JP5477351B2 - ガスバリア積層体およびその製造方法 - Google Patents
ガスバリア積層体およびその製造方法 Download PDFInfo
- Publication number
- JP5477351B2 JP5477351B2 JP2011209700A JP2011209700A JP5477351B2 JP 5477351 B2 JP5477351 B2 JP 5477351B2 JP 2011209700 A JP2011209700 A JP 2011209700A JP 2011209700 A JP2011209700 A JP 2011209700A JP 5477351 B2 JP5477351 B2 JP 5477351B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- gas barrier
- thin film
- oxide thin
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000004888 barrier function Effects 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 52
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 52
- 239000010409 thin film Substances 0.000 claims description 50
- 239000007789 gas Substances 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 40
- 239000000463 material Substances 0.000 claims description 36
- 239000010408 film Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 31
- 238000001020 plasma etching Methods 0.000 claims description 21
- 239000011347 resin Substances 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 19
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 17
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 17
- 238000000691 measurement method Methods 0.000 claims description 12
- -1 polyethylene terephthalate Polymers 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 9
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 4
- 239000004925 Acrylic resin Substances 0.000 claims description 3
- 229920000178 Acrylic resin Polymers 0.000 claims description 3
- 229920001225 polyester resin Polymers 0.000 claims description 3
- 239000004645 polyester resin Substances 0.000 claims description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 3
- 125000003504 2-oxazolinyl group Chemical group O1C(=NCC1)* 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims 1
- 238000012545 processing Methods 0.000 description 29
- 229920002799 BoPET Polymers 0.000 description 27
- 239000010410 layer Substances 0.000 description 20
- 239000012071 phase Substances 0.000 description 17
- 238000010438 heat treatment Methods 0.000 description 7
- 239000005022 packaging material Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000009998 heat setting Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 235000013305 food Nutrition 0.000 description 3
- 239000012770 industrial material Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- RZXDTJIXPSCHCI-UHFFFAOYSA-N hexa-1,5-diene-2,5-diol Chemical compound OC(=C)CCC(O)=C RZXDTJIXPSCHCI-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Images
Landscapes
- Laminated Bodies (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011209700A JP5477351B2 (ja) | 2011-09-26 | 2011-09-26 | ガスバリア積層体およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011209700A JP5477351B2 (ja) | 2011-09-26 | 2011-09-26 | ガスバリア積層体およびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013071258A JP2013071258A (ja) | 2013-04-22 |
| JP2013071258A5 JP2013071258A5 (zh) | 2013-08-01 |
| JP5477351B2 true JP5477351B2 (ja) | 2014-04-23 |
Family
ID=48476169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011209700A Active JP5477351B2 (ja) | 2011-09-26 | 2011-09-26 | ガスバリア積層体およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5477351B2 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150086158A (ko) | 2014-01-17 | 2015-07-27 | 주식회사 엘지화학 | 배리어 필름 및 그 제조 방법 |
| KR101702215B1 (ko) | 2014-04-30 | 2017-02-06 | 주식회사 엘지화학 | 배리어 필름 및 그 제조 방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10308521A (ja) * | 1997-05-07 | 1998-11-17 | Mitsubishi Chem Corp | 太陽電池モジュール用保護シート |
| JP2000063537A (ja) * | 1998-08-19 | 2000-02-29 | Teijin Ltd | ポリエステルフィルム |
| JP5142421B2 (ja) * | 2000-06-05 | 2013-02-13 | 東レ株式会社 | 透明蒸着用２軸配向ポリエチレンテレフタレートフィルム |
| JP5412850B2 (ja) * | 2009-01-28 | 2014-02-12 | 凸版印刷株式会社 | ガスバリア積層体 |
| JP5440005B2 (ja) * | 2009-07-24 | 2014-03-12 | 凸版印刷株式会社 | ガスバリア積層体 |
| JP2011148139A (ja) * | 2010-01-20 | 2011-08-04 | Toppan Printing Co Ltd | ガスバリア積層体 |
-
2011
- 2011-09-26 JP JP2011209700A patent/JP5477351B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013071258A (ja) | 2013-04-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI616335B (zh) | 阻氣性積層體及阻氣性積層體之製造方法 | |
| JP5181905B2 (ja) | ガスバリア積層体 | |
| JP5696085B2 (ja) | ガスバリア積層体およびその製造方法 | |
| JP5412850B2 (ja) | ガスバリア積層体 | |
| JP6288518B2 (ja) | ガスバリア性フィルムおよびその製造方法 | |
| JP6197428B2 (ja) | ガスバリア性フィルム | |
| JP5440005B2 (ja) | ガスバリア積層体 | |
| JP5521360B2 (ja) | ガスバリアフィルムの製造方法 | |
| JP2016087814A (ja) | ガスバリア積層体およびその製造方法 | |
| JP5477351B2 (ja) | ガスバリア積層体およびその製造方法 | |
| JP6007930B2 (ja) | ガスバリア積層体 | |
| JP5664341B2 (ja) | ガスバリア性フィルム | |
| JP2014114467A (ja) | ガスバリア性フィルムの製造方法 | |
| JP5838578B2 (ja) | ガスバリア積層体 | |
| JP5720254B2 (ja) | ガスバリア積層体およびその製造方法 | |
| JP2014218090A (ja) | ガスバリア積層体 | |
| JP6398194B2 (ja) | ガスバリア積層体およびそれを用いてなる太陽電池または表示体 | |
| WO2018101026A1 (ja) | ガスバリア性フィルム | |
| JP7087414B2 (ja) | ガスバリア積層体 | |
| JP2011148139A (ja) | ガスバリア積層体 | |
| JP6988166B2 (ja) | ガスバリア積層体の製造方法 | |
| JP6848339B2 (ja) | ガスバリア積層体及びその製造方法 | |
| JPH10244601A (ja) | 薄膜ガスバリア性フィルム用の基材プラスチックフィルムの製造方法 | |
| JP4946350B2 (ja) | ガスバリア性積層体 | |
| JP2008265232A (ja) | ガスバリア積層体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7425 Effective date: 20130514 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130606 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130606 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20130606 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20130606 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20130607 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130913 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20130919 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130924 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131008 Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20131008 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140114 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140127 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5477351 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |