JP5346421B2 - 試料分析システムの光学装置及び試料位置の検出方法 - Google Patents
試料分析システムの光学装置及び試料位置の検出方法 Download PDFInfo
- Publication number
- JP5346421B2 JP5346421B2 JP2000592621A JP2000592621A JP5346421B2 JP 5346421 B2 JP5346421 B2 JP 5346421B2 JP 2000592621 A JP2000592621 A JP 2000592621A JP 2000592621 A JP2000592621 A JP 2000592621A JP 5346421 B2 JP5346421 B2 JP 5346421B2
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- JP
- Japan
- Prior art keywords
- sample
- mirror
- scintillator
- video microscope
- centering element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 9
- 238000000034 method Methods 0.000 title claims description 4
- 238000006073 displacement reaction Methods 0.000 claims description 43
- 238000005259 measurement Methods 0.000 claims description 25
- 230000005469 synchrotron radiation Effects 0.000 claims description 13
- 239000000523 sample Substances 0.000 description 143
- 238000002474 experimental method Methods 0.000 description 14
- 230000033001 locomotion Effects 0.000 description 8
- 230000005291 magnetic effect Effects 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 239000012472 biological sample Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000004807 localization Effects 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000001683 neutron diffraction Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 210000005239 tubule Anatomy 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20016—Goniometers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Plasma & Fusion (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19900346A DE19900346A1 (de) | 1999-01-07 | 1999-01-07 | Präzisions-Probendrehvorrichtung |
| DE19900346.7 | 1999-01-07 | ||
| PCT/EP2000/000088 WO2000040952A2 (de) | 1999-01-07 | 2000-01-07 | Präzisions-probendrehvorrichtung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002534675A JP2002534675A (ja) | 2002-10-15 |
| JP2002534675A5 JP2002534675A5 (enExample) | 2007-03-15 |
| JP5346421B2 true JP5346421B2 (ja) | 2013-11-20 |
Family
ID=7893714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000592621A Expired - Lifetime JP5346421B2 (ja) | 1999-01-07 | 2000-01-07 | 試料分析システムの光学装置及び試料位置の検出方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6621085B1 (enExample) |
| EP (2) | EP1464950A3 (enExample) |
| JP (1) | JP5346421B2 (enExample) |
| AT (1) | ATE279721T1 (enExample) |
| AU (1) | AU2106500A (enExample) |
| DE (2) | DE19900346A1 (enExample) |
| DK (1) | DK1144988T3 (enExample) |
| ES (1) | ES2225079T3 (enExample) |
| PT (1) | PT1144988E (enExample) |
| WO (1) | WO2000040952A2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19900346A1 (de) * | 1999-01-07 | 2000-07-13 | Europ Lab Molekularbiolog | Präzisions-Probendrehvorrichtung |
| US6404849B1 (en) * | 1999-08-11 | 2002-06-11 | Abbott Laboratories | Automated sample handling for X-ray crystallography |
| GB0222334D0 (en) * | 2001-10-04 | 2002-10-30 | X Ray Res Gmbh | Automatic adjusting method for a goniometer and associated device |
| WO2003050598A2 (en) * | 2001-12-12 | 2003-06-19 | The Regents Of The University Of California | Integrated crystal mounting and alignment system for high-throughput biological crystallography |
| DE10336110B4 (de) * | 2003-08-06 | 2008-01-03 | Proteros Biostructures Gmbh | Vorrichtung und Verfahren zum Behandeln eines Proteinkristalls |
| JP5096747B2 (ja) * | 2006-03-02 | 2012-12-12 | 株式会社神戸製鋼所 | ビーム検出部材およびそれを用いたビーム検出器 |
| DE102009018570B4 (de) * | 2009-04-24 | 2018-12-20 | Carl Zeiss Industrielle Messtechnik Gmbh | Computertomograph mit einer Werkstückauflage zur Lagerung eines Werkstückes |
| JP6108674B2 (ja) * | 2012-03-16 | 2017-04-05 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置及び試料搬送装置 |
| US9613728B2 (en) * | 2013-03-15 | 2017-04-04 | Proto Manufacturing Ltd. | X-ray diffraction apparatus and method |
| DE102015118017B4 (de) * | 2015-10-22 | 2017-06-08 | Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh | Drehmodul für eine Beschleunigeranlage |
| NL2026054B1 (en) * | 2020-07-13 | 2022-03-15 | Delmic Ip B V | Method and apparatus for micromachining a sample using a Focused Ion Beam |
| DE102020122517B4 (de) * | 2020-08-28 | 2022-06-09 | Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung | Vorrichtung zur Rotation einer Probe um zwei orthogonale Achsen |
| JP7559621B2 (ja) * | 2021-03-03 | 2024-10-02 | 株式会社島津製作所 | X線分析装置およびx線分析方法 |
| CN113877699B (zh) * | 2021-09-28 | 2024-01-23 | 上海金自天正信息技术有限公司 | 自动破碎装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH595945A5 (enExample) * | 1975-06-06 | 1978-02-28 | Robert Habib | |
| CA1257714A (en) * | 1985-11-12 | 1989-07-18 | Michael Goldowsky | Goniometer |
| DE3546095A1 (de) * | 1985-12-24 | 1987-06-25 | Zeiss Carl Fa | Goniometertisch |
| US4821303A (en) * | 1986-12-05 | 1989-04-11 | The Dow Chemical Company | Combined thermal analyzer and x-ray diffractometer |
| JP2533169B2 (ja) * | 1988-07-14 | 1996-09-11 | 株式会社東芝 | X線回折装置 |
| JPH0235343A (ja) * | 1988-07-26 | 1990-02-05 | Rigaku Corp | 微小領域x線回折装置及びその試料セッティング方法 |
| JP2857406B2 (ja) * | 1989-03-10 | 1999-02-17 | 住友重機械工業株式会社 | 荷電粒子ビームモニタ |
| JPH02248899A (ja) * | 1989-03-22 | 1990-10-04 | Nippon Steel Corp | X線の拡大・単色化装置及びこの装置を利用したx線ct装置 |
| JPH06100677B2 (ja) * | 1989-05-26 | 1994-12-12 | 株式会社島津製作所 | X線回折装置 |
| JPH0390845A (ja) * | 1989-09-01 | 1991-04-16 | Hitachi Ltd | 表面分析方法およびその装置 |
| JPH03216537A (ja) * | 1990-01-22 | 1991-09-24 | Rigaku Corp | 中性子回折装置のダイレクトビームストッパ位置調節装置 |
| US5434901A (en) * | 1992-12-07 | 1995-07-18 | Olympus Optical Co., Ltd. | Soft X-ray microscope |
| JPH0738989U (ja) * | 1993-12-22 | 1995-07-14 | アロカ株式会社 | 放射線ビーム位置決め装置 |
| US6091796A (en) * | 1994-11-23 | 2000-07-18 | Thermotrex Corporation | Scintillator based microscope |
| JP3468623B2 (ja) * | 1995-08-08 | 2003-11-17 | 理学電機株式会社 | X線回折装置の光学系切換装置 |
| US5786600A (en) * | 1995-12-19 | 1998-07-28 | Eastman Kodak Company | (Barium hafnate:Ti, Ce, Pb) phosphors phosphor screens and phosphor preparation methods |
| JP3263920B2 (ja) * | 1996-02-01 | 2002-03-11 | 日本電子株式会社 | 電子顕微鏡用試料作成装置および方法 |
| US5912939A (en) * | 1997-02-07 | 1999-06-15 | Hirsch; Gregory | Soft x-ray microfluoroscope |
| DE19726884C1 (de) * | 1997-06-24 | 1998-10-15 | Fraunhofer Ges Forschung | Fiberoptische Röntgenkamera |
| US5898179A (en) * | 1997-09-10 | 1999-04-27 | Orion Equipment, Inc. | Method and apparatus for controlling a workpiece in a vacuum chamber |
| JPH11248651A (ja) * | 1998-03-04 | 1999-09-17 | Canon Inc | 微小領域x線回折装置 |
| US6269144B1 (en) * | 1998-03-04 | 2001-07-31 | William P. Dube | Method and apparatus for diffraction measurement using a scanning x-ray source |
| DE19900346A1 (de) * | 1999-01-07 | 2000-07-13 | Europ Lab Molekularbiolog | Präzisions-Probendrehvorrichtung |
| US6567497B2 (en) * | 2001-04-20 | 2003-05-20 | Lockheed Martin Corporation | Method and apparatus for inspecting a structure using X-rays |
-
1999
- 1999-01-07 DE DE19900346A patent/DE19900346A1/de not_active Withdrawn
-
2000
- 2000-01-07 US US09/868,646 patent/US6621085B1/en not_active Expired - Lifetime
- 2000-01-07 DE DE2000508227 patent/DE50008227D1/de not_active Expired - Lifetime
- 2000-01-07 EP EP04016152A patent/EP1464950A3/de not_active Withdrawn
- 2000-01-07 JP JP2000592621A patent/JP5346421B2/ja not_active Expired - Lifetime
- 2000-01-07 PT PT00901074T patent/PT1144988E/pt unknown
- 2000-01-07 EP EP00901074A patent/EP1144988B1/de not_active Expired - Lifetime
- 2000-01-07 WO PCT/EP2000/000088 patent/WO2000040952A2/de not_active Ceased
- 2000-01-07 AU AU21065/00A patent/AU2106500A/en not_active Abandoned
- 2000-01-07 ES ES00901074T patent/ES2225079T3/es not_active Expired - Lifetime
- 2000-01-07 DK DK00901074T patent/DK1144988T3/da active
- 2000-01-07 AT AT00901074T patent/ATE279721T1/de not_active IP Right Cessation
-
2003
- 2003-07-22 US US10/623,739 patent/US6927399B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6927399B2 (en) | 2005-08-09 |
| EP1144988B1 (de) | 2004-10-13 |
| DE19900346A1 (de) | 2000-07-13 |
| EP1144988A3 (de) | 2002-09-11 |
| WO2000040952A2 (de) | 2000-07-13 |
| EP1464950A3 (de) | 2006-10-18 |
| ES2225079T3 (es) | 2005-03-16 |
| DK1144988T3 (da) | 2005-01-24 |
| JP2002534675A (ja) | 2002-10-15 |
| WO2000040952A3 (de) | 2001-10-18 |
| AU2106500A (en) | 2000-07-24 |
| EP1144988A2 (de) | 2001-10-17 |
| PT1144988E (pt) | 2005-02-28 |
| DE50008227D1 (de) | 2004-11-18 |
| US6621085B1 (en) | 2003-09-16 |
| EP1464950A2 (de) | 2004-10-06 |
| US20050098737A1 (en) | 2005-05-12 |
| ATE279721T1 (de) | 2004-10-15 |
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