JP5273700B2 - 光触媒酸化チタン膜およびその製造方法 - Google Patents
光触媒酸化チタン膜およびその製造方法 Download PDFInfo
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- JP5273700B2 JP5273700B2 JP2007147634A JP2007147634A JP5273700B2 JP 5273700 B2 JP5273700 B2 JP 5273700B2 JP 2007147634 A JP2007147634 A JP 2007147634A JP 2007147634 A JP2007147634 A JP 2007147634A JP 5273700 B2 JP5273700 B2 JP 5273700B2
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- Prior art keywords
- film
- titanium oxide
- anatase
- gas
- titanium dioxide
- Prior art date
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims description 78
- 230000001699 photocatalysis Effects 0.000 title claims description 27
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000004408 titanium dioxide Substances 0.000 claims description 24
- 239000002245 particle Substances 0.000 claims description 16
- 239000011164 primary particle Substances 0.000 claims description 3
- 239000011163 secondary particle Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 68
- 239000007789 gas Substances 0.000 description 42
- 238000000034 method Methods 0.000 description 26
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 18
- 239000000843 powder Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 239000007921 spray Substances 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000012159 carrier gas Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000007751 thermal spraying Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010288 cold spraying Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- -1 titanium alkoxide Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Description
本発明の光触媒酸化チタン膜の製造方法は、コールドスプレー法だけでアナターゼ型二酸化チタンのみからなる膜が製造可能であるため、製造工程が簡便である。
原料粉末として凝集させていない粒径180nmのアナターゼ型二酸化チタン粉末を用いた以外は実施例1と同様の方法で皮膜を作製した。
102: ガス加熱用ヒーター
103: ガス温度センサー
104: ガス圧力センサー
105: ガス加速部位
106: 成膜距離
107: 皮膜
108: 基材
109: 基材保持部
110: 粉末供給器
111: キャリアガス
Claims (1)
- アナターゼ型二酸化チタン粒子を高温・高圧で吹きつけることにより成膜する光触媒酸化チタン膜の製造方法、において、前記、アナターゼ型ニ酸化チタン粒子が、一次粒径が0.1nm〜1μmのアナターゼ型二酸チタンを凝集させた粒径1μm〜100μmの二次粒子であり、かつ高温・高圧ガス発生部からの供給ガス圧力が0.3MPa〜1.0MPaであり、かつ高温・高圧ガス発生部からの供給ガスの温度が200℃以上800℃以下、であることを特徴とする製造方法。
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JP2007147634A JP5273700B2 (ja) | 2007-06-04 | 2007-06-04 | 光触媒酸化チタン膜およびその製造方法 |
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JP2007147634A JP5273700B2 (ja) | 2007-06-04 | 2007-06-04 | 光触媒酸化チタン膜およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2008297184A JP2008297184A (ja) | 2008-12-11 |
JP5273700B2 true JP5273700B2 (ja) | 2013-08-28 |
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JP2007147634A Expired - Fee Related JP5273700B2 (ja) | 2007-06-04 | 2007-06-04 | 光触媒酸化チタン膜およびその製造方法 |
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Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5525231B2 (ja) * | 2009-10-20 | 2014-06-18 | 株式会社フジコー | 溶射材料の製造方法及び溶射皮膜の製造方法 |
JP5549643B2 (ja) * | 2011-05-27 | 2014-07-16 | 新東工業株式会社 | リチウム二次電池用電極体の製造方法 |
DE102012001361A1 (de) * | 2012-01-24 | 2013-07-25 | Linde Aktiengesellschaft | Verfahren zum Kaltgasspritzen |
JP5914139B2 (ja) * | 2012-04-26 | 2016-05-11 | 新日鉄住金エンジニアリング株式会社 | 多孔質半導体電極の製造方法および製造装置 |
JP6334355B2 (ja) * | 2014-10-01 | 2018-05-30 | 株式会社東芝 | セラミックス粉末およびその皮膜 |
JP6621676B2 (ja) * | 2016-02-09 | 2019-12-18 | 国立大学法人東北大学 | 高圧水素ガス用蓄圧器の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09225302A (ja) * | 1995-12-22 | 1997-09-02 | Toshiba Lighting & Technol Corp | 光触媒体および照明器具 |
JP3252147B2 (ja) * | 1997-01-09 | 2002-01-28 | 独立行政法人産業技術総合研究所 | 二酸化チタン皮膜の形成方法 |
JP4972268B2 (ja) * | 2002-03-07 | 2012-07-11 | 日立化成工業株式会社 | 酸化チタン膜形成用液体、酸化チタン膜の形成法、酸化チタン膜及び光触媒性部材 |
JP4568866B2 (ja) * | 2004-02-05 | 2010-10-27 | 独立行政法人 日本原子力研究開発機構 | 可視光応答型二酸化チタン光触媒薄膜とその作製法 |
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