JP5250536B2 - 体積感知型ディスペンサー制御方法 - Google Patents
体積感知型ディスペンサー制御方法 Download PDFInfo
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- JP5250536B2 JP5250536B2 JP2009279545A JP2009279545A JP5250536B2 JP 5250536 B2 JP5250536 B2 JP 5250536B2 JP 2009279545 A JP2009279545 A JP 2009279545A JP 2009279545 A JP2009279545 A JP 2009279545A JP 5250536 B2 JP5250536 B2 JP 5250536B2
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- 238000000034 method Methods 0.000 title claims description 54
- 238000009826 distribution Methods 0.000 claims description 58
- 239000011347 resin Substances 0.000 claims description 46
- 229920005989 resin Polymers 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 39
- 238000012937 correction Methods 0.000 claims description 28
- 238000012546 transfer Methods 0.000 claims description 11
- 238000003860 storage Methods 0.000 claims description 10
- 230000007547 defect Effects 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 8
- 230000002950 deficient Effects 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 2
- 238000010923 batch production Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 34
- 229910052710 silicon Inorganic materials 0.000 description 34
- 239000010703 silicon Substances 0.000 description 34
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00634—Production of filters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00807—Producing lenses combined with electronics, e.g. chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Led Device Packages (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
Claims (9)
- ポンプでレジンを吐き出して製品に所定量のレジンを分配するように制御する体積感知型ディスペンサー制御方法において、
前記ポンプで前記製品にレジンを分配する予備分配段階;
前記予備分配段階が済んだ製品を光スキャナでスキャンして、分配されたレジンの体積を測定する体積測定段階;
前記体積測定段階で感知されたレジンの量と所定の分配量との差を用いて、追加に分配されるレジンの量を計算する補正体積算定段階;及び
前記補正体積算定段階で計算されたレジンの補正量を反映して前記製品にレジンを分配する補正分配段階;を含み、
前記補正分配段階は、前記予備分配段階を経た製品に対し、前記補正体積算定段階で計算されたレジンの補正量だけさらにレジンを分配することを特徴とする、体積感知型ディスペンサー制御方法。 - 多数の製品に対して前記予備分配段階を実行し、
前記予備分配段階が済んだ多数の製品に対して順次それぞれ前記体積測定段階及び補正体積算定段階を実行した後、
前記製品に対して順次前記補正分配段階を行うことを特徴とする、請求項1に記載の体積感知型ディスペンサー制御方法。 - 前記それぞれの製品に別途に割り当てられた製品別レジン分配量を入力されて格納部に格納する分配情報格納段階;をさらに含み、
前記補正体積算定段階は、前記分配情報格納段階で格納された前記製品別レジン分配量を用いてレジンの補正量を計算することを特徴とする、請求項2に記載の体積感知型ディスペンサー制御方法。 - 前記予備分配段階に先立ち、前記製品の3次元形状を前記光スキャナで測定する予備スキャン段階;をさらに含み、
前記補正体積算定段階は、前記体積測定段階で測定された値と前記予備スキャン段階で測定された値の差を用いてレジンの補正量を計算することを特徴とする、請求項1〜3のいずれか1項に記載の体積感知型ディスペンサー制御方法。 - 前記体積測定段階は、レーザーを光源とする光スキャナを用いて行うことを特徴とする、請求項4に記載の体積感知型ディスペンサー制御方法。
- 前記体積測定段階は、可視光線を光源とする光スキャナを用いて行うことを特徴とする、請求項4に記載の体積感知型ディスペンサー制御方法。
- 前記体積測定段階を実行した後、前記光スキャナによって測定されたイメージを用いて、分配されたレジンに含まれた気泡を感知する気泡感知段階;をさらに含むことを特徴とする、請求項6に記載の体積感知型ディスペンサー制御方法。
- 前記予備スキャン段階は、可視光線を光源とする光スキャナを用いて行い、
前記予備スキャン段階を実行した後、前記光スキャナによって測定されたイメージを用いて製品の不良を確認する不良感知段階;をさらに含み、
前記不良感知段階で不良と判断された製品に対し、後続の各段階を実行しないことを特徴とする、請求項4に記載の体積感知型ディスペンサー制御方法。 - 前記予備分配段階、体積測定段階及び補正分配段階は、順次配置されたポンプと光スキャナ、及び前記ポンプと光スキャナに沿って前記製品を移送する製品移送装置を用いて一括工程で行うことを特徴とする、請求項1〜3のいずれか1項に記載の体積感知型ディスペンサー制御方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0058285 | 2009-06-29 | ||
KR1020090058285A KR101073976B1 (ko) | 2009-06-29 | 2009-06-29 | 체적 감지형 디스펜서 제어 방법 |
Publications (2)
Publication Number | Publication Date |
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JP2011005476A JP2011005476A (ja) | 2011-01-13 |
JP5250536B2 true JP5250536B2 (ja) | 2013-07-31 |
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JP2009279545A Active JP5250536B2 (ja) | 2009-06-29 | 2009-12-09 | 体積感知型ディスペンサー制御方法 |
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Country | Link |
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US (1) | US8080192B2 (ja) |
JP (1) | JP5250536B2 (ja) |
KR (1) | KR101073976B1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101197229B1 (ko) * | 2011-01-26 | 2012-11-02 | 주식회사 프로텍 | Led 소자 제조 방법 및 led 소자 제조 장치 |
KR102356244B1 (ko) * | 2015-01-05 | 2022-01-28 | 현대모비스 주식회사 | 하우징의 핫멜트 도포 장치 및 방법 |
KR20210021160A (ko) | 2019-08-14 | 2021-02-25 | 삼성디스플레이 주식회사 | 액적 측정 방법, 액적 측정 장치, 및 표시 장치의 제조 방법 |
KR20210104222A (ko) | 2020-02-14 | 2021-08-25 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치, 액적 측정 방법, 및 표시 장치의 제조방법 |
KR102474000B1 (ko) | 2022-03-07 | 2022-12-05 | 주식회사피에스디이 | 나노 임프린팅을 위한 디스펜서 및 그 제조 방법 |
KR102454787B1 (ko) | 2022-05-06 | 2022-10-14 | 주식회사피에스디이 | 몰드 자동 교체형 나노 임프린팅 리소그래피 장치 및 그 방법 |
KR102690004B1 (ko) * | 2022-08-22 | 2024-07-30 | (주)나노젯코리아 | 언더필 디스펜싱 장치 |
WO2024054070A1 (ko) * | 2022-09-08 | 2024-03-14 | 주식회사 레신저스 | 광와이어 제조 장치 및 제조 방법 |
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JPS5724627A (en) * | 1980-07-18 | 1982-02-09 | Fujitsu Ltd | Quantitative dropping of liquid |
JPH0615711A (ja) * | 1992-04-08 | 1994-01-25 | Dr Spiess Kunststoff Recycling Gmbh & Co | 合成物質、特にリサイクル合成物質から資材を自動的に造るための方法および装置 |
US5518388A (en) * | 1993-12-14 | 1996-05-21 | United Technologies Corporation | Automated apparatus and method for resin transfer molding |
JPH11298200A (ja) * | 1998-04-10 | 1999-10-29 | Nagoya Denki Kogyo Kk | プリント基板の部品実装プロセスにおける自動品質管理方法およびその装置 |
JP4015007B2 (ja) * | 2001-11-16 | 2007-11-28 | シャープ株式会社 | 液晶表示装置の製造方法 |
JP2004273541A (ja) | 2003-03-05 | 2004-09-30 | Seiko Epson Corp | 樹脂塗布装置、アンダーフィル材の充填方法、半導体チップの実装方法、半導体実装基板および電子機器 |
JP2006116789A (ja) | 2004-10-21 | 2006-05-11 | Sumitomo Heavy Ind Ltd | 成形機及びその樹脂供給制御方法 |
JP4551324B2 (ja) * | 2005-12-28 | 2010-09-29 | 芝浦メカトロニクス株式会社 | ペーストの塗布量測定装置及びペースト塗布装置 |
JP2008076151A (ja) * | 2006-09-20 | 2008-04-03 | I-Pulse Co Ltd | 検査装置および検査方法 |
JP2008145300A (ja) * | 2006-12-11 | 2008-06-26 | Sharp Corp | 蛍光体層厚み判定方法および発光装置の製造方法 |
WO2008141218A2 (en) * | 2007-05-11 | 2008-11-20 | Shiloh Industries, Inc. | Composite component and method of manufacturing the same |
JP2009092485A (ja) * | 2007-10-06 | 2009-04-30 | Djtech Co Ltd | 印刷半田検査装置 |
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- 2009-06-29 KR KR1020090058285A patent/KR101073976B1/ko active IP Right Grant
- 2009-12-09 JP JP2009279545A patent/JP5250536B2/ja active Active
- 2009-12-31 US US12/650,685 patent/US8080192B2/en active Active
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Publication number | Publication date |
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KR20110000942A (ko) | 2011-01-06 |
US8080192B2 (en) | 2011-12-20 |
KR101073976B1 (ko) | 2011-10-17 |
JP2011005476A (ja) | 2011-01-13 |
US20100327468A1 (en) | 2010-12-30 |
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