JP5370462B2 - イオン源電極のクリーニング装置 - Google Patents

イオン源電極のクリーニング装置 Download PDF

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Publication number
JP5370462B2
JP5370462B2 JP2011243067A JP2011243067A JP5370462B2 JP 5370462 B2 JP5370462 B2 JP 5370462B2 JP 2011243067 A JP2011243067 A JP 2011243067A JP 2011243067 A JP2011243067 A JP 2011243067A JP 5370462 B2 JP5370462 B2 JP 5370462B2
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JP
Japan
Prior art keywords
electrode
cleaning
glow discharge
power supply
output current
Prior art date
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Active
Application number
JP2011243067A
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English (en)
Japanese (ja)
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JP2013098143A (ja
Inventor
武 松本
和浩 中尾
誠 厚主
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Ion Equipment Co Ltd
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Priority to JP2011243067A priority Critical patent/JP5370462B2/ja
Priority to CN201210236662.XA priority patent/CN103094028B/zh
Priority to KR1020120088335A priority patent/KR101342400B1/ko
Publication of JP2013098143A publication Critical patent/JP2013098143A/ja
Application granted granted Critical
Publication of JP5370462B2 publication Critical patent/JP5370462B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
JP2011243067A 2011-11-07 2011-11-07 イオン源電極のクリーニング装置 Active JP5370462B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011243067A JP5370462B2 (ja) 2011-11-07 2011-11-07 イオン源電極のクリーニング装置
CN201210236662.XA CN103094028B (zh) 2011-11-07 2012-07-09 离子源电极的清洁装置
KR1020120088335A KR101342400B1 (ko) 2011-11-07 2012-08-13 이온원 전극의 클리닝 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011243067A JP5370462B2 (ja) 2011-11-07 2011-11-07 イオン源電極のクリーニング装置

Publications (2)

Publication Number Publication Date
JP2013098143A JP2013098143A (ja) 2013-05-20
JP5370462B2 true JP5370462B2 (ja) 2013-12-18

Family

ID=48206477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011243067A Active JP5370462B2 (ja) 2011-11-07 2011-11-07 イオン源電極のクリーニング装置

Country Status (3)

Country Link
JP (1) JP5370462B2 (zh)
KR (1) KR101342400B1 (zh)
CN (1) CN103094028B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2777038C1 (ru) * 2021-12-17 2022-08-01 Публичное акционерное общество "Электромеханика" Газоразрядная электронно-лучевая пушка

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9570271B2 (en) * 2014-03-03 2017-02-14 Praxair Technology, Inc. Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
CN107924795B (zh) * 2015-08-20 2019-10-18 株式会社日立高新技术 离子束装置以及气体场致发射离子源的清洗方法
CN106206230B (zh) * 2016-08-31 2018-07-06 北京埃德万斯离子束技术研究所股份有限公司 一种离子源的电源系统及离子源
CN106783497B (zh) * 2016-12-22 2018-07-17 信利（惠州）智能显示有限公司 一种离子注入设备的运转方法
CN106929814B (zh) * 2017-02-24 2019-04-05 信利（惠州）智能显示有限公司 一种离子注入设备的清洗方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01128337A (ja) * 1987-11-11 1989-05-22 Hitachi Ltd 電子銃の放電洗浄装置
JPH02207442A (ja) * 1989-02-07 1990-08-17 Fuji Electric Co Ltd 荷電粒子装置
JPH02213039A (ja) * 1989-02-14 1990-08-24 Hitachi Ltd イオンビーム加工装置およびその放電洗浄方法
JPH02230641A (ja) * 1989-03-03 1990-09-13 Nec Corp イオンビーム発生装置
JPH10208653A (ja) * 1997-01-27 1998-08-07 Hitachi Ltd イオン源装置及びこれを用いた集束イオンビーム装置
JP5141732B2 (ja) * 2010-08-11 2013-02-13 日新イオン機器株式会社 イオン源電極のクリーニング方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2777038C1 (ru) * 2021-12-17 2022-08-01 Публичное акционерное общество "Электромеханика" Газоразрядная электронно-лучевая пушка

Also Published As

Publication number Publication date
CN103094028B (zh) 2015-09-09
KR101342400B1 (ko) 2013-12-17
JP2013098143A (ja) 2013-05-20
CN103094028A (zh) 2013-05-08
KR20130050232A (ko) 2013-05-15

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