JP5461897B2 - 光導波路積層配線基板及びその製造方法と実装構造 - Google Patents

光導波路積層配線基板及びその製造方法と実装構造 Download PDF

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JP5461897B2
JP5461897B2 JP2009146398A JP2009146398A JP5461897B2 JP 5461897 B2 JP5461897 B2 JP 5461897B2 JP 2009146398 A JP2009146398 A JP 2009146398A JP 2009146398 A JP2009146398 A JP 2009146398A JP 5461897 B2 JP5461897 B2 JP 5461897B2
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Japan
Prior art keywords
cladding layer
conductor portion
layer
optical waveguide
via hole
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JP2009146398A
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English (en)
Japanese (ja)
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JP2011003774A (ja
JP2011003774A5 (enExample
Inventor
賢司 柳沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
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Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP2009146398A priority Critical patent/JP5461897B2/ja
Priority to US12/814,783 priority patent/US8323878B2/en
Publication of JP2011003774A publication Critical patent/JP2011003774A/ja
Publication of JP2011003774A5 publication Critical patent/JP2011003774A5/ja
Priority to US13/614,209 priority patent/US8644656B2/en
Application granted granted Critical
Publication of JP5461897B2 publication Critical patent/JP5461897B2/ja
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0274—Optical details, e.g. printed circuits comprising integral optical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/11—Printed elements for providing electric connections to or between printed circuits
    • H05K1/111—Pads for surface mounting, e.g. lay-out
    • H05K1/112—Pads for surface mounting, e.g. lay-out directly combined with via connections
    • H05K1/113—Via provided in pad; Pad over filled via
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/421—Blind plated via connections
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0183—Dielectric layers
    • H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/09563—Metal filled via
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4647—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer around previously made via studs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63—Vias, e.g. via plugs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Integrated Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structure Of Printed Boards (AREA)
  • Optical Couplings Of Light Guides (AREA)
JP2009146398A 2009-06-19 2009-06-19 光導波路積層配線基板及びその製造方法と実装構造 Active JP5461897B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009146398A JP5461897B2 (ja) 2009-06-19 2009-06-19 光導波路積層配線基板及びその製造方法と実装構造
US12/814,783 US8323878B2 (en) 2009-06-19 2010-06-14 Method of manufacturing optical waveguide laminated wiring board
US13/614,209 US8644656B2 (en) 2009-06-19 2012-09-13 Optical waveguide laminated wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009146398A JP5461897B2 (ja) 2009-06-19 2009-06-19 光導波路積層配線基板及びその製造方法と実装構造

Publications (3)

Publication Number Publication Date
JP2011003774A JP2011003774A (ja) 2011-01-06
JP2011003774A5 JP2011003774A5 (enExample) 2012-06-28
JP5461897B2 true JP5461897B2 (ja) 2014-04-02

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Country Link
US (2) US8323878B2 (enExample)
JP (1) JP5461897B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9185810B2 (en) * 2006-06-06 2015-11-10 Second Sight Medical Products, Inc. Molded polymer comprising silicone and at least one metal trace and a process of manufacturing the same
US7750076B2 (en) * 2006-06-07 2010-07-06 Second Sight Medical Products, Inc. Polymer comprising silicone and at least one metal trace
JP2013186310A (ja) 2012-03-08 2013-09-19 Shinko Electric Ind Co Ltd 光電気複合基板及びその製造方法
WO2014080709A1 (ja) 2012-11-22 2014-05-30 インターナショナル・ビジネス・マシーンズ・コーポレーション 電気基板と光導波路の層とが積層される多層構造において、光導波路の層を貫通する電気連絡用ビア
JP6168598B2 (ja) * 2013-08-21 2017-07-26 日東電工株式会社 光電気混載モジュール
JP6168602B2 (ja) * 2013-10-31 2017-07-26 日東電工株式会社 光電気混載モジュール
JP6172679B2 (ja) * 2014-06-26 2017-08-02 インターナショナル・ビジネス・マシーンズ・コーポレーションＩｎｔｅｒｎａｔｉｏｎａｌ Ｂｕｓｉｎｅｓｓ Ｍａｃｈｉｎｅｓ Ｃｏｒｐｏｒａｔｉｏｎ 光結合構造、半導体デバイス、マルチ・チップ・モジュールのための光インターコネクト構造、および光結合構造のための製造方法
JP6395134B2 (ja) * 2014-12-26 2018-09-26 新光電気工業株式会社 光導波路装置の製造方法及びレーザ加工装置
JP2016156865A (ja) * 2015-02-23 2016-09-01 京セラ株式会社 光回路基板の製造方法
US9721812B2 (en) * 2015-11-20 2017-08-01 International Business Machines Corporation Optical device with precoated underfill
JP2018105925A (ja) * 2016-12-22 2018-07-05 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2018163918A (ja) * 2017-03-24 2018-10-18 新光電気工業株式会社 配線基板及びその製造方法
JP7244164B2 (ja) * 2018-06-05 2023-03-22 アサヒ飲料株式会社 混合茶飲料
JP2020148830A (ja) * 2019-03-11 2020-09-17 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2023008205A (ja) * 2021-07-05 2023-01-19 イビデン株式会社 配線基板

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3111590B2 (ja) * 1992-02-14 2000-11-27 株式会社日立製作所 多層回路の製造方法
JP3512225B2 (ja) * 1994-02-28 2004-03-29 株式会社日立製作所 多層配線基板の製造方法
JPH11330704A (ja) * 1998-05-07 1999-11-30 Nippon Avionics Co Ltd プリント配線板およびプリント配線板の製造方法
US6477284B1 (en) * 1999-06-14 2002-11-05 Nec Corporation Photo-electric combined substrate, optical waveguide and manufacturing process therefor
JP4540275B2 (ja) 2000-12-22 2010-09-08 イビデン株式会社 Ｉｃチップ実装用基板、および、ｉｃチップ実装用基板の製造方法
JP3833132B2 (ja) * 2002-03-25 2006-10-11 キヤノン株式会社 光導波装置の製造方法
US7499614B2 (en) * 2003-10-24 2009-03-03 International Business Machines Corporation Passive alignment of VCSELs to waveguides in opto-electronic cards and printed circuit boards
JP4260650B2 (ja) * 2004-02-26 2009-04-30 新光電気工業株式会社 光電気複合基板及びその製造方法
JP4551321B2 (ja) * 2005-07-21 2010-09-29 新光電気工業株式会社 電子部品実装構造及びその製造方法
JPWO2007074567A1 (ja) * 2005-12-27 2009-06-04 イビデン株式会社 光・電気複合配線板及びその製造方法
TW200807047A (en) * 2006-05-30 2008-02-01 Sumitomo Bakelite Co Substrate for mounting photonic device, optical circuit substrate, and photonic device mounting substrate
JP5155596B2 (ja) 2007-05-14 2013-03-06 新光電気工業株式会社 光電気混載基板の製造方法

Also Published As

Publication number Publication date
US8644656B2 (en) 2014-02-04
US8323878B2 (en) 2012-12-04
JP2011003774A (ja) 2011-01-06
US20130011096A1 (en) 2013-01-10
US20100323297A1 (en) 2010-12-23

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