JP5226174B2 - ナノ構造体、そのようなナノ構造体を有する電子機器およびナノ構造体を調製する方法 - Google Patents
ナノ構造体、そのようなナノ構造体を有する電子機器およびナノ構造体を調製する方法 Download PDFInfo
- Publication number
- JP5226174B2 JP5226174B2 JP2004549437A JP2004549437A JP5226174B2 JP 5226174 B2 JP5226174 B2 JP 5226174B2 JP 2004549437 A JP2004549437 A JP 2004549437A JP 2004549437 A JP2004549437 A JP 2004549437A JP 5226174 B2 JP5226174 B2 JP 5226174B2
- Authority
- JP
- Japan
- Prior art keywords
- nanostructure
- dopant
- electrode
- substrate
- growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002086 nanomaterial Substances 0.000 title claims description 62
- 238000000034 method Methods 0.000 title claims description 27
- 239000002071 nanotube Substances 0.000 claims description 58
- 239000000758 substrate Substances 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 27
- 239000002019 doping agent Substances 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000011148 porous material Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims description 7
- 230000007704 transition Effects 0.000 claims description 7
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 150000002484 inorganic compounds Chemical class 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000002070 nanowire Substances 0.000 description 19
- 239000013078 crystal Substances 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 12
- 238000003917 TEM image Methods 0.000 description 9
- 239000010931 gold Substances 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000002270 dispersing agent Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000005424 photoluminescence Methods 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000006399 behavior Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000013590 bulk material Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 150000002343 gold Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000024 high-resolution transmission electron micrograph Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000001429 visible spectrum Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000005428 wave function Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PNZVFASWDSMJER-UHFFFAOYSA-N acetic acid;lead Chemical compound [Pb].CC(O)=O PNZVFASWDSMJER-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052950 sphalerite Inorganic materials 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical compound [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004354 sulfur functional group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- -1 transition metal chalcogenides Chemical class 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02543—Phosphides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02606—Nanotubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02653—Vapour-liquid-solid growth
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
- H01L33/18—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
Description
基板の導電性表面に導電性材料の成長核を提供するステップと、
成長温度での化学蒸着によってナノ構造体を提供するステップと、
を有する。
基板の導電性表面に導電性材料の成長核を提供するステップであって、前記表面は第1の電極を定形するようにパターン化される、ステップと、
成長温度での化学蒸着によって、化合物半導体材料のナノ構造体を成長させるステップと、
成長した前記ナノ構造体と電気的に接続された第2の電極を提供するステップと、
を有する。
C.M. Lieberら、「ネイチャー」、415巻、p617-620、2002年 K. Hirumaら、「Appl. Phys. Lett.」、60巻、p745-747、1992年
InPナノチューブは、半導体ナノワイヤで用いられる方法と同様の、VLS成長法で合成した。ただし合成温度はより高温である。シリコン基板には酸化表面(「自然酸化物」)、およびその上に薄い(2乃至10Åの)金薄膜が設けられる。この基板をAl2O3ブロック上に設置し、これらを管状炉の下流端部に設置した。基板温度は、Al2O3ブロック内の基板から1mm深さの位置で測定した。炉内は10Pa以下に減圧した。その後100乃至300sccmのArを流して、圧力を3×104Paに設定した。処理炉は、金層が分離してナノメートルレベルのクラスターの生じる500℃まで昇温した。処理炉の上流端にInPターゲット(密度65%)を設置して、ArFレーザー(λ=193nm、100mJ/パルス、10Hz)を用いて、InPをターゲットから融発させた。InPは気化して基板上に輸送される。その結果、金クラスターの触媒作用の下、ナノ構造体が成長する。
(実施例2)
別の実施例では、成長評価試験を行った。この例ではターゲットはドーパント原子を含むものに変更した。この方法では、ナノチューブは電気的にドープされ、p型およびn型半導体を構成する。しかしながら、添加されるドーパントはナノチューブの成長挙動に影響を及ぼす。ドーパントがある場合、異なる形態、すなわち部分的にInP結晶が充填されたナノチューブが観測された。得られる形態は、InPターゲットに添加するドーパントおよび基板温度に依存した。
図6には、発光ダイオードを有する本装置10の実施例を示す。装置10は、第1の導電性層の設置された基板1を有し、第1の導電性層は第1の電極2を定形する。基板1は、絶縁材料からなり、例えばこの場合Al2O3であって、導電性層は、この例ではTiを有する。導電性層2は、図示されていない画素スイッチおよび駆動回路に接続される。ただし、これらの画素スイッチは、例えばポリシリコンまたはアモルファスシリコンのトランジスタとして、基板1に設けることも可能である。第1の電極2上には多孔質マトリックス3が設置され、このポアには、第1の領域5および第2の領域6を有するInPのナノチューブ4が充填され、第1の領域は第1のドーパントSeでドープされたp型となっており、第2の領域は第2のドーパントZnでドープされたn型となっている。第1および第2の領域5、6の相互界面7にはp-n接合が存在する。多孔質マトリクスの上部表面14には、ITOの第2の透明電極8が設けられる。このスタックは発光ダイオードを構成する。当業者には明らかなように、基板1上には複数の発光ダイオードが設けられることが好ましい。
(実施例3)
図7には、本発明の方法の3つのステップの概略断面図を示す。図7Aには、ホウケイ酸ガラスの担体1を有する基板10を示す。基板の上には導電性層2が設けられ、この層はAlを有する。その上には、500℃のホットフィルム化学蒸着反応器内で、この場合は金の核11によって、ナノチューブ3が成長する。ナノチューブ4は、径が約10nmで100-200nmの全長まで成長する。
(実施例4)
図8には、半導体装置100の概略断面図を示す。この例の場合、本装置は薄膜トランジスタである。ガラス基板110上には、ソース電極101とドレイン電極102が設けられる。電極101、102は、例えば金を有し、写真パターン転写技術によって定形される。他の金属、例えばAl/TiまたはAu/Ni/Geも同様に使用できる。電極101、102は、チャンネル105によって相互に分離される。チャンネルは誘電体を有し、この誘電体は、低誘電率であることが好ましい。適切な材料は当業者には明らかであり、シリコン酸化物および水素化物、メチルシルセスキオキサン、多孔質シリカ、SiLKならびにベンゾシクロブテン等である。材料の選定は、基板の選定にも依存する。電極101、102の表面111およびチャンネル105は平坦化され、実質的に平坦な表面111にナノ構造体4が提供される。
Claims (7)
- 少なくとも一つの無機半導体のナノ構造体を介して相互に接続される、第1および第2の電極を有する発光電子機器であって、
前記ナノ構造体は、
結晶質外殻と中空コアを有するナノチューブを有し、
p型にドーピングされた第1の領域と、n型にドーピングされた第2の領域を有し、前記第1および第2の領域は、pn接合を構成する相互界面を有することを特徴とする発光電子機器。 - 前記中空コアの径は2乃至20nmの範囲にあることを特徴とする請求項1に記載の機器。
- 前記外殻の厚さは、1乃至20nmの範囲にあることを特徴とする請求項1または2に記載の機器。
- 前記中空コアには、前記ナノチューブの前記外殻を構成する化合物半導体が、部分的に充填されていることを特徴とする請求項1に記載の機器。
- 前記無機半導体材料は、III-V族の半導体材料の群から選択されることを特徴とする請求項1に記載の機器。
- 実質的に相互に平行なポアを有する絶縁基板を有し、前記ポアは前記第1の電極から前記第2の電極まで延び、ポア内に前記ナノ構造体が設置されることを特徴とする請求項1に記載の発光電子機器。
- 発光電子機器の製造方法であって、
基板の導電性表面に導電性材料の成長核を提供するステップであって、前記基板は第1の電極を定形するようにパターン化される、ステップと、
成長温度での化学蒸着によって、無機化合物半導体材料のナノ構造体を成長させるステップと、
成長形成した前記ナノ構造体と電気的に接続された第2の電極を提供するステップと、
を有し、
前記成長温度は、成長期間中は遷移温度より高い温度あって、それにより結晶質外殻と中空コアを有するナノチューブが得られ、
前記成長期間には、化学蒸着反応器内において、第1のドーパントが蒸気に添加され、次に第2のドーパントが添加され、前記第1のドーパントは第1のドーピング型であって、前記第2のドーパントは第2のドーピング型であることを特徴とする製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02079617 | 2002-11-05 | ||
EP02079617.3 | 2002-11-05 | ||
PCT/IB2003/004693 WO2004042830A1 (en) | 2002-11-05 | 2003-10-23 | Nanostructure, electronic device having such nanostructure and method of preparing nanostructure |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006505477A JP2006505477A (ja) | 2006-02-16 |
JP5226174B2 true JP5226174B2 (ja) | 2013-07-03 |
Family
ID=32309403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004549437A Expired - Lifetime JP5226174B2 (ja) | 2002-11-05 | 2003-10-23 | ナノ構造体、そのようなナノ構造体を有する電子機器およびナノ構造体を調製する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060022191A1 (ja) |
EP (1) | EP1563547B1 (ja) |
JP (1) | JP5226174B2 (ja) |
KR (1) | KR101089123B1 (ja) |
CN (1) | CN100459181C (ja) |
AU (1) | AU2003274418A1 (ja) |
WO (1) | WO2004042830A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4576603B2 (ja) * | 2004-05-26 | 2010-11-10 | 独立行政法人物質・材料研究機構 | リン化インジウムナノチューブの製造方法 |
GB0415891D0 (en) * | 2004-07-16 | 2004-08-18 | Koninkl Philips Electronics Nv | Nanoscale fet |
KR100647288B1 (ko) * | 2004-09-13 | 2006-11-23 | 삼성전자주식회사 | 나노와이어 발광소자 및 그 제조방법 |
JP5349956B2 (ja) * | 2005-04-25 | 2013-11-20 | スモルテック エービー | ナノ構造体の基板上への制御下の成長およびそれに基づく電子放出デバイス |
EP1727216B1 (en) * | 2005-05-24 | 2019-04-24 | LG Electronics, Inc. | Rod type light emitting diode and method for fabricating the same |
US7777291B2 (en) | 2005-08-26 | 2010-08-17 | Smoltek Ab | Integrated circuits having interconnects and heat dissipators based on nanostructures |
WO2007024186A2 (en) * | 2005-08-26 | 2007-03-01 | Smoltek Ab | Interconnects and heat dissipators based on nanostructures |
EP1791186A1 (en) * | 2005-11-25 | 2007-05-30 | Stormled AB | Light emitting diode and method for manufacturing the same |
JP2008108924A (ja) * | 2006-10-26 | 2008-05-08 | Matsushita Electric Works Ltd | 化合物半導体発光素子およびそれを用いる照明装置ならびに化合物半導体発光素子の製造方法 |
WO2008054283A1 (en) * | 2006-11-01 | 2008-05-08 | Smoltek Ab | Photonic crystals based on nanostructures |
JP5535915B2 (ja) | 2007-09-12 | 2014-07-02 | スモルテック アーベー | ナノ構造体による隣接層の接続および接合 |
JP2009140975A (ja) * | 2007-12-04 | 2009-06-25 | Panasonic Electric Works Co Ltd | 半導体発光装置およびそれを用いる照明装置ならびに半導体発光装置の製造方法 |
US8624224B2 (en) * | 2008-01-24 | 2014-01-07 | Nano-Electronic And Photonic Devices And Circuits, Llc | Nanotube array bipolar transistors |
US8610125B2 (en) * | 2008-01-24 | 2013-12-17 | Nano-Electronic And Photonic Devices And Circuits, Llc | Nanotube array light emitting diodes |
US8610104B2 (en) | 2008-01-24 | 2013-12-17 | Nano-Electronic And Photonic Devices And Circuits, Llc | Nanotube array injection lasers |
EP2250661B1 (en) | 2008-02-25 | 2020-04-08 | Smoltek AB | Deposition and selective removal of conducting helplayer for nanostructure processing |
US8129728B2 (en) * | 2009-10-22 | 2012-03-06 | Walsin Lihwa Corporation | Light emitting device and method for enhancing light extraction thereof |
FR2951875B1 (fr) | 2009-10-23 | 2012-05-18 | Commissariat Energie Atomique | Procede de fabrication d?un ecran a tres haute resolution utilisant une couche conductrice anisotropique et emissive |
US8840799B2 (en) | 2011-12-01 | 2014-09-23 | Toyota Motor Engineering & Manufacturing North America, Inc. | Binary thermoelectric material containing nanoparticles and process for producing the same |
US8754397B2 (en) * | 2011-12-07 | 2014-06-17 | Nano-Electronic And Photonic Devices And Circuits, Llc | CNT-based electronic and photonic devices |
KR102184673B1 (ko) * | 2013-08-14 | 2020-12-01 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 유기 발광 표시 장치의 제조 방법 |
WO2018015368A1 (en) | 2016-07-22 | 2018-01-25 | Philips Lighting Holding B.V. | Nano-light source emitting polarized light |
JP6669608B2 (ja) * | 2016-08-03 | 2020-03-18 | 日本電信電話株式会社 | 半導体ナノワイヤレーザーおよびその製造方法 |
US10186584B2 (en) * | 2016-08-18 | 2019-01-22 | Uchicago Argonne, Llc | Systems and methods for forming diamond heterojunction junction devices |
US10739299B2 (en) * | 2017-03-14 | 2020-08-11 | Roche Sequencing Solutions, Inc. | Nanopore well structures and methods |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6538262B1 (en) * | 1996-02-02 | 2003-03-25 | The Regents Of The University Of California | Nanotube junctions |
US5846883A (en) * | 1996-07-10 | 1998-12-08 | Cvc, Inc. | Method for multi-zone high-density inductively-coupled plasma generation |
JP3902883B2 (ja) * | 1998-03-27 | 2007-04-11 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
US6833980B1 (en) * | 1999-05-10 | 2004-12-21 | Hitachi, Ltd. | Magnetoelectric device |
JP3600126B2 (ja) * | 1999-07-29 | 2004-12-08 | シャープ株式会社 | 電子源アレイ及び電子源アレイの駆動方法 |
WO2001057917A2 (en) * | 2000-02-07 | 2001-08-09 | Xidex Corporation | System and method for fabricating logic devices comprising carbon nanotube transistors |
KR100862131B1 (ko) * | 2000-08-22 | 2008-10-09 | 프레지던트 앤드 펠로우즈 오브 하버드 칼리지 | 반도체 나노와이어 제조 방법 |
US7032437B2 (en) * | 2000-09-08 | 2006-04-25 | Fei Company | Directed growth of nanotubes on a catalyst |
EP1374309A1 (en) * | 2001-03-30 | 2004-01-02 | The Regents Of The University Of California | Methods of fabricating nanostructures and nanowires and devices fabricated therefrom |
CN1155516C (zh) * | 2001-04-23 | 2004-06-30 | 南京大学 | 一种bn纳米管及其制法 |
CA2471842A1 (en) * | 2001-07-27 | 2003-02-13 | Eikos, Inc. | Conformal coatings comprising carbon nanotubes |
SG126710A1 (en) * | 2001-10-31 | 2006-11-29 | Univ Singapore | Carbon nanotubes fabrication and hydrogen production |
-
2003
- 2003-10-23 EP EP03758398.6A patent/EP1563547B1/en not_active Expired - Lifetime
- 2003-10-23 AU AU2003274418A patent/AU2003274418A1/en not_active Abandoned
- 2003-10-23 WO PCT/IB2003/004693 patent/WO2004042830A1/en active Application Filing
- 2003-10-23 CN CNB2003801027764A patent/CN100459181C/zh not_active Expired - Lifetime
- 2003-10-23 US US10/533,509 patent/US20060022191A1/en not_active Abandoned
- 2003-10-23 JP JP2004549437A patent/JP5226174B2/ja not_active Expired - Lifetime
- 2003-10-23 KR KR1020057007821A patent/KR101089123B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN1711648A (zh) | 2005-12-21 |
CN100459181C (zh) | 2009-02-04 |
EP1563547B1 (en) | 2018-12-26 |
AU2003274418A1 (en) | 2004-06-07 |
EP1563547A1 (en) | 2005-08-17 |
KR20050073603A (ko) | 2005-07-14 |
WO2004042830A1 (en) | 2004-05-21 |
KR101089123B1 (ko) | 2011-12-05 |
JP2006505477A (ja) | 2006-02-16 |
US20060022191A1 (en) | 2006-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5226174B2 (ja) | ナノ構造体、そのようなナノ構造体を有する電子機器およびナノ構造体を調製する方法 | |
US9202975B2 (en) | Light emitting diode including graphene layer | |
KR101147053B1 (ko) | 나노구조체 및 그 제조 방법 | |
CN101443887B (zh) | Gan纳米线的脉冲式生长及在族ⅲ氮化物半导体衬底材料中的应用和器件 | |
US8039854B2 (en) | Pulsed growth of catalyst-free growth of GaN nanowires and application in group III nitride semiconductor bulk material | |
US7638345B2 (en) | Method of manufacturing silicon nanowires and device comprising silicon nanowires formed by the same | |
US7968359B2 (en) | Thin-walled structures | |
US8895958B2 (en) | Light emitting element and method for manufacturing same | |
US9190565B2 (en) | Light emitting diode | |
KR20060121225A (ko) | 반도체 나노와이어의 세트를 제조하는 방법, 전기 장치 및그 제조 방법, 광 유도 에칭을 위한 장치 | |
TW201020206A (en) | Defect-free group III-nitride nanostructures and devices using pulsed and non-pulsed growth techniques | |
JP2005532181A5 (ja) | ||
KR20120105037A (ko) | 산화아연 나노로드를 이용한 레이저 다이오드 및 그 제조 방법 | |
US20140306256A1 (en) | Light emitting diode | |
JP4603370B2 (ja) | 基板上に作製された半導体光デバイスおよびその作製方法 | |
Yan | Controlled growth of semiconductor nanostructures and their optical and electrical properties | |
JP2009182354A (ja) | 基板上に作製された半導体光デバイスおよびその作製方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061020 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100223 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100519 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110614 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110913 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110921 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111213 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120918 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130115 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20130122 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130219 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130314 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5226174 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160322 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160322 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |