JP5243955B2 - ビシクロ[3.1.0]ヘキサノールの調製方法 - Google Patents
ビシクロ[3.1.0]ヘキサノールの調製方法 Download PDFInfo
- Publication number
- JP5243955B2 JP5243955B2 JP2008524593A JP2008524593A JP5243955B2 JP 5243955 B2 JP5243955 B2 JP 5243955B2 JP 2008524593 A JP2008524593 A JP 2008524593A JP 2008524593 A JP2008524593 A JP 2008524593A JP 5243955 B2 JP5243955 B2 JP 5243955B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxide
- tetramethylpiperidine
- reaction
- secondary amine
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 14
- NHPHSQKWQYLZSA-UHFFFAOYSA-N bicyclo[3.1.0]hexan-1-ol Chemical compound C1CCC2(O)C1C2 NHPHSQKWQYLZSA-UHFFFAOYSA-N 0.000 title description 3
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 claims description 20
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical group [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 18
- YAXWOADCWUUUNX-UHFFFAOYSA-N 1,2,2,3-tetramethylpiperidine Chemical compound CC1CCCN(C)C1(C)C YAXWOADCWUUUNX-UHFFFAOYSA-N 0.000 claims description 16
- 150000002118 epoxides Chemical class 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 9
- -1 alkyl lithium Chemical compound 0.000 claims description 9
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical group CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims description 6
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 150000003335 secondary amines Chemical class 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- CETVQRFGPOGIQJ-UHFFFAOYSA-N lithium;hexane Chemical compound [Li+].CCCCC[CH2-] CETVQRFGPOGIQJ-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 125000006272 (C3-C7) cycloalkyl group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 238000005888 cyclopropanation reaction Methods 0.000 claims description 2
- 229940043279 diisopropylamine Drugs 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000008346 aqueous phase Substances 0.000 description 3
- XENVCRGQTABGKY-ZHACJKMWSA-N chlorohydrin Chemical compound CC#CC#CC#CC#C\C=C\C(Cl)CO XENVCRGQTABGKY-ZHACJKMWSA-N 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- JCIVHYBIFRUGKO-UHFFFAOYSA-N lithium;2,2,6,6-tetramethylpiperidine Chemical compound [Li].CC1(C)CCCC(C)(C)N1 JCIVHYBIFRUGKO-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000005595 deprotonation Effects 0.000 description 1
- 238000010537 deprotonation reaction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 230000000707 stereoselective effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
- C07C29/56—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by isomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/07—Optical isomers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/02—Systems containing two condensed rings the rings having only two atoms in common
- C07C2602/14—All rings being cycloaliphatic
- C07C2602/18—All rings being cycloaliphatic the ring system containing six carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Hydrogenated Pyridines (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
のエポキシドの分子内シクロプロパン化を含む前記方法、を提供する。適切には、該二級アミン塩基は、ジイソプロピルアミンまたはテトラメチルピペリジンであり、好ましくはテトラメチルピペリジンである。好都合には、該アルキルリチウム塩基は、1当量超過で存在するブチルリチウムである。適切にはブチルリチウムの1.0から1.25当量、および好ましくは約1.1当量が存在する。該アルキルリチウム塩基は、該二級アミン塩基を脱プロトン化する働きをし、それにより該エポキシドの脱プロトン化および環化の誘発を促進する。従って、エポキシド存在下におけるアルキルリチウムの濃度を最小限に抑えるために、該アルキルリチウムをゆっくり加えることが好ましい。
Claims (10)
- 二級アミン塩基が、ジイソプロピルアミンまたはテトラメチルピペリジンである、請求項1に記載の方法。
- 二級アミン塩基が、テトラメチルピペリジンである、請求項2に記載の方法。
- 0.1から0.5当量のテトラメチルピペリジンが存在する、請求項3に記載の方法。
- アルキルリチウム塩基が、ブチルリチウムである、請求項1から4のいずれかに記載の方法。
- ブチルリチウムの1当量超過が存在する、請求項5に記載の方法。
- エポキシド存在下におけるアルキルリチウムの濃度を最小限に抑えるために、アルキルリチウムをゆっくり加える、請求項1から6のいずれかに記載の方法。
- R、R1、R2およびR3が、各々独立して、水素、メチル、エチルおよびイソプロピルから選択される、請求項1から7のいずれかに記載の方法。
- エポキシドおよびテトラメチルピペリジンを最初に適した溶媒中で混合し、次に混合物を冷却し、反応が完了するまで低温を保ちながらn−ブチルリチウムまたはn−ヘキシルリチウムを加える、請求項1に記載の方法。
- 反応が、エーテル系溶媒中で実施される、請求項1から9のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0515926.4 | 2005-08-03 | ||
GBGB0515926.4A GB0515926D0 (en) | 2005-08-03 | 2005-08-03 | Chemical process |
PCT/GB2006/050227 WO2007015111A1 (en) | 2005-08-03 | 2006-08-01 | A process for the preparation of bicyclo[3.1.0]hexanols |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009503046A JP2009503046A (ja) | 2009-01-29 |
JP5243955B2 true JP5243955B2 (ja) | 2013-07-24 |
Family
ID=34983980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008524593A Expired - Fee Related JP5243955B2 (ja) | 2005-08-03 | 2006-08-01 | ビシクロ[3.1.0]ヘキサノールの調製方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7834222B2 (ja) |
EP (1) | EP1912924A1 (ja) |
JP (1) | JP5243955B2 (ja) |
CN (1) | CN101253140B (ja) |
AU (1) | AU2006274689B2 (ja) |
CA (1) | CA2616724C (ja) |
GB (1) | GB0515926D0 (ja) |
WO (1) | WO2007015111A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8168799B2 (en) | 2005-04-28 | 2012-05-01 | Merck Sharpe & Dohme Ltd. | Process for the preparation of tetrazolytetrahydrocyclopentapyrazoles |
GB0716232D0 (en) | 2007-08-21 | 2007-09-26 | Givaudan Sa | Cyclopropanation process |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19858855A1 (de) * | 1998-12-19 | 2000-06-21 | Merck Patent Gmbh | Verfahren zur Herstellung von ortho-substituierten Arylmetallverbindungen und deren Umsetzung mit Elektrophilen |
US8168799B2 (en) | 2005-04-28 | 2012-05-01 | Merck Sharpe & Dohme Ltd. | Process for the preparation of tetrazolytetrahydrocyclopentapyrazoles |
-
2005
- 2005-08-03 GB GBGB0515926.4A patent/GB0515926D0/en not_active Ceased
-
2006
- 2006-08-01 US US11/989,885 patent/US7834222B2/en not_active Expired - Fee Related
- 2006-08-01 CA CA2616724A patent/CA2616724C/en not_active Expired - Fee Related
- 2006-08-01 JP JP2008524593A patent/JP5243955B2/ja not_active Expired - Fee Related
- 2006-08-01 WO PCT/GB2006/050227 patent/WO2007015111A1/en active Application Filing
- 2006-08-01 CN CN2006800284204A patent/CN101253140B/zh not_active Expired - Fee Related
- 2006-08-01 AU AU2006274689A patent/AU2006274689B2/en not_active Ceased
- 2006-08-01 EP EP06765375A patent/EP1912924A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB0515926D0 (en) | 2005-09-07 |
JP2009503046A (ja) | 2009-01-29 |
CN101253140B (zh) | 2012-06-13 |
WO2007015111A8 (en) | 2007-03-29 |
AU2006274689A1 (en) | 2007-02-08 |
AU2006274689B2 (en) | 2011-11-17 |
CA2616724A1 (en) | 2007-02-08 |
CA2616724C (en) | 2013-05-14 |
US20100099923A1 (en) | 2010-04-22 |
US7834222B2 (en) | 2010-11-16 |
EP1912924A1 (en) | 2008-04-23 |
CN101253140A (zh) | 2008-08-27 |
WO2007015111A1 (en) | 2007-02-08 |
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