JP5312058B2 - 投影光学系、露光装置及びデバイス製造方法 - Google Patents

投影光学系、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5312058B2
JP5312058B2 JP2009009334A JP2009009334A JP5312058B2 JP 5312058 B2 JP5312058 B2 JP 5312058B2 JP 2009009334 A JP2009009334 A JP 2009009334A JP 2009009334 A JP2009009334 A JP 2009009334A JP 5312058 B2 JP5312058 B2 JP 5312058B2
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Japan
Prior art keywords
optical element
optical system
axis direction
projection optical
optical
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JP2009009334A
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English (en)
Japanese (ja)
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JP2010166007A (ja
JP2010166007A5 (enExample
Inventor
雄平 住吉
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Canon Inc
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Canon Inc
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Priority to JP2009009334A priority Critical patent/JP5312058B2/ja
Priority to US12/687,997 priority patent/US8760618B2/en
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Publication of JP2010166007A5 publication Critical patent/JP2010166007A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/68—Introducing or correcting distortion, e.g. in connection with oblique projection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP2009009334A 2009-01-19 2009-01-19 投影光学系、露光装置及びデバイス製造方法 Active JP5312058B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009009334A JP5312058B2 (ja) 2009-01-19 2009-01-19 投影光学系、露光装置及びデバイス製造方法
US12/687,997 US8760618B2 (en) 2009-01-19 2010-01-15 Projection optical system, exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009009334A JP5312058B2 (ja) 2009-01-19 2009-01-19 投影光学系、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010166007A JP2010166007A (ja) 2010-07-29
JP2010166007A5 JP2010166007A5 (enExample) 2012-03-01
JP5312058B2 true JP5312058B2 (ja) 2013-10-09

Family

ID=42336711

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JP2009009334A Active JP5312058B2 (ja) 2009-01-19 2009-01-19 投影光学系、露光装置及びデバイス製造方法

Country Status (2)

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US (1) US8760618B2 (enExample)
JP (1) JP5312058B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10459349B2 (en) 2017-06-19 2019-10-29 Canon Kabushiki Kaisha Exposure method, exposure apparatus and method of manufacturing article

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013204572A1 (de) * 2013-03-15 2014-09-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit hochflexiblem Manipulator
JP6238580B2 (ja) * 2013-06-07 2017-11-29 キヤノン株式会社 露光装置、露光方法、それらを用いたデバイスの製造方法
CN105549327B (zh) * 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
JP6643834B2 (ja) 2015-09-02 2020-02-12 キヤノン株式会社 ディストーション検出方法、露光装置、露光方法、およびデバイス製造方法
DE102015218329A1 (de) * 2015-09-24 2017-03-30 Carl Zeiss Smt Gmbh Optische Korrekturanordnung, Projektionsobjektiv mit einer solchen optischen Korrekturanordnung sowie mikrolithografische Apparatur mit einem solchen Projektionsobjektiv
DE102018122652B4 (de) * 2018-09-17 2025-11-27 Carl Zeiss Microscopy Gmbh Spektralauflösende, hochauflösende 3D-Lokalisierungmikroskopie
JP2019070812A (ja) * 2018-11-29 2019-05-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法

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JP3303436B2 (ja) * 1993-05-14 2002-07-22 キヤノン株式会社 投影露光装置及び半導体素子の製造方法
JP3275575B2 (ja) * 1993-10-27 2002-04-15 キヤノン株式会社 投影露光装置及び該投影露光装置を用いたデバイスの製造方法
US20020080338A1 (en) * 1994-03-29 2002-06-27 Nikon Corporation Projection exposure apparatus
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
EP0851304B1 (en) * 1996-12-28 2004-03-17 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP3306772B2 (ja) * 1998-07-01 2002-07-24 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JP2002175964A (ja) * 2000-12-06 2002-06-21 Nikon Corp 観察装置およびその製造方法、露光装置、並びにマイクロデバイスの製造方法
US7106455B2 (en) * 2001-03-06 2006-09-12 Canon Kabushiki Kaisha Interferometer and interferance measurement method
JP2002257524A (ja) * 2001-03-06 2002-09-11 Canon Inc 干渉計及び干渉計測法
JP3381256B2 (ja) 2001-05-31 2003-02-24 株式会社ニコン 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
US8009271B2 (en) * 2004-12-16 2011-08-30 Nikon Corporation Projection optical system, exposure apparatus, exposure system, and exposure method
US7372633B2 (en) * 2006-07-18 2008-05-13 Asml Netherlands B.V. Lithographic apparatus, aberration correction device and device manufacturing method
KR101507622B1 (ko) * 2006-12-01 2015-03-31 칼 짜이스 에스엠티 게엠베하 이미지 수차들을 감소시키기 위한, 교환가능하고 조작가능한 보정 배열을 구비하는 광학 시스템
JP2010210760A (ja) * 2009-03-09 2010-09-24 Canon Inc 投影光学系、露光装置及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10459349B2 (en) 2017-06-19 2019-10-29 Canon Kabushiki Kaisha Exposure method, exposure apparatus and method of manufacturing article

Also Published As

Publication number Publication date
US20100182577A1 (en) 2010-07-22
JP2010166007A (ja) 2010-07-29
US8760618B2 (en) 2014-06-24

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