JP5421205B2 - 発光装置 - Google Patents
発光装置 Download PDFInfo
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- JP5421205B2 JP5421205B2 JP2010185242A JP2010185242A JP5421205B2 JP 5421205 B2 JP5421205 B2 JP 5421205B2 JP 2010185242 A JP2010185242 A JP 2010185242A JP 2010185242 A JP2010185242 A JP 2010185242A JP 5421205 B2 JP5421205 B2 JP 5421205B2
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- light
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 139
- 229910052791 calcium Inorganic materials 0.000 claims description 17
- 229910052712 strontium Inorganic materials 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 229920002050 silicone resin Polymers 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000012423 maintenance Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 41
- 238000000295 emission spectrum Methods 0.000 description 26
- 229920005989 resin Polymers 0.000 description 22
- 239000011347 resin Substances 0.000 description 22
- 230000005284 excitation Effects 0.000 description 21
- 239000002994 raw material Substances 0.000 description 20
- 239000011575 calcium Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 17
- 239000004065 semiconductor Substances 0.000 description 16
- 239000011777 magnesium Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- 238000000695 excitation spectrum Methods 0.000 description 12
- 230000007423 decrease Effects 0.000 description 9
- 238000010304 firing Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 229910052788 barium Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 229910005793 GeO 2 Inorganic materials 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- -1 carbonate compound Chemical class 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 229910052727 yttrium Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052688 Gadolinium Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- MCSXGCZMEPXKIW-UHFFFAOYSA-N 3-hydroxy-4-[(4-methyl-2-nitrophenyl)diazenyl]-N-(3-nitrophenyl)naphthalene-2-carboxamide Chemical compound Cc1ccc(N=Nc2c(O)c(cc3ccccc23)C(=O)Nc2cccc(c2)[N+]([O-])=O)c(c1)[N+]([O-])=O MCSXGCZMEPXKIW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 238000004255 ion exchange chromatography Methods 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000009877 rendering Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 101100496858 Mus musculus Colec12 gene Proteins 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000004110 Zinc silicate Substances 0.000 description 2
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- ZOIVSVWBENBHNT-UHFFFAOYSA-N dizinc;silicate Chemical compound [Zn+2].[Zn+2].[O-][Si]([O-])([O-])[O-] ZOIVSVWBENBHNT-UHFFFAOYSA-N 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 235000019352 zinc silicate Nutrition 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 102100032047 Alsin Human genes 0.000 description 1
- 101710187109 Alsin Proteins 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 239000004132 Calcium polyphosphate Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 101100513612 Microdochium nivale MnCO gene Proteins 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 229910001508 alkali metal halide Inorganic materials 0.000 description 1
- 229910001617 alkaline earth metal chloride Inorganic materials 0.000 description 1
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 description 1
- 229910001615 alkaline earth metal halide Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 235000019827 calcium polyphosphate Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
-
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/32257—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic the layer connector connecting to a bonding area disposed in a recess of the surface of the item
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
- H01L33/504—Elements with two or more wavelength conversion materials
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Led Device Packages (AREA)
- Luminescent Compositions (AREA)
- Led Devices (AREA)
Description
(Mg1−x,AEx)a(Ge1−y,Sny)bOcHAd:zMn (A)
(式中、AEはCa、またはSrからなる群から選択される少なくとも1種類以上の元素であり、
HAはF、またはClからなる群から選択される少なくとも1種類以上の元素であり、
2.54≦a≦4.40、
0.80≦b≦1.10、
3.85≦c≦7.00、
0≦d≦2.00、
0≦x≦0.05、
0≦y≦0.10、および
0<z≦0.03
である)
で表され、前記発光素子から放出される光を吸収して650nm以上665nm以下の波長領域に主発光ピークを有する光を放出する蛍光体を含む。
(Mg1−x,AEx)a(Ge1−y,Sny)bOcHAd:zMn (A)
(式中、AEはCa、またはSrからなる群から選択される少なくとも1種類以上の元素であり、
HAはF、またはClからなる群から選択される少なくとも1種類以上の元素であり、
2.54≦a≦4.40、
0.80≦b≦1.10、
3.85≦c≦7.00、
0≦d≦2.00、
0≦x≦0.05、
0≦y≦0.10、および
0<z≦0.03
である)
で表され、420nmを超え500nm以下の波長領域の光で励起することによって、650nm以上665nm以下の波長領域に主発光ピークを有する光を放出する。ここで主発光ピークの半値幅は30nm以内である。蛍光体の発光スペクトルは、発光ピークが400nmの近紫外領域LEDや460nm青色領域LED等によって蛍光体を励起し、例えばIMUC−7000G型分光光度計(商品名、大塚電子株式会社製)により測定して、得ることができる。
(Mg1−x,AEx)a(Ge1−y,Sny)bOcHAd:zMn (A)
2.54≦a≦4.40、好ましくは3.47≦a≦4.26
0.80≦b≦1.10、好ましくは0.95≦b≦1.00
3.85≦c≦7.00、好ましくは4.02≦c≦6.87
0≦d≦2.00、好ましくは0≦d≦0.83、
0≦x≦0.05、好ましくは0≦x≦0.04、
0≦y≦0.10、好ましくは0.02≦y≦0.08、
0<z≦0.03、好ましくは0.01≦z≦0.02
(Mg1−x’,AEx’)a’(Ge1−y’,Sny’)b’Oc’,Cld’:z’Mn (B)
ここで、AEはCaおよびSrから選択される少なくとも一種であり、
3.5≦a’≦4.4、好ましくは3.9≦a’≦4.2、
0.8≦b’≦1.1、好ましくは0.9≦b’≦1.0、
5.5≦c’≦7.0、好ましくは5.5≦c’≦6.9
0<d’≦0.41、好ましくは0<d’≦0.25、
0<x’≦0.05、好ましくは0<x’≦0.04、
0<y’≦0.10、
0<z’≦0.03
である。
この蛍光体は、前記した発光素子から放出される光によって励起され、赤色から深赤色の光を放出する。放出される光の発光スペクトルは、650nm以上665nm以下の波長領域に主発光ピークを有する。そして、その主発光ピークの半値幅は一般に20nm以下である。
3.5MgO・0.5MgF2・GeO2:0.01Mn(=Mg4GeO5。5F:0.01Mn)蛍光体(蛍光体No.1)と、(Y,Gd)3(Al,Ga)5O12:Ce蛍光体を混合し、シリコーン樹脂に分散させて樹脂混合物を調製した。蛍光体No.1の温度特性は図3に示したとおり、200℃付近まで温度消光が見られなかった。一方、(Y,Gd)3(Al,Ga)5O12:Ce蛍光体の室温に対する180℃での温度特性ΔIは80%であった。室温から180℃まで(Y,Gd)3(Al,Ga)5O12:Ce蛍光体の発光スペクトルの形状は殆ど変化が見られなかった。この樹脂混合物と発光素子と支持部材とを用いて、白色LED発光装置を作製した。発光素子は、連続駆動時のジャンクション温度が140℃であり、発光スペクトルのピーク波長が445nmである。支持部材は、Cu製のカップ状で、側面内壁には光反射率の高いアルミナが塗布されており、外部との電気的接続を保つ機能を備えている。発光素子をCu製支持部材の底面にはんだ接合して、さらに前記蛍光体を含む蛍光体層を形成させて、実施例1のフェイスアップ型白色LED発光装置を作製した。
実施例1の発光装置を30mm×30mmのAl基板に間隔5mmで4個を直列に配線した発光デバイスを、同一Al基板内に間隔5mmで各4列並列に配線した発光装置モジュールを作製した。これを実施例8の発光装置モジュールとする。また、比較例1の発光装置を用いて、実施例8と同様の構造を有する発光装置モジュールを作製した。これを比較例8の発光装置モジュールとする。
これら発光装置モジュールに配置されている各発光装置に投入電力が0.8Wとなるように投入電力を調整して、それぞれ発光効率を測定した。実施例8の発光装置モジュールの発光効率を比較例8の発光装置モジュールの発光効率と比較すると、実施例8の方がおよそ1.1倍高いことが見積もられた。比較例8の発光装置モジュールより、実施例8の発光装置モジュールの発光効率の方が優れていた原因として、発光装置の間隔が狭いことによりモジュールを構成する各発光装置の温度が上昇しても、実施形態による発光装置は発光効率の低下が起こりにくいためである。つまり実施形態による発光装置は駆動により温度上昇し、高温で駆動される場合に従来の発光装置に比較して高い発光効率を示すことがわかる。
504…反射面; 505…凹部; 506…発光チップ
507…ボンディングワイヤ; 508…ボンディングワイヤ; 509…蛍光層
510…蛍光体; 511…樹脂層;
600…樹脂ステム; 601…リード
602…リード; 603…樹脂部; 604…反射面; 605…開口部
606E…ツェナー・ダイオード; 606F…半導体発光素子; 607…接着剤
609…ボンディングワイヤ; 610…蛍光体; 611…封止体
622…バッファ層; 623…n型コンタクト層; 624…活性層
625…p型クラッド層; 626…p型コンタクト層; 627…n側電極
628…p側電極; 632…n型クラッド層; 638…透光性基板
642…バンプ; 644…バンプ; 650…n型シリコン基板
652…p型領域; 654…p側電極; 656…n側電極; 658…n側電極
660…配線層; 662…高反射膜
800、800’…リード; 801…半導体発光素子; 802…マウント材
803…ボンディングワイヤ; 804…プレディップ材; 805…キャスティング材。
Claims (8)
- 420nmを越え500nm以下の波長領域に主発光ピークを有する発光素子と、前記発光素子上に形成された蛍光体層とを具備する発光装置であって、前記発光素子に投入される電力が1W以上であり、前記発光装置の連続駆動時における前記発光素子のジャンクション温度が100℃以上200℃以下であり、前記蛍光体層が、下記一般式(A):
(Mg1−x,AEx)a(Ge1−y,Sny)bOcHAd:zMn (A)
(式中、AEはCa、またはSrからなる群から選択される少なくとも1種類以上の元素であり、
HAはF、またはClからなる群から選択される少なくとも1種類以上の元素であり、 2.54≦a≦4.40、
0.80≦b≦1.10、
3.85≦c≦7.00、
0≦d≦2.00、
0≦x≦0.05、
0≦y≦0.10、および
0<z≦0.03
である)
で表され、前記発光素子から放出される光を吸収して650nm以上665nm以下の波長領域に主発光ピークを有する光を放出する蛍光体を含むことを特徴とする発光装置。 - 熱抵抗が20℃/W以上である、請求項1に記載の発光装置。
- 前記発光素子を支持する支持部材をさらに具備し、前記発光素子が、金属接合により前記支持部材に接合されている、請求項1または2に記載の発光装置。
- 前記支持部材が、金属、またはセラミックスからなるものである、請求項3に記載の発光装置。
- 前記蛍光体層がシリコーン樹脂の硬化物からなり、前記蛍光体がその中に分散されている、請求項1〜4のいずれか1項に記載の発光装置。
- 前記蛍光体層が、前記一般式(A)で示される蛍光体以外の、540nm以上580nm以下の波長領域に主発光ピークを有する第二の蛍光体を含む、請求項1〜5のいずれか1項に記載の発光装置。
- 前記第二の蛍光体の室温に対する発光強度の維持率が80%以上である、請求項6に記載の発光装置。
- 前記発光装置が白色光発光装置であり、その色温度は温白色、または電球色である、請求項1〜7のいずれか1項に記載の発光装置。
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