JP5443484B2 - フレキソ印刷版の二次背面露光 - Google Patents

フレキソ印刷版の二次背面露光 Download PDF

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Publication number
JP5443484B2
JP5443484B2 JP2011521100A JP2011521100A JP5443484B2 JP 5443484 B2 JP5443484 B2 JP 5443484B2 JP 2011521100 A JP2011521100 A JP 2011521100A JP 2011521100 A JP2011521100 A JP 2011521100A JP 5443484 B2 JP5443484 B2 JP 5443484B2
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Japan
Prior art keywords
printing plate
flexographic printing
mask
plate precursor
image
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Expired - Fee Related
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JP2011521100A
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English (en)
Japanese (ja)
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JP2011529583A (ja
JP2011529583A5 (enExample
Inventor
ロイド ズワルド，グレゴリー
Original Assignee
イーストマン コダック カンパニー
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Publication of JP2011529583A5 publication Critical patent/JP2011529583A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2011521100A 2008-07-31 2009-07-21 フレキソ印刷版の二次背面露光 Expired - Fee Related JP5443484B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/183,173 US8034540B2 (en) 2008-07-31 2008-07-31 System and method employing secondary back exposure of flexographic plate
US12/183,173 2008-07-31
PCT/US2009/004203 WO2010014156A1 (en) 2008-07-31 2009-07-21 Employing secondary back exposure of flexographic plate

Publications (3)

Publication Number Publication Date
JP2011529583A JP2011529583A (ja) 2011-12-08
JP2011529583A5 JP2011529583A5 (enExample) 2012-08-23
JP5443484B2 true JP5443484B2 (ja) 2014-03-19

Family

ID=41136710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011521100A Expired - Fee Related JP5443484B2 (ja) 2008-07-31 2009-07-21 フレキソ印刷版の二次背面露光

Country Status (5)

Country Link
US (2) US8034540B2 (enExample)
EP (1) EP2313270B1 (enExample)
JP (1) JP5443484B2 (enExample)
CN (1) CN102112312A (enExample)
WO (1) WO2010014156A1 (enExample)

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US8520041B2 (en) * 2011-02-21 2013-08-27 Eastman Kodak Company Floor relief for dot improvement
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CN107255858B (zh) * 2011-12-20 2020-05-29 株式会社尼康 基底处理装置
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US9446578B2 (en) 2012-06-11 2016-09-20 Eastman Kodak Company Methods of manufacture and use of customized flexomaster patterns for flexographic printing
US20130337386A1 (en) * 2012-06-14 2013-12-19 Dirk De Rauw Processing apparatus for processing a flexographic plate, a method and a computer program product
EP2738606B1 (en) * 2012-11-28 2024-01-31 XSYS Prepress N.V. Method and computer program product for processing a flexographic plate.
US9021951B2 (en) * 2013-02-13 2015-05-05 Eastman Kodak Company Forming an image on a flexographic media
US9132622B2 (en) * 2013-03-04 2015-09-15 Uni-Pixel Displays, Inc. Method of printing uniform line widths with angle effect
US9223201B2 (en) 2013-06-27 2015-12-29 Uni-Pixel Displays, Inc. Method of manufacturing a photomask with flexography
US20150030984A1 (en) * 2013-07-26 2015-01-29 Uni-Pixel Displays, Inc. Method of manufacturing a flexographic printing plate for high-resolution printing
US9063426B2 (en) 2013-09-25 2015-06-23 Uni-Pixel Displays, Inc. Method of manufacturing a flexographic printing plate with support structures
JP6526018B2 (ja) * 2013-09-30 2019-06-05 フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング フレキソ印刷版を一列に並んで生産する装置及び方法
US9067402B1 (en) * 2014-01-31 2015-06-30 Eastman Kodak Company Forming an image on a flexographic media
EP3800508B1 (en) 2015-10-26 2022-05-04 Esko-Graphics Imaging GmbH System and method for controlled exposure of flexographic printing plates
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
WO2018096144A1 (de) * 2016-11-28 2018-05-31 Flint Group Germany Gmbh Belichtungsvorrichtung und verfahren zur belichtung von plattenförmigen materialien
EP4130882A1 (en) * 2017-03-20 2023-02-08 Esko-Graphics Imaging GmbH Process and apparatus for adjusting the floor of a flexographic printing plate in a controlled exposure system or process
US10457082B2 (en) * 2017-05-09 2019-10-29 Macdermid Graphics Solutions, Llc Flexographic printing plate with improved storage stability
US10831105B2 (en) 2017-07-20 2020-11-10 Esko-Graphics Imaging Gmbh System and process for direct curing of photopolymer printing plates
EP3721293B1 (de) 2017-12-08 2022-02-09 Flint Group Germany GmbH Verfahren zur kennzeichnung eines reliefvorläufers zur herstellung einer reliefstruktur
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
WO2019192764A1 (en) * 2018-04-06 2019-10-10 Esko-Graphics Imaging Gmbh Method for persistent marking of flexo plates with workflow information and plates marked therewith
FR3085304B1 (fr) 2018-08-31 2021-01-08 D Uniflexo Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante
NL2022394B1 (en) * 2019-01-14 2020-08-14 Xeikon Prepress Nv Apparatus and method for genrating a relief carrier
CN113330368B (zh) * 2019-02-01 2024-11-29 埃斯科绘图成像有限责任公司 用于柔性印版的持久标识的系统和方法以及用其标识的印版
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NL2028208B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh Flexographic printing element precursor with high melt flow index
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CN113635657B (zh) * 2021-08-19 2022-11-04 上海出版印刷高等专科学校 一种采用led光源的柔性版制版组合曝光方法
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Also Published As

Publication number Publication date
WO2010014156A1 (en) 2010-02-04
US20100028815A1 (en) 2010-02-04
EP2313270B1 (en) 2013-01-23
US8034540B2 (en) 2011-10-11
EP2313270A1 (en) 2011-04-27
CN102112312A (zh) 2011-06-29
JP2011529583A (ja) 2011-12-08
US20110310371A1 (en) 2011-12-22

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