JP5352329B2 - Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line - Google Patents

Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line Download PDF

Info

Publication number
JP5352329B2
JP5352329B2 JP2009097094A JP2009097094A JP5352329B2 JP 5352329 B2 JP5352329 B2 JP 5352329B2 JP 2009097094 A JP2009097094 A JP 2009097094A JP 2009097094 A JP2009097094 A JP 2009097094A JP 5352329 B2 JP5352329 B2 JP 5352329B2
Authority
JP
Japan
Prior art keywords
substrate
mounting
flat display
suction
display substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009097094A
Other languages
Japanese (ja)
Other versions
JP2010249936A (en
Inventor
不二夫 山崎
徹 宮坂
淳一 玉本
豊 渡辺
範行 大録
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2009097094A priority Critical patent/JP5352329B2/en
Priority to CN2010101641917A priority patent/CN101859041B/en
Publication of JP2010249936A publication Critical patent/JP2010249936A/en
Application granted granted Critical
Publication of JP5352329B2 publication Critical patent/JP5352329B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention provides an operation edge fixing base which can prevent component loading position precision or jointing reliability reduction caused by display substrate warpage in component loading joint processing of display device, a mounting processing operation device with an operation edge fixing base or a mounting processing operation method using the operation edge fixing base, a production line structure with the mounting operation device or operation method for providing a display substrate module assembly line with high yield rate and high operation efficiency. The mounting processing operation device or operation method for mounting components at the periphery of the display substrate comprises the following components: the operation edge fixing base for supporting and loading the operation edge of the loading component from the lower part; two movable side holding parts which support two edges for clamping the operation edge from the lower part; and a conveying moving base with a dimension which allows entering a dent-shaped part that is composed of the operation edge fixing base and the two side holding parts, wherein the operation edge fixing base is also provided with a substrate adsorption pad which adsorbs a planar display substrate after the adsorption of the planar display substrate.

Description

本発明は、液晶やプラズマなどのFPD(Flat Panel Display)の表示基板の周辺に駆動ICの搭載やCOF(Chip on Film),FPC(Flexible Printed Circuit)などのいわゆるTAB(Tape Automated Bonding)接続および周辺基板(PCB、Printed Circuit Board)を実装する実装処理作業装置及びそれ等から構成される表示基板モジュール組立ラインに関するものである。より具体的には、例えば、TABやICを搭載する処理作業に好適な基板固定ベースを有する実装処理作業装置及び実装処理作業方法並びに実装処理作業装置または実装処理作業方法に基づいて構成される表示基板モジュール組立ラインまたは表示基板モジュール組立方法に関するものである。   In the present invention, a driving IC is mounted around a display substrate of an FPD (Flat Panel Display) such as liquid crystal or plasma, so-called TAB (Tape Automated Bonding) connection such as COF (Chip on Film), FPC (Flexible Printed Circuit), and the like. The present invention relates to a mounting processing work apparatus for mounting a peripheral board (PCB, Printed Circuit Board), and a display board module assembly line composed of them. More specifically, for example, a mounting processing work device and mounting processing work method having a substrate fixing base suitable for processing work for mounting TAB and IC, and a display configured based on the mounting processing work device or mounting processing work method The present invention relates to a substrate module assembly line or a display substrate module assembly method.

表示基板モジュール組立ラインは、液晶、プラズマなどのFPDの表示基板(以下、基本的には単に基板と略し、その他の基板、例えばPCBの場合はPCB基板と明記する)に、複数の処理作業工程を順次行なうことで、該基板の周辺に、駆動IC、TABおよびPCB基板などを実装する装置である。   The display substrate module assembly line is a process substrate for FPD display substrates such as liquid crystal and plasma (hereinafter, simply abbreviated as a substrate, and clearly described as a PCB substrate in the case of a PCB, for example). Is a device for mounting a driving IC, a TAB, a PCB substrate, and the like around the substrate by sequentially performing the above.

例えば、処理工程の一例としては、(1)基板端部のTAB貼付け部を清掃する端子クリーニング工程、(2)清掃後の基板端部に異方性導電フィルム(ACF、Anisotropic Conductive Film)を貼付けるACF工程、(3)基板のACFを貼付けた位置に、TABやICを位置決めして搭載する搭載工程、(4)搭載したTABやICを加熱圧着することで、ACFにより固定する圧着工程、(5)TABの基板側と反対側に、予めACFを貼り付けたPCB基板を貼付け搭載するPCB工程(複数の工程からなる)などからなる。なお、ACFは接合する部材のどちらか一方に予め貼り付けられていれば良く、上記の処理工程の別な例として、ACFをTABやICの側に予め貼付けする構成も可能である。さらには、処理する基板の辺の数や処理するTABやICの数などで各処理装置の数や基板を回転する処理ユニットなどが必要となる。   For example, as an example of the processing step, (1) a terminal cleaning step for cleaning the TAB attachment portion at the substrate end, (2) an anisotropic conductive film (ACF, Anisotropic Conductive Film) is attached to the substrate end after cleaning. (3) A mounting step in which the TAB or IC is positioned and mounted at the position where the ACF is pasted on the substrate. (4) A pressing step in which the mounted TAB or IC is fixed by ACF by thermocompression bonding. (5) A PCB process (consisting of a plurality of processes) for attaching and mounting a PCB substrate on which an ACF is previously bonded to the side opposite to the TAB substrate side is included. Note that the ACF only needs to be attached in advance to either one of the members to be joined. As another example of the above processing steps, a configuration in which the ACF is attached in advance to the TAB or IC side is also possible. Furthermore, the number of processing apparatuses, processing units for rotating the substrates, and the like are required depending on the number of sides of the substrate to be processed and the number of TABs and ICs to be processed.

このような一連の工程を経ることによって、基板上の電極とTABやIC等に設けた電極との間を熱圧着することによって、ACF内部の導電性粒子を介して電気的な接続がなされる。なお、このとき同時に、ACF基材樹脂の硬化により、基板とTABやIC等が機械的にも接着される。   Through such a series of processes, electrical connection is made through conductive particles inside the ACF by thermocompression bonding between the electrode on the substrate and the electrode provided on the TAB, IC, or the like. . At the same time, the substrate and TAB, IC, etc. are also mechanically bonded by curing of the ACF base resin.

一般的に、基板サイズの大型化や薄型化に伴い、基板端部に反りが発生しやすくなる。上記各工程、例えば、TABやICを搭載する搭載工程においては、部品を搭載する基板に反りがあると搭載ズレの要因となる。部品搭載時などには基板を平面精度の高いベース面に直接固定することが理想である。
基板を固定する基板固定ベースに基板を位置決め保持する際は、一般的に、特許文献1あるいは特許文献2に記載されているよう吸着パッドで負圧エアーを使用し、基板を処理装置に向かって前後端もしくは左右端部で吸着保持する。また、吸着パッド自体の構造については、例えば特許文献3に開示されている。
In general, as the substrate size becomes larger or thinner, the edge of the substrate tends to be warped. In each of the above-described processes, for example, a mounting process for mounting TAB or IC, if a substrate on which a component is mounted is warped, it causes a mounting shift. Ideally, the board is directly fixed to the base surface with high plane accuracy when mounting components.
When positioning and holding the substrate on the substrate fixing base for fixing the substrate, generally, negative pressure air is used at the suction pad as described in Patent Document 1 or Patent Document 2, and the substrate is directed toward the processing apparatus. Adsorb and hold at front and rear ends or left and right ends. The structure of the suction pad itself is disclosed in, for example, Patent Document 3.

特開2001−228452号公報Japanese Patent Application Laid-Open No. 2001-228452 特開2007−150077号公報JP 2007-150077 A 特開2007−313607号公報JP 2007-313607 A

しかし、特許文献1あるいは特許文献2記載の吸着パッドの面で基板を保持する方式では、近年の大型化する表示ディスプレイの生産には平坦度の確保の面で、困難を生じる。たとえば、支持部分の間隔が500mmの場合、比較的良好な基板の場合でも平面度は0.1〜0.5mm程度となり、それ以上に精度を上げることが難しく、搭載精度の限界が生じている。この精度の向上は、基板のさらなる大型化の進展に伴い、大型表示ディスプレイの生産安定化の急務となっている。
また、特許文献3に開示されているような従来の吸着パッドは、吸着面で直接パネルの面を支える構造であり、前記の基板平面度の精度を向上させることが難しい構造となっている。
However, in the method of holding the substrate on the surface of the suction pad described in Patent Document 1 or Patent Document 2, it is difficult to produce flat display devices in recent years in terms of ensuring flatness. For example, when the distance between the support portions is 500 mm, even in the case of a relatively good substrate, the flatness is about 0.1 to 0.5 mm, and it is difficult to increase the accuracy beyond that, and the mounting accuracy is limited. . This improvement in accuracy has become an urgent task for stabilizing the production of large display devices as the size of substrates increases.
Moreover, the conventional suction pad as disclosed in Patent Document 3 has a structure in which the surface of the panel is directly supported by the suction surface, and it is difficult to improve the accuracy of the substrate flatness.

そこで、本発明の第1の目的は、大型表示ディスプレイの生産を安定に実現できる高精度の平坦度を確保できる搬送位置決め機構を有する、歩留まりまたは稼働率の高い表示基板モジュール組立ラインを提供することである。
また、本発明の第2の目的は、基板を基板固定ベースに高精度に保持できる歩留まりまたは稼働率の高い実装処理作業装置または実装処理作業方法を提供することである。
SUMMARY OF THE INVENTION Accordingly, a first object of the present invention is to provide a display substrate module assembly line having a high yield or operating rate, which has a transport positioning mechanism capable of ensuring high-accuracy flatness capable of stably realizing production of a large display. It is.
A second object of the present invention is to provide a mounting processing work apparatus or mounting processing working method with a high yield or operating rate that can hold a substrate with high accuracy on a substrate fixing base.

上記の第1の目的を達成するために、表示基板の部品を搭載する作業辺を下から支える、前記作業辺に平行する作業辺固定台座を設け、さらに前記作業辺を挟む両辺の下部を支える移動可能な両側保持部を設け、これらの作業辺固定台座および両側保持部のなす凹み状部分に入りえる寸法の搬送移動台座を設けたことを第1の特徴とする。   In order to achieve the first object, a work side fixing base that supports the work side on which the components of the display board are mounted is supported from below, and is parallel to the work side, and the lower portions of both sides sandwiching the work side are supported. A first feature is that a movable both-side holding part is provided, and a transporting and moving base having a size capable of entering the recessed portion formed by the working-side fixing base and the both-side holding part is provided.

また上記第1の目的を達成するために、第1の特徴に加え、前記移動可能な両側保持部は、前記作業辺固定台座に平行に設置された連結部を有し、また前記両側保持部は自動移動可能な駆動アクチュエータおよび、手動調整可能な位置調整機構を有することを第2の特徴とする。   In order to achieve the first object, in addition to the first feature, the movable both-side holding part has a connecting part installed in parallel to the work side fixing base, and the both-side holding part The second feature is that it has a drive actuator that can move automatically and a position adjustment mechanism that can be manually adjusted.

さらに前記作業辺固定台座には、表示基板を吸着する吸着部、および前記作業辺固定台座の表面より突出し、真空吸着の負圧により前記表示基板を前記作業辺固定台座の吸着部近傍に引き寄せ、吸着終了時には元の位置に復帰する吸着パッドを設けたことを第3の特徴とする。   Further, the work side fixing base protrudes from the surface of the work side fixing pedestal, the suction part that sucks the display board, and draws the display substrate near the suction part of the work side fixing base by the negative pressure of vacuum suction, A third feature is that a suction pad that returns to its original position at the end of suction is provided.

本発明によれば、基板固定ベースに基板を高精度に保持できる吸着パッドを提供することができる。
また、本発明によれば、基板を基板固定ベースに高精度に保持できる実装処理作業装置または実装処理作業方法を提供することができる。
さらに、本発明によれば、上記記載の実装処理作業装置または実装処理作業方法を有するライン構成とすることで、歩留まりあるいは稼働率の高い表示基板モジュール組立ラインを提供することができる。
ADVANTAGE OF THE INVENTION According to this invention, the suction pad which can hold | maintain a board | substrate to a board | substrate fixed base with high precision can be provided.
In addition, according to the present invention, it is possible to provide a mounting processing work apparatus or a mounting processing work method that can hold the substrate on the substrate fixing base with high accuracy.
Furthermore, according to the present invention, a display substrate module assembly line with a high yield or operating rate can be provided by adopting a line configuration having the mounting processing work apparatus or mounting processing work method described above.

本発明の第1の実施形態である表示基板モジュール組立ラインを示す図である。It is a figure which shows the display board module assembly line which is the 1st Embodiment of this invention. 本発明の実施形態であるTAB/IC搭載処理作業装置のTAB/IC基板を搭載する搭載部と搬送装及び搬送装置の動作説明図である。It is an operation explanatory view of the transport and mounting unit for mounting the TAB / IC substrate TAB / IC board processing work apparatus equipment and conveying apparatus according to an embodiment of the present invention. 図3(a)は、搬送手段2によって、基板Pの反り、撓みを考慮しながら、搭載装置の基板固定ベースよりH分高い位置で基板を搬送した図である。図3(b)は、基板を基板固定ベース及び基板保持手段に載置した図である。3 (a) is by the conveying means 2, the warpage of the substrate P, taking into account the deflection diagrams that transfers a substrate board fixing base by Ri H content high position of the mounting device. FIG. 3B is a diagram in which the substrate is placed on the substrate fixing base and the substrate holding means. 図4(a)は、図3に示す本発明の実施形態である基板固定ベースの左側一部の拡大図である。図4(b)は、前記実施形態のほかの実施形態を示す吸着溝の形状を示す拡大図である。FIG. 4A is an enlarged view of a part of the left side of the substrate fixing base according to the embodiment of the present invention shown in FIG. FIG.4 (b) is an enlarged view which shows the shape of the adsorption | suction groove | channel which shows other embodiment of the said embodiment. 本発明の実施形態であるベース面吸着溝部及び基板吸着パッドを負圧にするための負圧システムを模式的に示した図である。It is a diagram schematically showing a negative pressure system to the base surface adsorption grooves and the substrate suction pad which is an embodiment of the present invention to a negative pressure. 本発明の実施形態である基板吸着パッドの第1の実施例を示す図である。It is a figure which shows the 1st Example of the board | substrate suction pad which is embodiment of this invention. 本発明の実施形態である第1実施例における歪補正機能における基板吸着パッドと基板の基本的な動き示した図である。It is the figure which showed the fundamental motion of the board | substrate suction pad and the board | substrate in the distortion correction function in 1st Example which is embodiment of this invention. 基本的な処理にその他のフローも加味した全体的な処理フローを示す図であるIt is a figure which shows the whole processing flow which considered the other flow in addition to the basic processing. 本発明の実施形態である基板吸着パッドの他の実施例を示した図である。It is the figure which showed the other Example of the board | substrate suction pad which is embodiment of this invention. 図10(a)は本発明の実施形態において、図3と異なる寸法の表示基板の実装処理を行うため、支持部材を移動せしめた状態を示す斜視図である。図10(b)は前記、移動可能な支持部材を移動せしめる移動機構の一部と、異なる縦横比の表示基板の処理を行う場合に用いる手動調整機構を示す部分拡大図である。FIG. 10A is a perspective view showing a state in which the support member is moved in order to perform the mounting process of the display substrate having a size different from that in FIG. 3 in the embodiment of the present invention. FIG. 10B is a partially enlarged view showing a part of the moving mechanism for moving the movable support member and a manual adjustment mechanism used when processing a display substrate having a different aspect ratio. 図11は本発明の実施例のそのほかの形態として用いる、ベース面吸着溝部の外観を示す斜視図である。Figure 11 is used as the other forms of embodiment of the present invention, is a perspective view showing an appearance of the base surface adsorption grooves.

以下、本発明の一実施形態を図1から図11を用いて説明する。
図1は、本発明の一実施形態である表示基板モジュール組立ライン1を、図2は、その基板の搬送装置2の基本構成を示した図である。
Hereinafter, an embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a view showing a basic configuration of a display board module assembly line 1 according to an embodiment of the present invention, and FIG.

図1の装置は、基板Pを保持する基板保持手段12と、その基板を隣接する実装処理作
業装置の位置まで搬送するための搬送アーム11からなる搬送装置によって、図中左から右に向かって基板を順次搬送しながら、基板の周辺部に各種処理作業を行い、ICやTABなどの実装組立作業を行なうライン装置である。図1の装置は、まず、左側の基板長辺側の実装処理作業装置群13Lで基板長辺側の処理を行ない、基板長辺側の処理を行った後、基板を基板回転手段19で回転させ、同様な構成を有する基板短辺側の実装処理作業装置群13Sで基板短辺側の処理を行なう。基板長辺側13L及び基板短辺側13Sにおいて、以下同一装置、同一機能については同一符号を記す。
The apparatus of FIG. 1 has a substrate holding means 12 for holding a substrate P and a transfer device 2 including a transfer arm unit 11 for transferring the substrate to the position of an adjacent mounting processing work apparatus, from left to right in the figure. This is a line apparatus that performs various processing operations on the peripheral portion of the substrate while sequentially transporting the substrate toward the substrate, and performs mounting assembly operations such as IC and TAB. The apparatus of FIG. 1 first performs processing on the long side of the substrate with the mounting processing work group 13L on the long side of the left substrate, performs processing on the long side of the substrate, and then rotates the substrate with the substrate rotating means 19. Then, processing on the short side of the substrate is performed by the mounting processing apparatus group 13S on the short side of the substrate having the same configuration. In the substrate long side 13L and the substrate short side 13S, the same symbols are used for the same devices and functions.

図1で示す基板長辺側、処理として、左から(1)基板端部のTAB貼付け部を清掃する端子クリーニング工程,(2)清掃後の基板端部に異方性導電フィルム (ACF)を貼付けるACF工程,(3)ACFを貼付けた位置に、基板配線と位置決めしてTABやICを搭載する搭載工程、(4)搭載したTABやICを加熱圧着することで、ACFにより固定する圧着工程を順次行ない、さらに基板長辺側の最後には周辺基板であるPCB基板を実装する処理作業を行なうように構成されている。
図中の14〜20は、長辺側、短辺側とも同一符号で示し、それぞれ、端子クリーニング処理作業装置14、ACF貼付処理作業装置15、TAB/IC搭載処理作業装置16,本圧着処理作業装置17及び基板回転手段19を示している。なお、PCB基板実装処理作業装置は割愛している。
1. From the left side of the long side of the substrate shown in FIG. 1, as a process, (1) a terminal cleaning process for cleaning the TAB attaching portion at the end of the substrate, (2) an anisotropic conductive film (ACF) at the end of the substrate after cleaning ACF process for pasting, (3) Mounting process for mounting TAB or IC by positioning with substrate wiring at the position where ACF is pasted, (4) Crimping fixed by ACF by heat pressing the mounted TAB or IC The process is sequentially performed, and further, a processing operation for mounting a PCB substrate as a peripheral substrate is performed at the end on the long side of the substrate.
14 to 20 in the figure are denoted by the same reference numerals on the long side and the short side, respectively, and the terminal cleaning processing work device 14, the ACF sticking processing work device 15, the TAB / IC mounting processing work device 16, and the main pressure bonding processing work, respectively. An apparatus 17 and a substrate rotating means 19 are shown. Note that a PCB substrate mounting processing work apparatus is omitted.

図2は基板Pの搬送方向であるX方向から見たA−A断面図であり、TAB/IC搭載
処理作業装置16のTAB/IC基板を搭載する搭載部16aと搬送装置2を示した図で
ある。搭載部16aは基板Pを載置する基板固定ベース20(作業辺固定台座の例)と、他の位置でTAB/IC基板IC基板を吸着し、基板固定ベースの所定の位置にそのTAB/IC基板に搭載する搭載ヘッド18とを有する。搭載ヘッド18は、例えば半導体集積回路ICを搭載したフレキシブル基板COFやTABに代表される電子部品3を吸着保持する吸着ヘッド18a、電子部品3を基板Pの搭載位置に搭載するために吸着ヘッドを昇降するシリンダ18b、シリンダを駆動するシリンダ駆動部18c、シリンダ駆動部を旋回させてIC基板を搬送するアーム18dを有する。さらに吸着ヘッド18aと対向して基板Pを挟む位置に下支え18eが設けてある。
FIG. 2 is a cross-sectional view taken along the line AA as viewed from the X direction, which is the transport direction of the substrate P, and shows the mounting portion 16a for mounting the TAB / IC substrate of the TAB / IC mounting processing work device 16 and the transport device 2. It is. The mounting portion 16a adsorbs the TAB / IC substrate IC substrate at a substrate fixing base 20 (an example of a working side fixing base) on which the substrate P is placed and other positions, and the TAB / IC at a predetermined position on the substrate fixing base. And a mounting head 18 mounted on the substrate. The mounting head 18 includes, for example, a suction head 18a for sucking and holding an electronic component 3 represented by a flexible substrate COF or TAB on which a semiconductor integrated circuit IC is mounted, and a suction head for mounting the electronic component 3 on the mounting position of the substrate P. It has a cylinder 18b that moves up and down, a cylinder drive unit 18c that drives the cylinder, and an arm 18d that turns the cylinder drive unit to transport the IC substrate. Further, a lower support 18e is provided at a position facing the suction head 18a and sandwiching the substrate P.

一方、搬送装置2は、搬送アーム11と基板保持手段12を有している。基板保持手段12は、図1に示すように基板両側に設けた両側保持部12Aと両側保持部を連結し処理作業装置側に設けられた連結保持部12Bを有する。基板の処理作業箇所である基板固定ベース20へ基板Pが搬送されてくると、前記両側保持部12Aと連結保持部12Bは、
基板の撓みを減少して基板Pを載置することができる。一方、搬送アーム11は前記両側保持部12Aの間を上下するに搬送アーム11A(搬送移動台座の例)と、図2(a)(b)に示すように基板Pを前記基板保持手段12に載置又は離間するために前記搬送アーム11Aを昇降させる基板搬送アーム昇降部11Bと、搬送アーム11をガイドレール11C上で搬送方向に移動させるスライダ11Dを有する。
On the other hand, the transfer device 2 includes a transfer arm unit 11 and a substrate holding unit 12. As shown in FIG. 1, the substrate holding means 12 has a holding portion 12B provided on the processing work apparatus side by connecting the holding portions 12A on both sides of the substrate and the holding portions on both sides. When the substrate P is transferred to the substrate fixing base 20 which is a processing work place of the substrate, the both-side holding unit 12A and the connection holding unit 12B are
The board | substrate P can be mounted reducing the bending of a board | substrate. On the other hand, the transfer arm 11A to the transport arm 11 moves up and down between the two side holding portion 12A (the example of the transfer movement the seat), FIGS. 2 (a) the substrate P as shown in (b) the substrate holding means 12置又mounting to have a substrate transfer arm lifting unit 11B for raising and lowering the transport arm 11A for separating the slider 11D that are moved in the transport direction the carrier arm 11 a on the guide rail 11C.

このような本実施形態の搬送装置2によれば、基板Pを基板固定ベース上に直接搬送できるので、搬送後、基板Pを基板固定ベースに移動させるステップが必要なく、処理時間の短縮を図ることでできる。   According to the transfer apparatus 2 of this embodiment, since the substrate P can be directly transferred onto the substrate fixing base, there is no need to move the substrate P to the substrate fixing base after the transfer, thereby shortening the processing time. It can be done.

このような構造における搬送方法を、図1に示す基板PをACF貼付処理作業装置15
からTAB/IC搭載処理作業装置16に搬送する場合を例に説明する。搬送アーム11
は、ACF貼付処理作業装置15の場所で、図2(b)に示すように基板Pを搬送アーム
11Aにより保持し、基板搬送部材昇降手段11Bにより上昇させ、基板Pを両側保持部
12A、連結保持部12Bから離間させる。その後、基板Pを上昇保持したままで、スラ
イダ11Dにより基板PをTAB/IC搭載処理作業装置16の位置まで搬送する。この
とき、搬送アーム11Aは、2つの基板保持手段12間を移動する。TAB/IC搭載処
理作業装置16では、基板Pを下降させ、基板保持手段12に載置(図2(b))し、搬
送アーム11Aを基板Pから離間させる。そして、基板PはTAB/IC搭載処理作業装
置16で搭載作業が処理される。この搭載作業中に、搬送アーム11Aは、基板を保持していない姿勢を保持し、次の基板を搬送するためにACF貼付処理作業装置15まで戻る。上記一連動作は、組立ライン1に作業中のすべての基板Pに対して同期して行なわれ、全ての作業が同期して搬送され、処理が行なわれることになる。
In the transport method in such a structure, the substrate P shown in FIG.
Will be described as an example of transporting from TAB / IC to the TAB / IC mounting processing work device 16. Transfer arms 11
As shown in FIG. 2 (b), the substrate P is held by the transfer arm 11A and lifted by the substrate transfer member lifting / lowering means 11B at the location of the ACF sticking processing work device 15, and the substrate P is connected to both side holding portions 12A. Separated from the holding portion 12B. Thereafter, the substrate P is transported to the position of the TAB / IC mounting processing work device 16 by the slider 11D while the substrate P is held upward. At this time, the transfer arm 11 </ b> A moves between the two substrate holding means 12. In the TAB / IC mounting processing apparatus 16, the substrate P is lowered and placed on the substrate holding means 12 (FIG. 2B), and the transfer arm 11A is separated from the substrate P. The substrate P is processed for mounting by the TAB / IC mounting processing device 16. During this mounting operation, the transfer arm 11A holds the posture not holding the substrate, and returns to the ACF attachment processing work device 15 to transfer the next substrate. The above series of operations is performed in synchronism with all the substrates P in operation on the assembly line 1, and all operations are conveyed and processed in synchronism.

図1、図2に示す表示基板モジュール組立ライン、TAB/IC搭載処理作業装置及び搬送装置は一実施形態であって、特に、どのような実装処理作業装置を連ねる必要があるかは、組立作業を行なう表示基板モジュール構成に依存することは言うまでもない。   The display substrate module assembly line, the TAB / IC mounting processing work device, and the transfer device shown in FIGS. 1 and 2 are one embodiment. In particular, what mounting processing work devices need to be connected depends on the assembly work. Needless to say, it depends on the configuration of the display substrate module that performs the above.

以下、本発明の最も特徴とする基板固定ベース20を前述したTAB/IC搭載部品作業処理装置16を例に説明する。   Hereinafter, the TAB / IC mounting component work processing apparatus 16 described above will be described as an example of the board fixing base 20 which is the most characteristic of the present invention.

図3(a)は、搬送装置2によって、基板Pの反り、撓みを考慮しながら、搭載装置の
基板固定ベース20よりH分高い位置で基板を搬送して、直接基板Pを基板固定ベース20上に搬送した図である。図3では理解しやすくするため基板Pは輪郭を実線で示すに留め、面内を透明に示すことで搬送固定の機構部を表記した。図3(b)は、図3(a)に示した位置から、図2に示す搬送アーム昇降部11Bによって搬送アーム11Aを降下させて、基板Pを基板固定ベース20及び基板保持手段12に載置した図である。基板保持手段12は、両側に両側保持部12Aを有し、それらを基板固定ベース20側で連結する連結保持部12Bとで構成されているので、基板固定ベース20と共に安定して基板Pを保持可能である。このとき、搬送アーム11の幅は基板保持手段12の構成部品である連結保持部12Bと両側支持部12Aから形作られる凹み形状の幅より小さい。このため、搬送アーム11Aは、基板保持手段12に基板Pを移し変えたのち、下方に降下することで、基板保持手段12の下側を潜り抜けられるようになる。
FIG. 3A shows that the substrate is transferred by the transfer device 2 at a position higher by H than the substrate fixing base 20 of the mounting device while taking into account warpage and deflection of the substrate P, and the substrate P is directly transferred to the substrate fixing base 20. It is the figure conveyed above. In FIG. 3, for ease of understanding, the outline of the substrate P is shown by a solid line, and the in-plane transparent portion is shown as a transport and fixing mechanism. 3B, the transfer arm 11A is lowered from the position shown in FIG. 3A by the transfer arm elevating unit 11B shown in FIG. 2, and the substrate P is placed on the substrate fixing base 20 and the substrate holding means 12. FIG. The substrate holding means 12 has both side holding portions 12A on both sides and is composed of a connection holding portion 12B for connecting them on the substrate fixing base 20 side, so that the substrate P is stably held together with the substrate fixing base 20. Is possible. The width of the transfer arm 11 A is smaller than the width of the recessed shape is shaped from the connection holding section 12B and both side support portion 12A which is a component of a substrate holding means 12. For this reason, the transfer arm 11 </ b> A can move under the substrate holding unit 12 by moving down the substrate P to the substrate holding unit 12 and then descending downward.

基板固定ベース20及び搬送保持手段12に載置された基板は、搬送アーム11Aを調節してアライメントを行なう。そのアライメント終了後、後述する基板平坦矯正処理を行ない、電子部品3の実装処理作業を実施する。上記においては、基板載置後、アライメントを実施したが、基板Pをある程度降下させ、基板の基板固定ベース20との摺動を避けるために非接触の状態でアライメントし、その後、基板を載置してもよい。
または、前記の降下後のアライメント動作時に過大な摺動を生じないよう、基板固定ベース20の表面に設けた吸着部から若干の圧縮空気を噴出し、摺動を軽減することも有効である。
The substrates placed on the substrate fixing base 20 and the transport holding means 12 are aligned by adjusting the transport arm 11A. After the alignment is completed, a substrate flattening correction process, which will be described later, is performed, and an electronic component 3 mounting process work is performed. In the above, alignment was performed after placing the substrate. However, the substrate P is lowered to some extent and aligned in a non-contact state in order to avoid sliding of the substrate with the substrate fixing base 20, and then the substrate is placed. May be.
Alternatively, it is also effective to reduce the sliding by ejecting some compressed air from the suction portion provided on the surface of the substrate fixing base 20 so that excessive sliding does not occur during the alignment operation after the lowering.

なお、図10(a)に示したように、前記両側保持部12Aは前記連結保持部12Bに斜め方向に移動可能に設置されている。このため、異なる基板Pの処理を行う際に、斜め方向の移動機構12Cにより自動的に必要な基板寸法に調整される。ただし表示基板には縦横比が通常と異なる基板もあるため、手動にて縦横比の設定を変更できる縦横比調整機構12Dも有する。縦横比調整機構12Dは本実施例では簡便のためネジ締めによる摺動機構としたが、縦横比を頻繁に変更する用途では、本部分も自動調整可能とすることもよい。この場合は、縦横比の変更時に段取り換え作業を要しないので、頻繁な品種変更を行う場合に、迅速に設備の再立ち上げが可能となる。   In addition, as shown to Fig.10 (a), the said both-side holding | maintenance part 12A is installed in the said connection holding | maintenance part 12B so that the movement to the diagonal direction is possible. For this reason, when processing different substrates P, the substrate size is automatically adjusted to the required substrate size by the oblique movement mechanism 12C. However, since some display substrates have different aspect ratios, the display substrate also includes an aspect ratio adjustment mechanism 12D that can manually change the aspect ratio setting. In the present embodiment, the aspect ratio adjusting mechanism 12D is a sliding mechanism by screw tightening for the sake of simplicity. However, in applications where the aspect ratio is frequently changed, this portion may be automatically adjustable. In this case, the setup change operation is not required when changing the aspect ratio, so that the equipment can be quickly restarted when frequent product changes are made.

図4(a)は、図3に示す基板固定ベース20の左側の一部の拡大図である。基板固定ベース20は、所定の面精度を有し、基板Pとの接触面21aを具備するベース本体21と、その接触面に設けられた格子状の基板吸着用のベース面吸着溝部22と、前記ベース面吸着溝部と交互に設けられた基板引込み用の基板吸着パッド23と、及び前記ベース面吸着溝部22と基板吸着パッド23とをそれぞれ負圧にするための吸着溝用空気孔24a、パッド用空気孔24bを有する。図3に示す本実施例は、前記ベース面吸着溝部22が13個、基板吸着パッド23が12個設けてある。また、搬送アーム11Aの基板搬送面には、搬送時における基板Pの位置ズレ防止用のゴム状部材でできた吸着部11Aaを設けている。これらの基板吸着パッド23およびベース面吸着溝部22を裏面で接続する配管系(図示せず)は裏面蓋21bで覆われている。   FIG. 4A is an enlarged view of a part of the left side of the substrate fixing base 20 shown in FIG. The substrate fixing base 20 has a predetermined surface accuracy, and includes a base main body 21 having a contact surface 21a with the substrate P, a lattice-like base surface adsorption groove 22 provided on the contact surface, and Substrate suction pads 23 for retracting the substrate provided alternately with the base surface suction groove portions, suction groove air holes 24a for making the base surface suction groove portions 22 and the substrate suction pads 23 negative pressure, and pads, respectively. Air holes 24b. In this embodiment shown in FIG. 3, 13 base surface suction grooves 22 and 12 substrate suction pads 23 are provided. Further, an adsorption portion 11Aa made of a rubber-like member for preventing the positional deviation of the substrate P during transportation is provided on the substrate transportation surface of the transportation arm 11A. A piping system (not shown) for connecting the substrate suction pad 23 and the base surface suction groove portion 22 on the back surface is covered with a back surface lid 21b.

図4(b)は、前記の格子状の基板吸着用のベース面吸着溝部22の変形例として、前記基板吸着パッド23の近傍まで広げることで、平坦化吸着時の吸着力を高めた例である。   FIG. 4B shows an example in which the suction force at the time of flattening suction is increased by expanding the lattice-like substrate suction base surface suction groove 22 to the vicinity of the substrate suction pad 23 as a modified example. is there.

さらには、ベース面吸着溝部22は図11に示すように、丸型溝とすることも可能である。この場合は、基板吸着パッド23とベース面吸着溝部22の概略形状が同等にできるため、基板Pに対する吸着影響が均一になることが期待できる。   Furthermore, as shown in FIG. 11, the base surface adsorption groove 22 can be a round groove. In this case, since the schematic shapes of the substrate suction pad 23 and the base surface suction groove 22 can be made equal, it can be expected that the suction effect on the substrate P is uniform.

図5は、ベース面吸着溝部及び基板吸着パッドを負圧にするための負圧システム25を模式的に示したものである。負圧システム25は、負圧にするための排気装置25a、安定して排気するためのレギレータ25b、ベース面吸着溝部22、基板吸着パッド23の系統のうち負圧にする対象を選択するそれぞれの系統に設けたソレノイド弁25c1、25c2、各系統が正常に負圧を得られているかをチェックする圧力スイッチ25D1、25D2、基板吸着パッド23a〜23lのそれぞれに設けられ、空気の逆流を防止するチェック弁25e1〜25e12(図3には表示せず)、吸着溝用空気孔24a、パッド用空気孔24bを含む配管系25f及びこれ等を制御する制御装置30からなる。本実施例ではコスト削減のためベース面吸着溝部22にはチャック分25eを設けていないが、コストが許せば設けることが吸着力の安定化に有効であることは当然である。さらにベース面吸着溝部22の溝幅および溝深さを狭くすることで、吸着しない部分の減圧のロスを低減できることは当然である。   FIG. 5 schematically shows a negative pressure system 25 for setting the base surface suction groove and the substrate suction pad to a negative pressure. Each of the negative pressure systems 25 selects an object to be negative pressure from among a system of an exhaust device 25a for negative pressure, a regulator 25b for stable exhaust, a base surface suction groove 22 and a substrate suction pad 23. Solenoid valves 25c1 and 25c2 provided in the system, pressure switches 25D1 and 25D2 that check whether each system is normally obtaining negative pressure, and check that prevents backflow of air, respectively, provided on the substrate suction pads 23a to 23l It includes a valve system 25f including valves 25e1 to 25e12 (not shown in FIG. 3), a suction groove air hole 24a, a pad air hole 24b, and a control device 30 for controlling them. In this embodiment, the chucking portion 25e is not provided in the base surface suction groove portion 22 for cost reduction, but it is natural that providing the cost is allowed to stabilize the suction force if the cost permits. Furthermore, by reducing the groove width and groove depth of the base surface adsorption groove portion 22, it is natural that the loss of decompression of the portion that is not adsorbed can be reduced.

このような機構を有する基板固定ベース20と、負圧システム25を制御して、載置された基板Pに対して平面度を高くする平坦矯正処理を行なう。ただ単に基板Pを基板固定ベース20に置いただけでは、基板Pにおける端部の反りを補正できない。本実施形態の基本的な考え方は、複数(12個)の基板吸着パッド23で基板を強制的に引き込むことによって、基板の反りを解消し平面度を上げる。その後、13個のベース面吸着溝部22と共に、基板の処理作業中、負圧で基板を安定して保持する。前記基板の引込量は、基板Pの底面がベース本体21の接触面21aと同一面となるような量が望ましい。そこで、基板Pを引き込むために、基板吸着パッド23は、負圧になると縮み、負圧を解除したときに元の状態に復元する引込復元機能を実現する引込復元手段を有する。また、基板吸着パッド23は、さらに基板を載置したときの基板のうねりや反り等の歪に対する自己回復力に対応するために、基板Pを吸着する基板吸着部を少なくとも基板固定ベース20の長手方向に柔軟性を持たせて移動させ、うねりや反りなどの歪を補正する機能を実現する歪補正機能手段を有する。また、前記引込量を制御する制御手段を備えている。   The substrate fixing base 20 having such a mechanism and the negative pressure system 25 are controlled to perform a flattening process for increasing the flatness of the substrate P placed. If the substrate P is simply placed on the substrate fixing base 20, the warp of the end portion of the substrate P cannot be corrected. The basic idea of this embodiment is to forcibly pull the substrate with a plurality (12) of the substrate suction pads 23 to eliminate the warp of the substrate and increase the flatness. Thereafter, together with the 13 base surface suction grooves 22, the substrate is stably held at a negative pressure during the substrate processing operation. The substrate pull-in amount is preferably such that the bottom surface of the substrate P is flush with the contact surface 21 a of the base body 21. Therefore, in order to pull in the substrate P, the substrate suction pad 23 has a pull-in restoration means that realizes a pull-in restoration function that contracts when the negative pressure is reached and restores the original state when the negative pressure is released. Further, the substrate suction pad 23 further includes at least a substrate suction portion that sucks the substrate P in order to cope with a self-recovery force against distortion such as waviness or warpage of the substrate when the substrate is placed. It has a distortion correction function means that realizes a function of correcting distortion such as swell and warp by moving the direction with flexibility. Further, a control means for controlling the pull-in amount is provided.

図6は、上記2つの手段を実現する基板吸着パッド23の第1の実施例23Aと、引込復元機能における基板Pの基本的な動きを示す断面図である。おのおのは上から順に基板Pの吸着開始直後、吸着進行中、吸着完了時を示す。(a)は基板吸着パッド23に横方向移動機能を有しない通常の吸盤を用いた例であり、湾曲した基板Pを吸着した場合、湾曲が平坦化するときの横方向の誤差を吸盤が吸収できないため、最終的に中央部に皺状に強められた湾曲が残る。そこで、真空吸着パッド23に横方向移動機能を付与することで(b)に示すごとく、湾曲した基板Pの平坦化に従い、横方向の移動を真空吸着パッド23が吸収するため、基板Pは最終的に基板固定ベース20に密着する。   FIG. 6 is a cross-sectional view showing the basic movement of the substrate P in the first embodiment 23A of the substrate suction pad 23 realizing the above two means and the pull-in restoration function. Each of them shows, in order from the top, immediately after the start of suction of the substrate P, during the progress of suction, and when the suction is completed. (A) is an example in which a normal suction cup having no lateral movement function is used for the substrate suction pad 23. When the curved substrate P is sucked, the suction cup absorbs a lateral error when the curvature is flattened. Because it is not possible, the curved portion strengthened like a bowl finally remains in the center. Therefore, by providing the vacuum suction pad 23 with the lateral movement function, as shown in (b), the horizontal suction is absorbed by the vacuum suction pad 23 in accordance with the flattening of the curved substrate P. In particular, it closely contacts the substrate fixing base 20.

図7は、上記歪補正機能における基板吸着パッド23と基板Pの基本的な動き示した図である。図7では基板Pは薄いためハッチングは省略してある。図8は、前述した基本的な処理にその他のフローも加味した全体的な処理フローを示す図である。   FIG. 7 is a diagram showing the basic movement of the substrate suction pad 23 and the substrate P in the distortion correction function. In FIG. 7, since the substrate P is thin, hatching is omitted. FIG. 8 is a diagram showing an overall processing flow in which other flows are added to the basic processing described above.

基板吸着パッド23による引込復元力機能を、全体的な処理フローと併せて説明する。図6において、基板Pを基板固定ベース20の載置位置まで搬送し(図6(b)吸着開始時、図8ステップ(1))、その後、基板Pを基板固定ベース20に載置する(図6(b)吸着進行中、図8ステップ(2))。TAB/IC搭載処理作業装置16は、基板Pと搭載部品(例えば、図2に示すIC基板3)とのアライメントを行なう。アライメントは、基板固定ベース20あるいは搬送アーム11Aの姿勢を制御することによって行なう(図9ステップ(3))。アライメント終了後、負圧システム25は、12個の基板吸着パッド23a〜23lを負圧にし、図6(b)吸着進行中の状態を維持しようとする復元力に打勝って、基板Pを基板固定ベース20の接触面21aである基準面まで強制的に引込む(図6(b)吸着完了時、図8ステップ(4))。   The pull-in restoring force function by the substrate suction pad 23 will be described together with the overall processing flow. In FIG. 6, the substrate P is transported to the mounting position of the substrate fixing base 20 (FIG. 6B, at the start of suction, FIG. 8 step (1)), and then the substrate P is mounted on the substrate fixing base 20 ( FIG. 6 (b) (Step (2) in FIG. 8) while the adsorption is in progress. The TAB / IC mounting processing work device 16 performs alignment between the substrate P and mounting components (for example, the IC substrate 3 shown in FIG. 2). The alignment is performed by controlling the posture of the substrate fixing base 20 or the transfer arm 11A (step (3) in FIG. 9). After the alignment is completed, the negative pressure system 25 sets the twelve substrate suction pads 23a to 23l to a negative pressure and overcomes the restoring force to maintain the state in which the suction is in progress in FIG. Forcibly retracts to the reference surface which is the contact surface 21a of the fixed base 20 (FIG. 6B, when the suction is completed, step (4) in FIG. 8).

この際、13個のベース面吸着溝22a〜22mにより基板Pの吸着が行われ、基板Pの固定保持が一層確実になる。ベース面吸着溝22による吸着は、基板Pが基板固定ベース20に近接した状態で有効なため、基板吸着開始時には有効性が低い。よってベース面吸着溝22の減圧を、基板吸着パッド23の減圧に比べ、一定時間遅くすることで、基板Pの吸着保持を滑らかに行うことができる。
この場合の引込み力KPは式(i)で表現できるため、設計が容易になる。
KP=(基板吸着部の吸着面積)×負圧力−バネ力 (i)
また、復元力RPは以下の式で設計できる。
RP=バネ力+ダイヤフラムバネ力−吸着パッド質量×重力加速度 (ii)
また、その引込量Khは、予め対象とする基板に対して負圧と引込量の関係を求めて、その関係に基づき制御装置30により制御される。
At this time, the 13 pieces of the base surface suction groove 22a~22m adsorption of the substrate P is performed, fixed holding of the substrate P becomes more reliable. Adsorption by the base surface suction grooves 22, since the substrate P is enabled in close proximity to the board fixing base 20, is less effective at the start substrate adsorption. Thus the decompression of the base surface suction grooves 22, compared with the reduced pressure of the substrate suction pads 23, by slowing certain time, it is possible to perform smoothly the suction holding of the substrate P.
In this case, the pulling force KP can be expressed by the equation (i), so that the design becomes easy.
KP = (Suction area of the substrate suction part) × Negative pressure−Spring force (i)
Further, the restoring force RP can be designed by the following equation.
RP = spring force + diaphragm spring force−adsorption pad mass × gravity acceleration (ii)
The pull-in amount Kh is obtained in advance by obtaining a relationship between the negative pressure and the pull-in amount with respect to the target substrate, and is controlled by the control device 30 based on the relationship.

基板Pを引込み後、負圧システム25は13個のベース面吸着溝部22a〜22iも負圧にし、基板吸着パッド23と共に基板Pの平面度は500mmスパンで50μmに維持する(図8ステップ(5))。この平面度を維持した状態で電子部品3の搭載処理作業を行なう(図8ステップ(6))。処理作業終了後、ベース面吸着溝部22、基板吸着パッド23の負圧を解除((図9ステップ(7))し、基板を搬送アーム11Aに搭載し、搬送((図8ステップ(8))する、基板一枚に対する一連の処理を終了する。ステップ(8)において、基板吸着パッド23は、連結バネ23A3のバネ力である復元力により図7(a)の状態に戻る。従って、復元力は、基板吸着パッド23の持つ自重に打勝つ程度の弱いものでよい。   After drawing the substrate P, the negative pressure system 25 also applies negative pressure to the 13 base surface suction groove portions 22a to 22i, and the flatness of the substrate P together with the substrate suction pad 23 is maintained at 50 μm over a 500 mm span (step (5 in FIG. 8). )). The electronic component 3 is mounted while maintaining the flatness (step (6) in FIG. 8). After the processing operation is completed, the negative pressure of the base surface suction groove portion 22 and the substrate suction pad 23 is released (step (7) in FIG. 9), and the substrate is mounted on the transfer arm 11A and transferred ((step (8) in FIG. 8)). In step (8), the substrate suction pad 23 returns to the state shown in Fig. 7A due to the restoring force that is the spring force of the connecting spring 23A3. May be weak enough to overcome the dead weight of the substrate suction pad 23.

この際、ベース面吸着溝部22の負圧を、基板吸着パッド23の減圧に比べ、先に解除することで、基板Pの反りやたわみを一気に開放するのではなく、徐々に開放することができ、基板吸着パッド23の有する粘弾性による内部損失を有効に用い、基板Pに過大な振動や衝撃を与えずに、基板Pの吸着を解除できる。   At this time, by removing the negative pressure of the base surface suction groove portion 22 first as compared with the reduced pressure of the substrate suction pad 23, the warp and the deflection of the substrate P can be gradually released rather than released at once. The internal loss due to the viscoelasticity of the substrate suction pad 23 can be used effectively, and the adsorption of the substrate P can be released without giving excessive vibration or impact to the substrate P.

本実施形態によれば、基板固定ベースに強制的に基板を引き込むことができる基板吸着パッドを用いることで、基板の反りを補正し、基板を基板固定ベースに高精度に保持できる実装処理作業装置または実装処理作業方法を提供することができる。
また、本実施形態によれば、前記基板吸着パッドにその基板吸着部が横方向に柔軟性を持たせることで、基板のうねりや反りなど解消でき、基板を基板固定ベースに高精度に保持できる実装処理作業装置または実装処理作業方法を提供することができる。
さらに、前記基板吸着パッド23A他、前記基板固定ベースにベース面吸着溝部を設けることで、本実施形態によれば、基板を基板固定ベースに安定して保持できる実装処理作業装置または実装処理作業方法を提供することができる。
According to the present embodiment, the mounting processing work apparatus that corrects the warping of the substrate and holds the substrate on the substrate fixing base with high accuracy by using the substrate suction pad that can forcibly pull the substrate into the substrate fixing base. Alternatively, an implementation processing work method can be provided.
In addition, according to the present embodiment, the substrate suction portion of the substrate suction pad is flexible in the lateral direction, so that the swell or warpage of the substrate can be eliminated, and the substrate can be held on the substrate fixing base with high accuracy. A mounting processing work device or a mounting processing work method can be provided.
Furthermore, according to the present embodiment, by providing a base surface suction groove on the substrate fixing base in addition to the substrate suction pad 23A, the mounting processing work apparatus or mounting processing work method can stably hold the substrate on the substrate fixing base. Can be provided.

また、さらに、本実施形態によれば、基板固定ベースに基板を高精度に保持できる吸着パッドを提供することができる。
さらに、本実施形態によれば、上記記載の実装処理作業装置または実装処理作業方法を有するライン構成とすることで、歩留まりの高い、あるいは稼働率の高い表示基板モジュール組立ラインを提供することができる。
Furthermore, according to the present embodiment, it is possible to provide a suction pad that can hold the substrate with high precision on the substrate fixing base.
Furthermore, according to the present embodiment, a display substrate module assembly line having a high yield or a high operating rate can be provided by adopting a line configuration having the mounting processing work apparatus or the mounting processing work method described above. .

図9は、今まで説明してきた基板吸着パッド23の他の実施例を示したものである。図
9(a)に示す基板吸着パッド23Bは、基板吸着パッド23Aと同様に、引込復元力機
能、歪補正機能を内部に設けた圧縮バネで実現させたタイプである。基板吸着パッド23
Bは、大別してラッパ状の基板吸着部23Bkと、台座部23Bと、台座部23Bcと基板吸着部Bkとを連結する連結部23Bgからなる。前記連結部23Bgは、前記基板吸着部Bkと台座部Bcの間にバネ定数の低いコイル状の圧縮バネ23Baを設けている。また、基板吸着パッド23Bは、全体を上下には伸縮性があり、左右には柔軟性のある軟質の薄いゴム或いは軟質の薄い樹脂で被覆した構造を有する。具体的に被覆材として導電性シリコンゴムを用いている。
FIG. 9 shows another embodiment of the substrate suction pad 23 described so far. A substrate suction pad 23B shown in FIG. 9A is a type in which a pull-in restoring force function and a distortion correction function are realized by a compression spring provided therein, similarly to the substrate suction pad 23A. Substrate suction pad 23
B is a connecting part 23Bg for connecting the horn-shaped substrate attracting portion 23Bk broadly includes a base portion 23B c, and a base portion 23 Bc and the substrate attracting portion Bk. In the connecting portion 23 Bg, a coiled compression spring 23Ba having a low spring constant is provided between the substrate adsorption portion Bk and the pedestal portion Bc. The substrate suction pad 23B has a structure in which the whole is stretchable in the vertical direction and is covered with flexible soft thin rubber or soft thin resin on the left and right. Specifically, conductive silicon rubber is used as the covering material.

また、台座部23Bcは、基板吸着パッド23Aと同様に、前記基板吸引部23Bkに連通した吸引通路を有する固定吸引孔23Be、基板吸着パッド23Bを基板固定ベース20に固定するための固定板23Bhを有する。また固定板23Bhは前記固定吸引孔Beに設けたメネジによりオネジ23Bfをねじ締め固定する。前記低いバネ定数とは、基板吸着パッド23Aと同様に、基板吸着パッド23Bの持つ自重に打勝つ程度の弱いものでよい。
本実施例においても、横方向への自由度を持ったままパネルの吸着と高い引込力の発生が可能となり、引込復元力機能、歪補正機能を実現できる。
Similarly to the substrate suction pad 23A, the pedestal portion 23Bc includes a fixed suction hole 23Be having a suction passage communicating with the substrate suction portion 23Bk, and a fixing plate 23Bh for fixing the substrate suction pad 23B to the substrate fixing base 20. Have. The fixing plate 23Bh is fastened and fixed to the male screw 23Bf with a female screw provided in the fixed suction hole Be. The low spring constant may be weak enough to overcome the weight of the substrate suction pad 23B, like the substrate suction pad 23A.
Also in this embodiment, the panel can be adsorbed and a high pulling force can be generated with a degree of freedom in the lateral direction, and a pulling restoring force function and a distortion correcting function can be realized.

図9(b)(c)は、引込復元力機能、歪補正機能をダイヤフラム構造に持たせた基板
吸着パッド23の実施例23C、23Dである。基板吸着パッド23C、23Dは、大別
して、先端にラッパ状のあるいは階段状の基板吸着部23Ca、23Da、台座部と、台座部と基板吸着部と連結する連結部23C9、23D9からなる。基板吸着部は吸着孔23Ci、23Diを有する。台座部は、吸着孔23Ce、23Deを有し、基板吸着パッド23C、23Dを前記基板固定ベース20に固定するための固定部23Cc、23Dc下部に設けた固定板23Ch、23Dh及び前記固定板を介して基板吸着パッド23C、23Dを基板固定ベース20に固定するナット23Cf、23Dfにより固定される。前記連結部23C9、23D9は、前記基板吸着部の下部周囲と前記固定部の上部周囲と連結するダイヤフラム23C3、または蛇腹状の軟弱部分をし、これらと台座部と、基板吸着部23Ca、23Daとで真空空隙部を形成する。そのダイヤフラムの構造が基板吸着パッド23CではU溝型であり、基板引込用吸着パッ23Dではジャバラ溝型である。本実施例ではダイヤフラム23Ca、23Daの持つ縦方向の伸縮性、及び横方向の柔軟性により、引込復元力機能、歪補正機能を実現できる。
FIGS. 9B and 9C show Examples 23C and 23D of the substrate suction pad 23 having a diaphragm structure having a pull-in restoring force function and a distortion correction function. The substrate suction pads 23C and 23D are roughly divided into trumpet-like or step-like substrate suction portions 23Ca and 23Da at the tip, a pedestal portion, and connecting portions 23C9 and 23D9 that connect the pedestal portion and the substrate suction portion. The substrate suction portion has suction holes 23Ci and 23Di. Pedestal, the adsorption hole 23Ce, have 23De, substrate suction pads 23C, the fixed portion 23Cc for fixing 23D to the substrate fixing base 20, the fixing plate 23Ch provided in the lower part of 23Dc, the 23Dh and the fixed plate The substrate suction pads 23C and 23D are fixed by the nuts 23Cf and 23Df for fixing the substrate suction pads 23C and 23D to the substrate fixing base 20. The connecting portions 23C9 and 23D9 are a diaphragm 23C3 that connects the lower periphery of the substrate suction portion and the upper periphery of the fixed portion, or a bellows-like soft portion, and these, the pedestal portion, and the substrate suction portions 23Ca and 23Da. And form a vacuum gap. Its structure of the diaphragm is U-groove type in the substrate suction pad 23C, a suction pad bellows grooved in 23D substrate attraction. In the present embodiment, the retracting force function and the distortion correction function can be realized by the longitudinal stretchability and the lateral flexibility of the diaphragms 23Ca and 23Da.

以上説明した3つの実施例における基板吸着パッドによれば、横方向への自由度を持ったままパネルの吸着と高い引込力の発生が可能となり、基板固定ベースに基板Pを高精度に保持できる吸着パッドを提供することができる。
また、以上説明した3つの実施例における基板吸着パッドを、基板固定ベースに用いることで、基板固定ベースに強制的に基板を引き込むことができ、基板を基板固定ベースに高精度に保持できる実装処理作業装置または実装処理作業方法を提供することができる。
さらに、以上説明した3つの実施例における基板吸着パッドを、基板固定ベースに用いることで、基板のうねりや反りなどの歪を解消でき、基板を基板固定ベースに高精度に保持できる実装処理作業装置または実装処理作業方法を提供することができる。
According to the substrate suction pads in the three embodiments described above, the panel can be sucked and a high pull-in force can be generated with a degree of freedom in the lateral direction, and the substrate P can be held on the substrate fixing base with high accuracy. A suction pad can be provided.
In addition, by using the substrate suction pads in the three embodiments described above for the substrate fixing base, the substrate can be forcibly drawn into the substrate fixing base, and the substrate can be held on the substrate fixing base with high accuracy. A working device or a mounting processing work method can be provided.
Furthermore, by using the substrate suction pads in the three embodiments described above for the substrate fixing base, it is possible to eliminate distortions such as waviness and warping of the substrate, and to hold the substrate on the substrate fixing base with high accuracy. Alternatively, an implementation processing work method can be provided.

また、上記記載の実装処理作業装置または実装処理作業方法を有するライン構成とすることで、歩留まりの高い表示基板モジュール組立ラインまたは表示基板モジュール組立方法を提供することができる。
上記実施形態では、ベース面吸着溝部22と基板吸着パッド23とを併用したが、基板吸着パッド23のみで構成してもよい。
また、上記実施形態では、すべて歪補正機能を持たせたが、基板を載置したときに、うねりや反りなどの歪が無視できる程度に小さければ、横方向あるいは基板のスライド方向の剛性を高くしてもよい。
In addition, the display substrate module assembly line or the display substrate module assembly method having a high yield can be provided by adopting a line configuration having the mounting processing work apparatus or the mounting processing work method described above.
In the above embodiment, the base surface suction groove portion 22 and the substrate suction pad 23 are used in combination, but the substrate suction pad 23 alone may be used.
Further, in the above-described embodiment, all of them have a distortion correction function, but when the substrate is placed, if the distortion such as undulation and warpage is small enough to be ignored, the rigidity in the lateral direction or the sliding direction of the substrate is increased. May be.

1:表示基板モジュール組立ライン 2:搬送手段
3:電子部品 11:搬送アーム部
11:搬送アーム(搬送移動台座の例) 12:基板保持手段
12A:両側保持部 12B:連結保持部
13L:基板長辺側の実装処理作業装置群
13S:基板短辺側の実装処理作業装置群
14:端子クリーニング処理作業装置 15:ACF貼付処理作業装置
16:TAB/IC搭載処理作業装置 16a:搭載部
17:本圧着処理作業装置 19:基板回転手段
20:基板固定ベース(作業辺固定台座の例) 21:ベース本体
21a:接触面 22:ベース面吸着溝部
23:基板吸着パッド 23A〜D:基板吸着パッドの実施例
25:負圧システム 30:制御装置
P:基板(表示基板)。
1: Display board module assembly line 2: conveying means 3: Electronic component 11: transfer arms 11 A: transport arm (examples of conveying movement pedestal) 12: substrate holding means 12A: both side holding portion 12B: connection holding section 13L: substrate Long side mounting processing device group 13S: Substrate short side mounting processing device group 14: Terminal cleaning processing device 15: ACF sticking processing device 16: TAB / IC mounting processing device 16a: Mounting portion 17: Main crimping processing device 19: Substrate rotating means 20: Substrate fixing base (example of work side fixing base) 21: Base body 21a: Contact surface 22: Base surface suction groove 23: Substrate suction pad 23A to D: Substrate suction pad Example 25: Negative pressure system 30: Controller P: Substrate (display substrate).

Claims (13)

平面表示基板の周辺に部品を実装する実装処理作業装置において、部品を搭載する作業
辺に略平行しこれを下から支える作業辺固定台座と、前記作業辺を挟む両辺下から支え
前記作業辺固定台座に対し移動可能な両側保持部と、前記作業辺固定台座および前記両側保持部とから構成される凹み形状部分に入る寸法を有し、前記凹み形状部分に前記平面表示基板を搬送する搬送移動台座を設けたことを特徴とする実装処理作業装置。
In mounting the process working device for mounting components on the periphery of the flat display substrate, supported substantially parallel to the working sides of mounting parts and work side fixing base for supporting it from below, both sides sandwiching the working edge from the bottom,
The both sides holding part movable with respect to the working side fixing base, and having a dimension that enters a concave shape part composed of the working side fixing base and the both side holding part, and the flat display substrate is placed in the concave shape part. A mounting processing work apparatus characterized in that a transport moving base for transporting is provided.
平面表示基板の周辺に部品を実装する実装処理作業装置において、前記両辺を下から支
える両側保持部を連結する連結部を設け、この連結部と両側保持部とを相互に移動可能に
連結支持したことを特徴とする請求項1記載の実装処理作業装置。
In a mounting processing work apparatus for mounting components on the periphery of a flat display substrate, a connecting portion for connecting both side holding portions supporting the both sides from below is provided, and the connecting portion and the both side holding portions are connected and supported so as to be movable relative to each other. The mounting processing work device according to claim 1.
平面表示基板の周辺に部品を実装する実装処理作業装置において、前記作業辺固定台座
には、前記平面表示基板の吸着開始後に平面表示基板を引き込むことで平面表示基板を前記作業辺固定台座に倣わせ前記平面表示基板を吸着し平坦化する基板吸着パッドと、前記平面表示基板が前記作業辺固定台座の近傍に近接した状態から前記平面表示基板を吸着する吸着溝部を有することを特徴とする請求項1または請求項2記載の実装処理作業装置。
In a mounting processing work apparatus for mounting components around a flat display board, the flat display board is drawn into the work side fixing base after the flat display board starts to be sucked, thereby copying the flat display board to the working side fixing base. according to the substrate suction pad to planarize adsorb Align the flat display substrate, characterized in that it has a suction groove the flat display substrate adsorbs the flat display substrate from a state close to the vicinity of the working side fixed base The mounting processing work apparatus according to claim 1 or 2.
平面表示基板の周辺に部品を実装する実装処理作業装置において、複数の前記基板吸着パッドは相互に連結され同一系統の減圧系をなし、複数の前記吸着溝部は、相互に連結され同一系統の減圧系をなし、吸着開始時にはまず前記基板吸着パッドの減圧を行い、一定時間経過した後に前記吸着溝の減圧を行う負圧システムを有することを特徴とする請求項記載の実装処理作業装置。 In mounting the process working device for mounting components on the periphery of the flat display substrate, a plurality of the substrate suction pad, without a vacuum system of the same type are connected to each other, a plurality of the suction groove is the same type are connected to each other None of depressurization system, at the start adsorbing first subjected to vacuum of the substrate suction pads, mounting processing operations according to claim 3, characterized in that it has a negative pressure system for the decompression of the suction groove after the predetermined time elapses apparatus. 平面表示基板の周辺に部品を実装する実装処理作業装置において、複数の前記基板吸着パッドは相互に連結され同一系統の減圧系をなし、複数の前記吸着溝部は、相互に連結され同一系統の減圧系をなし、吸着終了時にはまず前記吸着溝の減圧を終了し、後に前記基板吸着パッドの減圧を終了する負圧システムを有することを特徴とする請求項記載の実装処理作業装置。 In mounting the process working device for mounting components on the periphery of the flat display substrate, a plurality of the substrate suction pad without a vacuum system of the same type are connected to each other, the plurality of the suction groove, of the same type are connected to each other No vacuum system, mounting processing work apparatus according to claim 3, characterized in that it has a negative pressure system to terminate the substrate vacuum suction pads after first the exit vacuum suction grooves, during suction termination. 平面表示基板の周辺に部品を実装する実装処理作業装置において、前記搬送移動台座に
は、前記平面表示基板を搬送するときに前記平面表示基板を吸着し平坦化する基板吸着パッドもしくは基板吸着溝を有することを特徴とする請求項1記載の実装処理作業装置。
In mounting the process working device for mounting components on the periphery of the flat display substrate, the transfer to the mobile base, the plane display the plane display adsorbs the substrate board suction pad or the substrate suction groove portion flattening when transporting the substrate The mounting processing work apparatus according to claim 1, further comprising:
平面表示基板の周辺に部品を実装する実装処理作業装置において、前記基板吸着パッド
は縦方向には前記平面表示基板の重量に対し前記平面表示基板を持ち上げるに足るバネ性を有する圧縮バネを有し、横方向に柔軟性の高い軟質の薄いゴム或いは軟質の薄い樹脂で前記圧縮バネを被覆することで横方向の移動柔軟性を高めたことを特徴とする請求項乃至請求項6のいずれかに記載の実装処理作業装置。
In mounting the process working device for mounting components on the periphery of the flat display substrate, the substrate suction pad is longitudinally has a compression spring having a spring property enough to lift the flat display substrate relative to the weight of the flat panel display substrate any of claims 3 to 6, characterized in that enhanced movement flexibility in the lateral direction in the transverse direction into thin thin rubber or soft highly flexible soft resin to coat the compressed spring The mounting processing work apparatus described in 1.
平面表示基板の周辺に部品を実装する実装処理作業装置において、前記基板吸着パッドは、先端に設けられた基板吸着部と、前記基板吸着部を前記作業辺固定台座に固定するための固定部と、前記固定部と前記基板吸着部とを連結する第2の連結部とを備え、前記第2の連結部は、前記基板吸着部の下部周囲と前記固定部の上部周囲を連結するダイヤフラムであり前記基板吸着部と、前記固定部と、前記ダイヤフラムとで真空空隙部を形成し、前記ダイヤフラムは、U溝型またはジャバラ溝型の構造を有することを特徴とする請求項乃至請求項6のいずれかに記載の実装処理作業装置。 In the mounting processing work apparatus for mounting components around the flat display substrate, the substrate suction pad includes a substrate suction portion provided at a tip, and a fixing portion for fixing the substrate suction portion to the work side fixing base. A second connecting part that connects the fixed part and the substrate suction part, and the second connecting part is a diaphragm that connects the lower periphery of the substrate suction part and the upper periphery of the fixed part . , said substrate attracting portion, said fixing portion, said forming a vacuum gap portion in the diaphragm, the diaphragm, claims 3 to characterized in that it has a U-groove type or bellows trench structure 6 The mounting processing work apparatus according to any one of the above. 平面表示基板の周辺に部品を実装する実装処理作業方法において、部品を搭載する作業
辺に平行した近傍を作業辺固定台座により下から支え、前記作業辺を挟む両辺を前記作業辺固定台座に対し移動可能な両側保持部により下から支えて処理作業を行い、前記平面表示基板の移動に際しては前記作業辺固定台座および前記両側保持部のなす凹み状部分に入る寸法を有し、前記凹み形状部分に前記平面表示基板を搬送する搬送移動台座により平面表示基板を移動することを特徴とする実装処理作業方法。
In a mounting processing work method for mounting components on the periphery of a flat display substrate, a work side fixing pedestal is supported from below by a work side fixing pedestal, and both sides sandwiching the work side with respect to the work side fixing pedestal performs processing operations supported from below by each side holding portion movable, upon movement of the flat display substrate has dimensions entering the formed recess shaped portion of the working side fixing base and the two side retaining portions, the recessed shaped part A mounting processing work method , wherein the flat display substrate is moved by a transfer moving base for transferring the flat display substrate.
平面表示基板の周辺に部品を実装する実装処理作業方法において、前記平面表示基板の
寸法が異なる品種を処理する場合は、前記両側保持部を移動せしめることにより、処理すべき平面表示基板の作業辺を挟む両辺を下から支えうる位置にあらかじめ設置することを
特徴とする請求項9記載の実装処理作業方法。
In the mounting processing work method for mounting components around the flat display substrate, when processing products having different dimensions of the flat display substrate, the working sides of the flat display substrate to be processed are moved by moving the both side holding portions. The mounting processing work method according to claim 9, wherein the mounting processing work method is preliminarily installed at a position where both sides sandwiching can be supported from below.
平面表示基板の周辺に部品を実装する実装処理作業方法において、処理作業開始に際してそりを有する前記平面表示基板を基板吸着パッドにより吸着し、前記作業辺固定台座に基板を引き込むことで平面表示基板を前記作業辺固定台座に倣わせ前記平面表示基板を平坦化し、しかる後に前記作業辺固定台座の吸着溝部により前記平面表示基板の保持を確実にすることを特徴とする請求項9または請求項10記載の実装処理作業方法。 In a mounting processing work method for mounting components around a flat display board, the flat display board having a warp is sucked by a board suction pad at the start of the processing work, and the flat display board is drawn by drawing the board into the work side fixing base. the so modeled after the work side fixed base and planarizing the flat display substrate, the working sides claim 9 or claim 10, wherein ensuring that the plane display holding of the substrate by the suction grooves of the fixing base thereafter Implementation processing work method. 平面表示基板の周辺に部品を実装する実装処理作業方法において、処理作業終了に際し
て前記作業辺固定台座の吸着溝部の吸着を解除し前記平面表示基板のそりを少量開放し、しかる後、前記基板吸着パッドの吸着を解除し、前記平面表示基板を前記作業辺固定台座から持ち上げることで前記平面表示基板を移動しやすくすることを特徴とする請求項11記載の実装処理作業方法。
In mounting the process working method for mounting components on a periphery of the flat display substrate, the processing work end when releasing the suction of the suction groove of the working side fixed base opened a small amount of warping of the flat display substrate, and thereafter, the substrate adsorption mounting processing work method of claim 11, wherein the releasing the suction of the pad to the planar display substrate easily move the flat display substrate by lifting from the working edge fixed base.
請求項1乃至8のいずれかに記載の実装作業処理装置と他の作業処理を行なう他作業処
理装置とからなるラインを構成する複数の作業処理装置と、前記平面表示基板を前記実装作業処理装置及び前記他作業処理装置間順次搬送する搬送装置とを有する平面表示基板モジュール組立ラインにおいて、
前記搬送装置は前記平面表示基板を前側の前記作業処理装置の前記基板固定ベース上から後側の前記作業処理装置の前記基板固定ベース上へ複数の持ち替え機構を介することなく1式の移動搭載機構により直接搬送することを特徴とする表示基板モジュール組立ライン。
A plurality of work processing devices constituting a line comprising the mounting work processing device according to any one of claims 1 to 8 and another work processing device for performing other work processing, and the flat display substrate as the mounting work processing device. And a flat display substrate module assembly line having a transfer device that sequentially transfers between the other work processing devices,
1 set moving mounting mechanism without passing through the transport device dimensional worlds said plurality to the substrate, stationary base of the work processing apparatus of the rear said flat display substrate from the substrate fixing base on the front side of the work processing apparatus mechanism Display board module assembly line, which is directly transported by
JP2009097094A 2009-04-13 2009-04-13 Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line Expired - Fee Related JP5352329B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009097094A JP5352329B2 (en) 2009-04-13 2009-04-13 Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line
CN2010101641917A CN101859041B (en) 2009-04-13 2010-04-09 Mounting processing operation device, operation method and display substrate module assembly line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009097094A JP5352329B2 (en) 2009-04-13 2009-04-13 Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line

Publications (2)

Publication Number Publication Date
JP2010249936A JP2010249936A (en) 2010-11-04
JP5352329B2 true JP5352329B2 (en) 2013-11-27

Family

ID=42945034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009097094A Expired - Fee Related JP5352329B2 (en) 2009-04-13 2009-04-13 Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line

Country Status (2)

Country Link
JP (1) JP5352329B2 (en)
CN (1) CN101859041B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102201393B1 (en) * 2020-08-10 2021-01-11 주식회사 엠플러스 Electrode automatic splicing vision adjustment device and electrode automatic splicing vision adjustment method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012103305A (en) * 2010-11-08 2012-05-31 Hitachi High-Technologies Corp Assembly device of fpd module
JP2012203304A (en) * 2011-03-28 2012-10-22 Hitachi High-Technologies Corp Fpd module assembling device
SG10201508582WA (en) * 2011-11-08 2015-11-27 Intevac Inc Substrate processing system and method
KR102197189B1 (en) * 2013-05-28 2020-12-31 주성엔지니어링(주) Apparatus for supporting substrate
TWI630059B (en) * 2015-12-25 2018-07-21 日商三星鑽石工業股份有限公司 Substrate adsorption device and workbench
KR101906250B1 (en) * 2016-12-29 2018-10-10 주식회사 어베인 Panel stage equipped with flatness control block

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0758191A (en) * 1993-08-13 1995-03-03 Toshiba Corp Wafer stage device
JPH08313856A (en) * 1995-05-18 1996-11-29 Dainippon Screen Mfg Co Ltd Substrate transporting device
JPH09134944A (en) * 1995-11-07 1997-05-20 Dainippon Screen Mfg Co Ltd Correction of position of substrate and the device
JP3782523B2 (en) * 1996-09-12 2006-06-07 オリンパス株式会社 Substrate adsorption member and apparatus
WO2001062062A2 (en) * 2000-02-17 2001-08-23 Matsushita Electric Industrial Co., Ltd. Component mounting apparatus and component mounting method, and recognition apparatus for component mount panel, component mounting apparatus for liquid crystal panel, and component mounting method for liquid crystal panel
JP2004079614A (en) * 2002-08-12 2004-03-11 Dainippon Printing Co Ltd Work processing method and its processing apparatus
JP4131164B2 (en) * 2002-11-27 2008-08-13 セイコーエプソン株式会社 Substrate fixing method and display device manufacturing method
JP4342210B2 (en) * 2003-05-16 2009-10-14 芝浦メカトロニクス株式会社 STAGE DEVICE, PASTE COATING DEVICE USING SAME, AND PASTE COATING METHOD
JP4555008B2 (en) * 2004-07-08 2010-09-29 パナソニック株式会社 Component mounting equipment
JP4652747B2 (en) * 2004-08-20 2011-03-16 パナソニック株式会社 Substrate processing equipment
JP2006201330A (en) * 2005-01-19 2006-08-03 Fujitsu Ltd Apparatus and method for manufacturing bonded substrate
JP2006259059A (en) * 2005-03-16 2006-09-28 Matsushita Electric Ind Co Ltd Panel assembling apparatus and panel assembly method
JP4854256B2 (en) * 2005-10-06 2012-01-18 株式会社日立ハイテクノロジーズ Panel processing apparatus and processing method
JP4537943B2 (en) * 2005-11-29 2010-09-08 芝浦メカトロニクス株式会社 Display device assembling apparatus and assembling method
JP5065621B2 (en) * 2006-05-26 2012-11-07 株式会社アルバック Vacuum suction pad

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102201393B1 (en) * 2020-08-10 2021-01-11 주식회사 엠플러스 Electrode automatic splicing vision adjustment device and electrode automatic splicing vision adjustment method

Also Published As

Publication number Publication date
CN101859041B (en) 2012-06-27
CN101859041A (en) 2010-10-13
JP2010249936A (en) 2010-11-04

Similar Documents

Publication Publication Date Title
JP5352329B2 (en) Mounting processing work apparatus, mounting processing work method, and display substrate module assembly line
JP4695406B2 (en) Component mounting apparatus and component mounting method
JP5589790B2 (en) Substrate transfer hand and substrate transfer robot
US9126393B2 (en) Bonding apparatus and method of bonding component on substrate using the same
TW201332769A (en) Sticking apparatus
WO2014129194A1 (en) Component mounting device, and component mounting method
JPWO2006118016A1 (en) Bonding apparatus and bonding system having the same
WO2006085462A1 (en) Component mounting apparatus and substrate transfer method
JP5002619B2 (en) Component crimping apparatus and method
JP2011047984A (en) Fpd module mounting device and method mounting the same
JP4191068B2 (en) Substrate holding apparatus, bonding material printing apparatus and printing method
JP5371590B2 (en) Mounting processing equipment and display board module assembly line
JP4661808B2 (en) Component mounting apparatus and board conveying method
JP2008192895A (en) Apparatus for connecting electrical component
CN112331089B (en) Adsorption device, laminating equipment and laminating method of substrate
JP6200735B2 (en) Die bonder and bonding method
JP4555008B2 (en) Component mounting equipment
JP5903668B2 (en) Component mounting apparatus and component mounting method
JP5580529B2 (en) Substrate straightening device
JP6153334B2 (en) Peeling apparatus and peeling method
CN103247552B (en) Die bonding apparatus therefor, bracket and method of die bonding
JP4661807B2 (en) Component mounting apparatus and board conveying method
JP4454470B2 (en) Panel assembly equipment
JP4238814B2 (en) Substrate holding apparatus, bonding material printing apparatus and printing method
JP5506203B2 (en) Display panel substrate transfer device and display panel module assembly device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110824

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20121012

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121023

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121220

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130730

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130826

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees