JP5260539B2 - フレキソ印刷プレートの溶剤アシストエンボス加工 - Google Patents
フレキソ印刷プレートの溶剤アシストエンボス加工 Download PDFInfo
- Publication number
- JP5260539B2 JP5260539B2 JP2009537269A JP2009537269A JP5260539B2 JP 5260539 B2 JP5260539 B2 JP 5260539B2 JP 2009537269 A JP2009537269 A JP 2009537269A JP 2009537269 A JP2009537269 A JP 2009537269A JP 5260539 B2 JP5260539 B2 JP 5260539B2
- Authority
- JP
- Japan
- Prior art keywords
- flexographic printing
- printing plate
- master tool
- substrate
- microstructure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/08—Forme preparation by embossing, e.g. with a typewriter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/003—Forme preparation the relief or intaglio pattern being obtained by imagewise deposition of a liquid, e.g. by an ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/24—Condition, form or state of moulded material or of the material to be shaped crosslinked or vulcanised
- B29K2105/243—Partially cured
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Methods (AREA)
Description
マイクロフレキソ印刷プレートは、微細構造を複製した線状角柱構造体(BEF 90/50、3M社(3M Co.)から市販されている)を備えた高分子フィルムを用いることと(本マスター構造体の表面形状スキャン(profilometric scan)は、図4に示されており、BEF MASTERと称される)、メチルエチルケトンの薄膜をその構造化された表面上に堆積することと、次に、サイレル(CYREL)(登録商標)フレキソプレート(型式TDR B 6.35mm厚、カバーシートを除去したもの、デュポン社(DuPont Co.)より市販されている)を微細構造を複製した表面の最上部に位置決めすることと、によって作製された。15時間後、サイレル(CYREL)(登録商標)プレートを、取り付けた微細構造を複製したフィルムを通して、UV処理装置(フュージョン(Fusion)製、メリーランド州ロックビル(Rockville))製紫外線硬化ランプ、型式MC−6RQN、78.74ワット/cm(200ワット/インチ)、水銀ランプ、約5fpmにて運転)内で紫外線に曝し、次に微細構造を複製したフレキソ印刷プレートをBEFマスターから取り外した。形状部を示しているこの微細構造を複製したフレキソ印刷プレートの表面形状スキャン(profilometric scan)は、図4に示されており、スタンプ・キュアード・スルー・BEF(STAMP CURED THROUGH BEF)と称される。x軸目盛りは、マイクロメートルであり、y軸目盛りはオングストロームである。
マイクロフレキソ印刷プレートは、微細構造を複製したコーナーキューブ構造を備えた高分子フィルムを用い、少量のメチルエチルケトンを、マスターツールの構造化された表面上に堆積し、次に、サイレル(CYREL)(登録商標)フレキソプレート(型式TDR B 6.35mm厚、カバーシートを除去したもの、デュポン社(DuPont Co.)社から入手可能)をマスターツールの微細構造を複製した表面の最上部に位置決めすることによって作製された。15時間後、サイレル(CYREL)(登録商標)プレートを、取り付けた微細構造を複製したフィルムを通して、UV処理装置(フュージョン(Fusion)製、メリーランド州ロックビル(Rockville))紫外線硬化ランプ、型式MC−6RQN、78.74ワット/cm(200ワット/インチ)、水銀ランプ、約1.5メートル/分にて稼働)内で紫外線へ露光し、次に微細構造を複製したフレキソ印刷プレートをマスターツールから取り外した。次に、この微細構造を複製したフレキソ印刷プレートを、フレキソ取り付け用テープ(型式1120、3M社(3M Co.)から市販されている)によって、12.7cm直径のガラス外筒に取り付けた。形状部を示す、この微細構造を複製したフレキソ印刷プレートの顕微鏡画像を、図6に示す。
Claims (3)
- フレキソ印刷プレートの形成法であって、
マスターツールパターンを画定する複数のくぼみを有し、前記くぼみ内に溶剤が配置されたマスターツールの上へ、光重合性材料を含む高分子基材を配置することと、
前記溶剤を前記高分子基材中へ拡散させて、前記マスターパターンに対して補完的な基材レリーフパターンを形成することと、
前記高分子基材に化学線を露光することによって前記基材レリーフパターンを硬化させて、フレキソ印刷プレートを形成することと、を含む、フレキソ印刷プレートの形成法。 - 硬化した光重合性材料を含み、主表面及び前記主表面から離れるように突出するレリーフパターンを有する高分子基材を含む、フレキソ印刷プレートであって、前記レリーフパターンが、少なくとも20マイクロメートルの高さを有し、かつ、前記レリーフパターンが、15マイクロメートル以下の横方向の寸法を有する形状部を含む、請求項1に記載の方法にしたがって作製されたフレキソ印刷プレート。
- 微細構造を有する剛性マスターツールを提供することと、
前記剛性マスターツールを用いて高分子基材上で前記微細構造を複製して、微細構造を複製した高分子ウェブマスターツールを形成することと、
光重合性材料を含む前記高分子基材を前記高分子ウェブマスターツールの上に配置して、微細構造を複製したフレキソ印刷プレートを形成することと、を含み、
前記微細構造が、10マイクロメートル以下の横方向の寸法を有する形状部を含み、
ダイヤモンド旋削によって、前記剛性マスターツール微細構造を形成することを更に含む、請求項1に記載のフレキソ印刷プレートの形成法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86597906P | 2006-11-15 | 2006-11-15 | |
US60/865,979 | 2006-11-15 | ||
PCT/US2007/083569 WO2008060876A2 (en) | 2006-11-15 | 2007-11-05 | Solvent-assisted embossing of flexographic printing plates |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010510093A JP2010510093A (ja) | 2010-04-02 |
JP2010510093A5 JP2010510093A5 (ja) | 2011-01-06 |
JP5260539B2 true JP5260539B2 (ja) | 2013-08-14 |
Family
ID=39204583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009537269A Expired - Fee Related JP5260539B2 (ja) | 2006-11-15 | 2007-11-05 | フレキソ印刷プレートの溶剤アシストエンボス加工 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100024671A1 (ja) |
EP (1) | EP2082286B1 (ja) |
JP (1) | JP5260539B2 (ja) |
KR (1) | KR101411161B1 (ja) |
CN (1) | CN101535893A (ja) |
BR (1) | BRPI0718765A2 (ja) |
WO (1) | WO2008060876A2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2084012B1 (en) | 2006-11-15 | 2011-03-09 | 3M Innovative Properties Company | Flexographic printing with curing during transfer to substrate |
US20140145368A1 (en) * | 2010-09-30 | 2014-05-29 | Fuji-Film Corporation | Method for producing flexographic plate original for laser engraving |
ES2441170T3 (es) * | 2011-06-21 | 2014-02-03 | Agfa Graphics N.V. | Líquido eyectable curable para fabricar una matriz de impresión flexográfica |
DE102016200793B4 (de) * | 2015-02-11 | 2024-04-04 | Heidelberger Druckmaschinen Ag | Verfahren zum Herstellen einer Werkzeugplatte zum Bearbeiten von Bedruckstoff |
MX2018012063A (es) | 2016-04-06 | 2019-01-14 | Procter & Gamble | Metodo para fabricar una placa de impresion flexografica con patron. |
EP3424740B1 (en) * | 2017-07-05 | 2022-06-15 | The Procter & Gamble Company | Method of printing 3d-microoptic images on packing systems |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51145605A (en) * | 1975-06-06 | 1976-12-14 | Kanazawa Furekiso Kk | Method of reproducing flexographic printing plate from photosensitive resin plate |
US4209551A (en) * | 1977-12-28 | 1980-06-24 | Toppan Printing Co., Ltd. | Method of fabricating a phosphor screen of a color television picture tube |
JPH0410933A (ja) * | 1990-04-27 | 1992-01-16 | Toppan Printing Co Ltd | 印刷版の製造方法 |
US5540147A (en) * | 1994-12-02 | 1996-07-30 | Corning Incorporated | Method for forming a contoured planarizing layer for a color filter |
DE69918573T3 (de) * | 1998-11-19 | 2008-12-04 | Nilpeter A/S | Verfahren und vorrichtung zum rotationsformen von strukturen mit oberflächenrelief |
AU2001284896A1 (en) * | 2000-08-14 | 2002-02-25 | Surface Logix, Inc. | Deformable stamp for patterning three-dimensional surfaces |
US6926957B2 (en) * | 2001-06-29 | 2005-08-09 | 3M Innovative Properties Company | Water-based ink-receptive coating |
EP1519839B1 (en) * | 2002-07-01 | 2011-10-05 | Inca Digital Printers Limited | Printing with ink |
US7591903B2 (en) * | 2002-08-13 | 2009-09-22 | 3M Innovative Properties Company | Die having multiple orifice slot |
KR100568581B1 (ko) * | 2003-04-14 | 2006-04-07 | 주식회사 미뉴타텍 | 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드 |
JP2008507114A (ja) * | 2004-04-27 | 2008-03-06 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | ソフトリソグラフィ用複合パターニングデバイス |
EP1657070B1 (en) * | 2004-11-10 | 2008-04-23 | Sony Deutschland GmbH | A stamp for soft lithography, in particular micro contact printing and a method of preparing the same |
EP1700680A1 (en) * | 2005-03-09 | 2006-09-13 | EPFL Ecole Polytechnique Fédérale de Lausanne | Easy release fluoropolymer molds for micro- and nano-pattern replication |
AU2006282042B2 (en) * | 2005-06-17 | 2011-12-22 | The University Of North Carolina At Chapel Hill | Nanoparticle fabrication methods, systems, and materials |
-
2007
- 2007-11-05 JP JP2009537269A patent/JP5260539B2/ja not_active Expired - Fee Related
- 2007-11-05 US US12/514,886 patent/US20100024671A1/en not_active Abandoned
- 2007-11-05 EP EP07863867.3A patent/EP2082286B1/en not_active Not-in-force
- 2007-11-05 BR BRPI0718765-3A patent/BRPI0718765A2/pt not_active IP Right Cessation
- 2007-11-05 CN CNA2007800424685A patent/CN101535893A/zh active Pending
- 2007-11-05 KR KR1020097009835A patent/KR101411161B1/ko active IP Right Grant
- 2007-11-05 WO PCT/US2007/083569 patent/WO2008060876A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR20090078351A (ko) | 2009-07-17 |
KR101411161B1 (ko) | 2014-07-01 |
WO2008060876A2 (en) | 2008-05-22 |
US20100024671A1 (en) | 2010-02-04 |
WO2008060876A3 (en) | 2008-12-04 |
BRPI0718765A2 (pt) | 2013-12-03 |
EP2082286B1 (en) | 2013-12-25 |
CN101535893A (zh) | 2009-09-16 |
JP2010510093A (ja) | 2010-04-02 |
EP2082286A2 (en) | 2009-07-29 |
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