JP5227491B2 - 表示装置 - Google Patents
表示装置 Download PDFInfo
- Publication number
- JP5227491B2 JP5227491B2 JP2004356959A JP2004356959A JP5227491B2 JP 5227491 B2 JP5227491 B2 JP 5227491B2 JP 2004356959 A JP2004356959 A JP 2004356959A JP 2004356959 A JP2004356959 A JP 2004356959A JP 5227491 B2 JP5227491 B2 JP 5227491B2
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- emitting element
- transistor
- display
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 238000005070 sampling Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 238000002347 injection Methods 0.000 description 10
- 239000007924 injection Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
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- 239000013078 crystal Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
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- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010000 carbonizing Methods 0.000 description 2
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- 238000007562 laser obscuration time method Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
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- 229920005989 resin Polymers 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Landscapes
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Control Of El Displays (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004356959A JP5227491B2 (ja) | 2003-12-18 | 2004-12-09 | 表示装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003421599 | 2003-12-18 | ||
| JP2003421599 | 2003-12-18 | ||
| JP2004356959A JP5227491B2 (ja) | 2003-12-18 | 2004-12-09 | 表示装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005202371A JP2005202371A (ja) | 2005-07-28 |
| JP2005202371A5 JP2005202371A5 (enExample) | 2008-01-24 |
| JP5227491B2 true JP5227491B2 (ja) | 2013-07-03 |
Family
ID=34829304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004356959A Expired - Fee Related JP5227491B2 (ja) | 2003-12-18 | 2004-12-09 | 表示装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5227491B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8004481B2 (en) * | 2005-12-02 | 2011-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| JP5364235B2 (ja) * | 2005-12-02 | 2013-12-11 | 株式会社半導体エネルギー研究所 | 表示装置 |
| CN101313348B (zh) * | 2005-12-02 | 2011-07-06 | 株式会社半导体能源研究所 | 半导体器件、显示设备以及电子设备 |
| JP5294274B2 (ja) * | 2008-02-08 | 2013-09-18 | シャープ株式会社 | 画素回路および表示装置 |
| TWI653755B (zh) | 2013-09-12 | 2019-03-11 | 日商新力股份有限公司 | 顯示裝置、其製造方法及電子機器 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4869497B2 (ja) * | 2001-05-30 | 2012-02-08 | 株式会社半導体エネルギー研究所 | 表示装置 |
| JP4067875B2 (ja) * | 2001-06-01 | 2008-03-26 | 株式会社半導体エネルギー研究所 | アクティブマトリクス型発光装置の修理方法及び作製方法 |
| JP2003308030A (ja) * | 2002-02-18 | 2003-10-31 | Sanyo Electric Co Ltd | 表示装置 |
| JP4024557B2 (ja) * | 2002-02-28 | 2007-12-19 | 株式会社半導体エネルギー研究所 | 発光装置、電子機器 |
| JP2003280576A (ja) * | 2002-03-26 | 2003-10-02 | Sanyo Electric Co Ltd | アクティブマトリクス型有機el表示装置 |
| JP3986051B2 (ja) * | 2002-04-30 | 2007-10-03 | 株式会社半導体エネルギー研究所 | 発光装置、電子機器 |
| JP2005017485A (ja) * | 2003-06-24 | 2005-01-20 | Seiko Epson Corp | 電気光学装置、電気光学装置の駆動方法、及び電子機器 |
| JP2005140827A (ja) * | 2003-11-04 | 2005-06-02 | Tohoku Pioneer Corp | 発光表示パネルの駆動装置 |
-
2004
- 2004-12-09 JP JP2004356959A patent/JP5227491B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005202371A (ja) | 2005-07-28 |
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