JP5589916B2 - スリット電極及びこれを備えた荷電粒子ビーム発生装置 - Google Patents
スリット電極及びこれを備えた荷電粒子ビーム発生装置 Download PDFInfo
- Publication number
- JP5589916B2 JP5589916B2 JP2011058671A JP2011058671A JP5589916B2 JP 5589916 B2 JP5589916 B2 JP 5589916B2 JP 2011058671 A JP2011058671 A JP 2011058671A JP 2011058671 A JP2011058671 A JP 2011058671A JP 5589916 B2 JP5589916 B2 JP 5589916B2
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- JP
- Japan
- Prior art keywords
- electrode
- slit
- frame
- rod
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 title claims description 14
- 230000008602 contraction Effects 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000002826 coolant Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32605—Removable or replaceable electrodes or electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3438—Electrodes other than cathode
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Description
<その他の実施形態>
2・・・電極枠体
3・・・開口部
4・・・スリット状開口部
5・・・電極棒
6・・・電極棒支持部材
7・・・支持部
8・・・ネジ
10・・・蓋体
U・・・電極ユニット
Claims (4)
- 開口部を有する電極枠体と、
前記電極枠体に個別に着脱可能に取り付けられた複数の電極ユニットからなるスリット電極であって、
各電極ユニットは、前記開口部内に並設された複数本の電極棒と、前記開口部を挟んで各電極棒の長手方向の端部を支持する一組の電極棒支持部材とを有していることを特徴とするスリット電極。 - 前記電極ユニットは、各電極ユニット間に隙間が形成されるようにして配置されていることを特徴とする請求項1記載のスリット電極。
- 前記電極ユニットは、前記電極棒支持部材に対して着脱可能に取り付けられているとともに、前記電極棒の長手方向における端部上面を覆うように配置された蓋体を備えていることを特徴とする請求項1または2記載のスリット電極。
- 荷電粒子ビーム引出し用の電極として、請求項1、2または3記載のスリット電極を備えていることを特徴とする荷電粒子ビーム発生装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011058671A JP5589916B2 (ja) | 2011-03-17 | 2011-03-17 | スリット電極及びこれを備えた荷電粒子ビーム発生装置 |
CN201110306371.9A CN102683144B (zh) | 2011-03-17 | 2011-10-11 | 狭缝电极和具有该狭缝电极的带电粒子束发生装置 |
KR1020110117297A KR101449442B1 (ko) | 2011-03-17 | 2011-11-11 | 슬릿 전극 및 이것을 구비한 하전 입자빔 발생장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011058671A JP5589916B2 (ja) | 2011-03-17 | 2011-03-17 | スリット電極及びこれを備えた荷電粒子ビーム発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012195177A JP2012195177A (ja) | 2012-10-11 |
JP5589916B2 true JP5589916B2 (ja) | 2014-09-17 |
Family
ID=46814883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011058671A Active JP5589916B2 (ja) | 2011-03-17 | 2011-03-17 | スリット電極及びこれを備えた荷電粒子ビーム発生装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5589916B2 (ja) |
KR (1) | KR101449442B1 (ja) |
CN (1) | CN102683144B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107112176A (zh) * | 2015-04-21 | 2017-08-29 | 日新离子机器株式会社 | 离子束引出用电极、离子源 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61195550A (ja) * | 1985-02-25 | 1986-08-29 | Hitachi Ltd | イオン源 |
JPH01309241A (ja) * | 1988-06-08 | 1989-12-13 | Mitsubishi Electric Corp | ホローカソード |
JPH0734358B2 (ja) * | 1989-03-14 | 1995-04-12 | 日新電機株式会社 | イオン源 |
JPH05114366A (ja) * | 1991-10-21 | 1993-05-07 | Nissin Electric Co Ltd | イオン源 |
JPH08148106A (ja) * | 1994-11-21 | 1996-06-07 | Nissin Electric Co Ltd | 大面積イオン引出し電極系 |
JP2996242B1 (ja) * | 1998-12-03 | 1999-12-27 | 日新ハイボルテージ株式会社 | 引出し電極 |
JP2002122700A (ja) * | 2000-10-16 | 2002-04-26 | Nissin High Voltage Co Ltd | 電子源 |
JP2005050600A (ja) * | 2003-07-31 | 2005-02-24 | Toshiba Corp | イオン源用電極板およびその製造方法 |
KR101001973B1 (ko) * | 2004-04-12 | 2010-12-17 | 삼성전자주식회사 | 백라이트 어셈블리 및 이를 갖는 표시 장치 |
JP2006003180A (ja) * | 2004-06-17 | 2006-01-05 | Nhv Corporation | 電子線照射装置 |
JP4229145B2 (ja) * | 2006-06-28 | 2009-02-25 | 日新イオン機器株式会社 | イオンビーム照射装置 |
JP5534359B2 (ja) * | 2011-09-21 | 2014-06-25 | 日新イオン機器株式会社 | スリット電極及びこれを備えた荷電粒子ビーム発生装置 |
-
2011
- 2011-03-17 JP JP2011058671A patent/JP5589916B2/ja active Active
- 2011-10-11 CN CN201110306371.9A patent/CN102683144B/zh not_active Expired - Fee Related
- 2011-11-11 KR KR1020110117297A patent/KR101449442B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2012195177A (ja) | 2012-10-11 |
KR20120106537A (ko) | 2012-09-26 |
CN102683144A (zh) | 2012-09-19 |
KR101449442B1 (ko) | 2014-10-13 |
CN102683144B (zh) | 2014-11-19 |
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