JP5483810B2 - Resin composition - Google Patents
Resin composition Download PDFInfo
- Publication number
- JP5483810B2 JP5483810B2 JP2007255097A JP2007255097A JP5483810B2 JP 5483810 B2 JP5483810 B2 JP 5483810B2 JP 2007255097 A JP2007255097 A JP 2007255097A JP 2007255097 A JP2007255097 A JP 2007255097A JP 5483810 B2 JP5483810 B2 JP 5483810B2
- Authority
- JP
- Japan
- Prior art keywords
- meth
- resin composition
- acrylate
- component
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011342 resin composition Substances 0.000 title claims description 50
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 59
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 21
- 239000010419 fine particle Substances 0.000 claims description 18
- 229910044991 metal oxide Inorganic materials 0.000 claims description 16
- 150000004706 metal oxides Chemical class 0.000 claims description 16
- 125000005370 alkoxysilyl group Chemical group 0.000 claims description 15
- 238000011156 evaluation Methods 0.000 claims description 11
- 238000012986 modification Methods 0.000 claims description 11
- 230000004048 modification Effects 0.000 claims description 11
- 239000003505 polymerization initiator Substances 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000010538 cationic polymerization reaction Methods 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000007870 radical polymerization initiator Substances 0.000 claims description 3
- 238000010526 radical polymerization reaction Methods 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 210000002268 wool Anatomy 0.000 claims description 3
- -1 polypropylene Polymers 0.000 description 26
- 238000005259 measurement Methods 0.000 description 24
- 238000000034 method Methods 0.000 description 17
- 238000012360 testing method Methods 0.000 description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 15
- 238000000576 coating method Methods 0.000 description 15
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical group CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000004925 Acrylic resin Substances 0.000 description 11
- 229920000178 Acrylic resin Polymers 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 11
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 8
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 8
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 7
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- 230000008034 disappearance Effects 0.000 description 6
- 239000003999 initiator Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- 238000012790 confirmation Methods 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229940059574 pentaerithrityl Drugs 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- UIVYVMVUNGBJBI-UHFFFAOYSA-N (1-isocyanato-1-prop-2-enoyloxyethyl) prop-2-enoate Chemical compound C=CC(=O)OC(C)(OC(=O)C=C)N=C=O UIVYVMVUNGBJBI-UHFFFAOYSA-N 0.000 description 2
- NQUXRXBRYDZZDL-UHFFFAOYSA-N 1-(2-prop-2-enoyloxyethyl)cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1(CCOC(=O)C=C)C(O)=O NQUXRXBRYDZZDL-UHFFFAOYSA-N 0.000 description 2
- IEQWWMKDFZUMMU-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)CCOC(=O)C=C IEQWWMKDFZUMMU-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- ZGSJFMIWRLMFBZ-UHFFFAOYSA-N 3-(3-aminopropyl-ethoxy-ethylsilyl)oxybutan-1-amine Chemical compound NCCC(C)O[Si](OCC)(CC)CCCN ZGSJFMIWRLMFBZ-UHFFFAOYSA-N 0.000 description 2
- YXBROFPUNWVVMW-UHFFFAOYSA-N 3-[3-aminopropyl(diethyl)silyl]oxybutan-1-amine Chemical compound NCCC(C)O[Si](CC)(CC)CCCN YXBROFPUNWVVMW-UHFFFAOYSA-N 0.000 description 2
- FEMYGARSLSSEAT-UHFFFAOYSA-N 3-[3-aminopropyl(dimethyl)silyl]oxypropan-1-amine Chemical compound NCCC[Si](C)(C)OCCCN FEMYGARSLSSEAT-UHFFFAOYSA-N 0.000 description 2
- FXLADADLMHWCLD-UHFFFAOYSA-N 3-[ethoxy(diethyl)silyl]propan-1-amine Chemical compound CCO[Si](CC)(CC)CCCN FXLADADLMHWCLD-UHFFFAOYSA-N 0.000 description 2
- MCLXOMWIZZCOCA-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propan-1-amine Chemical compound CO[Si](C)(C)CCCN MCLXOMWIZZCOCA-UHFFFAOYSA-N 0.000 description 2
- DQMRXALBJIVORP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(C)CCCS DQMRXALBJIVORP-UHFFFAOYSA-N 0.000 description 2
- XLBNHVVSCQAMHG-UHFFFAOYSA-N 3-isocyanatopropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCN=C=O XLBNHVVSCQAMHG-UHFFFAOYSA-N 0.000 description 2
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- ZTZBNDIHHLGKMA-UHFFFAOYSA-N C(C1=CC=CC=C1)NCCC[Si](OCC)(CC)CC Chemical compound C(C1=CC=CC=C1)NCCC[Si](OCC)(CC)CC ZTZBNDIHHLGKMA-UHFFFAOYSA-N 0.000 description 2
- HPBVLYMTGKSMFU-UHFFFAOYSA-N C(C1=CC=CC=C1)NCCC[Si](OCC)(OCC)CC Chemical compound C(C1=CC=CC=C1)NCCC[Si](OCC)(OCC)CC HPBVLYMTGKSMFU-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KMBVVVSNPLQSIK-UHFFFAOYSA-N NCCNC[Si](OCC)(CC)CC Chemical compound NCCNC[Si](OCC)(CC)CC KMBVVVSNPLQSIK-UHFFFAOYSA-N 0.000 description 2
- CUWWPRVBJGTNQR-UHFFFAOYSA-N NCCNC[Si](OCC)(OCC)CC Chemical compound NCCNC[Si](OCC)(OCC)CC CUWWPRVBJGTNQR-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000012663 cationic photopolymerization Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 2
- DOTCGKDDRPVXDY-UHFFFAOYSA-N ethoxy-diethyl-(3-isocyanatopropyl)silane Chemical compound CCO[Si](CC)(CC)CCCN=C=O DOTCGKDDRPVXDY-UHFFFAOYSA-N 0.000 description 2
- WZJMRIMGNYUTSE-UHFFFAOYSA-N ethoxy-diethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](CC)(CC)CCCOCC1CO1 WZJMRIMGNYUTSE-UHFFFAOYSA-N 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- CSNJSTXFSLBBPX-UHFFFAOYSA-N n'-(trimethoxysilylmethyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CNCCN CSNJSTXFSLBBPX-UHFFFAOYSA-N 0.000 description 2
- JVQPPOFQIHYVKY-UHFFFAOYSA-N n'-[[dimethoxy(methyl)silyl]methyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CNCCN JVQPPOFQIHYVKY-UHFFFAOYSA-N 0.000 description 2
- BWULBENCAPUARJ-UHFFFAOYSA-N n'-[[methoxy(dimethyl)silyl]methyl]ethane-1,2-diamine Chemical compound CO[Si](C)(C)CNCCN BWULBENCAPUARJ-UHFFFAOYSA-N 0.000 description 2
- FKLYLJYMNADAQF-UHFFFAOYSA-N n-benzyl-3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCNCC1=CC=CC=C1 FKLYLJYMNADAQF-UHFFFAOYSA-N 0.000 description 2
- ZIQCTPGELXPYTK-UHFFFAOYSA-N n-benzyl-3-[methoxy(dimethyl)silyl]propan-1-amine Chemical compound CO[Si](C)(C)CCCNCC1=CC=CC=C1 ZIQCTPGELXPYTK-UHFFFAOYSA-N 0.000 description 2
- CLYWMXVFAMGARU-UHFFFAOYSA-N n-benzyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCC1=CC=CC=C1 CLYWMXVFAMGARU-UHFFFAOYSA-N 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 150000003606 tin compounds Chemical class 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 1
- QZZJTWAHFMBFSX-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC(C(Cl)(Cl)Cl)=N1 QZZJTWAHFMBFSX-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- HRPUANCEDYZMFT-UHFFFAOYSA-N 2-(1-hydroxycyclohexyl)-1-phenylethanone Chemical compound C=1C=CC=CC=1C(=O)CC1(O)CCCCC1 HRPUANCEDYZMFT-UHFFFAOYSA-N 0.000 description 1
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 description 1
- IBJKVHFMCVDBEB-UHFFFAOYSA-N 2-[2-(furan-2-yl)ethenyl]-1H-triazine Chemical class O1C(=CC=C1)C=CN1NC=CC=N1 IBJKVHFMCVDBEB-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- ZWKFQUQDYZELOC-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)-1-triethoxysilylpropan-1-one Chemical compound CCO[Si](OCC)(OCC)C(=O)CCOCC1CO1 ZWKFQUQDYZELOC-UHFFFAOYSA-N 0.000 description 1
- BNYFUBOZYDQIDU-UHFFFAOYSA-N 3-[diethoxy(ethyl)silyl]propan-1-amine Chemical compound CCO[Si](CC)(OCC)CCCN BNYFUBOZYDQIDU-UHFFFAOYSA-N 0.000 description 1
- UZQJSDJLHIHJRJ-UHFFFAOYSA-N 3-[diethoxy(ethyl)silyl]propane-1-thiol Chemical compound CCO[Si](CC)(OCC)CCCS UZQJSDJLHIHJRJ-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- KIXRCYSYUXZLHM-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol;3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](C)(OC)CCCS.CO[Si](OC)(OC)CCCS KIXRCYSYUXZLHM-UHFFFAOYSA-N 0.000 description 1
- RKCRTGUXAZZTIR-UHFFFAOYSA-N 3-[ethoxy(diethyl)silyl]propane-1-thiol Chemical compound CCO[Si](CC)(CC)CCCS RKCRTGUXAZZTIR-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- GEBPIEKIDGJIKN-UHFFFAOYSA-N 4,5,6-tris(chloromethyl)triazine Chemical compound ClCC1=NN=NC(CCl)=C1CCl GEBPIEKIDGJIKN-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LESWPBZLFOVDAF-UHFFFAOYSA-N CCOC(C(CCCN)O[Si](CC)(CCCN)OCC)(OCC)OCC Chemical compound CCOC(C(CCCN)O[Si](CC)(CCCN)OCC)(OCC)OCC LESWPBZLFOVDAF-UHFFFAOYSA-N 0.000 description 1
- UPXJUPWUAKWFQF-UHFFFAOYSA-N CC[Si](C)(C)OCC1CCCCC1 Chemical compound CC[Si](C)(C)OCC1CCCCC1 UPXJUPWUAKWFQF-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GCLLUWOJCVSLGS-UHFFFAOYSA-N NCCNC(C)O[Si](OCC)(OCC)C Chemical compound NCCNC(C)O[Si](OCC)(OCC)C GCLLUWOJCVSLGS-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- MEQHKDWHHSCJMX-UHFFFAOYSA-N O=C(CC1[ClH][ClH]C=C1OC1=CC=CC=C1)C1=CC=CC=C1 Chemical compound O=C(CC1[ClH][ClH]C=C1OC1=CC=CC=C1)C1=CC=CC=C1 MEQHKDWHHSCJMX-UHFFFAOYSA-N 0.000 description 1
- HMTPKQSJSNXTSN-UHFFFAOYSA-N O[SiH3].CC(=O)c1ccccc1 Chemical class O[SiH3].CC(=O)c1ccccc1 HMTPKQSJSNXTSN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- OWHGIWAFWOWTCR-UHFFFAOYSA-N [1-isocyanato-1-(2-methylprop-2-enoyloxy)ethyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(OC(=O)C(C)=C)N=C=O OWHGIWAFWOWTCR-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- NVJPBZCLWGTJKD-UHFFFAOYSA-N [bis(4-tert-butylphenyl)-lambda3-iodanyl] trifluoromethanesulfonate Chemical compound CC(C)(C)c1ccc(cc1)[I](OS(=O)(=O)C(F)(F)F)c1ccc(cc1)C(C)(C)C NVJPBZCLWGTJKD-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- DRDRZHJTTDSOPK-UHFFFAOYSA-N bis(2-chlorophenyl)methanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1Cl DRDRZHJTTDSOPK-UHFFFAOYSA-N 0.000 description 1
- MAOSFLAYGYQLBB-UHFFFAOYSA-N butane-1,4-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCCCO MAOSFLAYGYQLBB-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- ODADONMDNZJQMW-UHFFFAOYSA-N diethoxy-ethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](CC)(OCC)CCCOCC1CO1 ODADONMDNZJQMW-UHFFFAOYSA-N 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- SLQTWNAJXFHMHM-UHFFFAOYSA-N dimethoxy-methyl-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](C)(OC)OC)CCC2OC21 SLQTWNAJXFHMHM-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- HTSRFYSEWIPFNI-UHFFFAOYSA-N ethyl-dimethoxy-methylsilane Chemical compound CC[Si](C)(OC)OC HTSRFYSEWIPFNI-UHFFFAOYSA-N 0.000 description 1
- SUHRFYWSDBWMFS-UHFFFAOYSA-N ethyl-methoxy-dimethylsilane Chemical compound CC[Si](C)(C)OC SUHRFYWSDBWMFS-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009396 hybridization Methods 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- CIAYYZGZMJDALI-UHFFFAOYSA-N n'-(triethoxysilylmethyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CNCCN CIAYYZGZMJDALI-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- ILRLVKWBBFWKTN-UHFFFAOYSA-N n-benzyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNCC1=CC=CC=C1 ILRLVKWBBFWKTN-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- RLUCXJBHKHIDSP-UHFFFAOYSA-N propane-1,2-diol;propanoic acid Chemical compound CCC(O)=O.CC(O)CO RLUCXJBHKHIDSP-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZZJNLOGMYQURDL-UHFFFAOYSA-M trifluoromethanesulfonate;tris(4-methylphenyl)sulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 ZZJNLOGMYQURDL-UHFFFAOYSA-M 0.000 description 1
- ULAQISQDFQAUCH-UHFFFAOYSA-N trifluoromethanesulfonic acid hydroiodide Chemical compound I.OS(=O)(=O)C(F)(F)F ULAQISQDFQAUCH-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3072—Treatment with macro-molecular organic compounds
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/10—Treatment with macromolecular organic compounds
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Description
本発明は、主にプラスチック基材に塗布し活性エネルギー線を用いて硬化することにより、基材に対して優れた密着性・光学的な透明性・表面硬度・耐磨耗性を有する塗膜を形成する樹脂組成物に関するものである。 The present invention is a coating film having excellent adhesion, optical transparency, surface hardness, and abrasion resistance to a base material, which is mainly applied to a plastic base material and cured using an active energy ray. The present invention relates to a resin composition that forms.
ポリメチルメタクリレート、ポリカーボネート、ABS樹脂、塩化ビニル樹脂、ポリプロピレン、ＰＥＴなどに代表されるプラスチック製品は、軽さ・易成形性・耐衝撃性などに優れている反面、表面硬度・耐摩耗性が低い為、キズがつき易く外観を著しく損なうという欠点があり、各分野でプラスチックの使用を試みる場合、この欠点が使用を妨げる大きな要因となっている。このため、これらプラスチック製品に表面硬度・耐摩耗性を付与するためのハードコーティング処理が求められている。特に光学分野で使用されることが多いポリメチルメタクリレートやポリカーボネートは、表面硬度・耐摩耗性と同時に透明性が要求される。
これらの問題点を改善するハードコーティング用の樹脂組成物としてシリコン系、アクリル系、ウレタン系などの被覆材料を塗布し、熱又は活性エネルギー線により硬化され保護塗膜を形成する方法が知られている。しかし、シリコン系の樹脂組成物はアクリル系、ウレタン系よりも塗膜の表面硬度及び耐擦傷性（耐磨耗性）の点で優れているものの、加熱反応に依る硬化であり、生産性の低さや生産設備のコスト高から最近では敬遠されがちである。一方、密着性や耐磨耗性等の向上を目的として活性エネルギー線硬化によるアクリル系樹脂組成物が知られている（特許文献１ 参照）。
As a resin composition for hard coating that improves these problems, a coating method such as silicon-based, acrylic-based, or urethane-based is applied, and a method of forming a protective coating film by curing with heat or active energy rays is known. Yes. However, although the silicon-based resin composition is superior in terms of surface hardness and scratch resistance (abrasion resistance) of the coating film to acrylic and urethane systems, it is cured by a heating reaction and has a high productivity. Recently, it tends to be avoided because of its low cost and high production cost. On the other hand, an acrylic resin composition by active energy ray curing is known for the purpose of improving adhesion and wear resistance (see Patent Document 1).
しかしながら、熱硬化のシリコン系の樹脂組成物に対して活性エネルギー線硬化のアクリル系の樹脂組成物は生産性においては有利なものの、表面硬度と耐擦傷性の両方を好適に得られ難いのが現状である。
本発明は、塗膜の密着性・光学的な透明性・表面硬度・耐擦傷性に優れた被膜を形成することのできる樹脂組成物、及び該樹脂組成物の製造方法を提供することを技術課題とする。
However, although the active energy ray-cured acrylic resin composition is advantageous in terms of productivity as compared with the thermosetting silicon-based resin composition, it is difficult to suitably obtain both surface hardness and scratch resistance. Currently.
The present invention provides a resin composition capable of forming a coating film excellent in adhesion, optical transparency, surface hardness, and scratch resistance of the coating film, and a method for producing the resin composition. Let it be an issue.
本発明は、上記課題を解決するために、次のような構成を備えることを特徴とする。
（１） 本発明の樹脂組成物は、（ｉ）アルコキシシリル基及び（メタ）アクリロイル基を同一分子内に有する化合物と、（ii）アルコキシシリル基又は／及び（メタ）アクリロイル基を持つように表面修飾率が５％〜５０％として表面修飾された金属酸化物微粒子と、（iii）3個以上の（メタ）アクリロイル基を有する多官能（メタ）アクリレートと、（iv）重合開始剤として光ラジカル重合開始剤及び光カチオン重合開始剤と、を含有する樹脂組成物であって，光ラジカル重合及び光カチオン重合を可能とする活性エネルギー線照射により光ラジカル重合及び光カチオン重合の両方の硬化系で有機無機ハイブリッド化された前記樹脂組成物に対する鉛筆硬度評価では少なくとも鉛筆硬度７Ｈが得られると共に，荷重1.5kgの10往復にて擦ったスチールウールによる耐擦傷性評価ではキズが１〜５本となる機械的物性が得られる、ことを特徴とする。
（２） （１）の樹脂組成物において、（ｉ）、（ii）、（iii）の割合が全固形分に対して
（ｉ）成分 ３〜５０重量％
（ii）成分 ２０〜９０重量％
（iii）成分 ３〜５０重量％
であり、（iv）成分は（i）成分＋（iii）成分の重量に対して
（iv）成分 １〜４０重量％
であることを特徴とする。
In order to solve the above-mentioned problems, the present invention is characterized by having the following configuration.
(1) The resin composition of the present invention has (i) a compound having an alkoxysilyl group and a (meth) acryloyl group in the same molecule, and (ii) an alkoxysilyl group and / or a (meth) acryloyl group. Metal oxide fine particles surface-modified with a surface modification rate of 5% to 50% , (iii) a polyfunctional (meth) acrylate having 3 or more (meth) acryloyl groups, and (iv) light as a polymerization initiator A resin composition comprising a radical polymerization initiator and a photocationic polymerization initiator, wherein both photoradical polymerization and photocationic polymerization are cured by irradiation with active energy rays capable of photoradical polymerization and photocationic polymerization. In the pencil hardness evaluation of the resin composition hybridized with organic and inorganic materials, at least a pencil hardness of 7H was obtained, and the steel was rubbed with 10 reciprocations with a load of 1.5 kg. It is characterized in that mechanical properties with scratches of 1 to 5 are obtained in the scratch resistance evaluation with wool wool .
(2) In the resin composition of (1), the ratio of (i), (ii), (iii) is based on the total solid content
(I) Component 3 to 50% by weight
(Ii) Component 20 to 90% by weight
(Iii) Component 3 to 50% by weight
(Iv) component is based on the weight of component (i) + component (iii)
(Iv) Component 1 to 40% by weight
It is characterized by being.
本発明の樹脂組成物は、基材に対する密着性、光学的な透明性、表面硬度、耐擦傷性が優れた被膜を形成することが可能であり、熱硬化ではなく活性エネルギーの照射による硬化のため、耐熱性の低いプラスチック基材にとってダメージを受け難いハードコート用の樹脂組成物として有用である。 The resin composition of the present invention can form a film having excellent adhesion to a substrate, optical transparency, surface hardness, and scratch resistance, and is not cured by thermal energy irradiation but by curing with active energy. Therefore, it is useful as a resin composition for a hard coat that is hardly damaged by a plastic substrate having low heat resistance.
以下において、本発明実施の形態について詳細に説明するが、本発明はこれらに限定されるものではない。本実施形態の樹脂組成物は、アルコキシシリル基及び（メタ）アクリロイル基を同一分子内に有する化合物を得る段階（手順１）、アルコキシシリル基又は／及び（メタ）アクリロイル基で表面修飾された金属酸化物微粒子を得る段階（手順２）、手順１で得られた化合物、手順２で得られた表面修飾済の金属酸化物微粒子と、3個以上の（メタ）アクリロイル基を有する多官能（メタ）アクリレートと、重合開始剤として光ラジカル重合開始剤及び光カチオン重合開始剤と、を混合する段階（手順３）、によって得ることができる。以下では各手順毎に分けて説明する。 Hereinafter, embodiments of the present invention will be described in detail, but the present invention is not limited thereto. The resin composition of the present embodiment is a step of obtaining a compound having an alkoxysilyl group and a (meth) acryloyl group in the same molecule (procedure 1), a surface-modified metal with an alkoxysilyl group and / or a (meth) acryloyl group Step of obtaining oxide fine particles (Procedure 2), compound obtained in Procedure 1, surface-modified metal oxide fine particles obtained in Procedure 2, and polyfunctional (meta) having three or more (meth) acryloyl groups ) The acrylate and the radical photopolymerization initiator and the photocationic polymerization initiator as a polymerization initiator are mixed (step 3). In the following, each procedure will be described separately.
（手順１）
本実施形態で使用される（ｉ）アルコキシシリル基及び（メタ）アクリロイル基を同一分子内に有する化合物の合成方法は特に限定されるものではないが、例として以下のように行うことができる。
ヒドロキシル基又はエポキシ基又はカルボキシル基含有の（メタ）アクリレートとこれらと反応し得る官能基（イソシアネート基・メルカプト基・ヒドロキシル基・アミノ基・カルボキシル基・エポキシ基等）を含有したシランカップリング剤を必要に応じてスズ化合物などを触媒として（(メタ)アクリレートの重量に対して100〜1000ppm添加）10〜100℃、好ましくは20〜50℃に加熱しながら30分〜24時間、好ましくは1〜8時間攪拌し反応させることで、アルコキシシリル基及び（メタ）アクリロイル基を同一分子内に有する化合物が得られる。
なお、「（メタ）アクリレート」とは、アクリレート及びメタクリレートの双方を含む意味で、「（メタ）アクリロイル基」とは、アクリロイル基及びメタクリロイル基の双方を含む意味で用いている。
(Procedure 1)
A method for synthesizing a compound having (i) an alkoxysilyl group and a (meth) acryloyl group in the same molecule used in the present embodiment is not particularly limited, but can be performed as follows as an example.
A silane coupling agent containing a hydroxyl group, an epoxy group or a carboxyl group-containing (meth) acrylate and a functional group capable of reacting with these (isocyanate group, mercapto group, hydroxyl group, amino group, carboxyl group, epoxy group, etc.) If necessary, tin compound or the like as a catalyst (added 100 to 1000 ppm based on the weight of (meth) acrylate) 10 to 100 ° C., preferably 30 to 24 hours with heating to 20 to 50 ° C., preferably 1 to By stirring and reacting for 8 hours, a compound having an alkoxysilyl group and a (meth) acryloyl group in the same molecule is obtained.
“(Meth) acrylate” means that both acrylate and methacrylate are included, and “(meth) acryloyl group” means that both acryloyl group and methacryloyl group are included.
ここで使用できる（メタ）アクリレートの例として、２−ヒドロキシエチル（メタ）アクリレート、２−ヒドロキシプロピル（メタ）アクリレート、（メタ）アクリル酸、２−（メタ）アクリロイロキシエチルコハク酸、２−（メタ）アクリロイロキシエチルヘキサヒドロフタル酸、グリシジル（メタ）アクリレート、２−（メタ）アクリロイロキシエチルアシッドホスフェート、グリセリンジ（メタ）アクリレート、２−ヒドロキシ３−アクリロイロプロピル（メタ）アクリレート、テトラヒドロフルフリル（メタ）アクリレート、２−ヒドロキシブチル（メタ）アクリレート、ペンタエリスリトールトリ（メタ）アクリレート、ジペンタエリスリトールペンタ（メタ）アクリレート、ジペンタエリスリトールテトラ（メタ）アクリレート、１，４ブタンジオールジ（メタ）アクリレート、１，６ヘキサンジオールジ（メタ）アクリレート、ネオペンチルグリコールジ（メタ）アクリレート、ポリエチレングリコールジ（メタ）アクリレート、ポリプロピレングリコールジ（メタ）アクリレート、ジシクロペンタニルジ（メタ）アクリレート、ジペンタエリスリトールトリ（メタ）アクリレート、及びこれらの混合物等が挙げられる。 Examples of (meth) acrylates that can be used here include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid, 2- (meth) acryloyloxyethyl succinic acid, 2- (Meth) acryloyloxyethyl hexahydrophthalic acid, glycidyl (meth) acrylate, 2- (meth) acryloyloxyethyl acid phosphate, glycerin di (meth) acrylate, 2-hydroxy-3-acryloylpropyl (meth) acrylate, Tetrahydrofurfuryl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate 1,4 butanediol di (meth) acrylate, 1,6 hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, dicyclopenta Examples thereof include nildi (meth) acrylate, dipentaerythritol tri (meth) acrylate, and mixtures thereof.
またイソシアネート基・メルカプト基・ヒドロキシル基・アミノ基・カルボキシル基・エポキシ基を含有したシランカップリング剤の例として、３−イソシアネートプロピルトリエトキシシラン、３−イソシアネートプロピルトリメトキシシラン、３−イソシアネートプロピルエチルジエトキシシラン、３−イソシアネートプロピルメチルジメトキシシラン、３−イソシアネートプロピルジエチルエトキシシラン、３−イソシアネートプロピルジメチルメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルトリメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルメチルジメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルジメチルメトキシシラン、３−グリシドキシプロピルトリメトキシシラン、３−グリシドキシプロピルエチルジエトキシシラン、３−グリシドキシプロピルトリエトキシシラン、３−グリシドキシプロピルメチルジメトキシシラン、３−グリシドキシプロピルジメチルメトキシシラン、３−グリシドキシプロピルジエチルエトキシシラン、N−２（アミノエチル）３−アミノプロピルメチルジメトキシラン、N−２（アミノエチル）３−アミノプロピルトリメトキシシラン、N−２（アミノエチル）３−アミノプロピルトリエトキシシラン、N−２（アミノエチル）３−アミノプロピルエチルジエトキシシラン、N−２（アミノエチル）３−アミノプロピルジメチルメトキシシラン、N−２（アミノエチル）３−アミノプロピルジエチルエトキシシラン、３−アミノプロピルトリメトキシシラン、３−アミノプロピルトリエトキシシラン、３−アミノプロピルエチルジエトキシシラン、３−アミノプロピルメチルジメトキシシラン、３−アミノプロピルジエチルエトキシシラン、３−アミノプロピルジメチルメトキシシラン、N−フェニル−３−アミノプロピルトリメトキシラン、N−フェニル−３−アミノプロピルトリエトキシラン、N−フェニル−３−アミノプロピルメチルジメトキシラン、N−フェニル−３−アミノプロピルエチルジエトキシラン、N−フェニル−３−アミノプロピルジメチルメトキシラン、N−フェニル−３−アミノプロピルジエチルエトキシラン、３−メルカプトプロピルメチルジメトキシシラン、３−メルカプトプロピルトリメトキシシラン、３−メルカプトプロピルジメチルメトキシシラン、３−メルカプトプロピルトリエトキシシラン、３−メルカプトプロピルエチルジエトキシシラン、３−メルカプトプロピルジエチルエトキシシラン、２−アミノエチルアミノメチルトリメトキシシラン、２−アミノエチルアミノメチルメチルジメトキシシラン、２−アミノエチルアミノメチルジメチルメトキシシラン、２−アミノエチルアミノメチルトリエトキシシラン、２−アミノエチルアミノメチルエチルジエトキシシラン、２−アミノエチルアミノメチルジエチルエトキシシラン、３−（２−アミノエチルアミノプロピル）トリメトキシシラン、３−（２−アミノエチルアミノプロピル）メチルジメトキシシラン、３−（２−アミノエチルアミノプロピル）ジメチルメトキシシラン、３−（２−アミノエチルアミノプロピル）トリエトキシシラン、３−（２−アミノエチルアミノプロピル）エチルジエトキシシラン、３−（２−アミノエチルアミノプロピル）ジエチルエトキシシラン、３−ベンジルアミノプロピルトリメトキシシラン、３−ベンジルアミノプロピルメチルジメトキシシラン、３−ベンジルアミノプロピルジメチルメトキシシラン、３−ベンジルアミノプロピルトリエトキシシラン、３−ベンジルアミノプロピルエチルジエトキシシラン、３−ベンジルアミノプロピルジエチルエトキシシラン及びこれらの混合物等が挙げられる。 Examples of silane coupling agents containing isocyanate groups, mercapto groups, hydroxyl groups, amino groups, carboxyl groups, and epoxy groups include 3-isocyanatepropyltriethoxysilane, 3-isocyanatepropyltrimethoxysilane, and 3-isocyanatepropylethyl. Diethoxysilane, 3-isocyanatopropylmethyldimethoxysilane, 3-isocyanatopropyldiethylethoxysilane, 3-isocyanatopropyldimethylmethoxysilane, 2- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4 epoxycyclohexyl) ) Ethylmethyldimethoxysilane, 2- (3,4 epoxycyclohexyl) ethyldimethylmethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-g Sidoxypropylethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyldimethylmethoxysilane, 3-glycidoxypropyldiethylethoxysilane, N- 2 (aminoethyl) 3-aminopropylmethyldimethoxylane, N-2 (aminoethyl) 3-aminopropyltrimethoxysilane, N-2 (aminoethyl) 3-aminopropyltriethoxysilane, N-2 (aminoethyl) 3-aminopropylethyldiethoxysilane, N-2 (aminoethyl) 3-aminopropyldimethylmethoxysilane, N-2 (aminoethyl) 3-aminopropyldiethylethoxysilane, 3-aminopropyltrimethoxysilane, 3-amino Propyltriethoxy 3-aminopropylethyldiethoxysilane, 3-aminopropylmethyldimethoxysilane, 3-aminopropyldiethylethoxysilane, 3-aminopropyldimethylmethoxysilane, N-phenyl-3-aminopropyltrimethoxylane, N-phenyl -3-aminopropyltriethoxylane, N-phenyl-3-aminopropylmethyldimethoxylane, N-phenyl-3-aminopropylethyldiethoxylane, N-phenyl-3-aminopropyldimethylmethoxylane, N-phenyl- 3-aminopropyldiethylethoxylane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyldimethylmethoxysilane, 3-mercaptopropyltriethoxysilane, 3-merca Ptopropylethyldiethoxysilane, 3-mercaptopropyldiethylethoxysilane, 2-aminoethylaminomethyltrimethoxysilane, 2-aminoethylaminomethylmethyldimethoxysilane, 2-aminoethylaminomethyldimethylmethoxysilane, 2-aminoethylamino Methyltriethoxysilane, 2-aminoethylaminomethylethyldiethoxysilane, 2-aminoethylaminomethyldiethylethoxysilane, 3- (2-aminoethylaminopropyl) trimethoxysilane, 3- (2-aminoethylaminopropyl) Methyldimethoxysilane, 3- (2-aminoethylaminopropyl) dimethylmethoxysilane, 3- (2-aminoethylaminopropyl) triethoxysilane, 3- (2-aminoethylaminopropyl) Rudiethoxysilane, 3- (2-aminoethylaminopropyl) diethylethoxysilane, 3-benzylaminopropyltrimethoxysilane, 3-benzylaminopropylmethyldimethoxysilane, 3-benzylaminopropyldimethylmethoxysilane, 3-benzylaminopropyl Examples include triethoxysilane, 3-benzylaminopropylethyldiethoxysilane, 3-benzylaminopropyldiethylethoxysilane, and mixtures thereof.
（手順２）
本実施形態で使用される（ii）アルコキシシリル基又は／及び（メタ）アクリロイル基で表面修飾された金属酸化物微粒子の合成法は特に限定されるものではないが、例として以下のように行うことができる。
有機溶媒を分散媒とした金属酸化物微粒子中に、下記に示すような表面修飾分子を所定量添加し、必要に応じてスズ化合物などの触媒存在下（シリカ固形分に対して100〜1000ppm添加）で10〜100℃、好ましくは20〜50℃に加熱しながら1〜48時間、好ましくは12〜24時間攪拌し反応させることにより、アルコキシシリル基又は／及び（メタ）アクリロイル基で表面修飾された金属酸化物微粒子が得られる。
(Procedure 2)
The method of synthesizing the metal oxide fine particles surface-modified with (ii) alkoxysilyl groups and / or (meth) acryloyl groups used in the present embodiment is not particularly limited, but is performed as follows as an example. be able to.
A predetermined amount of surface modification molecules as shown below are added to metal oxide fine particles using an organic solvent as a dispersion medium, and if necessary, in the presence of a catalyst such as a tin compound (100 to 1000 ppm added to the silica solid content) ) Is heated to 10 to 100 ° C., preferably 20 to 50 ° C. while stirring for 1 to 48 hours, preferably 12 to 24 hours, and the surface is modified with an alkoxysilyl group and / or (meth) acryloyl group. Metal oxide fine particles can be obtained.
ここで表面修飾率は金属酸化物微粒子表面のヒドロキシル基に対して何％がアルコキシシリル基又は／及び（メタ）アクリロイル基に置き換わったかを表しており、本発明では表面修飾率1〜100％の範囲とする。1％以下では有機無機ハイブリッドが出来難く、高硬度性が得られない。また100％以上では過剰の修飾分子により高硬度性が得られない。表面修飾率5〜50％とすることが好ましい。尚、シリカ表面のヒドロキシル基は1.7mmol/gとして換算する。
また、（ｉ）で使用するシランカップリング剤と（ii）で使用する表面修飾分子を同じもので設計した場合、手順１にて（ｉ）の化合物の合成する際このシランカップリング剤を過剰に添加しておけば、その過剰分を使用してシリカの表面修飾が出来るので、同一の反応容器内にて手順１に続けて手順２を効率よく実行することもできる。
Here, the surface modification rate indicates how many percent of the hydroxyl groups on the surface of the metal oxide fine particles are replaced by alkoxysilyl groups and / or (meth) acryloyl groups. In the present invention, the surface modification rate is 1 to 100%. Range. If it is 1% or less, it is difficult to produce an organic-inorganic hybrid, and high hardness cannot be obtained. On the other hand, if it is 100% or more, high hardness cannot be obtained due to the excessive modifying molecules. The surface modification rate is preferably 5 to 50%. The hydroxyl group on the silica surface is converted to 1.7 mmol / g.
In addition, when the silane coupling agent used in (i) and the surface modification molecule used in (ii) are designed to be the same, excess of the silane coupling agent is required when synthesizing the compound of (i) in step 1. If it is added to, the surface of the silica can be modified using the excess, so that the procedure 2 can be efficiently carried out after the procedure 1 in the same reaction vessel.
本実施形態で使用される金属酸化物微粒子の粒径としては、平均粒径がサブミクロンオーダのものを使用する。好ましくは100nm以下であり、物理的な大きさを有していれば、その下限は特に限定されない。入手可能な無機微粒子の粒径によって定められることとなる。使用可能な金属酸化物微粒子としては、表面修飾可能な金属酸化物ゾルを挙げることができる。例えば、シリカ（ＳｉＯ2）、アルミナ（Ａｌ2Ｏ3）、ジルコニア（ＺｒＯ2）、チタニア（ＴｉＯ2）、ＩＴＯ（スズドープ酸化インジウム）、酸化スズ（ＳｎＯ2）、酸化亜鉛（ＺｎＯ2）、酸化アンチモン（Ｓｂ2Ｏ3、Ｓｂ2Ｏ5）、及びこれらの複合微粒子等を挙げることができる。 As the particle size of the metal oxide fine particles used in the present embodiment, those having an average particle size of submicron order are used. The lower limit is not particularly limited as long as it is 100 nm or less and has a physical size. It will be determined by the particle size of available inorganic fine particles. Examples of metal oxide fine particles that can be used include surface-modifiable metal oxide sols. For example, silica (SiO 2 ), alumina (Al 2 O 3 ), zirconia (ZrO 2 ), titania (TiO 2 ), ITO (tin-doped indium oxide), tin oxide (SnO 2 ), zinc oxide (ZnO 2 ), oxidation Examples thereof include antimony (Sb 2 O 3 , Sb 2 O 5 ) and composite fine particles thereof.
また、本実施形態で使用される金属酸化物微粒子の分散媒としての有機溶媒は、メチルエチルケトン（MEK）、メチルイソブチルケトン（MIBK）、イソプロピルアルコール（IPA）、メタノール、エチレングリコール、n−プロピルセロソルブ、ジメチルアセトアミド、キシレン、トルエン、n―ブタノール、プロピレングリコールモノメチルアセテート、プロピレングリコールモノメチルエーテル、エタノール、プロピレングリコール、ジアセトンアルコール、及びこれらの混合物等が挙げられる。 Moreover, the organic solvent as a dispersion medium of the metal oxide fine particles used in this embodiment is methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), isopropyl alcohol (IPA), methanol, ethylene glycol, n-propyl cellosolve, Examples thereof include dimethylacetamide, xylene, toluene, n-butanol, propylene glycol monomethyl acetate, propylene glycol monomethyl ether, ethanol, propylene glycol, diacetone alcohol, and mixtures thereof.
また、本実施形態で使用される金属酸化物微粒子の表面修飾分子は、金属酸化物微粒子表面のヒドロキシル基と反応する官能基を含むシランカップリング剤や、ヒドロキシル基と反応する官能基を含む（メタ）アクリレートであればよい。ヒドロキシル基と反応する官能基を含むシランカップリング剤としては、３−イソシアネートプロピルトリエトキシシラン、３−イソシアネートプロピルトリメトキシシラン、３−イソシアネートプロピルエチルジエトキシシラン、３−イソシアネートプロピルメチルジメトキシシラン、３−イソシアネートプロピルジエチルエトキシシラン、３−イソシアネートプロピルジメチルメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルトリメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルメチルジメトキシシラン、２−（３，４エポキシシクロヘキシル）エチルジメチルメトキシシラン、３−グリシドキシプロピルトリメトキシシラン、３−グリシドキシプロピルエチルジエトキシシラン、３−グリシドキシプロピルトリエトキシシラン、３−グリシドキシプロピルメチルジメトキシシラン、３−グリシドキシプロピルジメチルメトキシシラン、３−グリシドキシプロピルジエチルエトキシシラン、N−２（アミノエチル）３−アミノプロピルメチルジメトキシラン、N−２（アミノエチル）３−アミノプロピルトリメトキシシラン、N−２（アミノエチル）３−アミノプロピルトリエトキシシラン、N−２（アミノエチル）３−アミノプロピルエチルジエトキシシラン、N−２（アミノエチル）３−アミノプロピルジメチルメトキシシラン、N−２（アミノエチル）３−アミノプロピルジエチルエトキシシラン、３−アミノプロピルトリメトキシシラン、３−アミノプロピルトリエトキシシラン、３−アミノプロピルエチルジエトキシシラン、３−アミノプロピルメチルジメトキシシラン、３−アミノプロピルジエチルエトキシシラン、３−アミノプロピルジメチルメトキシシラン、N−フェニル−３−アミノプロピルトリメトキシラン、N−フェニル−３−アミノプロピルトリエトキシラン、N−フェニル−３−アミノプロピルメチルジメトキシラン、N−フェニル−３−アミノプロピルエチルジエトキシラン、N−フェニル−３−アミノプロピルジメチルメトキシラン、N−フェニル−３−アミノプロピルジエチルエトキシラン、３−メルカプトプロピルメチルジメトキシシラン、３−メルカプトプロピルトリメトキシシラン、３−メルカプトプロピルジメチルメトキシシラン、３−メルカプトプロピルトリエトキシシラン、３−メルカプトプロピルエチルジエトキシシラン、３−メルカプトプロピルジエチルエトキシシラン、２−アミノエチルアミノメチルトリメトキシシラン、２−アミノエチルアミノメチルメチルジメトキシシラン、２−アミノエチルアミノメチルジメチルメトキシシラン、２−アミノエチルアミノメチルトリエトキシシラン、２−アミノエチルアミノメチルエチルジエトキシシラン、２−アミノエチルアミノメチルジエチルエトキシシラン、３−（２−アミノエチルアミノプロピル）トリメトキシシラン、３−（２−アミノエチルアミノプロピル）メチルジメトキシシラン、３−（２−アミノエチルアミノプロピル）ジメチルメトキシシラン、３−（２−アミノエチルアミノプロピル）トリエトキシシラン、３−（２−アミノエチルアミノプロピル）エチルジエトキシシラン、３−（２−アミノエチルアミノプロピル）ジエチルエトキシシラン、３−ベンジルアミノプロピルトリメトキシシラン、３−ベンジルアミノプロピルメチルジメトキシシラン、３−ベンジルアミノプロピルジメチルメトキシシラン、３−ベンジルアミノプロピルトリエトキシシラン、３−ベンジルアミノプロピルエチルジエトキシシラン、３−ベンジルアミノプロピルジエチルエトキシシラン、ヒドロキシル基と反応する官能基を含む（メタ）アクリレートとしては、例えば、２−アクリロイルオキシエチルイソシアネート、２−メタクリロイルオキシエチルイソシアネート、１，１−ビス（アクリロイルオキシ）エチルイソシアネート、１，１−ビス（メタクリロイルオキシ）エチルイソシアネート、２−ヒドロキシエチル（メタ）アクリレート、２−ヒドロキシプロピル（メタ）アクリレート、（メタ）アクリル酸、２−（メタ）アクリロイロキシエチルコハク酸、２−（メタ）アクリロイロキシエチルヘキサヒドロフタル酸、グリシジル（メタ）アクリレート、２−（メタ）アクリロイロキシエチルアシッドホスフェート、グリセリンジ（メタ）アクリレート、２−ヒドロキシ３−アクリロイロプロピル（メタ）アクリレート、テトラヒドロフルフリル（メタ）アクリレート、２−ヒドロキシブチル（メタ）アクリレート、ペンタエリスリトールトリ（メタ）アクリレート、ジペンタエリスリトールペンタ（メタ）アクリレート、ジペンタエリスリトールテトラ（メタ）アクリレート、１，４ブタンジオールジ（メタ）アクリレート、１，６ヘキサンジオールジ（メタ）アクリレート、ネオペンチルグリコールジ（メタ）アクリレート、ポリエチレングリコールジ（メタ）アクリレート、ポリプロピレングリコールジ（メタ）アクリレート、ジシクロペンタニルジ（メタ）アクリレート、ジペンタエリスリトールトリ（メタ）アクリレート、２−ヒドロキシブチル（メタ）アクリレート、４−ヒドロキシブチル（メタ）アクリレート、グリシジル（メタ）アクリレート、３，４−エポキシシクロヘキシルメチル（メタ）アクリレート及びこれらの混合物等が挙げられる。 Moreover, the surface modification molecule | numerator of the metal oxide fine particle used by this embodiment contains the silane coupling agent containing the functional group which reacts with the hydroxyl group of the metal oxide fine particle surface, and the functional group which reacts with a hydroxyl group ( Any meth) acrylate may be used. Examples of the silane coupling agent containing a functional group that reacts with a hydroxyl group include 3-isocyanatepropyltriethoxysilane, 3-isocyanatepropyltrimethoxysilane, 3-isocyanatepropylethyldiethoxysilane, 3-isocyanatepropylmethyldimethoxysilane, 3 -Isocyanatopropyldiethylethoxysilane, 3-isocyanatopropyldimethylmethoxysilane, 2- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4 epoxycyclohexyl) ethylmethyldimethoxysilane, 2- (3,4 epoxy) (Cyclohexyl) ethyldimethylmethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylethyldiethoxysilane, 3-glycidoxypropiyl Triethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyldimethylmethoxysilane, 3-glycidoxypropyldiethylethoxysilane, N-2 (aminoethyl) 3-aminopropylmethyldimethoxysilane, N -2 (aminoethyl) 3-aminopropyltrimethoxysilane, N-2 (aminoethyl) 3-aminopropyltriethoxysilane, N-2 (aminoethyl) 3-aminopropylethyldiethoxysilane, N-2 (amino Ethyl) 3-aminopropyldimethylmethoxysilane, N-2 (aminoethyl) 3-aminopropyldiethylethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylethyldiethoxysilane, 3-aminopropy Methyldimethoxysilane, 3-aminopropyldiethylethoxysilane, 3-aminopropyldimethylmethoxysilane, N-phenyl-3-aminopropyltrimethoxylane, N-phenyl-3-aminopropyltriethoxylane, N-phenyl-3- Aminopropylmethyldimethoxylane, N-phenyl-3-aminopropylethyldiethoxylane, N-phenyl-3-aminopropyldimethylmethoxylane, N-phenyl-3-aminopropyldiethylethoxylane, 3-mercaptopropylmethyldimethoxysilane 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyldimethylmethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropylethyldiethoxysilane, 3-mercaptopropyldiethyl Ruethoxysilane, 2-aminoethylaminomethyltrimethoxysilane, 2-aminoethylaminomethylmethyldimethoxysilane, 2-aminoethylaminomethyldimethylmethoxysilane, 2-aminoethylaminomethyltriethoxysilane, 2-aminoethylaminomethyl Ethyldiethoxysilane, 2-aminoethylaminomethyldiethylethoxysilane, 3- (2-aminoethylaminopropyl) trimethoxysilane, 3- (2-aminoethylaminopropyl) methyldimethoxysilane, 3- (2-aminoethyl) Aminopropyl) dimethylmethoxysilane, 3- (2-aminoethylaminopropyl) triethoxysilane, 3- (2-aminoethylaminopropyl) ethyldiethoxysilane, 3- (2-aminoethylaminopropyl) die Ruethoxysilane, 3-benzylaminopropyltrimethoxysilane, 3-benzylaminopropylmethyldimethoxysilane, 3-benzylaminopropyldimethylmethoxysilane, 3-benzylaminopropyltriethoxysilane, 3-benzylaminopropylethyldiethoxysilane, 3-Benzylaminopropyldiethylethoxysilane, (meth) acrylate containing a functional group that reacts with a hydroxyl group, for example, 2-acryloyloxyethyl isocyanate, 2-methacryloyloxyethyl isocyanate, 1,1-bis (acryloyloxy) Ethyl isocyanate, 1,1-bis (methacryloyloxy) ethyl isocyanate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate Rate, (meth) acrylic acid, 2- (meth) acryloyloxyethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, glycidyl (meth) acrylate, 2- (meth) acryloyloxyethyl acid Phosphate, glycerin di (meth) acrylate, 2-hydroxy-3-acryloylpropyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol Penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, 1,4 butanediol di (meth) acrylate, 1,6 hexanediol di (meth) acrylate, neopentyl glycol di (meth) a Chryrate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, dicyclopentanyl di (meth) acrylate, dipentaerythritol tri (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl Examples include (meth) acrylate, glycidyl (meth) acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, and mixtures thereof.
（手順３）
あらかじめ（手順１）で合成された（ｉ）アルコキシシリル基及び（メタ）アクリロイル基を同一分子内に有する化合物と、（手順２）で合成された（ii）アルコキシシリル基又は／及び（メタ）アクリロイル基で表面修飾された有機溶媒を分散媒とした金属酸化物微粒子を混合し、さらに（iii）3個以上の（メタ）アクリロイル基を有する多官能（メタ）アクリレート、（iv）光ラジカル重合開始剤及び光カチオン重合開始剤、さらに必要に応じて（v）その他の添加物を混合することで、目的のハードコート用の樹脂組成物を得ることができる。なお、樹脂組成物に含有する各成分の割合は、全固形分重量当たり（ｉ）成分３〜５０重量％、（ii）成分２０〜９０重量％、（iii）成分３〜５０重量部％であり（iv）成分は（ｉ）＋（iii）の重量に対して１〜４０重量％である。
(Procedure 3)
(I) a compound having an alkoxysilyl group and a (meth) acryloyl group synthesized in advance in (Procedure 1) in the same molecule, and (ii) an alkoxysilyl group or / and (meth) synthesized in (Procedure 2) Mixing metal oxide fine particles using organic solvent surface modified with acryloyl group as dispersion medium, and (iii) polyfunctional (meth) acrylate having 3 or more (meth) acryloyl groups, (iv) radical photopolymerization By mixing an initiator, a cationic photopolymerization initiator, and, if necessary, (v) other additives, a desired resin composition for hard coat can be obtained. In addition, the ratio of each component contained in the resin composition is (i) component 3 to 50% by weight, (ii) component 20 to 90% by weight, and (iii) component 3 to 50% by weight based on the total solid weight. Yes (iv) Component is 1 to 40% by weight based on the weight of (i) + (iii).
なお、本実施形態で使用される（iii）3個以上の（メタ）アクリロイル基を有する多官能（メタ）アクリレートの例としては、トリメチロールプロパントリ（メタ）アクリレート、EO変性トリメチロールプロパントリ（メタ）アクリレート、ペンタエリスリトールトリ（メタ）アクリレート、ペンタエリスリトールテトラ（メタ）アクリレート、ジペンタエリスリトールヘキサ（メタ）アクリレート、ジペンタエリスリトールペンタ（メタ）アクリレート、ジペンタエリスリトールテトラ（メタ）アクリレート、ジペンタエリスリトールトリ（メタ）アクリレート、テトラメチロールメタントリアクリレート、テトラメチロールメタンテトラアクリレート、トリス（２-ヒドロキシエチル）イソシアヌレートトリアクリレート等の分岐鎖状、環状の（メタ）アクリレート類、又はウレタンアクリレート類等、そしてこれらの重合体(オリゴマー、ポリマー)を挙げることができ、これらを１種類又は２種類以上の混合物にすることも可能である。 Examples of polyfunctional (meth) acrylates having (iii) three or more (meth) acryloyl groups used in this embodiment include trimethylolpropane tri (meth) acrylate, EO-modified trimethylolpropane tri ( (Meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol Branched, cyclic, such as tri (meth) acrylate, tetramethylolmethane triacrylate, tetramethylolmethane tetraacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate (Meth) acrylates, urethane acrylates, and the like, and polymers (oligomers, polymers) thereof can be used, and these can be used alone or in a mixture of two or more.
また、本実施形態で使用される（iv）光ラジカル重合開始剤及び光カチオン重合開始剤は、以下のものが挙げられるが、これらに限定されるものではない。光ラジカル重合開始剤の例として、トリス（クロロメチル）トリアジン、２，４−トリクロロメチル−（４'−メトキシスチリル）−６−トリアジン、２−〔２−（フラン−２−イル）エテニル〕−４，６−ビス（トリクロロメチル）−Ｓ−トリアジン、２，４，６−トリス（トリクロロメチル）−Ｓ−トリアジンなどのトリアジン系化合物、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインブチルエーテルなどのベンゾイン系化合物、ジエトキシアセトフェノン、４−フェノキシジクロロラセトフェノン、２−ベンジル−２−ジメチルアミノ−１−（４−モルフォリノフェニル）−ブタン−１−オン、ベンゾフェノン、２−ヒドロキシ−２−メチルプロピオフェノン、１−ヒドロキシシクロヘキシルフェニルケトン、１−ヒドロキシシクロヘキシルアセトフェノンなどのアセトフェノン系化合物、チオキサントン、２−メチルチオキサントン、２，４−ジメチルチオキサントン、２−クロロチオキサントンなどのチオキサントン系化合物、ベンジルジメチルケタール、２，４，６−トリメチルベンゾインジフェニルフォスフィンオキサイド、Ｎ，Ｎ−ジメチルアミノ安息香酸イソアミル、アシルフォスヒンオキサイド等が挙げられ、これらを１種類または２種類以上を併用して用いてもよい。添加量はアクリル樹脂に対して20重量％以下で、好ましくは1〜5重量％で使用する。また光カチオン重合開始剤はスルホニウム塩系やヨードニウム塩系があり、その例として、ジフェニル−4−チオフェノキシフェニルスルホニウムヘキサフルオロアンチモネート、トリ−p−トリルスルホニウムトリフルオロメタンスルホナート、トリ−p−トリルスルホニウムヘキサフルオロフォスフェート、トリフェニルスルホニウムテトラフルオロボラート、４−イソプロピル−4'−メチルジフェニルヨードニウムテトラキス（ペンタフルオロフェニル）ボラート、ビス（４−t−ブチルフェニル）ヨードニウムトリフルオロメタンスルホナート、ビス（４−t−ブチルフェニル）ヨードニウムヘキサフルオロフォスフェート、ジフェニルヨードニウムヘキサフルオロヒ酸、ジフェニルヨードニウムヘキサフルオロフォスフェート、ジフェニルヨードニウムトリフルオロメタンスルホン酸等が挙げられ、これらを１種類または２種類以上を併用して用いてもよい。添加量はアクリル樹脂に対して20重量％以下で、好ましくは1〜5重量％で使用する
（v）その他の添加剤として、さらにハードコート剤を希釈するための希釈剤（有機溶
剤や単官能又は２官能の（メタ）アクリレート及びそれらの混合物）、塗膜の塗れ性向上のための界面活性剤、泡消しのための消泡剤、紫外線が及ぼす塗膜への影響を削減し耐候性向上のための紫外線吸収剤や光安定剤、塗膜の表面滑り性又は撥水性を付与するためのフッ素系のアクリル樹脂の添加を行い、更なる機能性の付与や塗料の調整を行うことも可能である。
Examples of the (iv) radical photopolymerization initiator and the cationic photopolymerization initiator used in this embodiment include, but are not limited to, the following. Examples of radical photopolymerization initiators include tris (chloromethyl) triazine, 2,4-trichloromethyl- (4′-methoxystyryl) -6-triazine, 2- [2- (furan-2-yl) ethenyl]- Triazine compounds such as 4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin butyl ether, etc. Benzoin compounds, diethoxyacetophenone, 4-phenoxydichlorolacetophenone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, benzophenone, 2-hydroxy-2- Methylpropiophenone, 1-hydroxysilane Acetophenone compounds such as chlorophenyl ketone, 1-hydroxycyclohexyl acetophenone, thioxanthone compounds such as thioxanthone, 2-methylthioxanthone, 2,4-dimethylthioxanthone, 2-chlorothioxanthone, benzyldimethyl ketal, 2,4,6- Examples include trimethylbenzoindiphenylphosphine oxide, isoamyl N, N-dimethylaminobenzoate, acylphosphine oxide, and the like, and these may be used alone or in combination of two or more. The addition amount is 20% by weight or less, preferably 1 to 5% by weight based on the acrylic resin. Photocationic polymerization initiators include sulfonium salts and iodonium salts. Examples thereof include diphenyl-4-thiophenoxyphenylsulfonium hexafluoroantimonate, tri-p-tolylsulfonium trifluoromethanesulfonate, and tri-p-tolyl. Sulfonium hexafluorophosphate, triphenylsulfonium tetrafluoroborate, 4-isopropyl-4′-methyldiphenyliodonium tetrakis (pentafluorophenyl) borate, bis (4-t-butylphenyl) iodonium trifluoromethanesulfonate, bis (4 -T-butylphenyl) iodonium hexafluorophosphate, diphenyliodonium hexafluoroarsenate, diphenyliodonium hexafluorophosphate, diphenyl Examples thereof include iodonium trifluoromethanesulfonic acid, and these may be used alone or in combination of two or more. Addition amount is 20% by weight or less, preferably 1 to 5% by weight with respect to the acrylic resin. (V) Diluent for diluting hard coat agent (organic solvent or monofunctional) as other additives. Or a bifunctional (meth) acrylate and a mixture thereof), a surfactant for improving the paintability of the coating film, an antifoaming agent for defoaming, and reducing the influence of UV rays on the coating film to improve the weather resistance. Addition of UV absorbers and light stabilizers for coatings, and addition of fluorine-based acrylic resins to impart surface slipperiness or water repellency of coatings, and it is also possible to add further functionality and adjust paints It is.
（手順３）で得られた樹脂組成物を、スピンコート、スプレーコート、ディップコート、バーコート、フローコート、キャップコート、ナイフコート、ダイコート、ロールコート、グラビアコート法等を用いて所定の厚みだけプラスチック等からなる基板に塗布した後、活性エネルギー線により硬化させることにより、（メタ）アクリロリル基がラジカル重合し、アルコキシシリル基がカチオン重合し、それぞれが修飾された金属酸化物微粒子とも重合して３次元架橋することによって、有機無機ハイブリッド化が同時に行われる。これにより密着性に優れ光学的な透明性を有する表面硬度や耐擦傷性を向上させる効果を持つコーティングを行えることとなる。なお、本実施形態において、金属酸化物微粒子とアルコキシシリル基の反応は加水分解重縮合ではなくカチオン重合によるものであるため、塗料としてのポットライフを長く保つことが可能である。上記塗工方法にて基板に塗布、溶剤乾燥、活性エネルギー線照射し成膜することとなるが、このときの膜厚は１〜５０μｍ、好ましくは１〜２０μｍとなるようにする。活性エネルギー線照射は、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、無電極ランプ、キセノンランプ、メタルハライドランプ、カーボンアーク灯、ＬＥＤランプ、タングステンランプ等の光源から発せられる活性エネルギー線を照射し硬化させて成膜する。ここで言う活性エネルギー線とは、紫外線や電子線など光ラジカル重合及び光カチオン重合可能なものをいう。 The resin composition obtained in (Procedure 3) is spin coated, spray coated, dip coated, bar coated, flow coated, cap coated, knife coated, die coated, roll coated, gravure coated, etc. After being applied to a substrate made of plastic or the like, by curing with active energy rays, the (meth) acrylolyl group undergoes radical polymerization, the alkoxysilyl group undergoes cationic polymerization, and each of them also polymerizes with the modified metal oxide fine particles. Organic-inorganic hybridization is simultaneously performed by three-dimensional crosslinking. As a result, a coating having an effect of improving surface hardness and scratch resistance with excellent adhesion and optical transparency can be achieved. In the present embodiment, the reaction between the metal oxide fine particles and the alkoxysilyl group is based on cationic polymerization rather than hydrolytic polycondensation, so that the pot life as a paint can be kept long. The substrate is coated with the above coating method, dried with a solvent, and irradiated with active energy rays to form a film. The film thickness at this time is 1 to 50 μm, preferably 1 to 20 μm. Active energy rays are irradiated with active energy rays emitted from light sources such as low-pressure mercury lamps, high-pressure mercury lamps, ultrahigh-pressure mercury lamps, electrodeless lamps, xenon lamps, metal halide lamps, carbon arc lamps, LED lamps, and tungsten lamps. Cured to form a film. The active energy rays referred to here are those capable of photoradical polymerization and photocationic polymerization such as ultraviolet rays and electron beams.
これより以下に本発明に関する実施例及び比較例について述べるが、本発明はこれらに制限されるものではない。
（実施例１）
丸底フラスコにペンタエリスリトールトリアクリレート(ライトアクリレートPE3A：共栄社化学（株）製)を7.5ｇと３−イソシアネートプロピルトリメトキシシラン(Y5187：日本ユニカー（株）製)を3.2ｇ、触媒としてジ-ｎ-ブチルスズジラウレート(DBTDL：キシダ化学（株）製)をPE3Aに対して500ppm混合し35℃で1時間攪拌した。ここでできる化合物をPE3AIPSという。なお、この反応の確認は、FT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。
次に別の丸底フラスコにY5187を2.0ｇ、メチルエチルケトン分散のシリカゾルを120.8ｇ、DBTDLをシリカゾルに対して500ppm添加し、シリカの表面修飾を行う為40℃で24時間攪拌した。なお、この反応の確認は、FT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。これら2個の丸底フラスコの内容物を混合し、さらに多官能アクリレートとしてPE3Aを5.2g、さらに光カチオン重合開始剤であるSP-152（旭電化工業（株）製）と光ラジカル重合開始剤であるイルガキュア184（チバスペシャリティケミカルズ製）をそれぞれ全アクリル樹脂の3重量％になるように添加して目的の樹脂組成物（ハードコート剤）とした。
Hereinafter, examples and comparative examples relating to the present invention will be described, but the present invention is not limited thereto.
Example 1
In a round bottom flask, 7.5 g of pentaerythritol triacrylate (light acrylate PE3A: manufactured by Kyoeisha Chemical Co., Ltd.) and 3.2 g of 3-isocyanatopropyltrimethoxysilane (Y5187: manufactured by Nihon Unicar Co., Ltd.), di-n as a catalyst -Butyltin dilaurate (DBTDL: manufactured by Kishida Chemical Co., Ltd.) was mixed with PE3A at 500 ppm and stirred at 35 ° C. for 1 hour. The compound made here is called PE3AIPS. This reaction was confirmed by the disappearance of the isocyanate group peak appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.).
Next, Y5187 (2.0 g), methylethylketone-dispersed silica sol (120.8 g) and DBTDL (500 ppm) with respect to the silica sol were added to another round bottom flask, and the mixture was stirred at 40 ° C. for 24 hours to modify the surface of the silica. This reaction was confirmed by the disappearance of the isocyanate group peak appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.). The contents of these two round-bottom flasks were mixed, and 5.2 g of PE3A was added as a polyfunctional acrylate. Furthermore, SP-152 (manufactured by Asahi Denka Kogyo Co., Ltd.) and a photo radical polymerization initiator were used. Irgacure 184 (manufactured by Ciba Specialty Chemicals) was added so as to be 3% by weight of the total acrylic resin, to obtain a desired resin composition (hard coat agent).
この樹脂組成物を市販のアクリル板に1000rpmで20秒間スピンコートした。この後65℃で1分間溶剤を乾燥させてから、高圧水銀灯で光源下100mmの位置で紫外線を1000ｍJ/cm2照射して硬化させた。この塗膜の特性及び物性について、下記の測定及び試験を行った。尚、この測定及び試験は塗布後24時間以上経過してから行った。下記実施例２〜７、比較例１〜５についても同様にして塗布・硬化させ、測定及び試験を行った。
（１） 透過率測定：分光光度計（（株）日立製作所製、HITACHI200-10型）を用いて、樹脂組成物を塗布硬化させたアクリル板の所定領域（380〜780nm）の透過率を求めた。
（２） 機械的物性測定：塗布硬化させた樹脂組成物の表面上の鉛筆硬度（表面硬度）を、井本製作所製の鉛筆硬度試験機を用いてJIS-K-5400に準じて測定した。またスチールウールによる耐擦傷性は、ボンスター＃0000（日本スチールウール）に1.5kg荷重をかけ10往復擦ったときのキズの本数で評価した。評価としては、キズが０本の場合は評価Ａ、１〜５本は評価Ｂ、６〜１０本は評価Ｃ、１１〜１５本は評価Ｄ、１６〜２０本は評価Ｅ、２１本以上は評価Ｆとした。
（３） 密着性試験：JIS-K-5400に準じて、碁盤目状に100枡の升目をつくりセロハンテープ（ニチバン製＃405）で圧着、剥がしを行い皮膜が残っている数で評価を行った。
（４）外観確認 ：目視にて塗布表面の観察を行った。
測定、試験結果を表１に示す。
（実施例２）
丸底フラスコにPE3Aを7.5gとY5187を3.1g、DBTDLをPE3Aに対して500ppm混合し25℃で3時間攪拌した。またこれとは別の丸底フラスコにメチルエチルケトン分散のシリカゾル100.0gにBEIを3.2g、DBTDLをシリカゾルに対して500ppm混合し40℃で24時間攪拌した。これらの反応の確認は、FT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。これら2個の丸底フラスコの内容物を混合し、ここにPE3Aを8.4g、さらに光カチオン重合開始剤であるSP-152と光ラジカル重合開始剤であるイルガキュア184をそれぞれ全アクリル樹脂の3重量％になるように添加して目的の樹脂組成物とした。
This resin composition was spin-coated on a commercially available acrylic plate at 1000 rpm for 20 seconds. Thereafter, the solvent was dried at 65 ° C. for 1 minute, and then cured by irradiation with 1000 mJ / cm 2 of ultraviolet rays at a position of 100 mm under a light source with a high-pressure mercury lamp. The following measurements and tests were performed on the properties and physical properties of this coating film. This measurement and test were performed after 24 hours or more had passed after coating. The following Examples 2 to 7 and Comparative Examples 1 to 5 were similarly coated and cured, and measurements and tests were performed.
(1) Transmittance measurement: Using a spectrophotometer (manufactured by Hitachi, Ltd., HITACHI200-10 type), the transmittance of a predetermined region (380 to 780 nm) of an acrylic plate coated and cured with a resin composition is obtained. It was.
(2) Mechanical property measurement: Pencil hardness (surface hardness) on the surface of the resin composition coated and cured was measured according to JIS-K-5400 using a pencil hardness tester manufactured by Imoto Seisakusho. Further, the scratch resistance by steel wool was evaluated by the number of scratches when a 1.5 kg load was applied to Bonstar # 0000 (Nihon Steel Wool) and rubbed 10 times. As evaluation, when there are no scratches, evaluation A, 1-5 evaluation B, 6-10 evaluation C, 11-15 evaluation D, 16-20 evaluation E, 21 or more It was set as evaluation F.
(3) Adhesion test: In accordance with JIS-K-5400, make 100 squares in a grid pattern, press and peel off with cellophane tape (Nichiban # 405), and evaluate by the number of remaining films It was.
(4) Appearance confirmation: The coated surface was visually observed.
Table 1 shows the measurement and test results.
(Example 2)
In a round bottom flask, 7.5 g of PE3A and 3.1 g of Y5187 and 500 ppm of DBTDL were mixed with PE3A and stirred at 25 ° C. for 3 hours. In another round-bottom flask, 100.0 g of methylethylketone-dispersed silica sol was mixed with 3.2 g of BEI and 500 ppm of DBTDL with respect to the silica sol and stirred at 40 ° C. for 24 hours. Confirmation of these reactions was confirmed by the disappearance of the peak of the isocyanate group appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.). The contents of these two round bottom flasks were mixed, and 8.4 g of PE3A was added to this, and SP-152, a photocationic polymerization initiator, and Irgacure 184, a photoradical polymerization initiator, were each 3 wt. % To give the desired resin composition.
得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
（実施例３）
実施例１と同様にして、PE3AIPSを合成した。またこれとは別の丸底フラスコにメチルエチルケトン分散のシリカゾル50.0g、１，１−ビス（アクリロイルオキシ）エチルイソシアネート（BEI）1.6g、Y5187を0.8ｇ、DBTDLをシリカゾルに対して500ppm混合し40℃で24時間攪拌した。この反応の確認はFT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。これら2個の丸底フラスコの内容物を混合し、ここにPE3Aを8.4g、さらにSP-152とイルガキュア184をそれぞれ全アクリル樹脂の3重量％になるように添加して目的の樹脂組成物とした。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
（実施例４）
シリカゾルの表面修飾を、一方の丸底フラスコでメチルエチルケトン分散シリカゾル50.0gとBEIを0.9g加え、他方の丸底フラスコでメチルエチルケトン分散シリカゾル50.0ｇとY5187を0.8g加えてそれぞれのフラスコを40℃で24時間攪拌した。この反応の確認はFT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。ここで実施例１と同様にして得られたPE3AIPSとこれら2種類の表面修飾シリカを混合し、PE3Aを8.4g、さらにSP-152とイルガキュア184をそれぞれ全アクリル樹脂の3重量％になるように添加して目的の樹脂組成物とした。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
（実施例５）
（iii）成分として、3個以上の（メタ）アクリロイル基を有する多官能（メタ）アクリレートをPE3Aの代わりにジペンタエリスリトールヘキサアクリレート（ライトアクリレートDPE6A：共栄社化学（株）製）を5.2g用いた以外は実施例１と同様の操作を行い目的の樹脂組成物とした。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
（実施例６）
丸底フラスコにジペンタエリスリトールペンタアクリレート(SR-399E：日本化薬（株）製)を8.0gとY5187を5.2g、触媒としてDBTDLをPE3Aに対して500ppmだけ混合し30℃で1時間攪拌した。ここでできる化合物をPE5AIPSという。この反応の確認はFT-IR測定（堀場製作所製FT720）にて2250cm-1付近に現れるイソシアネート基のピークが消失していることから確認された。これ以後の操作は実施例１と同様にして行い目的の樹脂組成物とした。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
（実施例７）
丸底フラスコにPE3Aを7.5gとY5187を5.9g、触媒としてDBTDLをPE3Aに対して500ppm混合し30℃で1時間攪拌した。続けてMEK分散のシリカゾルを110.0g添加し35℃で20時間攪拌した。ここでFT-IRの測定を行い2250cm-1付近のピークが消失していることから、PE3AIPSの合成及びシリカの表面修飾が完了したことを確認した。ここにPE3Aを5.2g、SP-152とイルガキュア184を全アクリル樹脂の3重量％となるようにそれぞれ添加して、目的の樹脂組成物とした。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表１に示す。
The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
(Example 3)
In the same manner as in Example 1, PE3AIPS was synthesized. In another round bottom flask, 50.0 g of silica sol dispersed with methyl ethyl ketone, 1.6 g of 1,1-bis (acryloyloxy) ethyl isocyanate (BEI), 0.8 g of Y5187, and 500 ppm of DBTDL with respect to the silica sol were mixed at 40 ° C. For 24 hours. The confirmation of this reaction was confirmed by the disappearance of the isocyanate group peak appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.). The contents of these two round bottom flasks were mixed, and 8.4 g of PE3A, SP-152 and Irgacure 184 were added to each 3% by weight of the total acrylic resin to obtain the desired resin composition. did. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
(Example 4)
Surface modification of the silica sol was performed by adding 50.0 g of methyl ethyl ketone-dispersed silica sol and 0.9 g of BEI in one round bottom flask, and adding 50.0 g of methyl ethyl ketone-dispersed silica sol and 0.8 g of Y5187 in the other round bottom flask, and adding each flask at 40 ° C. at 24 ° C. Stir for hours. The confirmation of this reaction was confirmed by the disappearance of the isocyanate group peak appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.). Here, PE3AIPS obtained in the same manner as in Example 1 and these two types of surface-modified silica were mixed, so that PE3A was 8.4 g, and SP-152 and Irgacure 184 were each 3% by weight of the total acrylic resin. The target resin composition was added. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
(Example 5)
(Iii) As a component, 5.2 g of dipentaerythritol hexaacrylate (light acrylate DPE6A: manufactured by Kyoeisha Chemical Co., Ltd.) was used instead of PE3A as a polyfunctional (meth) acrylate having 3 or more (meth) acryloyl groups. Except for the above, the same operation as in Example 1 was performed to obtain a target resin composition. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
(Example 6)
In a round-bottomed flask, 8.0 g of dipentaerythritol pentaacrylate (SR-399E: Nippon Kayaku Co., Ltd.) and 5.2 g of Y5187 were mixed with DBTDL as a catalyst by 500 ppm with respect to PE3A and stirred at 30 ° C. for 1 hour. . The compound made here is called PE5AIPS. The confirmation of this reaction was confirmed by the disappearance of the isocyanate group peak appearing in the vicinity of 2250 cm −1 by FT-IR measurement (FT720 manufactured by Horiba, Ltd.). Subsequent operations were performed in the same manner as in Example 1 to obtain a target resin composition. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
(Example 7)
In a round bottom flask, 7.5 g of PE3A and 5.9 g of Y5187 and 500 ppm of DBTDL as a catalyst were mixed with PE3A and stirred at 30 ° C. for 1 hour. Subsequently, 110.0 g of MEK-dispersed silica sol was added and stirred at 35 ° C. for 20 hours. Here, FT-IR measurement was performed and the peak around 2250 cm −1 disappeared, confirming that the synthesis of PE3AIPS and the surface modification of silica were completed. Here, 5.2 g of PE3A, and SP-152 and Irgacure 184 were added so as to be 3% by weight of the total acrylic resin, respectively, to obtain a target resin composition. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 1.
（比較例１）
SP-152の添加をしなかったこと以外は実施例１と同様の操作を行い樹脂組成物を得た。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表２に示す。
（比較例２）
実施例２と同様にしてPE3AIPSを合成した。ここに表面修飾を行っていないMEK分散のシリカゾルを100.0gを添加し、SP-152とイルガキュア184を全アクリル樹脂の3重量％になるように添加して樹脂組成物を得た。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表２に示す。
（比較例３）
実施例１と同様にして2個の丸底フラスコを混合する操作までを行った。次に（iii）成分となる多官能アクリレートとしてPE3Aの添加をせずに、光カチオン重合開始剤であるSP-152と光ラジカル重合開始剤であるイルガキュア184をそれぞれ全アクリル樹脂の3重量％になるように添加して樹脂組成物を得た。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表２に示す。
（比較例４）
MEK分散のシリカゾルに代えて、シリカゾルが入っていないMEK50.0ｇを添加したこと以外は、比較例３と同様にして樹脂組成物を得た。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表２に示す。
（比較例５）
イルガキュア184の添加をしなかったこと以外は実施例１と同様の操作を行い樹脂組成物を得た。得られた樹脂組成物を実施例１と同様に市販のアクリル板に同条件にて塗布し、（１）〜（４）の測定、試験を行った。その結果を表２に示す。
(Comparative Example 1)
A resin composition was obtained in the same manner as in Example 1 except that SP-152 was not added. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 2.
(Comparative Example 2)
PE3AIPS was synthesized in the same manner as in Example 2. Here, 100.0 g of MEK-dispersed silica sol without surface modification was added, and SP-152 and Irgacure 184 were added so as to be 3% by weight of the total acrylic resin to obtain a resin composition. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 2.
(Comparative Example 3)
The same procedure as in Example 1 was repeated until the two round bottom flasks were mixed. Next, without adding PE3A as a polyfunctional acrylate as component (iii), SP-152, a photocationic polymerization initiator, and Irgacure 184, a photoradical polymerization initiator, were each added to 3% by weight of the total acrylic resin. It added so that the resin composition might be obtained. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 2.
(Comparative Example 4)
A resin composition was obtained in the same manner as in Comparative Example 3 except that 50.0 g of MEK containing no silica sol was added instead of the MEK-dispersed silica sol. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 2.
(Comparative Example 5)
A resin composition was obtained in the same manner as in Example 1 except that Irgacure 184 was not added. The obtained resin composition was applied to a commercially available acrylic plate under the same conditions as in Example 1, and the measurements and tests of (1) to (4) were performed. The results are shown in Table 2.
（結果）
表１、表２に示すように、実施例１〜７及び比較例１〜５の樹脂組成物を用いて得られる結果から本樹脂組成物は、基材に対する密着性、光学的な透明性、表面硬度、耐擦傷性が優れた被膜を形成することが確認できた。
(result)
As shown in Table 1 and Table 2, from the results obtained using the resin compositions of Examples 1 to 7 and Comparative Examples 1 to 5, the resin composition has adhesiveness to the substrate, optical transparency, It was confirmed that a film having excellent surface hardness and scratch resistance was formed.
Claims (2)
光ラジカル重合及び光カチオン重合を可能とする活性エネルギー線照射により光ラジカル重合及び光カチオン重合の両方の硬化系で有機無機ハイブリッド化された前記樹脂組成物に対する鉛筆硬度評価では少なくとも鉛筆硬度７Ｈが得られると共に，荷重1.5kgの10往復にて擦ったスチールウールによる耐擦傷性評価ではキズが１〜５本となる機械的物性が得られる、
ことを特徴とする樹脂組成物。 (I) a compound having an alkoxysilyl group and (meth) acryloyl group in the same molecule, and (ii) a surface modification rate of 5% to 50% so as to have an alkoxysilyl group and / or (meth) acryloyl group Modified metal oxide fine particles, (iii) a polyfunctional (meth) acrylate having three or more (meth) acryloyl groups, and (iv) a photo radical polymerization initiator and a photo cationic polymerization initiator as a polymerization initiator, A resin composition containing,
In the pencil hardness evaluation for the resin composition organic-inorganic hybridized in both photo radical polymerization and photo cation polymerization curing systems by irradiation with active energy rays enabling photo radical polymerization and photo cation polymerization, a pencil hardness of at least 7H is obtained. In addition, mechanical properties with scratches of 1 to 5 are obtained in the scratch resistance evaluation with steel wool rubbed with 10 reciprocations with a load of 1.5 kg.
The resin composition characterized by the above-mentioned.
（ｉ）成分 ３〜５０重量％
（ii）成分 ２０〜９０重量％
（iii）成分 ３〜５０重量％
であり、（iv）成分は（i）成分＋（iii）成分の重量に対して
（iv）成分 １〜４０重量％
であることを特徴とする樹脂組成物。 The resin composition according to claim 1, wherein the ratio of (i), (ii), (iii) is based on the total solid content.
(I) Component 3 to 50% by weight
(Ii) Component 20 to 90% by weight
(Iii) Component 3 to 50% by weight
(Iv) component is based on the weight of component (i) + component (iii)
(Iv) Component 1 to 40% by weight
Resin composition, wherein the at.
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| JP2009286925A (en) * | 2008-05-30 | 2009-12-10 | Jsr Corp | Curable composition |
| JP2011012163A (en) * | 2009-07-01 | 2011-01-20 | Asahi Glass Co Ltd | Method for producing photo-setting material, photo-setting material and article |
| JP5666226B2 (en) * | 2010-09-22 | 2015-02-12 | 株式会社ニデック | Resin composition |
| JP2012167262A (en) * | 2011-01-25 | 2012-09-06 | Sanyo Chem Ind Ltd | Photosensitive composition |
| JP6039349B2 (en) * | 2012-10-10 | 2016-12-07 | 株式会社カネカ | Active energy ray-curable coating resin composition |
| JP2015078340A (en) * | 2013-09-10 | 2015-04-23 | 昭和電工株式会社 | Organic-inorganic composite production method, curable composition, curable composition cured product, hard coat material, hard coat film, and silane coupling agent |
| JP6381354B2 (en) * | 2013-09-19 | 2018-08-29 | 日本合成化学工業株式会社 | Active energy ray-curable resin composition and coating agent composition |
| JP6276211B2 (en) * | 2014-05-30 | 2018-02-07 | リケンテクノス株式会社 | Transparent resin laminate |
| JP2016041774A (en) * | 2014-08-14 | 2016-03-31 | 信越化学工業株式会社 | Surface-treated inorganic particle and curable resin composition |
| CN107406690B (en) * | 2015-04-21 | 2020-06-09 | 株式会社大赛璐 | Resin composition for forming hard coat layer and cured product thereof |
| CN109715399B (en) | 2016-10-12 | 2021-08-20 | 日产化学株式会社 | High-hardness hard-coated laminate |
| JP7061502B2 (en) * | 2018-04-11 | 2022-04-28 | 株式会社Adeka | Polymerizable compositions, photosensitive compositions for black matrices and color filters |
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