JP5252864B2 - 有機ｅｌディスプレイパネル製造装置 - Google Patents

有機ｅｌディスプレイパネル製造装置 Download PDF

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Publication number
JP5252864B2
JP5252864B2 JP2007233995A JP2007233995A JP5252864B2 JP 5252864 B2 JP5252864 B2 JP 5252864B2 JP 2007233995 A JP2007233995 A JP 2007233995A JP 2007233995 A JP2007233995 A JP 2007233995A JP 5252864 B2 JP5252864 B2 JP 5252864B2
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Prior art keywords
substrate
organic
display panel
substrate tray
panel manufacturing
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Expired - Fee Related
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JP2007233995A
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Japanese (ja)
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JP2009064758A5 (enExample
JP2009064758A (ja
Inventor
友和 須志原
省三 笠井
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Canon Inc
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Canon Inc
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Priority to JP2007233995A priority Critical patent/JP5252864B2/ja
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  • Physical Vapour Deposition (AREA)
JP2007233995A 2007-09-10 2007-09-10 有機ｅｌディスプレイパネル製造装置 Expired - Fee Related JP5252864B2 (ja)

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JP2007233995A JP5252864B2 (ja) 2007-09-10 2007-09-10 有機ｅｌディスプレイパネル製造装置

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JP2007233995A JP5252864B2 (ja) 2007-09-10 2007-09-10 有機ｅｌディスプレイパネル製造装置

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JP2009064758A JP2009064758A (ja) 2009-03-26
JP2009064758A5 JP2009064758A5 (enExample) 2010-10-28
JP5252864B2 true JP5252864B2 (ja) 2013-07-31

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JP2007233995A Expired - Fee Related JP5252864B2 (ja) 2007-09-10 2007-09-10 有機ｅｌディスプレイパネル製造装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104508172A (zh) * 2012-11-13 2015-04-08 三菱重工业株式会社 真空蒸镀装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5567905B2 (ja) * 2009-07-24 2014-08-06 株式会社日立ハイテクノロジーズ 真空蒸着方法及びその装置
KR102699846B1 (ko) * 2020-11-30 2024-08-27 캐논 톡키 가부시키가이샤 성막 장치
JP7242626B2 (ja) * 2020-12-10 2023-03-20 キヤノントッキ株式会社 成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07145480A (ja) * 1993-11-22 1995-06-06 Hitachi Ltd スパッタリング装置およびそれを用いた成膜方法
JPH0913173A (ja) * 1995-06-28 1997-01-14 Hitachi Ltd スパッタリング装置、及びその防着板交換方法
JP2005056673A (ja) * 2003-08-04 2005-03-03 Nec Plasma Display Corp プラズマディスプレイパネルの成膜装置、該パネルの製造方法及びプラズマ表示装置の製造方法
JP4549697B2 (ja) * 2004-03-04 2010-09-22 株式会社アルバック 成膜装置及び成膜方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104508172A (zh) * 2012-11-13 2015-04-08 三菱重工业株式会社 真空蒸镀装置
CN104508172B (zh) * 2012-11-13 2016-10-12 三菱重工业株式会社 真空蒸镀装置

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JP2009064758A (ja) 2009-03-26

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