JP5460044B2 - 液晶ポリマー溶融重合装置の洗浄方法および洗浄液 - Google Patents
液晶ポリマー溶融重合装置の洗浄方法および洗浄液 Download PDFInfo
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- JP5460044B2 JP5460044B2 JP2008319638A JP2008319638A JP5460044B2 JP 5460044 B2 JP5460044 B2 JP 5460044B2 JP 2008319638 A JP2008319638 A JP 2008319638A JP 2008319638 A JP2008319638 A JP 2008319638A JP 5460044 B2 JP5460044 B2 JP 5460044B2
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- acid
- liquid crystal
- cleaning
- crystal polymer
- melt polymerization
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- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Polyesters Or Polycarbonates (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
- Polyamides (AREA)
Description
(1)単量体の混合物を無水酢酸等のアシル化剤と反応させ、単量体に含まれる水酸基およびアミノ基をアシル化する工程、
(2)工程(1)でアシル化された単量体の混合物を溶融状態で加熱し、酢酸等の低級脂肪酸を留去しながら重縮合を行う溶融重合工程。
(1)単量体の混合物を無水酢酸等のアシル化剤と反応させ、単量体に含まれる水酸基およびアミノ基をアシル化する工程、
(2)工程(1)でアシル化された単量体の混合物を溶融状態で加熱し、酢酸等の低級脂肪酸を留去しながら重縮合を行う溶融重合工程。
(A)パラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸共重合体
(B)パラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸/ハイドロキノン/テレフタル酸共重合体
なお、表中、グリコール類および有機カルボン酸の略号は以下のものを表す。
TEG:テトラエチレングリコール
TriEG:トリエチレングリコール
POB:パラヒドロキシ安息香酸
TPA:テレフタル酸
AcOH:酢酸
Claims (7)
- 溶融重合により液晶ポリマーを製造した重合装置を洗浄液で洗浄する方法において、
トリエチレングリコールおよび/またはテトラエチレングリコールであるグリコール類、および、
グリコール類100重量部に対して0.01〜10重量部の蟻酸、酢酸、プロピオン酸、こはく酸、フマル酸、テレフタル酸、イソフタル酸、2,6−ナフタレンジカルボン酸、パラヒドロキシ安息香酸、および6−ヒドロキシ2−ナフトエ酸からなる群から選択される有機カルボン酸
を含む洗浄液を使用し、180〜350℃の温度にて洗浄することを特徴とする、液晶ポリマー溶融重合装置の洗浄方法。 - 洗浄温度が260〜350℃である請求項1記載の液晶ポリマー溶融重合装置の洗浄方法。
- トリエチレングリコールおよび/またはテトラエチレングリコールであるグリコール類、および、グリコール類100重量部に対して0.01〜10重量部の蟻酸、酢酸、プロピオン酸、こはく酸、フマル酸、テレフタル酸、イソフタル酸、2,6−ナフタレンジカルボン酸、パラヒドロキシ安息香酸、および6−ヒドロキシ2−ナフトエ酸からなる群から選択される有機カルボン酸を含む、溶融重合により液晶ポリマーを製造した重合装置を洗浄するための洗浄液。
- 液晶ポリマーがパラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸共重合体である液晶ポリマーである、請求項1または2に記載の洗浄方法。
- 液晶ポリマーが、パラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸/ハイドロキノン/テレフタル酸共重合体である、請求項1または2に記載の洗浄方法。
- 液晶ポリマーがパラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸共重合体である液晶ポリマーである、請求項3に記載の洗浄液。
- 液晶ポリマーが、パラヒドロキシ安息香酸/6−ヒドロキシ−2−ナフトエ酸/ハイドロキノン/テレフタル酸共重合体である、請求項3に記載の洗浄液。
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