JP5548375B2 - 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 - Google Patents

荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 Download PDF

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Publication number
JP5548375B2
JP5548375B2 JP2009069566A JP2009069566A JP5548375B2 JP 5548375 B2 JP5548375 B2 JP 5548375B2 JP 2009069566 A JP2009069566 A JP 2009069566A JP 2009069566 A JP2009069566 A JP 2009069566A JP 5548375 B2 JP5548375 B2 JP 5548375B2
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Prior art keywords
charged particle
particle beam
electrode
film
deflector
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JP2009069566A
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Japanese (ja)
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JP2010225728A (ja
JP2010225728A5 (enExample
Inventor
哲朗 西山
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Nuflare Technology Inc
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Nuflare Technology Inc
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Priority to JP2009069566A priority Critical patent/JP5548375B2/ja
Priority to US12/714,735 priority patent/US8148698B2/en
Publication of JP2010225728A publication Critical patent/JP2010225728A/ja
Publication of JP2010225728A5 publication Critical patent/JP2010225728A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2009069566A 2009-03-23 2009-03-23 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 Active JP5548375B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009069566A JP5548375B2 (ja) 2009-03-23 2009-03-23 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
US12/714,735 US8148698B2 (en) 2009-03-23 2010-03-01 Charged particle beam writing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009069566A JP5548375B2 (ja) 2009-03-23 2009-03-23 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Publications (3)

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JP2010225728A JP2010225728A (ja) 2010-10-07
JP2010225728A5 JP2010225728A5 (enExample) 2012-01-26
JP5548375B2 true JP5548375B2 (ja) 2014-07-16

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US (1) US8148698B2 (enExample)
JP (1) JP5548375B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102685956B1 (ko) * 2019-08-20 2024-07-19 가부시키가이샤 뉴플레어 테크놀로지 묘화 장치 및 편향기

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5689047B2 (ja) * 2011-10-12 2015-03-25 東京エレクトロン株式会社 基体処理システム用の基体搬送装置
JP5964067B2 (ja) * 2012-02-02 2016-08-03 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置
JP6080540B2 (ja) * 2012-12-26 2017-02-15 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置
JP2018098268A (ja) 2016-12-08 2018-06-21 株式会社ニューフレアテクノロジー ブランキング偏向器及びマルチ荷電粒子ビーム描画装置
CN119846917A (zh) * 2025-03-11 2025-04-18 中国电子科技集团公司第四十八研究所 一种可变成型束电子束曝光装置及曝光方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4736139A (en) * 1984-11-19 1988-04-05 Matsushita Electric Industrial Co., Ltd. Flat type cathode ray tube and color image display apparatus utilizing same
US4661709A (en) * 1985-06-28 1987-04-28 Control Data Corporation Modular all-electrostatic electron-optical column and assembly of said columns into an array and method of manufacture
JPH06105599B2 (ja) * 1986-03-18 1994-12-21 富士通株式会社 同軸型静電偏向器
JPH09293472A (ja) * 1996-04-26 1997-11-11 Fujitsu Ltd 荷電粒子ビーム露光装置、その露光方法及びその製造方法
JP3057042B2 (ja) * 1997-11-18 2000-06-26 株式会社東芝 荷電粒子ビーム描画用ブランキング装置
JP2000011937A (ja) 1998-06-26 2000-01-14 Advantest Corp 電子ビーム露光装置の静電偏向器
JP2000260686A (ja) * 1999-03-08 2000-09-22 Toshiba Corp 露光方法及び露光装置
JP3785085B2 (ja) * 2000-12-01 2006-06-14 株式会社東芝 静電偏向器及びその製造方法、静電レンズ及びその製造方法、電子ビーム照射装置及びそのクリーニング方法
JP4801982B2 (ja) 2005-11-30 2011-10-26 株式会社ニューフレアテクノロジー 荷電ビーム描画方法及び描画装置
US7521687B2 (en) * 2006-03-30 2009-04-21 Tokyo Electron Limited Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate
JP2007294850A (ja) * 2006-03-30 2007-11-08 Tokyo Electron Ltd 静電偏向器及び電子線照射装置及び基板処理装置及び基板処理方法及び基板の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102685956B1 (ko) * 2019-08-20 2024-07-19 가부시키가이샤 뉴플레어 테크놀로지 묘화 장치 및 편향기

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JP2010225728A (ja) 2010-10-07
US20100237261A1 (en) 2010-09-23
US8148698B2 (en) 2012-04-03

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