JP5575895B2 - かみそりの原子層蒸着コーティング - Google Patents
かみそりの原子層蒸着コーティング Download PDFInfo
- Publication number
- JP5575895B2 JP5575895B2 JP2012520674A JP2012520674A JP5575895B2 JP 5575895 B2 JP5575895 B2 JP 5575895B2 JP 2012520674 A JP2012520674 A JP 2012520674A JP 2012520674 A JP2012520674 A JP 2012520674A JP 5575895 B2 JP5575895 B2 JP 5575895B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- blade
- etching
- ald
- razor blade
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
- B26B21/00—Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
- B26B21/54—Razor-blades
- B26B21/58—Razor-blades characterised by the material
- B26B21/60—Razor-blades characterised by the material by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Dry Shavers And Clippers (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Description
Claims (15)
- 原子層蒸着(ALD)プロセスを使用して、真空槽内に配置された少なくとも1つのかみそり刃上に少なくとも1種の材料からなる少なくとも1つのコーティングを蒸着する工程であって、前記少なくとも1つのコーティングが前記少なくとも1つのかみそり刃の少なくとも1つの刃側面の表面全体及び刃本体の表面の少なくとも一部を被覆する、蒸着する工程と、
前記少なくとも1つのコーティングをエッチングする工程と、を特徴とする、かみそり刃のコーティング方法。 - 前記コーティングの前記エッチング工程が、前記少なくとも1つの刃側面又は前記刃本体又は前記刃側面と前記刃本体との両方で行われる、請求項1に記載の方法。
- 前記エッチング工程が、前記コーティングを除去して約15nm〜約40nmの範囲の刃先端半径をもたらす、請求項1に記載の方法。
- 前記エッチング工程が、前記ALDプロセス中、前記ALDプロセス後、又は前記ALDプロセス中とプロセス後との両方で行われる、請求項1に記載の方法。
- 前記エッチング工程が、方向性エッチング、その場イオンエッチング、化学エッチング、高周波エッチング、プラズマエッチング、光によるエッチング、又はこれらの任意の組み合わせを含む、請求項1に記載の方法。
- 前記コーティングが、共形であり、実質的に均一な厚さ、平滑表面形態、及び実質的にゼロの気孔率を有する、請求項1に記載の方法。
- 前記コーティングが、約0.1nm〜約500nmの範囲の厚さを有する、請求項1に記載の方法。
- 前記ALDプロセスが、
a.前記少なくとも1つのかみそり刃上に第1材料の第1単分子層を蒸着する工程と、 b.前記少なくとも1つのかみそり刃上に第2材料の第2単分子層を蒸着する工程と、 c.前記少なくとも1つのコーティングの最適な厚さが得られるまで工程(a)及び工程(b)を繰り返す工程であること更に特徴とし、
工程(a)又は工程(b)が、
d.前記真空槽を排気する工程と、
e.前記槽内に第1蒸着前駆体を導入して前記少なくとも1つのかみそり刃上に吸着層を形成する工程と、
f.前記真空槽をパージする工程と、
g.前記槽内に第2蒸着前駆体を導入して前記少なくとも1つのかみそり刃上に前記材料の単分子層を生成する工程と、を更に含むものであることを更に特徴とする、請求項1に記載の方法。 - 前記第1材料と前記第2材料とが同じである、請求項8に記載の方法。
- 前記第1蒸着前駆体が、塩化ジルコニウム、塩化ハフニウム、塩化アルミニウム、若しくは塩化チタン、又はこれらの任意の組み合わせを含み、前記第2蒸着前駆体が、水蒸気を含み、前記かみそり刃が、鋼鉄、クロム(Cr)、ダイヤモンド状カーボン(DLC)、非晶質ダイヤモンド、クロム/プラチナ(Cr/Pt)、チタン、窒化チタン、若しくはニオブ、又はこれらの任意の組み合わせを含む、請求項8に記載の方法。
- 請求項1に記載の方法を使用して形成される、カミソリ刃。
- 第1材料の第1コーティング及び第2材料の第2コーティングであって、前記第1コーティング及び第2コーティングの少なくともひとつが原子層蒸着(ALD)プロセスにより蒸着され、かつそれらの少なくとも1つが共形であり、実質的に均一な厚さ、平滑表面形態、及び実質的にゼロの気孔率を有し、かつ前記第2コーティングが前記第1コーティングの上面に蒸着されるものであることを特徴とする、かみそり刃。
- 刃先端半径が約15nm〜約40nmの範囲であることを更に特徴とする、請求項12に記載のかみそり刃。
- 前記第2コーティングの少なくとも一部がエッチングにより除去される、請求項12に記載のかみそり刃。
- 前記第1材料が第1の特性を有し、かつ前記第2材料が第2の特性を有する、請求項12に記載のかみそり刃。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/504,991 US9327416B2 (en) | 2009-07-17 | 2009-07-17 | Atomic layer deposition coatings on razor components |
US12/504,991 | 2009-07-17 | ||
PCT/US2010/041304 WO2011008617A1 (en) | 2009-07-17 | 2010-07-08 | Atomic layer deposition coatings on razor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012533344A JP2012533344A (ja) | 2012-12-27 |
JP5575895B2 true JP5575895B2 (ja) | 2014-08-20 |
Family
ID=42799579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012520674A Expired - Fee Related JP5575895B2 (ja) | 2009-07-17 | 2010-07-08 | かみそりの原子層蒸着コーティング |
Country Status (9)
Country | Link |
---|---|
US (2) | US9327416B2 (ja) |
EP (1) | EP2454057B1 (ja) |
JP (1) | JP5575895B2 (ja) |
CN (1) | CN102470537B (ja) |
BR (1) | BR112012001117A2 (ja) |
IN (1) | IN2012DN00477A (ja) |
MX (1) | MX339164B (ja) |
RU (1) | RU2526347C2 (ja) |
WO (1) | WO2011008617A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8642122B2 (en) | 2009-01-12 | 2014-02-04 | The Gillette Company | Formation of thin uniform coatings on blade edges using isostatic press |
US8628821B2 (en) * | 2009-01-12 | 2014-01-14 | The Gillette Company | Formation of thin uniform coatings on blade edges using isostatic press |
EP2495081B1 (de) * | 2011-03-01 | 2014-05-07 | GFD Gesellschaft für Diamantprodukte mbH | Schneidewerkzeug mit Klinge aus feinkristallinem Diamant |
EP2495080B1 (de) * | 2011-03-01 | 2014-05-21 | GFD Gesellschaft für Diamantprodukte mbH | Schneidwerkzeug mit Klinge aus feinkristallinem Diamant |
US20130031794A1 (en) | 2011-08-05 | 2013-02-07 | Duff Jr Ronald Richard | RAZOR BLADES WITH ALUMINUM MAGNESIUM BORIDE (AlMgB14)-BASED COATINGS |
CN104364419A (zh) * | 2012-06-15 | 2015-02-18 | 皮考逊公司 | 通过原子层沉积来涂覆衬底卷式基材 |
US11148309B2 (en) * | 2013-06-05 | 2021-10-19 | The Gillette Company Llc | Razor components with novel coating |
WO2016015771A1 (en) * | 2014-07-31 | 2016-02-04 | Bic-Violex Sa | Razor blade coating |
KR102402007B1 (ko) * | 2014-12-22 | 2022-05-25 | 빅-비올렉스 에스아 | 면도날 |
US9925678B2 (en) | 2014-12-30 | 2018-03-27 | The Gillette Company Llc | Razor blade with a printed object |
US10315323B2 (en) | 2015-01-08 | 2019-06-11 | The Gillette Company Llc | Razor cartridge with a printed lubrication control member |
US20170033458A1 (en) * | 2015-07-28 | 2017-02-02 | Google Inc. | Multi-Beam Antenna System |
US11230025B2 (en) * | 2015-11-13 | 2022-01-25 | The Gillette Company Llc | Razor blade |
CN105506581B (zh) * | 2015-12-15 | 2019-03-19 | 北京北方华创微电子装备有限公司 | 一种应用原子层沉积技术制备薄膜的实现方法 |
US10384360B2 (en) | 2016-06-29 | 2019-08-20 | The Gillette Company Llc | Razor blade with a printed object |
US10675772B2 (en) * | 2016-06-29 | 2020-06-09 | The Gillette Company Llc | Printed lubricious material disposed on razor blades |
US11654588B2 (en) | 2016-08-15 | 2023-05-23 | The Gillette Company Llc | Razor blades |
WO2018124127A1 (ja) * | 2016-12-26 | 2018-07-05 | 京セラ株式会社 | 刃物 |
US10766157B2 (en) | 2017-02-13 | 2020-09-08 | The Gillette Company Llc | Razor blades |
CN106939414B (zh) * | 2017-03-01 | 2019-08-30 | 秦皇岛博硕光电设备股份有限公司 | 基材上生长AlMgB14膜层的方法及采用该方法制得的制品 |
CN108300997A (zh) * | 2018-03-30 | 2018-07-20 | 镇江东艺机械有限公司 | 一种基于pvd技术的高速切削刀具及制造方法 |
US10994379B2 (en) * | 2019-01-04 | 2021-05-04 | George H. Lambert | Laser deposition process for a self sharpening knife cutting edge |
EP3714913A1 (en) | 2019-03-29 | 2020-09-30 | Picosun Oy | Color coding |
US11338321B2 (en) * | 2019-05-09 | 2022-05-24 | The Gillette Company Llc | Method for modifying coated razor blade edges |
MX2022000620A (es) * | 2019-07-17 | 2022-05-19 | Anchor Mfg Group Inc | Navajas de afeitar no metálicas y ensamblajes de rastrillo para las mismas. |
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SE393967B (sv) | 1974-11-29 | 1977-05-31 | Sateko Oy | Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket |
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US5056227A (en) * | 1990-03-19 | 1991-10-15 | The Gillette Company | Razor blade technology |
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US20040172832A1 (en) * | 2003-03-04 | 2004-09-09 | Colin Clipstone | Razor blade |
SE527180C2 (sv) * | 2003-08-12 | 2006-01-17 | Sandvik Intellectual Property | Rakel- eller schaberblad med nötningsbeständigt skikt samt metod för tillverkning därav |
US7673541B2 (en) | 2004-06-03 | 2010-03-09 | The Gillette Company | Colored razor blades |
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-
2009
- 2009-07-17 US US12/504,991 patent/US9327416B2/en active Active
-
2010
- 2010-07-08 IN IN477DEN2012 patent/IN2012DN00477A/en unknown
- 2010-07-08 RU RU2012102082/02A patent/RU2526347C2/ru not_active IP Right Cessation
- 2010-07-08 BR BR112012001117A patent/BR112012001117A2/pt not_active IP Right Cessation
- 2010-07-08 WO PCT/US2010/041304 patent/WO2011008617A1/en active Application Filing
- 2010-07-08 CN CN201080032040.4A patent/CN102470537B/zh not_active Expired - Fee Related
- 2010-07-08 MX MX2012000772A patent/MX339164B/es active IP Right Grant
- 2010-07-08 EP EP10734400.4A patent/EP2454057B1/en active Active
- 2010-07-08 JP JP2012520674A patent/JP5575895B2/ja not_active Expired - Fee Related
-
2016
- 2016-03-31 US US15/086,336 patent/US10821619B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US9327416B2 (en) | 2016-05-03 |
JP2012533344A (ja) | 2012-12-27 |
IN2012DN00477A (ja) | 2015-06-05 |
MX2012000772A (es) | 2012-02-28 |
US20110010950A1 (en) | 2011-01-20 |
BR112012001117A2 (pt) | 2016-02-23 |
MX339164B (es) | 2016-05-09 |
CN102470537A (zh) | 2012-05-23 |
EP2454057A1 (en) | 2012-05-23 |
RU2012102082A (ru) | 2013-08-27 |
US10821619B2 (en) | 2020-11-03 |
CN102470537B (zh) | 2015-04-01 |
EP2454057B1 (en) | 2018-04-18 |
WO2011008617A1 (en) | 2011-01-20 |
RU2526347C2 (ru) | 2014-08-20 |
US20160207211A1 (en) | 2016-07-21 |
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