JP5559047B2 - シリカガラス粒子 - Google Patents
シリカガラス粒子 Download PDFInfo
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- JP5559047B2 JP5559047B2 JP2010515440A JP2010515440A JP5559047B2 JP 5559047 B2 JP5559047 B2 JP 5559047B2 JP 2010515440 A JP2010515440 A JP 2010515440A JP 2010515440 A JP2010515440 A JP 2010515440A JP 5559047 B2 JP5559047 B2 JP 5559047B2
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- Prior art keywords
- silica glass
- slag
- glass particles
- silica
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 title claims description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title description 52
- 239000002893 slag Substances 0.000 claims description 26
- 229910021485 fumed silica Inorganic materials 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000000843 powder Substances 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 238000007906 compression Methods 0.000 description 14
- 230000006835 compression Effects 0.000 description 14
- 239000012535 impurity Substances 0.000 description 9
- 238000009826 distribution Methods 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 230000002902 bimodal effect Effects 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- -1 silicon alkoxide Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000005550 wet granulation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 241000237858 Gastropoda Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 description 1
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000009490 roller compaction Methods 0.000 description 1
- 238000005029 sieve analysis Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3009—Physical treatment, e.g. grinding; treatment with ultrasonic vibrations
- C09C1/3036—Agglomeration, granulation, pelleting
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C12/00—Powdered glass; Bead compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Description
Claims (3)
- a)15〜190g/lの突き固め密度を有する熱分解法シリカ粉末をスラグに圧縮し、b)これらを引き続いて微粉砕し、かつ、100μmを下回る直径を有するスラグ片及び800μmを上回る直径を有するスラグ片を除去し、c)その際、スラグ片は300〜600g/lの突き固め密度を有しており、かつ、d)これらを引き続いて、ヒドロキシル基を除去するのに適した1個又はそれ以上の化合物を含有する雰囲気中で、600〜1100℃で処理し、かつ、e)その後に1200〜1400℃で焼結する、シリカガラス粒子の製造方法。
- 熱分解法シリカ粉末が、30〜150g/lの突き固め密度を有する、請求項1に記載の方法。
- スラグ片が400〜600g/lの突き固め密度を有する、請求項1又は2に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07111945.7A EP2014622B1 (de) | 2007-07-06 | 2007-07-06 | Verfahren zur Herstellung eines Kieselglasgranulats |
EP07111945.7 | 2007-07-06 | ||
PCT/EP2008/056941 WO2009007180A1 (en) | 2007-07-06 | 2008-06-04 | Silica glass granule |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010532310A JP2010532310A (ja) | 2010-10-07 |
JP5559047B2 true JP5559047B2 (ja) | 2014-07-23 |
Family
ID=38434030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010515440A Active JP5559047B2 (ja) | 2007-07-06 | 2008-06-04 | シリカガラス粒子 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8209999B2 (ja) |
EP (1) | EP2014622B1 (ja) |
JP (1) | JP5559047B2 (ja) |
KR (1) | KR101208263B1 (ja) |
CN (1) | CN101687681B (ja) |
TW (1) | TWI394726B (ja) |
WO (1) | WO2009007180A1 (ja) |
Families Citing this family (24)
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DE102009030101A1 (de) * | 2008-12-08 | 2010-07-15 | Center For Abrasives And Refractories Research & Development C.A.R.R.D. Gmbh | Verschleißschutzschicht auf Basis einer Kunstharzmatrix, Verfahren zu ihrer Herstellung sowie ihre Verwendung |
JP2011157261A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
DE102010008162B4 (de) | 2010-02-16 | 2017-03-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
US9446959B2 (en) | 2011-03-23 | 2016-09-20 | Mitsubishi Materials Corporation | Synthetic amorphous silica powder and method for producing same |
WO2013129404A1 (ja) * | 2012-02-28 | 2013-09-06 | 旭硝子株式会社 | 造粒体およびその製造方法 |
CN102580919A (zh) * | 2012-02-29 | 2012-07-18 | 成都中光电科技有限公司 | 玻璃原料有效粒径的检测方法 |
TWI621522B (zh) * | 2013-03-28 | 2018-04-21 | Univ Far East | Composite structure containing glass particles |
US10167227B2 (en) | 2015-08-10 | 2019-01-01 | Ppg Industries Ohio, Inc. | Fiberglass materials, methods of making, and applications thereof |
WO2017062240A1 (en) * | 2015-10-09 | 2017-04-13 | Ppg Industries Ohio, Inc. | Fiberglass materials, methods of making, and applications thereof |
TWI808933B (zh) | 2015-12-18 | 2023-07-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法 |
US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
TWI788278B (zh) | 2015-12-18 | 2023-01-01 | 德商何瑞斯廓格拉斯公司 | 由均質石英玻璃製得之玻璃纖維及預成型品 |
JP6881777B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 合成石英ガラス粒の調製 |
CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
WO2017103124A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
US10730780B2 (en) | 2015-12-18 | 2020-08-04 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
CN108779015B (zh) * | 2015-12-18 | 2021-10-26 | 贺利氏石英玻璃有限两合公司 | 从二氧化硅粉末制备石英玻璃体 |
US10261244B2 (en) | 2016-02-15 | 2019-04-16 | Nxgen Partners Ip, Llc | System and method for producing vortex fiber |
EP3339256A1 (de) * | 2016-12-23 | 2018-06-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von opakem quarzglas, und rohling aus dem opaken quarzglas |
US20230286814A1 (en) | 2020-05-25 | 2023-09-14 | Evonk Operations GmbH | Silica granules for thermal treatment |
US20240116764A1 (en) | 2021-02-11 | 2024-04-11 | Evonik Operations Gmbh | Fumed silica powder with reduced silanol group density |
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2007
- 2007-07-06 EP EP07111945.7A patent/EP2014622B1/de active Active
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2008
- 2008-06-04 JP JP2010515440A patent/JP5559047B2/ja active Active
- 2008-06-04 WO PCT/EP2008/056941 patent/WO2009007180A1/en active Application Filing
- 2008-06-04 KR KR1020107000155A patent/KR101208263B1/ko active IP Right Grant
- 2008-06-04 CN CN2008800235921A patent/CN101687681B/zh active Active
- 2008-06-04 US US12/667,696 patent/US8209999B2/en active Active
- 2008-07-02 TW TW097124950A patent/TWI394726B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP2014622B1 (de) | 2017-01-18 |
KR101208263B1 (ko) | 2012-12-04 |
TWI394726B (zh) | 2013-05-01 |
US20100178509A1 (en) | 2010-07-15 |
CN101687681B (zh) | 2012-07-25 |
WO2009007180A1 (en) | 2009-01-15 |
KR20100024476A (ko) | 2010-03-05 |
EP2014622A1 (de) | 2009-01-14 |
TW200922896A (en) | 2009-06-01 |
CN101687681A (zh) | 2010-03-31 |
JP2010532310A (ja) | 2010-10-07 |
US8209999B2 (en) | 2012-07-03 |
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