JP5422610B2 - 荷電粒子線装置 - Google Patents
荷電粒子線装置 Download PDFInfo
- Publication number
- JP5422610B2 JP5422610B2 JP2011140060A JP2011140060A JP5422610B2 JP 5422610 B2 JP5422610 B2 JP 5422610B2 JP 2011140060 A JP2011140060 A JP 2011140060A JP 2011140060 A JP2011140060 A JP 2011140060A JP 5422610 B2 JP5422610 B2 JP 5422610B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- charged particle
- particle beam
- oil
- lubricant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims (6)
- 荷電粒子線が照射された半導体ウェハから放出される荷電粒子を検出する検出器と、前記荷電粒子線が照射される半導体ウェハを包囲する真空室を備えた荷電粒子線装置において、
前記真空室内に配置される半導体ウェハを載せるための試料ステージの摺動部材の摺動部に、真空排気された真空空間内において80℃以上220℃以下の温度で加熱精製された潤滑剤が塗布されていることを特徴とする荷電粒子線装置。 - 請求項1において、
前記潤滑剤は、フッ素系化合物を含むことを特徴とする荷電粒子線装置。 - 請求項2において、
前記フッ素系化合物は、パーフルオロポリエーテルを含むことを特徴とする荷電粒子線装置。 - 請求項2において、
前記潤滑剤は、前記加熱精製によって、CF3,C2F5、及び/又はC3F7の一部が除去されたものであることを特徴とする荷電粒子線装置。 - 請求項1において、
前記潤滑剤は、炭化水素系の化合物を含むことを特徴とする荷電粒子線装置。 - 請求項1において、
前記潤滑剤は、動粘度が400〜700mm2/sであることを特徴とする荷電粒子線装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011140060A JP5422610B2 (ja) | 2011-06-24 | 2011-06-24 | 荷電粒子線装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011140060A JP5422610B2 (ja) | 2011-06-24 | 2011-06-24 | 荷電粒子線装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005336461A Division JP4875886B2 (ja) | 2005-11-22 | 2005-11-22 | 荷電粒子線装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011233532A JP2011233532A (ja) | 2011-11-17 |
JP5422610B2 true JP5422610B2 (ja) | 2014-02-19 |
Family
ID=45322613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011140060A Active JP5422610B2 (ja) | 2011-06-24 | 2011-06-24 | 荷電粒子線装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5422610B2 (ja) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02216616A (ja) * | 1989-02-15 | 1990-08-29 | Fuji Electric Co Ltd | 磁気記録媒体 |
JP2938154B2 (ja) * | 1990-07-10 | 1999-08-23 | 光洋精工株式会社 | 真空軸受用潤滑剤 |
JPH05135725A (ja) * | 1991-11-07 | 1993-06-01 | Jeol Ltd | 荷電粒子ビーム装置における有機ガス分子の除去方法 |
GB2322729B (en) * | 1995-10-30 | 2000-05-17 | Seagate Technology | Disc drive spindle motor having hydro bearing with lubricant optimized with disc drive compatible additives |
MXPA02001588A (es) * | 1999-08-16 | 2002-07-02 | Univ Johns Hopkins | Reflectron de iones, que comprende unt ablero flexible de circuito impreso. |
JP2003270992A (ja) * | 2002-03-18 | 2003-09-25 | Ricoh Co Ltd | 定着ローラ、それを用いた定着装置および画像形成装置、ならびに定着ローラの製造方法 |
JP2004259448A (ja) * | 2003-02-24 | 2004-09-16 | Hitachi High-Technologies Corp | 試料ステージ駆動機構 |
-
2011
- 2011-06-24 JP JP2011140060A patent/JP5422610B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2011233532A (ja) | 2011-11-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4875886B2 (ja) | 荷電粒子線装置 | |
JP6220423B2 (ja) | 検査装置 | |
Sherman et al. | Dry surface cleaning using CO2 snow | |
US7301157B2 (en) | Cluster tool for microscopic processing of samples | |
US9123503B2 (en) | Methods of fabricating microelectronic substrate inspection equipment | |
EP3196919B1 (en) | Cryogenic specimen processing in a charged particle microscope | |
JP4991144B2 (ja) | 試料測定方法、及び荷電粒子線装置 | |
Vladár et al. | Active monitoring and control of electron-beam-induced contamination | |
JP2005134170A (ja) | 電子分光分析方法及び分析装置 | |
JP5422610B2 (ja) | 荷電粒子線装置 | |
US20220065727A1 (en) | Coolant Microleak Sensor for a Vacuum System | |
JP5033374B2 (ja) | 荷電粒子線装置 | |
TW201831993A (zh) | 用於識別污染的設備及方法 | |
JP5099703B2 (ja) | 荷電粒子線装置 | |
JP2006139917A (ja) | イオンビーム加工装置および試料作製方法 | |
WO2012114409A1 (ja) | 真空装置及びそれに用いる潤滑油 | |
US20080190928A1 (en) | Apparatus having vacuum vessel | |
US20210132506A1 (en) | Ionic Liquids as Lubricants in Optical Systems | |
JP2010092633A (ja) | 真空室内のガス成分測定方法、及び真空装置 | |
JP5274952B2 (ja) | 真空シール方法及び真空装置 | |
KR101009939B1 (ko) | 전자에너지 손실 분광법에서 발생하는 탄소오염 제거방법 | |
Chia | Process tool cleanliness for clean manufacturing | |
JP2010048584A (ja) | X線光電子分光装置及び全反射x線光電子分光装置並びに角度分解x線光電子分光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130219 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130521 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130722 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130903 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130913 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20131029 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131125 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5422610 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |