JP5223015B2 - 極端紫外光源装置 - Google Patents
極端紫外光源装置 Download PDFInfo
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- JP5223015B2 JP5223015B2 JP2012030228A JP2012030228A JP5223015B2 JP 5223015 B2 JP5223015 B2 JP 5223015B2 JP 2012030228 A JP2012030228 A JP 2012030228A JP 2012030228 A JP2012030228 A JP 2012030228A JP 5223015 B2 JP5223015 B2 JP 5223015B2
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- laser
- light
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- extreme ultraviolet
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- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 11
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000005457 Black-body radiation Effects 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
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- 239000005357 flat glass Substances 0.000 description 1
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
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- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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Images
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012030228A JP5223015B2 (ja) | 2012-02-15 | 2012-02-15 | 極端紫外光源装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012030228A JP5223015B2 (ja) | 2012-02-15 | 2012-02-15 | 極端紫外光源装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007127777A Division JP4932592B2 (ja) | 2007-05-14 | 2007-05-14 | 極端紫外光源装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012095210A Division JP5511882B2 (ja) | 2012-04-19 | 2012-04-19 | 極端紫外光源装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012104861A JP2012104861A (ja) | 2012-05-31 |
| JP2012104861A5 JP2012104861A5 (enrdf_load_stackoverflow) | 2012-07-12 |
| JP5223015B2 true JP5223015B2 (ja) | 2013-06-26 |
Family
ID=46394825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012030228A Active JP5223015B2 (ja) | 2012-02-15 | 2012-02-15 | 極端紫外光源装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5223015B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6252358B2 (ja) * | 2014-05-27 | 2017-12-27 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| JP7426299B2 (ja) | 2020-06-26 | 2024-02-01 | ギガフォトン株式会社 | 極端紫外光生成システム及び電子デバイスの製造方法 |
| JP7657877B1 (ja) | 2023-09-25 | 2025-04-07 | レーザーテック株式会社 | 光源装置、検査装置、露光装置、光源制御方法、検査方法及び露光方法 |
| JP7657878B1 (ja) | 2023-09-25 | 2025-04-07 | レーザーテック株式会社 | 光源装置、検査装置、露光装置、光源制御方法、検査方法及び露光方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3363835B2 (ja) * | 1999-06-07 | 2003-01-08 | 住友重機械工業株式会社 | 戻り光除去方法と装置 |
| JP2000357835A (ja) * | 1999-06-15 | 2000-12-26 | Amada Eng Center Co Ltd | レーザ発振器 |
| JP2002280322A (ja) * | 2001-03-15 | 2002-09-27 | Ishikawajima Harima Heavy Ind Co Ltd | レーザ照射装置及びレーザ照射方法 |
| JP4875879B2 (ja) * | 2005-10-12 | 2012-02-15 | 株式会社小松製作所 | 極端紫外光源装置の初期アライメント方法 |
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2012
- 2012-02-15 JP JP2012030228A patent/JP5223015B2/ja active Active
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| Publication number | Publication date |
|---|---|
| JP2012104861A (ja) | 2012-05-31 |
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