JP5259977B2 - 半導体装置及び半導体装置の作製方法 - Google Patents
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- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
Description
本実施の形態では、本発明の半導体装置の一例に関して図面を参照して説明する。
本実施の形態では、上記実施の形態と異なる半導体装置及びその作製方法に関して図面を参照して説明する。具体的には、導電型が異なる複数のトランジスタを有する場合に関して説明する。また、実施の形態1に示した半導体膜とゲート絶縁膜の作製工程とは異なる工程で半導体膜とゲート絶縁膜を形成する場合について説明する。
本実施の形態では、上記実施の形態で示した作製方法を用いて得られた半導体装置の使用形態の一例について説明する。具体的には、非接触でデータの入出力が可能である半導体装置の適用例に関して図面を参照して以下に説明する。非接触でデータの入出力が可能である半導体装置は利用の形態によっては、RFIDタグ、IDタグ、ICタグ、ICチップ、RFタグ、無線タグ、電子タグまたは無線チップともよばれる。
102 絶縁膜
103 半導体膜
103a チャネル形成領域
103b 不純物領域
104 ゲート絶縁膜
105 導電膜
106 絶縁膜
107 導電膜
155 空間
156 空間
Claims (3)
- 基板と、
前記基板上に形成された第1の絶縁膜と、
前記第1の絶縁膜上に形成された半導体膜と、
前記半導体膜上に形成されたゲート絶縁膜と、
前記第1の絶縁膜及び前記ゲート絶縁膜上に形成されたゲート電極と、
前記半導体膜、前記ゲート絶縁膜、前記ゲート電極を覆う第2の絶縁膜とを有する半導体装置であって、
前記ゲート絶縁膜の端部は、前記半導体膜の端部よりも突出し、
前記ゲート絶縁膜は、前記半導体膜の側面を覆わず、
前記ゲート電極は、前記半導体膜と接しないように形成され、
前記第1の絶縁膜と、前記半導体膜の側面と、前記ゲート絶縁膜と、前記ゲート電極とに囲まれた空間を有することを特徴とする半導体装置。 - 基板上に第1の絶縁膜を形成し、
前記第1の絶縁膜上に半導体膜を形成し、
前記半導体膜上に第2の絶縁膜を形成し、
前記第2の絶縁膜上にレジストを形成し、
前記レジストをマスクとして前記半導体膜及び前記第2の絶縁膜をエッチングして、第1の島状の半導体膜及びゲート絶縁膜を形成し、
前記レジスト及び前記ゲート絶縁膜をマスクとして前記第1の島状の半導体膜をエッチングして、前記ゲート絶縁膜の端部よりも内側の領域に第2の島状の半導体膜を形成し、
前記第1の絶縁膜及び前記ゲート絶縁膜上にゲート電極を形成して、前記第1の絶縁膜と、前記第2の島状の半導体膜の側面と、前記ゲート絶縁膜と、前記ゲート電極とに囲まれた空間を形成し、
前記第2の島状の半導体膜、前記ゲート絶縁膜、前記ゲート電極を覆う第3の絶縁膜を形成することを特徴とする半導体装置の作製方法。 - 請求項2において、
前記半導体膜及び前記第2の絶縁膜のエッチングは、ドライエッチングにより行い、
前記第1の島状の半導体膜のエッチングは、有機アルカリ系水溶液を用いたウエットエッチングにより行うことを特徴とする半導体装置の作製方法。
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