JP5388433B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP5388433B2
JP5388433B2 JP2007246472A JP2007246472A JP5388433B2 JP 5388433 B2 JP5388433 B2 JP 5388433B2 JP 2007246472 A JP2007246472 A JP 2007246472A JP 2007246472 A JP2007246472 A JP 2007246472A JP 5388433 B2 JP5388433 B2 JP 5388433B2
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laser
laser beam
axis direction
film
major axis
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JP2007246472A
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Japanese (ja)
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JP2008112981A5 (enExample
JP2008112981A (ja
Inventor
幸一郎 田中
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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JP2007246472A 2006-10-03 2007-09-25 半導体装置の作製方法 Expired - Fee Related JP5388433B2 (ja)

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JP2007246472A JP5388433B2 (ja) 2006-10-03 2007-09-25 半導体装置の作製方法

Applications Claiming Priority (3)

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JP2006271363 2006-10-03
JP2006271363 2006-10-03
JP2007246472A JP5388433B2 (ja) 2006-10-03 2007-09-25 半導体装置の作製方法

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JP2008112981A JP2008112981A (ja) 2008-05-15
JP2008112981A5 JP2008112981A5 (enExample) 2010-09-30
JP5388433B2 true JP5388433B2 (ja) 2014-01-15

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JP2007246472A Expired - Fee Related JP5388433B2 (ja) 2006-10-03 2007-09-25 半導体装置の作製方法

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118409A (ja) * 2008-11-11 2010-05-27 Ulvac Japan Ltd レーザアニール装置及びレーザアニール方法
JP2011039078A (ja) * 2009-08-06 2011-02-24 Toppan Printing Co Ltd カラーフィルタの修正方法
JPWO2011141949A1 (ja) * 2010-05-10 2013-07-22 パナソニック株式会社 結晶性半導体膜の製造方法、結晶性半導体膜付き基板、薄膜トランジスタ
KR101317002B1 (ko) 2010-07-16 2013-10-11 파나소닉 액정 디스플레이 주식회사 결정성 반도체막의 제조 방법 및 결정성 반도체막의 제조 장치
JP7523960B2 (ja) 2020-06-18 2024-07-29 住友重機械工業株式会社 レーザ処理方法、レーザ処理装置の制御装置、及びレーザ処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2641101B2 (ja) * 1988-04-12 1997-08-13 株式会社日立製作所 半導体装置の製造方法および装置
JP2565138B2 (ja) * 1994-06-22 1996-12-18 日本電気株式会社 レーザcvd装置および薄膜形成方法
JPH09270393A (ja) * 1996-03-29 1997-10-14 Sanyo Electric Co Ltd レーザー光照射装置
JP4969024B2 (ja) * 2003-01-21 2012-07-04 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4171399B2 (ja) * 2003-10-30 2008-10-22 住友重機械工業株式会社 レーザ照射装置

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JP2008112981A (ja) 2008-05-15

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