JP5606992B2 - 液処理装置および液処理方法 - Google Patents

液処理装置および液処理方法 Download PDF

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JP5606992B2
JP5606992B2 JP2011129236A JP2011129236A JP5606992B2 JP 5606992 B2 JP5606992 B2 JP 5606992B2 JP 2011129236 A JP2011129236 A JP 2011129236A JP 2011129236 A JP2011129236 A JP 2011129236A JP 5606992 B2 JP5606992 B2 JP 5606992B2
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liquid
cover mechanism
substrate
wafer
cleaning
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JP2012256743A5 (enrdf_load_stackoverflow
JP2012256743A (ja
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藤 規 宏 伊
藤 尚 樹 新
谷 洋 介 八
井 高 志 永
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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JP2011129236A 2011-06-09 2011-06-09 液処理装置および液処理方法 Active JP5606992B2 (ja)

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JP2011129236A JP5606992B2 (ja) 2011-06-09 2011-06-09 液処理装置および液処理方法

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JP2014169688A Division JP5964372B2 (ja) 2014-08-22 2014-08-22 液処理装置および液処理方法

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JP2012256743A JP2012256743A (ja) 2012-12-27
JP2012256743A5 JP2012256743A5 (enrdf_load_stackoverflow) 2013-07-25
JP5606992B2 true JP5606992B2 (ja) 2014-10-15

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6188139B2 (ja) * 2013-09-02 2017-08-30 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP6191954B2 (ja) * 2013-09-02 2017-09-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
KR102239421B1 (ko) * 2013-09-02 2021-04-12 가부시키가이샤 스크린 홀딩스 기판 처리 방법 및 기판 처리 장치
JP6191953B2 (ja) * 2013-09-02 2017-09-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
JP6240450B2 (ja) * 2013-09-27 2017-11-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
TWI569349B (zh) 2013-09-27 2017-02-01 斯克林集團公司 基板處理裝置及基板處理方法
JP6329428B2 (ja) * 2014-05-09 2018-05-23 東京エレクトロン株式会社 基板処理装置、基板処理装置の付着物除去方法、及び記憶媒体
JP6706564B2 (ja) * 2016-09-23 2020-06-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
CN115369372A (zh) * 2021-05-17 2022-11-22 鑫天虹(厦门)科技有限公司 可减少微尘的基板处理腔室及其遮挡机构
JP2024176384A (ja) * 2023-06-08 2024-12-19 株式会社ジェイ・イー・ティ 基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08257524A (ja) * 1995-03-27 1996-10-08 Toshiba Corp スピンコータ
JP3643954B2 (ja) * 2001-08-29 2005-04-27 東京エレクトロン株式会社 洗浄処理装置
JP4191009B2 (ja) * 2003-11-05 2008-12-03 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5390808B2 (ja) * 2008-08-27 2014-01-15 大日本スクリーン製造株式会社 基板処理装置および基板処理方法

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