JP5494005B2 - 半導体発光素子 - Google Patents
半導体発光素子 Download PDFInfo
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- JP5494005B2 JP5494005B2 JP2010042519A JP2010042519A JP5494005B2 JP 5494005 B2 JP5494005 B2 JP 5494005B2 JP 2010042519 A JP2010042519 A JP 2010042519A JP 2010042519 A JP2010042519 A JP 2010042519A JP 5494005 B2 JP5494005 B2 JP 5494005B2
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- electrode
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- transparent electrode
- auxiliary electrode
- light emitting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
Description
ワイヤ70をボンディングしやすく、かつ、下層側を腐食から保護する材料とする材料が好ましい。このような材料として、例えばAuを例示することができます。また、表面側の層は、下層側よりシート抵抗が小さい材料が好ましい。さらに、補助電極60は、屈折率の異なる2つの材料の複数の層から形成される分布ブラッグ反射器(Distributed Bragg Reflector : DBR)として、発光層25から発せられる光を全反射するようにしたものと組み合わせることも可能である。補助電極60は、例えば真空蒸着法、スパッタリング法等により形成される。
図2に示すように、発光素子1は平面視にて略四角形状に形成され、本実施形態においては長方形状である。n電極40は長手方向一方の幅方向中央に形成され、透明電極30はn電極40と離隔してn電極を除く領域に比較的大きな面積で形成されている。絶縁層50の各開口52,54は、幅方向中央に、長手方向に離隔して形成される。
図5に示すように、この発光素子201は、下面側にp電極としての透明電極30及びn電極40が形成されるフリップチップ型である。発光素子201は、基板10と、バッファ層20と、n型コンタクト層22と、n型ESD層23と、n型クラッド層24と、発光層25と、p型クラッド層26と、p型コンタクト層27とを含む半導体積層構造を備え、p型コンタクト層27からn型コンタクト層22の一部がエッチングにより除去され、n型コンタクト層22の一部が露出している。
10 基板
20 バッファ層
22 n型コンタクト層
23 n型ESD層
24 n型クラッド層
25 発光層
26 p型クラッド層
27 p型コンタクト層
30 透明電極
32 開口
40 n電極
50 絶縁層
52 開口
54 開口
60 補助電極
62 ワイヤ接続部
64 延伸部
64a 半包囲部
64b 連結部
70 ボンディングワイヤ
72 ボンディングワイヤ
101 発光素子
201 発光素子
232 開口
252 開口
254 開口
260 補助電極
270 バンプ
272 バンプ
Claims (1)
- 第1導電型層、発光層及び第2導電型層をこの順で有する半導体積層体と、
前記第1導電型層上に形成され酸化物からなる透明電極と、
前記第1導電型層と前記透明電極の間に形成され、前記発光層から発せられる光の反射率が前記透明電極よりも高く、前記第1導電型層との接触抵抗が前記透明電極よりも大きく、前記透明電極よりもシート抵抗が小さい補助電極と、
前記第2導電型層の露出した領域上に形成されて前記補助電極とともにp側及びn側の電極を構成する他の電極と、
前記補助電極と前記他の電極のそれぞれの所定の位置上に外部電源接続用の開口を形成して前記透明電極上、前記他の電極上及び前記半導体積層体上に形成される絶縁層と、を備え、
前記補助電極は、前記外部電源接続用の開口に対応する部分とこの部分の外側に拡がる部分とを含むワイヤ接続部と、このワイヤ接続部から前記他の電極の方向に延伸する線状の延伸部を有し、
前記透明電極は、前記補助電極の一部を覆うとともに前記補助電極の外縁を経て外方へ伸びており、かつ、前記補助電極の前記所定の位置としての前記ワイヤ接続部上に形成された前記絶縁層の前記外部電源接続用の前記開口の直下に形成された開口を有し、
前記透明電極の前記開口の内壁は、前記外部電源接続用の前記開口を形成する前記絶縁層によって被覆されていて前記補助電極を介して前記外部電源と接続される半導体発光素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010042519A JP5494005B2 (ja) | 2010-02-26 | 2010-02-26 | 半導体発光素子 |
US12/929,757 US8274070B2 (en) | 2010-02-26 | 2011-02-14 | Semiconductor light-emitting element including an auxiliary electrode |
CN201110046839.5A CN102169942B (zh) | 2010-02-26 | 2011-02-24 | 半导体发光元件 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2010042519A JP5494005B2 (ja) | 2010-02-26 | 2010-02-26 | 半導体発光素子 |
Publications (2)
Publication Number | Publication Date |
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JP2011181597A JP2011181597A (ja) | 2011-09-15 |
JP5494005B2 true JP5494005B2 (ja) | 2014-05-14 |
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JP2010042519A Active JP5494005B2 (ja) | 2010-02-26 | 2010-02-26 | 半導体発光素子 |
Country Status (3)
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US (1) | US8274070B2 (ja) |
JP (1) | JP5494005B2 (ja) |
CN (1) | CN102169942B (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US9000461B2 (en) * | 2003-07-04 | 2015-04-07 | Epistar Corporation | Optoelectronic element and manufacturing method thereof |
KR20120130840A (ko) * | 2011-05-24 | 2012-12-04 | 삼성전자주식회사 | 반도체 발광소자 및 그 제조방법 |
KR101888604B1 (ko) * | 2011-10-28 | 2018-08-14 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
US10535798B2 (en) * | 2012-07-18 | 2020-01-14 | Semicon Light Co., Ltd. | Semiconductor light emitting device comprising finger electrodes |
KR20140100115A (ko) * | 2013-02-05 | 2014-08-14 | 삼성전자주식회사 | 반도체 발광 소자 |
KR102187501B1 (ko) * | 2014-06-11 | 2020-12-08 | 엘지이노텍 주식회사 | 발광 소자 및 그를 포함하는 발광소자 패키지 |
CN104091874B (zh) * | 2014-07-01 | 2017-01-18 | 天津三安光电有限公司 | 发光二极管 |
KR102357289B1 (ko) * | 2014-07-01 | 2022-02-03 | 서울바이오시스 주식회사 | 발광 소자 |
TWI583019B (zh) * | 2015-02-17 | 2017-05-11 | 新世紀光電股份有限公司 | Light emitting diode and manufacturing method thereof |
CN104821351B (zh) * | 2015-05-05 | 2017-08-29 | 湘能华磊光电股份有限公司 | Iii族半导体发光器件倒装结构的制作方法 |
WO2017030396A1 (ko) * | 2015-08-18 | 2017-02-23 | 엘지이노텍(주) | 발광 소자, 이 소자를 포함하는 발광 소자 패키지 및 이 패키지를 포함하는 발광 장치 |
DE102016112587A1 (de) * | 2016-07-08 | 2018-01-11 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip |
CN106025010A (zh) * | 2016-07-19 | 2016-10-12 | 厦门乾照光电股份有限公司 | 一种基于导电dbr结构的倒装led芯片及其制作方法 |
CN109148663B (zh) * | 2018-08-28 | 2020-05-12 | 福建兆元光电有限公司 | 发光二极管及其制造方法 |
DE102019106546A1 (de) * | 2019-03-14 | 2020-09-17 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur herstellung von optoelektronischen halbleiterbauteilen und optoelektronisches halbleiterbauteil |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3344296B2 (ja) * | 1997-10-21 | 2002-11-11 | 昭和電工株式会社 | 半導体発光素子用の電極 |
US6614056B1 (en) | 1999-12-01 | 2003-09-02 | Cree Lighting Company | Scalable led with improved current spreading structures |
JP4810746B2 (ja) | 2000-03-31 | 2011-11-09 | 豊田合成株式会社 | Iii族窒化物系化合物半導体素子 |
US6677805B2 (en) | 2001-04-05 | 2004-01-13 | Saifun Semiconductors Ltd. | Charge pump stage with body effect minimization |
EP1548852B1 (en) * | 2003-12-22 | 2013-07-10 | Samsung Electronics Co., Ltd. | Top-emitting nitride-based light emitting device and method of manufacturing the same |
JP2006128227A (ja) * | 2004-10-26 | 2006-05-18 | Mitsubishi Cable Ind Ltd | 窒化物半導体発光素子 |
JP2006156590A (ja) * | 2004-11-26 | 2006-06-15 | Mitsubishi Cable Ind Ltd | 発光ダイオード |
JP2008124267A (ja) * | 2006-11-13 | 2008-05-29 | Toyoda Gosei Co Ltd | 発光装置 |
JP5083817B2 (ja) * | 2007-11-22 | 2012-11-28 | シャープ株式会社 | Iii族窒化物半導体発光素子及びその製造方法 |
JP5169397B2 (ja) * | 2008-04-07 | 2013-03-27 | パナソニック株式会社 | 半導体発光素子およびそれを用いた半導体発光装置 |
JP5392611B2 (ja) | 2009-09-14 | 2014-01-22 | スタンレー電気株式会社 | 半導体発光装置および半導体発光装置の製造方法 |
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2010
- 2010-02-26 JP JP2010042519A patent/JP5494005B2/ja active Active
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2011
- 2011-02-14 US US12/929,757 patent/US8274070B2/en active Active
- 2011-02-24 CN CN201110046839.5A patent/CN102169942B/zh active Active
Also Published As
Publication number | Publication date |
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CN102169942A (zh) | 2011-08-31 |
US20110210310A1 (en) | 2011-09-01 |
US8274070B2 (en) | 2012-09-25 |
CN102169942B (zh) | 2015-06-24 |
JP2011181597A (ja) | 2011-09-15 |
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