 2006-09-05 | Tokyo Electron Limited | Methods for adaptive real time control of a thermal processing system |
US7025280B2 (en) * | 2004-01-30 | 2006-04-11 | Tokyo Electron Limited | Adaptive real time control of a reticle/mask system |
WO2006012388A2 (en) * | 2004-07-22 | 2006-02-02 | Kla-Tencor Technologies Corp. | Test structures and methods for monitoring or controlling a semiconductor fabrication process |
US20060094131A1 (en) * | 2004-11-02 | 2006-05-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for critical dimension control in semiconductor manufacturing |
US20060222975A1 (en) * | 2005-04-02 | 2006-10-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated optical metrology and lithographic process track for dynamic critical dimension control |
JP4410147B2 (ja) * | 2005-05-09 | 2010-02-03 | 東京エレクトロン株式会社 | 加熱装置、塗布、現像装置及び加熱方法 |
-
2006
- 2006-09-29 US US11/536,978 patent/US7445446B2/en active Active
-
2007
- 2007-09-17 TW TW096134673A patent/TW200823608A/zh unknown
- 2007-09-27 KR KR1020070097600A patent/KR101404349B1/ko active IP Right Grant
- 2007-09-28 JP JP2007255605A patent/JP5610664B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR101404349B1 (ko) | 2014-06-09 |
TW200823608A (en) | 2008-06-01 |
JP2008091918A (ja) | 2008-04-17 |
US20080102412A1 (en) | 2008-05-01 |
US7445446B2 (en) | 2008-11-04 |
KR20080029866A (ko) | 2008-04-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5610664B2 (ja) | レジストがコーティングされたウエハの熱処理をインラインで監視及び制御する方法 | |
JP5610665B2 (ja) | リアルタイムの動的cd制御方法 | |
US7483804B2 (en) | Method of real time dynamic CD control | |
US7025280B2 (en) | Adaptive real time control of a reticle/mask system | |
US6689519B2 (en) | Methods and systems for lithography process control | |
US7452793B2 (en) | Wafer curvature estimation, monitoring, and compensation | |
KR100334301B1 (ko) | 가열 장치, 가열 장치의 평가법 및 패턴 형성 방법 | |
US7563561B2 (en) | Pattern forming method and a semiconductor device manufacturing method | |
JP2006228816A (ja) | 熱処理板の温度設定方法,熱処理板の温度設定装置,プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 | |
US7957828B2 (en) | Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium | |
KR20070048736A (ko) | 반도체 프로세싱에서 웨이퍼 상에 형성된 구조의 임계치수를 제어하는 방법 | |
US7420650B2 (en) | Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium | |
JP2012044181A (ja) | 自己整合する二重パターンの形成方法 | |
US20080099463A1 (en) | Method and processing system for rapid hotplate cool down | |
US8135487B2 (en) | Temperature setting method and apparatus for a thermal processing plate | |
JP2012044182A (ja) | 自己整合する二重パターンの形成方法 | |
US6643604B1 (en) | System for uniformly heating photoresist |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100921 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110916 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20121221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130405 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131001 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20131220 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20131226 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140130 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140805 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140902 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5610664 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |