JP5495145B2 - イオンポンプシステム - Google Patents
イオンポンプシステム Download PDFInfo
- Publication number
- JP5495145B2 JP5495145B2 JP2012509160A JP2012509160A JP5495145B2 JP 5495145 B2 JP5495145 B2 JP 5495145B2 JP 2012509160 A JP2012509160 A JP 2012509160A JP 2012509160 A JP2012509160 A JP 2012509160A JP 5495145 B2 JP5495145 B2 JP 5495145B2
- Authority
- JP
- Japan
- Prior art keywords
- casing
- ion pump
- pump system
- magnet
- peripheral electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 108010083687 Ion Pumps Proteins 0.000 title claims description 64
- 230000002093 peripheral effect Effects 0.000 claims description 97
- 230000004907 flux Effects 0.000 description 27
- 238000010586 diagram Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 230000005684 electric field Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
- H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances
Landscapes
- Electron Tubes For Measurement (AREA)
Description
12 内側ケーシング
21 外周電極
22 内周電極
23 外周電極の内周部分
24 内周電極の外内周部分
31 内側磁石
32 内側ケーシングの内部空間
33 外側磁石
Claims (4)
- 外側ケーシング(11)と,前記外側ケーシング(11)内部に設けられた内側ケーシング(12)と,を有するイオンポンプシステムであって,
前記外側ケーシング(11)は,複数の外周電極(21)を有し,
前記複数の外周電極(21)は所定の間隔をもって,前記内側ケーシング(12)へ向けて前記外側ケーシング(11)に取り付けられた円盤状の電極であり,
前記内側ケーシング(12)は,複数の内周電極(22)を有し,
前記複数の内周電極(22)は所定の間隔をもって,前記外側ケーシング(11)へ向けて前記内側ケーシング(12)に取り付けられた円盤状の電極であり,
前記複数の外周電極(21)と前記複数の内周電極(22)とは,平行であり,
前記複数の外周電極(21)の最も内側ケーシング(12)に近い部分(23)は,前記複数の内周電極(22)の最も外側ケーシング(11)に近い部分(24)よりも前記内側ケーシング(12)に近い位置に存在する,
イオンポンプシステム。
- 請求項1に記載のイオンポンプシステムであって,
内側磁石(31)を,さらに有し,
前記内側磁石(31)は,前記内側ケーシング(12)のうち前記外側ケーシング(11)と逆側の空間(32)に設けられ,前記外側ケーシング(11)と前記内側ケーシング(12)間の空間に磁場を与えるものである,
イオンポンプシステム。
- 請求項1又は請求項2に記載のイオンポンプシステムであって,
外側磁石(33)を,さらに有し,
前記外側磁石(33)は,前記外側ケーシング(11)に設けられ,前記外側ケーシング(11)と前記内側ケーシング(12)間の空間に磁場を与えるものである,
イオンポンプシステム。
- 請求項1に記載のイオンポンプシステムであって,
前記内側ケーシング(12)は,メッシュ状部分を有し,これにより,前記メッシュ状部分を通じて前記内側ケーシング(12)の内側及び外側に存在するガスが移動できる,
イオンポンプシステム。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2010/002430 WO2011125093A1 (ja) | 2010-04-02 | 2010-04-02 | イオンポンプシステム |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011125093A1 JPWO2011125093A1 (ja) | 2013-07-08 |
JP5495145B2 true JP5495145B2 (ja) | 2014-05-21 |
Family
ID=44762087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012509160A Active JP5495145B2 (ja) | 2010-04-02 | 2010-04-02 | イオンポンプシステム |
Country Status (4)
Country | Link |
---|---|
US (1) | US20130195679A1 (ja) |
EP (1) | EP2562786B1 (ja) |
JP (1) | JP5495145B2 (ja) |
WO (1) | WO2011125093A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015012671A1 (ru) * | 2013-07-22 | 2015-01-29 | Saparqaliyev Aldan Asanovich | Система устройств и ее составляющие |
JP6327974B2 (ja) * | 2014-06-30 | 2018-05-23 | 国立研究開発法人情報通信研究機構 | 積層型超高真空作成装置 |
CN110491764B (zh) * | 2019-09-02 | 2022-03-29 | 北京卫星环境工程研究所 | 溅射离子泵的磁轭组件 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL86382C (ja) * | 1949-03-16 | |||
US2925504A (en) * | 1957-06-17 | 1960-02-16 | High Voltage Engineering Corp | High-vacuum pumps for high-voltage acceleration tubes |
JPS3516136B1 (ja) * | 1958-07-19 | 1960-10-25 | ||
US3022933A (en) * | 1959-06-01 | 1962-02-27 | Robert E Ellis | Multiple electron beam ion pump and source |
US3224664A (en) * | 1962-08-08 | 1965-12-21 | Philips Corp | Ion pump |
US3176907A (en) * | 1962-08-23 | 1965-04-06 | Ca Nat Research Council | Ion pump |
US3216652A (en) * | 1962-09-10 | 1965-11-09 | Hughes Aircraft Co | Ionic vacuum pump |
US3228589A (en) * | 1963-10-16 | 1966-01-11 | Gen Electric | Ion pump having encapsulated internal magnet assemblies |
US3236442A (en) * | 1964-01-20 | 1966-02-22 | Morris Associates | Ionic vacuum pump |
US3371854A (en) * | 1966-07-27 | 1968-03-05 | Wisconsin Alumni Res Found | High capacity orbiting electron vacuum pump |
US3416722A (en) * | 1967-04-05 | 1968-12-17 | Varian Associates | High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator |
JPS5153612A (ja) * | 1974-11-06 | 1976-05-12 | Hitachi Ltd | Ionhonpu |
JPH0927294A (ja) * | 1995-07-12 | 1997-01-28 | Ebara Corp | イオンポンプ |
CN1366706A (zh) * | 2000-03-13 | 2002-08-28 | 爱发科股份有限公司 | 离子溅射泵 |
US6443704B1 (en) * | 2001-03-02 | 2002-09-03 | Jafar Darabi | Electrohydrodynamicly enhanced micro cooling system for integrated circuits |
EP2249373B1 (en) | 2008-02-14 | 2017-08-02 | National Institute of Information and Communications Technology | Ion pump system and electromagnetic field generator |
-
2010
- 2010-04-02 JP JP2012509160A patent/JP5495145B2/ja active Active
- 2010-04-02 EP EP10849343.8A patent/EP2562786B1/en active Active
- 2010-04-02 WO PCT/JP2010/002430 patent/WO2011125093A1/ja active Application Filing
- 2010-04-02 US US13/638,615 patent/US20130195679A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2011125093A1 (ja) | 2011-10-13 |
US20130195679A1 (en) | 2013-08-01 |
EP2562786B1 (en) | 2019-06-26 |
JPWO2011125093A1 (ja) | 2013-07-08 |
EP2562786A4 (en) | 2015-10-14 |
EP2562786A1 (en) | 2013-02-27 |
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