JP5219377B2 - Substrate mounting table and substrate processing apparatus - Google Patents

Substrate mounting table and substrate processing apparatus Download PDF

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JP5219377B2
JP5219377B2 JP2007008862A JP2007008862A JP5219377B2 JP 5219377 B2 JP5219377 B2 JP 5219377B2 JP 2007008862 A JP2007008862 A JP 2007008862A JP 2007008862 A JP2007008862 A JP 2007008862A JP 5219377 B2 JP5219377 B2 JP 5219377B2
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mounting table
substrate
upper member
main body
lower member
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JP2007277702A (en
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穣一 潮田
毅 伊藤
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Tokyo Electron Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32715Workpiece holder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
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Description

本発明は、液晶表示装置(LCD)等のフラットパネルディスプレイ(FPD)製造用のガラス基板や半導体ウエハなどの基板に対してドライエッチング等の処理を施す基板処理装置において処理容器内で基板を載置する基板載置台およびこの基板載置台を適用した基板処理装置に関する。   The present invention provides a substrate processing apparatus for performing a process such as dry etching on a glass substrate or a semiconductor wafer for manufacturing a flat panel display (FPD) such as a liquid crystal display (LCD). The present invention relates to a substrate mounting table to be placed and a substrate processing apparatus to which the substrate mounting table is applied.

例えば、FPDや半導体の製造プロセスにおいては、被処理基板であるガラス基板や半導体ウエハに対して、ドライエッチングやスパッタリング、CVD(化学気相成長)等の各種処理が行われる。   For example, in FPD and semiconductor manufacturing processes, various processes such as dry etching, sputtering, and CVD (Chemical Vapor Deposition) are performed on glass substrates and semiconductor wafers that are substrates to be processed.

このような処理は、例えば、チャンバー内に設けられた基板載置台に基板を載置した状態で行われ、基板載置台に対する基板のローディングおよびアンローディングは基板載置台が備えている複数の昇降ピンを昇降させることにより行われる。すなわち、基板をローディングする際には、昇降ピンを載置台本体の表面から突出した状態として、搬送アームに載せられた基板をピンの上に移し替え、昇降ピンを下降させる。また、基板をアンローディングする際には、基板が載置台本体に載置されている状態から昇降ピンを上昇させて基板を載置台本体表面から上昇させ、その状態で基板を搬送アームに移し替える。このような技術は慣用技術であり、例えば特許文献1に開示されている。   Such processing is performed, for example, in a state in which the substrate is placed on the substrate mounting table provided in the chamber, and a plurality of lifting pins provided in the substrate mounting table are used for loading and unloading the substrate with respect to the substrate mounting table. This is done by raising and lowering. That is, when loading a substrate, the lifting pins are projected from the surface of the mounting table body, the substrate placed on the transfer arm is transferred onto the pins, and the lifting pins are lowered. Further, when unloading the substrate, the lifting pins are raised from the state where the substrate is placed on the mounting table body to raise the substrate from the surface of the mounting table body, and the substrate is transferred to the transfer arm in that state. . Such a technique is a conventional technique and is disclosed, for example, in Patent Document 1.

そして、FPD用のガラス基板に対してプラズマエッチングを行うエッチング装置の場合、チャンバー内に一対の平行平板電極(上部および下部電極)を配置し、基板載置台が下部電極として機能する。その場合には、基板面内において均一なプロセスを実現ために、昇降ピンを導電性材料である金属、例えばステンレス鋼(SUS)で構成する必要がある場合もある。   In the case of an etching apparatus that performs plasma etching on a glass substrate for FPD, a pair of parallel plate electrodes (upper and lower electrodes) are arranged in the chamber, and the substrate mounting table functions as a lower electrode. In that case, in order to realize a uniform process in the substrate surface, the elevating pins may need to be made of a metal which is a conductive material, for example, stainless steel (SUS).

ところで、LCDに代表されるFPD用のガラス基板は大型化が指向されており、一辺が2mを超えるような巨大なものも要求され、基板載置台も極めて大型化している。また、大型基板を支持するため、昇降ピンの数も多数必要となっている。このため、基板載置台自体が極めて高価なものとなっている。特に、エッチング装置の基板載置台は、上述したように下部電極として機能するため、冷却機構や給電機構等が取り付けられるため一層高価なものとなっている。   By the way, a glass substrate for FPD typified by LCD is directed to increase in size, a huge substrate having a side exceeding 2 m is required, and a substrate mounting table is extremely increased in size. In addition, in order to support a large substrate, a large number of lifting pins are required. For this reason, the substrate mounting table itself is extremely expensive. In particular, since the substrate mounting table of the etching apparatus functions as the lower electrode as described above, it is more expensive because a cooling mechanism, a power feeding mechanism, and the like are attached.

このような基板載置台は、多数設けられた昇降ピンが載置台本体内を昇降するため、昇降ピンが載置台本体から突出した状態で、搬送アームが昇降ピンに接触する等のトラブルが発生すると、基板載置台自体を損傷させるおそれがある。特に、上述したような、金属製の昇降ピンを用いた場合には、搬送アームの接触等の横方向の力により昇降ピン自体が曲がり、一連の搬送動作において昇降ピンが曲がったまま昇降動作してしまい、高価な基板載置台を損傷する可能性が高まる。このように載置台本体に損傷が生じると高価な基板載置台を交換する必要があり、装置コスト上昇の要因となってしまう。
特開平11−340208号公報
In such a substrate mounting table, since a large number of lifting pins are moved up and down in the mounting table body, troubles such as the transfer arm contacting the lifting pins occur while the lifting pins protrude from the mounting table body. There is a risk of damaging the substrate mounting table itself. In particular, when a metal lifting pin as described above is used, the lifting pin itself bends due to a lateral force such as contact of the transfer arm, and the lifting pin is bent and raised during a series of transfer operations. This increases the possibility of damaging an expensive substrate mounting table. When the mounting table main body is damaged in this way, it is necessary to replace the expensive substrate mounting table, which causes an increase in the apparatus cost.
JP 11-340208 A

本発明はかかる事情に鑑みてなされたものであって、昇降ピンによる載置台本体への損傷が生じ難い基板載置台、およびそのような基板載置台を備えた基板処理装置を提供することを目的とする。   The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate mounting table in which damage to the mounting table main body due to the lifting pins is less likely to occur, and a substrate processing apparatus including such a substrate mounting table. And

上記課題を解決するため、本発明の第1の観点では、基板処理装置において基板を載置する基板載置台であって、載置台本体と、前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとを具備し、前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、前記下部材は金属製であり、前記上部材は樹脂製であることを特徴とする基板載置台を提供する。
また、本発明の第2の観点では、基板処理装置において基板を載置する基板載置台であって、載置台本体と、前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとを具備し、前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、前記折部が前記上部材と前記下部材との接着部分を有している場合に、接着部分として導電接着剤を用いることを特徴とする基板載置台を提供する。
また、本発明の第3の観点では、基板処理装置において基板を載置する基板載置台であって、載置台本体と、前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとを具備し、前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、前記下部材は金属で形成されており、前記上部材は導電性樹脂で形成されていることを特徴とする基板載置台を提供する。
また、本発明の第4の観点では、基板処理装置において基板を載置する基板載置台であって、載置台本体と、前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとを具備し、前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、前記上部材は、金属製の心材とその外側を覆う樹脂部材とを有することを特徴とする基板載置台を提供する。
In order to solve the above problems, according to a first aspect of the present invention, there is provided a substrate mounting table for mounting a substrate in a substrate processing apparatus, wherein the substrate mounting table is vertically inserted into the mounting table main body and the mounting table main body. A lifting pin which is provided so as to be able to move up and down so as to project and sink with respect to the surface of the mounting table body, and which lifts and lowers by supporting the substrate at the tip thereof, the lifting pin being retracted in the mounting table body And a support position that protrudes from the mounting table main body and supports the substrate, and when it is in the supporting position, the lifting pin is deformed to a surface position of the mounting table main body or a position above it. A folding part that is folded when a lateral force having a predetermined magnitude smaller than the force to be applied is applied, a lower member that constitutes a lower part than the folding part, and an upper part that constitutes an upper part than the folding part. And the lower member is a metal. , And the upper member provides a substrate mounting table, characterized in that is made of resin.
According to a second aspect of the present invention, there is provided a substrate mounting table on which a substrate is mounted in a substrate processing apparatus, which is vertically inserted into the mounting table main body and the mounting table main body, and is a surface of the mounting table main body. And a lifting pin that supports the substrate at its tip and lifts and lowers, the lifting pin being retracted into the mounting table body, and the mounting table It is possible to take a support position that protrudes from the main body and supports the substrate, and when it is in the support position, it is smaller than the force that deforms the lifting pins at the surface position of the mounting table main body or a position above it. A folding part that is folded when a lateral force of a predetermined size is applied; a lower member that constitutes a lower part than the folding part; and an upper member that constitutes an upper part than the folding part The lower member and the upper member are conductive. And is connected so as to be electrically conducted from the tip of the upper member to the lower end of the lower member via the fold, and the fold has an adhesive portion between the upper member and the lower member. In this case, a substrate mounting table is provided in which a conductive adhesive is used as the bonding portion.
Moreover, in the 3rd viewpoint of this invention, it is a substrate mounting base which mounts a board | substrate in a substrate processing apparatus, Comprising: It is penetrated perpendicularly with respect to a mounting base main body and the above-mentioned mounting base main body, The surface of the above-mentioned mounting base main body And a lifting pin that supports the substrate at its tip and lifts and lowers, the lifting pin being retracted into the mounting table body, and the mounting table It is possible to take a support position that protrudes from the main body and supports the substrate, and when it is in the support position, it is smaller than the force that deforms the lifting pins at the surface position of the mounting table main body or a position above it. A folding part that is folded when a lateral force of a predetermined size is applied; a lower member that constitutes a lower part than the folding part; and an upper member that constitutes an upper part than the folding part The lower member and the upper member are conductive. And is connected so as to be electrically conducted from the tip of the upper member to the lower end of the lower member via the folding portion, the lower member is made of metal, and the upper member is conductive. Provided is a substrate mounting table which is formed of resin.
Moreover, in the 4th viewpoint of this invention, it is a substrate mounting base which mounts a board | substrate in a substrate processing apparatus, Comprising: It is penetrated perpendicularly with respect to a mounting base main body and the above-mentioned mounting base main body, The surface of the above-mentioned mounting base main body And a lifting pin that supports the substrate at its tip and lifts and lowers, the lifting pin being retracted into the mounting table body, and the mounting table It is possible to take a support position that protrudes from the main body and supports the substrate, and when it is in the support position, it is smaller than the force that deforms the lifting pins at the surface position of the mounting table main body or a position above it. A folding part that is folded when a lateral force of a predetermined size is applied; a lower member that constitutes a lower part than the folding part; and an upper member that constitutes an upper part than the folding part The lower member and the upper member are conductive. And is connected so as to be electrically connected to the lower end of the lower member through the folding portion, and the upper member is made of a metal core and a resin member covering the outside thereof. A substrate mounting table is provided.

上記第1から第4の観点において、前記昇降ピンは、前記下部材と上部材とが嵌合して構成されており、その嵌合部分が前記折部として機能するように構成してもよいし、前記下部材と前記上部材とが接着されて構成されており、その接着部分が前記折部として機能するように構成してもよいし、前記下部材と前記上部材とが嵌合し、かつその嵌合部分の少なくとも一部が接着されて構成されており、その嵌合部分および接着部分が前記折部として機能するように構成してもよい。あるいは、前記昇降ピンは、前記下部材と前記上部材との間に撓み変形可能な可撓部材が介在されて構成されており、前記可撓部材が前記折部として機能するように構成してもよい。 In a fourth aspect from the first, the lift pin is configured and pre-Symbol lower member and the upper member is fitted, be configured such that the fitting portion functions as the folding unit Alternatively, the lower member and the upper member may be bonded to each other, and the bonded portion may function as the folded portion, or the lower member and the upper member may be fitted together. In addition, at least a part of the fitting portion may be bonded, and the fitting portion and the bonding portion may function as the folding portion. Alternatively, the elevating pin is configured such that a flexible member that can be bent and deformed is interposed between the lower member and the upper member, and the flexible member functions as the folding portion. Also good.

上記第1から第4の観点において、前記昇降ピンは前記下部材と前記上部材との間に圧縮力を与える圧縮力付与部材をさらに有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記圧縮力が解除されて前記折部が折れるように構成することができる。この場合に、前記圧縮力付与部材としてコイルバネを用いることができる。 In the first to fourth aspects, the elevating pin further includes a compressive force applying member that applies a compressive force between the lower member and the upper member, and the elevating pin has a predetermined lateral direction. When the force is applied, the compression force is released and the folding portion can be folded. In this case, a coil spring can be used as the compressive force applying member.

また、前記昇降ピンは、前記上部材に対して上方向に付勢する付勢力を与える付勢力付与部材と、前記上部材に付勢力が与えられている状態で前記下部材と前記上部材とを連結する連結部材とをさらに有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記連結部材の連結が解除されて前記折部が折れるように構成することができる。この場合に、前記付勢力付与部材はコイルスプリングであり、前記連結部材は、前記下部材に固定される固定部と前記上部材に付勢力が付与されている際に前記上部材を係止する係止部とを有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記係止部の係止が解除されて前記折部が折れるように構成することができる。   Further, the elevating pin includes a biasing force applying member that applies a biasing force that biases the upper member upward, and the lower member and the upper member in a state in which a biasing force is applied to the upper member. A connecting member for connecting the connecting member, and when the lateral force of the predetermined magnitude is applied to the elevating pin, the connecting member is disconnected and the folding portion is folded. Can do. In this case, the urging force applying member is a coil spring, and the connecting member locks the upper member when the urging force is applied to the fixing portion fixed to the lower member and the upper member. A locking portion, and when the lateral force of the predetermined magnitude is applied to the lifting pin, the locking portion is unlocked and the folding portion is folded. it can.

上記第2または第4の観点において、前記下部材および前記上部材はいずれも金属で形成されていてもよい
また、第2から第4の観点において、前記上部材と前記下部材との間に前記可撓部材が介在され、前記下部材および前記上部材が導電性を有しているとき、前記可撓部材は導電性樹脂で構成されていてもよい。
た、このように前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続されている構成とした場合に、前記昇降ピンは前記載置台本体と同電位であることが好ましい。
In the second or fourth aspect, before Symbol lower member and the upper member may be formed of metal either.
In the second to fourth aspects, when the flexible member is interposed between the upper member and the lower member, and the lower member and the upper member have conductivity, the flexible member The member may be made of a conductive resin.
Also, in the case of such a said that folding portion from the tip of the upper member via a connected so as to be electrically conductive to the lower end of the lower member configuration, the lift pin and the mounting table body The same potential is preferable.

上記第1から第4の観点において、前記処理装置はプラズマ処理を行うものであり、前記載置台本体は下部電極として機能するものとすることができる。また、前記昇降ピンは、前記支持位置よりも上昇したメンテナンス位置をとることが可能である構成とすることができる。 In the first to fourth aspects, the processing apparatus performs plasma processing, and the mounting table main body functions as a lower electrode. Moreover, the said raising / lowering pin can be set as the structure which can take the maintenance position raised rather than the said support position.

本発明の第の観点では、基板を収容する処理容器と、前記処理容器内に設けられ、基板が載置される基板載置台と、前記処理室内で基板に対して所定の処理を施す処理機構とを具備し、前記基板載置台は上記第1の観点の構成を有する基板処理装置を提供する。 In a fifth aspect of the present invention, a processing container that accommodates a substrate, a substrate mounting table that is provided in the processing container and on which the substrate is placed, and a process that performs a predetermined process on the substrate in the processing chamber. A substrate processing apparatus having the configuration according to the first aspect.

上記第の観点において、前記処理機構は、前記処理容器内に処理ガスを供給するガス供給機構と、前記処理容器内を排気する排気機構と、前記処理容器内に前記処理ガスのプラズマを生成するプラズマ生成機構とを有する構成とすることができる。また、前記プラズマ生成機構は、下部電極として機能する前記基板載置台と、基板載置台に対向して設けられた上部電極と、基板載置台に高周波電力を印加する高周波電源とを有する構成とすることができる。 In the fifth aspect , the processing mechanism generates a gas for supplying a processing gas into the processing container, an exhaust mechanism for exhausting the processing container, and plasma of the processing gas in the processing container. And a plasma generation mechanism. The plasma generation mechanism includes the substrate mounting table that functions as a lower electrode, an upper electrode provided to face the substrate mounting table, and a high-frequency power source that applies high-frequency power to the substrate mounting table. be able to.

本発明によれば、昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部を有するので、支持位置にある昇降ピンの載置台本体表面から突出した部分に横方向の力が作用しても、昇降ピンが変形する前に折部において折れるので、昇降ピンが変形して直接的に載置台本体へ損傷を生じさせることや、昇降ピンが変形した状態のまま昇降動作されて載置台本体へ損傷を生じさせることを防止することができる。   According to the present invention, the elevating pin can take the retracted position submerged in the mounting table main body and the supporting position that protrudes from the mounting table main body and supports the substrate. In the support position, since it has a folding part at a surface position of the mounting table main body or a position above it, when a lateral force of a predetermined size smaller than a force that deforms the lifting pin is applied, Even if a lateral force acts on the part of the lifting pin protruding from the surface of the mounting table body, it breaks at the fold before the lifting pin is deformed, so the lifting pin deforms and directly damages the mounting table body. It is possible to prevent the mounting table main body from being damaged by moving up and down while the lifting pins are deformed.

以下、添付図面を参照して、本発明の実施形態について説明する。図1は、本発明の一実施形態に係る基板載置台としてのサセプタが設けられた処理装置の一例であるプラズマエッチング装置を示す断面図である。このプラズマエッチング装置1は、FPD用ガラス基板Gの所定の処理を行う装置の断面図であり、容量結合型平行平板プラズマエッチング装置として構成されている。ここで、FPDとしては、液晶ディスプレイ(LCD)、エレクトロルミネセンス(Electro Luminescence;EL)ディスプレイ、プラズマディスプレイパネル(PDP)等が例示される。   Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing a plasma etching apparatus as an example of a processing apparatus provided with a susceptor as a substrate mounting table according to an embodiment of the present invention. The plasma etching apparatus 1 is a cross-sectional view of an apparatus for performing a predetermined process on an FPD glass substrate G, and is configured as a capacitively coupled parallel plate plasma etching apparatus. Here, as FPD, a liquid crystal display (LCD), an electroluminescence (Electro Luminescence; EL) display, a plasma display panel (PDP), etc. are illustrated.

このプラズマエッチング装置1は、例えば表面がアルマイト処理(陽極酸化処理)されたアルミニウムからなる角筒形状に成形されたチャンバー2を有している。   This plasma etching apparatus 1 has a chamber 2 formed into a rectangular tube shape made of aluminum, for example, whose surface is anodized (anodized).

このチャンバー2内の底部には被処理基板であるガラス基板Gを載置するための基板載置台であるサセプタ4が設けられている。このサセプタ4は、サセプタ本体4aと、サセプタ本体4aへのガラス基板Gのローディングおよびアンローディングを行うための昇降ピン30とを有している。   A susceptor 4 as a substrate mounting table for mounting a glass substrate G as a substrate to be processed is provided at the bottom of the chamber 2. The susceptor 4 includes a susceptor body 4a and lifting pins 30 for loading and unloading the glass substrate G onto the susceptor body 4a.

サセプタ本体4aには、高周波電力を供給するための給電線23が接続されており、この給電線23には整合器24および高周波電源25が接続されている。高周波電源25からは例えば13.56MHzの高周波電力がサセプタ4に供給される。   The susceptor body 4a is connected to a power supply line 23 for supplying high-frequency power, and a matching unit 24 and a high-frequency power source 25 are connected to the power supply line 23. For example, high frequency power of 13.56 MHz is supplied from the high frequency power supply 25 to the susceptor 4.

前記サセプタ4の上方には、このサセプタ4と平行に対向して上部電極として機能するシャワーヘッド11が設けられている。シャワーヘッド11はチャンバー2の上部に支持されており、内部に内部空間12を有するとともに、サセプタ4との対向面に処理ガスを吐出する複数の吐出孔13が形成されている。このシャワーヘッド11は接地されており、サセプタ4とともに一対の平行平板電極を構成している。   Above the susceptor 4, a shower head 11 that functions as an upper electrode is provided in parallel with the susceptor 4. The shower head 11 is supported on the upper portion of the chamber 2, has an internal space 12 inside, and has a plurality of discharge holes 13 for discharging a processing gas on the surface facing the susceptor 4. The shower head 11 is grounded and forms a pair of parallel plate electrodes together with the susceptor 4.

シャワーヘッド11の上面にはガス導入口14が設けられ、このガス導入口14には、処理ガス供給管15が接続されており、この処理ガス供給管15には、バルブ16およびマスフローコントローラ17を介して、処理ガス供給源18が接続されている。処理ガス供給源18からは、エッチングのための処理ガスが供給される。処理ガスとしては、ハロゲン系のガス、Oガス、Arガス等、通常この分野で用いられるガスを用いることができる。 A gas inlet 14 is provided on the upper surface of the shower head 11, and a processing gas supply pipe 15 is connected to the gas inlet 14. A valve 16 and a mass flow controller 17 are connected to the processing gas supply pipe 15. A processing gas supply source 18 is connected to the via. A processing gas for etching is supplied from the processing gas supply source 18. As the processing gas, a gas usually used in this field, such as a halogen-based gas, an O 2 gas, or an Ar gas, can be used.

前記チャンバー2の底部には排気管19が形成されており、この排気管19には排気装置20が接続されている。排気装置20はターボ分子ポンプなどの真空ポンプを備えており、これによりチャンバー2内を所定の減圧雰囲気まで真空引き可能なように構成されている。また、チャンバー2の側壁には基板搬入出口21と、この基板搬入出口21を開閉するゲートバルブ22とが設けられており、このゲートバルブ22を開にした状態で基板Gが隣接するロードロック室(図示せず)との間で搬送されるようになっている。   An exhaust pipe 19 is formed at the bottom of the chamber 2, and an exhaust device 20 is connected to the exhaust pipe 19. The exhaust device 20 includes a vacuum pump such as a turbo molecular pump, and is configured so that the inside of the chamber 2 can be evacuated to a predetermined reduced pressure atmosphere. Further, a substrate loading / unloading port 21 and a gate valve 22 for opening and closing the substrate loading / unloading port 21 are provided on the side wall of the chamber 2, and a load lock chamber adjacent to the substrate G with the gate valve 22 opened. (Not shown).

次に、本発明の一実施形態に係る基板載置台であるサセプタ4について、図2に示す拡大図をも参照して詳細に説明する。
このサセプタ4は、上述したように、サセプタ本体4aと昇降ピン30とを有しており、サセプタ本体4aは、金属製の基材5と基材5の周縁に設けられた絶縁部材6とを有している。
Next, the susceptor 4 that is a substrate mounting table according to an embodiment of the present invention will be described in detail with reference to the enlarged view shown in FIG.
As described above, the susceptor 4 includes the susceptor body 4a and the lift pins 30. The susceptor body 4a includes a metal base 5 and an insulating member 6 provided on the periphery of the base 5. Have.

チャンバー2の底壁2aにはサセプタ本体4aの周縁部に対応するように絶縁体からなるスペーサ部材7が設けられており、その上にサセプタ本体4aが載せられている。スペーサ部材7と底壁2aとの間、スペーサ部材7とサセプタ本体4aとの間は気密にシールされており、サセプタ本体4aと底壁2aとの間に大気雰囲気の空間31が形成されている。そして、この空間31により大気絶縁が図られている。底壁2aには、サセプタ本体4aを支持するセラミックス等の絶縁体からなる複数の絶縁部材32が埋設されており、これら絶縁部材32の中心に鉛直に設けられた貫通孔に挿入されたボルト33により底壁2aとサセプタ本体4aが固定されるようになっている。   A spacer member 7 made of an insulator is provided on the bottom wall 2a of the chamber 2 so as to correspond to the peripheral edge of the susceptor body 4a, and the susceptor body 4a is placed thereon. The space between the spacer member 7 and the bottom wall 2a and the space between the spacer member 7 and the susceptor body 4a are hermetically sealed, and an air atmosphere space 31 is formed between the susceptor body 4a and the bottom wall 2a. . The space 31 is insulated from the atmosphere. A plurality of insulating members 32 made of an insulator such as ceramics supporting the susceptor body 4a are embedded in the bottom wall 2a, and bolts 33 inserted into through holes provided vertically at the centers of these insulating members 32. Thus, the bottom wall 2a and the susceptor body 4a are fixed.

サセプタ本体4aの上面、すなわち基材5の表面には、誘電体材料からなる複数の凸部5aが突起状に形成されており、これら凸部5aが絶縁部材6に周囲を囲まれた状態になっている。絶縁部材6aの上面と凸部5aの上面とは同じ高さとなっており、ガラス基板Gをサセプタ本体4aに載置する場合には、絶縁部材6の上面および凸部5aの上面に接触した状態とされる。   On the upper surface of the susceptor body 4a, that is, on the surface of the base material 5, a plurality of convex portions 5a made of a dielectric material are formed in a protruding shape, and these convex portions 5a are surrounded by the insulating member 6 It has become. The upper surface of the insulating member 6a and the upper surface of the convex portion 5a are the same height, and when the glass substrate G is placed on the susceptor body 4a, the upper surface of the insulating member 6 and the upper surface of the convex portion 5a are in contact with each other. It is said.

昇降ピン30は、サセプタ2の底壁に設けられた孔2bおよびサセプタ本体4aの基材5に設けられた孔5bに挿通されており、図3に示すように、ガラス基板Gの周縁部に相当する位置に10本、中央部に3本、合計13本設けられている。昇降ピン30は、図示しない駆動機構で昇降されるようになっており、処理中等のガラス基板Gの搬送を行っていない時には、サセプタ本体4a内に没した退避位置に位置し、ガラス基板Gのローディングおよびアンローディングの際には図2に示すようにサセプタ本体4aの表面から上方に突出した状態でガラス基板Gを支持する支持位置に位置するようになっている。また、昇降ピン30の下端には導電性のストッパ60がねじ止めされている。ストッパ60とサセプタ本体4aとの間には、真空雰囲気と大気雰囲気を遮断するための導電性のベローズ62が設けられている。したがって、昇降ピン30が導電性の場合には、昇降ピン30はベローズ62およびストッパ60を介してサセプタ本体4aと電気的に繋がることになり、同電位に保持される。ストッパ60の下には絶縁部材61が設けられている。   The elevating pin 30 is inserted into a hole 2b provided in the bottom wall of the susceptor 2 and a hole 5b provided in the base material 5 of the susceptor body 4a. As shown in FIG. A total of 13 lines are provided, 10 at the corresponding positions and 3 at the center. The elevating pins 30 are moved up and down by a drive mechanism (not shown). When the glass substrate G is not being transported during processing or the like, the elevating pins 30 are located at a retracted position immersed in the susceptor body 4a and At the time of loading and unloading, as shown in FIG. 2, the glass substrate G is positioned at a support position where it protrudes upward from the surface of the susceptor body 4a. A conductive stopper 60 is screwed to the lower end of the elevating pin 30. A conductive bellows 62 is provided between the stopper 60 and the susceptor body 4a to block the vacuum atmosphere and the air atmosphere. Therefore, when the elevating pin 30 is conductive, the elevating pin 30 is electrically connected to the susceptor body 4a via the bellows 62 and the stopper 60 and is held at the same potential. An insulating member 61 is provided under the stopper 60.

昇降ピン30には、支持位置にある時に、サセプタ本体4aの表面位置またはその僅かに上の位置に、昇降ピン30が変形する力よりも小さい所定の大きさの横方向の力が昇降ピン30の突出した部分に加えられた際に折れる折部35を有する。   When the lift pin 30 is in the support position, a lateral force having a predetermined magnitude smaller than the force by which the lift pin 30 deforms is applied to the surface position of the susceptor body 4a or a position slightly above it. It has the folding part 35 which bends when added to the protruding part.

すなわち、昇降ピン30は、下部材30aと上部材30bとを有しており、上記折部35においてこれらが接着されている。そして、昇降ピン30に所定値以上の負荷(力)が及ぼされることにより、折部35から折れるようになっている。   That is, the lifting pin 30 has a lower member 30a and an upper member 30b, and these are bonded to each other at the folding portion 35. Then, when a load (force) greater than or equal to a predetermined value is applied to the elevating pins 30, the folding pins 35 are bent.

具体的には、図4に示すように、折部35は、下部材30aの上端部中央に設けられた凹部36に上部材30bの下端部中央に設けられた凸部37が嵌め込まれ、かつ凹部36の底面と凸部37の先端との間に形成された接着剤層38を有している。凹部36および凸部37の高さや接着材層38の面積等を調節することにより、折部35から折れる際の力の最小値を調整することができる。これにより、ガラス基板Gの昇降動作の際には、折部35は変形せずに通常通りの動作が可能であるが、昇降ピン30に横から所定値以上の力が加わった時に、折部35から折れるようになっている。   Specifically, as shown in FIG. 4, the folding portion 35 has a convex portion 37 provided at the center of the lower end portion of the upper member 30b fitted in a concave portion 36 provided at the center of the upper end portion of the lower member 30a, and An adhesive layer 38 is formed between the bottom surface of the recess 36 and the tip of the projection 37. By adjusting the height of the concave portion 36 and the convex portion 37, the area of the adhesive layer 38, and the like, the minimum value of the force when folding from the folding portion 35 can be adjusted. Thereby, when the glass substrate G is moved up and down, the folding portion 35 can be operated as usual without being deformed. However, when a force exceeding a predetermined value is applied to the lifting pins 30 from the side, the folding portion It can be broken from 35.

折部35の直下位置には、昇降ピン30の取り付け取り外し等のメンテナンス時にスパナ等の工具を当てるメンテナンス部39が設けられている。従来この種のメンテナンスは、ガラス基板Gを支持する支持位置で行われており、したがって、メンテナンス部39はガラス基板Gが支持位置にあるときに図5の(a)に示すようにサセプタ本体4aの表面より上に出ている必要がある。このような状態を本実施形態に適用すると折部35がサセプタ本体4aの表面よりもかなり上方位置となる。しかし、昇降ピンの折れ位置は、理想的にはサセプタ本体4aの表面に近いほど好ましい。したがって、図5の(b)に示すように、支持位置においては、折部35の高さ位置をサセプタ本体4aの表面高さまたはそれよりも僅かに上になるようにして好ましい位置を確保した上で、昇降ピン30のさらなる停止位置としてこの支持位置よりもさらに上昇させたメンテナンス位置を新たに設け、図5の(c)に示すように、このメンテナンス位置に昇降ピン30を位置させることによりメンテナンス部39をサセプタ本体4aの表面よりも上に位置させて昇降ピン30のメンテナンスを可能にした。もちろん、従来のように退避位置と支持位置の2つの位置のみとして支持位置にて昇降ピンの取り付け取り外しを行うようにしてもよい。   A maintenance part 39 for applying a tool such as a spanner at the time of maintenance such as attachment / removal of the elevating pin 30 is provided immediately below the folding part 35. Conventionally, this type of maintenance is performed at a support position for supporting the glass substrate G. Therefore, when the glass substrate G is at the support position, the maintenance unit 39 has a susceptor body 4a as shown in FIG. Need to be above the surface of the. If such a state is applied to this embodiment, the folding part 35 will be in a position considerably above the surface of the susceptor body 4a. However, ideally, the folding position of the lifting pins is closer to the surface of the susceptor body 4a. Therefore, as shown in FIG. 5 (b), at the support position, the preferred position is secured by setting the height of the fold 35 to be slightly higher than the surface height of the susceptor body 4a. In the above, a maintenance position which is further raised from the support position as a further stop position of the lifting pin 30 is newly provided, and the lifting pin 30 is positioned at this maintenance position as shown in FIG. The maintenance part 39 is positioned above the surface of the susceptor body 4a to enable maintenance of the lift pins 30. Of course, as in the prior art, the lifting pins may be attached and detached at the support position only in two positions, the retracted position and the support position.

なお、折部35の形状は、図4に示すものに限らず、図6の(a)に示すようにすり鉢状の凹部36′と、円錐台状の凸部37′の組み合わせとして小面積の接着剤層38′としてもよい。また昇降ピン30の動作に支障がない限り、図6の(b)に示すように、凹部36と凸部37との嵌め込みだけでもよい。また、図6の(c)に示すように、折部35を平面状の接着剤層38″のみとしてもよい。   The shape of the folding portion 35 is not limited to that shown in FIG. 4, and a small area is obtained as a combination of a mortar-shaped concave portion 36 'and a truncated cone-shaped convex portion 37' as shown in FIG. It may be an adhesive layer 38 '. Further, as long as there is no hindrance to the operation of the elevating pin 30, only the recess 36 and the protrusion 37 may be fitted as shown in FIG. Further, as shown in FIG. 6 (c), the folded portion 35 may be formed of only the planar adhesive layer 38 ″.

また、折部35は、図7に示すように、下部材30aと上部材30bとの間に撓み(または曲げ)変形可能な例えば樹脂製の可撓部材34が介在された構造とし、この可撓部材34が変形して折部35から折れるように構成してもよい。この場合には、下部材30aおよび上部材30bと可撓部材34との付着性を高めるため、下部材30aおよび上部材30bの端部にそれぞれ突起45、46を形成しておき、これらの突起45、46が埋設されるように可撓部材34を設けることができる。可撓部材34は、下部材30aおよび上部材30bに一体的に成形してもよく、成形後に下部材30aおよび上部材30bに接着剤等によって接着してもよい。   Further, as shown in FIG. 7, the folding portion 35 has a structure in which a flexible member 34 made of, for example, resin that can be bent (or bent) is interposed between the lower member 30a and the upper member 30b. You may comprise so that the bending member 34 may deform | transform and bend from the folding part 35. FIG. In this case, in order to improve the adhesion between the lower member 30a and the upper member 30b and the flexible member 34, protrusions 45 and 46 are formed at the ends of the lower member 30a and the upper member 30b, respectively. The flexible member 34 can be provided so that 45 and 46 are embedded. The flexible member 34 may be molded integrally with the lower member 30a and the upper member 30b, or may be bonded to the lower member 30a and the upper member 30b with an adhesive or the like after molding.

下部材30aを構成する材料としては、昇降ピン30をチャンバー2の下方の図示しない取り付け部に確実に取り付ける観点からはステンレス鋼(SUS)等の金属材料であることが好ましい。また、上部材30bは孔5bにおけるサセプタ本体4aとの擦れによるトラブルを防止する観点からは樹脂部材であることが好ましい。   The material constituting the lower member 30a is preferably a metal material such as stainless steel (SUS) from the viewpoint of securely attaching the elevating pin 30 to an attachment portion (not shown) below the chamber 2. Further, the upper member 30b is preferably a resin member from the viewpoint of preventing troubles caused by rubbing with the susceptor body 4a in the hole 5b.

しかし、基板面内に均一なエッチング処理を行う観点からは、昇降ピン30の下部材30aおよび上部材30bが導電性を有するものとし、折部材35を介して上部材30bの先端から下部材30aの下端まで電気的に導通するようにして、サセプタ本体4aと同電位とすることが好ましく、そのような観点からは上部材30bはステンレス鋼(SUS)等の金属で構成し、接着剤層38としては導電性接着剤を用いることが好ましく、可撓部材34としては導電性樹脂を用いることが好ましい。また、可撓部材34を下部材30aおよび上部材30bに接着剤によって接着する場合には、この接着剤としても導電性接着剤を用いることが好ましい。このように昇降ピン30を導電性にすることにより、上述したように、昇降ピン30が導電性のベローズ62およびストッパ60を介してサセプタ本体4aと電気的に繋がり、サセプタ本体4aと同電位となる。また、上部材30bを導電性樹脂で構成することにより、サセプタ本体4aとの擦れによるトラブル防止およびエッチングの均一性を両立させることができる。もちろん、昇降ピン30の一部または全部を絶縁材料にて構成してもよく、下部材30aと上部材30bとを接着する接着剤も絶縁性であってよい。図8に示すように、上部材30bをステンレス鋼(SUS)からなる心材40と、その外側に巻かれた通常の樹脂材41とを有するものとすることによっても、サセプタ本体4aとの擦れによるトラブル防止およびエッチングの均一性を両立させることができる。   However, from the viewpoint of performing a uniform etching process on the substrate surface, it is assumed that the lower member 30a and the upper member 30b of the elevating pin 30 have conductivity, and the lower member 30a from the tip of the upper member 30b via the folding member 35. From the viewpoint, the upper member 30b is made of a metal such as stainless steel (SUS), and the adhesive layer 38 is electrically connected to the lower end of the susceptor body 4a. It is preferable to use a conductive adhesive, and it is preferable to use a conductive resin as the flexible member 34. Further, when the flexible member 34 is bonded to the lower member 30a and the upper member 30b with an adhesive, it is preferable to use a conductive adhesive as the adhesive. By making the elevating pin 30 conductive as described above, as described above, the elevating pin 30 is electrically connected to the susceptor body 4a via the conductive bellows 62 and the stopper 60, and has the same potential as the susceptor body 4a. Become. In addition, by configuring the upper member 30b with a conductive resin, it is possible to achieve both trouble prevention and etching uniformity due to rubbing with the susceptor body 4a. Of course, part or all of the lifting pins 30 may be made of an insulating material, and the adhesive that bonds the lower member 30a and the upper member 30b may be insulative. As shown in FIG. 8, the upper member 30b includes a core material 40 made of stainless steel (SUS) and a normal resin material 41 wound around the upper member 30b, and the upper member 30b is also rubbed with the susceptor body 4a. Both trouble prevention and etching uniformity can be achieved.

次に、このように構成されるプラズマエッチング装置1における処理動作について説明する。
まず、被処理基板であるガラス基板Gを、図示しないロードロック室から図示しない搬送アームにより基板搬入出口21を介してチャンバー2内へと搬入し、サセプタ本体4aの上、つまり、サセプタ本体4aの表面に形成された誘電体材料からなる凸部5aおよび絶縁部材6の上に載置する。この場合に、昇降ピン30は上方に突出して支持位置に位置しており、搬送アーム上のガラス基板Gを昇降ピン30の上に受け渡す。その後、昇降ピン30を下降させてガラス基板Gをサセプタ本体4aの上に載置する。
Next, the processing operation in the plasma etching apparatus 1 configured as described above will be described.
First, a glass substrate G as a substrate to be processed is carried into a chamber 2 through a substrate loading / unloading port 21 by a transfer arm (not shown) from a load lock chamber (not shown), and on the susceptor body 4a, that is, the susceptor body 4a. It is placed on the protrusion 5a made of a dielectric material and the insulating member 6 formed on the surface. In this case, the elevating pins 30 protrude upward and are positioned at the support position, and transfer the glass substrate G on the transfer arm onto the elevating pins 30. Thereafter, the lift pins 30 are lowered to place the glass substrate G on the susceptor body 4a.

その後、ゲートバルブ22を閉じ、排気装置20によって、チャンバー2内を所定の真空度まで真空引きする。そして、バルブ16を開放して、処理ガス供給源18から処理ガスを、マスフローコントローラ17によってその流量を調整しつつ、処理ガス供給管15、ガス導入口14を通ってシャワーヘッド11の内部空間12へ導入し、さらに吐出孔13を通って基板Gに対して均一に吐出し、排気量を調節しつつチャンバー2内を所定圧力に制御する。   Thereafter, the gate valve 22 is closed, and the inside of the chamber 2 is evacuated to a predetermined vacuum level by the exhaust device 20. Then, the valve 16 is opened, and the processing gas from the processing gas supply source 18 is adjusted by the mass flow controller 17, and the internal space 12 of the shower head 11 passes through the processing gas supply pipe 15 and the gas inlet 14. Then, the liquid is uniformly discharged to the substrate G through the discharge holes 13, and the inside of the chamber 2 is controlled to a predetermined pressure while adjusting the exhaust amount.

この状態で高周波電源25から整合器24を介して高周波電力をサセプタ本体4aに印加し、下部電極としてのサセプタ4と上部電極としてのシャワーヘッド11との間に高周波電界を生じさせて、処理ガスのプラズマを生成し、このプラズマによりガラス基板Gにエッチング処理を施す。   In this state, high frequency power is applied from the high frequency power supply 25 to the susceptor body 4a via the matching unit 24, and a high frequency electric field is generated between the susceptor 4 as the lower electrode and the shower head 11 as the upper electrode, thereby processing gas. And the glass substrate G is etched by this plasma.

このようにしてエッチング処理を施した後、高周波電源25からの高周波電力の印加を停止し、処理ガス導入を停止した後、チャンバー2内の圧力を所定の圧力に調整し、昇降ピン30によりガラス基板Gを支持位置まで上昇させる。この状態でゲートバルブ22を開放して図示しない搬送アームをチャンバー2内に挿入し、昇降ピン30上にあるガラス基板Gを搬送アームに受け渡す。そして、ガラス基板Gを基板搬入出口21を介してチャンバー2内から図示しないロードロック室へ搬出する。   After performing the etching process in this manner, the application of the high frequency power from the high frequency power supply 25 is stopped, the introduction of the processing gas is stopped, the pressure in the chamber 2 is adjusted to a predetermined pressure, and the glass is lifted by the lift pins 30. The substrate G is raised to the support position. In this state, the gate valve 22 is opened, a transfer arm (not shown) is inserted into the chamber 2, and the glass substrate G on the lift pins 30 is transferred to the transfer arm. Then, the glass substrate G is unloaded from the chamber 2 to the load lock chamber (not shown) through the substrate loading / unloading port 21.

以上の処理において、ガラス基板Gの搬入および搬出の際には、昇降ピン30がサセプタ本体4aの表面から突出した支持位置に位置されるが、そのような場合に、搬送アーム等が昇降ピンに衝突する事故が生じて横方向の力が及ぼされることがある。そして、その際の力が昇降ピンに変形を及ぼす大きさのものである場合、従来では、その際の力により昇降ピン30が変形してサセプタ本体4aに直接損傷を与えるか、または昇降ピン30が変形したまま使用を続けることによりサセプタ本体4aに損傷を与えるという事態が生じていた。これに対し、本実施形態の場合には、昇降ピン30が変形する力よりも小さい所定の大きさの横方向の力が昇降ピン30の突出した部分に加えられた際に折れる折部35を形成しているので、昇降ピン30が変形する前に折れ部35で折れ、昇降ピン30に変形が生じない。このため、サセプタ本体4aが損傷することを防止することができる。   In the above processing, when the glass substrate G is carried in and out, the elevating pin 30 is positioned at the support position protruding from the surface of the susceptor body 4a. In such a case, the transfer arm or the like is used as the elevating pin. Collisional accidents can occur and lateral forces can be exerted. In the case where the force at that time is of a magnitude that deforms the lifting pin, conventionally, the lifting pin 30 is deformed by the force at that time and directly damages the susceptor body 4a, or the lifting pin 30 There was a situation in which the susceptor body 4a was damaged by continuing to use it while being deformed. On the other hand, in the case of the present embodiment, the folding portion 35 that is folded when a lateral force having a predetermined magnitude smaller than the force that deforms the lifting pin 30 is applied to the protruding portion of the lifting pin 30 is provided. Since it is formed, the lift pin 30 is bent at the bent portion 35 before the lift pin 30 is deformed, and the lift pin 30 is not deformed. For this reason, it is possible to prevent the susceptor body 4a from being damaged.

次に、昇降ピン30の構造の他の例について説明する。
図9は、昇降ピンの他の例を示す模式的な断面図である。この例では、昇降ピン30は、下部材30aと上部材30bとの間に圧縮力を与える圧縮力付与部材としてのコイルスプリング43をさらに有している。このコイルスプリング43は、下部材30aの上部に形成された凹部44に設けられており、一端が下部材30aに他端が上部材30bに取り付けられている。そして、図9の(a)に示す通常の状態では、このコイルスプリング43は、引張られた状態で凹部44に収容されており、この際のバネ力により下部材30aと上部材30bとの間に圧縮力が与えられる。したがって、昇降ピン30の通常の昇降動作の際には圧縮力により変形等を生じずに昇降動作を行うことが可能である。
Next, another example of the structure of the lifting pins 30 will be described.
FIG. 9 is a schematic cross-sectional view showing another example of the lifting pins. In this example, the elevating pin 30 further includes a coil spring 43 as a compression force applying member that applies a compression force between the lower member 30a and the upper member 30b. The coil spring 43 is provided in a recess 44 formed in the upper part of the lower member 30a, and one end is attached to the lower member 30a and the other end is attached to the upper member 30b. In the normal state shown in FIG. 9A, the coil spring 43 is housed in the recessed portion 44 in a tensioned state, and the spring force at this time causes a gap between the lower member 30a and the upper member 30b. A compression force is applied to the. Therefore, during the normal lifting / lowering operation of the lifting / lowering pin 30, the lifting / lowering operation can be performed without causing deformation or the like due to the compressive force.

この例の昇降ピン30の場合でも、昇降ピン30に昇降ピン30が変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れ部35で折れるように設計される。具体的には、下部材30aと上部材30bとの間の圧縮力よりも大きな力がこれらの間に作用するような横方向の力が昇降ピン30に与えられた場合に、折部35で折れるのであるから、そのときの力が昇降ピン30が変形する力よりも小さくなるように、バネの引張力を調整する。これにより、昇降ピン30に所定の横方向の力が及ぼされた際に、図9の(b)のように折部35で折れるのである。   Even in the case of the lifting pin 30 of this example, the lifting pin 30 is designed to be folded at the folding portion 35 when a lateral force having a predetermined magnitude smaller than the force by which the lifting pin 30 is deformed is applied. Specifically, when a lateral force is applied to the elevating pin 30 so that a force larger than the compressive force between the lower member 30a and the upper member 30b acts between them, the folding portion 35 Since it bends, the tension of the spring is adjusted so that the force at that time is smaller than the force by which the elevating pin 30 is deformed. As a result, when a predetermined lateral force is applied to the elevating pin 30, it is folded at the folding portion 35 as shown in FIG. 9B.

次に、昇降ピン30の構造のさらに他の例について説明する。
図10は、昇降ピンのさらに他の例を示す模式的な断面図である。この例では、昇降ピン30は、上部材30bに対して上方向に付勢する付勢力を与える付勢力付与部材としてのコイルスプリング51と、上部材30bに付勢力が与えられている状態で下部材30aと上部材30bとを連結する樹脂製の連結部材52とをさらに有している。
Next, still another example of the structure of the lifting pins 30 will be described.
FIG. 10 is a schematic cross-sectional view showing still another example of the lifting pins. In this example, the elevating pin 30 is lowered in a state in which a biasing force is applied to the upper member 30b and a coil spring 51 as a biasing force applying member that applies a biasing force that biases the upper member 30b upward. It further has a resin-made connecting member 52 that connects the member 30a and the upper member 30b.

下部材30aの上端部には、上方が開口する凹部53が形成されており、上部材30bの下端部には、下方が開口する凹部54が形成されている。また、凹部54の上部には段部54aを有しており、段部54aより上の部分が大径部54bとなっている。連結部材52は、下端部にネジ部52aを有しており、上端部に傘状の係合部52bを有している。凹部53の外周部には上記コイルスプリング51が嵌め込まれ、凹部53の中央部には連結部材52の下部が挿入され、ネジ部52aにより下部材30aに螺合されている。連結部材52の上部は凹部54に嵌め込まれており、その係合部52bが大径部54aに挿入されており、係合部52bが段部54aに係合するようになっている。上部材30bの下端にはコイルスプリング51に対応するように環状に押圧部55が形成されており、下部材30aと上部材30bとを連結した際に、押圧部55がコイルスプリング51を圧縮し、その付勢力が上部材30bに及ぼされるようになっている。   A recess 53 that opens upward is formed at the upper end of the lower member 30a, and a recess 54 that opens downward is formed at the lower end of the upper member 30b. In addition, a step portion 54a is provided on the upper portion of the concave portion 54, and a portion above the step portion 54a is a large-diameter portion 54b. The connecting member 52 has a screw portion 52a at the lower end portion and an umbrella-shaped engaging portion 52b at the upper end portion. The coil spring 51 is fitted into the outer periphery of the recess 53, the lower part of the connecting member 52 is inserted into the center of the recess 53, and is screwed to the lower member 30a by the screw portion 52a. The upper part of the connecting member 52 is fitted into the recess 54, the engaging part 52b is inserted into the large diameter part 54a, and the engaging part 52b is engaged with the step part 54a. An annular pressing portion 55 is formed at the lower end of the upper member 30b so as to correspond to the coil spring 51. When the lower member 30a and the upper member 30b are connected, the pressing portion 55 compresses the coil spring 51. The biasing force is exerted on the upper member 30b.

昇降ピン30にガラス基板Gの荷重が及ぼされていない時には、図10の(a)に示すように、上部材30bはコイルスプリング51により上方へ付勢され、凹部54の段部54aと連結部材52の係合部52bとが係合して昇降ピン30は変形等を生じずに安定して昇降動作を行うことが可能である。またガラス基板Gの荷重が及ぼされているときには、図10の(b)に示すように、コイルスプリングが圧縮され係合部52bと段部54aとの係合は解除されるが、横方向の力が加わらない限り安定した昇降動作を行うことができる。   When the load of the glass substrate G is not applied to the elevating pins 30, the upper member 30b is urged upward by the coil spring 51 as shown in FIG. The lift pins 30 can be stably moved up and down without being deformed by the engagement with the engagement portions 52b of 52. When the load of the glass substrate G is applied, the coil spring is compressed and the engagement between the engaging portion 52b and the stepped portion 54a is released as shown in FIG. As long as no force is applied, a stable lifting operation can be performed.

この例の昇降ピン30の場合でも、昇降ピン30に昇降ピン30が変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れ部35で折れるように設計される。具体的には、上部材30bに及ぼされる付勢力よりも大きな力が上部材30bに作用するような横方向の力が昇降ピン30に与えられた場合に、段部54aと係合部52bの係合が外れて折部35で折れると考えられるから、そのときの力が昇降ピン30が変形する力よりも小さくなるように、バネの付勢力を調整する。これにより、昇降ピン30に所定の横方向の力が及ぼされた際に、図10の(c)のように折部35で折れるのである。   Even in the case of the lifting pin 30 of this example, the lifting pin 30 is designed to be folded at the folding portion 35 when a lateral force having a predetermined magnitude smaller than the force by which the lifting pin 30 is deformed is applied. Specifically, when a lateral force is applied to the elevating pin 30 so that a force larger than the urging force exerted on the upper member 30b is applied to the elevating pin 30, the step portion 54a and the engaging portion 52b Since it is considered that the engagement is disengaged and the folding part 35 breaks, the biasing force of the spring is adjusted so that the force at that time becomes smaller than the force by which the elevating pin 30 is deformed. Thus, when a predetermined lateral force is exerted on the elevating pin 30, it is folded at the folding portion 35 as shown in FIG.

なお、図9、図10の例においても、導電性を確保するために上部材30bを導電性樹脂で構成したり、図8に示すような構造にすることが可能であることは言うまでもない。   In the examples of FIGS. 9 and 10, it goes without saying that the upper member 30b can be made of a conductive resin in order to ensure conductivity, or can have a structure as shown in FIG.

なお、本発明は上記実施形態に限定されることはなく、種々の変形が可能である。
例えば、本実施形態では、下部電極に高周波電力を印加するRIEタイプの容量結合型平行平板プラズマエッチング装置における下部電極としてのサセプタに本発明の基板載置台を適用した例について示したが、これに限らず、アッシング、CVD成膜等の他のプラズマ処理装置に適用することができるし、上部電極に高周波電力を供給するタイプであっても、また容量結合型に限らず誘導結合型であってもよい。また、プラズマ処理に限らず、他の処理装置に適用することも可能である。
In addition, this invention is not limited to the said embodiment, A various deformation | transformation is possible.
For example, in this embodiment, an example in which the substrate mounting table of the present invention is applied to a susceptor as a lower electrode in an RIE type capacitively coupled parallel plate plasma etching apparatus that applies high-frequency power to the lower electrode has been described. The present invention can be applied not only to other plasma processing apparatuses such as ashing and CVD film formation, but also to a type that supplies high-frequency power to the upper electrode. Also good. Further, the present invention can be applied not only to plasma processing but also to other processing apparatuses.

また、昇降ピンとしては、昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部を有するものであればよく、折部の構成は上記実施形態に限るものではない。例えば、このような条件を満たす限り、折部が単に切り欠きであってもよい。   Moreover, as a raising / lowering pin, what is necessary is just to have a folding part which bends when the horizontal force of the predetermined magnitude | size smaller than the force which a raising / lowering pin deform | transforms is applied, and the structure of a folding part is the said embodiment. It is not limited to. For example, as long as such a condition is satisfied, the folded portion may simply be a notch.

また、被処理基板はFPD用ガラス基板Gに限られず半導体ウエハ等の他の基板であってもよい。   Further, the substrate to be processed is not limited to the FPD glass substrate G but may be another substrate such as a semiconductor wafer.

本発明の一実施形態に係る基板載置台としてのサセプタが設けられた処理装置の一例であるプラズマエッチング装置を示す断面図。Sectional drawing which shows the plasma etching apparatus which is an example of the processing apparatus provided with the susceptor as a substrate mounting base concerning one Embodiment of this invention. 図1の処理装置におけるサセプタを拡大して示す断面図。Sectional drawing which expands and shows the susceptor in the processing apparatus of FIG. サセプタ本体における昇降ピンの配置を説明するための平面図。The top view for demonstrating arrangement | positioning of the raising / lowering pin in a susceptor main body. 本発明の一実施形態に係る基板載置台としてのサセプタに用いられた昇降ピンの構造の一例を示す図。The figure which shows an example of the structure of the raising / lowering pin used for the susceptor as a substrate mounting base concerning one Embodiment of this invention. 本実施形態のサセプタにおける昇降ピンのメンテナンス手法を説明するための概略図。Schematic for demonstrating the maintenance method of the raising / lowering pin in the susceptor of this embodiment. 図4の昇降ピンにおける折部の変形例を説明するための図。The figure for demonstrating the modification of the folding part in the raising / lowering pin of FIG. 図4の昇降ピンにおける折部の他の例を説明するための図。The figure for demonstrating the other example of the folding part in the raising / lowering pin of FIG. 図4の昇降ピンの変形例を示す図。The figure which shows the modification of the raising / lowering pin of FIG. 昇降ピンの構造の他の例を示す図。The figure which shows the other example of the structure of a raising / lowering pin. 昇降ピンの構造のさらに他の例を示す図。The figure which shows the further another example of the structure of a raising / lowering pin.

符号の説明Explanation of symbols

1;処理装置(プラズマエッチング装置)
2;チャンバー(処理容器)
3;絶縁板
4;サセプタ(基板載置台)
4a;サセプタ本体(載置台本体)
5;基材
5a;凸部
6;絶縁部材
7;スペーサ部材
11;シャワーヘッド(ガス供給手段)
20;排気装置
25;高周波電源(プラズマ生成手段)
30;昇降ピン
30a;下部材
30b;上部材
34;可撓部材
35;折部
36,36′;凹部
37,37′;凸部
38,38′,38″;接着剤層
39;メンテナンス部
40;心材
41;樹脂材
43;コイルスプリング(圧縮力付与部材)
44;凹部
51;コイルスプリング(付勢力付与部材)
52;連結部材
52b;係合部
54a;段部
55;押圧部
G;ガラス基板
1: Processing equipment (plasma etching equipment)
2; Chamber (processing container)
3; Insulating plate 4; Susceptor (substrate mounting table)
4a: Susceptor body (mounting table body)
5; base material 5a; convex portion 6; insulating member 7; spacer member 11; shower head (gas supply means)
20; exhaust device 25; high-frequency power supply (plasma generating means)
30; Lift pin 30a; Lower member 30b; Upper member 34; Flexible member 35; Folded portion 36, 36 '; Recessed portion 37, 37';; Core material 41; resin material 43; coil spring (compressive force applying member)
44; recess 51; coil spring (biasing force applying member)
52; connecting member 52b; engaging portion 54a; stepped portion 55; pressing portion G; glass substrate

Claims (20)

基板処理装置において基板を載置する基板載置台であって、
載置台本体と、
前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンと
を具備し、
前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、
前記下部材は金属製であり、前記上部材は樹脂製であることを特徴とする基板載置台。
A substrate mounting table for mounting a substrate in a substrate processing apparatus,
A mounting table body;
It is vertically inserted with respect to the mounting table main body, is provided so as to be able to move up and down so as to project and sink with respect to the surface of the mounting table main body, and includes a lifting pin that supports and lifts the substrate at its tip.
The elevating pin can take a retracted position submerged in the mounting table main body and a support position that protrudes from the mounting table main body and supports the substrate. A folding portion that is folded when a lateral force having a predetermined magnitude smaller than a force that deforms the elevating pin is applied to the surface position or a position above it, and a lower portion than the folding portion. A lower member, and an upper member that constitutes an upper part of the folded portion,
The substrate mounting table, wherein the lower member is made of metal and the upper member is made of resin .
基板処理装置において基板を載置する基板載置台であって、A substrate mounting table for mounting a substrate in a substrate processing apparatus,
載置台本体と、A mounting table body;
前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとElevating pins that are inserted vertically with respect to the mounting table main body and are provided so as to be movable up and down so as to project and sink with respect to the surface of the mounting table main body, and support the substrate at the tip thereof to move up and down
を具備し、Comprising
前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、The elevating pin can take a retracted position submerged in the mounting table main body and a support position that protrudes from the mounting table main body and supports the substrate. A folding portion that is folded when a lateral force having a predetermined magnitude smaller than a force that deforms the elevating pin is applied to the surface position or a position above it, and a lower portion than the folding portion. A lower member, and an upper member that constitutes an upper part of the folded portion,
前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、The lower member and the upper member have electrical conductivity, and are connected so as to be electrically conducted from the tip of the upper member to the lower end of the lower member via the folding portion,
前記折部が前記上部材と前記下部材との接着部分を有している場合に、接着部分として導電接着剤を用いることを特徴とする基板載置台。When the folding part has an adhesive part between the upper member and the lower member, a conductive adhesive is used as the adhesive part.
基板処理装置において基板を載置する基板載置台であって、A substrate mounting table for mounting a substrate in a substrate processing apparatus,
載置台本体と、A mounting table body;
前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとElevating pins that are inserted vertically with respect to the mounting table main body and are provided so as to be movable up and down so as to project and sink with respect to the surface of the mounting table main body, and support the substrate at the tip thereof to move up and down
を具備し、Comprising
前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、The elevating pin can take a retracted position submerged in the mounting table main body and a support position that protrudes from the mounting table main body and supports the substrate. A folding portion that is folded when a lateral force having a predetermined magnitude smaller than a force that deforms the elevating pin is applied to the surface position or a position above it, and a lower portion than the folding portion. A lower member, and an upper member that constitutes an upper part of the folded portion,
前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、The lower member and the upper member have electrical conductivity, and are connected so as to be electrically conducted from the tip of the upper member to the lower end of the lower member via the folding portion,
前記下部材は金属で形成されており、前記上部材は導電性樹脂で形成されていることを特徴とする基板載置台。The substrate mounting table, wherein the lower member is made of metal, and the upper member is made of conductive resin.
基板処理装置において基板を載置する基板載置台であって、A substrate mounting table for mounting a substrate in a substrate processing apparatus,
載置台本体と、A mounting table body;
前記載置台本体に対して鉛直に挿通され、前記載置台本体の表面に対して突没するように昇降自在に設けられ、その先端で基板を支持して昇降させる昇降ピンとElevating pins that are inserted vertically with respect to the mounting table main body and are provided so as to be movable up and down so as to project and sink with respect to the surface of the mounting table main body, and support the substrate at the tip thereof to move up and down
を具備し、Comprising
前記昇降ピンは、前記載置台本体内に没した退避位置と、前記載置台本体から突出して基板を支持する支持位置とをとることが可能であり、前記支持位置にある時に、前記載置台本体の表面位置またはそれより上方位置に、前記昇降ピンが変形する力よりも小さい所定の大きさの横方向の力が加えられた際に折れる折部と、前記折部よりも下方部分を構成する下部材と、前記折部よりも上方部分を構成する上部材とを有し、The elevating pin can take a retracted position submerged in the mounting table main body and a support position that protrudes from the mounting table main body and supports the substrate. A folding portion that is folded when a lateral force having a predetermined magnitude smaller than a force that deforms the elevating pin is applied to the surface position or a position above it, and a lower portion than the folding portion. A lower member, and an upper member that constitutes an upper part of the folded portion,
前記下部材および前記上部材は導電性を有しており、前記折部を介して前記上部材の先端から前記下部材の下端まで電気的に導通するように接続され、The lower member and the upper member have electrical conductivity, and are connected so as to be electrically conducted from the tip of the upper member to the lower end of the lower member via the folding portion,
前記上部材は、金属製の心材とその外側を覆う樹脂部材とを有することを特徴とする基板載置台。The upper member includes a metal core and a resin member that covers an outer side of the metal core.
前記昇降ピンは、前記下部材と前記上部材とが嵌合して構成されており、その嵌合部分が前記折部として機能することを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 The said raising / lowering pin is comprised by the said lower member and the said upper member fitting, The fitting part functions as the said folding part , The any one of Claims 1-4 characterized by the above-mentioned. The substrate mounting table according to the item . 前記昇降ピンは、前記下部材と前記上部材とが接着されて構成されており、その接着部分が前記折部として機能することを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 The said raising / lowering pin is comprised by adhere | attaching the said lower member and the said upper member, The adhesion part functions as the said folding part, The Claim 1 characterized by the above-mentioned. The board | substrate mounting base of description. 前記昇降ピンは、前記下部材と前記上部材との間に撓み変形可能な可撓部材が介在されて構成されており、前記可撓部材が前記折部として機能することを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 Claim the lift pins are constructed by interposing the deformable flexible deflectable member between the upper member and the lower member, wherein said flexible member functions as the folding unit The substrate mounting table according to any one of claims 1 to 4 . 前記昇降ピンは、前記下部材と前記上部材とが嵌合し、かつその嵌合部分の少なくとも一部が接着されて構成されており、その嵌合部分および接着部分が前記折部として機能することを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 The elevating pin is configured such that the lower member and the upper member are fitted to each other, and at least a part of the fitting portion is bonded, and the fitting portion and the bonding portion function as the folding portion. The substrate mounting table according to any one of claims 1 to 4, wherein the substrate mounting table is provided. 前記昇降ピンは、前記下部材と前記上部材との間に圧縮力を与える圧縮力付与部材をさらに有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記圧縮力が解除されて前記折部が折れることを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 The elevating pin further includes a compressive force applying member that applies a compressive force between the lower member and the upper member, and when the lateral force of the predetermined magnitude is applied to the elevating pin, The substrate mounting table according to any one of claims 1 to 4, wherein the folding part is folded by releasing the compressive force. 前記圧縮力付与部材はコイルバネであることを特徴とする請求項9に記載の基板載置台。 The substrate mounting table according to claim 9 , wherein the compressive force applying member is a coil spring. 前記昇降ピンは、前記上部材に対して上方向に付勢する付勢力を与える付勢力付与部材と、前記上部材に付勢力が与えられている状態で前記下部材と前記上部材とを連結する連結部材とをさらに有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記連結部材の連結が解除されて前記折部が折れることを特徴とする請求項1から請求項4のいずれか1項に記載の基板載置台。 The elevating pin connects the lower member and the upper member in a state in which a biasing force is applied to the upper member, and a biasing force imparting member that biases the upper member upward. claims linking further comprising a member, and wherein said folding portion connecting is released the coupling member break that when the lateral force of the predetermined magnitude to the lift pins was added to The substrate mounting table according to any one of claims 1 to 4 . 前記付勢力付与部材はコイルスプリングであり、前記連結部材は、前記下部材に固定される固定部と前記上部材に付勢力が付与されている際に前記上部材を係止する係止部とを有し、前記昇降ピンに前記所定の大きさの横方向の力が加えられた際に前記係止部の係止が解除されて前記折部が折れることを特徴とする請求項11に記載の基板載置台。 The biasing force applying member is a coil spring, and the connecting member includes a fixed portion fixed to the lower member and a locking portion for locking the upper member when a biasing force is applied to the upper member. 12. The device according to claim 11 , wherein when the lateral force of the predetermined magnitude is applied to the elevating pin, the locking portion is released and the folding portion is folded. Substrate mounting table. 前記下部材および前記上部材導電性を有しているとき
前記可撓部材は導電性樹脂で構成されていることを特徴とする請求項7に記載の基板載置台。
When said lower member and said upper member has conductivity,
The substrate mounting table according to claim 7 , wherein the flexible member is made of a conductive resin.
前記下部材および前記上部材はいずれも金属で形成されていることを特徴とする請求項2または請求項4に記載の基板載置台。 The substrate mounting table according to claim 2 or 4 , wherein both the lower member and the upper member are made of metal. 前記昇降ピンは前記載置台本体と同電位であることを特徴とする請求項2から請求項14のいずれか1項に記載の基板載置台。 The substrate mounting table according to any one of claims 2 to 14 , wherein the elevating pins have the same potential as the mounting table main body. 前記処理装置はプラズマ処理を行うものであり、前記載置台本体は下部電極として機能することを特徴とする請求項1から請求項15のいずれか1項に記載の基板載置台。 The substrate mounting table according to any one of claims 1 to 15 , wherein the processing apparatus performs plasma processing, and the mounting table main body functions as a lower electrode. 前記昇降ピンは、前記支持位置よりも上昇したメンテナンス位置をとることが可能であることを特徴とする請求項1から請求項16のいずれか1項に記載の基板載置台。 The substrate mounting table according to any one of claims 1 to 16 , wherein the elevating pins can take a maintenance position that is higher than the support position. 基板を収容する処理容器と、
前記処理容器内に設けられ、基板が載置される基板載置台と、
前記処理室内で基板に対して所定の処理を施す処理機構と
を具備し、
前記基板載置台は請求項1から請求項17のいずれかの構成を有することを特徴とする基板処理装置。
A processing container for containing a substrate;
A substrate mounting table provided in the processing container and on which a substrate is mounted;
A processing mechanism for performing a predetermined process on the substrate in the processing chamber;
18. The substrate processing apparatus, wherein the substrate mounting table has a configuration according to any one of claims 1 to 17 .
前記処理機構は、前記処理容器内に処理ガスを供給するガス供給機構と、前記処理容器内を排気する排気機構と、前記処理容器内に前記処理ガスのプラズマを生成するプラズマ生成機構とを有することを特徴とする請求項18に記載の基板処理装置。 The processing mechanism includes a gas supply mechanism that supplies a processing gas into the processing container, an exhaust mechanism that exhausts the processing container, and a plasma generation mechanism that generates plasma of the processing gas in the processing container. The substrate processing apparatus according to claim 18 . 前記プラズマ生成機構は、下部電極として機能する前記基板載置台と、基板載置台に対向して設けられた上部電極と、基板載置台に高周波電力を印加する高周波電源とを有することを特徴とする請求項19に記載の基板処理装置。 The plasma generation mechanism includes the substrate mounting table that functions as a lower electrode, an upper electrode provided to face the substrate mounting table, and a high-frequency power source that applies high-frequency power to the substrate mounting table. The substrate processing apparatus according to claim 19 .
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